JPH0466290A - Laser beam machine - Google Patents
Laser beam machineInfo
- Publication number
- JPH0466290A JPH0466290A JP2175677A JP17567790A JPH0466290A JP H0466290 A JPH0466290 A JP H0466290A JP 2175677 A JP2175677 A JP 2175677A JP 17567790 A JP17567790 A JP 17567790A JP H0466290 A JPH0466290 A JP H0466290A
- Authority
- JP
- Japan
- Prior art keywords
- differential pressure
- window
- laser beam
- vacuum container
- pressure chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 21
- 239000007789 gas Substances 0.000 abstract description 36
- 239000000463 material Substances 0.000 abstract description 13
- 230000000694 effects Effects 0.000 abstract description 8
- 239000011261 inert gas Substances 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は真空中でレーザーによる材料の加工を行う装
置に係り、より詳しくはウィンドウを通して導入するレ
ーザー光により被加工物を加工する際に、ウィンドウへ
の蒸着を防止し、レーザー加工を長時間安定して行うこ
とができるレーザー加工装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to an apparatus for processing materials using a laser in a vacuum. The present invention relates to a laser processing device that can prevent vapor deposition and perform laser processing stably for a long time.
従来の技術
レーザー加工装置は、真空容器のウィンドウを通して導
入するレーザー光により該真空容器内の被加工物を加工
する装置であり、構造的には第４図にその概要を示すご
とく、真空容器（１）のレーザー光導入部（２）にウィ
ンドウ（３）を設け、集光しンズ（４）を通過したレー
ザー光（７）をウィンドウ（３）を通して真空容器（１
）内の被加工物（５）に照射する構造となしたもので、
図面では被加工物の蒸気を基板（６）に蒸着させる例を
示している。A conventional laser processing device is a device that processes a workpiece in a vacuum container using a laser beam introduced through a window of the vacuum container, and its structure is as shown in Fig. 4. A window (3) is provided in the laser light introduction part (2) of 1), and the laser light (7) that has passed through the condensing lens (4) passes through the window (3) and enters the vacuum vessel (1).
) has a structure that irradiates the workpiece (5) within
The drawing shows an example in which the vapor of the workpiece is deposited on the substrate (6).
しかし、この種のレーザー加工装置においては、真空容
器内の蒸気の一部がレージ−先導入部より流出してウィ
ンドウ（３）に蒸着し、レーザー光の透過率が低下する
ばかりでなく、ウィンドウの温度が上昇して破損に至る
という問題がある。また、そのために大出力のレーザー
を長時間にわたって。However, in this type of laser processing equipment, a part of the vapor in the vacuum container flows out from the laser tip introduction part and is deposited on the window (3), which not only reduces the transmittance of the laser beam but also There is a problem in that the temperature rises and leads to damage. In addition, for this purpose, a high-power laser is used for a long period of time.
照射させることができなかった。I couldn't get it to irradiate.
かかる対策として従来、セラミックスをＣＯｔレーザー
によって蒸発させ、基板上に膜として堆積させるレーザ
ー加工装置において、レーザー光導入部にガスを導入し
てウィンドウへの蒸着を防止する方法が知られている。As a countermeasure against this problem, a method is conventionally known in which a gas is introduced into a laser beam introduction part in a laser processing apparatus that evaporates ceramics using a COt laser and deposits the ceramics as a film on a substrate to prevent vapor deposition on the window.
発明が解決しようとする課題
しかし、レーザー光導入部に単にガスを導入してウィン
ドウへの蒸着を防止する方法は、完全に蒸着を防止する
のに多量のガスを導入する必要があり、その結果真空容
器内の圧力が高くなり、高い真空度を得るためには大型
の真空ポンプが必要となり、経済性、能率面から必ずし
も有効な方法とは言い得ないものであった。Problems to be Solved by the Invention However, the method of simply introducing gas into the laser beam introduction part to prevent vapor deposition on the window requires introducing a large amount of gas to completely prevent vapor deposition. The pressure inside the vacuum container becomes high, and in order to obtain a high degree of vacuum, a large-sized vacuum pump is required, and this method cannot necessarily be said to be effective from an economic and efficiency standpoint.
この発明はこのような現状よりみて、多量のガスを必要
とすることなく効果的にウィンドウへの蒸着を防止し、
長時間安定してレーザー光を照射できる高能率、高経済
性のレーザー加工装置を提供しようとするものである。In view of the current situation, this invention effectively prevents vapor deposition on the window without requiring a large amount of gas.
The present invention aims to provide a highly efficient and highly economical laser processing device that can stably irradiate laser light for a long period of time.
課題を解決するための手段
この発明は、真空容器のウィンドウを通して導入するレ
ーザー光により該真空容器内の被加工物を加工するレー
ザー加工装置において、被加工物の蒸気がウィンドウに
蒸着するのを防止する方法として、次に記載する手段を
こうじた。Means for Solving the Problems The present invention provides a method for preventing the vapor of the workpiece from being deposited on the window in a laser processing apparatus that processes a workpiece in a vacuum container using a laser beam introduced through a window of the vacuum container. As a method to do this, we used the following method.
■ 真空容器のレーザー光導入部にガス導入差圧室を設
け、高周波電極により該差圧室内にプラズマを発生させ
る方法。(2) A method in which a gas introduction differential pressure chamber is provided in the laser beam introduction part of a vacuum container, and plasma is generated in the differential pressure chamber using a high frequency electrode.
■ 真空容器のレーザー光導入部に設けたガス導入差圧
室内にレーザー光反射ミラーを設ける方法。■ A method of installing a laser light reflecting mirror in the gas introduction differential pressure chamber provided at the laser light introduction part of the vacuum container.
■ 高周波電極によりガス導入差圧室内にプラズマを発
生させる方法と、レーザー光反射ミラーを設ける方法を
併用した方法。■ A method that combines the method of generating plasma in the gas introduction differential pressure chamber using a high-frequency electrode and the method of installing a laser beam reflecting mirror.
作 用
真空容器のレーザー光導入部にガス導入差圧室を設ける
ことによって、被加工物の蒸気が真空容器のレーザー光
導入孔よりウィンドウ側へ流入するのを防止することが
できる。By providing a gas introduction differential pressure chamber in the laser light introduction part of the vacuum vessel, it is possible to prevent the vapor of the workpiece from flowing into the window side from the laser light introduction hole of the vacuum vessel.
ガス導入差圧室部に設けた高周波電極により該差圧室内
にプラズマを発生させると、ウィンドウには負のバイア
スが生じ、プラズマ中のガスイオンは負のバイアスによ
って加速されてウィンドウに入射し、イオンのスパッタ
効果により、ウィンドウに蒸着した物質が除去される。When plasma is generated in the differential pressure chamber by a high frequency electrode provided in the gas introduction differential pressure chamber, a negative bias is generated in the window, and gas ions in the plasma are accelerated by the negative bias and enter the window. The sputtering effect of the ions removes the material deposited on the window.
ここで、スパッタ効果について詳細に説明すると、負の
電位が印加されている基材がプラズマ中に存在する場合
、プラズマ中の正イオンが負の電界により加速されて基
材に入射する。この時、そのイオンの衝撃によって基材
の物質が放出される現象をスパッタ効果という。Here, to explain the sputtering effect in detail, when a base material to which a negative potential is applied is present in plasma, positive ions in the plasma are accelerated by the negative electric field and enter the base material. At this time, the phenomenon in which the substance of the base material is released due to the impact of the ions is called the sputtering effect.
また、ウィンドウに負゛の電位が印加される理由は、高
周波プラズマにさらされた絶縁物においては、ある周期
には電子電流が流れ込み、次の周期にはイオン電流が流
れ込む。しかし、電子とイオンの質量の違いによって、
電子の移動度の方ががなり大きいため、電子電流が流れ
込む半周期には大きな電流が流れ込み、イオン電流が流
れ込む半周期においては、比較的ｌトさな電流が流れ込
む。Furthermore, the reason why a negative potential is applied to the window is that in an insulator exposed to high-frequency plasma, an electron current flows in one cycle, and an ionic current flows in the next cycle. However, due to the difference in mass between electrons and ions,
Since the mobility of electrons is larger, a large current flows in the half cycle in which the electron current flows, and a relatively small current flows in the half cycle in which the ionic current flows.
よって、高周波プラズマ中の絶縁物は負に帯電す。Therefore, the insulator in the high-frequency plasma becomes negatively charged.
ることになる。That will happen.
このように、レーザー光導入部にガスを導入し、外部か
らの高周波電界により当該部分にプラズマを発生させる
ことにより、ウィンドウに被加工物からの蒸気が蒸着し
ても前記スパッタ効果により蒸着した物質を除去するこ
とができるのである。In this way, by introducing gas into the laser beam introduction part and generating plasma in that part by a high-frequency electric field from the outside, even if vapor from the workpiece is deposited on the window, the sputtering effect will prevent the deposited material from being deposited. can be removed.
また、プラズマ生成のための圧力は、ｔｘｔｏ””Ｔ
ｏｒｒ程度でよいことがら、ガス導入量を少なくするこ
とができ、真空容器内の圧力を低くすることが可能であ
る。In addition, the pressure for plasma generation is txto""T
The amount of gas introduced can be reduced, and the pressure inside the vacuum container can be lowered.
また、この発明において、ウィンドウを通過したレーザ
ー光をミラーに反射させて被加工物に照射するのは、ミ
ラーの方がウィンドウに比べ蒸着の影響を受ける程度が
少ないことによる。Furthermore, in the present invention, the reason why the laser beam that has passed through the window is reflected by the mirror and irradiated onto the workpiece is that the mirror is less affected by vapor deposition than the window.
すなわち、ウィンドウは温度の上昇により吸収率が増大
する特性を有するため、蒸着によりその部分の吸収率が
より大きくなり、ウィンドウ全体の破損につながる。し
かし、ミラーの場合はウィンドウと比較して、温度上昇
に対して破損の可能性が低く、またミラーは金属製であ
るため熱電導率が良好で、冷却水などよって冷却が可能
であるという特性を有する。したがって、被加工物から
の蒸気に直接さらされる部分にミラーを使用することに
よって、ウィンドウへの蒸着を低減することが可能とな
るのである。That is, since the window has a characteristic that its absorption rate increases as the temperature rises, vapor deposition causes the absorption rate of that portion to increase, leading to damage to the entire window. However, compared to windows, mirrors are less likely to be damaged due to temperature rises, and since mirrors are made of metal, they have good thermal conductivity and can be cooled with cooling water. has. Therefore, by using mirrors in areas directly exposed to vapor from the workpiece, it is possible to reduce vapor deposition on the window.
なお、レーザー光の反射ミラーは、レーザー光により溶
融しない高融点で、しかもレーザー光を反射する金属で
あればよく、例えばＭｏ製またはＭｏ合金製を用いるこ
とができる。Note that the laser beam reflecting mirror may be any metal as long as it has a high melting point that is not melted by the laser beam and also reflects the laser beam. For example, it may be made of Mo or a Mo alloy.
また、ガス導入差圧室内にプラズマを発生させる高周波
電極としては、高周波コイルが好適である。Moreover, a high frequency coil is suitable as the high frequency electrode for generating plasma in the gas introduction differential pressure chamber.
また、レーザー光反射ミラーとプラズマ発生手段を併用
することにより、ウィンドウへの蒸着をほぼ完全に防止
することができ、ウィンドーの耐久性を大幅に向上させ
ることができる結果、大出力レーザー光を長時間安定し
て照射できる。In addition, by using a laser beam reflecting mirror and a plasma generation means, it is possible to almost completely prevent vapor deposition on the window, greatly improving the durability of the window, and as a result, the high-power laser beam can be used for a long time. Can be irradiated stably over time.
実 施 例
実施例１
第１図はレーザー光導入部にプラズマ発生用高周波コイ
ルを設けたレーザー加工装置を示す概略縦断面図で、（
１１）は真空容器、（１２）はガス導入差圧室、（１３
）はウィンドウ、（１４）は集光レンズ、（１５）は被
加工物、（１６）は基板、（１７）はガス導入管、（１
８）は高周波コイル（電極）をそれぞれ示す。EXAMPLES Example 1 FIG. 1 is a schematic vertical cross-sectional view showing a laser processing device in which a high-frequency coil for plasma generation is provided in the laser beam introduction part.
11) is a vacuum vessel, (12) is a gas introduction differential pressure chamber, (13) is a
) is the window, (14) is the condenser lens, (15) is the workpiece, (16) is the substrate, (17) is the gas introduction tube, (1
8) each indicate a high frequency coil (electrode).
すなわち、集光レンズ（１４）を通過したレーザー光（
１９）はウィンドウ（１３）を通して差圧室（１２）内
を通過して真空容器（１１）内に導入し、被加工物（１
５）を照射し蒸発させて基板（１６）に蒸着させるが、
被加工物（１５）からの蒸気がガス導入差圧室（１２）
内に流入しウィンドウ（１３）に蒸着しても、高周波コ
イル（１８）に通電して該差圧室内にプラズマを発生さ
せることにより、スパッタ効果でウィンドウ（３）に蒸
着した物質が除去される。このとき、ガス導入差圧室（
１２）内には、ガス導入管（１７）よりＡｒガス等の不
活性ガスが導入されてｌＸｌ０−”Ｔｏｒｒ程度の真空
度に保持されている。一方、真空容器（１１）内は５Ｘ
１０−’Ｔｏｒｒ程度の真空度に保持されている。That is, the laser beam (
19) is introduced into the vacuum container (11) through the differential pressure chamber (12) through the window (13), and the workpiece (1
5) is irradiated and evaporated to be deposited on the substrate (16),
Steam from the workpiece (15) is introduced into the gas differential pressure chamber (12)
Even if the material flows into the window (13) and is deposited on the window (13), the material deposited on the window (3) is removed by the sputtering effect by energizing the high frequency coil (18) and generating plasma in the differential pressure chamber. . At this time, the gas introduction differential pressure chamber (
12), an inert gas such as Ar gas is introduced from the gas introduction pipe (17) and maintained at a vacuum level of approximately 1X10-'' Torr.On the other hand, the inside of the vacuum vessel (11) is maintained at a vacuum level of 5X
The degree of vacuum is maintained at about 10-'Torr.
上記装置におけるウィンドウの耐久性を調べるため、第
１表に示す条件でレーザー加工を実施した。その結果、
第４図に示す従来の装置ではウィンドウが約６時間で破
損したのに対し、この発明装置では約８７時間と大幅に
伸び、約１４倍の耐久性を示した。In order to examine the durability of the window in the above device, laser processing was performed under the conditions shown in Table 1. the result,
In the conventional device shown in FIG. 4, the window broke in about 6 hours, but in the device of the present invention, the durability was significantly extended to about 87 hours, showing about 14 times the durability.
以下余白
第１表 レーザー加工条件
実施例２
第２図はレーザー光導入部にレーザー光反射ミラーを設
けたレーザー加工装置を示す概略縦断面図で、（２０）
はガス導入差圧室、（２１）は反射ミラーである。Table 1 with blank space below Laser processing condition example 2 Figure 2 is a schematic vertical cross-sectional view showing a laser processing device equipped with a laser light reflecting mirror in the laser light introduction part.
is a gas introduction differential pressure chamber, and (21) is a reflection mirror.
すなわち、集光レンズ（１４）を通過したレーザー光（
１９）はウィンドウ（１３）を通して差圧室（２０）に
入射し、反射ミラー（２１）により反射して真空容器（
１１）内に導入し、被加工物（１５）を照射し蒸発させ
る。この時、被加工物（１５）からの蒸気が差圧室（２
０）内に流入した場合、該蒸気はウィンドウ（１３）に
至るまでにその大半が反射ミラー（２１）に蒸着する。That is, the laser beam (
19) enters the differential pressure chamber (20) through the window (13), is reflected by the reflection mirror (21), and enters the vacuum vessel (
11), and the workpiece (15) is irradiated and evaporated. At this time, steam from the workpiece (15) flows into the differential pressure chamber (2
0), most of the vapor is deposited on the reflecting mirror (21) before reaching the window (13).
なお、差圧室（２０）内は、ガス導入管（１７）よりＡ
ｒガス等が導入されて所定の真空度に保持されている。In addition, the inside of the differential pressure chamber (20) is connected to A from the gas introduction pipe (17).
R gas or the like is introduced to maintain a predetermined degree of vacuum.
上記装置におけるウィンドウの耐久性を調べるため、反
射ミラーにＭＯ製ミラーを使用し前記第１表に示す条件
でレーザー加工を実施した結果、ウィンドウの破損まで
の時間は約１９０時間で、この場合も従来の約３０倍の
耐久性を示した。In order to investigate the durability of the window in the above device, we used an MO mirror as a reflection mirror and performed laser processing under the conditions shown in Table 1 above. As a result, the time until the window broke was approximately 190 hours, and in this case as well. It showed about 30 times the durability of conventional products.
実施例３
第３図はレーザー光導入部に高周波コイルと反射ミラー
を設けたレーザー加工装置を示す概略縦断面図で、（１
８）は差圧室（２０）内にプラズマを発生させるための
高周波コイルである。Embodiment 3 FIG. 3 is a schematic vertical cross-sectional view showing a laser processing device in which a high-frequency coil and a reflection mirror are provided in the laser beam introduction part.
8) is a high frequency coil for generating plasma in the differential pressure chamber (20).
すなわち、この装置の場合は、差圧室（２０）内に流入
した蒸気の大半は反射ミラー（２１）に蒸着するので、
ウィンドウ（１３）に蒸着する量は大幅に少なくなるが
、差圧室（２０）内にガス導入管（１７）よりＡｒガス
等を導入し、高周波コイル（１８）に通電して該差圧室
（２０）内にプラズマを発生させることによって、スパ
ッタ効果によりウィンドウ（１３）に蒸着した物質を除
去することができる。したがって、反射ミラー（２１）
と高周波コイル（１８）を併用した場合は、ウィンドウ
（１３）の蒸着をほぼ完全に防止することができる。That is, in the case of this device, most of the vapor that has flowed into the differential pressure chamber (20) is deposited on the reflection mirror (21), so
Although the amount deposited on the window (13) is greatly reduced, Ar gas or the like is introduced into the differential pressure chamber (20) from the gas introduction pipe (17), and the high frequency coil (18) is energized to increase the pressure in the differential pressure chamber. By generating a plasma in (20), material deposited on the window (13) can be removed by sputtering effect. Therefore, the reflective mirror (21)
When the high frequency coil (18) is used in combination with the high frequency coil (18), vapor deposition on the window (13) can be almost completely prevented.
上記装置におけるウィンドウの耐久性を調べるため、前
記と同じＭｏ製反射ミラーを用い、前記第１表に示す条
件でレーザー加工を実施した結果、５００時間以上の耐
久性を示した。In order to examine the durability of the window in the above device, laser processing was carried out using the same Mo reflective mirror as above under the conditions shown in Table 1, and as a result, durability was shown for over 500 hours.
なおここでは、基板（１６）上に蒸着する場合を例示し
たが、基板がない場合、すなわち被加工物（１５）のみ
によって加工される場合にも適用できることはいうまで
もない。また、ガス導入差圧室（２０）内にプラズマを
発生させる電極につし）ては、ガス導入差圧室内の内側
、外側のいずれか一方、または内外両側に設けることが
できる。Although the case where the vapor deposition is performed on the substrate (16) is illustrated here, it goes without saying that the present invention can also be applied when there is no substrate, that is, when only the workpiece (15) is processed. Further, the electrode for generating plasma in the gas introduction differential pressure chamber (20) can be provided on either the inside or outside of the gas introduction differential pressure chamber, or on both the inside and outside of the gas introduction differential pressure chamber.
発明の詳細
な説明したごとく、この発明はウィンドウへの蒸着を防
止する手段として、レーザー光導入部のガス導入差圧室
内に高周波電極にてプラズマを発生させる方法、ガス導
入差圧室内に設けたミラーにレーザー光を反射させて入
射させる方法、上記２つの方法を併用する方法を用いた
ことにより、ウィンドウへの蒸着を防止することができ
る結果、ウィンドーの耐久性が大幅に向上し大出力レー
ザー光を長時間安定して照射できるという、優れた効果
を奏するものである。As described in detail, the present invention provides a method of generating plasma using a high frequency electrode in a gas introduction differential pressure chamber of a laser beam introduction section, and a method of generating plasma in a gas introduction differential pressure chamber of a laser beam introduction section, as a means for preventing vapor deposition on a window. By using a method in which the laser beam is reflected by a mirror and then incident on the mirror, and a method in which the above two methods are combined, it is possible to prevent vapor deposition on the window, which greatly improves the durability of the window and enables high-output lasers. It has the excellent effect of being able to stably irradiate light for a long period of time.
第１図〜第３図はこの発明の実施例装置を示す概略縦断
面図で、第１図はレーザー光導入部にプラズマ発生用高
周波コイルを設けたレーザー加工装置、第２図は同じく
レーザー光導入部にレーザー光反射ミラーを設けたレー
ザー加工装置、第３図は同じくレーザー光導入部にプラ
ズマ発生用高周波コイルと反射ミラーを設けたレーザー
加工装置をそれぞれ示す。
第４図はこの発明の対象とする従来のレーザー加工装置
の一例を示す概略縦断面図である。
１１・・・真空容器 １２．２０・・・ガス導入差
圧室１３・・・ウィンドウ １４・・・集光レン
ズ１５・・・被加工物 １６・・・基板１７・
・・ガス導入管 １８・・・高周波コイル１９・
・・レーザー光 ２１・・・反射ミラー第１図Figures 1 to 3 are schematic vertical cross-sectional views showing an embodiment of the present invention. FIG. 3 shows a laser processing device in which a laser beam reflection mirror is provided in the introduction section, and a laser processing device in which a high frequency coil for plasma generation and a reflection mirror are similarly provided in the laser beam introduction section. FIG. 4 is a schematic vertical cross-sectional view showing an example of a conventional laser processing apparatus to which the present invention is applied. 11... Vacuum container 12.20... Gas introduction differential pressure chamber 13... Window 14... Condenser lens 15... Workpiece 16... Substrate 17.
...Gas introduction pipe 18...High frequency coil 19.
...Laser light 21...Reflection mirror Figure 1
Claims (1)
り該真空容器内の被加工物を加工するレーザー加工装置
において、真空容器のレーザー光導入部にガス導入差圧
室を設け、高周波により前記ガス導入差圧室内にプラズ
マを発生させる電極を設けたことを特徴とするレーザー
加工装置。 ２ 真空容器のウィンドウを通して導入するレーザー光によ
り該真空容器内の被加工物を加工するレーザー加工装置
において、真空容器のレーザー光導入部にガス導入差圧
室を設け、該差圧室内にレーザー光反射ミラーを設けた
ことを特徴とするレーザー加工装置。 ３ 真空容器のウィンドウを通して導入するレーザー光によ
り該真空容器内の被加工物を加工するレーザー加工装置
において、真空容器のレーザー光導入部にガス導入差圧
室を設け、該差圧室内にレーザー光反射ミラーを設ける
とともに、高周波により前記差圧室内にプラズマを発生
させる電極を設けたことを特徴とするレーザー加工装置
。[Scope of Claims] 1. In a laser processing device that processes a workpiece in a vacuum container by laser light introduced through a window of the vacuum container, a gas introduction differential pressure chamber is provided in the laser light introduction part of the vacuum container, and a high-frequency A laser processing apparatus characterized in that an electrode for generating plasma is provided in the gas introduction differential pressure chamber. 2. In a laser processing device that processes a workpiece in a vacuum container using a laser beam introduced through a window of the vacuum container, a gas introduction differential pressure chamber is provided in the laser beam introduction part of the vacuum container, and the laser beam is introduced into the differential pressure chamber. A laser processing device characterized by being equipped with a reflecting mirror. 3. In a laser processing device that processes a workpiece in a vacuum container with a laser beam introduced through a window of the vacuum container, a gas introduction differential pressure chamber is provided in the laser beam introduction part of the vacuum container, and the laser beam is introduced into the differential pressure chamber. A laser processing device characterized in that a reflecting mirror is provided, and an electrode is provided for generating plasma in the differential pressure chamber using high frequency waves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2175677A JPH0466290A (en) | 1990-07-02 | 1990-07-02 | Laser beam machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2175677A JPH0466290A (en) | 1990-07-02 | 1990-07-02 | Laser beam machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0466290A true JPH0466290A (en) | 1992-03-02 |
Family
ID=16000308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2175677A Pending JPH0466290A (en) | 1990-07-02 | 1990-07-02 | Laser beam machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0466290A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09180896A (en) * | 1995-12-15 | 1997-07-11 | Applied Materials Inc | Plasma igniter for semiconductor manufacturing device |
-
1990
- 1990-07-02 JP JP2175677A patent/JPH0466290A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09180896A (en) * | 1995-12-15 | 1997-07-11 | Applied Materials Inc | Plasma igniter for semiconductor manufacturing device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6456642B1 (en) | Optical coupling device | |
| US6232613B1 (en) | Debris blocker/collector and emission enhancer for discharge sources | |
| US7328885B2 (en) | Plasma radiation source and device for creating a gas curtain for plasma radiation sources | |
| JP4638867B2 (en) | Discharge generated plasma EUV light source | |
| Abramova et al. | Photostimulated desorption of metal atoms from surfaces of transparent insulators | |
| EP1729550B1 (en) | Arrangement and method for protecting an optical component, particularly in an EUV source | |
| US20240019614A1 (en) | Parabolic cassegrain-type reflector for ablation loading | |
| JPH0466290A (en) | Laser beam machine | |
| Elton et al. | X‐ray damage to optical components using a laser‐plasma source | |
| JPH02100297A (en) | Generation method for x-ray of laser excitation type | |
| Maier-Komor et al. | Preparation and investigation of thick carbon foils prepared by laser plasma ablation deposition | |
| JP2000297361A (en) | Formation of hyper-fine particle film and device for forming hyper-fine particle film | |
| JP3318595B2 (en) | Laser ion plating equipment | |
| JPH0837096A (en) | X-ray generating device | |
| JPH062115A (en) | Laser-beam machine and production of shielding plate for the machine | |
| JPH02125864A (en) | Plasma vacuum device with plasma gun utilized therefor | |
| JPH01137543A (en) | Laser-excited x-ray generator | |
| KR920002728B1 (en) | Electric beam processing | |
| Stenz et al. | Self-channeling of a multiterawatt ultra-short laser pulse in argon gas jets-Shadowgraphy imaging | |
| JPS5842769A (en) | Ion plating device using light beam | |
| JP2022138771A (en) | Foil trap and light source device comprising the same | |
| Baranov et al. | Space–time distribution of CO2 laser radiation on the surface of a target in the presence of an optical-breakdown plasma | |
| JP2847056B2 (en) | Plasma igniter for semiconductor manufacturing equipment | |
| JPS62296358A (en) | Ion beam device | |
| De Mars et al. | A study of high power argon laser optics Final report, 15 Apr. 1967-14 Apr. 1968 |