JPH04349147A - Radiation-resistant optical fiber and its production - Google Patents
Radiation-resistant optical fiber and its productionInfo
- Publication number
- JPH04349147A JPH04349147A JP3146932A JP14693291A JPH04349147A JP H04349147 A JPH04349147 A JP H04349147A JP 3146932 A JP3146932 A JP 3146932A JP 14693291 A JP14693291 A JP 14693291A JP H04349147 A JPH04349147 A JP H04349147A
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- radiation
- sio2
- preform
- geo2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 33
- 230000005855 radiation Effects 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 38
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims abstract description 26
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 20
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 19
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 19
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 19
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 19
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 19
- 239000004071 soot Substances 0.000 claims abstract description 16
- 239000011521 glass Substances 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims description 8
- 238000005253 cladding Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 abstract description 8
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 abstract description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 5
- 239000001257 hydrogen Substances 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 3
- 239000000835 fiber Substances 0.000 abstract description 2
- 229910004074 SiF6 Inorganic materials 0.000 abstract 1
- 229910020489 SiO3 Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910006113 GeCl4 Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 2
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/01453—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering for doping the preform with flourine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は耐放射線性を有する光フ
ァイバとその製法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical fiber having radiation resistance and a method for manufacturing the same.
【０００２】0002
【従来の技術】従来より、耐放射線性に優れた光ファイ
バとして、純石英からなるコアと、屈折率を下げ、かつ
耐放射線性を向上せしめるドーパントであるＦが添加さ
れたクラッドとから形成されたステップインデックス（
ＳＩ）形光ファイバが用いられていた。しかしこのＳＩ
形光ファイバは伝送帯域が小さいため、その適用範囲が
限られていた。[Prior Art] Conventionally, optical fibers with excellent radiation resistance have been formed from a core made of pure silica and a cladding doped with F, a dopant that lowers the refractive index and improves radiation resistance. Step index (
SI) type optical fiber was used. However, this SI
Because the transmission band of shaped optical fiber is small, its range of application has been limited.
【０００３】そこで、ＳｉＯ２に屈折率を上げるドーパ
ントであるＧｅＯ２を添加することによって屈折率プロ
ファイルが制御されたグレーデッドインデックス（ＧＩ
）形光ファイバが放射線雰囲気下で用いられるようにな
った。このＧＩ形光ファイバは伝送帯域が大きいため、
広い範囲に適用することができる。[0003] Therefore, graded index (GI), in which the refractive index profile is controlled by adding GeO2, which is a dopant that increases the refractive index, to SiO2 is used.
)-shaped optical fibers have come to be used in radiation atmospheres. This GI type optical fiber has a large transmission band, so
Can be applied to a wide range.
【０００４】そして、このものは一般にＶＡＤ法によっ
て以下のようにして製造される。まず、バーナに原料と
なるＳｉＣｌ４およびＧｅＣｌ４、燃料となる水素およ
び酸素を供給する。水素は燃焼して火炎となり、その火
炎中で、火炎加水分解反応および酸化反応によりＳｉＯ
２とＧｅＯ２が生成する。生成したＳｉＯ２の粒子はス
ートプリフォームの下面に堆積するとともに、この中に
ＧｅＯ２が取り込まれる。このスートプリフォームはそ
の中心軸を回転軸として回転するとともに、上方に引き
上げられつつ成長し、所望の長さのスートプリフォーム
が形成される。得られたスートプリフォームはＣｌ等の
ハロゲン雰囲気中で脱水され、さらに高温で焼結されて
透明なプリフォームとなる。このプリフォームは高温の
線引炉で溶融状態とされ、線引されて光ファイバが形成
される。[0004] This product is generally manufactured by the VAD method as follows. First, SiCl4 and GeCl4 as raw materials and hydrogen and oxygen as fuel are supplied to the burner. Hydrogen burns to form a flame, and in the flame, SiO is produced by flame hydrolysis and oxidation reactions.
2 and GeO2 are generated. The generated SiO2 particles are deposited on the lower surface of the soot preform, and GeO2 is taken into them. The soot preform rotates about its central axis and grows while being pulled upward, forming a soot preform of a desired length. The obtained soot preform is dehydrated in a halogen atmosphere such as Cl, and further sintered at a high temperature to become a transparent preform. This preform is molten in a high temperature drawing furnace and drawn to form an optical fiber.
【０００５】[0005]
【発明が解決しようとする課題】このような、ＳｉＯ２
にＧｅＯ２が添加されたＧＩ形光ファイバは、ＳｉＣｌ
４およびＧｅＣｌ４を原料として製造され、またＣｌ雰
囲気中で脱水されるため数百ｐｐｍのＣｌを含有してお
り、これが原因となって放射線雰囲気下において伝送損
失の増加が起こるという問題があった。したがって、こ
のＧＩ形光ファイバは、放射線の照射線量が１０５Ｒ程
度以下の放射線環境下においてしか使用することができ
なかった。[Problem to be solved by the invention] Such SiO2
GI type optical fiber doped with GeO2 is SiCl
Since it is manufactured using 4 and GeCl4 as raw materials and is dehydrated in a Cl atmosphere, it contains several hundred ppm of Cl, which causes a problem of increased transmission loss in a radiation atmosphere. Therefore, this GI type optical fiber could only be used in a radiation environment where the radiation dose was about 105R or less.
【０００６】この発明は前記事情に鑑みてなされたもの
で、広い伝送帯域を有し、かつ耐放射線性に優れた光フ
ァイバの提供を目的とする。The present invention was made in view of the above circumstances, and an object thereof is to provide an optical fiber having a wide transmission band and excellent radiation resistance.
【０００７】[0007]
【課題を解決するための手段】この発明の請求項１記載
の耐放射線性光ファイバは、Ｃｌを含有せず、かつＦが
０．１重量％以上添加されたＳｉＯ２からなることを前
記課題の解決手段とした。また、請求項２記載の耐放射
線性光ファイバは上記請求項１記載の光ファイバであっ
て、ＧｅＯ２およびＦが添加されたＳｉＯ２からなるコ
アと、Ｆが添加されたＳｉＯ２からなるクラッドを有す
ることを前記課題の解決手段とした。また、請求項３記
載の耐放射線性光ファイバの製法は、ガラス原料として
アルコキシシランとアルコキシゲルマンを用いてスート
プリフォームを形成し、これをＳＦ６雰囲気中で加熱す
ることによって、請求項１または２に記載の耐放射線性
光ファイバを製造することを前記課題の解決手段とした
。[Means for Solving the Problems] The radiation-resistant optical fiber according to claim 1 of the present invention is made of SiO2 that does not contain Cl and has 0.1% by weight or more of F added thereto. It was used as a solution. Furthermore, the radiation-resistant optical fiber according to claim 2 is the optical fiber according to claim 1, and has a core made of SiO2 doped with GeO2 and F, and a cladding made of SiO2 doped with F. was used as a means of solving the above problem. Further, the method for producing a radiation-resistant optical fiber according to claim 3 is performed by forming a soot preform using alkoxysilane and alkoxygermane as glass raw materials and heating this in an SF6 atmosphere. The solution to the above problem was to manufacture the radiation-resistant optical fiber described in .
【０００８】[0008]
【作用】本発明において、放射線雰囲気下において伝送
損失を増大させる原因となるＣｌが添加されることなく
光ファイバを形成するとともに、耐放射線性を向上せし
めるドーパントであるＦを添加することにより、耐放射
線性に優れた光ファイバを得ることができる。また屈折
率を上げるドーパントであるＧｅＯ２をコアに添加して
屈折率を制御することによって、伝送帯域が大きいＧＩ
形光ファイバを得ることができる。また、上記Ｆの添加
量は０．１重量％以上に設定され、光ファイバの屈折率
分布に影響しない範囲で、好ましくは０．１〜１．０重
量％とすることができる。またこのような光ファイバは
、ガラス原料としてアルコキシシランとアルコキシゲル
マンを用いてスートプリフォームを形成し、これをＳＦ
６雰囲気中で加熱することによって製造することができ
る。[Operation] In the present invention, an optical fiber is formed without adding Cl, which causes increased transmission loss in a radiation atmosphere, and by adding F, which is a dopant that improves radiation resistance. An optical fiber with excellent radiation properties can be obtained. In addition, by controlling the refractive index by adding GeO2, a dopant that increases the refractive index, to the core, a GI with a large transmission band can be used.
shaped optical fiber can be obtained. Further, the amount of F added is set to 0.1% by weight or more, and preferably 0.1 to 1.0% by weight within a range that does not affect the refractive index distribution of the optical fiber. In addition, such optical fibers are produced by forming a soot preform using alkoxysilane and alkoxygermane as glass raw materials, and then fabricating this with SF.
It can be manufactured by heating in a 6 atmosphere.
【０００９】[0009]
【実施例】以下、本発明の一実施例を示し、詳しく説明
する。[Example] Hereinafter, an example of the present invention will be shown and explained in detail.
【００１０】本発明の耐放射線性光ファイバは原料とし
てＳｉ（ＣＨ３Ｏ）４、Ｓｉ（Ｃ２Ｈ５Ｏ）４等のアル
コキシシラン、およびＧｅ（ＣＨ３Ｏ）４、Ｇｅ（Ｃ２
Ｈ５Ｏ）４等のアルコキシゲルマンを用い、通常のＶＡ
Ｄ法によって製造することができる。まず、バーナに原
料となるＳｉ（ＣＨ３Ｏ）４およびＧｅ（ＣＨ３Ｏ）４
、燃料となる水素、および酸素を供給し、水素火炎中で
ＧｅＯ２およびＳｉＯ２を生成した。スートプリフォー
ムをその中心軸を回転軸として回転させつつ上方に引き
上げ、このスートプリフォームの下面に、ＧｅＯ２がド
ープされたＳｉＯ２の粒子を堆積、成長させた。このと
き、バーナの数、形状、原料の流し方等のスート堆積条
件を適宜設定することによってＧｅＯ２の添加量を制御
し、この屈折率プロファイルを放物線状に形成した。The radiation-resistant optical fiber of the present invention uses alkoxysilanes such as Si(CH3O)4, Si(C2H5O)4, Ge(CH3O)4, Ge(C2
Using an alkoxygermane such as H5O)4, normal VA
It can be manufactured by method D. First, the raw materials Si(CH3O)4 and Ge(CH3O)4 are added to the burner.
, hydrogen as a fuel, and oxygen were supplied to generate GeO2 and SiO2 in a hydrogen flame. The soot preform was pulled upward while rotating about its central axis, and SiO2 particles doped with GeO2 were deposited and grown on the lower surface of the soot preform. At this time, the amount of GeO2 added was controlled by appropriately setting the soot deposition conditions such as the number and shape of burners, and the method of flowing the raw material, and the refractive index profile was formed into a parabolic shape.
【００１１】得られたスートプリフォームを電気炉等の
任意の加熱手段を用いて、ＨｅおよびＳＦ６雰囲気中で
脱水、焼結するとともに、このスートプリフォームにＦ
を添加した。このときＳＦ６の流量は０．２ ｌ／ｍ
ｉｎ、Ｈｅの流量は３ ｌ／ｍｉｎとし、Ｆの添加量
は０．３重量％とした。ここで、ＳＦ６の流量を適宜設
定することによってＦの添加量を制御することができる
。The obtained soot preform is dehydrated and sintered in an atmosphere of He and SF6 using any heating means such as an electric furnace, and the soot preform is heated with F.
was added. At this time, the flow rate of SF6 is 0.2 l/m
In, the flow rate of He was 3 l/min, and the amount of F added was 0.3% by weight. Here, the amount of F added can be controlled by appropriately setting the flow rate of SF6.
【００１２】このようにして透明ガラス化されたプリフ
ォームを高温の線引炉で線引することによって、コアが
ＧｅＯ２およびＦが添加されたＳｉＯ２からなり、クラ
ッドがＦが添加されたＳｉＯ２からなり、かつＣｌを含
有しないＧＩ形光ファイバが得られた。By drawing the transparent vitrified preform in a high-temperature drawing furnace, the core is made of SiO2 to which GeO2 and F are added, and the cladding is made of SiO2 to which F is added. A GI optical fiber containing no Cl was obtained.
【００１３】得られた光ファイバにγ線を照射線量が１
０７Ｒとなるまで照射したが、損失増加は非常に小さく
、実用においては無視できる程度であった。The obtained optical fiber was irradiated with gamma rays at a dose of 1
Although irradiation was performed until the temperature reached 07R, the increase in loss was very small and could be ignored in practical use.
【００１４】[0014]
【発明の効果】以上説明したように、この発明の耐放射
線性光ファイバは、Ｃｌを含有せず、かつ少なくともＦ
が０．１重量％以上添加されたＳｉＯ２からなるもので
ある。したがって、従来の光ファイバに含有されていた
Ｃｌによる伝送損失の増加を防止するとともに、Ｆを添
加することによって耐放射線性を向上させることができ
る。Effects of the Invention As explained above, the radiation-resistant optical fiber of the present invention does not contain Cl and contains at least F.
It is made of SiO2 to which 0.1% by weight or more of is added. Therefore, an increase in transmission loss due to Cl contained in conventional optical fibers can be prevented, and radiation resistance can be improved by adding F.
【００１５】また、本発明の耐放射線性光ファイバをＧ
ｅＯ２およびＦが添加されたＳｉＯ２からなるコアとＦ
が添加されたＳｉＯ２からなるクラッドとによって形成
することによって、光ファイバの屈折率プロファイルを
容易に制御することができ、伝送帯域が大きいＧＩ形光
ファイバを形成することができ、放射線雰囲気下におけ
る光ファイバの適用範囲を増大させることができる。Furthermore, the radiation-resistant optical fiber of the present invention is
A core made of SiO2 doped with eO2 and F and F
The refractive index profile of the optical fiber can be easily controlled by forming a cladding made of SiO2 doped with Fiber coverage can be increased.
【００１６】さらに、ガラス原料としてアルコキシシラ
ンとアルコキシゲルマンを用いてスートプリフォームを
形成し、これをＳＦ６雰囲気中で加熱することによって
、Ｆの添加を行うと同時に、Ｃｌを用いることなくスー
トプリフォームの脱水を行うことができる。Furthermore, by forming a soot preform using alkoxysilane and alkoxygermane as glass raw materials and heating it in an SF6 atmosphere, a soot preform can be formed without using Cl while simultaneously adding F. can be dehydrated.
Claims (3)
０．１重量％以上添加されたＳｉＯ２からなることを特
徴とする耐放射線性光ファイバ。1. A radiation-resistant optical fiber characterized in that it is made of SiO2 that does not contain Cl and has at least 0.1% by weight of F added thereto.
２からなるコアと、Ｆが添加されたＳｉＯ２からなるク
ラッドを有することを特徴とする請求項１記載の耐放射
線性光ファイバ。[Claim 2] SiO added with GeO2 and F
2. The radiation-resistant optical fiber according to claim 1, having a core made of SiO2 and a cladding made of F-doped SiO2.
アルコキシゲルマンを用いてスートプリフォームを形成
し、これをＳＦ６雰囲気中で加熱することを特徴とする
請求項１または２記載の耐放射線性光ファイバの製法。3. The method for producing a radiation-resistant optical fiber according to claim 1 or 2, characterized in that a soot preform is formed using alkoxysilane and alkoxygermane as glass raw materials, and this is heated in an SF6 atmosphere. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3146932A JPH04349147A (en) | 1991-05-22 | 1991-05-22 | Radiation-resistant optical fiber and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3146932A JPH04349147A (en) | 1991-05-22 | 1991-05-22 | Radiation-resistant optical fiber and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04349147A true JPH04349147A (en) | 1992-12-03 |
Family
ID=15418835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3146932A Pending JPH04349147A (en) | 1991-05-22 | 1991-05-22 | Radiation-resistant optical fiber and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04349147A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0888398A1 (en) * | 1996-12-16 | 1999-01-07 | Corning Incorporated | Germanium doped silica forming feedstock and method |
| WO1999002459A1 (en) * | 1997-07-08 | 1999-01-21 | Corning Incorporated | Germanium chloride and siloxane feedstock for forming silica glass and method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6163543A (en) * | 1984-09-01 | 1986-04-01 | Showa Electric Wire & Cable Co Ltd | Quartz-based optical fiber |
| JPS61222940A (en) * | 1985-03-29 | 1986-10-03 | Furukawa Electric Co Ltd:The | Optical fiber |
| JPS62143845A (en) * | 1985-12-18 | 1987-06-27 | Mitsubishi Cable Ind Ltd | Light-transmission path having radiation resistance |
| JPH0214850A (en) * | 1988-06-29 | 1990-01-18 | Mitsubishi Cable Ind Ltd | Radiation-resistant multiple fiber |
-
1991
- 1991-05-22 JP JP3146932A patent/JPH04349147A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6163543A (en) * | 1984-09-01 | 1986-04-01 | Showa Electric Wire & Cable Co Ltd | Quartz-based optical fiber |
| JPS61222940A (en) * | 1985-03-29 | 1986-10-03 | Furukawa Electric Co Ltd:The | Optical fiber |
| JPS62143845A (en) * | 1985-12-18 | 1987-06-27 | Mitsubishi Cable Ind Ltd | Light-transmission path having radiation resistance |
| JPH0214850A (en) * | 1988-06-29 | 1990-01-18 | Mitsubishi Cable Ind Ltd | Radiation-resistant multiple fiber |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0888398A1 (en) * | 1996-12-16 | 1999-01-07 | Corning Incorporated | Germanium doped silica forming feedstock and method |
| EP0888398A4 (en) * | 1996-12-16 | 1999-09-29 | Corning Inc | Germanium doped silica forming feedstock and method |
| WO1999002459A1 (en) * | 1997-07-08 | 1999-01-21 | Corning Incorporated | Germanium chloride and siloxane feedstock for forming silica glass and method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19961119 |