JPH0442101A - Color filter and production thereof - Google Patents
Color filter and production thereofInfo
- Publication number
- JPH0442101A JPH0442101A JP2149588A JP14958890A JPH0442101A JP H0442101 A JPH0442101 A JP H0442101A JP 2149588 A JP2149588 A JP 2149588A JP 14958890 A JP14958890 A JP 14958890A JP H0442101 A JPH0442101 A JP H0442101A
- Authority
- JP
- Japan
- Prior art keywords
- purity
- photoresist
- color
- dispersed
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 72
- 239000000049 pigment Substances 0.000 claims abstract description 24
- 230000000295 complement effect Effects 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000206 photolithography Methods 0.000 claims description 3
- 239000003086 colorant Substances 0.000 abstract description 8
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract description 8
- 239000001054 red pigment Substances 0.000 abstract description 4
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 235000019646 color tone Nutrition 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 238000004043 dyeing Methods 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- 239000001055 blue pigment Substances 0.000 description 3
- 239000001056 green pigment Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000001263 FEMA 3042 Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- 239000000980 acid dye Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 235000021384 green leafy vegetables Nutrition 0.000 description 1
- -1 grue Proteins 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 235000013372 meat Nutrition 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
本発明は、カラー液晶表示装置、カラービデオカメラ、
カラーセンサー、カラーイメージセンサ−等、カラー画
像の入出力装置に使用するカラーフィルターの構造とそ
の製造方法に関する。The present invention provides a color liquid crystal display device, a color video camera,
The present invention relates to the structure and manufacturing method of a color filter used in color image input/output devices such as color sensors and color image sensors.
カラー液晶表示装置において表示品質の低下を防止する
ため、対向して設けられる透明なガラス基板の一方の内
面に着色部が透光可能に形成されている。
従来、この着色部を形成する一般的な方法としては、重
クロム酸塩により感光性を持たせたゼラチン、グリユー
、カゼイン、ポリビニルアルコール等の親水性樹脂溶液
をガラスなどの透明基板に回転塗布法等により全面塗膜
し、次いでマスク露光法により所定のパターンを転写・
現像してレリーフパターンを形成し、これを所望の色の
酸性染料にて染色、しかる後にタンニン酸水溶液と吐酒
石水溶液にて防染処理を施す工程を、所望の色数（通常
はレッド、グリーン、ブルーの三色）だけ繰り返し行っ
て形成する方法がある。
また、必要に応じて各色の境界部に遮光性のブラックマ
トリックスパターンを形成し、色の滲み、白抜は等をな
くして表示品質の向上を図ることも行われている。この
ブラックマトリックスノぐターンの形成も、一般には透
光可能な着色部と同様、写真製版技術を用いてパターン
を転写したのち、黒色染料で染色して形成されている。
上記着色部の形成方法においてはレッド、グリーン、ブ
ルー、ブラック等の着色部全てが写真製版技術と、染色
・防染処理によって形成されているため、工数が多くな
り、生産性が上がらないと云う問題点があった。このた
め、顔料を分散含有した光硬化性ホトレジストを用いる
ことにより、染色・防染工程を減らし、生産性を向上さ
せる新しい技術が提案されている。In order to prevent deterioration of display quality in a color liquid crystal display device, a colored portion is formed on the inner surface of one of the transparent glass substrates provided opposite to each other so as to be transparent. Conventionally, the general method for forming this colored area is to spin-coat a hydrophilic resin solution such as gelatin, grue, casein, or polyvinyl alcohol, which has been made photosensitive with dichromate, onto a transparent substrate such as glass. etc., to coat the entire surface, and then transfer/transfer a predetermined pattern by mask exposure method.
It is developed to form a relief pattern, dyed with an acid dye of the desired color, and then subjected to resist dyeing treatment with an aqueous solution of tannic acid and an aqueous solution of tartarite. There is a method of forming a pattern by repeating only the three colors (green and blue). Furthermore, if necessary, a light-shielding black matrix pattern is formed at the boundary between each color to eliminate color bleeding, white spots, etc., and to improve display quality. The black matrix nozzle is generally formed by transferring a pattern using photoengraving technology and then dyeing it with black dye, similar to the transparent colored part. In the method for forming colored parts mentioned above, all colored parts such as red, green, blue, and black are formed by photolithography technology and dyeing/resist dyeing treatment, which increases the number of man-hours and does not increase productivity. There was a problem. For this reason, a new technique has been proposed that reduces the number of dyeing and resist dyeing steps and improves productivity by using a photocurable photoresist containing dispersed pigments.
しかしながら５．顔料を分散含をした光硬化性ホトレジ
ストを用いて着色部を形成する方法においては、明暗を
調節することは可能であるが、色調を調節することが出
来ないと云う問題点があった。すなわち、基板に塗膜す
るホトレジストの膜厚を変えると、透過する光量は増減
するのでその明暗は調節出来るが、光吸収特性には全く
変化がナイタめ色調は変わらない。このことは品質ノ安
定化を図る上で有利となる一方、液晶表示装置等のアッ
センブリメーカーに部品として供給する際には、メーカ
ーによって組合せるノイツクライトの色が微妙に異なる
ため、同じカラーフィルターを納入してもＡ社では奇麗
なレッド、グリーン、ブルーが得られるが、Ｂ社では希
望の色を出すことができないと云う問題点があった。こ
のため、需要家ごとに一々顔料を調合しなければならず
、手間が掛かる上に、多量に調合しておくと残肉が多く
出ると云う問題点があった。However, 5. In the method of forming a colored part using a photocurable photoresist containing pigment dispersed therein, it is possible to adjust the brightness and darkness, but there is a problem in that the color tone cannot be adjusted. That is, by changing the thickness of the photoresist coated on the substrate, the amount of transmitted light increases or decreases, so the brightness and darkness can be adjusted, but the light absorption characteristics do not change at all, but the nighty color tone does not change. While this is advantageous in terms of stabilizing quality, when supplying as parts to assembly manufacturers of liquid crystal display devices, etc., the color of Neutsk light used in combination differs slightly depending on the manufacturer, so the same color filter is delivered. However, Company A could produce beautiful reds, greens, and blues, but Company B had the problem of not being able to produce the desired colors. For this reason, the pigment must be prepared one by one for each customer, which is time-consuming and has the problem that if a large amount is prepared, there will be a lot of leftover material.
本発明は上記した従来技術の課題を解決するためになさ
れたもので、パターン状に形成された着色部が、顔料を
分散含有したホトレジストと、前記ホトレジストの色を
補正するための補色用顔料を分散含有したホトレジスト
との積層体からなることを特徴とするカラーフィルター
であり、着色部を写真製版技術を用いて形成するカラー
フィルターの製造方法であって、顔料を分散含有した光
硬化性ホトレジストを透明基板上にパターン状に順次残
存形成し、該ホトレジストの一部、または全部それぞれ
に前記ホトレジストの色を補正するための補色用顔料を
分散含有した光硬化性ホトレジストを順次積層して前記
着色部を形成することを特徴とするカラーフィルターの
製造方法を提供するものである。The present invention has been made to solve the problems of the prior art described above, and the colored portion formed in a pattern includes a photoresist containing a dispersed pigment and a complementary color pigment for correcting the color of the photoresist. A color filter characterized by being made of a laminate with a photoresist containing dispersed pigments, and a method for producing a color filter in which colored portions are formed using photolithography technology, the method comprising: a photocurable photoresist containing dispersed pigments; A photocurable photoresist is sequentially formed to remain in a pattern on a transparent substrate, and a photocurable photoresist containing a complementary color pigment dispersed therein for correcting the color of the photoresist is sequentially laminated in part or all of the photoresist to form the colored portion. The present invention provides a method for manufacturing a color filter characterized by forming a color filter.
本発明になるカラーフィルターの製造方法は、透明なガ
ラスなどの基板に色純度の高い顔料を含有した高純度ホ
トレジストと、色純度の低い補色用顔料を分散含有した
低純度ホトレジストとを積層して着色部を形成するため
、色純度の異なる二種類のホトレジストの積層比を変え
ることにより、前記着色部を透過する光の吸収特性が自
在に変えられる。The method for producing a color filter according to the present invention involves laminating a high-purity photoresist containing pigments with high color purity and a low-purity photoresist containing dispersed complementary color pigments with low color purity on a substrate such as transparent glass. In order to form a colored part, by changing the lamination ratio of two types of photoresists having different color purity, the absorption characteristics of light transmitted through the colored part can be freely changed.
つぎに本発明を図面°に基づいてさらに詳細に説明する
。
第１図は透明なガラス製の基板１の片面に光硬化性ホト
レジストが固着形成されてレッド、グリーン、ブルーの
三色の着色部Ｒ１ＧおよびＢがパターン状に繰り返し形
成された本発明になるカラーフィルターの一例であって
、レッド着色部Ｒは色純度の高い赤色顔料、例えばレー
キレッド等を分散含有したジアゾ系の光硬化性高純度ホ
トレジストＲ２が１．０〜３．０μＩ形成され、さらに
この上に色純度が低い１１７７５色の顔料を分散含有し
た、低純度ホトレジストｒ２が高純度ホトレジストＲ２
の色を補正するために０．２〜１．ｏｊｍ積層された構
成であり、同様にグリーン着色部Ｇは色純度の高い緑色
顔料を分散含有するジアゾ系の高純度ホトレジストＧ２
、１．０〜３．０ａｍの上に色純度が低いイエローの顔
料を含有する、低純度ホトレジストｇ２が０．２〜１．
０μ厘積層された構成であり、ブルー着色部Ｂは色純度
の高い青色顔料、例えばメチレブルを含有するジアゾ系
の高純度ホトレジストＢ２．１．０〜３．０μ霧の上に
色純度が低いパイオッレトの顔料を含有する、低純度ホ
トレジストｂ２が０．２〜１．０＋ｉ＋積層された構成
である。
そして、レッド着色部Ｒ１グリーン着色部Ｇ１ブルー着
色部Ｂそれぞれの境界部には遮光性を持つ光吸収性に優
れたブラックマトリックスパターン１１が形成されてい
る。
上記構成のレッド着色部Ｒ１グリーン着色部Ｇおよびブ
ルー着色部Ｂそれぞれの透過光は、−例を第３図に示す
様に、ホトレジストＲ２、Ｇ２、Ｂ２単独の波長（破線
）に対して所定の補正が出来、必要とする波長（実線）
が得られた。
なお、本発明において補色用顔料とは、補色関係にある
色のことを意味するものではなく、単に色調を補正ある
いは補充するための顔料を意味している。
上記構成のカラーフィルターを製造する本発明の製造方
法を説明すると、基板１の片面に赤色の顔料が分散剤（
界面活性剤）と共に２０〜４０％配合添加された光硬化
性を持つジアゾ系（アクリル系樹脂、フェノール系樹脂
の添加可能）の高純度ホトレジス）Ｒ１を適宜の方法、
例えば回転塗布法によって均一に塗膜して乾燥させ、し
かる後に例えばクロム蒸着層によって所望のパターン２
１が片面に形成されたホトマスク２を、前記高純度ホト
レジストＲ１とパターン２１とを対峙させて重ね合わせ
、ホトマスク２側から紫外線または遠紫外線を照射して
、高純度ホトレジストＲ１を部分露光させる。所定時間
露光させてホトマスク２のパターン２１を高純度ホトレ
ジストＲ１に転写したのちアルカリ液により現像し、露
光により変性硬化した部分（Ｒ２）を選択残存させ、露
光されなかったために硬化することのなかった高純度ホ
トレジストＲ１を除去すると、パターン２１に対応する
高純度ホトレジス）Ｒ２のパターンが基板１の上に固着
形成される。
続いて、緑色の顔料が分散剤（界面活性剤）と共に２０
〜４０％配合添加された、ジアゾ系（アクリル系樹脂、
フェノール系樹脂の添加可能）の光硬化性高純度ホトレ
ジストＧ１を塗膜したのち、ホトマスク２と基板１との
相対位置を移動して同様に部分露光させ、前工程で固着
形成した高純度ホトレジス）Ｒ２の片側に隣接して変性
硬化した高純度ホトレジストＧ２を固着形成させる。た
だしブラックマトリックスパターン１１を形成する場合
には適宜な間隙だけ離間させる。さらに、青色の顔料が
分散剤（界面活性剤）と共に２０〜４０％配合添加され
たジアゾ系（アクリル系樹脂、フェノール系樹脂の添加
可能）の光硬化性高純度ホトレジス）Ｂｌを塗膜し、前
記変性硬化した高純度ホトレジストＲ２と高純度ホトレ
ジストＧ２の間にそれぞれ適宜の間隙を保って変性硬化
した高純度ホトレジストＢ２を固着形成させると、基板
１にはレッド、グリーン、ブルーそれぞれの顔料を分散
含有した高純度ホトレジストＲ２、Ｇ２、Ｂ２がストラ
イプ状に連続的に繰り返し形成される。
続いて、オレンジの顔料が分散剤（界面活性剤）と共に
２０〜４０％配合添加されたアクリル樹脂系の光硬化性
低純度ホトレジス）ｒｌを塗膜し、前記ホトマスク２を
最初の位置に戻して部分露光させることにより、変性硬
化した低純度ホトレジス）ｒ２を既に固着形成した高純
度ホトレジストＲ２上に選択残存させて積層する。以下
同様にして、高純度ホトレジストＧ２の上にイエローの
低純度ホトレジストｇ２を、高純度ホトレジストＢ２の
上にバイオレットの低純度ホトレジストｂ２をそれぞれ
残存形成させると、本発明になるカラーフィルターの構
成となる。続いて、着色部Ｒ１ＧおよびＢの境界部を明
瞭にするため、黒色の顔料を含有したジアゾ系の光硬化
性ホトレジストを用いたり、従来周知の染色法を用いた
りしてブラックマトリックスパターン１１を形成する。
なお、本発明に使用される着色顔料は、従来公知のもの
を使用することが可能である。
上記工程によって形成されるレッド、グリーン、ブルー
それぞれの着色部Ｒ％ＧおよびＢは、適宜の樹脂（例え
ばメラミン−エポキシ樹脂など）をトップコートして使
用される。
なお、色補正を必要としない高純度ホトレジストについ
ては低純度ホトレジストを積層しなくてもよいし、積層
順についても高純度ホトレジストの固着形成を全て終了
したあとで低純度ホトレジストを順次積層しても良いし
、高純度ホトレジストの固着形成と補正用の低純度ホト
レジストの積層を繰り返し行う方法の何れであっても構
わない。ブラックマトリックスパターン１１は、着色部
の固着形成の前後何れの工程で形成しても構わない。Next, the present invention will be explained in more detail based on the drawings. Figure 1 shows a color according to the present invention in which a photocurable photoresist is fixedly formed on one side of a transparent glass substrate 1, and colored parts R1G and B in three colors of red, green, and blue are repeatedly formed in a pattern. This is an example of a filter, and the red colored part R is formed with 1.0 to 3.0 μl of diazo-based photocurable high-purity photoresist R2 containing a red pigment with high color purity, such as Lake Red, dispersed therein. Low-purity photoresist R2, which contains pigments of 11,775 colors with low color purity dispersed thereon, is a high-purity photoresist R2.
0.2 to 1. to correct the color. Similarly, the green colored part G is a high purity diazo photoresist G2 containing dispersed green pigment with high color purity.
, 1.0 to 3.0 am, and a low purity photoresist G2 containing a yellow pigment with low color purity is 0.2 to 1.0 am.
The blue colored part B is a diazo-based high purity photoresist containing a blue pigment with high color purity, such as methylene oxide. It has a structure in which 0.2 to 1.0+i+ of low-purity photoresists b2 containing a pigment of 0.2 to 1.0+i+ are laminated. A black matrix pattern 11 having excellent light-shielding properties and excellent light-absorbing properties is formed at each boundary between the red-colored part R1, the green-colored part G1, and the blue-colored part B. The transmitted light of each of the red colored part R1, the green colored part G, and the blue colored part B in the above structure is, as shown in FIG. Wavelength that can be corrected and required (solid line)
was gotten. In the present invention, the term "complementary color pigment" does not mean a complementary color, but simply a pigment for correcting or supplementing the color tone. To explain the manufacturing method of the present invention for manufacturing a color filter having the above configuration, a red pigment is coated on one side of the substrate 1 with a dispersant (
A high-purity photoresist (diazo type (acrylic resin, phenolic resin can be added)) R1 with photocurability, which is blended and added at 20 to 40% with a surfactant), by an appropriate method,
For example, a film is coated uniformly by a spin coating method and dried, and then a desired pattern 2 is formed by, for example, a chromium vapor deposited layer.
1 is formed on one side, the high-purity photoresist R1 and the pattern 21 are overlapped with each other so as to face each other, and ultraviolet rays or deep ultraviolet rays are irradiated from the photomask 2 side to partially expose the high-purity photoresist R1. The pattern 21 of the photomask 2 was transferred to the high-purity photoresist R1 by exposure for a predetermined period of time, and then developed with an alkaline solution, and the portion (R2) that was denatured and hardened by exposure was left selectively, and was not cured because it was not exposed to light. When the high-purity photoresist R1 is removed, a pattern of high-purity photoresist (R2) corresponding to the pattern 21 is fixedly formed on the substrate 1. Next, the green pigment was mixed with a dispersant (surfactant) for 20 minutes.
Diazo type (acrylic resin,
After coating a photocurable high purity photoresist G1 (with which phenolic resin can be added), the relative positions of the photomask 2 and the substrate 1 are moved and partial exposure is performed in the same way, and the high purity photoresist (which was fixed and formed in the previous process) is applied. A denatured and hardened high-purity photoresist G2 is fixedly formed adjacent to one side of R2. However, when forming the black matrix pattern 11, they are separated by an appropriate gap. Furthermore, a diazo-based (acrylic resin and phenolic resin can be added) photocurable high-purity photoresist) Bl containing 20 to 40% of a blue pigment and a dispersant (surfactant) is applied. When the denatured and hardened high purity photoresist B2 is fixedly formed between the denatured and hardened high purity photoresist R2 and the high purity photoresist G2 with an appropriate gap between them, red, green and blue pigments are dispersed on the substrate 1. The high-purity photoresists R2, G2, and B2 contained therein are continuously and repeatedly formed in a stripe shape. Next, an acrylic resin-based photocurable low-purity photoresist (RL) containing 20 to 40% orange pigment and a dispersant (surfactant) was applied, and the photomask 2 was returned to its initial position. By partially exposing to light, the denatured and hardened low-purity photoresist (R2) is selectively left and laminated on the high-purity photoresist R2 that has already been firmly formed. Similarly, a yellow low-purity photoresist g2 is left on top of the high-purity photoresist G2, and a violet low-purity photoresist b2 is left on top of the high-purity photoresist B2, thereby forming a color filter according to the present invention. . Subsequently, in order to clarify the boundary between the colored parts R1G and B, a black matrix pattern 11 is formed using a diazo photocurable photoresist containing a black pigment or using a conventionally known dyeing method. do. Note that conventionally known color pigments can be used as the color pigments used in the present invention. The red, green, and blue colored portions R%G and B formed by the above steps are used after being top coated with an appropriate resin (for example, melamine-epoxy resin). Note that for high-purity photoresists that do not require color correction, it is not necessary to laminate low-purity photoresists, and regarding the lamination order, it is possible to laminate low-purity photoresists in sequence after all of the high-purity photoresists have been fixedly formed. Any method of repeatedly forming a high-purity photoresist and laminating a low-purity photoresist for correction may be used. The black matrix pattern 11 may be formed either before or after the colored portion is fixedly formed.
以上説明した様に本発明になるカラーフィルターの製造
方法によれば、基本となる色純度の高い高純度ホトレジ
ストと補色用の低純度ホトレジストとを揃えておけば、
需要家によって希望の色調が微妙に異なっていても、低
純度ホトレジストの厚みを適宜変えることにより容易に
その要求に応えることが出来る。したがって、需要家ご
とにホトレジストを調合をする必要がなくなったため、
工数が省略出来ると共に、保管スペースも狭くすること
が出来る。また、残肉量の減少と、品種変更に伴う塗膜
装置の洗浄回数の減少などによりコストダウンが図れる
。As explained above, according to the color filter manufacturing method of the present invention, if the basic high-purity photoresist with high color purity and the low-purity photoresist for complementary colors are prepared,
Even if the desired color tone differs slightly depending on the consumer, the demand can be easily met by appropriately changing the thickness of the low-purity photoresist. Therefore, there is no need to mix photoresist for each customer.
Not only can the man-hours be omitted, but the storage space can also be reduced. In addition, costs can be reduced by reducing the amount of remaining meat and reducing the number of cleaning times of coating equipment due to product changes.
第１図は本発明になるカラーフィルターの説明図、第２
図はその製造方法を工程順に示す説明図、第３図は着色
部の光透過率を示す説明図である。
１・・・基板、
１１・・・ブラックマトリックスパターン、２・・・ホ
トマスク、
２１・・・パターン、
ＲｌＧ、Ｂ・・・着色部、
Ｒ１，Ｇ１．ＢＩ・・・高純度ホトレジスト、Ｒ２，Ｇ
２．Ｂ２・・・（変性硬化）高純度ホトレノスト、ｒｌ
、ｇｌ、ｂｌ・・・低純度ホトレジスト、ｒ２．ｇ２．
ｂ２・・・（変性硬化）低純度ホトレノスト。
区
（’Ｊ
派
＝◇
＝５
＝）
＝◇
＝■
：）Figure 1 is an explanatory diagram of the color filter according to the present invention, Figure 2 is an explanatory diagram of the color filter according to the present invention.
The figure is an explanatory diagram showing the manufacturing method in the order of steps, and FIG. 3 is an explanatory diagram showing the light transmittance of the colored part. DESCRIPTION OF SYMBOLS 1... Substrate, 11... Black matrix pattern, 2... Photomask, 21... Pattern, RlG, B... Colored part, R1, G1. BI...High purity photoresist, R2,G
2. B2... (modified curing) high purity photorenost, rl
, gl, bl...low purity photoresist, r2. g2.
b2... (modified curing) low purity photorenost. Ward ('J faction =◇ =5 =) =◇ =■ :)
Claims (2)
有したホトレジストと、前記ホトレジストの色を補正す
るための補色用顔料を分散含有したホトレジストとの積
層体からなることを特徴とするカラーフィルター。(1) A color characterized in that the colored portion formed in a pattern is composed of a laminate of a photoresist containing a pigment dispersed therein and a photoresist containing a complementary color pigment dispersed therein for correcting the color of the photoresist. filter.
ィルターの製造方法であって、顔料を分散含有した光硬
化性ホトレジストを透明基板上にパターン状に順次残存
形成し、該ホトレジストの一部、または全部それぞれに
前記ホトレジストの色を補正するための補色用顔料を分
散含有した光硬化性ホトレジストを順次積層して前記着
色部を形成することを特徴とするカラーフィルターの製
造方法。(2) A method for manufacturing a color filter in which colored portions are formed using photolithography, in which a photocurable photoresist containing a dispersed pigment is sequentially formed to remain in a pattern on a transparent substrate, and a portion of the photoresist is , or a method for manufacturing a color filter, characterized in that the colored portion is formed by sequentially laminating photocurable photoresists each containing a complementary color pigment dispersed therein for correcting the color of the photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2149588A JPH0442101A (en) | 1990-06-07 | 1990-06-07 | Color filter and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2149588A JPH0442101A (en) | 1990-06-07 | 1990-06-07 | Color filter and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0442101A true JPH0442101A (en) | 1992-02-12 |
Family
ID=15478488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2149588A Pending JPH0442101A (en) | 1990-06-07 | 1990-06-07 | Color filter and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0442101A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008039802A (en) * | 2006-08-01 | 2008-02-21 | Toppan Printing Co Ltd | Color filter and liquid crystal display using same |
-
1990
- 1990-06-07 JP JP2149588A patent/JPH0442101A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008039802A (en) * | 2006-08-01 | 2008-02-21 | Toppan Printing Co Ltd | Color filter and liquid crystal display using same |
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