JPH0526868B2 - - Google Patents
Info
- Publication number
- JPH0526868B2 JPH0526868B2 JP25040885A JP25040885A JPH0526868B2 JP H0526868 B2 JPH0526868 B2 JP H0526868B2 JP 25040885 A JP25040885 A JP 25040885A JP 25040885 A JP25040885 A JP 25040885A JP H0526868 B2 JPH0526868 B2 JP H0526868B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- boron nitride
- cubic boron
- aluminum
- outer layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052582 BN Inorganic materials 0.000 claims description 81
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 79
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- -1 aluminum compound Chemical class 0.000 claims description 25
- JXOOCQBAIRXOGG-UHFFFAOYSA-N [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] Chemical compound [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] JXOOCQBAIRXOGG-UHFFFAOYSA-N 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 9
- 230000000737 periodic effect Effects 0.000 claims description 6
- 239000006104 solid solution Substances 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 150000001247 metal acetylides Chemical class 0.000 claims description 3
- DJPURDPSZFLWGC-UHFFFAOYSA-N alumanylidyneborane Chemical compound [Al]#B DJPURDPSZFLWGC-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 154
- 239000000758 substrate Substances 0.000 description 41
- 238000000034 method Methods 0.000 description 32
- 239000000843 powder Substances 0.000 description 15
- 239000011247 coating layer Substances 0.000 description 14
- 239000000919 ceramic Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 4
- 229910000997 High-speed steel Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000011195 cermet Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910004542 HfN Inorganic materials 0.000 description 1
- 229910003178 Mo2C Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910008322 ZrN Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、切削工具又は耐摩耗工具などの工具
部品及び半導体基板などの電子機器用部品として
利用できる立方晶窒化ホウ素被覆部品に関するも
のである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to cubic boron nitride coated parts that can be used as tool parts such as cutting tools or wear-resistant tools, and parts for electronic devices such as semiconductor substrates. .
（従来の技術）
立方晶窒化ホウ素は、ダイヤモンドに次ぐ高硬
度性、高熱伝導性及び高電気絶縁性を有し、しか
もダイヤモンドよりもすぐれた化学的安定性、耐
酸化物、耐熱性及び耐熱的衝撃性を有している。
また、ダイヤモンドは、鉄族金属との親和性が高
いのに対して立方晶窒化ホウ素は、鉄族金属との
親和性が低いことから、例えば鉄族金属材料を切
削又は研削するための工具材料として注目されて
いる。このように、立方晶窒化ホウ素は、すぐれ
た特性を有しているが、脆性材料であり、しかも
難焼結性材料であることから形状及び用途に制約
を受けている。(Prior art) Cubic boron nitride has high hardness, high thermal conductivity, and high electrical insulation properties second only to diamond, and also has better chemical stability, oxide resistance, heat resistance, and thermal shock resistance than diamond. It has a sexual nature.
In addition, diamond has a high affinity with iron group metals, whereas cubic boron nitride has a low affinity with iron group metals, so it can be used as a tool material for cutting or grinding iron group metal materials, for example. It is attracting attention as As described above, although cubic boron nitride has excellent properties, it is a brittle material and is difficult to sinter, so its shape and use are limited.
そこで、立方晶窒化ホウ素を被覆層として基体
の表面に形成してなる被覆部品によつて形状及び
用途の制約を解決しようとする試みがなされてい
る。その代表例として、立方晶窒化ホウ素の被覆
層を窒化ケイ素焼結体の基体の表面に直接形成さ
せてなる被覆部品が特開昭57−95881号公報に開
示されている。 Therefore, attempts have been made to solve the shape and usage constraints by using a coated part formed by forming a coating layer of cubic boron nitride on the surface of a substrate. As a typical example, Japanese Patent Laid-Open No. 57-95881 discloses a coated part in which a cubic boron nitride coating layer is directly formed on the surface of a sintered silicon nitride substrate.
（発明が解決しようとする問題点）
特開昭57−95881号公報に開示の被覆部品は、
次のような問題がある。窒化ケイ素焼結体は、焼
結を促進させるために、例えばAl2O3、MgO、
Y2O3などの、主として金属酸化物からなる焼結
助剤を含有している。このように焼結助剤を含有
した窒化ケイ素焼結体の基体の表面に直接立方晶
窒化ホウ素からなる被覆層を形成させてなる被覆
部品は、基体の表面にも焼結助剤が存在し、この
焼結助剤が六方晶窒化ホウ素又は非晶質窒化ホウ
素などの窒化ホウ素の立方晶窒化ホウ素への転換
を阻害し、又、基体と被覆層との付着性を低下さ
せるという問題がある。(Problems to be solved by the invention) The covered parts disclosed in Japanese Patent Application Laid-open No. 57-95881 are as follows:
There are the following problems. The silicon nitride sintered body contains, for example, Al 2 O 3 , MgO,
Contains sintering aids consisting primarily of metal oxides, such as Y 2 O 3 . In this way, coated parts in which a coating layer made of cubic boron nitride is directly formed on the surface of a silicon nitride sintered body substrate containing a sintering aid, have the sintering aid present on the surface of the substrate as well. There is a problem that this sintering aid inhibits the conversion of boron nitride, such as hexagonal boron nitride or amorphous boron nitride, to cubic boron nitride, and also reduces the adhesion between the substrate and the coating layer. .
本発明は、上述のような問題点を解決したもの
で、具体的には、基体と立方晶窒化ホウ素からな
る外層との間に窒化ホウ素の立方晶窒化ホウ素へ
の転換を促進させる効果があり、しかも高温での
安定性及び外層との付着性にすぐれた中間層を介
在させてなる立方晶窒化ホウ素被覆部品の提供を
目的とするものである。 The present invention solves the above-mentioned problems, and specifically has the effect of promoting the conversion of boron nitride to cubic boron nitride between the substrate and the outer layer made of cubic boron nitride. Moreover, the object of the present invention is to provide a cubic boron nitride coated part having an intermediate layer having excellent stability at high temperatures and excellent adhesion to the outer layer.
（問題点を解決するための手段）
基体の表面に立方晶窒化ホウ素からなる被覆層
が形成される場合は、２つの形態があり、第１の
形態は、立方晶窒化ホウ素が合成されて、その立
方晶窒化ホウ素が被覆層として基体の表面に付着
形成される場合であり、第２の形態は、非晶質窒
化ホウ素又は六方晶窒化ホウ素などの窒化ホウ素
が基体の表面に被覆層として付着形成されると同
時又は被覆層として形成された後に、窒化ホウ素
が立方晶窒化ホウ素に転換する場合である。この
内、第１の形態に対しては、立方晶窒化ホウ素の
付着しやすい物質が必要であり、第２の形態に対
しては、窒化ホウ素の立方晶窒化ホウ素への転換
にすぐれる物質が必要である。本発明者らは、こ
の第１の形態と第２の形態に対して必要な物質及
び工具部品などの苛酷な用途に耐えることができ
る物質について検討した所、酸素又は酸素含有化
合物は、第１の形態及び第２の形態に対して最も
障害になること、並びに炭素及び炭素含有化合物
も第１の形態及び第２の形態に対して好ましくな
いということから、更に検討した結果、ホウ化ア
ルミニウム又はホウ窒化アルミニウムが上述の第
１の形態及び第２の形態などに対して満足させる
ことができるという知見を得るに至り、本発明を
完成したものである。(Means for solving the problem) When a coating layer made of cubic boron nitride is formed on the surface of a substrate, there are two forms. In the first form, cubic boron nitride is synthesized, The second form is when cubic boron nitride is deposited on the surface of the substrate as a coating layer, and the second form is when boron nitride such as amorphous boron nitride or hexagonal boron nitride is deposited on the surface of the substrate as a coating layer. This is the case when the boron nitride is converted to cubic boron nitride either as it is formed or after it is formed as a coating layer. Among these, for the first form, a substance to which cubic boron nitride easily adheres is required, and for the second form, a substance that is excellent in converting boron nitride to cubic boron nitride is required. is necessary. The present inventors studied the materials necessary for the first form and the second form and the materials that can withstand harsh applications such as tool parts, and found that oxygen or oxygen-containing compounds are As a result of further investigation, aluminum boride or The present invention has been completed based on the finding that aluminum boronitride can satisfy the above-mentioned first and second embodiments.
すなわち、本発明の立方晶窒化ホウ素被覆部品
は、基体の表面に立方晶窒化ホウ素を主成分とす
る外層を形成してなる被覆部品において、前記基
体と前記外層との間に１層又は多層で構成される
中間層を介在させ、前記外層に隣接する該中間層
がホウ化アルミニウミ又はホウ窒化アルミニウム
からなるアルミニウム化合物層によつて形成され
ていることを特徴とするものである。 That is, the cubic boron nitride-coated part of the present invention is a coated part formed by forming an outer layer containing cubic boron nitride as a main component on the surface of a base, in which one layer or multiple layers are provided between the base and the outer layer. The intermediate layer adjacent to the outer layer is formed of an aluminum compound layer made of aluminum boride or aluminum boron nitride.
ここで用いる基体は、後述する製造条件に耐え
ることが可能な材種ならば特別に制限されるもの
でなく、例えば各種の金属、合金、焼結ハイス、
超硬合金、サーメツト又はセラミツクスなどを用
途によつて使い分けることができる。 The substrate used here is not particularly limited as long as it can withstand the manufacturing conditions described below, such as various metals, alloys, sintered high-speed steel,
Cemented carbide, cermet, ceramics, etc. can be used depending on the purpose.
立方晶窒化ホウ素を主成分とする外層は、μｍ
単位の薄膜状の層からmm単位の厚膜状の層として
形成することができる。この外層の成分は、立方
晶窒化ホウ素又は立方晶窒化ホウ素の他にFe、
Ni、Co、Al、Si及び周期律表4a、5a、6a族金属
もしくはAl、Siの窒化物あるいは周期律表4a、
5a、6a族金属の炭化物、窒化物、ホウ化物及び
これらの相互固溶体の中の少なくとも１種の結合
相を含有させたものにすることができる。この
内、立方晶窒化ホウ素からなる外層の場合は、立
方晶窒化ホウ素が脆性材料であることから0.1μｍ
以上〜15μｍ以下の層厚、好ましくは0.5μｍ以上
〜10μｍ以下の層厚でなる薄膜状にするのがよ
く、立方晶窒化ホウ素の他に結合相を含有した外
層の場合は、0.05mm以上〜0.8mm以下の層厚でな
る厚膜状にすることもできる。 The outer layer mainly composed of cubic boron nitride is μm
It can be formed as a thin film-like layer of the order of units to a thick film-like layer of the unit of mm. The components of this outer layer include cubic boron nitride or cubic boron nitride as well as Fe,
Ni, Co, Al, Si and metals of groups 4a, 5a, 6a of the periodic table or nitrides of Al, Si or 4a of the periodic table,
It can contain at least one binder phase among carbides, nitrides, borides, and mutual solid solutions of group 5a and 6a metals. Among these, in the case of the outer layer made of cubic boron nitride, the thickness is 0.1 μm because cubic boron nitride is a brittle material.
It is preferable to form a thin film with a layer thickness of 15 μm or more, preferably 0.5 μm or more and 10 μm or less, and in the case of an outer layer containing a binder phase in addition to cubic boron nitride, 0.05 mm or more It is also possible to form a thick film with a layer thickness of 0.8 mm or less.
これらの基体と外層との間に介在させる中間層
は、使用する基体の材種又は本発明の被覆部品の
用途もしくは形状によつて各種の構成にすること
ができる。 The intermediate layer interposed between these substrates and the outer layer can have various configurations depending on the material of the substrate used or the use or shape of the coated part of the present invention.
例えば、第１の構成としては、中間層がホウ化
アルミニウム又はホウ窒化アルミニウムのアルミ
ニウム化合物層からなるものである。この場合
は、基体と外層との間にアルミニウム化合物層が
介在しているもので、アルミニウム化合物層との
付着性にすぐれている基体、例えばAlN系セラ
ミツクス、Al2O3系セラミツクスなどの基体に適
用すると外層のすぐれた特性を発揮することがで
きる。 For example, in a first configuration, the intermediate layer is made of an aluminum compound layer of aluminum boride or aluminum boronitride. In this case, an aluminum compound layer is interposed between the substrate and the outer layer, and a substrate that has excellent adhesion to the aluminum compound layer, such as AlN ceramics or Al 2 O 3 ceramics, is used. When applied, the excellent properties of the outer layer can be exhibited.
第２の構成としては、中間層がアルミニウム化
合物層と周期律表4a、5a、6a族金属のホウ化物
又は窒化アルミニウム、酸化アルミニウム及びこ
れらの相互固溶体から選ばれる１種以上の第１密
着補助層とからなるものである。この場合は、基
体と外層との間に第１密着補助層とアルミニウム
化合物層が介在し、基体に第１密着補助層が隣接
し、外層にアルミニウム化合物層が隣接している
もので、第１密着補助層との付着性にすぐれてい
る基体、例えばZrO2系セラミツクス、TiC系セ
ラミツクス、Si3N4系セラミツクス、SiC系セラ
ミツクスなどの各種のセラミツクスからなる基体
に適用すると外層のすぐれた特性を発揮すること
ができる。 In the second configuration, the intermediate layer is an aluminum compound layer and a first adhesion auxiliary layer of one or more types selected from borides of metals of groups 4a, 5a, and 6a of the periodic table, aluminum nitride, aluminum oxide, and mutual solid solutions thereof. It consists of. In this case, the first adhesion auxiliary layer and the aluminum compound layer are interposed between the base and the outer layer, the first adhesion auxiliary layer is adjacent to the base, the aluminum compound layer is adjacent to the outer layer, and the first adhesion auxiliary layer is adjacent to the base and the aluminum compound layer is adjacent to the outer layer. When applied to substrates that have excellent adhesion with the adhesion auxiliary layer, such as substrates made of various ceramics such as ZrO 2 ceramics, TiC ceramics, Si 3 N 4 ceramics, and SiC ceramics, the excellent properties of the outer layer can be improved. able to demonstrate.
第３の構成としては、中間層がアルミニウム化
合物層と第１密着補助層と周期律表4a、5a、6a
族金属の炭化物、窒化物、酸化物及びこれらの相
互固溶体から選ばれる１種以上の第２密着補助層
とからなるものである。この場合は、基体と外層
との間に第２密着補助層と第１密着補助層とアル
ミニウム化合物層が介在し、基体に第２密着補助
層が隣接し、外層にアルミニウム化合物層が隣接
し、第２密着補助層とアルミニウム化合物層との
間に第１密着補助層が介在しているもので、第２
密着補助層との付着性にすぐれている基体、例え
ば各種の金属又はステンレス、高速度鋼などの工
具鋼を含めた各種合金、焼結ハイス、超硬合金、
サーメツトなどの基体に適用すると外層のすぐれ
た特性を発揮することができるものである。 In the third configuration, the intermediate layer is an aluminum compound layer, a first adhesion auxiliary layer, and a layer of the periodic table 4a, 5a, 6a.
and a second adhesion auxiliary layer of one or more selected from group metal carbides, nitrides, oxides, and mutual solid solutions thereof. In this case, the second adhesion auxiliary layer, the first adhesion auxiliary layer, and the aluminum compound layer are interposed between the base and the outer layer, the second adhesion auxiliary layer is adjacent to the base, the aluminum compound layer is adjacent to the outer layer, The first adhesion auxiliary layer is interposed between the second adhesion auxiliary layer and the aluminum compound layer, and the second
Substrates that have excellent adhesion with the adhesion auxiliary layer, such as various metals or stainless steel, various alloys including tool steels such as high-speed steel, sintered high speed steel, cemented carbide,
When applied to a substrate such as cermet, the excellent properties of the outer layer can be exhibited.
その他の中間層の構成としては、例えば前述し
た第３の構成で、第２密着補助層中にFe、Ni、
Coなどの金属を含有した層でなる場合、又は第
３の構成で、更に基体と第２密着補助層との間に
金属又は合金でなる層の介在した場合、もしくは
アルミニウム化合物層と第２密着補助層との組合
わせにすることもできる。 Other intermediate layer configurations include, for example, the third configuration described above, which includes Fe, Ni, and Ni in the second adhesion assisting layer.
In the case of a layer containing a metal such as Co, or in the third configuration, a layer made of a metal or alloy is further interposed between the base and the second adhesion auxiliary layer, or in the case of an aluminum compound layer and the second adhesion auxiliary layer. It can also be combined with an auxiliary layer.
上述の如く、中間層は、主として基体との付着
性の関係から１層又は多層からなる構成にするこ
とができるが、外層に隣接する中間層は、立方晶
窒化ホウ素との付着性にすぐれるのと、窒化ホウ
素の立方晶窒化ホウ素への転換作用が高いのと、
強度及び化学的安定性にすぐれているということ
からアルミニウム化合物層にすることを特徴とす
るものである。 As mentioned above, the intermediate layer can be composed of one layer or multiple layers mainly from the viewpoint of adhesion to the substrate, but the intermediate layer adjacent to the outer layer has excellent adhesion to cubic boron nitride. , and the conversion effect of boron nitride to cubic boron nitride is high.
It is characterized by an aluminum compound layer because it has excellent strength and chemical stability.
これらの中間層を具体的に示すと、アルミニウ
ム化合物層としたは、例えばAlB、AlB2、
AlB10、AlB12、Al（Ｂ、Ｎ）があり、特にAlB2
又はAlB12に相当するホウ化アルミニウムが好ま
しい。第１密着補助層としては、例えばTiB2、
ZrB2、HfB2、VB2、TaB、WB、AlN、Al2O3、
Al（Ｏ、Ｎ）があり、第２密着補助層としては、
例えばTiC、ZrC、HfC、VC、TaC、NbC、
WC、Cr3C2、Mo2C、TiN、ZrN、HfN、VN、
TaN、CrN、Ti（Ｃ、Ｏ）、Ti（Ｎ、Ｏ）、Ti（Ｃ、
Ｎ、Ｏ）、（Ti、Ta）Ｃなどを挙げることができ
る。これらの中間層は、化学量論的化合物のみで
なく、非化学量論的化合物、例えばAlB1-x、
AlB2-xなどとして形成される。 Specifically showing these intermediate layers, the aluminum compound layer includes, for example, AlB, AlB 2 ,
AlB 10 , AlB 12 , Al(B,N), especially AlB 2
Or aluminum boride corresponding to AlB 12 is preferred. As the first adhesion auxiliary layer, for example, TiB 2 ,
ZrB 2 , HfB 2 , VB 2 , TaB, WB, AlN, Al 2 O 3 ,
Al(O,N) is used as the second adhesion auxiliary layer.
For example, TiC, ZrC, HfC, VC, TaC, NbC,
WC, Cr3C2 , Mo2C , TiN , ZrN, HfN, VN,
TaN, CrN, Ti (C, O), Ti (N, O), Ti (C,
Examples include N, O), (Ti, Ta)C, and the like. These interlayers contain not only stoichiometric compounds but also non-stoichiometric compounds, such as AlB 1-x ,
Formed as AlB 2-x , etc.
本発明の立方晶窒化ホウ素被覆部品は、次のよ
うな方法によつて製造することができる。まず、
基体は、板状体、塊状体、粉末状又は粉末圧粉体
状のものを用いることができる。この内、板状体
又は塊状体のものを用いる場合は、必要に応じて
基体の表面を研摩、洗浄及び乾燥などを行なうと
基体と中間層との付着性がすぐれることから好ま
しいことである。 The cubic boron nitride coated part of the present invention can be manufactured by the following method. first,
The substrate can be in the form of a plate, a block, a powder, or a powder compact. When using a plate-like or block-like material, it is preferable to polish, wash, and dry the surface of the substrate as necessary to improve adhesion between the substrate and the intermediate layer. .
基体の表面に中間層を設ける方法は、CVD法、
PVD法又はプラズマCVD法による方法、金属を
蒸着した後浸炭や窒化処理して金属化合物の中間
層とする方法、スプレー、刷毛塗りなどで粉末状
として設ける方法、もしくは加圧成形によつて粉
末圧粉体として設ける方法がある。また、基体と
中間層との付着性を高めるために、基体の表面に
金属又は合金からなる層を設ける必要がある場合
には、蒸着、イオンプレーテイング又はスパツタ
ーのようなPVD法の他にメツキによつても形成
することができる。 Methods for providing an intermediate layer on the surface of the substrate include CVD method,
PVD method or plasma CVD method, method of depositing metal and then carburizing or nitriding to form an intermediate layer of metal compound, method of applying it as a powder by spraying or brushing, or powder compaction by pressure molding. There is a method of providing it as a powder. In addition, if it is necessary to provide a layer made of metal or alloy on the surface of the substrate in order to improve the adhesion between the substrate and the intermediate layer, plating may be used in addition to PVD methods such as vapor deposition, ion plating, or sputtering. It can also be formed by
外層の形成方法は、PVD法又はプラズマCVD
法の他に粉末状、粉末圧粉体状もしくはCVD法、
PVD法、プラズマCVD法などによつて窒化ホウ
素を中間層の表面に形成した後、立方晶窒化ホウ
素の安定な高圧高温条件によつて処理して立方晶
窒化ホウ素を主体とする外層にすることができ
る。さらに、本発明の被覆部品の製造方法につい
て具体的に説明すると、第１の方法は、基体が、
例えば線引品、圧延品、鋳造品、鍛造品又は焼結
品からなる板状体もしくは塊状体である場合、基
体の表面を研摩、洗浄及び乾燥後、CVD法、
PVD法又はプラズマCVD法によつて中間層を設
ける。次いで、高エネルギーを発生し得るPVD
法、プラズマCVD法又はレーザ蒸着法などの反
応容器内に設置して、中間層の表面に0.05μｍ〜
20μｍ程度の薄膜状の外層を形成する方法であ
る。 The outer layer is formed using PVD or plasma CVD.
In addition to the method, powder form, powder compact form or CVD method,
After boron nitride is formed on the surface of the intermediate layer by a PVD method, plasma CVD method, etc., it is processed under stable high pressure and high temperature conditions for cubic boron nitride to form an outer layer mainly composed of cubic boron nitride. I can do it. Furthermore, to specifically explain the method for manufacturing the coated component of the present invention, in the first method, the substrate is
For example, in the case of a plate or block made of a drawn product, a rolled product, a cast product, a forged product, or a sintered product, the surface of the substrate is polished, washed, and dried, and then the CVD method is applied.
An intermediate layer is provided by a PVD method or a plasma CVD method. Next, PVD, which can generate high energy
0.05 μm to 0.05 μm on the surface of the intermediate layer.
This method forms a thin film-like outer layer of about 20 μm.
第２の方法は、第１の方法で用いたと同様の基
体の表面に第１の方法と同様にして中間層を形成
した後、中間層の表面にCVD法、PVD法、プラ
ズマCVD法又はレーザ蒸着法によつて外層を形
成するための例えば非晶質窒化ホウ素又は六方晶
窒化ホウ素からなる薄膜を形成し、次いでベルト
型又はカードル型などの高圧高温装置に設置して
立方晶窒化ホウ素の安定な高圧高温条件下で処理
する方法である。 The second method involves forming an intermediate layer on the surface of the same substrate used in the first method in the same manner as in the first method, and then applying CVD, PVD, plasma CVD, or laser to the surface of the intermediate layer. A thin film made of, for example, amorphous boron nitride or hexagonal boron nitride is formed to form the outer layer by a vapor deposition method, and then placed in a high-pressure, high-temperature device such as a belt type or cardle type to stabilize the cubic boron nitride. This method involves processing under high pressure and high temperature conditions.
第３の方法は、第１の方法で用いたと同様の基
体の表面に第１の方法と同様にして中間層を形成
した後、0.05mm〜0.8mm程度の厚膜状の外層を形
成する目的で、中間層の表面に外層を形成するた
めの粉末状又は粉末圧粉体状のものを設け、次い
で高圧高温装置に設置して立方晶窒化ホウ素の安
定な高圧高温条件下で処理する方法である。この
とき、厚膜状の外層にする場合は、窒化ホウ素の
他に窒化ホウ素の立方晶窒化ホウ素への転換のた
めの触媒作用となる、例えばホウ化アルミニウ
ム、窒化アルミニウム、ホウ窒化アルミニウムな
どを含有させておくと一層好ましいことである。 The purpose of the third method is to form an intermediate layer on the surface of the same substrate used in the first method in the same manner as in the first method, and then form a thick outer layer of about 0.05 mm to 0.8 mm. In this method, a powder or compacted powder is provided on the surface of the intermediate layer to form an outer layer, and then placed in a high-pressure and high-temperature device to process cubic boron nitride under stable high-pressure and high-temperature conditions. be. At this time, if a thick outer layer is to be formed, in addition to boron nitride, it may contain, for example, aluminum boride, aluminum nitride, aluminum boronitride, etc., which acts as a catalyst for the conversion of boron nitride to cubic boron nitride. It is even more preferable to leave it alone.
第４の方法は、第１の方法で用いたと同様の基
体の表面に粉末状、粉末圧粉体状又は板状体でな
る中間層を設けた後、この中間層の表面に外層を
形成するための粉末状又は粉末圧粉体状のものを
設け、次いで高圧高温装置に設置して立方晶窒化
ホウ素の安定な高圧高温条件下で処理する方法で
ある。 The fourth method is to provide an intermediate layer made of powder, compacted powder, or plate on the surface of the same substrate as used in the first method, and then form an outer layer on the surface of this intermediate layer. This is a method in which a powder or powder compact is prepared for the treatment, and then placed in a high-pressure, high-temperature device to process cubic boron nitride under stable high-pressure and high-temperature conditions.
第５の方法は、基体、中間層及び外層を全て粉
末状又は粉末圧粉体状として設けた後、高圧高温
装置に設置して、立方晶窒化ホウ素の安定な高圧
高温条件下で処理する方法である。 The fifth method is to provide the base, intermediate layer, and outer layer in the form of powder or compacted powder, and then place them in a high-pressure and high-temperature device to process cubic boron nitride under stable high-pressure and high-temperature conditions. It is.
このときの立方晶窒化ホウ素の安定な高圧高温
条件下とは、圧力4.5GPa以上、温度700℃で行な
うことができるが、特に圧力6.0GPa以上、温度
1500℃以上で行なうのが好ましい。 The stable high-pressure and high-temperature conditions for cubic boron nitride at this time can be carried out at a pressure of 4.5 GPa or higher and a temperature of 700°C, but in particular a pressure of 6.0 GPa or higher and a temperature of 700°C.
It is preferable to carry out the reaction at a temperature of 1500°C or higher.
（作用）
本発明の立方晶窒化ホウ素被覆部品は、外層に
隣接する中間層がホウ化アルミニウム又はホウ窒
化アルミニウムからなるアルミニウム化合物で、
このアルミニウム化合物が立方晶窒化ホウ素との
付着性を高めること、窒化ホウ素の立方晶窒化ホ
ウ素への転換作用を高めること並びにアルミニウ
ム化合物自体が高硬度性であるということから立
方晶窒化ホウ素の含有量が高く、緻密で膜状の外
層を形成しているものである。また、本発明の被
覆部品は、中間層と基体との付着性を高めること
ができるために被覆層の耐剥離性がすぐれている
ものである。この結果、本発明の被覆部品は、立
方晶窒化ホウ素自体の有している高硬度性、高熱
伝導性、高電気絶縁性などの諸特性を充分に発揮
することができるものである。(Function) The cubic boron nitride coated component of the present invention has an aluminum compound in which the intermediate layer adjacent to the outer layer is made of aluminum boride or aluminum boronitride,
This aluminum compound increases adhesion with cubic boron nitride, enhances the conversion effect of boron nitride to cubic boron nitride, and the aluminum compound itself has high hardness. It has a high density and forms a dense, membranous outer layer. Furthermore, the coated component of the present invention has excellent peeling resistance of the coating layer because it can improve the adhesion between the intermediate layer and the substrate. As a result, the coated component of the present invention can fully exhibit the various properties of cubic boron nitride itself, such as high hardness, high thermal conductivity, and high electrical insulation.
（実施例）
実施例 １
Al2O3−25wt％TiC−1wt％MgO組成のセラミ
ツクス焼結体で作成した形状寸法10φ×３mmの基
体の表面をダイヤモンド砥石で研摩後蒸留水及び
エチルアルコールで洗浄してから乾燥した。次い
で、基体を反応容器内に設置し、5vol％ACl3−
10vol％BCl3−25vol％Ar−60vol％H2雰囲気中、
圧力50Torr、温度1250℃、保持時間60分にて処
理し、基体の表面にホウ化アルミニウムの層を形
成させた。次に、容器内のガスを真空排気した
後、9vol％BCl3−25vol％H2−40vol％NH3−
26vol％Ar雰囲気中、圧力60Torr、温度1100℃、
保持時間90分の条件で処理してホウ化アルミニウ
ム層の表面に窒化ホウ素の層を形成させた。次い
で、これを高圧高温装置に設置して、圧力
6.5GPa、温度1650℃の条件で処理して本発明品
の被覆部品を得た。(Example) Example 1 The surface of a 10φ x 3mm base made of a ceramic sintered body with a composition of Al 2 O 3 -25wt%TiC-1wt%MgO was polished with a diamond grindstone and then washed with distilled water and ethyl alcohol. Then it was dried. Next, the substrate was placed in a reaction vessel and 5 vol% ACl 3 −
In an atmosphere of 10vol% BCl3−25vol %Ar−60vol% H2 ,
The treatment was carried out at a pressure of 50 Torr, a temperature of 1250° C., and a holding time of 60 minutes to form an aluminum boride layer on the surface of the substrate. Next, after evacuating the gas in the container, 9vol%BCl 3 −25vol%H 2 −40vol%NH 3 −
In 26vol%Ar atmosphere, pressure 60Torr, temperature 1100℃,
A boron nitride layer was formed on the surface of the aluminum boride layer by processing with a holding time of 90 minutes. Next, this is placed in a high-pressure, high-temperature device to
A coated part of the present invention was obtained by processing at a temperature of 6.5 GPa and a temperature of 1650°C.
比較用として、上述した本発明の被覆部品の製
造方法からホウ化アルミニウム層の形成工程を除
いて、その他の工程を同様に行なつて比較の被覆
部品を得た。 For comparison, a comparative coated part was obtained by performing the same steps as described above except for the step of forming an aluminum boride layer in the method for producing a coated part of the present invention.
こうして得た本発明の被覆部品と比較の被覆部
品の被覆層をＸ線回折及び走査型電子顕微鏡にて
調べた所、本発明の被覆部品は、外層が厚さ3μ
ｍの緻密な立方晶窒化ホウ素の層で、中間層が厚
さ1μｍのAlB2相当の層であり、比較の被覆部品
は、被覆層が厚さ3μｍで、六方晶窒化ホウ素の
層であつた。 When the coating layers of the thus obtained coated parts of the present invention and comparative coated parts were examined using X-ray diffraction and scanning electron microscopy, it was found that the coated parts of the present invention had an outer layer with a thickness of 3 μm.
The intermediate layer was a layer equivalent to AlB 2 with a thickness of 1 μm, and the coating part was a layer of hexagonal boron nitride with a thickness of 3 μm. .
実施例 ２
ZrO2−5wt％MgO組成のセラミツクス焼結体
で作成した形状寸法10φ×３mmの基体の表面を実
施例１と同様に処理した後、反応容器内に設置
し、5vol％ACl3−10vol％CO−10vol％CO2−
75vol％H2雰囲気中、圧力30Torr、温度1100℃、
保持時間120分にて処理して基体の表面に酸化ア
ルミニウムの層を形成させた。次に、容器内のガ
スを真空排気した後、5vol％AlCl3−10vol％
BCl3−25vol％Ar−60vol％H2雰囲気中、圧力
50Torr、温度1250℃、保持時間60分にて処理し、
酸化アルミニウム層の表面にホウ化アルミニウム
の層を形成させた。次に容器内のガスを真空排気
した後、10vol％BCl3−25vol％H2−40vol％NH3
−25vol％Ar雰囲気中、圧力60Torr、温度1100
℃、保持時間120分にて処理してホウ化アルミニ
ウム層の表面に窒化ホウ素の層を形成させた。次
いで、これを高圧高温装置に設置して、圧力
6GPa、温度1600℃の条件で処理して本発明品の
被覆部品を得た。Example 2 After treating the surface of a 10φ x 3 mm substrate made of a ceramic sintered body with a composition of ZrO 2 −5wt%MgO in the same manner as in Example 1, it was placed in a reaction vessel and treated with 5vol%ACl 3 − 10vol%CO−10vol% CO2−
75vol% H2 atmosphere, pressure 30Torr, temperature 1100℃,
The treatment was carried out for a holding time of 120 minutes to form an aluminum oxide layer on the surface of the substrate. Next, after evacuating the gas in the container, 5vol% AlCl3−10vol %
BCl 3 −25vol%Ar−60vol% H2 atmosphere, pressure
Processed at 50Torr, temperature 1250℃, holding time 60 minutes,
An aluminum boride layer was formed on the surface of the aluminum oxide layer. Next, after evacuating the gas in the container, 10vol%BCl 3 -25vol% H2 -40vol% NH3
-25vol%Ar atmosphere, pressure 60Torr, temperature 1100
℃ for a holding time of 120 minutes to form a boron nitride layer on the surface of the aluminum boride layer. Next, this is placed in a high-pressure, high-temperature device to
A coated part of the present invention was obtained by processing under conditions of 6 GPa and a temperature of 1600°C.
比較用として、上述した本発明の被覆部品の製
造方法から酸化アルミニウム層及びホウ化アルミ
ニウム層の形成工程を除いて、その他の工程を実
施例１と同様に行なつて比較の被覆部品を得た。 For comparison, a comparative coated part was obtained by performing the same steps as in Example 1 except for the steps of forming an aluminum oxide layer and an aluminum boride layer from the method for manufacturing a coated part of the present invention described above. .
こうして得た本発明の被覆部品と比較の被覆部
品を実施例１と同様に調べた所、本発明の被覆部
品は、外層が厚さ2μｍの緻密な立方晶窒化ホウ
素の層で、中間層が厚さ1μｍのAl2O3層と厚さ1μ
ｍのAlB2相当の層であり、比較の被覆部品は、
被覆層が厚さ2μｍで、六方晶窒化ホウ素の層で
あつた。 The thus obtained coated parts of the present invention and comparative coated parts were examined in the same manner as in Example 1, and it was found that the coated parts of the present invention had an outer layer of dense cubic boron nitride with a thickness of 2 μm, and an intermediate layer of 3 layers of 1μm thick Al 2 O and 1μm thick
The comparative coated part is a layer equivalent to AlB 2 of m.
The coating layer had a thickness of 2 μm and was a layer of hexagonal boron nitride.
実施例 ３
WC−8wt％TiC−８％TaC−８％Co組成の超
硬合金で作成した形状寸法10×10×５mmの基体の
表面を実施例１と同様に処理した後、反応容器内
に設置し、8vol％TiCl4−5vol％CH4−87vol％
H2雰囲気中、圧力20Torr、温度1000℃、保持時
間30分にて処理して基体の表面にチタン炭化物層
を形成させた。次いで、容器内のガスを真空排気
した後、5vol％AlCl3−10vol％CO−10vol％CO2
−75vol％H2雰囲気中、圧力30Torr、温度1100
℃、保持時間120分にて処理してチタン炭化物層
の表面に酸化アルミニウム層を形成させ、再度容
器内のガスを真空排気した後、5vol％AlCl3−
10vol％BCl3−25vol％Ar−60vol％H2雰囲気中、
圧力30Torr、温度1100℃、保持時間120分にて処
理して酸化アルミニウム層の表面にホウ化アルミ
ニウム層を形成させた。また、容器内のガスを真
空排気した後、10vol％BCl3−25vol％H2−40vol
％NH3−25vol％Ar雰囲気中、圧力50Torr、温
度1150℃、保持時間100分にて処理してホウ化ア
ルミニウム層の表面に窒化ホウ素の層を形成させ
た。次に、これを高圧高温装置に設置して、圧力
60GPa、温度1500℃の条件で処理して本発明品の
被覆部品を得た。Example 3 After treating the surface of a 10 x 10 x 5 mm substrate made of cemented carbide with a composition of WC-8wt%TiC-8%TaC-8%Co in the same manner as in Example 1, it was placed in a reaction vessel. Set up 8vol% TiCl4−5vol % CH4−87vol %
A titanium carbide layer was formed on the surface of the substrate by treatment in an H 2 atmosphere at a pressure of 20 Torr, a temperature of 1000° C., and a holding time of 30 minutes. Then, after evacuating the gas in the container, 5vol% AlCl3−10vol %CO−10vol% CO2
−75vol% H2 atmosphere, pressure 30Torr, temperature 1100
℃ for a holding time of 120 minutes to form an aluminum oxide layer on the surface of the titanium carbide layer, and after evacuating the gas in the container again, 5vol% AlCl 3 −
In an atmosphere of 10vol% BCl3−25vol %Ar−60vol% H2 ,
An aluminum boride layer was formed on the surface of the aluminum oxide layer by processing at a pressure of 30 Torr, a temperature of 1100° C., and a holding time of 120 minutes. In addition, after evacuating the gas in the container, 10vol%BCl 3 −25vol%H 2 −40vol
% NH3-25vol %Ar atmosphere at a pressure of 50 Torr, a temperature of 1150°C, and a holding time of 100 minutes to form a boron nitride layer on the surface of the aluminum boride layer. Next, this is installed in a high-pressure, high-temperature device, and the pressure is
A coated part of the present invention was obtained by processing at a temperature of 60 GPa and a temperature of 1500°C.
比較用として、上述した本発明の被覆部品の製
造方法からチタン炭化物層、酸化アルミニウム層
及びホウ化アルミニウム層の形成工程を除いて、
その他の工程を実施例１と同様に行なつて比較の
被覆部品を得た。 For comparison, the method for manufacturing a coated component of the present invention described above except for the steps of forming a titanium carbide layer, an aluminum oxide layer, and an aluminum boride layer,
Other steps were carried out in the same manner as in Example 1 to obtain a comparative coated part.
こうして得た本発明の被覆部品と比較の被覆部
品を実施例１と同様に調べた所、本発明の被覆部
品は、外層が厚さ2μｍの緻密な立方晶窒化ホウ
素の層で、中間層が厚さ1μｍのTiC層と厚さ1μｍ
のAl2O3層と厚さ1μｍのAlB2相当の層であり、比
較の被覆部品は、被覆層が厚さ2μｍで、六方晶
窒化ホウ素の層であつた。 The thus obtained coated parts of the present invention and comparative coated parts were examined in the same manner as in Example 1, and it was found that the coated parts of the present invention had an outer layer of dense cubic boron nitride with a thickness of 2 μm, and an intermediate layer of 1μm thick TiC layer and 1μm thick
3 layers of Al 2 O and a layer equivalent to AlB 2 with a thickness of 1 μm, and the coating layer of the comparative coated part was a layer of hexagonal boron nitride with a thickness of 2 μm.
実施例 ４
WC−6wt％Co組成の超硬合金で作成した形状
寸法10×10×５mmの基体の表面を実施例３と同様
にしてチタン炭化物層、酸化アルミニウム層及び
ホウ化アルミニウム層を形成させた後、高出力可
変高周波熱プラズマ発生装置によつて高プラズマ
を発生させた容器内に設置し、20vol％B3N3H6
−40vol％NH3−40vol％H2雰囲気中、温度1200
℃、で処理してホウ化アルミニウム層の表面に窒
化ホウ素の層を形成させて本発明品の被覆部品を
得た。Example 4 A titanium carbide layer, an aluminum oxide layer, and an aluminum boride layer were formed on the surface of a substrate with dimensions of 10 x 10 x 5 mm made of cemented carbide having a composition of WC-6wt%Co in the same manner as in Example 3. After that, it was placed in a container in which high plasma was generated by a high output variable high frequency thermal plasma generator, and 20vol%B 3 N 3 H 6
-40vol% NH3 -40vol% H2 in atmosphere, temperature 1200
℃ to form a layer of boron nitride on the surface of the aluminum boride layer to obtain a coated part of the present invention.
比較用として、上述の窒化ホウ素の層を形成さ
せる方法と同様にして、基体の表面に直接窒化ホ
ウ素の層を形成させて比較の被覆部品を得た。 For comparison, a coated part for comparison was obtained by forming a layer of boron nitride directly on the surface of the substrate in the same manner as the method for forming the layer of boron nitride described above.
こうして得た本発明の被覆部品と比較の被覆部
品の被覆層を実施例１と同様にして調べた所、本
発明の被覆部品は外層が厚さ2μｍの立方晶窒化
ホウ素を主体とする層で、中間層が厚さ1μｍの
TiC層と厚さ1μｍのAl2O3層と厚さ1μｍのAlB2相
当の層であり、比較の被覆部品は、被覆層が厚さ
2μｍで、立方晶窒化ホウ素の微量含有した六方
晶窒化ホウ素の層であつた。 The coating layers of the thus obtained coated part of the present invention and the comparative coated part were examined in the same manner as in Example 1, and it was found that the coated part of the present invention had an outer layer mainly composed of cubic boron nitride with a thickness of 2 μm. , the intermediate layer is 1 μm thick
A TiC layer, 3 Al 2 O layers with a thickness of 1 μm, and a layer equivalent to AlB 2 with a thickness of 1 μm.
It was a layer of hexagonal boron nitride with a thickness of 2 μm and containing a trace amount of cubic boron nitride.
（発明の効果）
上述の如く、本発明の立方晶窒化ホウ素被覆部
品は、基体と外層との間に中間層を介在させるこ
とによつて、被覆層の耐剥離性が著しくすぐれる
と共に緻密で立方晶窒化ホウ素の含有量の多い外
層が形成されているものである。このために、従
来の立方晶窒化ホウ素焼結体が用いられている切
削工具及び耐摩耗工具から更には形状及び用途的
に制約を受けている、例えばミクロンドリル、ド
ツトピン、ブレーカー付きスローアウエイチツプ
など複雑形状の工具部材にも応用することができ
る。また、立方晶窒化ホウ素からなる外層が緻密
でバラツキの少ないものであることから立方晶窒
化ホウ素の特性を利用した半導体基板をはじめ各
種の電子又は電気部品関係に応用できる産業上有
用な材料である。(Effects of the Invention) As described above, the cubic boron nitride-coated parts of the present invention have extremely excellent peeling resistance of the coating layer and are dense by interposing the intermediate layer between the base and the outer layer. An outer layer with a high content of cubic boron nitride is formed. For this reason, the cutting tools and wear-resistant tools in which conventional cubic boron nitride sintered bodies are used are further restricted in terms of shape and use, such as micron drills, dot pins, throw-away chips with breakers, etc. It can also be applied to tool members with complex shapes. In addition, because the outer layer made of cubic boron nitride is dense and has little variation, it is an industrially useful material that can be applied to various electronic or electrical parts, including semiconductor substrates that utilize the characteristics of cubic boron nitride. .
Claims (1)
る外層を形成してなる被覆部品において、前記基
体と前記外層との間に１層又は多層で構成される
中間層を介在させ、前記外層に隣接する該中間層
がホウ化アルミニウム又はホウ窒化アルミニウム
からなるアルミニウム化合物層によつて形成され
ていることを特徴とする立方晶窒化ホウ素被覆部
品。 ２ 上記中間層は、上記外層に隣接するアルミニ
ウム化合物層と１層又は多層で構成される密着補
助層からなり、前記アルミニウム化合物層に隣接
する該密着補助層が周期律表4a、5a、6a族金属
のホウ化物、酸化アルミニウム又は窒化アルミニ
ウム及びこれらの相互固溶体から選ばれる１種以
上の第１密着補助層であることを特徴とする特許
請求の範囲第１項記載の立方晶窒化ホウ素被覆部
品。 ３ 上記中間層において、上記第１密着補助層に
隣接する第２密着補助層が周期律表4a、5a、6a
族金属の炭化物、窒化物、酸化物及びこれらの相
互固溶体から選ばれる１種以上の成分からなるこ
とを特徴とする特許請求の範囲第２項記載の立方
晶窒化ホウ素被覆部品。[Scope of Claims] 1. A coated part formed by forming an outer layer mainly composed of cubic boron nitride on the surface of a base, wherein an intermediate layer composed of one layer or multiple layers is provided between the base and the outer layer. A cubic boron nitride coated component, characterized in that the intervening intermediate layer adjacent to the outer layer is formed of an aluminum compound layer consisting of aluminum boride or aluminum boron nitride. 2 The intermediate layer is composed of an aluminum compound layer adjacent to the outer layer and an adhesion auxiliary layer composed of one layer or multiple layers, and the adhesion auxiliary layer adjacent to the aluminum compound layer is composed of a group 4a, 5a, or 6a of the periodic table. The cubic boron nitride coated component according to claim 1, wherein the first adhesion auxiliary layer is one or more types selected from metal borides, aluminum oxide, aluminum nitride, and mutual solid solutions thereof. 3 In the intermediate layer, the second adhesion auxiliary layer adjacent to the first adhesion auxiliary layer is a layer of the periodic table 4a, 5a, 6a.
3. The cubic boron nitride-coated component according to claim 2, characterized in that it comprises one or more components selected from group metal carbides, nitrides, oxides, and mutual solid solutions thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25040885A JPS62109975A (en) | 1985-11-08 | 1985-11-08 | Member covered with cubic boron nitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25040885A JPS62109975A (en) | 1985-11-08 | 1985-11-08 | Member covered with cubic boron nitride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62109975A JPS62109975A (en) | 1987-05-21 |
| JPH0526868B2 true JPH0526868B2 (en) | 1993-04-19 |
Family
ID=17207450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25040885A Granted JPS62109975A (en) | 1985-11-08 | 1985-11-08 | Member covered with cubic boron nitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62109975A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69205075T2 (en) * | 1991-06-25 | 1996-03-21 | Sumitomo Electric Industries | Hard sintered compact for tools. |
| JP6337733B2 (en) * | 2014-10-10 | 2018-06-06 | 新日鐵住金株式会社 | Carbide tool |
-
1985
- 1985-11-08 JP JP25040885A patent/JPS62109975A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62109975A (en) | 1987-05-21 |
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