JPH0420853B2 - - Google Patents

Info

Publication number: JPH0420853B2
Authority: JP; Japan
Prior art keywords: silica; synthetic quartz; gas; chlorine; substrate
Prior art date: 1983-10-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP58198268A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6090836A (ja

Inventor

Haruo Okamoto

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Shin Etsu Chemical Co Ltd

Original Assignee

Shin Etsu Chemical Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-10-25

Filing date

1983-10-25

Publication date

1992-04-07

1983-10-25 Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd

1983-10-25 Priority to JP19826883A priority Critical patent/JPS6090836A/ja

1985-05-22 Publication of JPS6090836A publication Critical patent/JPS6090836A/ja

1992-04-07 Publication of JPH0420853B2 publication Critical patent/JPH0420853B2/ja

Status Granted legal-status Critical Current

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 78
239000000377 silicon dioxide Substances 0.000 claims description 27
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 23
239000010453 quartz Substances 0.000 claims description 23
229910000077 silane Inorganic materials 0.000 claims description 23
150000002148 esters Chemical class 0.000 claims description 21
239000000460 chlorine Substances 0.000 claims description 18
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 17
229910052801 chlorine Inorganic materials 0.000 claims description 17
239000000758 substrate Substances 0.000 claims description 16
239000007789 gas Substances 0.000 claims description 13
238000004519 manufacturing process Methods 0.000 claims description 11
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
238000002844 melting Methods 0.000 claims description 8
230000008018 melting Effects 0.000 claims description 8
239000011261 inert gas Substances 0.000 claims description 7
BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical group CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 6
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
239000000126 substance Substances 0.000 claims description 5
229910002804 graphite Inorganic materials 0.000 claims description 3
239000010439 graphite Substances 0.000 claims description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
229910052799 carbon Inorganic materials 0.000 claims description 2
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
238000010438 heat treatment Methods 0.000 claims 1
238000000034 method Methods 0.000 description 22
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 8
238000002485 combustion reaction Methods 0.000 description 8
229910001882 dioxygen Inorganic materials 0.000 description 8
239000002994 raw material Substances 0.000 description 8
125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
229910052786 argon Inorganic materials 0.000 description 5
239000000446 fuel Substances 0.000 description 5
239000007858 starting material Substances 0.000 description 5
238000004017 vitrification Methods 0.000 description 5
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
239000011521 glass Substances 0.000 description 4
230000003287 optical effect Effects 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
238000009835 boiling Methods 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
238000010586 diagram Methods 0.000 description 3
LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 3
239000000203 mixture Substances 0.000 description 3
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
208000005156 Dehydration Diseases 0.000 description 2
ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
125000000217 alkyl group Chemical group 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
239000012159 carrier gas Substances 0.000 description 2
NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
238000001816 cooling Methods 0.000 description 2
230000018044 dehydration Effects 0.000 description 2
238000006297 dehydration reaction Methods 0.000 description 2
239000001307 helium Substances 0.000 description 2
229910052734 helium Inorganic materials 0.000 description 2
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
239000001257 hydrogen Substances 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
239000000463 material Substances 0.000 description 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
239000005049 silicon tetrachloride Substances 0.000 description 2
239000005046 Chlorosilane Substances 0.000 description 1
OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
229910020175 SiOH Inorganic materials 0.000 description 1
125000003545 alkoxy group Chemical group 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
125000001309 chloro group Chemical group Cl* 0.000 description 1
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000003779 heat-resistant material Substances 0.000 description 1
229930195733 hydrocarbon Natural products 0.000 description 1
150000002430 hydrocarbons Chemical class 0.000 description 1
230000003301 hydrolyzing effect Effects 0.000 description 1
239000012535 impurity Substances 0.000 description 1
230000001788 irregular Effects 0.000 description 1
231100000053 low toxicity Toxicity 0.000 description 1
239000000155 melt Substances 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
229940050176 methyl chloride Drugs 0.000 description 1
239000005055 methyl trichlorosilane Substances 0.000 description 1
239000013307 optical fiber Substances 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
229920001296 polysiloxane Polymers 0.000 description 1
239000001294 propane Substances 0.000 description 1
239000012264 purified product Substances 0.000 description 1
239000010703 silicon Substances 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
229920002545 silicone oil Polymers 0.000 description 1
229920002379 silicone rubber Polymers 0.000 description 1
239000004945 silicone rubber Substances 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
239000005051 trimethylchlorosilane Substances 0.000 description 1
238000009489 vacuum treatment Methods 0.000 description 1
239000002966 varnish Substances 0.000 description 1
238000005303 weighing Methods 0.000 description 1
238000004383 yellowing Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Geochemistry & Mineralogy (AREA)
Life Sciences & Earth Sciences (AREA)
General Chemical & Material Sciences (AREA)
General Life Sciences & Earth Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Manufacturing & Machinery (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Silicon Compounds (AREA)
Glass Melting And Manufacturing (AREA)
Manufacture, Treatment Of Glass Fibers (AREA)

JP19826883A 1983-10-25 1983-10-25 合成石英の製造方法 Granted JPS6090836A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP19826883A JPS6090836A (ja)	1983-10-25	1983-10-25	合成石英の製造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP19826883A JPS6090836A (ja)	1983-10-25	1983-10-25	合成石英の製造方法

Publications (2)

Publication Number	Publication Date
JPS6090836A JPS6090836A (ja)	1985-05-22
JPH0420853B2 true JPH0420853B2 (es)	1992-04-07

Family

ID=16388307

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP19826883A Granted JPS6090836A (ja)	1983-10-25	1983-10-25	合成石英の製造方法

Country Status (1)

Country	Link
JP (1)	JPS6090836A (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01138145A (ja) *	1987-08-20	1989-05-31	Shin Etsu Chem Co Ltd	合成石英ガラス部材の製造方法
JPH0394843A (ja) *	1989-09-04	1991-04-19	Shin Etsu Chem Co Ltd	合成石英ガラスるつぼおよびその製造方法
US5043002A (en) *	1990-08-16	1991-08-27	Corning Incorporated	Method of making fused silica by decomposing siloxanes
JP2588447B2 (ja) *	1991-06-29	1997-03-05	信越石英株式会社	エキシマレーザー用石英ガラス部材の製造方法
JP3175247B2 (ja) *	1991-12-16	2001-06-11	住友電気工業株式会社	光ファイバ用多孔質母材の加熱透明化方法
JPH11116247A (ja) *	1997-10-09	1999-04-27	Nikon Corp	合成石英ガラス製造方法
JP4640293B2 (ja) *	2006-08-24	2011-03-02	住友電気工業株式会社	石英ガラス体製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS56125232A (en) *	1980-03-04	1981-10-01	Nippon Telegr & Teleph Corp <Ntt>	Preparation of multicomponent glass fiber preform rod

1983
- 1983-10-25 JP JP19826883A patent/JPS6090836A/ja active Granted

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS56125232A (en) *	1980-03-04	1981-10-01	Nippon Telegr & Teleph Corp <Ntt>	Preparation of multicomponent glass fiber preform rod

Also Published As

Publication number	Publication date
JPS6090836A (ja)	1985-05-22

Publication	Publication Date	Title
CA2037102C (en)	1997-10-21	Method of making fused silica
JP3233298B2 (ja)	2001-11-26	高純度溶融シリカガラスの非多孔質物体を作成する方法
KR0130007B1 (ko)	1998-04-06	유리질실리카제품 및 그 제조방법
US5703191A (en)	1997-12-30	Method for purifying polyalkylsiloxanes and the resulting products
JP3796565B2 (ja)	2006-07-12	球状シリカ微粒子の製造方法
US5879649A (en)	1999-03-09	Method for purifying polyalkylsiloxanes and the resulting products
KR100473827B1 (ko)	2005-07-18	액체반응물의연소에의해용융실리카를제조하는방법및장치
EP0529190A1 (en)	1993-03-03	Method of making titania-doped fused silica
JPH0138063B2 (es)	1989-08-10
JPH0420853B2 (es)	1992-04-07
JPH0459254B2 (es)	1992-09-21
KR20000052522A (ko)	2000-08-25	유기실란의 분해에 의한 실리카 제조방법
JPS629536B2 (es)	1987-02-28
JPH0459253B2 (es)	1992-09-21
JP3417962B2 (ja)	2003-06-16	合成石英ガラス部材の製造方法
JPH0460057B2 (es)	1992-09-25
AU638702C (en)	1997-11-06	Vitreous silica products