JPH02264203A - Production of color filter - Google Patents
Production of color filterInfo
- Publication number
- JPH02264203A JPH02264203A JP1085401A JP8540189A JPH02264203A JP H02264203 A JPH02264203 A JP H02264203A JP 1085401 A JP1085401 A JP 1085401A JP 8540189 A JP8540189 A JP 8540189A JP H02264203 A JPH02264203 A JP H02264203A
- Authority
- JP
- Japan
- Prior art keywords
- colored
- light
- oxygen
- exposed
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 27
- 239000001301 oxygen Substances 0.000 claims abstract description 27
- 239000011159 matrix material Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 12
- 239000003999 initiator Substances 0.000 claims abstract description 10
- 239000000049 pigment Substances 0.000 claims abstract description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 230000001133 acceleration Effects 0.000 claims abstract 3
- 238000006116 polymerization reaction Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 4
- 230000000903 blocking effect Effects 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 229920000620 organic polymer Polymers 0.000 claims 1
- 239000002491 polymer binding agent Substances 0.000 claims 1
- 239000003505 polymerization initiator Substances 0.000 claims 1
- 230000004888 barrier function Effects 0.000 abstract description 7
- 230000007547 defect Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 11
- 241000519995 Stachys sylvatica Species 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、液晶カラーテレビ等に用いられるカラーフィ
ルター製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing color filters used in liquid crystal color televisions and the like.
従来の技術
一般に着色レジストを用いたカラーフィルター等のパタ
ーンの形成法は、第３図（Ａ）に示したように、ガラス
基板２１上に着色レジスト２２を所定の膜厚で塗布した
後、ブリベータを行い、光重合を行なうタイプの着色レ
ジストの場合は、酸素遮断膜２３を塗布して、マスク２
４を介して露光を行った後、現像、リンスによって不要
部分を除去し、最後にポストベークを行う工程よりなっ
ている。特に、カラーフィルターの場合、ブラックマト
リクスの形成にはカーボンを分散した着色レジストを用
い、画素の部分には、赤、緑、青、の顔料を分散した着
色レジストを用いている。BACKGROUND ART In general, a method of forming a pattern such as a color filter using a colored resist is as shown in FIG. In the case of a colored resist that undergoes photopolymerization, an oxygen barrier film 23 is applied and a mask 2 is applied.
After exposure through step 4, unnecessary portions are removed by development and rinsing, and finally post-baking is performed. In particular, in the case of color filters, a colored resist in which carbon is dispersed is used to form the black matrix, and a colored resist in which red, green, and blue pigments are dispersed is used for the pixel portions.
発明が解決しようとする課題
着色レジストは顔料等によって光吸収が大きいため膜厚
方向に光の強度分布がつきレジストの下部で重合が不十
分なため、第３図（Ｂ）に示すように、現像時サイドエ
ッチ２７が生じパターンの欠は等の原因となる。前記着
色レジストの下部まで十分重合し、耐現像性を有するの
に必要な露光ｌを確保するためには、表面で非常に大き
な露光量が必要となる。しかしこの場合、回折によりパ
ターンの太りが生じる。また、ブラックマトリクスに着
色レジストを用いた場合、ブラックマトリクスと画素が
重なった部分は盛り上がりを生じギャップむらや対向シ
ロートの原因となり易い。このため画素の大きさをブラ
ックマトリクスにはみ出さないようにするとアライメン
ト誤差等による白抜け２６が生じやすくなる。Problems to be Solved by the Invention Colored resists have large light absorption due to pigments, etc., resulting in light intensity distribution in the film thickness direction and insufficient polymerization at the bottom of the resist, as shown in Figure 3 (B). During development, side etching 27 occurs, causing pattern defects and the like. In order to sufficiently polymerize the colored resist to the lower part and to secure the exposure l necessary for it to have development resistance, a very large amount of exposure is required on the surface. However, in this case, the pattern becomes thicker due to diffraction. Furthermore, when a colored resist is used for the black matrix, the portion where the black matrix and pixels overlap tends to bulge, causing gap unevenness and opposing slope. For this reason, if the pixel size is set so that it does not extend beyond the black matrix, white spots 26 are likely to occur due to alignment errors and the like.
本発明はかかる点に鑑み、欠陥、白抜けのない安定なパ
ターンを有するカラーフィルタを容易に製造する方法を
提供することを目的とする。In view of this, an object of the present invention is to provide a method for easily manufacturing a color filter having a stable pattern without defects or white spots.
課題を解決するための手段
本発明は、上記課題を解決するため、透明基板上に顔料
もしくは、カーボンを混入、分散したネガ型（光重合型
）着色フォトレジストを塗布し、ベーキングを行なった
後、酸素雰囲気中でマスクを介して非パターン部に露光
を行ない非パターン部のラジカルを消費した後、前記着
色フォトレジストの上に酸素遮断膜を塗布し、乾燥させ
た後全面に露光を行った後、重合促進加熱、現像、リン
ス等を行い画素、及びブラックマトリクスパターンを形
成するカラーフィルタの形成を可能とする。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention applies a negative-type (photopolymerizable) colored photoresist in which a pigment or carbon is mixed and dispersed on a transparent substrate, and after baking it. After consuming the radicals in the non-patterned area by exposing the non-patterned area to light through a mask in an oxygen atmosphere, an oxygen blocking film was applied on top of the colored photoresist, and after drying, the entire surface was exposed to light. Thereafter, polymerization-promoting heating, development, rinsing, etc. are performed to enable the formation of pixels and a color filter that forms a black matrix pattern.
作用
本発明は、基板上に塗布し、乾燥させた前記着色レジス
トを酸素雰囲気中で露光すると、光によって光重合開始
剤がラジカルを生成するがこのラジカルは、酸素と反応
し重合に寄与することなくすぐに消滅してしまう。すな
わち、非パターン部に酸素雰囲気中で選択的に光を照射
し、非パターン部のラジカルを消費した後、酸素遮断雰
囲気で前記着色レジストの全面に露光を行うと、画素部
では、十分なラジカルの生成があるため重合が起こるが
、非パターン部ではラジカルの生成が不十分であるため
十分な重合が起こらない。このため、現像、リンスによ
って非パターン部は除去され画素部のみが残る。各色に
ついて、この工程を繰り返すことによってカラーフィル
ターを形成することができるみ
実施例
以下に、本発明の実施例について図面を参照しながら説
明する。Function The present invention provides that when the colored resist coated on a substrate and dried is exposed to light in an oxygen atmosphere, the photopolymerization initiator generates radicals due to the light, and these radicals react with oxygen and contribute to polymerization. It will disappear soon. That is, when the non-pattern area is selectively irradiated with light in an oxygen atmosphere to consume the radicals in the non-pattern area, and the entire surface of the colored resist is exposed to light in an oxygen-blocking atmosphere, sufficient radicals are generated in the pixel area. Polymerization occurs due to the generation of , but sufficient polymerization does not occur in the non-patterned area because radicals are insufficiently generated. Therefore, by developing and rinsing, the non-pattern portion is removed and only the pixel portion remains. A color filter can be formed by repeating this process for each color.Examples Examples of the present invention will be described below with reference to the drawings.
第１図は本発明の実施例の工程を説明するための工程断
面図である。基板１上に顔料やカーボン等を分散させた
着色フォトレジスト（光重合タイプ）を塗布し、ベーキ
ングを行い、所定の膜厚の着色レジスト層２を形成する
（同図（Ａ））。続いて、前記着色レジスト層２にマス
ク３を介して非パターン部４に酸素雰囲気中で選択的に
光を照射する（同図（Ｂ））。通常光重合タイプのレジ
ストは、以下に示した機構によって連鎖反応的に重合が
進む。FIG. 1 is a process sectional view for explaining the process of an embodiment of the present invention. A colored photoresist (photopolymerization type) in which pigments, carbon, etc. are dispersed is applied onto a substrate 1, and baking is performed to form a colored resist layer 2 of a predetermined thickness (FIG. 2(A)). Subsequently, light is selectively irradiated onto the non-patterned portions 4 of the colored resist layer 2 through the mask 3 in an oxygen atmosphere (FIG. 3(B)). In a normal photopolymerizable type resist, polymerization progresses in a chain reaction manner by the mechanism shown below.
Ｉｎｓ＋Ｍ −−＞ＩｎＭ＊ ＩｎＭ＊＋ｍＭ −−＞Ｉｎ−（Ｍ）ｓ。Ins+M -->InM＊ InM*+mM --> In-(M)s.
工ｎ：光重合開始剤
Ｍ：モノマー
この時、非パターン部４では、光重合開始剤（Ｉｎ）の
生成するラジカルは、以下の機構によって酸素に消費さ
れる。Step n: Photopolymerization initiator M: Monomer At this time, in the non-patterned portion 4, the radicals generated by the photopolymerization initiator (In) are consumed by oxygen by the following mechanism.
Ｉｎｓ ＋０２ −−＞Ｉｎ０−旦酸素と結合
した光重合開始剤は再び光があたってもラジカルを生成
しなくなる。Ins +02 --> In0 - Once the photopolymerization initiator has bonded with oxygen, it will no longer generate radicals even if it is exposed to light again.
この様にして、非パターン部の光重合開始剤を十分酸素
と結合させた後、前記着色レジスト層２に酸素遮断膜６
を塗布した後全面に光を照射する（同図（Ｃ））。この
時前記非パターン部４は、前述のように重合が起こらな
いがパターン部５では重合が起こる。In this way, after the photopolymerization initiator in the non-patterned area is sufficiently combined with oxygen, an oxygen barrier film 6 is applied to the colored resist layer 2.
After coating, the entire surface is irradiated with light ((C) in the same figure). At this time, polymerization does not occur in the non-pattern portion 4 as described above, but polymerization occurs in the pattern portion 5.
この後、重合促進加熱、現像、リンス、ポストベークを
行うことによってパターン部５のみが前記基板１上に形
成される（同図（Ｄ））。Thereafter, by performing polymerization-promoting heating, development, rinsing, and post-baking, only the pattern portion 5 is formed on the substrate 1 (FIG. 4(D)).
この様にしてパターンを形成すると、前記パターン部５
を露光する時、精度を気にせずに露光が可能となる。即
ち、前記パターン部５を十分重合させるために、露光量
を増やすこともできるし、また、表、裏画面から露光す
ることもできる。When a pattern is formed in this way, the pattern portion 5
When exposing images, it is possible to do so without worrying about accuracy. That is, in order to sufficiently polymerize the pattern portion 5, the amount of exposure can be increased, or exposure can be performed from the front and back screens.
また、着色レジスト層が厚く、前記着色レジスト層２の
下部まで十分に光重合開始剤を消費することができない
場合は、前述のように酸素遮断膜６を塗布し、非パター
ン部の下部が重合しない程度に全面露光をした後、現像
を行ない、非パターン部４の上層部を除去し、再び酸素
雰囲気にて前記マスク３を介して露光を行ない十分に非
パターン部の光重合開始剤を消費した後、酸素遮断膜６
を塗布し、全面露光、を行ないパターンを形成すること
も可能であり、さらに膜厚の厚い場合には、前述の工程
を複数回繰り返すことによってパターンを形成すること
が可能である。In addition, if the colored resist layer is thick and the photopolymerization initiator cannot be sufficiently consumed to the lower part of the colored resist layer 2, the oxygen barrier film 6 is applied as described above, and the lower part of the non-patterned part is polymerized. After the entire surface is exposed to light to the extent that it does not occur, development is performed to remove the upper layer of the non-patterned area 4, and exposure is performed again through the mask 3 in an oxygen atmosphere to sufficiently consume the photopolymerization initiator in the non-patterned area. After that, the oxygen barrier film 6
It is also possible to form a pattern by applying and exposing the entire surface to light. Furthermore, in the case of a thick film, it is possible to form a pattern by repeating the above-mentioned process multiple times.
第２図は本発明の他の実施例のカラーフィルタ製造の工
程概略図である。FIG. 2 is a schematic diagram of the process of manufacturing a color filter according to another embodiment of the present invention.
ガラス基板７上にブラックマトリクス８を形成し、その
上に第１色目の着色レジスト９を塗布しベーキングを行
なった後、酸素雰囲気中にてマスク１０を介して前記着
色レジスト９の非画素部に選択的に露光を行なった（同
図（Ａ））。その後、前記着色レジスト９の上に酸素遮
断膜（ポリビニルアルコール）を塗布し乾燥させ、ガラ
ス基板７側から全面露光を行なった後（同図（Ｂ））、
重合促進加熱、現像、リンス、ポストベークを行ない第
１色目の画素１１を形成した（同図（Ｃ））。A black matrix 8 is formed on a glass substrate 7, a colored resist 9 of a first color is applied thereon and baked, and then a non-pixel portion of the colored resist 9 is coated through a mask 10 in an oxygen atmosphere. Exposure was performed selectively ((A) in the same figure). After that, an oxygen barrier film (polyvinyl alcohol) was applied on the colored resist 9 and dried, and the entire surface was exposed from the glass substrate 7 side ((B) in the same figure).
Polymerization-promoting heating, development, rinsing, and post-baking were performed to form pixels 11 of the first color (FIG. 3(C)).
さらに上記工程を繰り返すことによって２色目、３色め
の画楚を形成し、カラーフィルタを作製した。Further, by repeating the above steps, second and third color images were formed to produce a color filter.
またこの時、前記マスク１０の遮光部の大きさは、画素
１１以上で、前記ブラックマトリクス８から隣接する画
素へはみ出さなければ良い。なぜならば、裏面露光によ
って画素を重合させるため、ブラックマトリクス上は遮
光され重合されないからである。Further, at this time, the size of the light-shielding portion of the mask 10 may be larger than the pixel 11 and does not extend beyond the black matrix 8 to adjacent pixels. This is because the pixels are polymerized by backside exposure, and the black matrix is shielded from light and is not polymerized.
このような方法によってカラーフィルタを製造すること
によって、次のような効果がある。By manufacturing a color filter by such a method, the following effects can be obtained.
第１に、画素を硬化させるため十分な露光ができるので
欠陥の白画素が形成できる。First, sufficient exposure is provided to harden the pixels, resulting in defective white pixels.
第２に、最終的にブラックマトリクスがマスクとなって
画素を形成するので、第２図（Ａ）に示した露光におい
てアライメント精度がラフで良く且つ、第２図（Ｃ）に
示したように、ブラックマトリクスへの重なりや、アラ
イメントずれによる白抜けのない画素が形成できる。Second, since the black matrix ultimately serves as a mask to form pixels, the alignment accuracy is rough and good in the exposure shown in Figure 2 (A), and as shown in Figure 2 (C). , it is possible to form pixels without overlapping the black matrix or with no white spots due to misalignment.
着色フォトレジストの材料としては、アクリロイド系感
光樹脂より成る、例えば富士ハントエレクトロニクステ
クノロジー社製の顔料充填レジスト、すなわち青色レジ
スト（商標名カラーモザイりＢ１ 略称ＣＢ）、
緑色レジスト（商標名カラーモザイクＧ１ 略称ＣＧ
）、赤色レジスト（商標名カラーモザイクＲ１略称ＣＲ
）、黒色レジスト（商標名カラーモザイクに１ 略称
ＣＫ）を用いた。Materials for the colored photoresist include, for example, a pigment-filled resist manufactured by Fuji Hunt Electronics Technology Co., Ltd., which is made of an acryloid photosensitive resin, that is, a blue resist (trade name: Color Mosaic B1, abbreviated as CB);
Green resist (trade name Color Mosaic G1, abbreviation CG)
), red resist (trade name Color Mosaic R1 abbreviation CR
), black resist (trade name Color Mosaic 1, abbreviation CK) was used.
現像剤としては、１重量％の炭酸ソーダ水溶液を用いた
。A 1% by weight aqueous sodium carbonate solution was used as the developer.
また、本実施例では、着色レジスト剤について述べたが
、フォトレジスト中に顔料や着色剤の代わりに光吸収性
の機能材料等を混入した場合も同様にしてパターンを形
成することによって、精度良く安定したパターンが得ら
れる。In addition, although this example describes a colored resist agent, when a light-absorbing functional material is mixed into the photoresist instead of a pigment or coloring agent, a pattern can be formed in the same manner with high precision. A stable pattern can be obtained.
発明の効果
本発明によって、顔料やカーボン等を分散させた着色フ
ォトレジストを用いてサイドエッチ、欠け、突起、およ
び、白抜けのない安定したカラーフィルタの製造が可能
となる。Effects of the Invention According to the present invention, it is possible to manufacture a stable color filter without side etching, chipping, protrusions, or white spots using a colored photoresist in which pigments, carbon, etc. are dispersed.
第１図、第２図は本発明の実施例の工程を説明する工程
断面図、第３図は従来例の工程を説明する工程断面図で
ある。
１．７・・・ガラス基板、２．９・・・着色レジスト、
３・・・フォトマスク、４・・・着色レジスト非パター
ン部、５・・・着色レジストパターン部、６．１０・・
・酸素遮断膜、８・・・ブラックマトリクス、１１、・
・・画素。
代理人の氏名 弁理士 粟野重孝はか１名第１図
第２図
１光FIGS. 1 and 2 are process cross-sectional views explaining the steps of an embodiment of the present invention, and FIG. 3 is a process cross-sectional view explaining the steps of a conventional example. 1.7...Glass substrate, 2.9...Colored resist,
3... Photomask, 4... Colored resist non-pattern area, 5... Colored resist pattern area, 6.10...
・Oxygen barrier film, 8...Black matrix, 11,・
...Pixel. Name of agent: Patent attorney Shigetaka Awano (1 person) Figure 1 Figure 2 Figure 1 Hikari
Claims (5)
散したネガ型（光重合型）着色フォトレジストを塗布し
、ベーキングを行なった後、酸素雰囲気中でマスクを介
して非パターン部に露光を行ない非パターン部の重合開
始剤を消費した後、前記着色フォトレジストに対して酸
素遮断を施し全面に露光を行った後、重合促進加熱、現
像、リンス等を行い画素、及びブラックマトリクスパタ
ーンを形成することを特徴とするカラーフィルタ製造方
法。(1) A negative (photopolymerizable) colored photoresist mixed with or dispersed with pigment or carbon is applied onto a transparent substrate, and after baking, the non-patterned areas are exposed to light through a mask in an oxygen atmosphere. After the polymerization initiator in the non-patterned area is consumed, the colored photoresist is blocked from oxygen and exposed to light over the entire surface, followed by heating to promote polymerization, development, rinsing, etc. to form pixels and a black matrix pattern. A color filter manufacturing method characterized by:
キングを行なった後、酸素雰囲気中でマスクを介して非
パターン部に露光を行ない非パターン部のラジカルを消
費した後、前記着色フォトレジストに対して酸素遮断を
施し全面に露光し、重合促進加熱を行った後、現像、リ
ンス等を行い非パターン部の上層部を除去した後乾燥し
、再び前記マスクを介して酸素雰囲気中で露光を行い非
パターン部の下層部のラジカルを十分に消費した後、前
記着色レジストに対して酸素遮断を施し、全面露光を行
い、重合促進、現像、リンス等を行い画素、及びブラッ
クマトリクスパターンを形成することを特徴とするカラ
ーフィルタ製造方法。(2) After coating a colored photoresist on a transparent substrate and baking it, the non-patterned area is exposed to light through a mask in an oxygen atmosphere to consume the radicals in the non-patterned area, and then the colored photoresist is The entire surface of the sample is exposed to light with oxygen cutoff, and then heated to promote polymerization. After that, development, rinsing, etc. are performed to remove the upper layer of the non-patterned area, and then drying. After sufficiently consuming the radicals in the lower layer of the non-patterned area, the colored resist is oxygen-blocked, exposed to light over the entire surface, and subjected to polymerization acceleration, development, rinsing, etc. to form pixels and a black matrix pattern. A color filter manufacturing method characterized by:
、前記ブラックマトリクスの上からＲ（赤）、Ｇ（緑）
、Ｂ（青）の内、第１色目の着色レジストを塗布しベー
キングした後、画素用マスクを介して第１色目の画素以
外の部分（非パターン部）に酸素雰囲気中で露光を行い
非パターン部のラジカルを消費した後、前記着色レジス
トに対して酸素遮断を施した後透明基板側より全面露光
を行い、更にその後重合促進加熱、現像、リンス、ポス
トベーク等を行い第１色目の画素を形成し、以下同様に
して第２、第３色目の画素を形成することを特徴とする
カラーフィルタ製造方法。(3) After forming a black matrix on a transparent substrate, R (red) and G (green) are applied from above the black matrix.
, B (blue), after applying and baking the first colored resist, the areas other than the pixels of the first color (non-pattern areas) are exposed to light in an oxygen atmosphere through a pixel mask to form non-pattern areas. After consuming the radicals, the colored resist is subjected to oxygen blocking, and then exposed to light from the entire surface from the transparent substrate side. After that, polymerization-promoting heating, development, rinsing, post-baking, etc. are performed to form the first color pixel. A color filter manufacturing method characterized in that the second and third color pixels are formed in the same manner.
ないようにしたことを特徴とする請求項３記載のカラー
フィルタ製造方法。(4) The color filter manufacturing method according to claim 3, characterized in that the size of the light shielding part of the pixel mask is made larger than the pixel part and does not protrude into the adjacent pixel part.
ー、有機重合体結合剤及びトリハロメチル−Ｓ−トリア
ジン系化合物を含む光重合開始剤を組成とした感光性樹
脂と顔料もしくはカーボンを含有する着色材料であるこ
とを特徴とする請求項１、２、または３記載のカラーフ
ィルタ製造方法。(5) The colored resist material is a colored material containing a photosensitive resin composed of a polyfunctional acrylate monomer, an organic polymer binder, and a photopolymerization initiator containing a trihalomethyl-S-triazine compound, and a pigment or carbon. The color filter manufacturing method according to claim 1, 2, or 3, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1085401A JPH02264203A (en) | 1989-04-04 | 1989-04-04 | Production of color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1085401A JPH02264203A (en) | 1989-04-04 | 1989-04-04 | Production of color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02264203A true JPH02264203A (en) | 1990-10-29 |
Family
ID=13857763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1085401A Pending JPH02264203A (en) | 1989-04-04 | 1989-04-04 | Production of color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02264203A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0483693A2 (en) * | 1990-10-29 | 1992-05-06 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix |
| JP2006091160A (en) * | 2004-09-21 | 2006-04-06 | Dainippon Printing Co Ltd | Method for manufacturing color filter |
-
1989
- 1989-04-04 JP JP1085401A patent/JPH02264203A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0483693A2 (en) * | 1990-10-29 | 1992-05-06 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix |
| JP2006091160A (en) * | 2004-09-21 | 2006-04-06 | Dainippon Printing Co Ltd | Method for manufacturing color filter |
| JP4601367B2 (en) * | 2004-09-21 | 2010-12-22 | 大日本印刷株式会社 | Manufacturing method of color filter |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20100052500A (en) | Thin resin film and production method thereof, and color filter for liquid crystal display and production method thereof | |
| JP2998826B2 (en) | Manufacturing method of color filter | |
| JPS62106407A (en) | Production of color filter for liquid crystal display | |
| JPH02264203A (en) | Production of color filter | |
| KR100538291B1 (en) | Manufacturing Method of Color Filter Board | |
| JPS59226305A (en) | Production of optical filter | |
| JPH02277005A (en) | Production of color filter | |
| JPH0253003A (en) | Manufacture of color filter | |
| JPH07128517A (en) | Color filter | |
| JPH01293306A (en) | Manufacture of color filter | |
| JPH01307703A (en) | Production of color filter | |
| JPH10133012A (en) | Production of color filter | |
| JP3021907B2 (en) | Method of forming color filter pattern | |
| JPH06331815A (en) | Color filter | |
| JPH0740082B2 (en) | Color filter manufacturing method | |
| JPH03274502A (en) | Color filter | |
| JPH05134110A (en) | Formation of photosensitive resin pattern | |
| JPH0486801A (en) | Production of color filter | |
| JPH08271714A (en) | Production of color filter | |
| JPH03136021A (en) | Production of color liquid crystal panel | |
| JPS5950411A (en) | Production of color filter | |
| JPH07294724A (en) | Color resin pattern forming method | |
| CN114792713A (en) | Display panel, preparation method thereof and display device | |
| JPH02115841A (en) | Photomask | |
| JPH02287402A (en) | Production of color filter |