JPH04331B2 - - Google Patents
Info
- Publication number
- JPH04331B2 JPH04331B2 JP10499180A JP10499180A JPH04331B2 JP H04331 B2 JPH04331 B2 JP H04331B2 JP 10499180 A JP10499180 A JP 10499180A JP 10499180 A JP10499180 A JP 10499180A JP H04331 B2 JPH04331 B2 JP H04331B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- photoresist
- phosphor
- panel
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 32
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 19
- 239000011159 matrix material Substances 0.000 claims description 16
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 9
- 239000011358 absorbing material Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000001263 FEMA 3042 Substances 0.000 description 3
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 3
- 229940033123 tannic acid Drugs 0.000 description 3
- 235000015523 tannic acid Nutrition 0.000 description 3
- 229920002258 tannic acid Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/18—Luminescent screens
- H01J29/30—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines
- H01J29/32—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines with adjacent dots or lines of different luminescent material, e.g. for colour television
- H01J29/327—Black matrix materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/22—Applying luminescent coatings
- H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
- H01J9/2278—Application of light absorbing material, e.g. between the luminescent areas
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Description
【発明の詳細な説明】
本発明はカラー受像管けい光面の形成方法、特
に光吸収材よりなるモザイクまたはストライプ状
のパターン、いわゆるブラツクマトリツクス面の
形成方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a fluorescent surface of a color picture tube, and more particularly to a method for forming a mosaic or striped pattern of light absorbing material, a so-called black matrix surface.
一般にシヤドウマスク形カラー受像管けい光面
には、黒鉛膜を形成してなるブラツクマトリツク
ス形と黒鉛膜のないノンブラツクマトリツクス形
とがあり、本発明は前者に適合し、その形成方法
は通常用いられている写真印刷法によつて行なわ
れる。 In general, the fluorescent surface of a shadow mask type color picture tube is classified into a black matrix type in which a graphite film is formed and a non-black matrix type in which no graphite film is formed. This is done using the photo printing method used.
第１図ａ〜ｇは従来のブラツクマトリツクス形
けい光面の形成方法の一例を説明するための要部
断面工程図である。これらの図において、まず、
同図ａに示したように最初にパネル１の内面にホ
トレジスト２を塗布し、乾燥した後、シヤドウマ
スク３をパネル１に装着してシヤドウマスク３に
形成されている例えばスリツトパターンを感光さ
せる。このとき、露光は同図ａに示すように光源
位置がパネル１のシール面に対して垂直な方向に
適当な距離をもつてパネル１の中心に一致させた
光４ａとさらに水平方向（左，右）に同じ偏位量
をもつ光４ｂ，４ｃとの３種の露光光源光を用い
て、各々緑，青，赤のけい光体ストライプパター
ンの絵素を形成する部分を露光して感光されたホ
トレジスト被膜を形成する。そして、露光完了
後、パネル１よりシヤドウマスクを取り外し、適
当な方法で現像を行なうことにより、未露光部分
のホトレジスト２を洗い落し、同図ｂに示したよ
うにホトレジスト被膜からなるホトレジストスト
ライプ２ａをパネル１の内面に形成する。次に、
同図ｃで示すようにパネル１の内面に例えばアク
アダツクなどの光吸収性物質５を全面に塗布して
乾燥した後、例えばNaOcl、H2O2などのエツチ
ング液をパネル１内面に注入し、ホトレジストス
トライプ２ａを剥離除去し、さらに現像を行なう
ことによつて、同図ｄに示したようにブラツクマ
トリツクス膜５ａを形成する。次に、同図ｅに示
したように３色のけい光体絵素を形成するけい光
体スラリ６をパネル１内に塗布し、各々緑，青，
赤の順に順次露光して現像することにより、同図
ｆに示したように上記ホトレジストストライプ２
ａを除去した部分に各々けい光体ストライプ６G，
６B，６Rを形成する。この場合、上記ホトレジス
ト２を露光した露光装置と同様の装置を用いてけ
い光体スラリ６面を露光する。次に、同図ｆに示
したように各々けい光体ストライプ６G，６B，６
Ｒ上にアクリル樹脂系のフイルミング膜７を形成
し、さらにAlを真空蒸着により、Al膜８を形成
する。次に、このパネル１を400〜450℃のパネル
ベーキングを行なうことによつて、フイルミング
膜７およびけい光体ストライプ６G，６B，６R中
の有機化合物を除去し、同図ｇに示したようなブ
ラツクマトリツクス形のけい光面が形成される。 FIGS. 1a to 1g are cross-sectional process diagrams of essential parts for explaining an example of a conventional method for forming a black matrix type fluorescent surface. In these figures, first,
As shown in FIG. 1A, a photoresist 2 is first applied to the inner surface of the panel 1, and after drying, a shadow mask 3 is attached to the panel 1 and, for example, a slit pattern formed on the shadow mask 3 is exposed to light. At this time, as shown in FIG. On the right), using three types of exposure light sources, lights 4b and 4c with the same amount of deviation, the parts forming the picture elements of the green, blue, and red phosphor stripe patterns are exposed and exposed. A photoresist film is formed. After the exposure is completed, the shadow mask is removed from the panel 1, and the unexposed portions of the photoresist 2 are washed off by development using an appropriate method, and the photoresist stripes 2a made of the photoresist film are applied to the panel as shown in FIG. Formed on the inner surface of 1. next,
As shown in Figure c, after coating the entire surface of the panel 1 with a light-absorbing material 5 such as Aquadac and drying it, an etching solution such as NaOcl or H 2 O 2 is injected into the panel 1's inner surface. The photoresist stripe 2a is peeled off and developed, thereby forming a black matrix film 5a as shown in FIG. Next, as shown in FIG.
By sequentially exposing and developing the photoresist stripes in the order of red, the photoresist stripes 2 are formed as shown in FIG.
A phosphor stripe 6 G ,
Form 6 B and 6 R. In this case, the phosphor slurry 6 surface is exposed using an exposure device similar to the one that exposed the photoresist 2 described above. Next, as shown in FIG .
An acrylic resin-based filming film 7 is formed on R , and an Al film 8 is further formed by vacuum evaporation of Al. Next, this panel 1 is subjected to panel baking at 400 to 450°C to remove organic compounds in the filming film 7 and the phosphor stripes 6 G , 6 B , and 6 R , as shown in g in the same figure. A black matrix-shaped fluorescent surface is formed.
しかしながら、上記方法によるけい光面の形成
方法においては、上述したようにけい光面の製作
工程は極めて複雑であり、しかも多数回の湿式塗
布、水洗、現像および乾燥等の繰り返しを行なう
長大なプロセスを必要とするため、その作業性、
生産工程等において合理化が極めて困難であり、
生産コストを高価なものにしていた。また、この
長大なプロセスにおいても電気、水等のエネルギ
および諸材料を多量に使用するため、その生産コ
ストをさらに高価なものにしていた。 However, in the method for forming a fluorescent surface using the above method, the manufacturing process of the fluorescent surface is extremely complicated as described above, and is a lengthy process that involves repeating multiple wet coatings, washing, development, and drying. Because it requires, its workability,
It is extremely difficult to rationalize production processes, etc.
This made production costs expensive. Furthermore, this lengthy process also uses a large amount of energy such as electricity and water, as well as various materials, making the production cost even higher.
したがつて本発明は上記従来の欠点を除去し、
生産プロセスを短縮させてブラツクマトリツクス
面を低コストで得るようにしたカラー受像管けい
光面の形成方法を提供することを目的としてい
る。 Therefore, the present invention eliminates the above-mentioned conventional drawbacks,
It is an object of the present invention to provide a method for forming a fluorescent surface of a color picture tube by which a black matrix surface can be obtained at low cost by shortening the production process.
このような目的を達成するために本発明は、ブ
ラツクマトリツクス形成工程を省略し、パネルベ
ーキング時にブラツクマトリツクス膜を形成した
ものである。以下図面を用いて本発明を詳細に説
明する。 In order to achieve this object, the present invention omits the black matrix forming step and forms a black matrix film during panel baking. The present invention will be explained in detail below using the drawings.
第２図ａ〜ｇは本発明によるブラツクマトリツ
クス形けい光面の形成方法の一例を説明するため
の要部断面工程図であり、第１図ａ〜ｈと同記号
は同一要素となるのでその説明は省略する。これ
らの図において、まず、同図ａに示したようにパ
ネル１の内面に、光吸収性物質（黒鉛等）の熱分
解を促進させる物質例えばタンニン酸などを混合
したホトレジスト９を塗布して乾燥した後、シヤ
ドウマスク３を介して各々緑，青，赤の絵素を形
成する部分を露光して現像し、未露光部分のホト
レジスト９を洗い落し、同図ｂに示したようにホ
トレジスト９によるホトレジストストライプ９ａ
をパネル１内面に形成する。次に、同図ｃに示し
たようにホトレジストストライプ９ａが形成され
たパネル１の内面に光吸収性物質５を全面一様に
塗布する。この場合、ホトレジストストライプ９
ａのエツチングを行なわない。次に、同図ｄに示
したようにこの光吸収性物質５の膜上にけい光体
スラリ６を塗布し、各々緑，青，赤の順に順次露
光して現像することにより、けい光体ストライプ
６G，６B，６Rが形成される。しかる後、同図ｅ
に示したようにこのけい光体ストライプ６G，６
Ｂ，６R上にアクリル系樹脂のフイルミング膜７を
形成し、さらにその上面にAl膜８を形成する。
次にこのパネル１を400〜450℃でパネルベーキン
グすることによつて、パネル１の内面に形成され
ていた光吸収性物質の熱分解を促進する物質（タ
ンニン酸）を含むホトレジストストライプ９ａ
と、アクリル系フイルミング膜７と、けい光体ス
トライプ６Ｇ，６Ｂ，６Ｒに含有されている有機
化合物とが熱分解する。そして、その熱分解と同
時に発生する上記タンニン酸の発熱効果により、
ホトレジストストライプ９ａ及びこのホトレジス
トストライプ９ａ上の光吸収性物質５が焼却され
てブラツクマトリツクス膜５ａが形成されるとと
もに、ホトレジストストライプ９ａの除去部分に
はけい光体ストライプ６G，６B，６Rが埋め込ま
れて同図ｆに示したようなブラツクマトリツクス
形のけい光面が形成される。 FIGS. 2a to 2g are cross-sectional process diagrams of essential parts for explaining an example of the method for forming a black matrix type fluorescent surface according to the present invention, and the same symbols as in FIGS. 1a to 1h are the same elements. The explanation will be omitted. In these figures, first, as shown in figure a, a photoresist 9 mixed with a substance that promotes thermal decomposition of a light-absorbing substance (such as graphite), such as tannic acid, is applied to the inner surface of the panel 1 and dried. After that, the portions where green, blue, and red picture elements are to be formed are exposed and developed through the shadow mask 3, and the unexposed portions of the photoresist 9 are washed off, and as shown in FIG. stripe 9a
is formed on the inner surface of panel 1. Next, as shown in FIG. 3C, a light-absorbing material 5 is uniformly applied to the inner surface of the panel 1 on which the photoresist stripes 9a are formed. In this case, photoresist stripe 9
Do not perform etching in a. Next, as shown in FIG. d, a phosphor slurry 6 is applied onto the film of the light-absorbing material 5, and the phosphor slurry 6 is sequentially exposed and developed in the order of green, blue, and red. Stripes 6 G , 6 B and 6 R are formed. After that, the same figure e
As shown in this phosphor stripe 6 G , 6
A filming film 7 of acrylic resin is formed on B and 6R , and an Al film 8 is further formed on the upper surface thereof.
Next, by baking this panel 1 at 400 to 450°C, a photoresist stripe 9a containing a substance (tannic acid) that promotes thermal decomposition of the light-absorbing substance formed on the inner surface of the panel 1 is formed.
Then, the acrylic filming film 7 and the organic compound contained in the phosphor stripes 6G, 6B, and 6R are thermally decomposed. Due to the exothermic effect of the tannic acid that occurs simultaneously with its thermal decomposition,
The photoresist stripe 9a and the light-absorbing material 5 on the photoresist stripe 9a are incinerated to form a black matrix film 5a, and phosphor stripes 6 G , 6 B , 6 R are formed in the removed portion of the photoresist stripe 9a. is embedded to form a black matrix-shaped fluorescent surface as shown in FIG.
このような形成方法において、パネル１の内面
に光吸収性物質の熱分解を促進する物質を混合し
たホトレジスト２を塗布し、けい光体ストライプ
を形成する部分を露光して感光させた後、光吸収
性物質５を全面一様に塗布し、さらにその上面に
けい光体ストライプ６G，６B，６R、フイルミン
グ膜７およびAl膜８を形成した後、パネルベー
キングすることによつて、感光されているホトレ
ジストストライプ９ａが焼却されてその両側にブ
ラツクマトリツクス膜５ａが形成できるため、パ
ネル１内面のホトレジストストライプ９ａ上に光
吸収性物質５を塗布した後のエツチング、剥離、
洗浄および乾燥などの工程が不要となるので、製
作工程を短縮できるとともに、装置の簡略化が可
能となる。 In such a forming method, a photoresist 2 mixed with a substance that promotes thermal decomposition of a light-absorbing substance is applied to the inner surface of the panel 1, and after exposing the portion where the phosphor stripes are to be formed, the photoresist 2 is exposed to light. After uniformly applying the absorbent substance 5 to the entire surface and forming phosphor stripes 6 G , 6 B , 6 R , a filming film 7 and an Al film 8 on the upper surface, the photosensitive material is exposed by panel baking. Since the photoresist stripe 9a that has been applied is incinerated and a black matrix film 5a is formed on both sides of the photoresist stripe 9a, etching, peeling, etc.
Since steps such as washing and drying are not required, the manufacturing process can be shortened and the device can be simplified.
なお、上記実施例においては、パネル１の内面
に光吸収性物質の熱分解を促進する物質を含有さ
せたホトレジスト９のホトレジストストライプ９
ａを最初に形成した場合について説明したが、本
発明はこれに限定されるものではなく、パネル１
の内面に光吸収性物質５を塗布した後に光吸収性
物質の熱分解を促進する物質を含有させたホトレ
ジスト９のホトレジストストライプ９ａを形成し
ても、前述と全く同様の効果が得られる。また、
光吸収性物質の熱分解を促進する物質をけい光体
スラリ６に混合させてけい光体ストライプ６G，
６B，６Rを形成することでも前述と全く同様の効
果が得られることは明らかである。 In the above embodiment, the photoresist stripes 9 of the photoresist 9 containing a substance that promotes thermal decomposition of a light-absorbing substance are formed on the inner surface of the panel 1.
Although the case where the panel a is formed first has been described, the present invention is not limited to this, and the panel 1 is formed first.
Even if the photoresist stripes 9a of the photoresist 9 containing a substance that promotes thermal decomposition of the light-absorbing material is formed after coating the inner surface of the light-absorbing material 5, the same effect as described above can be obtained. Also,
A substance that promotes thermal decomposition of the light-absorbing substance is mixed into the phosphor slurry 6 to form phosphor stripes 6G ,
It is clear that the same effect as described above can be obtained by forming 6 B and 6 R.
また、上記実施例において、けい光体膜をスト
ライプ状とした場合について説明したが、ドツト
状であつても前述と同様の効果が得られることは
勿論である。 Further, in the above embodiments, the case where the phosphor film is formed into a stripe shape has been described, but it goes without saying that the same effect as described above can be obtained even when the phosphor film is formed into a dot shape.
以上説明したように本発明によるカラー受像管
けい光面の形成方法によれば、ブラツクマトリツ
クスの光吸収層の形成工程を工程間に独立して設
けることが不要となるため、従来の形成方法に比
較して製造プロセスが簡易化されるので、けい光
面の形成工程が短縮され、生産コストを大幅に低
減させることができるなどの極めて優れた効果が
得られる。 As explained above, according to the method for forming the fluorescent surface of a color picture tube according to the present invention, it is not necessary to separately provide the step of forming the light absorption layer of the black matrix between steps. Since the manufacturing process is simplified compared to the previous method, the process for forming the fluorescent surface is shortened, and extremely excellent effects such as a significant reduction in production costs can be obtained.
第１図ａ〜ｇは従来のカラー受像管けい光面の
形成方法を説明するための要部断面工程図、第２
図ａ〜ｆは本発明によるカラー受像管けい光面の
形成方法の一例を説明するための要部断面工程図
である。
１…パネル、５…光吸収性物質、５ａ…ブラツ
クマトリツクス膜、６…けい光体スラリ、６G，
６B，６R…けい光体ストライプ、７…フイルミン
グ膜、８…Al膜、９…光吸収性物質の熱分解を
促進する物質を含有したホトレジスト、９ａ…ホ
トレジストストライプ。
Figures 1a to 1g are cross-sectional process diagrams of main parts for explaining the conventional method of forming the fluorescent surface of a color picture tube;
Figures a to f are cross-sectional process diagrams of essential parts for explaining an example of a method for forming a color picture tube fluorescent surface according to the present invention. DESCRIPTION OF SYMBOLS 1... Panel, 5... Light-absorbing substance, 5a... Black matrix film, 6... Phosphor slurry, 6 G ,
6 B , 6 R ... Phosphor stripe, 7... Filming film, 8... Al film, 9... Photoresist containing a substance that promotes thermal decomposition of a light-absorbing substance, 9a... Photoresist stripe.
Claims (1)
ラツクマトリツクス形カラー受像管けい光面の形
成方法において、前記パネルの内面にホトレジス
ト膜を形成する工程と、前記ホトレジスト膜にシ
ヤドウマスクを介してけい光体絵素を形成すべき
位置を露光し未露光部を現像除去してホトレジス
トの絵素を形成する工程と、前記ホトレジストの
絵素が形成されたパネルの内面に光吸収性物質を
塗布して乾燥する工程と、前記光吸収性物質膜上
にけい光体を分散させた各色のけい光体膜を形成
する工程と、前記けい光体膜上にフイルミング膜
を形成する工程と、前記パネルを焼成する工程と
を有し、前記ホトレジスト膜、けい光体膜の両方
もしくはいずれか一方に前記光吸収性物質の熱分
解を促進する物質を混合させることによつて、光
吸収性物質のブラツクマトリツクス面を形成した
ことを特徴とするブラツクマトリツクス形カラー
受像管けい光面の形成方法。1. A method for forming a phosphor surface of a black matrix color picture tube in which a phosphor is adhered to the inner surface of a panel, including the steps of forming a photoresist film on the inner surface of the panel, and applying a shadow mask to the photoresist film. A step of exposing a position where a phosphor picture element is to be formed and developing and removing the unexposed part to form a photoresist picture element, and applying a light-absorbing substance to the inner surface of the panel on which the photoresist picture element is formed. a step of forming a phosphor film of each color in which a phosphor is dispersed on the light-absorbing material film; a step of forming a filming film on the phosphor film; and baking the panel, and by mixing a substance that promotes thermal decomposition of the light-absorbing substance into the photoresist film and/or the phosphor film, the light-absorbing substance is heated. A method for forming a fluorescent surface of a black matrix type color picture tube, characterized in that a black matrix surface is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10499180A JPS5732543A (en) | 1980-08-01 | 1980-08-01 | Method of forming fluorescent surface for color-picture tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10499180A JPS5732543A (en) | 1980-08-01 | 1980-08-01 | Method of forming fluorescent surface for color-picture tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5732543A JPS5732543A (en) | 1982-02-22 |
| JPH04331B2 true JPH04331B2 (en) | 1992-01-07 |
Family
ID=14395556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10499180A Granted JPS5732543A (en) | 1980-08-01 | 1980-08-01 | Method of forming fluorescent surface for color-picture tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5732543A (en) |
-
1980
- 1980-08-01 JP JP10499180A patent/JPS5732543A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5732543A (en) | 1982-02-22 |
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