JPH04129622A - Manufacture of diamond-coated tool - Google Patents
Manufacture of diamond-coated toolInfo
- Publication number
- JPH04129622A JPH04129622A JP24745990A JP24745990A JPH04129622A JP H04129622 A JPH04129622 A JP H04129622A JP 24745990 A JP24745990 A JP 24745990A JP 24745990 A JP24745990 A JP 24745990A JP H04129622 A JPH04129622 A JP H04129622A
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- tool
- diamond film
- substrate
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 131
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 130
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 16
- 239000010949 copper Substances 0.000 claims abstract description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052802 copper Inorganic materials 0.000 claims abstract description 7
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 5
- 239000010941 cobalt Substances 0.000 claims abstract description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000919 ceramic Substances 0.000 claims abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000002131 composite material Substances 0.000 claims abstract 2
- 229910052759 nickel Inorganic materials 0.000 claims abstract 2
- 239000002245 particle Substances 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 35
- 239000012808 vapor phase Substances 0.000 claims description 15
- 238000001308 synthesis method Methods 0.000 claims description 5
- 239000011195 cermet Substances 0.000 claims description 2
- 230000002706 hydrostatic effect Effects 0.000 claims description 2
- 238000005470 impregnation Methods 0.000 claims 2
- 239000011148 porous material Substances 0.000 abstract description 9
- 239000000126 substance Substances 0.000 abstract description 4
- 230000002194 synthesizing effect Effects 0.000 abstract 3
- 239000010408 film Substances 0.000 description 55
- 238000005520 cutting process Methods 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000004873 anchoring Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- CAOSCCRYLYQBES-UHFFFAOYSA-N 2-[[[4-hydroxy-2-oxo-1-(phenylmethyl)-3-quinolinyl]-oxomethyl]amino]acetic acid Chemical compound O=C1C(C(=O)NCC(=O)O)=C(O)C2=CC=CC=C2N1CC1=CC=CC=C1 CAOSCCRYLYQBES-UHFFFAOYSA-N 0.000 description 1
- 208000031872 Body Remains Diseases 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔概 要〕
ダイヤモンド膜を気相合成法で工具基板上に形成したダ
イヤモンド・コーティング工具の製造方法に関し、
高い密着力の気相合成ダイヤモンド膜を被覆したダイヤ
モンド・コーティング工具の製造方法を提供することを
目的とし、
気孔による凹凸表面を有する多孔質焼結体の工具基板の
上に、気相合成法によってダイヤモンド膜を形成し、そ
して、前記基板に溶融金属を前記ダイヤモンド膜の被覆
されていない表面から含浸させるように構成する。[Detailed Description of the Invention] [Summary] A diamond-coated tool coated with a vapor-phase synthetic diamond film having high adhesion, which relates to a method for manufacturing a diamond-coated tool in which a diamond film is formed on a tool substrate by a vapor-phase synthesis method. A diamond film is formed by a vapor phase synthesis method on a tool substrate of a porous sintered body having an uneven surface due to pores, and a molten metal is applied to the substrate to form a diamond film. The membrane is configured to be impregnated from the uncoated surface.
本発明は、ダイヤモンド膜を気相合成法で工具基板上に
形成したダイヤモンド・コーティング工具の製造方法に
関する。The present invention relates to a method for manufacturing a diamond-coated tool in which a diamond film is formed on a tool substrate by a vapor phase synthesis method.
ダイヤモンドはビッカース硬度１００００と地球上で最
も硬い材料であり、耐磨耗性、化学的安定性にも優れて
いる。このような優れた性質のため、ダイヤモンドは切
削工具などの工具として最高の材料であり、現在のハイ
テク産業には必要不可欠な存在である。従来のダイヤモ
ンド工具は天然または高圧合成の単結晶または焼結体ダ
イヤモンドを用いているが、極めて高価でありかつ大き
な形状の工具ができないなどの欠点があった。Diamond is the hardest material on earth, with a Vickers hardness of 10,000, and has excellent wear resistance and chemical stability. These excellent properties make diamond the best material for tools such as cutting tools, and it is indispensable in today's high-tech industries. Conventional diamond tools use natural or high-pressure synthesized single crystal or sintered diamond, but these have drawbacks such as being extremely expensive and not being able to be made into large-sized tools.
ＴｉＣ，Ｔ、Ｎ、 ＡＩ７！２０３などの薄膜を単層ま
たは多層として超硬合金や高速度鋼の表面に被覆したコ
ーティング工具が開発され市販されており、これらコー
テイング膜の代わりにダイヤモンド膜を形成することが
研究開発されている（例えば、臭性、検出、見義： “
超硬合金上へのダイヤモンドの気相合成”、粉体および
粉末冶金、第３５巻、第３号、ｐｐ、１１４−１１７．
１９８８年４月、参照）。また、ダイヤモンド膜を形成
することについては、例えば、加茂睦和： “ダイヤモ
ンドの気相合成”、日本金属学会会報、第２８巻、第６
号（１９８９） 、ｐｐ、 ４８３−４９２に解説され
ている。Coating tools in which the surfaces of cemented carbide and high-speed steel are coated with a single or multilayer thin film of TiC, T, N, AI7!203, etc. have been developed and commercially available, and diamond films can be formed in place of these coating films. Research and development is being conducted to determine the
"Vapor phase synthesis of diamond on cemented carbide", Powder and Powder Metallurgy, Vol. 35, No. 3, pp. 114-117.
(Ref. April 1988). Regarding the formation of a diamond film, see, for example, Mutsukazu Kamo: “Vapor Phase Synthesis of Diamond,” Bulletin of the Japan Institute of Metals, Vol. 28, Vol. 6.
(1989), pp. 483-492.
工具を気相合成法によるダイヤモンド膜で被覆する際に
、ダイヤモンドの熱膨張係数と工具や加熱治具の基板の
熱膨張係数とが大きく異なること、さらにダイヤモンド
の成膜温度（合成温度）が１０００℃前後と非常に高温
であることの理由でダイヤモンド膜と基板との間に大き
な熱応力が発生して、容易に膜が剥離してしまう。即ち
、気相合成ダイヤモンドを用いた工具が開発されている
が、この気相合成ダイヤモンド膜は密着力は極めて小さ
いという問題点がある。そこで、炭化物等の中間層をダ
イヤモンド膜の下に設けて化学的に密着力を上げようと
の試みがあるが成功していない。When coating a tool with a diamond film by vapor phase synthesis, the thermal expansion coefficient of diamond and the thermal expansion coefficient of the substrate of the tool or heating jig are significantly different, and the diamond film formation temperature (synthesis temperature) is 1000% Due to the extremely high temperature of around 0.9°C, large thermal stress is generated between the diamond film and the substrate, and the film easily peels off. That is, tools using vapor-phase synthetic diamond have been developed, but this vapor-phase synthetic diamond film has a problem in that its adhesion is extremely low. Therefore, attempts have been made to chemically increase the adhesion by providing an intermediate layer such as carbide under the diamond film, but these efforts have not been successful.
本発明の目的は、高い密着力の気相合成ダイヤモンド膜
を被覆したダイヤモンド・コーティング工具の製造方法
を提供することである。An object of the present invention is to provide a method for manufacturing a diamond-coated tool coated with a vapor-phase synthetic diamond film of high adhesion.
上述の目的が、下記２つのやり方で達成でき、第１のや
り方は、気孔による担凸表面を有する多孔質焼結体の工
具基板の上に、気相合成法によってダイヤモンド膜を形
成し、そして、前記基板に溶融金属を前記ダイヤモンド
膜の被覆されていない表面から含浸させることを特徴と
するダイヤモンド・コーティング工具の製造方法であり
、そして第２のやり方は、凹凸表面を有する工具基板に
ダイヤモンド粒子をぶつけて該工具基板の表面に傷を付
けかつくぼみ内に該ダイヤモンド粒子を入れ込ませ、こ
れら傷およびダイヤモンド粒子を成長核として気相合成
法によってダイヤモンド膜を前記工具基板上に形成する
ことを特徴とするダイヤモンド・コーティング工具の製
造方法である。The above object can be achieved in the following two ways. The first method is to form a diamond film by vapor phase synthesis on a tool substrate of a porous sintered body having a pore-supported surface, and , a method for manufacturing a diamond-coated tool, characterized in that the substrate is impregnated with molten metal from the uncoated surface of the diamond film; scratches the surface of the tool substrate by hitting the tool substrate with the diamond particles and causes the diamond particles to enter the recesses, and forms a diamond film on the tool substrate by vapor phase synthesis using the scratches and diamond particles as growth nuclei. This is a unique method for manufacturing diamond-coated tools.
気相合成ダイヤモンド膜の下地工具基体への密着力を高
めるために、本願発明では、凹凸表面の工具基体を用い
て、その凹凸を利用したアンカー効果を出してダイヤモ
ンド膜を工具基体によりしっかりとつなぎ止めることが
できる。In order to increase the adhesion of the vapor phase synthesized diamond film to the underlying tool base, the present invention uses a tool base with an uneven surface, and uses the unevenness to create an anchor effect to firmly anchor the diamond film to the tool base. be able to.
このようなアンカー効果を上げるためには基板の凹凸が
激しいほど適しているわけであり、本発明の第１実施態
様では、多孔質の焼結体工具基板（セラミックス、サー
メット、金属、または、これらの複合材料の基板）を用
いて、多孔質体表面のくぼみ内にもダイヤモンドが堆積
され、これがくさびの役割を果たして高い密着力が得ら
れる。In order to increase such an anchoring effect, the more irregular the substrate is, the more suitable it is, and in the first embodiment of the present invention, a porous sintered tool substrate (ceramic, cermet, metal, or any of these materials) is used. Diamond is also deposited within the depressions on the surface of the porous material, which acts as a wedge and provides high adhesion.
他方、多孔質のままでは強度、靭性が低いので、焼結体
の気孔中へ金属（Ｃｕ 、ＣｏまたはＮ１を主成分とし
た金属）を減圧下であるいは静水圧加圧で含浸させて気
孔（空隙）をなくし、機械的強度を高めることができる
。On the other hand, since the strength and toughness are low if the sintered body remains porous, a metal (metal whose main component is Cu, Co, or N1) is impregnated into the pores of the sintered body under reduced pressure or by hydrostatic pressure. It is possible to eliminate voids) and increase mechanical strength.
また、工具基体表面の凹凸が激しすぎたり、ダイヤモン
ド成長時の核発密度が小さかったりすると、凹部にダイ
ヤモンドが成長せず、そこが隙間となってしまい充分な
アンカー効果が得られない場合がある。そこで、本発明
の第２実施態様では、でこぼこな下地基板の表面にダイ
ヤモンド粒子を押し付け（ぶつけ）で基板表面にダイヤ
モンド成長の核発生サイトとなる微細な傷を無数に作る
とともに、基板表面のくぼみにダイヤモンド粒子を入り
込ませ、このダイヤモンド粒子もダイヤモンド成長の核
とさせることにより、工具基板とダイヤモンド膜との界
面にすき間のない緻密なダイヤモンド膜を形成し、アン
カー効果を最大限に発揮させようとするものである。In addition, if the surface of the tool base is too uneven or the density of nuclei during diamond growth is small, diamonds will not grow in the recesses, creating gaps that may not provide a sufficient anchoring effect. be. Therefore, in the second embodiment of the present invention, diamond particles are pressed (bumped) onto the surface of an uneven base substrate to create countless fine scratches on the substrate surface that will become nucleation sites for diamond growth, and to create dents in the substrate surface. By incorporating diamond particles into the diamond film and using these diamond particles as nuclei for diamond growth, a dense diamond film with no gaps is formed at the interface between the tool substrate and the diamond film, and the anchoring effect is maximized. It is something to do.
表面凹凸のくぼみ幅は１００／−以下が好ましく、これ
よりも大きいと表面が荒くなりすぎて実用上問題である
。さらに、押し付ける（衝突させる）ダイヤモンド粒子
はそのサイズ（粒径）が０．ＩＪ＝−〜１００即である
のが好ましく、０．１−以下のダイヤモンド粒子は製造
および取扱いがむずかしく、また、傷つけ効果が小さい
。１００譚以上では表面くぼみ内に入れ込むことがむず
かしい。The width of the depressions in the surface irregularities is preferably 100/- or less; if it is larger than this, the surface becomes too rough, which is a practical problem. Furthermore, the size (particle diameter) of the diamond particles to be pressed (collided) is 0. It is preferable that IJ=- to 100. Diamond particles of 0.1- or less are difficult to manufacture and handle, and have a small scratching effect. With more than 100 tans, it is difficult to penetrate into the surface depressions.
以下、添付図面を参照して、本発明の実施態様例および
比較例によって本発明の詳細な説明する。Hereinafter, the present invention will be described in detail by embodiments and comparative examples with reference to the accompanying drawings.
第１Ａ図〜第１Ｃ図は、本発明の第１実施態様に係る場
合のダイヤモンド・コーティング工具の製造工程を説明
する工具の概略部分断面図である。1A to 1C are schematic partial cross-sectional views of a tool illustrating the manufacturing process of a diamond-coated tool according to the first embodiment of the present invention.
実施例１
平均粒径１０−のタングステン粒子を焼結して焼結板を
製作し、これから概寸１０ ＸＩＯＸ ３ ｍｍのバイ
トチップ（スローアウェイチップ）１として切り出した
（第１Ａ図）。このチップ（工具基板）１はその空隙率
が３５％であって、表面凹凸のくぼみ２があり、内部に
気孔３が存在する。Example 1 A sintered plate was produced by sintering tungsten particles having an average particle size of 10 mm, and cut out from the plate as a bite chip (throw-away chip) 1 having an approximate size of 10 X IOX 3 mm (FIG. 1A). This chip (tool substrate) 1 has a porosity of 35%, has depressions 2 with uneven surfaces, and has pores 3 inside.
次に、バイトチップ１を直流プラズマジェットＣＶＤ装
置内に装着し、ダイヤモンド膜４をバイトチップ１の上
面および側面にコーティングしたく第１Ｂ図）。この直
流プラズマジェッ）ＣＶＤ装置は、本発明者らが既に開
発した装置であり、例えば、特開昭６４−３３０９６号
公報にも開示されている。ダイヤモンド成膜条件は、例
えば、次のとおりであった。Next, the bite tip 1 is placed in a DC plasma jet CVD apparatus, and a diamond film 4 is coated on the top and side surfaces of the bite tip 1 (FIG. 1B). This DC plasma jet CVD apparatus has already been developed by the present inventors, and is also disclosed in, for example, Japanese Patent Laid-Open No. 64-33096. The diamond film forming conditions were, for example, as follows.
原料ガス：メタンガス１．５１７ｍ１ｎ水素ガス５Ｑｆ
／ｍｉｎ
装置内圧カニ ５ＱＴｏｒｒ
アーク （プラズマ）出カニ５ｋＷ
基板搭載台：水冷
厚さ５０廂のダイヤモンド膜４が、第１Ｂ図に示すよう
に、表面のくぼみ内にもダイヤモンドが堆積して成長す
るので、くぼみ内にくさびを入れたようになりアンカー
効果が現われる。Raw material gas: methane gas 1.517ml1n hydrogen gas 5Qf
/min Internal pressure of the device: 5QTorr Arc (plasma) output: 5kW Substrate mounting stage: water-cooled The diamond film 4 with a thickness of 50 cm is deposited and grows in the depressions on the surface, as shown in Figure 1B. , it looks like a wedge has been inserted into the depression, creating an anchor effect.
その後に、バイトチップ１を真空中で溶融銅（Ｃｕ）に
浸して、ダイヤモンド膜４で被覆されていない表面から
内部に含浸させ、気孔を銅５で満した（第１Ｃ図）。こ
のようにして、ダイヤモンド・コーティング工具（スロ
ーアウェイチップ）を作製した。Thereafter, the bite tip 1 was immersed in molten copper (Cu) in a vacuum to impregnate the inside from the surface not covered with the diamond film 4, and the pores were filled with copper 5 (FIG. 1C). In this way, a diamond coated tool (indexable tip) was produced.
得られた工具についてそのダイヤモンド膜の密着強度を
引き剥し方式で測定したところ、約１００ｋｇ／ｃｒ１
以上になったところで測定治具がダイヤモンド膜表面か
らはがれてしまい、ダイヤモンド膜の密着強度を値とし
て得ることができなかった。When the adhesion strength of the diamond film on the obtained tool was measured using a peel-off method, it was approximately 100 kg/cr1.
At this point, the measuring jig peeled off from the surface of the diamond film, making it impossible to obtain a value for the adhesion strength of the diamond film.
一方、タングステン粒子を焼結し粒子間隙に金属バイン
ダを充填したようになっているタングステン焼結板に同
様にしてダイヤモンド膜を被覆してダイヤモンド・コー
ティング工具を作製した。この場合でのダイヤモンド膜
の密着強度は同様に測定して１ｋｇ／ｃａｔ以下であっ
た（膜が剥れた）。したがって、本発明の場合は従来よ
りも大幅に密着力が向上していることがわかる。On the other hand, a tungsten sintered plate made of sintered tungsten particles and a metal binder filled in the gaps between the particles was coated with a diamond film in the same manner to produce a diamond-coated tool. The adhesion strength of the diamond film in this case was similarly measured and was 1 kg/cat or less (the film peeled off). Therefore, it can be seen that in the case of the present invention, the adhesion strength is significantly improved compared to the conventional one.
次に、このダイヤモンド・コーティングバイトチップと
従来の超硬チップおよび焼結ダイヤモンドチップを用い
て金属切削試験を行った。切削条件は、被削材：Ａβ−
１２％Ｓ１合金（ＡＣ８Ａ−７６）、切削方法：外周長
手連続旋削、切削速度４００ｍ／ｍｉｎ 、送り０．１
ｍｍ／ｒｅｖ 、切込み０．２５ｍｍである。Next, metal cutting tests were conducted using this diamond-coated bit tip, a conventional carbide tip, and a sintered diamond tip. The cutting conditions are: Work material: Aβ-
12% S1 alloy (AC8A-76), cutting method: outer circumference longitudinal continuous turning, cutting speed 400 m/min, feed 0.1
mm/rev, and the cutting depth is 0.25 mm.
その結果、超硬チップの場合、１０００ｍの切削で逃げ
面磨耗幅が２００７＝−以上となったが、焼結ダイヤモ
ンドチップと本発明のバイトチップは超硬の１０＋倍の
１００００ｍの切削でも逃げ面磨耗幅は数１０−であっ
た。この結果から本発明のダイヤモンドチップは焼結ダ
イヤモンドチップと同等の特性であることがわかる。As a result, in the case of the carbide tip, the flank wear width was 2007=- or more after 1000 m of cutting, but the flank wear width of the sintered diamond tip and the cutting tool of the present invention was 10+ times that of carbide, even when cutting 10,000 m. The wear width was several 10-. This result shows that the diamond tip of the present invention has properties equivalent to those of the sintered diamond tip.
実施例２
平均粒径５Ｊ１ｍのタングステン・カーバイト粒子を焼
結して焼結板を製作し、実施例１と同様に、これから概
寸１０ ＸＩＯＸ ３ ｍｍのバイトチップ１として切
り出した。このチップはその空隙率が３０％であり、第
１Ａ図のように、表面にくぼみがあり、内部に気孔が存
在する。Example 2 A sintered plate was produced by sintering tungsten carbide particles with an average particle size of 5J1 m, and in the same manner as in Example 1, a bite chip 1 having an approximate size of 10 X IOX 3 mm was cut from the plate. This chip has a porosity of 30%, and as shown in FIG. 1A, there are depressions on the surface and pores inside.
次に、実施例１と同じに直流プラズマジェットＣＶＤ法
によってダイヤモンド膜でバイトチップの上面および側
面を被覆した。Next, in the same manner as in Example 1, the top and side surfaces of the bite tip were coated with a diamond film using the DC plasma jet CVD method.
その後に、バイトチップを銅粉末とともにホットプレス
装置内に入れ、真空引き後、１０７０℃、５０気圧で銅
をチップ気孔を充填するように含浸させた。Thereafter, the bite chip was placed in a hot press machine together with copper powder, and after being evacuated, copper was impregnated at 1070° C. and 50 atm so as to fill the chip pores.
得られたダイヤモンド・コーティング工具について、そ
のダイヤモンド膜の密着強度を実施例１と同様にして測
定したところ、約１００ｋｇ／ｍ＋ｎ２以上で測定治具
がはがれ、正確な密着強度値は得られなかったが、従来
よりも大幅に密着力は向上している。When the adhesion strength of the diamond film on the obtained diamond-coated tool was measured in the same manner as in Example 1, the measuring jig peeled off at approximately 100 kg/m+n2 and an accurate adhesion strength value could not be obtained. , the adhesion is significantly improved compared to the conventional one.
次に、このダイヤモンド・コーティングバイトチップを
実施例１と同じ条件で切削試験を行なったところ、焼結
ダイヤモンドチップと同等の切削特性であった。Next, this diamond-coated bit tip was subjected to a cutting test under the same conditions as in Example 1, and it was found that the cutting properties were equivalent to those of the sintered diamond tip.
第２Ａ図〜第２Ｃ図は、本発明の第２実施態様に係る場
合のダイヤモンド・コーティング工具の製造工程を説明
する工具の概略部分断面図である。FIGS. 2A to 2C are schematic partial cross-sectional views of a tool illustrating the manufacturing process of a diamond-coated tool according to a second embodiment of the present invention.
実施例３
平均粒径５崗のタングステン粒子を焼結して焼結板を製
作し、これから概寸１０ ＸＩＯＸ ２ ｍｍのバイト
チップ（スローアウェイチップ）１１として切り出した
（第２Ａ図）。このチップ（工具基板）１１はその空隙
率が２０％であって、表面凹凸のくぼみ１２がある。Example 3 A sintered plate was produced by sintering tungsten particles with an average particle size of 5 mm, and cut out from the plate as a bite chip (throw-away chip) 11 with an approximate size of 10 X IOX 2 mm (FIG. 2A). This chip (tool substrate) 11 has a porosity of 20% and has depressions 12 on the surface.
アルミナ製の器に平均粒径３ｐのダイヤモンド粉末を入
れ、その中にバイトチップ１１を入れ、その上にアルミ
ナ製の重しを乗せた後、超音波振動機にかけ、チップ表
面に傷つけ処理するとともに、表面のくぼみ（凹部）１
２にダイヤモンド粒子１３が入り込むようにした（第２
Ｂ図）。Put diamond powder with an average particle size of 3p in an alumina container, put the bite tip 11 in it, place an alumina weight on top of it, and then apply it to an ultrasonic vibrator to damage the tip surface. , surface depression (concavity) 1
The diamond particles 13 were made to enter into the second part (second part).
Figure B).
次に、バイトチップ１１を直流プラズマジェットＣＶＤ
装置内に装着し、ダイヤモンド膜１４をバイトチップ１
の上面および側面にコーティングした（第２ｃ図）。こ
の直流プラズマジェットＣＶＤ装置は、本発明者らが既
に開発した装置であり、例えば、特開昭６４−３３０９
６号公報にも開示されている。ダイヤモンド成膜条件は
、例えば、次のとおりであった。Next, the bite chip 11 is processed by direct current plasma jet CVD.
Place the diamond film 14 on the bite tip 1.
(Figure 2c). This DC plasma jet CVD apparatus is an apparatus already developed by the present inventors.
It is also disclosed in Publication No. 6. The diamond film forming conditions were, for example, as follows.
原料ガス：メタンガス１．５４’ ／ｍｉｎ水素ガス
５０β／ｍ ｉ ｎ
装置内圧カニ ５０Ｔｏｒｒ
アーク （プラズマ）出カニ １０ｋＷ基板搭載台：水
冷
厚さ１００Ｘａのダイヤモンド膜１４が、第２Ｃ図に示
すように、表面くぼみ内のダイヤモンド粒子１３そして
ダイヤモンド粒子による微細な無数の傷が成長（堆積）
核となって、ダイヤモンドの成長が進行して、チップ（
基板）１１とダイヤモンド膜１４との界面に隙間のない
緻密なダイヤモンド膜が得られる。そして、表面のくぼ
み内にもくさびを入れたようにダイヤモンド膜が形成さ
れているので、アンカー効果が当然現われる。Raw material gas: methane gas 1.54'/min hydrogen gas
50β/min Equipment internal pressure 50Torr Arc (plasma) output 10kW Substrate mounting stand: water-cooled A diamond film 14 with a thickness of 100Xa is coated with diamond particles 13 in the surface recesses and fine particles formed by the diamond particles, as shown in Fig. 2C. Numerous scratches grow (accumulate)
As a nucleus, diamond growth progresses and a chip (
A dense diamond film with no gaps at the interface between the substrate 11 and the diamond film 14 can be obtained. Since the diamond film is formed like a wedge in the depressions on the surface, an anchor effect naturally appears.
得られた工具についてそのダイヤモンド膜の密着強度を
引き剥し方式で測定したところ、約１００ｋｇ ／ ｃ
ｕｔ以上になったところで測定治具がダイヤモンド膜表
面からはがれてしまい、ダイヤモンド膜の密着強度を値
として得ることができなかった。When the adhesion strength of the diamond film on the obtained tool was measured using a peel-off method, it was approximately 100 kg/c.
When the temperature exceeded ut, the measuring jig peeled off from the surface of the diamond film, and the adhesion strength of the diamond film could not be obtained as a value.
一方、ダイヤモンド粒子による傷付けおよび押し込み残
留を施こさないバイトチップに同様にしてダイヤモンド
膜を被覆してダイヤモンド・コーティング工具を作製し
た。この場合でのダイヤモンド膜の密着強度は同様に測
定して１０ｋｇ／ｃｍ以下であった（膜が剥れた）。し
たがって、本発明の場合は従来よりも大幅に密着力が向
上していることがわかる。On the other hand, a diamond coated tool was fabricated by coating a diamond film in the same manner on a tool tip that would not be scratched by diamond particles or leave any indentation residue. The adhesion strength of the diamond film in this case was similarly measured and was 10 kg/cm or less (the film peeled off). Therefore, it can be seen that in the case of the present invention, the adhesion strength is significantly improved compared to the conventional one.
次に、このダイヤモンド・コーティングバイトチップと
従来の超硬チップおよび焼結ダイヤモンドチップを用い
て金属切削試験を行った。切削条件は、被削材：Ａβ−
１２％Ｓ１合金（ＡＣ８Ａ −７６）、切削方法：外周
長手連続旋削、切削速度４００ｍ／ｍｉｎ 、送り０．
１ ｍｍ／ｒｅｖ 、切込み０．２５ｍ＋ｎである。Next, metal cutting tests were conducted using this diamond-coated bit tip, a conventional carbide tip, and a sintered diamond tip. The cutting conditions are: Work material: Aβ-
12% S1 alloy (AC8A-76), cutting method: outer longitudinal continuous turning, cutting speed 400 m/min, feed 0.
1 mm/rev, cutting depth 0.25 m+n.
その結果、超硬チップの場合、１０００ｍの切削で逃げ
面磨耗幅が２００声以上となったが、焼結ダイヤモンド
チップと本発明のバイトチップは超硬の１０倍の１００
００ｍの切削でも逃げ面磨耗幅は数１０庫であった。こ
の結果から本発明のダイヤモンドチップは焼結ダイヤモ
ンドチップと同等の特性であることがわかる。As a result, in the case of the carbide tip, the width of flank wear was more than 200 mm after 1000 m of cutting, but the sintered diamond tip and the bite tip of the present invention had a wear width of 100 mm, which is 10 times that of the carbide tip.
Even when cutting 00m, the width of flank wear was several tens of degrees. This result shows that the diamond tip of the present invention has properties equivalent to those of the sintered diamond tip.
実施例４
バイトチップとして、平均粒径１０ａ＋のタングステン
カーバイド （ＷＣ）＋：２３％コバルト （ＣＯ）パ
イグーによるＷＣ／Ｃｏ超硬チップを利用し、硝酸でコ
バルトのみを深さ約５−エツチングした。この超硬チッ
プの上にスパッタリングによってタングステン（Ｗ）膜
を厚さ０．１ｐで形成してコーティングした。このよう
な処理を施したバイトチップ（基板）を、エタノール中
に平均粒径１ｉａのダイヤモンド粒子を分散させたダイ
ヤモンド研磨液に入れ、超音波振動をかけ、基板表面に
微細な無数の傷をつけ、同時に、表面のくぼみ（凹所）
にダイヤモンド粒子を押し込んだ。Example 4 A WC/Co carbide tip made of tungsten carbide (WC) +:23% cobalt (CO) pie goo with an average particle size of 10a+ was used as a bite tip, and only the cobalt was etched to a depth of about 5 mm with nitric acid. A tungsten (W) film with a thickness of 0.1p was formed and coated on this carbide chip by sputtering. The bite tip (substrate) that has been treated in this way is placed in a diamond polishing solution in which diamond particles with an average particle size of 1 ia are dispersed in ethanol, and ultrasonic vibration is applied to create numerous fine scratches on the substrate surface. , at the same time, surface depressions (depressions)
Diamond particles were pushed into the.
次に、実施例３と同じに直流プラズマジェットＣＶＤ法
によってダイヤモンド膜でバイトチップの上面および側
面を被覆した。Next, in the same manner as in Example 3, the top and side surfaces of the bite tip were coated with a diamond film using the DC plasma jet CVD method.
そして、この得られたダイヤモンド・コーティングバイ
トチップを実施例３と同じ条件で切削試験を行なったと
ころ、焼結ダイヤモンドチップと同等の切削特性であっ
た。Then, a cutting test was conducted on the obtained diamond-coated bit tip under the same conditions as in Example 3, and it was found that the cutting properties were equivalent to those of the sintered diamond tip.
実施例５
バイトチップ（工具基板）として２０ Ｘ２０ Ｘ ５
ｍ＋ｎの窒化珪素焼結板を用い、その表面に圧膜法に
より平均粒径５陶の窒化珪素粒子を厚さ２０角印刷し、
窒素雰囲気中１８００℃で焼成し、表面に凹凸を形成し
た。このような処理を施したバイトチップ（基板）に、
平均粒径５Ｊ！Ｉｎのダイヤモンド粒子を圧縮空気によ
ってノズルから噴出させてぶつけ、基板表面に傷つけ処
理するとともに、表面のくぼみ（凹部）にダイヤモンド
粒子が入り込むようにした。そして、実施例３と同様の
方法でダイヤモンド・コーティングを行なった。Example 5 20 x 20 x 5 as bite chip (tool board)
Using a m+n silicon nitride sintered plate, silicon nitride particles with an average particle size of 5 porcelain were printed on the surface using a pressure film method to a thickness of 20 squares,
It was fired at 1800° C. in a nitrogen atmosphere to form irregularities on the surface. The bite chip (substrate) that has been treated in this way is
Average particle size 5J! Diamond particles of In were ejected from a nozzle using compressed air and struck the substrate to damage the surface of the substrate and cause the diamond particles to enter the depressions (recesses) on the surface. Diamond coating was then performed in the same manner as in Example 3.
得られたダイヤモンド・コーティング工具について、そ
のダイヤモンド膜の密着強度を実施例３と同様にして測
定したところ、約１００ｋｇ／ｍｍ２以上で測定治具が
はがれ、正確な密着強度値は得られなかった。一方、窒
化珪素基板に直接にダイヤモンド膜を同様にして被覆し
た場合には、膜の密着強度は１ｋｇ／ＣｆＩＩ以下であ
った。したがって、本発明の場合は従来よりも大幅に密
着力が向上していることがわかる。When the adhesion strength of the diamond film on the obtained diamond coated tool was measured in the same manner as in Example 3, the measuring jig peeled off at a pressure of about 100 kg/mm2 or more, and an accurate adhesion strength value could not be obtained. On the other hand, when a silicon nitride substrate was directly coated with a diamond film in the same manner, the adhesion strength of the film was 1 kg/CfII or less. Therefore, it can be seen that in the case of the present invention, the adhesion strength is significantly improved compared to the conventional one.
上述したように、本発明によれば、気相合成法で被覆し
たダイヤモンド膜では１００ｋｇ／ ｍ＋ｎ２以上の密
着強度が得られ、本方法を用いない場合に対し、大幅な
密着力の改善が達成できる。さらに、本発明によりダイ
ヤモンド被覆された工具は、従来の焼結ダイヤモンドを
用いた工具と比べて格段に安い価格で、焼結ダイヤモン
ド工具と同等の特性が得られる。As described above, according to the present invention, an adhesion strength of 100 kg/m+n2 or more can be obtained with a diamond film coated using a vapor phase synthesis method, and a significant improvement in adhesion can be achieved compared to the case where this method is not used. . Furthermore, a tool coated with diamond according to the present invention provides properties comparable to those of a sintered diamond tool at a significantly lower price than tools using conventional sintered diamond.
第１Ａ図〜第１Ｃ図は、本発明の第１実施態様に係る場
合のダイヤモンド・コーティング工具の製造工程を説明
する工具の概略部分断面図であり、第２Ａ図〜第２Ｃ図
は、本発明の第２実施態様に係る場合のダイヤモンド・
コーティング工具の製造工程を説明する工具の概略部分
断面図である。
１．１１・・・バイトチップ（工具基板）２・１２・・
・くぼみ、 ３・・・気孔、４・１４・・・ダイ
ヤモンド膜、
５・・・銅、
１３・・・ダイヤモンド粒子。1A to 1C are schematic partial cross-sectional views of a tool illustrating the manufacturing process of a diamond-coated tool according to the first embodiment of the present invention, and FIGS. 2A to 2C are schematic partial sectional views of a tool according to the first embodiment of the present invention. Diamond in the case of the second embodiment of
It is a schematic partial sectional view of a tool explaining the manufacturing process of a coating tool. 1.11...Bite chip (tool board) 2.12...
- Hollow, 3... Pore, 4, 14... Diamond film, 5... Copper, 13... Diamond particle.
Claims (8)
板（１）の上に、気相合成法によってダイヤモンド膜（
４）を形成し、そして、前記基板（１）に溶融金属（５
）を前記ダイヤモンド膜（４）の被覆されていない表面
から含浸させることを特徴とするダイヤモンド・コーテ
ィング工具の製造方法。1. A diamond film (
4) and deposit molten metal (5) on the substrate (1).
) is impregnated from the uncoated surface of the diamond film (4).
金属、または、これらの複合材料の焼結体であることを
特徴とする請求項１記載の製造方法。2. The tool substrate (1) is made of ceramics, cermet,
2. The manufacturing method according to claim 1, wherein the manufacturing method is a sintered body of metal or a composite material thereof.
分とすることを特徴とする請求項１記載の製造方法。3. 2. The manufacturing method according to claim 1, wherein the molten metal contains copper, cobalt, or nickel as a main component.
する請求項１記載の製造方法。4. 2. A manufacturing method according to claim 1, wherein said impregnation with said molten metal is carried out under reduced pressure.
行なうことを特徴とする請求項１記載の製造方法。5. 2. A manufacturing method according to claim 1, wherein said impregnation is carried out by placing the substrate in a molten metal bath and applying hydrostatic pressure.
粒子（１３）をぶつけて該工具基板（１１）の表面に傷
を付けかつくぼみ内に該ダイヤモンド粒子（１３）を入
れ込ませ、これら傷およびダイヤモンド粒子を成長核と
して気相合成法によってダイヤモンド膜（１４）を前記
工具基板（１１）上に形成することを特徴とするダイヤ
モンド・コーティング工具の製造方法。6. Diamond particles (13) are struck against a tool substrate (11) having an uneven surface to scratch the surface of the tool substrate (11) and introduce the diamond particles (13) into the recesses. A method for manufacturing a diamond-coated tool, characterized in that a diamond film (14) is formed on the tool substrate (11) by a vapor phase synthesis method using as a growth nucleus.
〜１００μｍであることを特徴とする請求項６記載の製
造方法。7. The diamond particles (13) have a particle size of 0.1
7. The manufacturing method according to claim 6, wherein the thickness is 100 μm.
請求項６記載の製造方法。8. 7. The manufacturing method according to claim 6, wherein the scale of the unevenness of the substrate is 100 μm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24745990A JPH04129622A (en) | 1990-09-19 | 1990-09-19 | Manufacture of diamond-coated tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24745990A JPH04129622A (en) | 1990-09-19 | 1990-09-19 | Manufacture of diamond-coated tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04129622A true JPH04129622A (en) | 1992-04-30 |
Family
ID=17163764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24745990A Pending JPH04129622A (en) | 1990-09-19 | 1990-09-19 | Manufacture of diamond-coated tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04129622A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0518631A2 (en) * | 1991-06-10 | 1992-12-16 | De Beers Industrial Diamond Division (Proprietary) Limited | Tool components |
| JPH06183890A (en) * | 1992-12-15 | 1994-07-05 | Nippon Seiko Kk | Artificial diamond-coated material |
| WO1998030357A1 (en) * | 1997-01-13 | 1998-07-16 | Winter Cvd Technik Gmbh | Abrasive body |
| US6053669A (en) * | 1996-11-18 | 2000-04-25 | Sandvik Aktiebolag | Chip forming cutting insert with internal cooling |
| US6815052B2 (en) * | 2000-12-01 | 2004-11-09 | P1 Diamond, Inc. | Filled diamond foam material and method for forming same |
| CN102965637A (en) * | 2011-08-30 | 2013-03-13 | 三菱综合材料株式会社 | Carbon film coating element and manufacturing method |
-
1990
- 1990-09-19 JP JP24745990A patent/JPH04129622A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0518631A2 (en) * | 1991-06-10 | 1992-12-16 | De Beers Industrial Diamond Division (Proprietary) Limited | Tool components |
| EP0518631A3 (en) * | 1991-06-10 | 1995-05-17 | De Beers Ind Diamond | Tool components |
| JPH06183890A (en) * | 1992-12-15 | 1994-07-05 | Nippon Seiko Kk | Artificial diamond-coated material |
| US6053669A (en) * | 1996-11-18 | 2000-04-25 | Sandvik Aktiebolag | Chip forming cutting insert with internal cooling |
| WO1998030357A1 (en) * | 1997-01-13 | 1998-07-16 | Winter Cvd Technik Gmbh | Abrasive body |
| US6815052B2 (en) * | 2000-12-01 | 2004-11-09 | P1 Diamond, Inc. | Filled diamond foam material and method for forming same |
| US6863938B2 (en) | 2000-12-01 | 2005-03-08 | P1 Diamond, Inc. | Filled diamond foam material and method for forming same |
| US6902808B2 (en) | 2000-12-01 | 2005-06-07 | P1 Diamond, Inc. | Diamond coated article bonded to a body |
| CN102965637A (en) * | 2011-08-30 | 2013-03-13 | 三菱综合材料株式会社 | Carbon film coating element and manufacturing method |
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