JPH06260764A - Multilayer wiring board and manufacture thereof - Google Patents

Multilayer wiring board and manufacture thereof

Info

Publication number
JPH06260764A
JPH06260764A JP4114793A JP4114793A JPH06260764A JP H06260764 A JPH06260764 A JP H06260764A JP 4114793 A JP4114793 A JP 4114793A JP 4114793 A JP4114793 A JP 4114793A JP H06260764 A JPH06260764 A JP H06260764A
Authority
JP
Japan
Prior art keywords
wiring board
resin
multilayer wiring
base material
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4114793A
Other languages
Japanese (ja)
Inventor
Tomio Tanno
富男 淡野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP4114793A priority Critical patent/JPH06260764A/en
Publication of JPH06260764A publication Critical patent/JPH06260764A/en
Pending legal-status Critical Current

Links

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To provide a method of manufacturing a multilayer wiring board excellent in low halo properties. CONSTITUTION:A feature of a multilayer wiring board is that an outermost metal foil is provided through the intermediary of a resin layer onto the upside and/or underside of each of inner material layers which are formed as many sheets as required and each provided with a circuit, and the interposed resin- impregnated base material is cured as far as 90% or below in the degree of cure for the formation of a multilayer wiring board, and the feature of this wiring board manufacturing method is that a through-hole is made on the multilayer wiring board, a circuit is formed, then the resin-impregnated base material is fully cured, and then processes after a plating process are carried out.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子機器、電気機器、計
算器、通信機器等に用いられる多層配線基板、多層配線
板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer wiring board and a multilayer wiring board used in electronic equipment, electric equipment, calculators, communication equipment and the like.

【0002】[0002]

【従来の技術】近年、電気、電子機器の高信頼化対策と
して低ハロー性が要求されている。このため電気用積層
板の穴明け工程においては細心の注意が必要とされ、作
業能率を著しく低下させている。この対策として回路の
銅表面に酸化銅を形成させた後、還元する方法があり有
効であるが、処理工程が複雑となり工程管理が難しくコ
ストアップを招く欠点があった。
2. Description of the Related Art In recent years, a low halo property is required as a measure for improving reliability of electric and electronic equipment. For this reason, meticulous attention is required in the process of punching the electrical laminate, which significantly reduces the work efficiency. As a countermeasure, there is a method of forming copper oxide on the copper surface of the circuit and then reducing it, but it is effective, but it has a drawback that the process is complicated and the process control is difficult and the cost is increased.

【0003】[0003]

【発明が解決しようとする課題】従来の技術で述べたよ
うに、低ハロー性を良くするための従来方法は何れも困
難で作業能率を著しく低下させている。本発明は従来の
技術における上述の問題点に鑑みてなされたもので、そ
の目的とするところは作業能率を低下させることなく容
易に低ハロー性を実現させる多層配線基板、多層配線板
を提供することにある。
As described in the prior art, all the conventional methods for improving the low halo property are difficult and work efficiency is remarkably reduced. The present invention has been made in view of the above problems in the prior art, and an object of the present invention is to provide a multilayer wiring board and a multilayer wiring board that easily realize a low halo property without lowering work efficiency. Especially.

【0004】[0004]

【課題を解決するための手段】本発明は所要枚数の回路
形成した内層材の各上面及び又は各下面に樹脂層を介
し、最外層に金属箔を配設後、介入させた樹脂層の樹脂
硬化度が90%以下になるように硬化させたことを特徴
とする多層配線基板及び該多層配線基板に開穴、回路形
成後、完全硬化させてから鍍金以降の工程を施すことを
特徴とする多層配線板の製造方法のため、ドリル開穴時
のクラックを抑制し上記目的を達成することができたも
ので、以下本発明を詳細に説明する。
SUMMARY OF THE INVENTION According to the present invention, the resin of the resin layer intervened after the metal foil is disposed on the outermost layer through the resin layer on each upper surface and / or each lower surface of the inner layer material on which a required number of circuits are formed. A multilayer wiring board characterized by being cured to a degree of curing of 90% or less, and a method of forming a hole in the multilayer wiring board, forming a circuit, completely curing, and then performing a plating step and subsequent steps. Because of the method for manufacturing a multilayer wiring board, cracks at the time of drilling a hole can be suppressed and the above object can be achieved. The present invention will be described in detail below.

【0005】本発明に用いる内層材はフェノ−ル樹脂、
エポキシ樹脂、ポリイミド樹脂、不飽和ポリエステル樹
脂、ポリフェニレンオキサイド樹脂、フッ素樹脂等の樹
脂に必要に応じてタルク、クレー、シリカ、炭酸カルシ
ュウム、水酸化アルミニゥム、三酸化アンチモン、五酸
化アンチモン等の無機質粉末充填剤、ガラス繊維、アス
ベスト繊維、パルプ繊維、合成繊維、セラミック繊維等
の繊維質充填剤を添加したものである。基材としてはガ
ラス、アスベスト等の無機質繊維、ポリエステル、ポリ
アミド、ポリアクリル、ポリビニルアルコール、ポリイ
ミド、フッ素樹脂等の有機質繊維、木綿等の天然繊維の
織布、不織布、紙、マット等を用いることができる。基
材に対する含浸は同一の樹脂のみによる含浸でもよい
が、同系樹脂又は異系樹脂による1次含浸、2次含浸と
いうように含浸を複数にし、より含浸が均一になるよう
にすることもできる。かくして基材に樹脂を含浸、乾燥
して得た所要枚数の樹脂含浸基材の上面及び又は下面に
銅、アルミニュウム、真鍮、ニッケル、鉄等の単独、合
金、複合箔からなる金属箔を配設ー体化してなる電気用
積層板に回路形成して内層材を得るものである。内層材
の上面及び又は下面に配設される樹脂含浸基材としては
上記のような樹脂含浸基材をそのまま用いることがで
き、上記のような金属箔を最外層に配してから樹脂硬化
度が90%以下になるように硬化させるものである。樹
脂硬化度を90%以下にするには完全硬化に必要な成形
温度の95%以下の温度及び又は完全硬化に必要な成形
時間の45%以下の時間で硬化させることが必要で、か
くして低ハロー性に優れた多層配線基板を得るものであ
る。次に該多層配線基板にスルホール穴等を開穴、回路
形成後、アフターキュアーをおこない完全硬化させる。
完全硬化方法は樹脂硬化度を90%以下で止めた時の不
足分を充足すればよい。以降の作業は通常方法に従って
鍍金以降の工程を施し多層配線板を得るものである。
The inner layer material used in the present invention is phenol resin,
Inorganic powder filling such as talc, clay, silica, calcium carbonate, aluminum hydroxide, antimony trioxide, antimony pentoxide, etc. as needed for resins such as epoxy resin, polyimide resin, unsaturated polyester resin, polyphenylene oxide resin, fluororesin, etc. Agent, glass fiber, asbestos fiber, pulp fiber, synthetic fiber, ceramic fiber and other fibrous fillers are added. As the base material, it is possible to use glass, inorganic fibers such as asbestos, organic fibers such as polyester, polyamide, polyacrylic, polyvinyl alcohol, polyimide and fluororesin, woven cloth of natural fibers such as cotton, non-woven fabric, paper and mat. it can. The base material may be impregnated only with the same resin, but a plurality of impregnations such as primary impregnation with the same resin or different type resin and secondary impregnation may be performed to make the impregnation more uniform. Thus, a metal foil consisting of a single, alloy, or composite foil of copper, aluminum, brass, nickel, iron, etc. is provided on the upper and / or lower surface of the required number of resin-impregnated base materials obtained by impregnating the base material with resin and drying. An inner layer material is obtained by forming a circuit on a laminated electric board. As the resin-impregnated base material disposed on the upper surface and / or the lower surface of the inner layer material, the resin-impregnated base material as described above can be used as it is. Is 90% or less. In order to reduce the degree of resin curing to 90% or less, it is necessary to cure at a temperature of 95% or less of the molding temperature required for complete curing and / or a time of 45% or less of the molding time required for complete curing, and thus a low halo A multi-layer wiring board having excellent properties is obtained. Next, through holes are formed in the multilayer wiring board, and after forming a circuit, after-curing is performed to completely cure the wiring.
The complete curing method may satisfy the deficiency when the resin curing degree is stopped at 90% or less. Subsequent work is to obtain a multilayer wiring board by performing the steps after plating according to the usual method.

【0006】以下本発明を実施例に基づいて説明する。The present invention will be described below based on examples.

【0007】[0007]

【実施例1】エポキシ当量475のビスフェノ−ルA型
エポキシ樹脂100重量部(以下単に部と記す)に、ジ
シアンジアミド4部、ベンジルジメチルアルコール0.
2部、メチルオキシトール100部を添加したエポキシ
樹脂ワニスを、厚み0.018mmの平織ガラス布に乾
燥後樹脂付着量が45%になるように含浸、乾燥して樹
脂含浸基材を得た。次に該樹脂含浸基材4枚を重ねた上
下面に厚み0.018mmの銅箔を各々配設した積層体
を成形圧力40Kg/cm2 、170℃で90分間加熱
加圧成形して厚み0.9mmの両面銅張積層板を得た。
次に該積層板の上下面に回路形成してから両面に各々上
記と同じ樹脂含浸基材1枚を介してから厚み0.018
mmの銅箔を配設した積層体を成形圧力30Kg/cm
2 、160℃で45分間積層成形して介入させた樹脂含
浸基材の樹脂硬化度が85%の多層配線基板を得、該多
層配線基板2枚を重ね、65000rpm、送り25ミ
クロン/rpmでドリルマシンで開穴後、スルホール鍍
金をおこない多層配線板を得た。
Example 1 To 100 parts by weight of a bisphenol A type epoxy resin having an epoxy equivalent of 475 (hereinafter simply referred to as "part"), 4 parts of dicyandiamide and 0.
An epoxy resin varnish added with 2 parts and 100 parts of methyl oxytol was impregnated into a plain woven glass cloth having a thickness of 0.018 mm so that the resin adhesion amount was 45% after drying, and dried to obtain a resin-impregnated base material. Next, a laminate having copper foils each having a thickness of 0.018 mm arranged on the upper and lower surfaces of the four resin-impregnated base materials is heated and pressure-molded at 170 ° C. for 90 minutes at a molding pressure of 40 Kg / cm 2 , and a thickness of 0 is obtained. A double-sided copper-clad laminate having a size of 0.9 mm was obtained.
Next, a circuit is formed on the upper and lower surfaces of the laminated plate, and the same resin-impregnated base material as described above is interposed on both surfaces, and then a thickness of 0.018
Molding pressure is 30 kg / cm
2. A multilayer wiring board having a resin hardening degree of 85% of a resin-impregnated base material, which was formed by laminating at 160 ° C. for 45 minutes, was obtained, two of the multilayer wiring boards were stacked, and drilled at 65000 rpm at a feed rate of 25 μm / rpm. After making holes in the machine, through-hole plating was performed to obtain a multilayer wiring board.

【0008】[0008]

【実施例2】実施例1と同じ多層配線基板を実施例1と
同じ条件で開穴後、170℃で60分間アフターキュア
ーし樹脂含浸基材の樹脂硬化度が100%の多層配線基
板をスルホール鍍金して多層配線板を得た。
Example 2 The same multilayer wiring board as in Example 1 was opened under the same conditions as in Example 1, and after-cured at 170 ° C. for 60 minutes to through-hole the resin-impregnated base material with a resin curing degree of 100%. It was plated to obtain a multilayer wiring board.

【0009】[0009]

【比施例】2次成形時の成形条件を175℃で120分
間とし、樹脂含浸基材の硬化度を100%にした以外は
実施例1と同様に処理して多層配線基板、多層配線板を
得た。
Comparative Example A multilayer wiring board and a multilayer wiring board were processed in the same manner as in Example 1 except that the molding conditions at the time of secondary molding were 175 ° C. for 120 minutes and the curing degree of the resin-impregnated base material was 100%. Got

【0010】実施例1と2及び比較例の多層配線板のT
g、ハローイングサイズ、耐薬品性は表1のようであ
る。硬化度はDSCで評価し、ハローイングは外層プリ
プレグを引剥してハローイングの大きさを光学顕微鏡で
測定した。
T of the multilayer wiring boards of Examples 1 and 2 and Comparative Example
Table 1 shows g, halo size, and chemical resistance. The degree of cure was evaluated by DSC, and the halo was measured by peeling the outer layer prepreg and measuring the size of the halo with an optical microscope.

【0011】[0011]

【表1】 [Table 1]

【0012】[0012]

【発明の効果】本発明は上述した如く構成されている。
特許請求の範囲に記載した構成を有する多層配線基板、
多層配線板においては、低ハロー性で、本発明の優れて
いることを確認した。
The present invention is constructed as described above.
A multilayer wiring board having the configuration described in the claims,
It was confirmed that the multilayer wiring board had a low halo property and was excellent in the present invention.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】所要枚数の回路形成した内層材の各上面及
び又は各下面に樹脂層を介し、最外層に金属箔を配設
後、介入させた樹脂層の樹脂硬化度が90%以下になる
ように硬化させたことを特徴とする多層配線基板。
1. A resin curing degree of 90% or less of an intervening resin layer after a metal foil is disposed on the outermost layer through a resin layer on each upper surface and / or lower surface of an inner layer material having a required number of circuits formed therein. A multilayer wiring board characterized by being cured so that
【請求項2】層間絶縁接着層としての樹脂硬化度が90
%以下の多層配線基板に開穴、回路形成後、完全硬化さ
せてから鍍金以降の工程を施すことを特徴とする多層配
線板の製造方法。
2. The degree of cure of resin as an interlayer insulating adhesive layer is 90.
% Or less, a method for manufacturing a multi-layer wiring board, which comprises forming holes, forming a circuit, completely curing, and then performing a plating process and subsequent steps.
JP4114793A 1993-03-02 1993-03-02 Multilayer wiring board and manufacture thereof Pending JPH06260764A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4114793A JPH06260764A (en) 1993-03-02 1993-03-02 Multilayer wiring board and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4114793A JPH06260764A (en) 1993-03-02 1993-03-02 Multilayer wiring board and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH06260764A true JPH06260764A (en) 1994-09-16

Family

ID=12600310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4114793A Pending JPH06260764A (en) 1993-03-02 1993-03-02 Multilayer wiring board and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH06260764A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319764A (en) * 2001-04-23 2002-10-31 Fujitsu Ltd Multilayer printed wiring board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319764A (en) * 2001-04-23 2002-10-31 Fujitsu Ltd Multilayer printed wiring board

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