JPH04180063A - Device for cleaning reticle - Google Patents
Device for cleaning reticleInfo
- Publication number
- JPH04180063A JPH04180063A JP2309678A JP30967890A JPH04180063A JP H04180063 A JPH04180063 A JP H04180063A JP 2309678 A JP2309678 A JP 2309678A JP 30967890 A JP30967890 A JP 30967890A JP H04180063 A JPH04180063 A JP H04180063A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- foreign matter
- stage
- thin film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims description 10
- 239000000126 substance Substances 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 abstract description 14
- 108010010803 Gelatin Proteins 0.000 abstract description 7
- 229920000159 gelatin Polymers 0.000 abstract description 7
- 239000008273 gelatin Substances 0.000 abstract description 7
- 235000019322 gelatine Nutrition 0.000 abstract description 7
- 235000011852 gelatine desserts Nutrition 0.000 abstract description 7
- 239000010408 film Substances 0.000 abstract description 5
- 238000005406 washing Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はレチクルの表面に付着した異物を洗浄する装置
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for cleaning foreign matter adhering to the surface of a reticle.
従来、透明基板とこの上に形成された遮光膜からなるパ
ターンとで構成されるレチクルの洗浄は、レチクルを洗
浄槽内の洗浄液に浸したり、レチクル表面をブラシ等で
こすり、付着した異物を洗い落す方法が主に用いられて
いた。Conventionally, cleaning a reticle, which consists of a transparent substrate and a pattern made of a light-shielding film formed on the transparent substrate, involves immersing the reticle in a cleaning solution in a cleaning tank or rubbing the reticle surface with a brush to remove foreign matter that has adhered to it. The dropping method was mainly used.
上述した従来のレチクル洗浄装置を用いる洗浄方法では
、レチクルを洗浄液に浸すため、−皮除去した異物がレ
チクルに再付着したり、レチクル表面をブラシ等で研摩
するためにその摩耗屑がレチクルに付着してしまうとい
う欠点がある。又従来の異物除去方法では、レチクルに
強く付着した異物や、パターンの溝に入り込んだ微小な
異物を除去することは困難であった。In the cleaning method using the conventional reticle cleaning device described above, since the reticle is immersed in a cleaning solution, foreign matter that has been removed may re-adhere to the reticle, and wear debris from polishing the reticle surface with a brush etc. may adhere to the reticle. It has the disadvantage that it does. Furthermore, with conventional foreign matter removal methods, it is difficult to remove foreign matter that is strongly attached to the reticle or minute foreign matter that has entered the grooves of the pattern.
本発明のレチクル洗浄装置は、レチクルを保持し上下動
する基体と、中央部にレチクル挿入用の開口部を有し周
囲に薬液ストッパが設けられたステージと、前記開口部
内に配置されるレチクルの表面に薬液を滴下するための
ノズルと、レチクル表面に滴下された薬液を硬化させる
為の硬化手段とを含んで構成される。The reticle cleaning device of the present invention includes a base body that holds a reticle and moves up and down, a stage that has an opening for inserting the reticle in the center and a chemical stopper around it, and a stage that holds the reticle and moves up and down. It is configured to include a nozzle for dropping a chemical liquid onto the surface of the reticle, and a curing means for curing the chemical liquid dropped on the reticle surface.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第１図は本発明一実施例の断面図、第２図は第１図にお
ける薄膜形成ステージ及びレチクルの上面図である。FIG. 1 is a sectional view of one embodiment of the present invention, and FIG. 2 is a top view of the thin film forming stage and reticle in FIG. 1.
レチクル１は、レチクル吸着部２とレチクル支持棒３と
から構成される基体で保持されると共に、パルスモータ
−８で上下動され、薄膜形成用のステージ５の中央部に
設けられた開口部５Ｂ内に設定される。ステージ５の上
部には薬液滴下用のノズル６が設けられており、薬液配
管７を介してノズル６より薬液として、例えばゼラチン
系の薬液か滴下される。ノズル６を右から左へパルスモ
ータ−８等により移動させることにより、薬液ストッパ
ー５Ａを有するステージ５上にゼラチン系薄膜４を形成
する。ステージ５の上部には、薬液硬化手段として、例
えは赤外線照射部９が設けられており、この赤外線照射
部９より赤外線を照射してゼラチン系薄膜４を硬化させ
た後、レチクル支持棒を下方に動かすことにより、レチ
クル１の表面からゼラチン系薄膜４をはくすし、同時に
レチクル１上の異物１０を吸着除去する。以下必要に応
じてレチクル１を純水等で洗浄する。The reticle 1 is held by a base consisting of a reticle suction part 2 and a reticle support rod 3, and is moved up and down by a pulse motor 8, and is moved up and down by an opening 5B provided in the center of a stage 5 for forming a thin film. is set within. A nozzle 6 for dropping a chemical liquid is provided at the top of the stage 5, and a gelatin-based chemical liquid, for example, is dropped from the nozzle 6 via a chemical liquid piping 7. By moving the nozzle 6 from right to left using a pulse motor 8 or the like, a gelatin-based thin film 4 is formed on the stage 5 having the chemical stopper 5A. At the top of the stage 5, an infrared ray irradiation unit 9 is provided as a chemical liquid curing means, for example, and after the gelatin thin film 4 is cured by irradiating infrared rays from the infrared ray irradiation unit 9, the reticle support rod is moved downward. By moving the reticle 1, the gelatin thin film 4 is removed from the surface of the reticle 1, and at the same time, the foreign matter 10 on the reticle 1 is adsorbed and removed. Thereafter, the reticle 1 is cleaned with pure water or the like as necessary.
このように本実施例によれば、レチクル１上に付着した
異物１０を薬液の薄膜により容易に除去することができ
る。As described above, according to this embodiment, the foreign matter 10 attached to the reticle 1 can be easily removed using the thin film of the chemical solution.
尚、上記実施例においては薬液硬化手段として赤外線を
用いたが、使用する薬液を硬化できるものであれば、紫
外線等を用いてもよい。In the above embodiments, infrared rays were used as the chemical solution curing means, but ultraviolet rays or the like may be used as long as the chemical solution used can be cured.
以上説明しなように本発明によれば、レチクル上に形成
した薬液の薄膜に異物を取り込ませ、この薄膜を表面か
ら剥離することにより異物を除去できるため、従来のよ
うに、洗浄液中の異物がレチクルに再付着したり、ブラ
シ等の摩耗屑がレチクルに付着するのを防止できる。さ
らに、レチクル表面に強力に付着した異物やパターンの
講に入り込んだ微小な異物を薄膜中に取り込んで除去で
きるという効果がある。As described above, according to the present invention, foreign matter can be removed by incorporating it into a thin film of chemical solution formed on the reticle and peeling off this thin film from the surface. It is possible to prevent the re-adhering of the paint onto the reticle and the adhesion of worn debris such as brushes to the reticle. Furthermore, there is an effect that foreign matter strongly attached to the reticle surface or minute foreign matter that has penetrated into the pattern can be incorporated into the thin film and removed.
第１図及び第２図は本発明の一実施例の断面図及び薄膜
形成ステージの上面図である。
１・・・レチクル、２・・・レチクル吸着部、３・・・
レチクル支持棒、４・・・ゼラチン系薄膜、５・・・ス
テージ、５Ａ・・・薬液ストッパー、６・・・ノズル、
・・・薬液配管、８・・・パルスモータ−０
代理人 弁理士 内 原 晋
吊１履
帛２図1 and 2 are a sectional view and a top view of a thin film forming stage of an embodiment of the present invention. 1... Reticle, 2... Reticle suction part, 3...
Reticle support rod, 4... Gelatin thin film, 5... Stage, 5A... Chemical solution stopper, 6... Nozzle,
...Chemical liquid piping, 8...Pulse motor-0 Agent: Patent attorney Shintsuri Uchihara 1, 2 diagrams
Claims (1)
挿入用の開口部を有し周囲に薬液ストッパが設けられた
ステージと、前記開口部内に配置されるレチクルの表面
に薬液を滴下するためのノズルと、レチクル表面に滴下
された薬液を硬化させる為の硬化手段とを含むことを特
徴とするレチクル洗浄装置。A base body that holds a reticle and moves up and down, a stage that has an opening for inserting the reticle in the center and a chemical stopper around it, and a stage for dropping a chemical liquid onto the surface of the reticle placed in the opening. A reticle cleaning device comprising a nozzle and a curing means for curing a chemical solution dropped onto a reticle surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2309678A JPH04180063A (en) | 1990-11-15 | 1990-11-15 | Device for cleaning reticle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2309678A JPH04180063A (en) | 1990-11-15 | 1990-11-15 | Device for cleaning reticle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04180063A true JPH04180063A (en) | 1992-06-26 |
Family
ID=17995960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2309678A Pending JPH04180063A (en) | 1990-11-15 | 1990-11-15 | Device for cleaning reticle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04180063A (en) |
-
1990
- 1990-11-15 JP JP2309678A patent/JPH04180063A/en active Pending
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