JPH04291262A - Method and device for applying resist - Google Patents
Method and device for applying resistInfo
- Publication number
- JPH04291262A JPH04291262A JP7820391A JP7820391A JPH04291262A JP H04291262 A JPH04291262 A JP H04291262A JP 7820391 A JP7820391 A JP 7820391A JP 7820391 A JP7820391 A JP 7820391A JP H04291262 A JPH04291262 A JP H04291262A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- film thickness
- inclination angle
- drying
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 44
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000007796 conventional method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、塗布技術、例えばリー
ドフレーム製造のエッチング工程において、材料にレジ
スト膜を形成するレジストの塗布方法及びその装置に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to coating techniques, such as a resist coating method and apparatus for forming a resist film on a material in an etching process for manufacturing lead frames.
【０００２】0002
【従来の技術】従来のレジスト膜形成方法、例えば材料
をレジスト中に浸漬し、垂直に引上げることによって両
面に均一なレジスト膜を形成する方法（垂直引上げ法）
において、レジスト膜厚は、材料の引上げ速度、レジス
ト粘度、レジスト温度に依存しており、これらを制御す
ることによって特定の膜厚のレジスト膜が得られる。こ
の方法では任意の膜厚を得るために、前記速度、粘度、
温度を全て変更する必要が生じ、特に厚膜のレジスト膜
を得るためにはこれらを大きく変化させる必要がある。[Prior Art] Conventional resist film forming methods, such as a method in which a material is immersed in a resist and pulled up vertically to form a uniform resist film on both sides (vertical pulling method)
In this method, the resist film thickness depends on the pulling rate of the material, the resist viscosity, and the resist temperature, and by controlling these, a resist film with a specific thickness can be obtained. In this method, in order to obtain an arbitrary film thickness, the speed, viscosity,
It becomes necessary to change all the temperatures, and in particular, in order to obtain a thick resist film, it is necessary to change these greatly.
【０００３】しかし前記速度を大きくすると乾燥時間が
不足し、前記粘度を変化させるには浴を更新する必要が
生じ、前記温度を大きく変化させると雰囲気温度との差
が広がりレジスト液温の安定性が低下する等の問題があ
り、前記速度、粘度、温度の数値変更範囲は限定される
。このため、得られるレジスト膜厚の範囲は狭く、特に
１０μｍ以上の膜厚を有するレジスト膜は得られない欠
点がある。However, if the speed is increased, the drying time becomes insufficient, and the bath needs to be renewed in order to change the viscosity, and if the temperature is changed significantly, the difference with the ambient temperature widens, resulting in an increase in the stability of the resist liquid temperature. There are problems such as a decrease in the speed, viscosity, and temperature, and the range in which the values of speed, viscosity, and temperature can be changed is limited. For this reason, the range of resist film thickness that can be obtained is narrow, and in particular, there is a drawback that a resist film having a film thickness of 10 μm or more cannot be obtained.
【０００４】さらに垂直引上げ法では、膜厚の均一性を
高めるために、塗布後のレジストの流動性が乾燥の進行
によりなくなるまで、垂直に引上げ続ける必要があり、
装置高さが非常に高くなるなどの欠点がある。Furthermore, in the vertical pulling method, in order to improve the uniformity of the film thickness, it is necessary to continue pulling the resist vertically until the fluidity of the resist after coating disappears due to progress of drying.
There are disadvantages such as the height of the device being very high.
【０００５】[0005]
【発明が解決しようとする課題】本発明は、従来法の欠
点を解決し、任意のレジスト膜厚を容易に形成し、厚膜
のレジスト膜を実現し、装置高さを低くおさえ、両面同
時に膜厚均一性の高いレジスト膜を連続的に得ることが
できるレジストの塗布方法及びその装置を提供すること
を目的とする。[Problems to be Solved by the Invention] The present invention solves the drawbacks of the conventional method, easily forms a resist film of any thickness, realizes a thick resist film, keeps the height of the device low, and simultaneously coats both sides. It is an object of the present invention to provide a resist coating method and an apparatus therefor that can continuously obtain a resist film with high film thickness uniformity.
【０００６】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明は材料の両面に感光性レジスト層を連続塗
布する方法において、前記材料を感光性レジスト液中に
浸漬し、次いで前記液中で前記材料を垂直方向に搬送し
、前記材料がレジスト液表面から出たのち直ちに前記材
料を傾斜せしめ、乾燥する方法であり、また、前記液中
に設けた垂直搬送ローラーと、前記材料を傾斜せしめ乾
燥するに際し、材料の傾斜角度を調整する可変搬送ロー
ラーと、材料の傾斜に追従する乾燥ヒーターとを備えた
レジスト塗布装置である。Means for Solving the Problems In order to achieve the above object, the present invention provides a method for continuously coating a photosensitive resist layer on both sides of a material, in which the material is immersed in a photosensitive resist solution, and then the This is a method in which the material is conveyed in a vertical direction in a liquid, and after the material comes out from the surface of the resist liquid, the material is immediately tilted and dried. This resist coating device is equipped with a variable conveyance roller that adjusts the inclination angle of the material and a drying heater that follows the inclination of the material.
【０００７】[0007]
【作用】本発明の塗布方法はレジスト中から材料を垂直
に引上げた後直ちに傾斜せしめることにより、材料表面
に付着したレジストの重力による流れ落ち量を減少せし
め、同時に材料表面にレジスト膜として固定させるので
、従来法では得られない厚い膜厚のレジスト膜が得られ
る。さらに材料表面に付着したレジストの重力による流
れ落ち量を傾斜角度により調節するので、任意の値のレ
ジスト膜厚が傾斜角度の調整のみで得られる。[Operation] The coating method of the present invention reduces the amount of resist adhered to the material surface that falls off due to gravity by pulling the material vertically out of the resist and immediately tilting it. , a thick resist film that cannot be obtained with conventional methods can be obtained. Furthermore, since the amount of resist that adheres to the material surface falls off due to gravity is adjusted by the inclination angle, a resist film thickness of any value can be obtained simply by adjusting the inclination angle.
【０００８】また、従来法が垂直方向にのみ引き上げる
方法であるのに対して、本発明の方法は材料の傾斜角度
が可変し、かつ材料の方向が転換するようになっており
、材料は傾斜し屈曲を繰り返す。そして、乾燥用ヒータ
ーが材料の変化に追従するように設けられているので、
装置高さを従来法より低くしても、乾燥時間は十分確保
できる。Furthermore, while the conventional method involves pulling up only in the vertical direction, the method of the present invention changes the inclination angle of the material and changes the direction of the material. Repeat bending. And since the drying heater is installed to follow changes in the material,
Even if the height of the device is lower than that of the conventional method, sufficient drying time can be secured.
【０００９】[0009]
【実施例】図１に本発明による塗布方法を実施するため
の塗布装置の概略図を示す。図１においてレジスト１に
浸漬された材料２は垂直搬送ローラー３によって搬送方
向が垂直に変えられる。レジスト１の液面から材料２が
垂直方向に出るときに、両面にレジスト１を付着し持ち
出す。材料２は直ちにローラー４によって鉛直方向から
角度θだけ搬送方向を傾斜させる。ローラー４は所望面
に非接触の形状を有する。ここより乾燥ヒーター５を用
いてレジスト膜の乾燥を行ない、材料表面上へレジスト
膜を固定する。材料２は可変搬送ローラー６によって搬
送方向を反転し、鉛直方向に対して角度−θだけ傾斜を
つける。可変搬送ローラー６は、鉛直方向に直角の方向
でかつ搬送方向に移動可能となっており、この可変搬送
ローラー６の位置によって材料２の傾斜角度θを調節す
る。材料２は角度θでの屈曲を繰り返し、ローラー７ま
で搬送されると反転され、次工程へ送られる。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a schematic diagram of a coating apparatus for carrying out the coating method according to the present invention. In FIG. 1, the conveyance direction of the material 2 immersed in the resist 1 is changed vertically by a vertical conveyance roller 3. When the material 2 comes out from the liquid surface of the resist 1 in the vertical direction, the resist 1 is attached to both surfaces and taken out. Immediately, the conveyance direction of the material 2 is inclined by an angle θ from the vertical direction by the roller 4. The roller 4 has a shape that does not contact the desired surface. From here, the resist film is dried using the drying heater 5, and the resist film is fixed onto the material surface. The conveyance direction of the material 2 is reversed by the variable conveyance roller 6, and the material 2 is inclined by an angle -θ with respect to the vertical direction. The variable conveyance roller 6 is movable in a direction perpendicular to the vertical direction and in the conveyance direction, and the inclination angle θ of the material 2 is adjusted by the position of the variable conveyance roller 6. The material 2 is repeatedly bent at an angle θ, and when it is conveyed to the roller 7, it is reversed and sent to the next process.
【００１０】本発明による塗布条件は、レジストが水溶
性レジストであり、粘度１８．０±０．５ｃＰ、温度２
２．０±０．１℃に設定した。材料は帯状のＦｅ−Ｎｉ
合金で搬送速度１．０ｍ／分、乾燥温度８０±１℃、乾
燥時間８分とした。上記条件により傾斜角度θが０、１
５、３０、４５、６０°の５点について、塗布、乾燥を
行い、材料両面の膜厚を測定した。The coating conditions according to the present invention are that the resist is a water-soluble resist, the viscosity is 18.0±0.5 cP, and the temperature is 2.
The temperature was set at 2.0±0.1°C. The material is band-shaped Fe-Ni
The conveyance speed for the alloy was 1.0 m/min, the drying temperature was 80±1° C., and the drying time was 8 minutes. Due to the above conditions, the inclination angle θ is 0, 1
Coating and drying were performed at 5 points, 5, 30, 45, and 60 degrees, and the film thickness on both sides of the material was measured.
【００１１】傾斜角度と膜厚の関係を図２に示す。図２
より、膜厚は角度の増加とともに大きくなっており、角
度６０°では１４μｍという従来法では得られない厚膜
レジストが得られた。また膜厚均一性は、試料内、試料
間、表裏ともに±０．３μｍ以内のばらつきとなってお
り、高い均一性のレジスト膜が連続的に得られた。さら
に膜厚の調整は、レジスト粘度、レジスト温度、材料搬
送速度一定の条件において、引上げ角度の調節のみで任
意の膜厚が５〜１４μｍの広範囲にわたって得られた。
本装置の高さは、従来法による装置と比較して同一乾燥
時間を確保しても、およそ２／３におさえることができ
た。FIG. 2 shows the relationship between the inclination angle and the film thickness. Figure 2
Therefore, the film thickness increased as the angle increased, and at an angle of 60°, a thick resist film of 14 μm, which could not be obtained by conventional methods, was obtained. Further, the film thickness uniformity varied within ±0.3 μm within the sample, between samples, and on both the front and back sides, and a highly uniform resist film was continuously obtained. Furthermore, the film thickness could be adjusted over a wide range of 5 to 14 μm by simply adjusting the pulling angle under conditions of constant resist viscosity, resist temperature, and material transport speed. The height of this device was reduced to about 2/3 compared to conventional devices even if the drying time was the same.
【００１２】0012
【発明の効果】以上詳細に説明したように、本発明によ
れば、材料引上げ角度の調節のみで膜厚が制御でき、角
度を大きくすることにより厚膜が得られ、装置高さを低
くおさえることができ、均一性の高いレジスト膜を両面
同時に連続的に得られる。[Effects of the Invention] As explained in detail above, according to the present invention, the film thickness can be controlled simply by adjusting the material pulling angle, a thick film can be obtained by increasing the angle, and the height of the apparatus can be kept low. A highly uniform resist film can be continuously obtained on both sides at the same time.
【００１３】[0013]
【図１】本発明の実施例である塗布装置の概略図である
。FIG. 1 is a schematic diagram of a coating device that is an embodiment of the present invention.
【図２】レジスト膜厚と材料の傾斜角度θの関係を示し
ている。FIG. 2 shows the relationship between resist film thickness and material inclination angle θ.
１ レジスト ２ 材料 ３ 垂直搬送ローラー ４ ローラー（固定） ５ 乾燥ヒーター ６ 可変搬送ローラー ７ ローラー（固定） 1 Resist 2 Materials 3 Vertical conveyance roller 4 Roller (fixed) 5 Drying heater 6 Variable conveyance roller 7 Roller (fixed)
Claims (2)
塗布する方法において、前記材料を感光性レジスト液中
に浸漬し、次いで前記液中で前記材料を垂直方向に搬送
し、前記材料がレジスト液表面から出たのち直ちに前記
材料を傾斜せしめ、乾燥することを特徴とするレジスト
の塗布方法。1. A method of continuously applying a photosensitive resist layer on both sides of a material, in which the material is immersed in a photosensitive resist solution, and then the material is conveyed in the solution in a vertical direction, so that the material becomes a resist layer. A method for applying a resist, which comprises tilting the material immediately after it comes out of the liquid surface and drying it.
法において、前記液中に設けた垂直搬送ローラーと、前
記材料を傾斜せしめ乾燥するに際し、材料の傾斜角度を
調整する可変搬送ローラーと、材料の傾斜に追従する乾
燥ヒーターとを備えたレジスト塗布装置。2. The resist coating method according to claim 1, comprising: a vertical conveyance roller provided in the liquid; and a variable conveyance roller that adjusts the inclination angle of the material when tilting and drying the material. A resist coating device equipped with a drying heater that follows the slope of the material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3078203A JP3006128B2 (en) | 1991-03-19 | 1991-03-19 | Resist coating method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3078203A JP3006128B2 (en) | 1991-03-19 | 1991-03-19 | Resist coating method and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04291262A true JPH04291262A (en) | 1992-10-15 |
| JP3006128B2 JP3006128B2 (en) | 2000-02-07 |
Family
ID=13655467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3078203A Expired - Lifetime JP3006128B2 (en) | 1991-03-19 | 1991-03-19 | Resist coating method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3006128B2 (en) |
-
1991
- 1991-03-19 JP JP3078203A patent/JP3006128B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP3006128B2 (en) | 2000-02-07 |
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