JPH04240538A - Inspecting method of color filter - Google Patents

Inspecting method of color filter

Info

Publication number
JPH04240538A
JPH04240538A JP2277891A JP2277891A JPH04240538A JP H04240538 A JPH04240538 A JP H04240538A JP 2277891 A JP2277891 A JP 2277891A JP 2277891 A JP2277891 A JP 2277891A JP H04240538 A JPH04240538 A JP H04240538A
Authority
JP
Japan
Prior art keywords
light
color
defect
color filter
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2277891A
Other languages
Japanese (ja)
Other versions
JPH07101195B2 (en
Inventor
Tadahiro Furukawa
忠宏 古川
Atsushi Takahashi
敦 高橋
Toshiki Deguchi
俊樹 出口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyodo Printing Co Ltd
Original Assignee
Kyodo Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyodo Printing Co Ltd filed Critical Kyodo Printing Co Ltd
Priority to JP3022778A priority Critical patent/JPH07101195B2/en
Publication of JPH04240538A publication Critical patent/JPH04240538A/en
Publication of JPH07101195B2 publication Critical patent/JPH07101195B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To effectively detect a defect when colors are mixed (for example, a blue pixel is overlapped partly on a red pixel) without processing the image. CONSTITUTION:For a detecting light from a color filter 100, both a permeating light from a first light source L1 and a reflecting light from a second light source L2 are used. It is difficult to distinguish a defect resulting from the mixing of colors from a light shield pattern 40 only with use of the data of the permeating light. Since the color pixel material has a low reflectivity although the light shield pattern 40 has a high reflectivity of light, the defect as a result of the mixing of colors can be clearly distinguished from the shield pattern 40 with use of the data of the reflecting light.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、たとえば液晶カラー
表示パネルにおけるカラーフィルタの欠陥、特に、赤、
緑、青などの色画素の形成材料が、フィルタの基体の必
要な部分以外に付着した混色による欠陥を検出する上で
有効な技術に関する。
[Industrial Field of Application] This invention is applicable to defects in color filters in, for example, liquid crystal color display panels.
The present invention relates to a technique that is effective in detecting defects caused by color mixing in which materials forming color pixels such as green and blue adhere to areas other than the necessary parts of a filter base.

【0002】0002

【従来の技術およびその問題点】一般に、この種のカラ
ーフィルタは、基本的に、ガラス基板等の光透過性の基
体の一面に、赤、緑、青などの互いに異なる分光特性を
もつ複数色の色画素を備え、そして、多くの場合に、各
色画素の境界部分に遮光パターンを備えている。遮光パ
ターンは、表示パネルによる表示画像の鮮明度を高める
上で効果があるといわれる。こうしたカラーフィルタに
は、図3に示すように、3種類の欠陥が見られる。一つ
は、異物による欠陥10であり、基体12の一面の赤(
R)、緑(G)、青(B)の色画素20の中に少なくと
も一部が埋め込まれた形態で存在する。また一つは、白
抜けの欠陥30であり、あるべき所に色画素20あるい
は遮光パターン40がないパターン欠陥である。さらに
一つは、混色による欠陥50であり、たとえば赤(R)
の色画素20の上に青(B)の色画素20が一部載るよ
うに、必要な部分以外に他の色画素材料が付着した欠陥
である。異物による欠陥10は高さがあるので、対向基
板とのショートを生じるし、また、白抜けおよび混色の
他の欠陥30,50も表示品質の低下をもたらす。
[Prior Art and Problems] In general, this type of color filter basically consists of multiple colors having different spectral characteristics such as red, green, and blue on one surface of a light-transmitting substrate such as a glass substrate. color pixels, and in many cases, a light-shielding pattern is provided at the boundary between each color pixel. The light-shielding pattern is said to be effective in increasing the clarity of images displayed by the display panel. As shown in FIG. 3, three types of defects are observed in such color filters. One is a defect 10 caused by foreign matter, which is caused by red (
R), green (G), and blue (B) color pixels 20, at least a portion of which is embedded. Another type is a white defect 30, which is a pattern defect in which the color pixel 20 or the light-shielding pattern 40 is not located where it should be. Further, one is a defect 50 due to color mixture, for example, red (R).
This is a defect in which another color image material is attached to an area other than the necessary part so that a part of the blue (B) color pixel 20 is placed on top of the color pixel 20 of . Since the defect 10 due to foreign matter has a height, it causes a short circuit with the counter substrate, and other defects 30 and 50 such as white spots and color mixture also cause a deterioration in display quality.

【0003】そこで、それらの欠陥の有無を検査するこ
とが必要であり、従来一般には、目視による方法を採っ
ている。また、検査の効率および精度を高めた、機械化
したカラーフィルタの検査方法を適用することもできる
。たとえば、異物による欠陥10を検出する場合、特開
昭59−148809号の公報が示すように、異物から
の散乱光が他の部分よりも大きいことを利用し、散乱光
を検出することによって、異物による欠陥10を検出す
ることができる。また、白抜けの欠陥30を検出する場
合、特開昭51−97380号の公報が示す、透過光を
利用したマスクの検査方法を適用することができる。 図4が示すように、白抜けの欠陥30の部分は、色画素
20および遮光パターン40の部分に比べて透過光の光
強度が大きい。そのため、ラインThの所に判定基準を
設けることによって、白抜けの欠陥30を検出すること
ができる。
[0003] Therefore, it is necessary to inspect the presence or absence of these defects, and conventionally, a visual inspection method has generally been adopted. Furthermore, a mechanized color filter inspection method with improved inspection efficiency and accuracy can also be applied. For example, when detecting a defect 10 caused by a foreign object, as shown in Japanese Unexamined Patent Publication No. 148809/1989, by detecting the scattered light by utilizing the fact that the scattered light from the foreign object is larger than other parts, Defects 10 caused by foreign matter can be detected. Further, when detecting the white defect 30, a mask inspection method using transmitted light disclosed in Japanese Patent Laid-Open No. 51-97380 can be applied. As shown in FIG. 4, the light intensity of the transmitted light is greater in the white defect 30 than in the color pixel 20 and the light shielding pattern 40 portion. Therefore, by providing a determination criterion at the line Th, the white defect 30 can be detected.

【0004】しかし、混色による欠陥50の部分につい
ては、散乱光あるいは透過光を用いる前記の方法では、
各光強度が他の部分と大きなちがいを生じないため、欠
陥を有効に検出することができない。たとえば、散乱光
では、色画素20の部分と混色による欠陥50の部分と
を区別することが困難であり、また、透過光では、図2
の中に鎖線で示すように、混色による欠陥50の部分の
透過光の光強度は極端に低く、遮光パターン40の部分
のそれのレベルに近く、判定基準を適正に設定すること
が困難である。その点、カラーフィルタの色画素20お
よび遮光パターン40の各パターンに規則性があること
を利用し、画像処理することによって、混色による欠陥
50の部分をそれらの規則性のある各パターンから区別
するようにすることが考えられる。ところが、画像処理
にはそれなりの処理装置が必要であり、コストを増すと
いう問題を生じる。
However, regarding the defect 50 due to color mixture, the above method using scattered light or transmitted light cannot
Since each light intensity is not significantly different from other parts, defects cannot be detected effectively. For example, in scattered light, it is difficult to distinguish between the color pixel 20 and the defect 50 due to color mixture, and in transmitted light,
As shown by the chain line in the figure, the light intensity of the transmitted light in the part of the defect 50 due to color mixture is extremely low and is close to the level of that of the part of the light shielding pattern 40, making it difficult to appropriately set the judgment criteria. . In this regard, by utilizing the regularity of each pattern of the color pixels 20 and the light shielding pattern 40 of the color filter, and performing image processing, the defect 50 due to color mixture is distinguished from each of these regular patterns. It is possible to do so. However, image processing requires a certain amount of processing equipment, leading to the problem of increased costs.

【0005】[0005]

【発明の目的】この発明の目的は、画像処理をすること
なく、混色による欠陥を有効に検出することができる技
術を提供することにある。
OBJECTS OF THE INVENTION An object of the present invention is to provide a technique that can effectively detect defects due to color mixture without image processing.

【0006】[0006]

【そのための手段および作用】この発明では、カラーフ
ィルタの基体10のある部分を通過した透過光のほか、
その基体の同じ部分の色画素20および遮光パターン4
0からの反射光をも検出し、それら透過光と反射光とを
プラスした検出光を基に欠陥を検出する。遮光パターン
40の形成材料として、クロム、アルミニウム、ニッケ
ル等の金属材料が多用されており、それらのパターン形
成材料は、色画素20の形成材料に比べて高い光反射性
を示す。そこで、その高い反射性を利用して、何ら画像
処理することなく、混色による欠陥50を遮光パターン
40の部分と明確に区別するようにすることができる。 透過光だけでは、混色による欠陥50を遮光パターン4
0から識別することが困難であるが、反射光を加えるこ
とによって、図2に実線で示すように、遮光パターン4
0の部分の光強度を判定基準Thよりも大きくすること
ができ、それによって、混色による欠陥50のみを検出
することができる。
[Means and effects therefor] In this invention, in addition to the transmitted light that has passed through a certain part of the base 10 of the color filter,
Color pixel 20 and shading pattern 4 in the same part of the substrate
The reflected light from 0 is also detected, and defects are detected based on the detected light that is the sum of the transmitted light and reflected light. Metal materials such as chromium, aluminum, and nickel are often used as materials for forming the light-shielding pattern 40, and these pattern-forming materials exhibit higher light reflectivity than the materials for forming the color pixels 20. Therefore, by utilizing its high reflectivity, the defect 50 due to color mixture can be clearly distinguished from the light-shielding pattern 40 without any image processing. If only transmitted light is used, the defect 50 due to color mixture can be removed by the light shielding pattern 4.
Although it is difficult to distinguish from 0, by adding reflected light, the light shielding pattern 4 can be created as shown by the solid line in FIG.
The light intensity of the 0 portion can be made larger than the determination criterion Th, and thereby only the defect 50 due to color mixture can be detected.

【0007】[0007]

【実施例】図1は、この発明を適用した検査装置の光学
系を示している。検査の対象であるカラーフィルタ10
0に対し、2つの検出系が用意されている。一つは、カ
ラーフィルタ100の背後の第1の光源L1を用いた透
過光による検出系であり、もう一つは、第2の光源L2
およびハーフミラー200を用いた反射光による検出系
である。各光源としては、ハロゲンランプあるいは白色
レーザなどを用いることができる。カラーフィルタ10
0の上部のカメラ300が、カラーフィルタ100から
の透過光および反射光を受光する。カメラ300として
は、光−電気変換の通常のカメラ、あるいは色強度補正
が可能な3板式カラーカメラなどの公知のものを用いる
ことができる。通常のカメラを用いる場合には、色強度
補正フィルタ400を挿入することによって、色に基づ
く光強度のちがいを補正するようにするのが好ましい。 なお、欠陥50として検出すべきものの大きさは、たと
えば20〜100μm以上であるが、カメラ300の画
素の大きさは、最小検出面積の1/4以下にすることが
望ましい。こうした検査装置を用いることによって、カ
ラーフィルタ100の同じ部分からの透過光および反射
光を同時に検出し、混色による欠陥50を有効に検出す
ることができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an optical system of an inspection apparatus to which the present invention is applied. Color filter 10 to be inspected
0, two detection systems are prepared. One is a detection system using transmitted light using a first light source L1 behind the color filter 100, and the other is a detection system using a second light source L2.
and a detection system using reflected light using a half mirror 200. A halogen lamp, a white laser, or the like can be used as each light source. color filter 10
A camera 300 at the top of the color filter 100 receives transmitted light and reflected light from the color filter 100. As the camera 300, a known camera such as a normal optical-to-electrical conversion camera or a three-panel color camera capable of color intensity correction can be used. When using a normal camera, it is preferable to insert a color intensity correction filter 400 to correct differences in light intensity based on color. The size of the defect to be detected as the defect 50 is, for example, 20 to 100 μm or more, but it is desirable that the size of the pixel of the camera 300 be 1/4 or less of the minimum detection area. By using such an inspection device, transmitted light and reflected light from the same portion of the color filter 100 can be detected simultaneously, and defects 50 due to color mixture can be effectively detected.

【0008】[0008]

【発明の効果】この発明によれば、遮光パターン40の
部分からの反射光が混色による欠陥50の部分からのそ
れに比べてはるかに大きいことに着目し、カラーフィル
タ100側の同じ部分からの透過光と反射光とを検出し
、それらをプラスした検出光を基に欠陥を検出するよう
にしているため、画像処理をすることなく、混色による
欠陥50を有効に検出することができる。
According to the present invention, attention is paid to the fact that the reflected light from the light shielding pattern 40 is much larger than that from the defect 50 due to color mixture, and the light transmitted from the same portion on the color filter 100 side is Since the light and the reflected light are detected, and defects are detected based on the detection light obtained by adding them, the defect 50 due to color mixture can be effectively detected without image processing.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】この発明を適用した検査装置の一例を示す図で
ある。
FIG. 1 is a diagram showing an example of an inspection device to which the present invention is applied.

【図2】この発明による検出原理を示す特性図である。FIG. 2 is a characteristic diagram showing the detection principle according to the present invention.

【図3】カラーフィルタにおける各種の欠陥を示す断面
図である。
FIG. 3 is a cross-sectional view showing various defects in a color filter.

【図4】白抜きの欠陥の検出原理を示す特性図である。FIG. 4 is a characteristic diagram showing the principle of detecting defects shown in white.

【符号の説明】[Explanation of symbols]

12  基体 20  色画素 40  遮光パターン 50  混色による欠陥 100  カラーフィルタ 300  カメラ L1,L2  光源 12 Base 20 color pixels 40 Shade pattern 50 Defects due to color mixture 100 Color filter 300 camera L1, L2 light source

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  光透過性の基体の一面に、互いに異な
る分光特性をもつ複数色の色画素と、各色画素の境界部
分に位置する遮光パターンとを備え、この遮光パターン
が前記色画素の形成材料に比べて高い光反射性を示す材
料からなるカラーフィルタの欠陥を検出するカラーフィ
ルタの検査方法において、前記基体のある部分を通過し
た透過光のほか、その基体の同じ部分の色画素および遮
光パターンからの反射光をも検出し、それら透過光と反
射光とをプラスした検出光を基に欠陥を検出することを
特徴とする、カラーフィルタの検査方法。
1. On one surface of a light-transmitting substrate, color pixels of a plurality of colors having mutually different spectral characteristics and a light-shielding pattern located at the boundary between each color pixel are provided, and this light-shielding pattern forms the color pixel. In a color filter inspection method for detecting defects in a color filter made of a material that exhibits higher light reflectivity than the other material, in addition to the transmitted light that has passed through a certain part of the base, color pixels and shading in the same part of the base are detected. A color filter inspection method characterized by also detecting reflected light from a pattern and detecting defects based on detected light that is a combination of the transmitted light and reflected light.
【請求項2】  前記欠陥は、前記色画素の形成材料が
前記基体の必要な部分以外に付着した混色による欠陥で
ある、請求項1のカラーフィルタの検査方法。
2. The method for inspecting a color filter according to claim 1, wherein the defect is a defect due to color mixture in which the material forming the color pixel adheres to a portion other than a necessary portion of the substrate.
JP3022778A 1991-01-23 1991-01-23 Color filter inspection method Expired - Fee Related JPH07101195B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3022778A JPH07101195B2 (en) 1991-01-23 1991-01-23 Color filter inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3022778A JPH07101195B2 (en) 1991-01-23 1991-01-23 Color filter inspection method

Publications (2)

Publication Number Publication Date
JPH04240538A true JPH04240538A (en) 1992-08-27
JPH07101195B2 JPH07101195B2 (en) 1995-11-01

Family

ID=12092128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3022778A Expired - Fee Related JPH07101195B2 (en) 1991-01-23 1991-01-23 Color filter inspection method

Country Status (1)

Country Link
JP (1) JPH07101195B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007256245A (en) * 2006-03-27 2007-10-04 Toppan Printing Co Ltd Appearance inspecting apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61256241A (en) * 1985-05-09 1986-11-13 Dainippon Printing Co Ltd Apparatus fr inspecting color separation filter

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61256241A (en) * 1985-05-09 1986-11-13 Dainippon Printing Co Ltd Apparatus fr inspecting color separation filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007256245A (en) * 2006-03-27 2007-10-04 Toppan Printing Co Ltd Appearance inspecting apparatus

Also Published As

Publication number Publication date
JPH07101195B2 (en) 1995-11-01

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