JPH04200893A - Reflow apparatus - Google Patents

Reflow apparatus

Info

Publication number
JPH04200893A
JPH04200893A JP33393690A JP33393690A JPH04200893A JP H04200893 A JPH04200893 A JP H04200893A JP 33393690 A JP33393690 A JP 33393690A JP 33393690 A JP33393690 A JP 33393690A JP H04200893 A JPH04200893 A JP H04200893A
Authority
JP
Japan
Prior art keywords
heating chamber
nitrogen gas
nitrogen
oxygen concentration
concn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33393690A
Other languages
Japanese (ja)
Inventor
Toshio Nishi
西 壽雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP33393690A priority Critical patent/JPH04200893A/en
Publication of JPH04200893A publication Critical patent/JPH04200893A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To execute safe heating treatment by providing a nitrogen gas control device for supplying into a heating chamber and an oxygen concn. lowering alarm element for an out side of the heating chamber in a reflow apparatus for an electronic parts fitting substrate. CONSTITUTION:The reflow apparatus is constituted with the heating chamber 1, a heater 2 set in there, a carrying conveyor 4 for the electronic parts fitting substrate, a nitrogen gas generating means 10, an oxygen or nitrogen concn. meter at inner and outer parts of the heating chamber, the nitrogen gas control device 16 for supplying into the heating chamber from a nitrogen generating means 10 according to the concn. and the oxygen concn. lowering alarm element 17 for the outside of the heating chamber. By this method, the nitrogen concn. in the heating chamber 1 is automatically adjusted, and the heating treatment of soldering is executed under good condition, and safety of the worker is obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はリフロー装置に係り、酸素濃度計やチッソ濃度
計により加熱室の内外の酸素濃度やチッソ濃度を計測し
て、加熱室に供給するチッソガス量を制御し、また加熱
室外の酸素濃度の低下を報知するようにしたものである
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a reflow apparatus, which measures the oxygen concentration and nitrogen concentration inside and outside a heating chamber using an oxygen concentration meter and a nitrogen concentration meter, and supplies the measured oxygen and nitrogen concentrations to the heating chamber. This system controls the amount of nitrogen gas and notifies you of a decrease in oxygen concentration outside the heating chamber.

(従来の技術) 電子部品が実装された基板は、リフロー装置の加熱室へ
送られ、電子部品の電極を基板に接着する半田の加熱処
理が行われる。この場合、半田、基板の回路パターン、
電子部品の電極などの金属部分が加熱されて酸化するの
を防止するために、加熱室にチッソガスを供給し、チ・
7ソガス雰囲気中において半田の加熱処理を行うことが
知られている。
(Prior Art) A board on which electronic components are mounted is sent to a heating chamber of a reflow apparatus, and heat treatment is performed on the solder that bonds the electrodes of the electronic component to the board. In this case, the solder, the circuit pattern on the board,
In order to prevent metal parts such as electrodes of electronic components from being heated and oxidized, nitrogen gas is supplied to the heating chamber.
It is known that heat treatment of solder is performed in a 7-gas atmosphere.

(発明が解決しようとする課題) ところが加熱室は、基板を搬入搬出するだめの入口と出
口が開口されているので、この入口と出口からチッソガ
スが加熱室外へ流出し、またここから外部空気が加熱室
内に流入して、加熱室のチッソガス濃度が次第に低下し
やすい問題点があった。また入口や出口からチッソガス
が流出する結果、リフロー装置が設置された作業室内の
酸素濃度が次第に低下し、作業者が酸欠症状を起すなど
、作業者の健康上の問題点があった。
(Problem to be Solved by the Invention) However, since the heating chamber has an open inlet and outlet for loading and unloading the substrate, nitrogen gas flows out of the heating chamber from the inlet and outlet, and external air leaks from here. There is a problem in that nitrogen gas flows into the heating chamber and the concentration of nitrogen gas in the heating chamber tends to gradually decrease. Furthermore, as a result of nitrogen gas flowing out from the inlet and outlet, the oxygen concentration in the work chamber where the reflow equipment is installed gradually decreases, causing health problems for workers, such as symptoms of oxygen deficiency.

(課題を解決するための手段) 本発明は、加熱室と、この加熱室に配設されたヒータと
、電子部品が実装された基板をこの加熱室内を搬送する
コンベヤと、この加熱室にチッソガスを供給するチッソ
ガス発生手段と、この加熱室の内部及び外部の酸素濃度
又はチ。
(Means for Solving the Problems) The present invention includes a heating chamber, a heater disposed in the heating chamber, a conveyor for conveying a board on which electronic components are mounted inside the heating chamber, and a nitrogen gas and the oxygen concentration inside and outside this heating chamber.

ソ温度を計測する酸素濃度計又はチッソ濃度計と、加熱
室内の酸素濃度又はチッソ濃度に応じて上記チッソガス
発生手段から加熱室に供給するチッソガス量を制御する
制御装置と、加熱室外の酸素濃度が低下したことを報知
する警報素子とからリフロー装置を構成している。
an oxygen concentration meter or a nitrogen concentration meter that measures the nitrogen temperature; a control device that controls the amount of nitrogen gas supplied from the nitrogen gas generation means to the heating chamber according to the oxygen concentration or nitrogen concentration inside the heating chamber; The reflow apparatus is composed of an alarm element that notifies that the temperature has decreased.

(作用) 上記構成において、基板はコンベヤにより搬送されなが
ら、チッソガス雰囲気中において、半田の加熱処理が行
われるが、加熱室内の酸素濃度が高くなると、チッソガ
ス発生手段からのチッソガス供給量は増加される。また
加熱室外の酸素濃度が低下したならば、ブザーやモニタ
ー−テレビなどの警報素子によりその旨報知する。
(Function) In the above configuration, solder heat treatment is performed in a nitrogen gas atmosphere while the substrate is being transported by a conveyor, but as the oxygen concentration in the heating chamber increases, the amount of nitrogen gas supplied from the nitrogen gas generating means increases. . Furthermore, if the oxygen concentration outside the heating chamber decreases, an alarm device such as a buzzer or a monitor/TV will notify you of this fact.

(実施例) 次に、図面を参照しながら本発明の詳細な説明する。(Example) Next, the present invention will be described in detail with reference to the drawings.

第1図はリフロー装置の側面図である。1は加熱室であ
り、その内部にはヒータ2とファン3が配設されており
、また電子部品Pが実装された基板Sを搬送するコンベ
ヤ4が設けられて、 いる。5は基板搬入用コン−、ヤ
、6は基板搬出用コンベヤ、7.8は入口と出口である
FIG. 1 is a side view of the reflow apparatus. Reference numeral 1 denotes a heating chamber, in which a heater 2 and a fan 3 are disposed, and a conveyor 4 for conveying a board S on which an electronic component P is mounted is provided. 5 is a conveyor for carrying in substrates, 6 is a conveyor for carrying out substrates, and 7.8 is an inlet and an outlet.

10はチッソ・ガス発生手段であって、管路11を通し
て、上記加熱室1にチッソガスを供給する。12は酸素
濃度計であって、加熱室1の内部と加熱室1の外部に酸
素取入部13.14.15を有している。16は酸素濃
度計12に接続されたコンピュータのような制御装置で
あって、上記チッソガス発生手段10や、ブザー、モニ
ターテレビ、ランプのような警報素子17−3= を制御する。
Reference numeral 10 denotes nitrogen gas generating means, which supplies nitrogen gas to the heating chamber 1 through a conduit 11. Reference numeral 12 denotes an oxygen concentration meter, which has oxygen intake sections 13, 14, and 15 inside the heating chamber 1 and outside the heating chamber 1. 16 is a control device such as a computer connected to the oxygen concentration meter 12, and controls the nitrogen gas generating means 10 and alarm elements 17-3 such as a buzzer, a monitor television, and a lamp.

上記構成において、電子部品Pが実装された基板Sはコ
ンベヤ4により搬送されながら、チッソガス雰囲気中に
おいて、半田の加熱処理が行われる。加熱室1は、入ロ
アや出口8により内外と連通しているので、加熱室1内
のチッソガスは加熱室1外に流出し、また加熱室1外の
空気は加熱室1内に流入し、加熱室1内の酸素濃度は次
第に高くなる。そこで酸素濃度計12により加熱室1内
の酸素濃度を計測し、酸素濃度が高くなったならば、チ
・7ソガス発生手段10から加熱室0へのチッソガス供
給■を増大する。
In the above configuration, while the board S on which the electronic component P is mounted is conveyed by the conveyor 4, the solder heat treatment is performed in a nitrogen gas atmosphere. Since the heating chamber 1 communicates with the inside and outside through the inlet lower and the outlet 8, the nitrogen gas in the heating chamber 1 flows out of the heating chamber 1, and the air outside the heating chamber 1 flows into the heating chamber 1. The oxygen concentration within the heating chamber 1 gradually increases. Therefore, the oxygen concentration in the heating chamber 1 is measured by the oxygen concentration meter 12, and if the oxygen concentration becomes high, the supply of nitrogen gas from the nitrogen gas generating means 10 to the heating chamber 0 is increased.

また加熱室1内のチッソガスか加熱室1外へ流出するこ
とから、このリフロー装置が設置された作業室内の酸素
濃度は次第に低下する。このように作業室内の□蔽素儂
度が低下すると、作業者は酸欠症状を起すの妃その場合
は警報素T−17によりその旨報知し、あるいは装置の
運転を停止する。
Further, since the nitrogen gas in the heating chamber 1 flows out of the heating chamber 1, the oxygen concentration in the working chamber in which this reflow apparatus is installed gradually decreases. When the degree of shielding in the work room is reduced in this way, the worker may experience oxygen deficiency symptoms.In that case, the alarm T-17 is used to notify the operator of this problem, or the operation of the apparatus is stopped.

−4= 上記実施例では、酸素濃度計12により加熱室1内外の
酸素濃度を計測しているが、酸素濃度計12に替えてチ
ッソ濃度計を設置し、チッソ濃度計により加熱室1内の
内部や外部のチッソ濃度を計測してもよいものである。
-4= In the above embodiment, the oxygen concentration inside and outside the heating chamber 1 is measured by the oxygen concentration meter 12, but a nitrogen concentration meter is installed in place of the oxygen concentration meter 12, and the oxygen concentration inside the heating chamber 1 is measured by the nitrogen concentration meter. It is also possible to measure the nitrogen concentration inside or outside.

(発明の効果) 以上説明したように本発明は、加熱室と、この加熱室に
配設されたヒータと、電子部品が実装された基板をこの
加熱室内を搬送するコンベヤと、この加熱室にチッソガ
スを供給するチッソガス発生手段と、この加熱室の内部
及び外部内の酸素?;度又はチッソ濃度を計測する酸素
濃度計又はチッソ濃度計と、加熱室内の酸素濃度又はチ
ッソ濃度に応じて上記チッソガス発生手段から加熱室に
供給するチッソガス量を制御する制御装置と、加熱室外
の酸素濃度が低下したことを報知する警報素子とからリ
フロー装置を構成しているので、加熱室1内のチッソ濃
度を自動調整して、半田の加熱処理を良好に行うことか
でき、また作業者の安全を図ることができる。
(Effects of the Invention) As explained above, the present invention includes a heating chamber, a heater disposed in the heating chamber, a conveyor for conveying a board on which electronic components are mounted inside the heating chamber, and a heater disposed in the heating chamber. A nitrogen gas generation means that supplies nitrogen gas, and oxygen inside and outside this heating chamber? an oxygen concentration meter or a nitrogen concentration meter that measures degrees or nitrogen concentration; a control device that controls the amount of nitrogen gas supplied from the nitrogen gas generation means to the heating chamber according to the oxygen concentration or nitrogen concentration in the heating chamber; Since the reflow device is composed of an alarm element that notifies that the oxygen concentration has decreased, the nitrogen concentration in the heating chamber 1 can be automatically adjusted to perform the solder heat treatment well, and the operator can Safety can be ensured.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の実施例を示すものであって、第1図はリフ
ロー装置の側面図である。 1・・・加熱室 2・・・ヒータ 4・・ ・コンベヤ 10・・・チッソガス発生手段 12・・・酸素濃度計 16・・・制御装置 17・・・警報素子
The drawings show an embodiment of the present invention, and FIG. 1 is a side view of a reflow apparatus. 1...Heating chamber 2...Heater 4...Conveyor 10...Nitrogen gas generating means 12...Oxygen concentration meter 16...Control device 17...Alarm element

Claims (1)

【特許請求の範囲】[Claims]  加熱室と、この加熱室に配設されたヒータと、電子部
品が実装された基板をこの加熱室内を搬送するコンベヤ
と、この加熱室にチッソガスを供給するチッソガス発生
手段と、この加熱室の内部及び外部の酸素濃度又はチッ
ソ濃度を計測する酸素濃度計又はチッソ濃度計と、加熱
室内の酸素濃度又はチッソ濃度に応じて上記チッソガス
発生手段から加熱室に供給するチッソガス量を制御する
制御装置と、加熱室外の酸素濃度が低下したことを報知
する警報素子とを備えて成ることを特徴とするリフロー
装置。
A heating chamber, a heater disposed in the heating chamber, a conveyor for transporting a board on which electronic components are mounted inside the heating chamber, a nitrogen gas generating means for supplying nitrogen gas to the heating chamber, and an interior of the heating chamber. and an oxygen concentration meter or a nitrogen concentration meter that measures the external oxygen concentration or nitrogen concentration, and a control device that controls the amount of nitrogen gas supplied from the nitrogen gas generation means to the heating chamber according to the oxygen concentration or nitrogen concentration in the heating chamber. A reflow apparatus comprising: an alarm element that notifies that the oxygen concentration outside the heating chamber has decreased.
JP33393690A 1990-11-29 1990-11-29 Reflow apparatus Pending JPH04200893A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33393690A JPH04200893A (en) 1990-11-29 1990-11-29 Reflow apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33393690A JPH04200893A (en) 1990-11-29 1990-11-29 Reflow apparatus

Publications (1)

Publication Number Publication Date
JPH04200893A true JPH04200893A (en) 1992-07-21

Family

ID=18271632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33393690A Pending JPH04200893A (en) 1990-11-29 1990-11-29 Reflow apparatus

Country Status (1)

Country Link
JP (1) JPH04200893A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120655A (en) * 1992-09-30 1994-04-28 A Tec Tekutoron Kk Automatic soldering machine
JPH06277826A (en) * 1993-03-31 1994-10-04 Honda Motor Co Ltd Method and device for high frequency heating
JP2001501008A (en) * 1996-12-20 2001-01-23 レール・リキード・ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Process for supplying gas to a chamber and method for adjusting the content of certain components of the atmosphere in such a chamber
TWI700144B (en) * 2019-04-11 2020-08-01 鴻齡科技股份有限公司 A reflow oven central monitoring method and monitoring system thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120655A (en) * 1992-09-30 1994-04-28 A Tec Tekutoron Kk Automatic soldering machine
JPH06277826A (en) * 1993-03-31 1994-10-04 Honda Motor Co Ltd Method and device for high frequency heating
JP2001501008A (en) * 1996-12-20 2001-01-23 レール・リキード・ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Process for supplying gas to a chamber and method for adjusting the content of certain components of the atmosphere in such a chamber
TWI700144B (en) * 2019-04-11 2020-08-01 鴻齡科技股份有限公司 A reflow oven central monitoring method and monitoring system thereof

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