JPH06103572A - Device and method for producing magnetic recording medium - Google Patents

Device and method for producing magnetic recording medium

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Publication number
JPH06103572A
JPH06103572A JP25172792A JP25172792A JPH06103572A JP H06103572 A JPH06103572 A JP H06103572A JP 25172792 A JP25172792 A JP 25172792A JP 25172792 A JP25172792 A JP 25172792A JP H06103572 A JPH06103572 A JP H06103572A
Authority
JP
Japan
Prior art keywords
magnetic
film
recording medium
particles
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25172792A
Other languages
Japanese (ja)
Inventor
Osamu Yoshida
修 吉田
Noriyuki Kitaori
典之 北折
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Priority to JP25172792A priority Critical patent/JPH06103572A/en
Publication of JPH06103572A publication Critical patent/JPH06103572A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To increase the rate of film formation and to improve the bonding property of a magnetic film by arranging targets so that flying evaporated particles pass between the targets. CONSTITUTION:Evaporated particles of a magnetic alloy from a crucible 4 fly toward a polyethylene terephthalate film 11, pass through a sputtering atmospehre between Co-Ni targets 8a, 8b and deposit on the film 11. Sputtered magnetic particles reach the film 11 and also deposit on the film 11. Since particles generated by both vapor depositing and sputtering means deposit, a high rate of film formation is attained and the bonding property of a formed magnetic film is much more excellent than that of a film formed by a vapor depositing means. The objective magnetic recording medium excellent in profitableness and having high performance can be efficiently produced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気記録媒体の製造装
置及び製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium manufacturing apparatus and method.

【0002】[0002]

【発明の背景】磁気テープ等の磁気記録媒体において
は、高密度記録化の要請から、非磁性支持体上に設けら
れる磁性層として、バインダ樹脂を用いた塗布型のもの
ではなく、バインダ樹脂を用いない金属薄膜型のものが
提案されていることは周知の通りである。
BACKGROUND OF THE INVENTION In a magnetic recording medium such as a magnetic tape, due to a demand for high density recording, a binder resin is not used as a magnetic layer provided on a non-magnetic support, instead of a coating type using a binder resin. It is well known that a metal thin film type that is not used has been proposed.

【0003】すなわち、無電解メッキといった湿式メッ
キ手段、真空蒸着あるいはスパッタといった乾式メッキ
手段により磁性層を構成した磁気記録媒体が提案されて
いる。そして、この種の磁気記録媒体は磁性体の充填密
度が高いことから、高密度記録に適したものである。
尚、蒸着手段により磁性膜を構成する手段は、スパッタ
による場合よりも成膜速度が速いことから製造能率上か
らは好ましいものと言われている。
That is, there has been proposed a magnetic recording medium having a magnetic layer formed by a wet plating means such as electroless plating and a dry plating means such as vacuum deposition or sputtering. Since the magnetic recording medium of this type has a high packing density of magnetic material, it is suitable for high-density recording.
It is said that the means for forming the magnetic film by the vapor deposition means is preferable from the viewpoint of manufacturing efficiency because the film formation rate is higher than that by sputtering.

【0004】このような蒸着手段による磁気記録媒体の
製造装置は、図3のように構成されているものが一般的
である。尚、図3中、21は冷却キャン、22はポリエ
チレンテレフタレート(PET)フィルムの供給側ロー
ル、23はPETフィルムの巻取側ロール、24は遮蔽
板、25はルツボ、26はCo−Ni磁性合金、27は
電子銃、28は真空容器である。すなわち、真空容器2
8内を所定の真空度のものに排気した後、電子銃27を
作動させてルツボ25内の磁性合金26を蒸発させ、P
ETフィルムに対して磁性合金26を堆積(蒸着)させ
ることによって磁気記録媒体が製造されている。
An apparatus for manufacturing a magnetic recording medium by such a vapor deposition means is generally constructed as shown in FIG. In FIG. 3, 21 is a cooling can, 22 is a polyethylene terephthalate (PET) film supply side roll, 23 is a PET film winding side roll, 24 is a shielding plate, 25 is a crucible, and 26 is a Co-Ni magnetic alloy. 27 is an electron gun, and 28 is a vacuum container. That is, the vacuum container 2
After evacuating the inside of the crucible 8 to a predetermined vacuum degree, the electron gun 27 is operated to evaporate the magnetic alloy 26 in the crucible 25, and P
A magnetic recording medium is manufactured by depositing (evaporating) the magnetic alloy 26 on the ET film.

【0005】ところで、このようにして構成される磁性
膜は緻密性に欠け、磁性膜の結着性に問題が有ると言わ
れており、この為製造効率を犠牲にしてスパッタによる
手段が採用されていたりする。
By the way, it is said that the magnetic film thus constructed lacks in denseness and has a problem in the binding property of the magnetic film. Therefore, a method by sputtering is adopted at the sacrifice of manufacturing efficiency. I will go.

【0006】[0006]

【発明の開示】本発明の目的は、成膜速度がスパッタ手
段による場合の数倍以上も速く、かつ、成膜された磁性
膜の結着性は蒸着手段による場合よりも遙に優れた磁気
記録媒体の製造技術を提供することにある。この本発明
の目的は、容器に入れられた磁性材料を蒸発させ、基体
に堆積させることにより磁性膜を構成する磁気記録媒体
の製造装置であって、前記容器から前記基体に飛来する
蒸発粒子を挟む如くターゲットを配設したスパッタ手段
が設けられてなることを特徴とする磁気記録媒体の製造
装置によって達成される。
DISCLOSURE OF THE INVENTION It is an object of the present invention that the film formation rate is several times faster than that obtained by the sputtering means, and the cohesiveness of the formed magnetic film is far superior to that obtained by the vapor deposition means. It is to provide a manufacturing technique of a recording medium. An object of the present invention is an apparatus for producing a magnetic recording medium that forms a magnetic film by evaporating a magnetic material contained in a container and depositing the magnetic material on the substrate, and to evaporate particles that fly from the container to the substrate. This is achieved by an apparatus for manufacturing a magnetic recording medium, characterized in that a sputtering means in which a target is arranged so as to be sandwiched is provided.

【0007】又、容器に入れられた磁性材料からの蒸発
粒子とスパッタ手段によるスパッタ粒子を共に基体に堆
積させることにより磁性膜を構成する磁気記録媒体の製
造方法であって、前記容器から前記基体に飛来する蒸発
粒子をスパッタ雰囲気を飛来させ、スパッタ粒子と共に
基体に堆積させることを特徴とする磁気記録媒体の製造
方法によって達成される。
A method for manufacturing a magnetic recording medium in which a magnetic film is formed by depositing evaporated particles from a magnetic material placed in a container and sputtered particles by a sputtering means together on the substrate, This is achieved by a method for manufacturing a magnetic recording medium, characterized in that vaporized particles flying to the substrate are blown into a sputtering atmosphere and deposited on a substrate together with the sputtered particles.

【0008】以下、本発明について更に詳しく説明す
る。図1は磁気記録媒体の製造装置であり、1a,1b
はガイドロール、2はPETフィルム等の基板11の供
給側ロール、3はPETフィルム11の巻取側ロール、
4はルツボ、5はCo−Niなどの磁性金属、6は電子
銃、7a,7bは対向電極、8a,8bはCo−Niな
どの磁性金属からなる対向ターゲット、9はコイル、1
0は酸素ガス導入管であり、これらは真空雰囲気下に配
置されている。尚、ルツボ4内の磁性金属が蒸発し、基
板11に堆積する飛来行程をターゲット8aと8bとが
挟む如くになるようターゲットは配置されている。
The present invention will be described in more detail below. FIG. 1 shows a magnetic recording medium manufacturing apparatus including 1a and 1b.
Is a guide roll, 2 is a supply side roll of the substrate 11 made of PET film or the like, 3 is a take-up roll of the PET film 11,
4 is a crucible, 5 is a magnetic metal such as Co-Ni, 6 is an electron gun, 7a and 7b are counter electrodes, 8a and 8b are counter targets made of magnetic metal such as Co-Ni, 9 is a coil, 1
Reference numeral 0 denotes an oxygen gas introduction pipe, which are arranged in a vacuum atmosphere. The targets are arranged so that the magnetic metal in the crucible 4 evaporates and the flying stroke of deposition on the substrate 11 is sandwiched between the targets 8a and 8b.

【0009】そして、ルツボ4からの磁性合金が蒸発さ
せられ、この蒸発粒子はPETフィルム11に向かって
飛来する。この行程中において、スパッタ装置が作動し
ているから、ターゲット8aと8bとの間のスパッタ雰
囲気中を前記ルツボ4からの蒸発磁性粒子は通過する。
そして、スパッタ雰囲気中を通過した蒸発磁性粒子はP
ETフィルム11に到達し、堆積する。
Then, the magnetic alloy from the crucible 4 is vaporized, and the vaporized particles fly toward the PET film 11. During this process, since the sputtering apparatus is operating, the evaporated magnetic particles from the crucible 4 pass through the sputtering atmosphere between the targets 8a and 8b.
The evaporated magnetic particles that have passed through the sputtering atmosphere are P
The ET film 11 is reached and deposited.

【0010】この蒸着に際して、ターゲット8a,8b
からのスパッタ磁性粒子もPETフィルム11に到達
し、堆積する。すなわち、蒸発磁性粒子とスパッタ磁性
粒子との二種類の磁性粒子が混在した状態でPETフィ
ルム11に堆積するのである。このようにして成膜され
た磁性膜の成膜速度を考察してみると、蒸着手段とスパ
ッタ手段との双方からの粒子が堆積するものであるか
ら、スパッタ手段の場合に比べて10〜50倍程度も高
く、蒸着手段による場合と同程度の成膜速度で進行して
いるものであった。
At the time of this vapor deposition, the targets 8a, 8b
The sputtered magnetic particles from No. reach the PET film 11 and are deposited. That is, two kinds of magnetic particles, evaporative magnetic particles and sputtered magnetic particles, are deposited on the PET film 11 in a mixed state. Considering the film formation rate of the magnetic film formed in this manner, particles from both the vapor deposition means and the sputtering means are deposited, and therefore, 10 to 50 compared with the case of the sputtering means. It was about twice as high, and it was progressing at the same film formation rate as that by the vapor deposition means.

【0011】しかしながら、上記したように成膜された
磁性膜の構成粒子は蒸着手段によったものが10〜50
倍程度も多いにもかかわらず、成膜された磁性膜の特性
はスパッタ手段によって構成された磁性膜の特性と同程
度のものであり、蒸着手段によって構成された磁性膜の
緻密度と比べると遙に緻密なものとなっていた。この現
象、すなわち蒸着手段とスパッタ手段との双方が同時に
使用された場合、何故に双方の良い特徴のみが現出した
のかは、実に不思議なことであった。なぜならば、スパ
ッタ雰囲気を通過するに際して、蒸発粒子がスパッタ粒
子と衝突する確率は極めて小さく、有り得ること等ない
ように考えられるものであり、この為蒸発粒子がスパッ
タ雰囲気を通過したとしてもスパッタ粒子に変換される
とは夢想だに出来ないからである。
However, the constituent particles of the magnetic film formed as described above are 10 to 50 depending on the vapor deposition means.
The characteristics of the magnetic film formed are about the same as those of the magnetic film formed by the sputtering means, even though the number of times is twice as large, and compared with the density of the magnetic film formed by the evaporation means. It was much more detailed. It was truly mysterious why this phenomenon, that is, when both the vapor deposition means and the sputtering means were used at the same time, only the good features of both appeared. This is because the probability that the vaporized particles collide with the sputtered particles when passing through the sputter atmosphere is extremely small, and it is considered that there is no possibility that the vaporized particles will collide with the sputtered particles even if they pass through the sputter atmosphere. Because it cannot be a dream to be converted.

【0012】しかしながら、本発明者による実験によれ
ば、この有り得ないような現象が起き、成膜に関して双
方の良い特徴のみが発現し、成膜速度はスパッタ手段に
よる場合の数十倍も速く、かつ、成膜された磁性膜の結
着性は蒸着手段による場合よりも遙に優れた磁気記録媒
体が得られたのである。図2に本発明により得られた磁
気記録媒体の概略断面図を示す。
However, according to the experiments conducted by the present inventor, such an impossible phenomenon occurs, and only good characteristics of both are exhibited in the film formation, and the film formation rate is several tens of times faster than in the case of the sputtering means. In addition, a magnetic recording medium having a much better binding property of the formed magnetic film than that obtained by the vapor deposition means was obtained. FIG. 2 shows a schematic sectional view of the magnetic recording medium obtained by the present invention.

【0013】同図中、11は非磁性の基板であり、この
基板11はPET等のポリエステル、ポリアミド、ポリ
イミド、ポリスルフォン、ポリカーボネート、ポリプロ
ピレン等のオレフィン系の樹脂、セルロース系の樹脂、
塩化ビニル系の樹脂といった高分子材料、ガラスやセラ
ミック等の無機系材料、アルミニウム合金などの金属材
料が用いられる。
In the figure, 11 is a non-magnetic substrate, and this substrate 11 is made of polyester such as PET, polyamide, polyimide, polysulfone, polycarbonate, olefin resin such as polypropylene, cellulose resin,
Polymer materials such as vinyl chloride resins, inorganic materials such as glass and ceramics, and metal materials such as aluminum alloys are used.

【0014】基板11面上には磁性層の密着性を向上さ
せる為のアンダーコート層12が設けられている。すな
わち、表面の粗さを適度に粗すことにより蒸着・スパッ
タ法により構成される磁性層の密着性を向上させ、さら
に磁気記録媒体表面の表面粗さを適度なものとして走行
性を改善する為、例えばSiO2 等の粒子を含有させた
厚さが0.01〜0.5μmの塗膜を設けることによっ
てアンダーコート層12が構成されている。
An undercoat layer 12 for improving the adhesion of the magnetic layer is provided on the surface of the substrate 11. That is, in order to improve the adhesiveness of the magnetic layer formed by the vapor deposition / sputtering method by appropriately roughening the surface roughness, and further to improve the running property by making the surface roughness of the magnetic recording medium surface moderate. The undercoat layer 12 is formed by providing a coating film containing particles such as SiO 2 and having a thickness of 0.01 to 0.5 μm.

【0015】アンダーコート層12の上に、上記した蒸
着・スパッタ装置により金属薄膜型の磁性層13が設け
られる。例えば、10-4〜10-6Torr程度の真空雰
囲気下で強磁性金属材料が抵抗加熱、高周波加熱、電子
ビーム加熱などにより蒸発させられ、かつ、ターゲット
間に電圧が印加され、スパッタ粒子が形成され、これら
双方の粒子が基板11のアンダーコート層12面上に堆
積させられることにより、磁性層13が0.04〜1μ
m厚形成される。尚、より高い保磁力を得る為、基板に
対して蒸発粒子を斜めに蒸着させる斜め蒸着法によるこ
とが好ましい。
A metal thin film type magnetic layer 13 is provided on the undercoat layer 12 by the above-described vapor deposition / sputtering apparatus. For example, a ferromagnetic metal material is vaporized by resistance heating, high frequency heating, electron beam heating, etc. in a vacuum atmosphere of about 10 −4 to 10 −6 Torr, and a voltage is applied between targets to form sputtered particles. By depositing these particles on the surface of the undercoat layer 12 of the substrate 11, the magnetic layer 13 has a thickness of 0.04 to 1 μm.
m thickness is formed. In order to obtain a higher coercive force, it is preferable to use an oblique evaporation method in which evaporated particles are obliquely evaporated on the substrate.

【0016】磁性層13を構成する材料としては、例え
ばFe,Co,Ni等の金属の他に、Co−Ni合金、
Co−Pt合金、Co−Ni−Pt合金、Fe−Co合
金、Fe−Ni合金、Fe−Co−Ni合金、Fe−C
o−B合金、Co−Ni−Fe−B合金、Co−Cr合
金、あるいはこれらにAlやTa等の金属を含有させた
もの等が挙げられる。
As a material for forming the magnetic layer 13, for example, in addition to metals such as Fe, Co and Ni, a Co--Ni alloy,
Co-Pt alloy, Co-Ni-Pt alloy, Fe-Co alloy, Fe-Ni alloy, Fe-Co-Ni alloy, Fe-C
Examples thereof include o-B alloys, Co-Ni-Fe-B alloys, Co-Cr alloys, and alloys containing metals such as Al and Ta.

【0017】磁性層13の形成に際して、堆積部分に酸
素を供給し、強制酸化させることによって磁性層13の
表層部分を酸化させ、酸化膜による保護層14を形成す
る。尚、この酸化膜から構成される保護層14の厚さは
数十Å程度のものであり、この程度の厚さの酸化膜は自
然酸化で構成される場合もあり、このような時には強制
酸化の手段を講じなくても良い場合がある。
At the time of forming the magnetic layer 13, oxygen is supplied to the deposition portion and forced oxidation is performed to oxidize the surface layer portion of the magnetic layer 13 to form a protective layer 14 made of an oxide film. The thickness of the protective layer 14 composed of this oxide film is about several tens of liters, and an oxide film of this thickness may be composed of natural oxidation. It may not be necessary to take the measures of.

【0018】15は酸化膜からなる保護層14の上に設
けられた潤滑剤層である。すなわち、潤滑剤層15が、
潤滑剤を含有させた塗料を所定の手段で塗布することに
より、約5〜50Å、好ましくは約10〜30Å程度の
厚さ設けられる。16は、基板11の他面に設けられた
カーボンブラック等を含有させたバックコート層であ
る。
Reference numeral 15 is a lubricant layer provided on the protective layer 14 made of an oxide film. That is, the lubricant layer 15 is
By applying a coating material containing a lubricant by a predetermined means, a thickness of about 5 to 50Å, preferably about 10 to 30Å is provided. Reference numeral 16 is a back coat layer provided on the other surface of the substrate 11 and containing carbon black or the like.

【0019】以下、具体的な実施例を挙げて説明する。A specific example will be described below.

【0020】[0020]

【実施例】【Example】

〔実施例1〕図1に示される如くの真空蒸着・スパッタ
装置に厚さ9.3μmのPETフィルム11を装着し
た。そして、先ず、真空容器内を所定の真空度のものに
排気した後、電子銃6を作動させてルツボ4内の磁性金
属5を蒸発させ、ターゲット8aと8bとの間のスパッ
タ雰囲気中を通過させ、PETフィルム11に磁性金属
5を蒸着させると共に、ターゲット8a,8bからのス
パッタ磁性粒子をもPETフィルム11に堆積させる。
Example 1 A PET film 11 having a thickness of 9.3 μm was mounted on the vacuum vapor deposition / sputtering apparatus as shown in FIG. Then, first, after evacuating the inside of the vacuum container to a predetermined vacuum degree, the electron gun 6 is operated to evaporate the magnetic metal 5 in the crucible 4 and pass through the sputtering atmosphere between the targets 8a and 8b. Then, the magnetic metal 5 is vapor-deposited on the PET film 11, and the sputtered magnetic particles from the targets 8a and 8b are also deposited on the PET film 11.

【0021】すなわち、蒸発磁性粒子とスパッタ磁性粒
子との二種類の磁性粒子が混在した状態でPETフィル
ム11に堆積させ、1500Å厚の磁性膜を形成した。
そして、酸素ガス導入管10より酸素を供給し、磁性膜
の表面層を強制酸化させ、数十Å厚の酸化膜による表面
保護層を形成した。この後、テープを取り出し、平均粒
径20nmのカーボンブラック及び塩化ビニル系樹脂と
ウレタンプレポリマーとからなるバインダ樹脂を分散さ
せてなるバックコート用の塗料をダイレクトグラビア法
により磁性層とは反対側のPETフィルム11に塗布
し、乾燥厚さが0.5μmのバックコート層を設けた。
That is, two kinds of magnetic particles, evaporative magnetic particles and sputtered magnetic particles, were mixed and deposited on the PET film 11 to form a magnetic film having a thickness of 1500Å.
Then, oxygen was supplied from the oxygen gas introducing tube 10 to forcibly oxidize the surface layer of the magnetic film, and a surface protective layer made of an oxide film having a thickness of several tens of liters was formed. After that, the tape was taken out, and a backcoating paint prepared by dispersing carbon black having an average particle diameter of 20 nm and a binder resin composed of a vinyl chloride resin and a urethane prepolymer was applied on the side opposite to the magnetic layer by a direct gravure method. It was applied to PET film 11 to form a back coat layer having a dry thickness of 0.5 μm.

【0022】この後、フッ素パーフルオロポリエーテル
(グレード:FOMBLIN ZDIAC カルボキシ
ル基変性、日本モンテジソン社製)をフッ素不活性液体
(フロリナート、FC−84、住友スリーエム社製)に
0.1%となるように希釈・分散させた塗料をダイ塗工
方式により乾燥後の厚さが20Å程度となるように塗布
し、70℃で乾燥させた。
Thereafter, fluorine perfluoropolyether (grade: FOMBLIN ZDIAC carboxyl group-modified, manufactured by Nippon Montedison Co., Ltd.) was added to a fluorine-inert liquid (Fluorinert, FC-84, manufactured by Sumitomo 3M Co., Ltd.) so as to be 0.1%. The diluted and dispersed coating composition was applied by a die coating method so that the thickness after drying was about 20Å, and dried at 70 ° C.

【0023】この後、所定の幅にスリットし、図2に示
す如くの磁気テープを作製した。 〔比較例1〕実施例1の装置において、スパッタ装置の
部分は作動させず、蒸着装置の部分のみを作動させ、1
500Å厚の磁性膜を形成した。この後、同様に行い、
図2に示す如くの磁気テープを作製した。
After that, a magnetic tape as shown in FIG. 2 was produced by slitting it into a predetermined width. [Comparative Example 1] In the apparatus of Example 1, only the vapor deposition apparatus was operated without operating the sputtering apparatus.
A magnetic film having a thickness of 500Å was formed. After this, do the same,
A magnetic tape as shown in FIG. 2 was produced.

【0024】〔比較例2〕実施例1の装置において、蒸
着装置の部分は作動させず、スパッタ装置の部分のみを
作動させ、1500Å厚の磁性膜を形成した。この後、
同様に行い、図2に示す如くの磁気テープを作製した。 〔特性〕上記各例で得た磁気テープにおける磁性膜の成
膜に要した時間及び磁性膜の結着性を調べたので、その
結果を表1に示す。
[Comparative Example 2] In the apparatus of Example 1, the vapor deposition apparatus was not operated, and only the sputtering apparatus was operated to form a 1500 Å thick magnetic film. After this,
A magnetic tape as shown in FIG. 2 was produced in the same manner. [Characteristics] The time required for forming the magnetic film and the binding property of the magnetic film in the magnetic tapes obtained in each of the above examples were examined, and the results are shown in Table 1.

【0025】 表 1 成膜に要した時間 磁性膜の結着性 実施例1 10秒 35g重 比較例1 12秒 20g重 比較例2 143秒 45g重 *磁性膜の結着性は引っかき試験(引っかきの圧子に断
続的に荷重を増やし、磁性膜が剥離した時の荷重)によ
り評価したものである。
Table 1 Time required for film formation Binding property of magnetic film Example 1 10 seconds 35 g weight Comparative example 1 12 seconds 20 g weight Comparative example 2 143 seconds 45 g weight * Binding property of magnetic film was a scratch test (scratch test). The load is intermittently increased on the indenter and the load when the magnetic film is peeled off) is evaluated.

【0026】これによれば、本発明になるものは、成膜
速度がスパッタ手段による場合の十数倍も速く、かつ、
成膜された磁性膜の結着性は蒸着手段による場合よりも
遙に優れていることが判る。
According to this, according to the present invention, the film forming speed is ten times faster than that by the sputtering means, and
It can be seen that the binding property of the formed magnetic film is far superior to that obtained by the vapor deposition means.

【0027】[0027]

【効果】本発明によれば、低コストで高性能な磁気記録
媒体を効率良く提供できる。
According to the present invention, it is possible to efficiently provide a high-performance magnetic recording medium at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明になる磁気記録媒体の製造装置の一実施
例の概略説明図
FIG. 1 is a schematic explanatory view of an embodiment of an apparatus for manufacturing a magnetic recording medium according to the present invention.

【図2】本発明による磁気記録媒体の概略断面図FIG. 2 is a schematic sectional view of a magnetic recording medium according to the present invention.

【図3】従来の磁気記録媒体の製造装置の概略説明図FIG. 3 is a schematic explanatory diagram of a conventional magnetic recording medium manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1a,1b ガイドロール 2 供給側ロール 3 巻取側ロール 4 ルツボ 5 磁性合金 6 電子銃 7a,7b 対向電極 8a,8b 対向ターゲット 9 コイル 11 基板 1a, 1b Guide roll 2 Supply side roll 3 Winding side roll 4 Crucible 5 Magnetic alloy 6 Electron gun 7a, 7b Counter electrode 8a, 8b Counter target 9 Coil 11 Substrate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 容器に入れられた磁性材料を蒸発させ、
基体に堆積させることにより磁性膜を構成する磁気記録
媒体の製造装置であって、前記容器から前記基体に飛来
する蒸発粒子を挟む如くターゲットを配設したスパッタ
手段が設けられてなることを特徴とする磁気記録媒体の
製造装置。
1. Evaporating the magnetic material contained in a container,
An apparatus for manufacturing a magnetic recording medium having a magnetic film formed by depositing it on a substrate, comprising a sputtering means in which a target is arranged so as to sandwich evaporated particles flying from the container to the substrate. Device for manufacturing a magnetic recording medium.
【請求項2】 容器に入れられた磁性材料からの蒸発粒
子とスパッタ手段によるスパッタ粒子を共に基体に堆積
させることにより磁性膜を構成する磁気記録媒体の製造
方法であって、前記容器から前記基体に飛来する蒸発粒
子をスパッタ雰囲気を飛来させ、スパッタ粒子と共に基
体に堆積させることを特徴とする磁気記録媒体の製造方
法。
2. A method of manufacturing a magnetic recording medium, wherein a magnetic film is formed by depositing evaporated particles from a magnetic material contained in a container and sputtered particles by a sputtering means together on the substrate, the container comprising the substrate A method for manufacturing a magnetic recording medium, characterized in that vaporized particles flying to a substrate are blown into a sputtering atmosphere and deposited on a substrate together with the sputtered particles.
JP25172792A 1992-09-21 1992-09-21 Device and method for producing magnetic recording medium Pending JPH06103572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25172792A JPH06103572A (en) 1992-09-21 1992-09-21 Device and method for producing magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25172792A JPH06103572A (en) 1992-09-21 1992-09-21 Device and method for producing magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH06103572A true JPH06103572A (en) 1994-04-15

Family

ID=17227075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25172792A Pending JPH06103572A (en) 1992-09-21 1992-09-21 Device and method for producing magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH06103572A (en)

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