JPH05259137A - Cleaning apparatus for mask - Google Patents
Cleaning apparatus for maskInfo
- Publication number
- JPH05259137A JPH05259137A JP5238292A JP5238292A JPH05259137A JP H05259137 A JPH05259137 A JP H05259137A JP 5238292 A JP5238292 A JP 5238292A JP 5238292 A JP5238292 A JP 5238292A JP H05259137 A JPH05259137 A JP H05259137A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- cleaning
- arm
- mask substrate
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は半導体製造におけるリソ
グラフィに使用されるマスク基板を洗浄するためのマス
ク洗浄装置である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask cleaning apparatus for cleaning a mask substrate used for lithography in semiconductor manufacturing.
【０００２】[0002]
【従来の技術】近年、半導体製造において微細化が進
み、それに伴いマスク基板上に堆積したパーティクル等
を除去する洗浄が重要になっている。2. Description of the Related Art In recent years, miniaturization has progressed in semiconductor manufacturing, and as a result, cleaning for removing particles and the like deposited on a mask substrate has become important.
【０００３】以下、従来のマスク洗浄機について説明す
る。図５は従来のマスク洗浄機である。１はマスク基板
をつかむアームである。２はアームを動かす駆動系であ
る。３はマスクを洗浄する洗浄漕である。４はマスクを
水洗する水洗漕である。５は全ての動作を制御する制御
系である。６はマスク基板である。７は乾燥機である。A conventional mask cleaning machine will be described below. FIG. 5 shows a conventional mask cleaning machine. Reference numeral 1 is an arm that holds the mask substrate. 2 is a drive system for moving the arm. Reference numeral 3 is a washing tank for washing the mask. Reference numeral 4 is a washing tank for washing the mask with water. Reference numeral 5 is a control system for controlling all operations. 6 is a mask substrate. 7 is a dryer.
【０００４】まず、硫酸と過酸化水素水の混合液などの
洗浄液を入れてある洗浄漕３にアーム１でマスク基板６
を運び洗浄液の中に漬け洗浄を行なう。次にアーム１で
マスク基板６を水洗漕４に運び純水のシャワーなどを行
い水洗し、洗浄液を取り除く。次にアーム１でマスク基
板６を乾燥機７に運び乾燥する。このようにしてマスク
の洗浄が行われる。First, the mask substrate 6 is moved by the arm 1 into a cleaning tank 3 containing a cleaning solution such as a mixed solution of sulfuric acid and hydrogen peroxide.
Carry and soak it in the cleaning solution for cleaning. Next, the mask substrate 6 is carried to the water washing tank 4 by the arm 1 and showered with pure water to wash it, thereby removing the washing liquid. Next, the mask substrate 6 is carried to the dryer 7 by the arm 1 and dried. In this way, the mask is cleaned.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上記従
来の構成ではマスク製作時のベルト搬送やハンドリング
によるマスク裏面や側面の汚れが洗浄漕３でマスク表面
に再付着するという課題があった。However, in the above-mentioned conventional structure, there is a problem that dirt on the back and side surfaces of the mask due to belt conveyance and handling during mask production is redeposited on the mask surface in the cleaning tank 3.
【０００６】本発明は上記従来の課題を解決するもの
で、マスク製作時のベルト搬送やハンドリングによるマ
スク裏面や側面の汚れが洗浄漕でマスク表面に再付着す
る事なしに洗浄できるマスク洗浄機を提供することを目
的とする。The present invention solves the above-mentioned conventional problems, and provides a mask cleaning machine capable of cleaning without causing dirt on the back and side surfaces of the mask due to belt conveyance and handling during mask manufacturing to be reattached to the mask surface in a cleaning tank. The purpose is to provide.
【０００７】[0007]
【課題を解決するための手段】この目的を達成するため
に本発明のマスク洗浄機は、マスク基板をつかむアーム
と、前記アームを動かす駆動系と、前記マスクを洗浄す
る２つの洗浄漕と、純水を放出するノズルと、前記マス
クを水洗する水洗漕と、前記アームと前記駆動系と前記
２つの洗浄槽と前記ノズルと前記水洗槽の動作を制御す
る制御系を備えている。In order to achieve this object, a mask cleaning machine of the present invention comprises an arm for holding a mask substrate, a drive system for moving the arm, and two cleaning tanks for cleaning the mask. It is provided with a nozzle for discharging pure water, a water washing tank for washing the mask with water, the arm, the drive system, the two washing tanks, and a control system for controlling the operations of the nozzle and the water washing tank.
【０００８】[0008]
【作用】この構成によって、１つ目の洗浄漕でマスク製
作時のベルト搬送やハンドリングによるマスク裏面や側
面の汚れを落とすことができ、２つ目の洗浄漕で洗浄液
に漬けても裏面や側面の汚れがマスク表面に再付着する
事なしにマスク基板を洗浄することができる。With this configuration, the first cleaning tank can remove dirt on the back and side surfaces of the mask due to belt conveyance and handling during mask manufacturing, and the back and side surfaces can be cleaned even when immersed in the cleaning solution in the second cleaning tank. It is possible to clean the mask substrate without the stains from reattaching to the mask surface.
【０００９】[0009]
【実施例】以下、本発明の第１の実施例に付いて、図面
を参照しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to the drawings.
【００１０】図１は本発明の第１の実施例におけるマス
ク洗浄機の概略図を示すものである。FIG. 1 is a schematic view of a mask cleaning machine according to the first embodiment of the present invention.
【００１１】図１において、１はマスク基板をつかむア
ームである。２はアームを動かす駆動系である。３、８
はマスクを洗浄する洗浄漕である。４はマスクを水洗す
る水洗漕である。５は全ての動作を制御する制御系であ
る。６はマスク基板である。７は乾燥機である。９は純
水を放出するノズルである。In FIG. 1, reference numeral 1 is an arm for holding the mask substrate. 2 is a drive system for moving the arm. 3, 8
Is a washing tank for washing the mask. Reference numeral 4 is a washing tank for washing the mask with water. Reference numeral 5 is a control system for controlling all operations. 6 is a mask substrate. 7 is a dryer. Reference numeral 9 is a nozzle for discharging pure water.
【００１２】まず、洗浄漕３にアーム１でマスク基板６
を運ぶ。次にこのマスク基板６の裏面及び側面のみに、
ノズル９から放出された純水があたるようにアーム１及
び純水の放出のタイミングを制御系５でコントロールし
て裏面と側面の洗浄を行い汚れを落とす。次に硫酸と過
酸化水素水の混合液などの洗浄液を入れてある洗浄漕８
にアーム１でマスク基板６を運び洗浄液の中に漬け洗浄
を行なう。次にアーム１でマスク基板６を水洗漕４に運
び純水のシャワーなどを行い水洗し、洗浄液を取り除
く。次にアーム１でマスク基板６を乾燥機７に運び乾燥
する。その結果、裏面や側面の汚れがマスク表面に再付
着する事なしにマスク基板の洗浄ができる。First, the mask substrate 6 is placed on the cleaning tank 3 by the arm 1
carry. Next, only on the back surface and the side surface of the mask substrate 6,
The control system 5 controls the timing of discharging the arm 1 and pure water so that the pure water discharged from the nozzle 9 hits, and the back surface and side surface are cleaned to remove dirt. Next, a washing tank 8 containing a washing liquid such as a mixed liquid of sulfuric acid and hydrogen peroxide water.
Then, the mask substrate 6 is carried by the arm 1 and immersed in the cleaning liquid for cleaning. Next, the mask substrate 6 is carried to the water washing tank 4 by the arm 1 and showered with pure water to wash it, thereby removing the washing liquid. Next, the mask substrate 6 is carried to the dryer 7 by the arm 1 and dried. As a result, the mask substrate can be cleaned without the dirt on the back surface or the side surface reattaching to the mask surface.
【００１３】次に、本発明の第２の実施例に付いて、図
面を参照しながら説明する。図２は本発明の第２の実施
例におけるマスク洗浄機の概略図を示すものである。図
２において、１はマスク基板をつかむアーム、２はアー
ムを動かす駆動系、３、８はマスクを洗浄する洗浄漕、
４はマスクを水洗する水洗漕、５は全ての動作を制御す
る制御系、６はマスク基板、７は乾燥機、９は純水を放
出するノズル、１０はマスク基板を洗浄するブラシであ
る。Next, a second embodiment of the present invention will be described with reference to the drawings. FIG. 2 is a schematic view of a mask cleaning machine according to the second embodiment of the present invention. In FIG. 2, 1 is an arm for grasping the mask substrate, 2 is a drive system for moving the arm, 3 and 8 are cleaning tanks for cleaning the mask,
4 is a water washing tank for washing the mask with water, 5 is a control system for controlling all operations, 6 is a mask substrate, 7 is a dryer, 9 is a nozzle for discharging pure water, and 10 is a brush for washing the mask substrate.
【００１４】まず、洗浄漕３にアーム１でマスク基板６
を運ぶ。次にこのマスク基板６の裏面及び側面のみに、
ノズル９から放出された純水があたるようにアーム１及
び純水の放出のタイミングを制御系５でコントロールし
裏面と側面の洗浄を行い汚れを落とすと共にブラシ１０
でマスク基板６の裏面及び側面を擦り更に付着強度の強
い汚れを落とす。次に硫酸と過酸化水素水の混合液など
の洗浄液を入れてある洗浄漕８にアーム１でマスク基板
６を運び洗浄液の中に漬け洗浄を行なう。次にアーム１
でマスク基板６を水洗漕４に運び純水のシャワーなどを
行い水洗し、洗浄液を取り除く。次にアーム１でマスク
基板６を乾燥機７に運び乾燥する。その結果、裏面や側
面の汚れがマスク表面に再付着する事なしにマスク基板
の洗浄ができる。First, the mask substrate 6 is mounted on the washing tank 3 by the arm 1
carry. Next, only on the back surface and the side surface of the mask substrate 6,
The control system 5 controls the timing of discharging the arm 1 and the pure water so that the pure water discharged from the nozzle 9 hits, and the back surface and the side surface are cleaned to remove dirt and the brush 10
Then, the back surface and the side surface of the mask substrate 6 are rubbed to further remove stains having high adhesion strength. Next, the mask substrate 6 is carried by the arm 1 to the cleaning tank 8 containing a cleaning liquid such as a mixed liquid of sulfuric acid and hydrogen peroxide water, and the mask substrate 6 is immersed in the cleaning liquid for cleaning. Next arm 1
Then, the mask substrate 6 is carried to the water washing tank 4 and showered with pure water to wash it with water to remove the washing liquid. Next, the mask substrate 6 is carried to the dryer 7 by the arm 1 and dried. As a result, the mask substrate can be cleaned without the dirt on the back surface or the side surface reattaching to the mask surface.
【００１５】次に、本発明の第３の実施例に付いて、図
面を参照しながら説明する。図３は本発明の第３の実施
例におけるマスク洗浄機の概略図を示すものである。Next, a third embodiment of the present invention will be described with reference to the drawings. FIG. 3 is a schematic view of a mask cleaning machine according to the third embodiment of the present invention.
【００１６】図３において、１はマスク基板をつかむア
ーム、２はアームを動かす駆動系、３、８はマスクを洗
浄する洗浄漕、４はマスクを水洗する水洗漕、５は全て
の動作を制御する制御系、６はマスク基板、７は乾燥
機、１１は純水を高圧で噴射するノズル、１２は純水に
圧力を加えるポンプである。In FIG. 3, 1 is an arm for grasping a mask substrate, 2 is a drive system for moving the arm, 3 and 8 are washing tanks for washing the mask, 4 is a water washing tank for washing the mask with water, and 5 is a control of all operations. A control system, 6 is a mask substrate, 7 is a dryer, 11 is a nozzle for injecting pure water at high pressure, and 12 is a pump for applying pressure to pure water.
【００１７】まず、洗浄漕３にアーム１でマスク基板６
を運ぶ。次にこのマスク基板６の裏面及び側面のみに、
ポンプ１２で加圧しノズル１１から噴射した純水があた
るようにアーム１及び純水の噴射のタイミングを制御系
５でコントロールして裏面と側面の更に付着強度の強い
汚れを基板の損傷無しに落とす。次に硫酸と過酸化水素
水の混合液などの洗浄液を入れてある洗浄漕８にアーム
１でマスク基板６を運び洗浄液の中に漬け洗浄を行な
う。次にアーム１でマスク基板６を水洗漕４に運び純水
のシャワーなどを行い水洗し、洗浄液を取り除く。次に
アーム１でマスク基板６を乾燥機７に運び乾燥する。そ
の結果、裏面や側面の汚れがマスク表面に再付着する事
なしにマスク基板の洗浄ができる。First, the mask substrate 6 is mounted on the cleaning tank 3 by the arm 1
carry. Next, only on the back surface and the side surface of the mask substrate 6,
The control system 5 controls the timing of the spraying of the arm 1 and pure water so that the pure water sprayed from the nozzle 11 and pressurized by the pump 12 is removed by removing the stains having stronger adhesion strength on the back and side surfaces without damaging the substrate. . Next, the mask substrate 6 is carried by the arm 1 to the cleaning tank 8 containing a cleaning liquid such as a mixed liquid of sulfuric acid and hydrogen peroxide water, and the mask substrate 6 is immersed in the cleaning liquid for cleaning. Next, the mask substrate 6 is carried to the water washing tank 4 by the arm 1 and showered with pure water to wash it, and the washing liquid is removed. Next, the mask substrate 6 is carried to the dryer 7 by the arm 1 and dried. As a result, the mask substrate can be cleaned without the dirt on the back surface or the side surface reattaching to the mask surface.
【００１８】次に、本発明の第４の実施例に付いて、図
面を参照しながら説明する。図４は本発明の第４の実施
例におけるマスク洗浄機の概略図を示すものである。Next, a fourth embodiment of the present invention will be described with reference to the drawings. FIG. 4 is a schematic view of a mask cleaning machine according to the fourth embodiment of the present invention.
【００１９】図４において、１はマスク基板をつかむア
ーム、２はアームを動かす駆動系、３、８はマスクを洗
浄する洗浄漕、４はマスクを水洗する水洗漕、５は全て
の動作を制御する制御系、６はマスク基板、７は乾燥
機、１３は超音波を掛けた純水を放出するノズル、１４
は純水に超音波を掛ける発振器である。In FIG. 4, 1 is an arm for grasping a mask substrate, 2 is a drive system for moving the arm, 3 and 8 are washing tanks for washing the mask, 4 is a water washing tank for washing the mask with water, and 5 is a control of all operations. Control system, 6 is a mask substrate, 7 is a drier, 13 is a nozzle for emitting pure water subjected to ultrasonic waves, 14
Is an oscillator that applies ultrasonic waves to pure water.
【００２０】まず、洗浄漕３にアーム１でマスク基板６
を運ぶ。次にこのマスク基板６の裏面及び側面のみに、
発振器１４で超音波を掛けノズル１１から放出した純水
があたるようにアーム１及び純水の放出のタイミングを
制御系５でコントロールして裏面と側面の更に細かい汚
れを落とす。次に硫酸と過酸化水素水の混合液などの洗
浄液を入れてある洗浄漕８にアーム１でマスク基板６を
運び洗浄液の中に漬け洗浄を行なう。次にアーム１でマ
スク基板６を水洗漕４に運び純水のシャワーなどを行い
水洗し、洗浄液を取り除く。次にアーム１でマスク基板
６を乾燥機７に運び乾燥する。その結果、裏面や側面の
汚れがマスク表面に再付着する事なしにマスク基板の洗
浄ができる。First, the mask substrate 6 is mounted on the cleaning tank 3 with the arm 1.
carry. Next, only on the back surface and the side surface of the mask substrate 6,
The control system 5 controls the timing of the arm 1 and the release of the pure water so that the pure water emitted from the nozzle 11 by applying ultrasonic waves with the oscillator 14 can be cleaned to remove finer dirt on the back and side surfaces. Next, the mask substrate 6 is carried by the arm 1 to the cleaning tank 8 containing a cleaning liquid such as a mixed liquid of sulfuric acid and hydrogen peroxide water, and the mask substrate 6 is immersed in the cleaning liquid for cleaning. Next, the mask substrate 6 is carried to the water washing tank 4 by the arm 1 and showered with pure water to wash it, thereby removing the washing liquid. Next, the mask substrate 6 is carried to the dryer 7 by the arm 1 and dried. As a result, the mask substrate can be cleaned without the dirt on the back surface or the side surface reattaching to the mask surface.
【００２１】以上のように本実施例の第１の手段は、マ
スク基板をつかむアームと前記アームを動かす駆動系と
マスクを洗浄する２つの洗浄漕と純水を放出するノズル
とマスクを水洗する水洗漕と全ての動作を制御する制御
系を備えている。また第２の手段は、マスク基板をつか
むアームと前記アームを動かす駆動系とマスクを洗浄す
る２つの洗浄漕と純水を放出するノズルとマスク基板を
洗浄するブラシとマスクを水洗する水洗漕と全ての動作
を制御する制御系を備えている。また第３の手段は、マ
スク基板をつかむアームと前記アームを動かす駆動系と
マスクを洗浄する２つの洗浄漕と純水を高圧で噴射する
ノズルと純水に圧力を加えるポンプとマスクを水洗する
水洗漕と全ての動作を制御する制御系を備えている。ま
た第４の手段は、マスク基板をつかむアームと前記アー
ムを動かす駆動系とマスクを洗浄する２つの洗浄漕と超
音波を掛けた純水を放出するノズルと純水に超音波を掛
ける発振器とマスクを水洗する水洗漕と全ての動作を制
御する制御系を備えている。このため１つ目の洗浄漕で
マスク製作時のベルト搬送やハンドリングによるマスク
裏面や側面の汚れを落とすことができ、二つ目の洗浄漕
で洗浄液に漬けても裏面や側面の汚れがマスク表面に再
付着する事なしにマスク基板を洗浄することができる優
れたマスク洗浄装置である。As described above, according to the first means of this embodiment, the arm for holding the mask substrate, the drive system for moving the arm, the two cleaning tanks for cleaning the mask, the nozzle for discharging pure water, and the mask are rinsed with water. It is equipped with a flush tank and a control system that controls all operations. The second means is an arm for holding the mask substrate, a drive system for moving the arm, two cleaning tanks for cleaning the mask, a nozzle for discharging pure water, a brush for cleaning the mask substrate, and a water tank for cleaning the mask. It has a control system that controls all operations. A third means is to wash the mask for holding the mask substrate, a drive system for moving the arm, two washing tanks for washing the mask, a nozzle for injecting pure water at high pressure, a pump for applying pressure to the pure water, and the mask. It is equipped with a flush tank and a control system that controls all operations. A fourth means is an arm for grabbing the mask substrate, a drive system for moving the arm, two cleaning tanks for cleaning the mask, a nozzle for emitting pure water to which ultrasonic waves are applied, and an oscillator for applying ultrasonic waves to the pure water. It is equipped with a washing tank for washing the mask and a control system for controlling all operations. For this reason, the first cleaning tank can remove dirt on the back and side surfaces of the mask due to belt conveyance and handling during mask production, and even if it is immersed in the cleaning solution in the second cleaning tank, dirt on the back surface and side surfaces remains on the mask surface. It is an excellent mask cleaning device that can clean the mask substrate without reattaching to the mask substrate.
【００２２】[0022]
【発明の効果】本発明によれば、１つ目の洗浄漕でマス
ク製作時のベルト搬送やハンドリングによるマスク裏面
や側面の汚れを落とすことができ、二つ目の洗浄漕で洗
浄液に漬けても裏面や側面の汚れがマスク表面に再付着
する事なしにマスク基板を洗浄することができる。EFFECTS OF THE INVENTION According to the present invention, the first cleaning tank can remove dirt on the back and side surfaces of the mask due to belt conveyance and handling during mask production, and can be immersed in the cleaning solution in the second cleaning tank. In addition, the mask substrate can be cleaned without the dirt on the back surface or the side surface reattaching to the mask surface.
【図１】本発明の第１の実施例におけるマスク洗浄装置
の概略図FIG. 1 is a schematic view of a mask cleaning apparatus according to a first embodiment of the present invention.
【図２】本発明の第２の実施例におけるマスク洗浄装置
の概略図FIG. 2 is a schematic view of a mask cleaning apparatus according to a second embodiment of the present invention.
【図３】本発明の第３の実施例におけるマスク洗浄装置
の概略図FIG. 3 is a schematic view of a mask cleaning apparatus according to a third embodiment of the present invention.
【図４】本発明の第４の実施例におけるマスク洗浄装置
の概略図FIG. 4 is a schematic diagram of a mask cleaning apparatus according to a fourth embodiment of the present invention.
【図５】従来のマスク洗浄装置の概略図FIG. 5 is a schematic view of a conventional mask cleaning device.
１ マスク基板をつかむアーム ２ アームを動かす駆動系 ３ マスクを洗浄する洗浄漕 ４ マスクを水洗する水洗漕 ５ 全ての動作を制御する制御系 ６ マスク基板 ７ 乾燥機 ８ マスクを洗浄する洗浄漕 ９ 純水を放出するノズル 1 Arm for grasping the mask substrate 2 Drive system for moving the arm 3 Washing tank for washing the mask 4 Water washing tank for washing the mask 5 Control system for controlling all operations 6 Mask substrate 7 Dryer 8 Washing tank for washing the mask 9 Pure Nozzle that discharges water
Claims (4)
を動かす駆動系と、前記マスクを洗浄する２つの洗浄漕
と、純水を放出するノズルと、前記マスクを水洗する水
洗漕と、前記アームと前記駆動系と前記２つの洗浄槽と
前記ノズルと前記水洗槽の動作を制御する制御系を備え
たことを特徴とするマスク洗浄装置。1. An arm for holding a mask substrate, a drive system for moving the arm, two cleaning tanks for cleaning the mask, a nozzle for discharging pure water, a water cleaning tank for cleaning the mask, and the arm. A mask cleaning apparatus comprising: a drive system; the two cleaning tanks; a control system for controlling the operations of the nozzles and the water cleaning tank.
れ、前記制御系によって前記ブラシの動作を制御してい
ることを特徴とする請求項１記載のマスク洗浄装置。2. The mask cleaning apparatus according to claim 1, further comprising a brush for cleaning the mask substrate, wherein the control system controls the operation of the brush.
れ、前記制御系によって前記ポンプの動作を制御してい
ることを特徴とする請求項１記載のマスク洗浄装置。3. The mask cleaning apparatus according to claim 1, further comprising a pump for applying a pressure to the pure water, and the operation of the pump is controlled by the control system.
られ、前記制御系によって前記超音波の動作を制御して
いることを特徴とする請求項１記載のマスク洗浄装置。4. The mask cleaning apparatus according to claim 1, further comprising an oscillator for applying ultrasonic waves to the pure water, and the operation of the ultrasonic waves is controlled by the control system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5238292A JPH05259137A (en) | 1992-03-11 | 1992-03-11 | Cleaning apparatus for mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5238292A JPH05259137A (en) | 1992-03-11 | 1992-03-11 | Cleaning apparatus for mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05259137A true JPH05259137A (en) | 1993-10-08 |
Family
ID=12913259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5238292A Pending JPH05259137A (en) | 1992-03-11 | 1992-03-11 | Cleaning apparatus for mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05259137A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007052300A (en) * | 2005-08-19 | 2007-03-01 | Pre-Tech Co Ltd | Cleaning device for mask substrate, and cleaning method for mask substrate using the same |
| US7581551B2 (en) * | 2004-09-01 | 2009-09-01 | Sanyo Electric Co., Ltd. | Cleaning apparatus |
| KR101386317B1 (en) * | 2007-09-03 | 2014-04-18 | 엘지디스플레이 주식회사 | Mask cleaning equipment and method for cleaning mask |
-
1992
- 1992-03-11 JP JP5238292A patent/JPH05259137A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7581551B2 (en) * | 2004-09-01 | 2009-09-01 | Sanyo Electric Co., Ltd. | Cleaning apparatus |
| JP2007052300A (en) * | 2005-08-19 | 2007-03-01 | Pre-Tech Co Ltd | Cleaning device for mask substrate, and cleaning method for mask substrate using the same |
| KR101386317B1 (en) * | 2007-09-03 | 2014-04-18 | 엘지디스플레이 주식회사 | Mask cleaning equipment and method for cleaning mask |
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