JPH05339710A - Method for vacuum vapor deposition and device therefor - Google Patents

Method for vacuum vapor deposition and device therefor

Info

Publication number
JPH05339710A
JPH05339710A JP4170198A JP17019892A JPH05339710A JP H05339710 A JPH05339710 A JP H05339710A JP 4170198 A JP4170198 A JP 4170198A JP 17019892 A JP17019892 A JP 17019892A JP H05339710 A JPH05339710 A JP H05339710A
Authority
JP
Japan
Prior art keywords
vapor deposition
boat
vacuum
shield plate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4170198A
Other languages
Japanese (ja)
Inventor
Toru Endo
亨 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Denshi KK
Original Assignee
Hitachi Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Denshi KK filed Critical Hitachi Denshi KK
Priority to JP4170198A priority Critical patent/JPH05339710A/en
Publication of JPH05339710A publication Critical patent/JPH05339710A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent fine impurity defects intruding in a vapor deposition film during vacuum vapor deposition of material having high melting point. CONSTITUTION:Vapor deposition is performed by using a fine powder of vacuum vapor deposition material, boat 2 to prevent splashing, and shielding plate 1 near the boat 2. The device consists of the vapor deposition boat 2 to hold and heat the vapor deposition material, shielding plate 1 having an aperture to pass the vapor deposition material and provided on the upper part of the vapor deposition boat, and a cover 4 to hold the shielding plate 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高融点物質の真空加熱
蒸着において不純物の蒸着を防止する真空蒸着方法に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum vapor deposition method for preventing vapor deposition of impurities in vacuum vapor deposition of high melting point substances.

【0002】[0002]

【従来の技術】従来の真空加熱蒸着方法で一般的な方法
は、蒸着物質をタングステンまたはモリブデン等の材質
で加工したボートに入れて、このボートを通電加熱して
蒸着する。ボートは、通電用の端子部に固定されてい
る。この状態で、蒸着面は、ボート全体と固定端子部に
対面している。この方法は、蒸着物質の融点が低い物質
の場合はボート部分中央が高温になるだけであり、事前
に高温処理して使用するボートでは、蒸着する物質以外
の不純物の蒸着は発生しない。しかし、高融点物質例え
ば酸化セリウム等の酸化物の蒸着では、ボートが高温に
なるだけではなく、ボート固定端子部分まで高温にな
る。この固定端子部分は、ステンレス等の板と固定ビス
でボート両端を固定するものである。また、蒸着毎にボ
ート取り替え作業があり、そのときに不純物が付着しや
すい。また、蒸着作業前にボートを通電加熱で高温処理
するがこの処理は、蒸着条件まで加熱することは、ボー
ト材質が劣化するためできない。以上から蒸着時には、
ボート固定端子部分も高温になりボート全体も処理条件
以上の高温になることから不純物の蒸着が発生する。こ
の不純物は、蒸着した膜に微細欠陥を発生させる問題が
あった。
2. Description of the Related Art In a conventional vacuum heating vapor deposition method, a vapor deposition material is placed in a boat made of a material such as tungsten or molybdenum, and the boat is electrically heated for vapor deposition. The boat is fixed to a terminal portion for energization. In this state, the vapor deposition surface faces the entire boat and the fixed terminal portion. In this method, when the vapor deposition material has a low melting point, only the center of the boat is heated to a high temperature, and in a boat which is used after being subjected to a high temperature treatment in advance, vapor deposition of impurities other than the vapor deposition material does not occur. However, in vapor deposition of a refractory substance, for example, an oxide such as cerium oxide, not only the temperature of the boat becomes high, but also the temperature of the boat fixed terminal portion becomes high. This fixed terminal portion is for fixing both ends of the boat with a plate such as stainless steel and fixing screws. Further, there is a boat replacement work every vapor deposition, and at that time, impurities are easily attached. Further, the boat is subjected to high temperature treatment by electric heating before the vapor deposition work, but this treatment cannot be performed up to the vapor deposition condition because the material of the boat deteriorates. From the above, during vapor deposition,
Since the boat fixed terminal portion also becomes high in temperature and the entire boat also becomes high temperature higher than the processing condition, the deposition of impurities occurs. This impurity has a problem of generating fine defects in the deposited film.

【0003】[0003]

【発明が解決しようとする課題】前述のように、ボート
固定端子部分まで、蒸着面に対応しているボート構造で
は、高融点物質の真空蒸着では蒸着膜に不純物を混入す
る問題がある。この問題点を改善しようとしたのが本発
明の目的である。
As described above, in the boat structure in which even the boat fixed terminal portion corresponds to the vapor deposition surface, there is a problem that impurities are mixed in the vapor deposition film in vacuum vapor deposition of the high melting point substance. It is an object of the present invention to try to remedy this problem.

【0004】[0004]

【課題を解決するための手段】本発明は、この問題点を
解決するために、ボート固定端子部、および蒸着前のボ
ート熱処理で高温処理ができないボートの両端が蒸着面
に対応しないように遮蔽板を設けて不純物の蒸着を防止
したものである。
SUMMARY OF THE INVENTION In order to solve this problem, the present invention shields a boat fixed terminal portion and both ends of a boat that cannot be subjected to high temperature heat treatment by boat heat treatment before vapor deposition so as not to correspond to the vapor deposition surface. A plate is provided to prevent the vapor deposition of impurities.

【0005】[0005]

【作用】ボート穴近辺以外のボート部分およびボート固
定端子部分が高温になり付着不純物が蒸発しても、真空
蒸着であるため、蒸着物質は直進し、この遮蔽板により
蒸着面に達しないことになる。
[Effect] Even if the boat portion and the boat fixing terminal portion other than the vicinity of the boat hole become hot and the adhered impurities evaporate, since the vapor deposition is vacuum vapor deposition, the vapor deposition material goes straight and does not reach the vapor deposition surface by the shielding plate. Become.

【0006】[0006]

【実施例】以下、本発明の一実施例を図1で説明する。
図1は、撮像管の面板を作成する工程における本発明の
実施例を示す図でボートと遮蔽板の位置関係を説明する
ものである。本発明の遮蔽板とボートの関係を説明する
と、図1のように遮蔽板の穴6がボートから蒸着物質が
出る穴5に近接して設置される。遮蔽板とボートの距離
と遮蔽板の穴6の寸法は必要蒸着面積で決める。たとえ
ば、このために、ボート部分およびボート固定端子部分
から付着不純物が蒸発しても、遮蔽板1により蒸着面7
に達しないことになる。したがって蒸着面には蒸着物質
のみが蒸着されることになる。1は本発明の遮蔽板であ
る。材質は例えば、洗浄、処理がしやすいステンレス材
で作成する。場合によっては石英板でも可能である。2
は通電加熱ボートである。このボートは、蒸着物質の微
粉末およびスプラッシュを防止するために、穴加工した
ボートカバーを使用する構造のボートである。また、蒸
着物質が出る穴をボートカバーの中央に一つ開けた物が
最上部に来る組み合わせのボートを使用する。3がボー
トに加熱用電流を通電するためとボートの固定を兼ねた
端子部分である。4は側面のカバーで遮蔽板1を保持す
るためと蒸着装置内に広く蒸着物質が付着しないように
カバーする目的の金属円筒治具である。7は撮像管面板
の蒸着面である。なお、ボート2の蒸着物質が出る穴の
径と遮蔽板1の穴の径およびボート遮蔽板の距離は必要
な蒸着面積から決める。この構成でボートを加熱して行
くと、ボート内の蒸着物が蒸気状になり、ボートカバー
を通過して穴5から上部に蒸着されて行く。この蒸着物
質は遮蔽板1の穴6の大きさで制限をうける。この穴6
の径と、ボート2と遮蔽板1の距離は、蒸着面7の面積
で決める。この面積は図1の矢印の範囲を考えて決めて
行く。本発明は、高融点物質の真空蒸着における不純物
混入防止改善を主体としているが、低融点物質の真空加
熱蒸着において、蒸着面の温度上昇が制限される場合の
ボート温度を遮蔽する手段にも使用が可能である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIG.
FIG. 1 is a diagram showing an embodiment of the present invention in a process of forming a face plate of an image pickup tube, and is for explaining a positional relationship between a boat and a shield plate. The relationship between the shield plate and the boat of the present invention will be described. As shown in FIG. 1, the hole 6 of the shield plate is installed in the vicinity of the hole 5 through which the vapor deposition material is discharged from the boat. The distance between the shielding plate and the boat and the size of the hole 6 in the shielding plate are determined by the required vapor deposition area. For example, for this reason, even if adhered impurities evaporate from the boat portion and the boat fixed terminal portion, the vapor deposition surface 7 is covered by the shield plate 1.
Will not be reached. Therefore, only the deposition material is deposited on the deposition surface. 1 is a shield plate of the present invention. The material is, for example, a stainless material that is easy to wash and process. In some cases, a quartz plate is also possible. Two
Is an electric heating boat. This boat has a structure in which a holed boat cover is used to prevent fine powder of the vapor deposition material and splash. In addition, a boat is used in which one hole is formed in the center of the boat cover, through which the vapor deposition material is released, and the top of the boat is the one that is opened. Reference numeral 3 is a terminal portion for supplying a heating current to the boat and also for fixing the boat. Reference numeral 4 denotes a metal cylindrical jig for holding the shield plate 1 by a side cover and for covering the vapor deposition apparatus widely so as not to deposit the vapor deposition material. 7 is a vapor deposition surface of the imaging tube face plate. The diameter of the hole through which the vapor deposition material of the boat 2 exits, the diameter of the hole of the shield plate 1 and the distance between the boat shield plate are determined from the required vapor deposition area. When the boat is heated with this configuration, the vapor deposition in the boat becomes vaporized, passes through the boat cover, and is vaporized from the hole 5 to the upper portion. This vapor deposition material is limited by the size of the holes 6 in the shield plate 1. This hole 6
And the distance between the boat 2 and the shield plate 1 are determined by the area of the vapor deposition surface 7. This area is decided by considering the range of the arrow in FIG. The present invention is mainly intended to improve the prevention of impurities from being mixed in the vacuum deposition of the high melting point substance, but is also used as a means for shielding the boat temperature when the temperature rise of the deposition surface is limited in the vacuum heating deposition of the low melting point substance. Is possible.

【0007】[0007]

【考案の効果】本発明を用いると、ボートを使用前に通
電加熱熱処理をした部分のみが蒸着面に対応することか
ら蒸着物質以外の不純物の混入が防止できて蒸着膜の微
細欠陥が減少して良品率を向上することができる。特に
撮像管の面板作成に応用すると大きな効果を有する。
EFFECTS OF THE INVENTION According to the present invention, since only the portion of the boat that has been heat-treated by heating before use corresponds to the vapor deposition surface, it is possible to prevent impurities other than the vapor deposition material from entering and reduce fine defects in the vapor deposition film. The rate of non-defective products can be improved. In particular, it has a great effect when applied to the production of a face plate of an image pickup tube.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例説明図。FIG. 1 is an explanatory diagram of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 本発明の遮蔽板 2 ボート 3 固定端子部分 5 ボート穴 6 遮蔽板穴 1 Shield Plate of the Present Invention 2 Boat 3 Fixed Terminal Part 5 Boat Hole 6 Shield Plate Hole

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 真空加熱蒸着において、蒸着ボートに近
接させて、必要蒸着面積を得る最少限の穴加工をした遮
蔽板を使用することを特徴とした真空蒸着方法。
1. A vacuum vapor deposition method characterized in that, in the vacuum heating vapor deposition, a shielding plate having a minimum number of holes for obtaining a required vapor deposition area is used in the vicinity of a vapor deposition boat.
【請求項2】 真空加熱蒸着において、蒸着物質を入
れ、これを加熱する蒸着ボートと、前記蒸着物質が通過
するための穴を有し、前記蒸着ボートの上部に設けた遮
蔽板と、該遮蔽板を保持するカバーより成る真空蒸着装
置。
2. In vacuum heating vapor deposition, a vapor deposition boat for containing a vapor deposition substance and heating the vapor deposition substance, a shield plate having a hole for allowing the vapor deposition substance to pass therethrough, and a shield plate provided on the vapor deposition boat, and the shield. A vacuum deposition device consisting of a cover that holds a plate.
JP4170198A 1992-06-04 1992-06-04 Method for vacuum vapor deposition and device therefor Pending JPH05339710A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4170198A JPH05339710A (en) 1992-06-04 1992-06-04 Method for vacuum vapor deposition and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4170198A JPH05339710A (en) 1992-06-04 1992-06-04 Method for vacuum vapor deposition and device therefor

Publications (1)

Publication Number Publication Date
JPH05339710A true JPH05339710A (en) 1993-12-21

Family

ID=15900492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4170198A Pending JPH05339710A (en) 1992-06-04 1992-06-04 Method for vacuum vapor deposition and device therefor

Country Status (1)

Country Link
JP (1) JPH05339710A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100889761B1 (en) * 2002-09-30 2009-03-24 삼성모바일디스플레이주식회사 Heating crucible for forming apparatus of organic thin film
KR101451082B1 (en) * 2012-10-30 2014-10-15 주식회사 선익시스템 Nozzle Shield to minimize the Thermal Deformation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100889761B1 (en) * 2002-09-30 2009-03-24 삼성모바일디스플레이주식회사 Heating crucible for forming apparatus of organic thin film
KR101451082B1 (en) * 2012-10-30 2014-10-15 주식회사 선익시스템 Nozzle Shield to minimize the Thermal Deformation

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