JPH05302175A - Contamination preventive sheet - Google Patents
Contamination preventive sheetInfo
- Publication number
- JPH05302175A JPH05302175A JP10654892A JP10654892A JPH05302175A JP H05302175 A JPH05302175 A JP H05302175A JP 10654892 A JP10654892 A JP 10654892A JP 10654892 A JP10654892 A JP 10654892A JP H05302175 A JPH05302175 A JP H05302175A
- Authority
- JP
- Japan
- Prior art keywords
- film
- foil
- ceramic
- spark discharge
- contamination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、防汚シートに関し、特
に真空中において薄膜を形成する装置の形成室内部の汚
染防止に有効に利用できる防汚シートに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antifouling sheet, and more particularly to an antifouling sheet which can be effectively used to prevent contamination of the inside of a forming chamber of an apparatus for forming a thin film in a vacuum.
【０００２】[0002]
【従来の技術】真空を応用した薄膜形成方法として、真
空蒸着法、イオンプレーティング法、スパッタリング
法、ＣＶＤ法等がよく用いられている。ところが、目的
とする基板以外の形成室内部にも膜が堆積し、これらが
剥離して、粉じん、ダストとなって成形室内の清浄度を
損うばかりか形成しようとする薄膜を汚染し、製品の純
度を低下させるばかりでなく、ピット等の原因ともなっ
ている。そこで一般的には成形室（チャンバー）専用の
ステンレスないしアルミニウム製の防汚板（防着板）を
製作して、壁面などに取り付けることが行なわれてい
る。この場合には、汚染時すなわち膜の堆積時に防汚板
を取りはずした後、ブラスト等物理的方法や剥離液に浸
漬し溶解除去する化学的方法等により、付着した膜を剥
離、洗浄化して再使用されている。又、アルミニウム箔
を成形室内面に固定し、防汚板として使用する方法も行
なわれている。この場合には汚染時に取りはずし、使い
捨てにすることができるため作業を簡易化できるという
利点がある。2. Description of the Related Art As a thin film forming method using vacuum, a vacuum vapor deposition method, an ion plating method, a sputtering method, a CVD method and the like are often used. However, a film is deposited inside the formation chamber other than the target substrate, and these are separated and become dust and dust, which not only impairs the cleanliness in the molding chamber but also contaminates the thin film to be formed. Not only lowers the purity, but also causes pits and the like. Therefore, generally, a stain-proof plate (deposition plate) made of stainless steel or aluminum dedicated to the molding chamber (chamber) is manufactured and attached to a wall surface or the like. In this case, at the time of contamination, that is, when depositing the film, the antifouling plate is removed, and then the attached film is peeled, cleaned and re-installed by a physical method such as blasting or a chemical method such as immersion in a stripping solution to dissolve and remove. It is used. Another method is also used in which an aluminum foil is fixed to the inner surface of the molding chamber and used as an antifouling plate. In this case, there is an advantage that the work can be simplified because it can be removed at the time of contamination and can be disposable.
【０００３】しかしながら、真空薄膜形成装置専用の防
汚板を使用する場合には、該防汚板作成のための設計製
作に費用と労力を必要とする上、一般的に厚手の板を使
用するので、しかも成形室が大きい場合には防汚板自体
が大型化し、重量が重くなりその着脱に多大な労力が必
要となる。しかも、汚染膜の剥離や洗浄は別工程となる
ため、長時間を要するだけではなく、作業工程が繁雑に
なる等問題が多かった。一方、金属板や金属箔を表面処
理なしで用いると、汚染膜の堆積が進み、厚みが増すに
従って汚染膜が剥離し、ダストとなりやすく、洗浄化作
業を頻繁に行なわなければならないとの問題もある。さ
らに、アルミニウム箔を用いる場合には、アルミニウム
金属表面の油分や不安定な酸化物からのガス発生があ
り、必要とする真空度が得られないのみならず、形成し
ようとする膜が汚染される不安もある。又、アルミニウ
ムはこれらの装置でしばしば使用するハロゲン系ガス等
に侵されやすいという問題もある。However, when an antifouling plate dedicated to a vacuum thin film forming apparatus is used, cost and labor are required for designing and manufacturing the antifouling plate, and a thick plate is generally used. Therefore, when the molding chamber is large, the antifouling plate itself becomes large and heavy, and a great deal of labor is required to attach and detach it. Moreover, peeling and cleaning of the contaminated film are separate steps, which not only takes a long time, but also causes many problems such as complicated working steps. On the other hand, if a metal plate or metal foil is used without surface treatment, the contamination film will be deposited, and as the thickness increases, the contamination film will peel off and easily become dust, and there is also the problem that cleaning work must be performed frequently. is there. Furthermore, when an aluminum foil is used, gas is generated from oil content or an unstable oxide on the surface of the aluminum metal, so that the required degree of vacuum cannot be obtained and the film to be formed is contaminated. I also have anxiety. There is also a problem that aluminum is easily attacked by halogen-based gas or the like often used in these devices.
【０００４】[0004]
【発明が解決しようとする課題】従って、本発明は、汚
染膜が剥離しにくく、かつ成形室内面に簡易に固定でき
る汚染防汚（防着）シートを提供することを目的とす
る。SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a stain-proofing (adhesion-preventing) sheet in which a stain film is less likely to be peeled off and which can be easily fixed on the inner surface of the molding chamber.
【０００５】[0005]
【課題を解決するための手段】本発明は、アルミニウム
箔にセラミックス皮膜を形成した箔を防汚板として用い
れば、前記の課題を効率的に解決できるとの知見に基ず
いてなされたものである。すなわち、本発明は、可とう
性アルミニウム箔の少なくとも片面にセラミックス皮膜
を形成したことを特徴とする防汚シートを提供する。
尚、セラミックス皮膜を、陽極火花放電法により形成す
ると、アルミ箔とセラミックス皮膜との接着性にすぐ
れ、かつ極めて薄いセラミックス皮膜を均一を形成する
ことができる。本発明において、基材となるアルミニウ
ム箔としては、厚さ0.０３mm〜0.２mmのものを一般的に
使用することができるが、防汚しようとする成形室の形
状、大きさ等を考慮して取り扱いやすさから選択する
が、0.０５〜0.１mmとするのがよい。薄すぎると作業時
に破断しやすく、厚すぎると曲げにくくなるためであ
る。セラミックス被覆アルミニウム箔を製造する場合の
前処理としては、アルミニウムに通常行なう方法を用い
ることができるが、最低限脱脂は充分に行なうのが好ま
しい。これは、アルミニウム箔圧延時の付着油を除去す
るためである。さらに、エッチング、酸洗等により充分
に洗浄することが望ましい。The present invention has been made based on the finding that the aforementioned problems can be efficiently solved by using a foil formed by forming a ceramic film on an aluminum foil as an antifouling plate. is there. That is, the present invention provides an antifouling sheet comprising a flexible aluminum foil and a ceramic film formed on at least one surface thereof.
When the ceramics film is formed by the anode spark discharge method, the aluminum foil and the ceramics film have excellent adhesiveness and an extremely thin ceramics film can be uniformly formed. In the present invention, as the aluminum foil as the base material, a foil having a thickness of 0.03 mm to 0.2 mm can be generally used, but the shape, size, etc. of the molding chamber to be antifouled are taken into consideration. Then, it is selected from the viewpoint of ease of handling, but it is preferable to set it to 0.05 to 0.1 mm. This is because if it is too thin, it tends to break during work, and if it is too thick, it becomes difficult to bend. As a pretreatment for producing a ceramics-coated aluminum foil, a method generally used for aluminum can be used, but it is preferable that degreasing is sufficiently performed at a minimum. This is to remove the oil adhered when the aluminum foil is rolled. Further, it is desirable to thoroughly wash by etching, pickling or the like.
【０００６】セラミックス被膜の形成は、例えば陽極火
花放電法、塗装法、気相メッキ法、溶射法などにより行
うことができるが、陽極火花放電法によるのが好まし
い。この陽極火花放電法によるセラミックス被膜の形成
方法及び組成は、例えば特公昭58−17298 号公報及び特
開平３−94077 号公報に記載のものを用いることができ
る。より具体的には、セラミックス皮膜を形成させる陽
極火花放電法としては、水溶性若しくはコロイド状ケイ
酸塩及び／又は酸素酸塩を含有する水溶液ないし、それ
らにセラミックス微粒子を懸濁させた電解浴中にアルミ
ニウム箔を浸して陽極火花放電を行なう方法が好まし
い。ここで、ケイ酸塩としては、一般式 M2O ・nSiO2
（Ｍはアルカリ金属を示し、ｎは0.５乃至１００の整数
を示す）で表わされる種々の水溶性のもの、例えば、ケ
イ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウムと、
水分散性のものとしてはコロイダルシリカ等を挙げるこ
とができる。又、酸素酸塩としては、タングステン酸、
錫酸塩、モリブデン酸、ホウ酸塩、アルミン酸塩、リン
酸塩等などの一種又は二種以上の混合物があげられる。
本発明では、上記ケイ酸塩又は酸素酸塩単独で、若しく
は２種以上の混合物として、又は両者の混合物として用
いることができる。The ceramic coating can be formed by, for example, an anode spark discharge method, a coating method, a vapor phase plating method, a thermal spraying method, etc., but the anode spark discharge method is preferable. As the method and composition of forming the ceramic coating by the anode spark discharge method, those described in JP-B-58-17298 and JP-A-3-94077 can be used. More specifically, the anode spark discharge method for forming a ceramic film is an aqueous solution containing a water-soluble or colloidal silicate and / or an oxyacid salt, or in an electrolytic bath in which ceramic particles are suspended. A method in which an aluminum foil is dipped in to perform anode spark discharge is preferable. Here, the silicate is represented by the general formula M 2 O.nSiO 2
(M represents an alkali metal, n represents an integer of 0.5 to 100), and various water-soluble compounds such as sodium silicate, potassium silicate, and lithium silicate,
Examples of water-dispersible substances include colloidal silica and the like. As the oxyacid salt, tungstic acid,
Examples include stannate, molybdic acid, borate, aluminate, phosphate and the like, or a mixture of two or more thereof.
In the present invention, the silicates or oxygenates may be used alone, as a mixture of two or more kinds, or as a mixture of both.
【０００７】さらに、電解浴に不溶性で分散可能な種々
のセラミックス微粒子を懸濁させてもよい。例えば、Al
2O3 、Al(OH)3 、SiO2、３Al2O3 ・２SiO2、TiO2、Zr
O2、部分安定化したジルコニア、安定化ジルコニア、Cr
2O3 等の酸化物系セラミックスやSiＣ、TiＣ、TiＮ、Ti
Ｂ、ZrＢ、ＢＮ、ＷＣ、WSi2、MoSi2等の非酸化物系セ
ラミックスをあげることが出来る。尚、これらは単独
で、又は２種以上の混合物を用いることができる（特願
平１−２２８６３９号及び同２−５４８２７号）。これ
らのうち、特に、浴種としては、ケイ酸塩を含むもの
や、さらにセラミックス微粒子を懸濁させたもの、又は
酸素酸塩にセラミックス微粒子を懸濁させたものを用い
るのがよい。電解浴に用いる水溶液中の水溶性若しくは
コロイド状ケイ酸塩及び／又は酸素酸塩の濃度は５ｇ／
l 以上が好ましく、２５〜２００ｇ／l が好適である。
特に酸素酸塩では飽和に近い濃度とすると皮膜形成速度
が最も上昇するが、濃度上昇とともに形成された皮膜が
不均一となる現象も発生しやすくなるので上記濃度とす
るのがよい。尚、水溶液のpHは任意であるが、３〜１3.
５とするのがよい。通常これらの金属基材に火花放電皮
膜を形成する場合、特に前処理を行なわなくともよい
が、脱脂、エッチング、酸洗等により充分に清浄化して
おくのが望ましい。Further, various insoluble and dispersible ceramic fine particles may be suspended in the electrolytic bath. For example, Al
2 O 3 , Al (OH) 3 , SiO 2 , 3Al 2 O 3 · 2SiO 2 , TiO 2 , Zr
O 2 , partially stabilized zirconia, stabilized zirconia, Cr
Oxide ceramics such as 2 O 3 and SiC, TiC, TiN, Ti
Non-oxide ceramics such as B, ZrB, BN, WC, WSi 2 and MoSi 2 can be mentioned. In addition, these can be used individually or as a mixture of two or more kinds (Japanese Patent Application Nos. 1-228639 and 2-54827). Among these, it is particularly preferable to use, as the bath type, one containing silicate, one in which ceramic fine particles are further suspended, or one in which ceramic fine particles are suspended in an oxyacid salt. The concentration of water-soluble or colloidal silicate and / or oxygenate in the aqueous solution used for the electrolytic bath is 5 g /
l or more is preferable, and 25 to 200 g / l is preferable.
Especially in the case of oxyacid salt, when the concentration is close to saturation, the film forming rate is most increased, but the phenomenon that the formed film becomes non-uniform tends to occur as the concentration is increased, so the above concentration is preferable. The pH of the aqueous solution is arbitrary, but it is 3 to 13.
A value of 5 is recommended. Usually, when forming a spark discharge film on these metal substrates, it is not necessary to perform pretreatment in particular, but it is desirable to sufficiently clean them by degreasing, etching, pickling and the like.
【０００８】陰極には、鉄、ステンレス、ニッケル等不
溶性電極を用いる。火花放電を行う際の浴温は、５〜９
０℃とするのが好ましく、１５〜６０℃がより好まし
い。低温では火花放電による皮膜の形成速度がおそくな
り、一方高温では、形成された皮膜が不均一となりやす
いからである。電流密度は0.２〜２０Ａ／dm2 で行なう
のがよく、好ましくは１〜５Ａ／dm2 である。本発明に
おいて、セラミックス皮膜は、アルミニウム箔の少なく
とも片面に形成されていればよいが、両面に形成するこ
ともできる。又、片面の全面に形成されているのが好ま
しいが、防汚シートとして使用できる限り、必ずしも全
面でなくともよい。しかし、片面にのみセラミックス皮
膜を形成した防汚シートを真空中で使用する場合には、
アルミニウムが露出している面のガス放出性や耐食性等
に問題が生じるため使用条件には注意する必要がある。
セラミックス皮膜の膜厚としては１〜３０μm が例示さ
れるが、５〜１５μmが望ましく、厚すぎると作業時の
折り曲げ等により皮膜が破損しやすく、薄いと耐食性、
脱ガス特性等が不充分となりやすい。又、セラミックス
皮膜の表面粗さとしては、ＪＩＳ Ｂ０６０１に記載さ
れた方法で測定したときのＲa （中心線平均粗さ）が１
〜４μm 、Ｒmax （最大高さ）が５〜３０μm となるよ
うにするのがよい。汚染膜との密着強度に防汚シートの
表面粗さが関係するため、特に上記範囲とするのがよ
い。陽極火花放電後は、イオン交換水、純水等により防
汚シートを充分に洗浄した後、洗浄大気中で付着した水
を完全に乾燥するのがよい。好ましくは、真空容器中
で、１２０〜３００℃に加熱し、脱ガスベイキングする
のがよいが、防汚シートの用途によっては、上記後処理
を必ずしも行わなくてもよい。又、柔軟性を一層増すに
は、３００℃〜３５０℃で、数１０分から１〜２時間加
熱し、焼きなましを行なうと良い。An insoluble electrode such as iron, stainless steel or nickel is used as the cathode. The bath temperature for spark discharge is 5-9
The temperature is preferably 0 ° C, more preferably 15 to 60 ° C. This is because at low temperatures the rate of film formation due to spark discharge becomes slower, while at high temperatures the formed film tends to become non-uniform. Current density may be carried out in 0.2~20A / dm 2, preferably 1-5A / dm 2. In the present invention, the ceramic film may be formed on at least one surface of the aluminum foil, but may be formed on both surfaces. Further, it is preferable that it is formed on the entire surface of one side, but as long as it can be used as an antifouling sheet, it does not necessarily have to be the entire surface. However, when using an antifouling sheet with a ceramic film formed on only one side in a vacuum,
It is necessary to pay attention to the operating conditions because there will be problems with gas release and corrosion resistance of the exposed aluminum surface.
The thickness of the ceramic film is, for example, 1 to 30 μm, but is preferably 5 to 15 μm. If it is too thick, the film will be easily damaged by bending during work, and if it is thin, it will have corrosion resistance.
Degassing characteristics are likely to be insufficient. As the surface roughness of the ceramic film, Ra (center line average roughness) is 1 when measured by the method described in JIS B0601.
It is preferable that Rmax (maximum height) is 5 to 30 μm. Since the surface roughness of the antifouling sheet is related to the adhesion strength with the contaminated film, the above range is particularly preferable. After the anode spark discharge, it is preferable to thoroughly wash the antifouling sheet with ion-exchanged water, pure water, etc., and then completely dry the attached water in the washing atmosphere. It is preferable to heat at 120 to 300 ° C. and degas baking in a vacuum container, but the above-mentioned post-treatment may not be necessarily performed depending on the use of the antifouling sheet. Further, in order to further increase the flexibility, it is preferable to perform heating at 300 ° C. to 350 ° C. for several tens of minutes to 1 to 2 hours for annealing.
【０００９】[0009]
【発明の効果】本発明によれば、可とう性に富み自由に
変形加工でき、ハサミ、カッターナイフ等により容易に
切断でき、しかもダストやパーティクル発生の少ない防
汚シートが得られる。しかも、表面セラミックス層は脱
ガス性にすぐれるため真空度を低下させることがなく、
特に、セラミックス層は汚染膜との密着性に優れるた
め、汚染膜の剥離による二次的汚染の問題のない防汚シ
ートとなる。又、アルミニウム箔を陽極火花放電処理に
より形成したものでは、腐食性ガスに対する耐食性も向
上する。このシートは専用のくり返し使用する防着板と
異なり、汚染膜の剥離がないため、長期間の使用に耐
え、しかも、使い捨て可能なため、再生のための余分な
労力を省け、経済的である。又、表面のセラミックスは
完全な無機物であるため、基材であるアルミニウムの再
利用も容易である。この箔は安定なセラミックス膜が形
成されているため、電離ないし励起状態にある活性粒子
を含む、各種のブラズマにも安定で侵されない。従っ
て、本発明の防汚シートは、真空成形室内面の保護シー
ト、塗装時の非塗装部分の保護シートなどの用途のみで
なく、絶縁、防食、電波シールド等の用途のシートとし
ても幅広く活用できる。次に実施例により本発明を説明
する。According to the present invention, it is possible to obtain an antifouling sheet which is highly flexible, can be freely deformed, can be easily cut with scissors, a cutter knife, etc., and has less dust and particles. Moreover, since the surface ceramic layer has excellent degassing property, the vacuum degree is not lowered,
In particular, since the ceramic layer has excellent adhesion to the contaminated film, the antifouling sheet does not have the problem of secondary contamination due to peeling of the contaminated film. In addition, when the aluminum foil is formed by the anode spark discharge treatment, the corrosion resistance to corrosive gas is also improved. This sheet is different from the anti-adhesion plate that is repeatedly used, because it does not peel off the contaminated film, so it can be used for a long period of time, and because it is disposable, it saves extra labor for recycling and is economical. . Moreover, since the ceramics on the surface is a completely inorganic substance, it is easy to reuse aluminum as a base material. Since this foil has a stable ceramic film formed, it is stable and is not attacked by various types of plasma containing active particles in an ionized or excited state. Therefore, the antifouling sheet of the present invention can be widely used not only as a protective sheet for the interior of a vacuum forming chamber, a protective sheet for a non-painted portion at the time of coating, but also as a sheet for applications such as insulation, anticorrosion, and radio wave shielding. . Next, the present invention will be described with reference to examples.
【００１０】[0010]
実施例１ 厚さ0.０５mmのアルミニウム箔（４０cm×１００cm）を
充分に脱脂水洗した後、K2O ・ nSiO2 ２００ｇ／リット
ル溶液中で、火花放電法により１０μm のセラミックス
皮膜を形成し、イオン交換水と純水で充分に洗浄した
後、洗浄空気の乾燥炉にて充分に乾燥した。さらに、洗
浄空気中の熱風循環ベーキング炉にて、３００℃で１時
間加熱し、焼きなました。得られたシートの触針式表面
粗さ測定器（小坂製作所、ＳＥ−３０Ｈ）による表面粗
さはＲａ2.１μm であった。このセラミックス被覆アル
ミニウム箔を内容積３５０リットル、内表面積５ｍ2 の
真空室内面に取り付けた。シートはハサミで自由なサイ
ズに切断でき、しかも、手で任意に曲げられるので、取
り付けは容易だった。この真空室を使用して数１０回、
TiN 、SiO2等の薄膜形成実験を行なった。防着シートに
は、５０μm 以上の汚染膜が形成されたが、剥離は全く
なく、ダスト等の発生もなかった。又、取り付けたこと
による真空度の低下も認められなかった。又、SiH4、O2
等の反応ガスや、そのプラズマ状態のガスによる損傷も
認められなかった。 実施例２ 実施例１と同様の脱脂水洗したアルミニウム箔に、Na4P
2O7 ・10H2O ６０％水溶液にZrO2微粒子（日本電工
（株）製、商品名 Ｎ−ＰＣ、平均粒径0.７〜1.０μm
）を添加し、撹拌により充分安定に懸濁された溶液中
で、火花放電法により、１０μm のセラミックス皮膜を
形成した。得られたシートの表面粗さはＲａ2.８μm だ
った。実施例１と同様に乾燥、焼きなまし後、実施例１
と同一の真空室内面に取り付けたところ、取り付け作業
は容易で、その他の効果も実施例１と同様だった。Example 1 An aluminum foil (40 cm × 100 cm) with a thickness of 0.05 mm was thoroughly degreased and washed with water, and then a 10 μm ceramic film was formed by a spark discharge method in a K 2 O.nSiO 2 200 g / liter solution. After thoroughly washing with exchanged water and pure water, it was thoroughly dried in a washing air drying oven. Furthermore, it was annealed by heating it at 300 ° C for 1 hour in a hot air circulating baking oven in washing air. The surface roughness of the obtained sheet by a stylus type surface roughness measuring instrument (SE-30H, Kosaka Seisakusho) was Ra 2.1 μm. This ceramic-coated aluminum foil was attached to the inner surface of a vacuum chamber having an internal volume of 350 liters and an internal surface area of 5 m 2 . The sheet could be cut with scissors to any size, and it could be bent by hand, so installation was easy. Dozens of times using this vacuum chamber,
A thin film formation experiment of TiN, SiO 2, etc. was conducted. On the anti-adhesion sheet, a contaminated film having a thickness of 50 μm or more was formed, but it was not peeled off at all, and dust was not generated. Moreover, the vacuum degree was not lowered due to the attachment. In addition, SiH 4 , O 2
No damage due to the reaction gas such as the above or the gas in the plasma state was observed. Example 2 The same degreasing water-washed aluminum foil as in Example 1 was coated with Na 4 P.
2 O 7 · 10H 2 O 60% aqueous solution with ZrO 2 fine particles (manufactured by Nippon Denko KK, trade name N-PC, average particle size 0.7 to 1.0 μm)
) Was added, and a 10 μm ceramics film was formed by a spark discharge method in a sufficiently suspended solution by stirring. The surface roughness of the obtained sheet was Ra 2.8 μm. After drying and annealing as in Example 1, Example 1
When it was mounted on the same vacuum chamber inner surface, the mounting work was easy and the other effects were the same as in Example 1.
Claims (2)
面にセラミックス皮膜を形成したことを特徴とする防汚
シート。1. An antifouling sheet comprising a flexible aluminum foil and a ceramic film formed on at least one surface thereof.
より形成されている請求項１記載の防汚シート。2. The antifouling sheet according to claim 1, wherein the ceramic film is formed by an anode spark discharge method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10654892A JP3159517B2 (en) | 1992-04-24 | 1992-04-24 | Antifouling sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10654892A JP3159517B2 (en) | 1992-04-24 | 1992-04-24 | Antifouling sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05302175A true JPH05302175A (en) | 1993-11-16 |
| JP3159517B2 JP3159517B2 (en) | 2001-04-23 |
Family
ID=14436414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10654892A Expired - Fee Related JP3159517B2 (en) | 1992-04-24 | 1992-04-24 | Antifouling sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3159517B2 (en) |
Cited By (4)
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|---|---|---|---|---|
| JP2004523894A (en) * | 2000-12-29 | 2004-08-05 | ラム リサーチ コーポレーション | Low-contamination plasma chamber component and method of manufacturing the same |
| WO2004075233A1 (en) * | 2003-02-18 | 2004-09-02 | Matsushita Electric Industrial Co., Ltd. | Process for manufacturing plasma display panel and substrate holder |
| DE102011007424A1 (en) * | 2011-04-14 | 2012-10-18 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | Process for the preparation of a coating on the surface of a substrate based on light metals by plasma electrolytic oxidation |
| CN115478269A (en) * | 2022-10-11 | 2022-12-16 | 山西聚星辰新材料科技有限公司 | Preparation method of flexible aluminum-based ceramic insulating foil |
-
1992
- 1992-04-24 JP JP10654892A patent/JP3159517B2/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004523894A (en) * | 2000-12-29 | 2004-08-05 | ラム リサーチ コーポレーション | Low-contamination plasma chamber component and method of manufacturing the same |
| JP4890734B2 (en) * | 2000-12-29 | 2012-03-07 | ラム リサーチ コーポレーション | Low-contamination plasma chamber components and manufacturing method thereof |
| WO2004075233A1 (en) * | 2003-02-18 | 2004-09-02 | Matsushita Electric Industrial Co., Ltd. | Process for manufacturing plasma display panel and substrate holder |
| US7195532B2 (en) | 2003-02-18 | 2007-03-27 | Matsushita Electric Industrial Co., Ltd. | Process for manufacturing plasma display panel and substrate holder |
| US7780491B2 (en) | 2003-02-18 | 2010-08-24 | Panasonic Corporation | Process for manufacturing plasma display panel and substrate holder |
| US7798880B2 (en) | 2003-02-18 | 2010-09-21 | Panasonic Corporation | Process for manufacturing plasma display panel and substrate holder |
| DE102011007424A1 (en) * | 2011-04-14 | 2012-10-18 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | Process for the preparation of a coating on the surface of a substrate based on light metals by plasma electrolytic oxidation |
| DE102011007424B4 (en) * | 2011-04-14 | 2014-01-23 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | A method of forming a coating on the surface of a light metal based substrate by plasma electrolytic oxidation and coated substrate |
| DE102011007424B8 (en) * | 2011-04-14 | 2014-04-10 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | A method of forming a coating on the surface of a light metal based substrate by plasma electrolytic oxidation and coated substrate |
| US8828215B2 (en) | 2011-04-14 | 2014-09-09 | Helmholtz-Zentrum Geesthacht Zentrum für Material-und Küstenforschung GmbH | Process for producing a coating on the surface of a substrate based on lightweight metals by plasma-electrolytic oxidation |
| CN115478269A (en) * | 2022-10-11 | 2022-12-16 | 山西聚星辰新材料科技有限公司 | Preparation method of flexible aluminum-based ceramic insulating foil |
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| Publication number | Publication date |
|---|---|
| JP3159517B2 (en) | 2001-04-23 |
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