JPH0593809A - Color filter and production thereof - Google Patents
Color filter and production thereofInfo
- Publication number
- JPH0593809A JPH0593809A JP28051391A JP28051391A JPH0593809A JP H0593809 A JPH0593809 A JP H0593809A JP 28051391 A JP28051391 A JP 28051391A JP 28051391 A JP28051391 A JP 28051391A JP H0593809 A JPH0593809 A JP H0593809A
- Authority
- JP
- Japan
- Prior art keywords
- film
- parts
- smoothing
- edge portion
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、液晶、例えばスーパ
ー・ツイステッド・ネマティック液晶と組み合わせてカ
ラー表示装置を構成する場合等に用いられるカラーフィ
ルタとその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used when a liquid crystal, for example, a super twisted nematic liquid crystal is combined to form a color display device, and a manufacturing method thereof.
【０００２】[0002]
【従来の技術】液晶セルを構成する片側の基板内面に、
所定色の画素、例えば赤、緑、青の３色の画素を備えた
カラーフィルタを形成し、対向する２枚の基板間に液晶
層を挟持させたカラー表示装置は、例えば特開昭６１−
３１２２号公報等によって知られている。このようなカ
ラーフィルタにおいては、画素の保護と画素形成部の平
滑化のために平滑化膜が設けられている。この平滑化膜
には一般にアクリル系、ポリイミド系、エポキシ系等の
高分子樹脂が使用されるが、基板全面に平滑化膜が形成
される場合と感光性樹脂等を用いてフォトリソグラフィ
の技術により表示部のみを覆うようなパターニングで平
滑化膜が形成される場合がある。2. Description of the Related Art On one inner surface of a substrate which constitutes a liquid crystal cell,
A color display device in which a color filter having pixels of a predetermined color, for example, pixels of three colors of red, green, and blue is formed and a liquid crystal layer is sandwiched between two substrates facing each other is disclosed in, for example, Japanese Patent Laid-Open No. 61-
It is known from Japanese Patent No. 3122. In such a color filter, a smoothing film is provided to protect the pixels and smooth the pixel formation portion. Generally, polymer resins such as acrylic, polyimide, and epoxy resins are used for this smoothing film. However, when a smoothing film is formed on the entire surface of the substrate and by photolithography technology using a photosensitive resin, etc. The smoothing film may be formed by patterning so as to cover only the display portion.
【０００３】後者の表示部のみを覆うパターニングの場
合には、現像時における現像液の染み込みに起因するめ
くれによって平滑化膜のエッジ部が鋭い断面形状になり
やすい。図４はこの状態を例示したもので、１は基板、
２は画素、３は平滑化膜、３ａは上方に盛り上がった部
分を有するエッジ部である。平滑化膜３の上面には後工
程で透明導電膜４が形成されるが、鋭い形状のエッジ部
３ａのためにこれを覆う部分４ａに無理な力が加わりや
すくなり、またステップカバレッジがよくない場合には
平滑化膜３の端面に沿う立ち下がり部が薄くなる。この
ため、部分４ａで断線しやすくなり、信頼性を低下させ
る結果となっていた。In the latter case of patterning covering only the display portion, the edge portion of the smoothing film is likely to have a sharp cross-sectional shape due to the curling due to the permeation of the developing solution during development. FIG. 4 exemplifies this state, where 1 is a substrate,
Reference numeral 2 is a pixel, 3 is a smoothing film, and 3a is an edge portion having a raised portion. The transparent conductive film 4 is formed on the upper surface of the smoothing film 3 in a later step, but due to the sharp edge portion 3a, it is easy to apply an unreasonable force to the portion 4a covering the edge portion 3a, and the step coverage is not good. In this case, the falling portion along the end surface of the smoothing film 3 becomes thin. Therefore, the wire breakage is likely to occur at the portion 4a, resulting in a decrease in reliability.
【０００４】[0004]
【発明が解決しようとする課題】この発明はこのような
問題点に着目し、平滑化膜のエッジ部での透明導電膜の
断線をなくすことを課題としてなされたものである。SUMMARY OF THE INVENTION The present invention has been made in view of these problems, and an object thereof is to eliminate the disconnection of the transparent conductive film at the edge portion of the smoothing film.
【０００５】[0005]
【課題を解決するための手段】上述の課題を解決するた
めに、この発明のカラーフィルタは、平滑化膜のエッジ
部を次第に膜厚が減少する断面形状で形成している。ま
た、この発明のカラーフィルタの製造方法は、縁部での
紫外線透過率が次第に変化する遮光膜をフォトマスクに
形成し、このフォトマスクを使用して平滑化膜形成のた
めの露光処理を行うことにより、平滑化膜のエッジ部を
上記のような次第に膜厚が減少する断面形状で形成する
ようにしている。更に、平滑化膜形成のための露光処理
を行う際に、フォトマスクの遮光膜縁部における紫外線
の広がりを利用して平滑化膜のエッジ部の露光量を次第
に変化させることによっても、平滑化膜のエッジ部を上
記のような断面形状で形成することができる。In order to solve the above problems, in the color filter of the present invention, the edge portion of the smoothing film is formed in a cross-sectional shape in which the film thickness gradually decreases. Further, in the method for manufacturing a color filter of the present invention, a light-shielding film whose ultraviolet transmittance at the edges gradually changes is formed on a photomask, and the photomask is used to perform an exposure process for forming a smoothing film. As a result, the edge portion of the smoothing film is formed in the cross-sectional shape in which the film thickness gradually decreases as described above. Further, when performing the exposure process for forming the smoothing film, the spread of the ultraviolet rays at the edge of the light shielding film of the photomask is used to gradually change the exposure amount of the edge of the smoothing film to smooth the film. The edge portion of the film can be formed with the cross-sectional shape as described above.
【０００６】[0006]
【作用】平滑化膜のエッジ部の膜厚が次第に減少するの
で図４のような鋭い形状にならず、平滑化膜の上面に形
成される透明導電膜も平滑化膜の形状に沿った形状とな
って断線が生じにくくなる。また、フォトマスクの遮光
膜縁部での紫外線透過率に応じて露光処理の際の露光量
が次第に変化し、転写精度が低下したのと同様な結果と
なって膜厚が次第に減少する形状で平滑化膜のエッジ部
が形成される。更に、フォトマスクの遮光膜縁部で紫外
線が広がることにより、転写精度が低下したのと同様な
結果となって膜厚が次第に減少する形状で平滑化膜のエ
ッジ部が形成される。Since the film thickness of the edge portion of the smoothing film is gradually reduced, the shape is not sharp as shown in FIG. 4, and the transparent conductive film formed on the upper surface of the smoothing film also has a shape conforming to the shape of the smoothing film. Is less likely to cause disconnection. In addition, the exposure amount during the exposure process gradually changes according to the ultraviolet transmittance at the edge of the light-shielding film of the photomask, and the same result as when the transfer accuracy is lowered is obtained. An edge portion of the smoothing film is formed. Further, since the ultraviolet rays spread at the edge of the light shielding film of the photomask, the same result as that of the transfer accuracy is lowered, and the edge portion of the smoothing film is formed in a shape in which the film thickness is gradually reduced.
【０００７】[0007]
【実施例】次に、図示の実施例について説明する。図１
は一実施例の断面図である。図において、１は基板、２
は画素、３は平滑化膜であることは図４と同様である
が、平滑化膜３のエッジ部３ｂは、その断面形状が図４
のエッジ部３ａのような鋭い形状ではなく膜厚が勾配を
持ってなだらかに減少する形状となっている。このた
め、平滑化膜３の上面に透明導電膜４が形成された場合
にエッジ部３ｂを覆う部分４ｂもなだらかなものとなっ
て、この部分に無理な力が加わることがなくなり、また
鋭い立ち下がり形状とならないためにステップカバレッ
ジに関しても有利に作用して部分４ｂを所定の厚さで形
成することが容易となり、この部分での断線が生じにく
くなって信頼性が向上されるのである。なお、エッジ部
３ｂの傾斜は４５°程度以下とすることが望ましい。EXAMPLES Next, the illustrated examples will be described. Figure 1
FIG. 4 is a cross-sectional view of an example. In the figure, 1 is a substrate, 2
4 is the same as FIG. 4 in that the pixel 3 is a smoothing film, but the edge portion 3b of the smoothing film 3 has a cross-sectional shape shown in FIG.
The edge portion 3a does not have a sharp shape, but has a shape in which the film thickness gradually decreases with a gradient. Therefore, when the transparent conductive film 4 is formed on the upper surface of the smoothing film 3, the portion 4b that covers the edge portion 3b also becomes gentle, and no excessive force is applied to this portion, and a sharp rise occurs. Since it does not have a downward shape, it also has an advantageous effect on step coverage, making it easy to form the portion 4b with a predetermined thickness, making it difficult for disconnection to occur at this portion, and improving reliability. In addition, it is desirable that the inclination of the edge portion 3b be about 45 ° or less.
【０００８】図２は、縁部での紫外線透過率が次第に変
化する遮光膜を有するフォトマスクを使用して、図１に
示したような形状の平滑化膜を形成する製造方法の実施
例である。フォトマスクは図の(a)に示すように透明な
マスク基板１１に所定のパターンで遮光膜１２を形成し
たものであるが、この実施例では従来のように(a)の状
態のフォトマスクをそのまま露光処理に使用せず、遮光
膜１２の縁部を次のような処理によって紫外線透過率が
次第に変化するものにしている。すなわち、遮光膜１２
は例えばクロムの成膜によって形成されるが、この成膜
をパターンの幅を少しずつ変化させながら２回もしくは
数回に分けて行うのであり、これにより遮光膜１２の縁
部１２ａは膜厚が順次薄くなる。図の(b)は(a)のものに
更に成膜を１回実施したものであって、２回目の成膜に
よる薄い縁部１２ａが形成されている。なお、成膜回数
を多くすれば縁部１２ａの膜厚の変化はよりなだらかな
ものとなる。また、各回の成膜は同じ材料で行う必要は
なく、クロム以外の金属酸化物、金属ふっ化物等の薄膜
を成膜することによっても同様な縁部１２ａを形成する
ことができる。FIG. 2 shows an embodiment of a manufacturing method for forming a smoothing film having a shape as shown in FIG. 1 by using a photomask having a light-shielding film whose ultraviolet ray transmittance at the edges gradually changes. is there. The photomask is formed by forming a light shielding film 12 in a predetermined pattern on a transparent mask substrate 11 as shown in (a) of the figure. In this embodiment, the photomask in the state of (a) is conventionally used. Instead of being used as it is for the exposure process, the ultraviolet transmittance is gradually changed at the edge of the light shielding film 12 by the following process. That is, the light shielding film 12
Is formed by, for example, forming a chromium film, but this film formation is performed twice or several times while changing the width of the pattern little by little, whereby the edge portion 12a of the light shielding film 12 has a film thickness of It gradually becomes thinner. (B) of the figure shows that the film of (a) is further formed once, and a thin edge portion 12a is formed by the second film formation. It should be noted that if the number of times of film formation is increased, the change in the film thickness of the edge portion 12a becomes more gradual. Further, it is not necessary to perform the film formation for each time with the same material, and the same edge portion 12a can be formed by forming a thin film of a metal oxide other than chromium, a metal fluoride, or the like.
【０００９】露光処理は図の(b)に示すフォトマスク１
３を使用して行われる。すなわち、(c)に示すように画
素(図示せず)を形成してその上に平滑化膜形成用の例え
ば感光性樹脂５を塗布した基板１にフォトマスク１３を
重ね、紫外線を当てて遮光膜１２で覆われている部分以
外を感光させる。次いで基板１を現像して感光性樹脂５
の感光した部分を除去し、残った部分を平滑化膜３とす
るのであるが、縁部１２ａに対応する部分は遮光膜１２
のない部分よりも露光量が小さいので現像によって完全
には除去されず、図の(d)に示すように平滑化膜３のエ
ッジ部３ｂは膜厚が段階的に減少した形状となるのであ
る。The exposure process is performed by the photomask 1 shown in FIG.
3 is used. That is, as shown in (c), a pixel (not shown) is formed and a photomask 13 is superposed on the substrate 1 on which a smoothing film forming photosensitive resin 5 is applied, for example, and a photomask 13 is applied to block the light. The portion other than the portion covered with the film 12 is exposed to light. Next, the substrate 1 is developed to develop the photosensitive resin 5
The exposed portion is removed and the remaining portion is used as the smoothing film 3. However, the portion corresponding to the edge portion 12a is the light shielding film 12.
Since the exposure amount is smaller than that of the non-exposed portion, it is not completely removed by the development, and the edge portion 3b of the smoothing film 3 has a shape in which the film thickness is gradually reduced as shown in FIG. ..
【００１０】以後、透明導電膜の形成その他の所定の工
程を経てカラーフィルタが完成されるのであり、透明導
電膜が平滑化膜３のエッジ部３ｂを覆う部分もなだらか
な形状となって断線が生じにくくなるのである。なお、
フォトリソグラフィの技術においては、転写精度を向上
するためにマスクと被露光物との間隔、すなわちプロキ
シミティ量を通常１００μm以下にしているが、この間
隔を若干大きくすることにより転写精度が低下したのと
同様な結果が得られ、遮光膜１２の縁部１２ａに紫外線
が干渉して生ずる回折により平滑化膜３のエッジ部３ｂ
の膜厚は図のように角が取れてなだらかなものとなる。After that, the color filter is completed through the formation of the transparent conductive film and other predetermined steps, so that the transparent conductive film covers the edge portion 3b of the smoothing film 3 in a gentle shape to cause disconnection. It is less likely to occur. In addition,
In the photolithography technique, the distance between the mask and the object to be exposed, that is, the proximity amount is usually set to 100 μm or less in order to improve the transfer accuracy, but the transfer accuracy is lowered by slightly increasing the distance. The same result is obtained, and the edge portion 3b of the smoothing film 3 is diffracted by the diffraction caused by the interference of the ultraviolet rays with the edge portion 12a of the light shielding film 12.
As shown in the figure, the film thickness is smooth with a sharp edge.
【００１１】図３は、上記の回折現象等によってフォト
マスクの遮光膜縁部で紫外線が広がることを積極的に利
用した製造方法の実施例である。この実施例では図２の
(a)に相当するフォトマスク１４が使用されるが、ここ
ではフォトマスク１４の向きを逆にして遮光膜１２を紫
外線の光源側に向けて配置している。従って、プロキシ
ミティ量は通常よりも大きくなって遮光膜１２の縁部で
生ずる回折現象の影響が拡大され、更に紫外線は遮光膜
１２を過ぎた後にマスク基板１１を通過して若干散乱さ
れるので、遮光膜１２の縁部に対応する部分の露光量は
勾配を持ったものとなり、現像によって完全には除去さ
れず、図の(b)に示すように平滑化膜３のエッジ部３ｂ
は膜厚がなだらかに減少した形状となるのである。以
後、透明導電膜の形成その他の所定の工程を経てカラー
フィルタが完成される。FIG. 3 shows an embodiment of a manufacturing method which positively utilizes the fact that ultraviolet rays spread at the edge of the light-shielding film of the photomask due to the above-mentioned diffraction phenomenon and the like. In this embodiment, as shown in FIG.
Although the photomask 14 corresponding to (a) is used, here, the direction of the photomask 14 is reversed and the light shielding film 12 is arranged toward the light source side of the ultraviolet rays. Therefore, the proximity amount becomes larger than usual and the influence of the diffraction phenomenon generated at the edge of the light shielding film 12 is magnified, and the ultraviolet rays pass through the light shielding film 12 and then pass through the mask substrate 11 to be slightly scattered. The exposure amount of the portion corresponding to the edge of the light-shielding film 12 has a gradient and is not completely removed by the development, and the edge portion 3b of the smoothing film 3 is removed as shown in FIG.
Has a shape in which the film thickness is gently reduced. After that, the color filter is completed through the formation of the transparent conductive film and other predetermined steps.
【００１２】なお、図２以下の実施例では平滑化膜形成
用材料としてポジタイプの感光性樹脂を使用した説明と
なっているが、材料がネガタイプの場合には遮光膜の位
置が逆になるだけであり、同様な工程によってエッジ部
の膜厚が勾配を持って次第に減少する形状の平滑化膜を
得ることができる。In the embodiments shown in FIG. 2 and later, the positive type photosensitive resin is used as the material for forming the smoothing film, but when the material is the negative type, the position of the light shielding film is simply reversed. By the same process, it is possible to obtain a smoothing film having a shape in which the film thickness of the edge portion gradually decreases with a gradient.
【００１３】[0013]
【発明の効果】上述の実施例から明らかなように、この
発明のカラーフィルタは、平滑化膜のエッジ部を次第に
膜厚が減少する断面形状で形成したものである。従っ
て、平滑化膜のエッジ部が鋭い形状にならず、透明導電
膜もこの平滑化膜の形状に沿って形成されるので、透明
導電膜の断線が発生しにくくなり、信頼性が向上され
る。また、透明導電膜成膜の際のステップカバレッジも
良好となってエッジ部で所定の膜厚を確保することが容
易となり、断線防止に有効であると共に使用時における
電圧降下を小さくして表示品質が向上される利点もあ
る。As is apparent from the above-described embodiments, the color filter of the present invention is formed by forming the edge portion of the smoothing film in a sectional shape in which the film thickness gradually decreases. Therefore, the edge portion of the smoothing film does not have a sharp shape, and the transparent conductive film is also formed along the shape of the smoothing film, so that disconnection of the transparent conductive film is less likely to occur and reliability is improved. .. In addition, the step coverage during the formation of the transparent conductive film becomes good, and it becomes easy to secure a predetermined film thickness at the edge part, which is effective in preventing disconnection and reduces the voltage drop during use to reduce the display quality. Is also improved.
【００１４】また、この発明のカラーフィルタの製造方
法は、縁部での紫外線透過率が次第に変化する遮光膜を
フォトマスクに形成し、このフォトマスクを使用して平
滑化膜形成のための露光処理を行い、あるいは遮光膜縁
部での紫外線の広がりを利用して平滑化膜のエッジ部の
露光量を次第に変化する状態として露光処理を行うよう
にしたものである。従って、平滑化膜のエッジ部を上記
のような断面形状で形成することができ、透明導電膜の
断線が発生しにくいカラーフィルタを得ることができ
る。Further, according to the method of manufacturing a color filter of the present invention, a light-shielding film whose ultraviolet transmittance at the edges gradually changes is formed on a photomask, and the photomask is used to perform exposure for forming a smoothing film. The exposure process is performed such that the exposure amount is gradually changed by utilizing the spread of ultraviolet rays at the edge of the light shielding film. Therefore, the edge portion of the smoothing film can be formed in the cross-sectional shape as described above, and a color filter in which disconnection of the transparent conductive film is unlikely to occur can be obtained.
【図１】この発明のカラーフィルタの一実施例の断面図
である。FIG. 1 is a sectional view of an embodiment of a color filter of the present invention.
【図２】この発明のカラーフィルタの製造方法の一実施
例の工程説明図である。2A to 2D are process explanatory views of an embodiment of the color filter manufacturing method of the invention.
【図３】この発明のカラーフィルタの製造方法の他の実
施例の工程説明図である。FIG. 3 is a process drawing of another embodiment of the color filter manufacturing method of the present invention.
【図４】従来のカラーフィルタの断面図である。FIG. 4 is a cross-sectional view of a conventional color filter.
１ 基板 ２ 画素 ３ 平滑化膜 ３ｂ エッジ部 ４ 透明導電膜 ５ 感光性樹脂 １１ マスク基板 １２ 遮光膜 １２ａ 縁部 １３，１４ フォトマスク 1 Substrate 2 Pixel 3 Smoothing film 3b Edge part 4 Transparent conductive film 5 Photosensitive resin 11 Mask substrate 12 Light-shielding film 12a Edge part 13, 14 Photomask
Claims (3)
に平滑化膜を設けた構造のカラーフィルタにおいて、平
滑化膜のエッジ部を次第に膜厚が減少する断面形状で形
成したことを特徴とするカラーフィルタ。1. A color filter having a structure in which pixels of a predetermined color are formed on a substrate and a smoothing film is provided thereon, and the edge portion of the smoothing film is formed in a cross-sectional shape in which the film thickness gradually decreases. Is a color filter.
遮光膜をフォトマスクに形成し、このフォトマスクを使
用して平滑化膜形成のための露光処理を行うことによ
り、平滑化膜のエッジ部を次第に膜厚が減少する断面形
状で形成することを特徴とするカラーフィルタの製造方
法。2. A smoothing film is formed by forming a light-shielding film having a gradually changing ultraviolet transmittance at an edge portion on a photomask and performing an exposure process for forming a smoothing film using this photomask. A method of manufacturing a color filter, wherein the edge portion is formed in a cross-sectional shape in which the film thickness is gradually reduced.
に、フォトマスクの遮光膜縁部における紫外線の広がり
を利用して平滑化膜のエッジ部の露光量を次第に変化す
る状態とすることにより、平滑化膜のエッジ部を次第に
膜厚が減少する断面形状で形成することを特徴とするカ
ラーフィルタの製造方法。3. When the exposure process for forming the smoothing film is performed, the exposure amount of the edge part of the smoothing film is gradually changed by utilizing the spread of ultraviolet rays at the edge part of the light shielding film of the photomask. As a result, the edge portion of the smoothing film is formed with a cross-sectional shape in which the film thickness is gradually reduced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28051391A JP3122498B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28051391A JP3122498B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0593809A true JPH0593809A (en) | 1993-04-16 |
| JP3122498B2 JP3122498B2 (en) | 2001-01-09 |
Family
ID=17626148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28051391A Expired - Fee Related JP3122498B2 (en) | 1991-09-30 | 1991-09-30 | Manufacturing method of color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3122498B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002207116A (en) * | 2001-01-10 | 2002-07-26 | Seiko Epson Corp | Color filter substrate, method for producing the same and liquid crystal device |
| JP2005099266A (en) * | 2003-09-24 | 2005-04-14 | Dainippon Printing Co Ltd | Phase difference control substrate and display |
| JP2006201433A (en) * | 2005-01-20 | 2006-08-03 | Toppan Printing Co Ltd | Method of manufacturing color filter for semi-transmissive liquid crystal display device and color filter for semi-transmissive liquid crystal display device |
-
1991
- 1991-09-30 JP JP28051391A patent/JP3122498B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002207116A (en) * | 2001-01-10 | 2002-07-26 | Seiko Epson Corp | Color filter substrate, method for producing the same and liquid crystal device |
| JP2005099266A (en) * | 2003-09-24 | 2005-04-14 | Dainippon Printing Co Ltd | Phase difference control substrate and display |
| JP2006201433A (en) * | 2005-01-20 | 2006-08-03 | Toppan Printing Co Ltd | Method of manufacturing color filter for semi-transmissive liquid crystal display device and color filter for semi-transmissive liquid crystal display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3122498B2 (en) | 2001-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |