JPH06273359A - Total reflection fluorescent x-ray analyzer - Google Patents
Total reflection fluorescent x-ray analyzerInfo
- Publication number
- JPH06273359A JPH06273359A JP6226193A JP6226193A JPH06273359A JP H06273359 A JPH06273359 A JP H06273359A JP 6226193 A JP6226193 A JP 6226193A JP 6226193 A JP6226193 A JP 6226193A JP H06273359 A JPH06273359 A JP H06273359A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- total reflection
- ray source
- rays
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、全反射蛍光Ｘ線法に
用いられる全反射蛍光Ｘ線分析装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a total reflection X-ray fluorescence analyzer used for a total reflection X-ray fluorescence method.
【０００２】[0002]
【従来の技術】従来技術を図３を用いて説明する。Ｘ線
源１１から放射されたＸ線は、スリット２で細い平行Ｘ
線束にされた後、Ｘ線分光手段３により分光される。分
光されたＸ線は試料支持体５の光学的に平滑な面に低い
角度で照射される。Ｘ線分光手段３はＸ線の照射方向に
対しその固定角度が変えられるようになっており、Ｘ線
源１１のターゲットの固有Ｘ線が試料支持体５に照射さ
れ、それ以外のエネルギーのＸ線はほとんど試料支持体
５に照射されないようになっている。試料支持体５のＸ
線が照射される平面上には試料４が付着している。試料
支持体５は位置ぎめテーブル６の上に載せられている。2. Description of the Related Art A conventional technique will be described with reference to FIG. The X-rays emitted from the X-ray source 11 are thin parallel X-rays in the slit 2.
After being converted into a bundle of rays, it is spectrally separated by the X-ray spectroscopic means 3. The dispersed X-rays are applied to the optically smooth surface of the sample support 5 at a low angle. The fixed angle of the X-ray spectroscopic means 3 can be changed with respect to the X-ray irradiation direction, and the characteristic X-rays of the target of the X-ray source 11 are irradiated on the sample support 5, and the X-rays having other energies. Almost no line is irradiated on the sample support 5. X of sample support 5
The sample 4 is attached on the plane irradiated with the line. The sample support 5 is mounted on a positioning table 6.
【０００３】試料支持体５の上方には、試料支持体５の
光学的に平滑な面に対向して半導体検出器８が設置さ
れ、これにより試料支持体５上に載せられた試料４から
放射される蛍光Ｘ線が検出される。このような構造は、
例えば、特開平３−２０２７６０号公報に開示されてい
る。A semiconductor detector 8 is installed above the sample support 5 so as to face the optically smooth surface of the sample support 5, whereby the semiconductor detector 8 is radiated from the sample 4 placed on the sample support 5. The fluorescent X-rays generated are detected. Such a structure
For example, it is disclosed in Japanese Patent Laid-Open No. 3-202760.
【０００４】Ｘ線源１１のターゲットは、測定対象元素
により最適なものを選択するが、試料によってはターゲ
ットを変えて複数回測定することも多い。ターゲットを
変える手段としては、第１にＸ線源ごと取り替える方法
があり、第２に複数個のＸ線源を装備し、各々のＸ線源
ごとに、Ｘ線分光手段を専用に持ち、全体の光学系を切
り換える方法が採用されている。The target of the X-ray source 11 is selected optimally according to the element to be measured, but depending on the sample, it is often the case that the target is changed and the measurement is carried out a plurality of times. As a means for changing the target, firstly, there is a method of replacing each X-ray source, and secondly, a plurality of X-ray sources are provided, and each X-ray source has its own X-ray spectroscopic means for exclusive use. The method of switching the optical system of is adopted.
【０００５】[0005]
【発明が解決しようとする課題】しかし第１の方法で
は、Ｘ線源を交換するために手間や時間がかかるという
課題があり、第２の方法では、光学系を複数個持つため
に、複雑な構成となり、大型でコストがかかるという課
題があった。However, the first method has a problem that it takes time and labor to replace the X-ray source, and the second method has a complicated structure because it has a plurality of optical systems. However, there is a problem that it is large in size and costly.
【０００６】そこで、この発明の目的は、従来のこのよ
うな課題を解決するため、ターゲットの交換に手間や時
間がかからず、かつ装置が大型にならず安価な交換機能
を有する装置を得ることである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above-mentioned conventional problems and to obtain an apparatus having a replacement function which does not require much time and labor for replacement of a target, and which does not become large in size and has an inexpensive replacement function. That is.
【０００７】[0007]
【課題を解決するための手段】上記課題を解決するため
に、この発明は、複数のターゲットにより測定を行う全
反射蛍光Ｘ線分析装置において、複数のＸ線源を直列に
並べ、所望のＸ線源を所定の位置に制御装置により配置
する直線駆動機構を設けた。あるいは、直線駆動機構の
代わりに、複数のＸ線源を円周上に並べ、所望のＸ線源
を所定の位置に制御装置により配置する回転駆動機構を
設けた。In order to solve the above-mentioned problems, the present invention relates to a total reflection X-ray fluorescence analyzer for measuring with a plurality of targets, in which a plurality of X-ray sources are arranged in series to obtain a desired X-ray. A linear drive mechanism was provided that placed the radiation source in place by the controller. Alternatively, instead of the linear drive mechanism, a rotary drive mechanism is provided in which a plurality of X-ray sources are arranged on the circumference and a desired X-ray source is arranged at a predetermined position by a control device.
【０００８】いずれの場合も、Ｘ線分光手段などの光学
系は各Ｘ線源で共通に使用されるため、ターゲットの交
換が迅速で簡便であり、かつ装置の小型化が図れるよう
にした。In any case, since the optical system such as the X-ray spectroscopic means is commonly used by each X-ray source, the replacement of the target is quick and easy, and the size of the apparatus can be reduced.
【０００９】[0009]
【作用】上記のように構成された全反射蛍光Ｘ線分析装
置においては、オペレータの指示により、制御装置が所
望のＸ線源を所定の位置に配置するので、Ｘ線源の交換
のための手間や時間が大幅に削減されることとなる。ま
た、複数ターゲットによる連続測定も可能となる。In the total reflection X-ray fluorescence analyzer constructed as described above, the controller places a desired X-ray source at a predetermined position according to an operator's instruction. The labor and time will be greatly reduced. In addition, continuous measurement with multiple targets is also possible.
【００１０】さらに、Ｘ線分光手段などの光学系はただ
ひとつ持てばよく、Ｘ線源のみを移動させるという簡単
な構成としたので、装置の大型化を防止できる。Further, since it is necessary to have only one optical system such as X-ray spectroscopic means and only the X-ray source is moved, it is possible to prevent the apparatus from becoming large.
【００１１】[0011]
【実施例】以下に、この発明の実施例を図に基づいて説
明する。図１において、Ｘ線源１１から放射されたＸ線
は、スリット２で細い平行Ｘ線束にされた後、Ｘ線分光
手段３により分光される。Ｘ線源１１は、他の１つ以上
のＸ線源１２、１３、…とともに直線駆動機構１に搭載
されており、制御装置７によってＸ線源１１のターゲッ
トの固有Ｘ線のみが試料支持体５の光学的に平滑な面に
照射するような位置に配置されている。Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, the X-rays emitted from the X-ray source 11 are made into a thin parallel X-ray bundle by the slit 2 and then dispersed by the X-ray spectroscopic means 3. The X-ray source 11 is mounted on the linear drive mechanism 1 together with one or more other X-ray sources 12, 13, ..., And only the characteristic X-rays of the target of the X-ray source 11 are controlled by the controller 7 to the sample support. 5 is arranged at a position where it irradiates the optically smooth surface.
【００１２】Ｘ線源を変更するときは制御装置７により
直線駆動機構１が動作し、矢印方向に移動することによ
って所望のＸ線源が所定の位置に配置される。ここで所
定の位置とは、選択したＸ線源のターゲットの固有Ｘ線
のみが試料支持体５の光学的に平滑な面に照射されるよ
うな条件を満たす位置であり、Ｘ線源、Ｘ線分光手段
３、試料支持体５の光学的に平滑な面の３者の相対的な
位置で決まるものである。When changing the X-ray source, the linear drive mechanism 1 is operated by the controller 7 and moved in the direction of the arrow so that the desired X-ray source is arranged at a predetermined position. Here, the predetermined position is a position that satisfies the condition that only the eigen X-rays of the target of the selected X-ray source irradiate the optically smooth surface of the sample support body 5. It is determined by the relative positions of the line spectroscopic means 3 and the optically smooth surface of the sample support 5 among the three.
【００１３】Ｘ線源の切り換え機構としては図２に示す
ような回転駆動機構９も利用できる。回転駆動機構の場
合、矢印方向に移動して所望のＸ線が選択される。本発
明の全反射蛍光Ｘ線分析装置において、Ｘ線源としてＭ
ｏ、Ｗ、Ｃｕの各ターゲットを使用したときの各試料元
素から得られる蛍光Ｘ線強度を表に示す。励起源となる
特性Ｘ線としては、それぞれＭｏＫα、ＷＬβ、ＣｕＫ
αを用いた。また、各元素とも、Ｗをターゲットとした
ときの強度を１とした場合の相対強度を示す。A rotary drive mechanism 9 as shown in FIG. 2 can also be used as the X-ray source switching mechanism. In the case of the rotary drive mechanism, the desired X-ray is selected by moving in the arrow direction. In the total reflection X-ray fluorescence analyzer of the present invention, M as an X-ray source is used.
The table shows the fluorescent X-ray intensities obtained from the respective sample elements when the respective targets of o, W and Cu are used. The characteristic X-rays used as excitation sources are MoKα, WLβ, and CuK, respectively.
α was used. Moreover, each element shows the relative intensity when the intensity when W is the target is 1.
【００１４】 （表１） （ａ）加速電圧５０ｋＶの場合 励起源のターゲット 元 素 Ｍｏ Ｗ Ｃｕ Ｚｎ ０．３２ １ Ｃｕ ０．３１ １ Ｎｉ ０．３１ １ Ｃｏ ０．３０ １ ８．３０ Ｆｅ ０．３０ １ ８．２４ Ｍｎ ０．２９ １ ８．４２ Ｃｒ ０．２９ １ ８．４５ （ｂ）加速電圧３０ｋＶの場合 励起源のターゲット 元 素 Ｗ Ｃｕ Ｚｎ １ Ｃｕ １ Ｎｉ １ Ｃｏ １ ７．５４ Ｆｅ １ ７．４８ Ｍｎ １ ７．６５ Ｃｒ １ ７．６７ 表からわかるように、加速電圧５０ｋＶの場合、Ｃｒ〜
Ｚｎの元素に対してＷ励起の方がＭｏ励起に比べて約３
倍の蛍光Ｘ線強度が得られる。また、加速電圧３０ｋＶ
の場合、Ｃｒ〜Ｃｏの元素に対してＣｕ励起の方がＷ励
起に比べて約７．５倍の蛍光Ｘ線強度が得られる。また
Ｍｏ励起では、ＷやＣｕ励起では測定できないＢｒやＰ
ｂなどの蛍光Ｘ線を得ることができる。(Table 1) (a) In case of accelerating voltage of 50 kV Target element of excitation source Mo W Cu Zn 0.32 1 Cu 0.31 1 Ni 0.31 1 Co 0.30 1 8.30 Fe 0.30. 30 1 8.24 Mn 0.29 1 8.42 Cr 0.29 1 8.45 (b) In case of acceleration voltage 30 kV Target element of excitation source W Cu Zn 1 Cu 1 Ni 1 Co 1 7.54 Fe 1 7.48 Mn 1 7.65 Cr 1 7.67 As can be seen from the table, when the acceleration voltage is 50 kV, Cr to
The W excitation is about 3 compared with the Mo excitation for the Zn element.
Double fluorescent X-ray intensity is obtained. Also, acceleration voltage 30 kV
In the case of, in the case of the elements Cr to Co, the excitation of Cu gives about 7.5 times the fluorescent X-ray intensity as compared with the excitation of W. Also, with Mo excitation, Br and P cannot be measured with W and Cu excitation.
Fluorescent X-rays such as b can be obtained.
【００１５】このように、得られる蛍光Ｘ線の強度は測
定精度に効いてくるので、ある試料を複数のターゲット
で分析したいという要求が強い。本装置は、このような
要求に応えるもので、Ｘ線源の交換が迅速かつ簡便であ
り、オペレータは交換作業を意識することがない。ま
た、Ｘ線源の交換は制御装置を通して行うため、１試料
を複数ターゲットで連続測定することも可能である。As described above, since the intensity of the obtained fluorescent X-ray affects the measurement accuracy, there is a strong demand to analyze a certain sample with a plurality of targets. The present apparatus responds to such demands, the replacement of the X-ray source is quick and easy, and the operator does not have to be aware of the replacement work. Further, since the X-ray source is replaced through the control device, it is possible to continuously measure one sample with a plurality of targets.
【００１６】[0016]
【発明の効果】この発明は、以上説明したように、複数
のＸ線源を装備し、それらのＸ線源の中から所望のＸ線
源を所定の位置に制御装置をもって配置する切り換え機
構を持つという構成としたので、Ｘ線源の交換の手間や
時間が大幅に削減できて操作性が向上し、また簡単な切
り換え機構を持つため、装置が大型にならないという効
果がある。As described above, the present invention provides a switching mechanism equipped with a plurality of X-ray sources and arranging a desired X-ray source from the X-ray sources at a predetermined position with a control device. Since it is configured to have it, there is an effect that the time and effort for exchanging the X-ray source can be greatly reduced, operability is improved, and a simple switching mechanism is provided, so that the device does not become large.
【図１】本発明の実施例による全反射蛍光Ｘ線装置の概
略を示した説明図である。FIG. 1 is an explanatory view schematically showing a total reflection fluorescent X-ray apparatus according to an embodiment of the present invention.
【図２】本発明の実施例による全反射蛍光Ｘ線装置で用
いられる回転駆動機構の概略を示した説明図である。FIG. 2 is an explanatory view showing an outline of a rotation drive mechanism used in the total reflection X-ray fluorescence device according to the embodiment of the present invention.
【図３】従来の全反射蛍光Ｘ線装置の説明図である。FIG. 3 is an explanatory diagram of a conventional total reflection fluorescent X-ray device.
１ 直線駆動機構 ２ スリット ３ Ｘ線分光手段 ４ 試料 ５ 試料支持体 ６ 位置ぎめテーブル ７ 制御装置 ８ Ｘ線検出器 ９ 回転駆動機構 １１、１２、１３、２１、２２、２３ Ｘ線源 1 linear drive mechanism 2 slits 3 X-ray spectroscopic means 4 sample 5 sample support 6 positioning table 7 controller 8 X-ray detector 9 rotary drive mechanism 11, 12, 13, 21, 22, 23 X-ray source
Claims (1)
射する表面を有した部材と、前記部材の表面近傍に位置
する試料から発生する蛍光Ｘ線を検出する検出器と、Ｘ
線源から放射されたＸ線を分光して前記部材の表面に微
小の角度をもって入射する分光手段と、これら部材の相
対的位置を制御する制御装置とからなる全反射蛍光Ｘ線
分析装置において、前記Ｘ線源は複数個のＸ線源からな
り、前記複数のＸ線源の中から使用するＸ線源を切り換
える切り換え装置と、前記切り換え装置を制御する制御
装置とを有することを特徴とする全反射蛍光Ｘ線分析装
置。1. A member having a surface for totally reflecting X-rays incident at a minute angle, a detector for detecting fluorescent X-rays generated from a sample located near the surface of the member, and X.
In a total reflection X-ray fluorescence analyzer comprising a spectroscopic means for separating X-rays radiated from a radiation source and incident on the surface of the member at a minute angle, and a controller for controlling the relative position of these members, The X-ray source includes a plurality of X-ray sources, and has a switching device that switches an X-ray source to be used from among the plurality of X-ray sources, and a control device that controls the switching device. Total reflection X-ray fluorescence analyzer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6226193A JPH06273359A (en) | 1993-03-22 | 1993-03-22 | Total reflection fluorescent x-ray analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6226193A JPH06273359A (en) | 1993-03-22 | 1993-03-22 | Total reflection fluorescent x-ray analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06273359A true JPH06273359A (en) | 1994-09-30 |
Family
ID=13195035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6226193A Pending JPH06273359A (en) | 1993-03-22 | 1993-03-22 | Total reflection fluorescent x-ray analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06273359A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08334480A (en) * | 1995-06-07 | 1996-12-17 | Sony Corp | X-ray fluorescence analytical device |
| JP2002148225A (en) * | 2000-11-14 | 2002-05-22 | Kazuo Taniguchi | Apparatus and method for x-ray analysis |
| JP2002357572A (en) * | 2001-05-31 | 2002-12-13 | Rigaku Industrial Co | Fluorescent x-ray analysis apparatus |
-
1993
- 1993-03-22 JP JP6226193A patent/JPH06273359A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08334480A (en) * | 1995-06-07 | 1996-12-17 | Sony Corp | X-ray fluorescence analytical device |
| JP2002148225A (en) * | 2000-11-14 | 2002-05-22 | Kazuo Taniguchi | Apparatus and method for x-ray analysis |
| JP2002357572A (en) * | 2001-05-31 | 2002-12-13 | Rigaku Industrial Co | Fluorescent x-ray analysis apparatus |
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