JPH0411305A - Magnetic head and production thereof - Google Patents
Magnetic head and production thereofInfo
- Publication number
- JPH0411305A JPH0411305A JP11424290A JP11424290A JPH0411305A JP H0411305 A JPH0411305 A JP H0411305A JP 11424290 A JP11424290 A JP 11424290A JP 11424290 A JP11424290 A JP 11424290A JP H0411305 A JPH0411305 A JP H0411305A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- laminated
- substrate
- alloy
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 239000011521 glass Substances 0.000 claims abstract description 34
- 229910001004 magnetic alloy Inorganic materials 0.000 claims abstract description 27
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 25
- 239000000956 alloy Substances 0.000 claims abstract description 25
- 239000010410 layer Substances 0.000 claims abstract description 22
- 239000011229 interlayer Substances 0.000 claims abstract description 13
- 238000005304 joining Methods 0.000 claims abstract description 7
- 229910002796 Si–Al Inorganic materials 0.000 claims abstract 3
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 238000003475 lamination Methods 0.000 claims description 11
- 238000004804 winding Methods 0.000 claims description 11
- 238000005520 cutting process Methods 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 3
- 238000003466 welding Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 72
- 239000011162 core material Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000696 magnetic material Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
の１
本発明は、一般に二つのコア半体を所定ギャップ長にて
突合せて接合することにより構成される磁気ヘッド及び
その製造方法に関するものであり、特に、Ｆｅ−Ｓｉ−
Ａ２合金磁性膜を非磁性基板にて挟持した構造の二つの
コア半体を所定ギャップ長にて突合せて接合することに
より構成される磁気ヘッド及びその製造方法に関するも
のである。このような磁気ヘッドは、特に、高周波用で
且つ高いＳ／Ｎ比が要求される高密度記録用ヘッド、コ
ンピュータ用ヘッドなどに好適に使用される。DETAILED DESCRIPTION OF THE INVENTION 1. The present invention generally relates to a magnetic head constructed by abutting and joining two core halves with a predetermined gap length, and a method for manufacturing the same. −
The present invention relates to a magnetic head constructed by abutting and joining two core halves having a structure in which an A2 alloy magnetic film is sandwiched between nonmagnetic substrates with a predetermined gap length, and a method for manufacturing the same. Such magnetic heads are particularly suitable for use in high-density recording heads, computer heads, etc., which are used for high frequencies and require a high S/N ratio.
１迷」と１斐
磁気記録技術の分野における最近の記録密度の向上は著
しく、これに伴なって例えば電磁変換素子としての磁気
ヘッドに対する狭トラツク化及びコア材料の飽和磁化の
増大並びに高周波領域における透磁率の改善といった要
求が高まっている。Recent improvements in recording density in the field of magnetic recording technology have been remarkable, and along with this, for example, magnetic heads as electromagnetic transducer elements have become narrower tracks, the saturation magnetization of core materials has increased, and in the high frequency range There is an increasing demand for improved magnetic permeability.
近年、磁気記録分野における上記要求を満足せしめる磁
気ヘッドとして、例えばＦｅ−Ｓｉ−Ａｌ合金磁性膜を
用いた薄膜積層磁気ヘッドが注目を浴びている。該磁気
ヘッドの一例が第２区〜第４図に図示される。簡単にそ
の構造及び製造法の一例を説明する。In recent years, thin film laminated magnetic heads using, for example, Fe--Si--Al alloy magnetic films have been attracting attention as magnetic heads that satisfy the above requirements in the field of magnetic recording. An example of the magnetic head is illustrated in Sections 2 to 4. An example of its structure and manufacturing method will be briefly explained.
第３図を参照すると、結晶化ガラス又はセラミックスか
ら成る基板１１ａ上にＦｅ−Ｓｉ−Ａ２合金磁性膜１２
が膜厚１〜２０μｍにて成膜される。次いで、該合金磁
性膜１２上にＳｉＯ２から成る非磁性給縁膜、即ち、眉
間膜１３が膜厚０．０３〜０．３μｍにて形成される。Referring to FIG. 3, a Fe-Si-A2 alloy magnetic film 12 is placed on a substrate 11a made of crystallized glass or ceramics.
is formed to a film thickness of 1 to 20 μm. Next, a non-magnetic feeder film made of SiO2, ie, a glabellar film 13, is formed on the alloy magnetic film 12 to a thickness of 0.03 to 0.3 μm.
更に、合金磁性膜１２と層間膜１３が必要回数積層され
、積層磁性合金膜１４が形成される。斯る合金磁性ｇ１
１２と層間膜１３の膜厚及び積層回数は積層部の厚さが
トラック幅（Ｗ）（第３図）となるように適宜設定され
る。Further, the magnetic alloy film 12 and the interlayer film 13 are laminated a necessary number of times to form a laminated magnetic alloy film 14. Such alloy magnetic g1
The thicknesses and number of laminations of the interlayer film 12 and the interlayer film 13 are appropriately set so that the thickness of the laminated portion corresponds to the track width (W) (FIG. 3).
次いで、前記積層磁性合金膜１４の上にガラス膜１５が
形成され、その上に他の基板１１ｂが積層される。ガラ
ス膜１５としては種々の接合ガラスが使用されている。Next, a glass film 15 is formed on the laminated magnetic alloy film 14, and another substrate 11b is laminated thereon. Various bonded glasses are used as the glass film 15.
基板１１ｂは前記基板１１ａと同様の材料にて作製され
る。The substrate 11b is made of the same material as the substrate 11a.
このようにして作製された積層膜構造体１７にて、第２
図に図示されるように、一対のコア半体１８．１９が形
成され、少なくとも片方のコア半体、本例ではコア半体
１８に巻線溝２０が形成される。In the laminated film structure 17 produced in this way, the second
As shown in the figure, a pair of core halves 18, 19 are formed, with a winding groove 20 formed in at least one of the core halves, in this example core half 18.
両コア半体１８．１９の突合せ面の接合を強固なものと
するために、従来、第２図に図示されるように、巻線溝
２０に対向した、本例ではコア半体１９の両側面部に面
取部２２を形成し、又、両コア半体の該巻線溝２０とは
反対側にも凹所２３を形成した後、両コア半体１８．１
９の突合せ面は研摩加工後ギャップ部２１が形成される
。In order to strengthen the joint between the abutting surfaces of both core halves 18 and 19, conventionally, as shown in FIG. After forming a chamfer 22 on the surface and also forming a recess 23 on the side opposite to the winding groove 20 of both core halves, both core halves 18.1
A gap portion 21 is formed on the abutting surface 9 after polishing.
この後、両コア半体１８．１９を突合せ面にて突合せ、
該面取部及び凹所にモールドガラスを充填し両コア半体
を接合する。After this, the two core halves 18 and 19 are butted together at the butting surfaces,
The chamfered portion and recess are filled with molded glass, and both core halves are joined.
最後に、テープ摺動面を形成するべくＲ研摩加工及び他
の成形加工並びに巻線加工が行なわれ、磁気ヘッド１０
が得られる。Finally, R polishing, other molding, and winding are performed to form the tape sliding surface, and the magnetic head 10
is obtained.
が しよ と る
上記構成の磁気ヘッドは、極めて良好な磁気特性を有す
るものであるが、磁気ヘッドの製造時において、或は機
器に組み込んだ後において、積層磁性合金膜１４と非磁
性基板１１ｂとが十分に接合せず剥離してしまい所期の
磁気特性を得ることができないか、或は使用不可能とな
ることがあった。Although the magnetic head with the above configuration has extremely good magnetic properties, the laminated magnetic alloy film 14 and the nonmagnetic substrate 11b are There have been cases in which the desired magnetic properties cannot be obtained or the magnetic material cannot be used because the magnetic material and the magnetic material do not bond sufficiently and separate.
本発明者らは、この問題を解決するべく積層磁性合金膜
１４、ガラス膜１５及び基板１１ｂの積層部分を詳細に
観察したところ、ガラス膜１５と非磁性基板１１ｂとが
反応し、その結果、ガラス膜１５の接合材としての本来
の機能が大巾に減少していることを見出した。In order to solve this problem, the present inventors closely observed the laminated portion of the laminated magnetic alloy film 14, glass film 15, and substrate 11b, and found that the glass film 15 and the nonmagnetic substrate 11b reacted, and as a result, It has been found that the original function of the glass film 15 as a bonding material is greatly reduced.
本発明者らは、この点を解決するべく研究実験を継続し
て行なった結果、予め、非磁性基板１１ｂにＣｒなとの
金属層をスパッタにより成膜し、その後ガラス膜１５を
介して積層磁性合金膜１４に接合した場合には、非磁性
基板１１．ｂに設けた金属層によりガラス膜１５と非磁
性基板１１ｂとの直接の接触が回避され、それによって
、ガラス膜１５が非磁性基板１１ｂと反応することはな
く、その結果、ガラス膜１５の接合材としての本来の機
能を完全に発揮し得て、積層磁性合金膜１４と非磁性基
板１１ｂとの間に十分な接合力を得ることができること
を見出した。As a result of continuing research experiments to solve this problem, the present inventors formed a metal layer such as Cr on the non-magnetic substrate 11b by sputtering, and then laminated it with a glass film 15 interposed therebetween. When bonded to the magnetic alloy film 14, the non-magnetic substrate 11. The metal layer provided on b prevents direct contact between the glass film 15 and the non-magnetic substrate 11b, thereby preventing the glass film 15 from reacting with the non-magnetic substrate 11b, and as a result, the bonding of the glass film 15 is prevented. It has been found that the original function as a material can be fully exhibited and sufficient bonding force can be obtained between the laminated magnetic alloy film 14 and the non-magnetic substrate 11b.
本発明は、斯る新規な知見に基づくものである。The present invention is based on such novel findings.
従って、本発明の目的は、積層磁性合金膜を両非磁性基
板にて完全に接合して挟持することができ、それによっ
て、耐久性のある且つ磁気特性に優れた磁気ヘッドを提
供することであり、又、このような磁気ヘッドを、従来
に比し歩留り良く製造し得る磁気ヘッドの製造方法を提
供することである。Therefore, an object of the present invention is to provide a magnetic head that can completely bond and sandwich a laminated magnetic alloy film between both non-magnetic substrates, thereby providing durability and excellent magnetic properties. Another object of the present invention is to provide a method for manufacturing a magnetic head that can manufacture such a magnetic head at a higher yield than conventional methods.
を るための
上記目的は本発明に係る磁気ヘッド及びその製造方法に
て達成される。要約すれば本発明は、二つのコア半体を
形成し、該両コア半体の突合せ面を所定のギャップ長に
て接合して構成される磁気ヘッドにおいて、前記各コア
半体は、一方の基板と、該基板の上にＦｅ−Ｓｉ−ＡＩ
２合金磁性膜と層間膜とが交互に積層されて成る積層磁
性合金膜と、該積層磁性合金膜の上に成膜されたガラス
膜と、該ガラス膜の上に金属層を介して接合された他方
の基板とを有した積層膜構造体から成る磁気ヘッドであ
る。好ましくは、前記金属層は、Ｃｒ、Ｔｉ若しくはこ
れら各々の金属の合金；これら金属若しくは合金の酸化
物；又は、金属若しくは合金と、金属若しくは合金の酸
化物との混合物にて形成される。The above objects are achieved by a magnetic head and a method for manufacturing the same according to the present invention. In summary, the present invention provides a magnetic head constructed by forming two core halves and joining the abutting surfaces of the two core halves with a predetermined gap length, in which each of the core halves has one a substrate, and Fe-Si-AI on the substrate.
A laminated magnetic alloy film formed by alternately laminating two-alloy magnetic films and interlayer films, a glass film formed on the laminated magnetic alloy film, and a glass film bonded to the glass film via a metal layer. This magnetic head is composed of a laminated film structure having a second substrate and a second substrate. Preferably, the metal layer is formed of Cr, Ti, or an alloy of each of these metals; an oxide of these metals or alloys; or a mixture of a metal or alloy and an oxide of a metal or alloy.
又、斯る磁気ヘッドは、（ａ）非磁性基板を準備する工
程； （ｂ）前記非磁性基板の一つの面に金属層を形成
する工程； （Ｃ）前記非磁性基板の他の面に、Ｆｅ−
Ｓｉ−Ａ２合金磁性膜と層間膜とを交互に積層してなる
積層磁性合金膜が成膜された積層用基板を作製する工程
； （ｄ）前記積層用基板をチップ状に切断する工程；
（ｅ）前記チップ状に切断された積層用基板の両面に
ガラス膜を成膜する工程； （ｆ）前記工程（ｅ）にて
得られたチップ状積層用基板を個々に分離し、互いに積
層し溶着することによって積層ブロックを形成する工程
； （ｇ）前記積層ブロックを積層方向に沿った方向に
切断し、積層ヘッドピースを作製する工程； （ｈ）必
要に応じて前記積層ヘッドピースに横溝、巻き線溝入れ
加工などを施した後、二つの積層ヘッドピースを突き合
せ接合し、フロントＲ研削加工の後、輪切り切断し所望
形状のコアを作製する工程； （１）前記工程（ｈ）に
て作製されたコアに巻き線を施す工程；を有することを
特徴とする製造方法にて効率よく製造することができる
。Further, such a magnetic head includes the following steps: (a) preparing a non-magnetic substrate; (b) forming a metal layer on one surface of the non-magnetic substrate; (C) forming a metal layer on the other surface of the non-magnetic substrate. , Fe-
A step of producing a laminated substrate on which a laminated magnetic alloy film formed by alternately laminating a Si-A2 alloy magnetic film and an interlayer film is formed; (d) A step of cutting the laminated substrate into chips;
(e) Step of forming a glass film on both sides of the lamination substrate cut into chip shapes; (f) Separating the chip-shaped lamination substrates obtained in step (e) individually and laminating them together. a step of forming a laminated block by welding; (g) a step of cutting the laminated block in a direction along the lamination direction to produce a laminated head piece; (h) forming a lateral groove in the laminated head piece as necessary; , After performing winding grooving, etc., the two laminated head pieces are butt-joined, and after front R grinding, round cutting is performed to produce a core of the desired shape; (1) Step (h) It can be efficiently manufactured using a manufacturing method characterized by the step of winding the core produced in the above process.
大ＪＬ例
次に、本発明に係る磁気ヘッドについて更に詳しく説明
する。Large JL Example Next, the magnetic head according to the present invention will be explained in more detail.
本発明に係る磁気ヘッドは、第２図に図示されるような
従来と同様の構造とされ、二つのコア半体１８．１９を
突き合せ面２１にて所定のギャップ長にて接合して構成
される。ただ、本発明によれば、各コア半体１８．１９
は、第１図に図示されるように、一方の非磁性基板１１
ａと、該基板１．１ａの上にＦｅ−３ｔ−ＡＩ２合金磁
性膜１２と層間膜１３とが交互に積層されて成る積層磁
性合金膜１４と、該積層磁性合金膜１４の上に成膜され
たガラス膜１５と、該ガラス膜１５の上に金属層１６を
介して接合された他方の非磁性基板１１ｂとを有した積
層膜構造体１７にて構成される。The magnetic head according to the present invention has the same structure as the conventional one as shown in FIG. be done. However, according to the present invention, each core half 18.19
As shown in FIG. 1, one non-magnetic substrate 11
a, a laminated magnetic alloy film 14 formed by alternately laminating Fe-3t-AI2 alloy magnetic films 12 and interlayer films 13 on the substrate 1.1a, and a film formed on the laminated magnetic alloy film 14. A laminated film structure 17 includes a glass film 15 and the other non-magnetic substrate 11b bonded to the glass film 15 via a metal layer 16.
斯る本発明に係る磁気ヘッドのより詳しい構造は、次に
説明する、本発明の磁気ヘッドの製造方法を参照すれば
より良く理解されるであろう。A more detailed structure of the magnetic head according to the present invention will be better understood by referring to the method for manufacturing the magnetic head according to the present invention, which will be described below.
本発明に係る磁気ヘッドを製造するに当たり、先ず、第
５図及び第６図に図示するように、酸化マンガンと酸化
ニッケルを主成分とするセラミックス基板のような矩形
の非磁性基板１１を準備し、両面を研摩加工した後、該
基板１１の一方の面、本実施例では裏面に金属層１６を
形成する。In manufacturing the magnetic head according to the present invention, first, as shown in FIGS. 5 and 6, a rectangular nonmagnetic substrate 11 such as a ceramic substrate whose main components are manganese oxide and nickel oxide is prepared. After polishing both surfaces, a metal layer 16 is formed on one surface of the substrate 11, which is the back surface in this embodiment.
金属層１６は、好ましくはＣｒ、Ｔｉ若しくはこれら各
々の金属の合金、又はこれら金属若しくは合金の酸化物
をスパッタにより基板１１の裏面に成膜することにより
形成される。金属層１６の膜厚は、接合ガラスが非磁性
基板へ拡散するのを防止するに必要な最小厚みとエデイ
カレントを防止するための最大厚さから０．００５〜０
．１μｍとされ、通常０．０５ｕｍ程度とされる。The metal layer 16 is preferably formed by depositing Cr, Ti, an alloy of these metals, or an oxide of these metals or alloys on the back surface of the substrate 11 by sputtering. The thickness of the metal layer 16 is between 0.005 and 0.005 from the minimum thickness required to prevent the bonding glass from diffusing into the non-magnetic substrate and the maximum thickness required to prevent eddy current.
．． The thickness is 1 μm, and usually about 0.05 μm.
又、本発明者等の研究実験の結果によると、特に、Ｃｒ
若しくはＣｒ合金と、これらの酸化物との混合物がより
好ましく、ガラス膜１５と非磁性基板１１ｂとの反応を
阻止し、ガラス膜１５と非磁性基板１１ｂとの接合力を
増大せしめることが分かった。Furthermore, according to the results of research experiments conducted by the present inventors, in particular, Cr
Alternatively, it has been found that a mixture of a Cr alloy and these oxides is more preferable and can prevent the reaction between the glass film 15 and the non-magnetic substrate 11b and increase the bonding force between the glass film 15 and the non-magnetic substrate 11b. .
従って、金属層１６を成膜する場合には不活性ガス、例
えばＡｒガス雰囲気下にて行うことができるが、Ａｒガ
ス雰囲気内に酸素ガスを２％程度混入した微酸化雰囲気
下にてスパッタリングを行なうのが好ましい。Therefore, when forming the metal layer 16, it can be performed in an inert gas atmosphere, for example, Ar gas atmosphere, but sputtering can be performed in a slightly oxidizing atmosphere in which about 2% oxygen gas is mixed into the Ar gas atmosphere. It is preferable to do so.
一方、基板１１の他方の面には、第７図に図示されるよ
うに、Ｆｅ−Ｓｉ−ＡＩ２合金磁性膜１２が所定の膜厚
で成膜される。続いて、このＦｅ−Ｓｉ−Ａβ合金磁性
膜１２の上に層間膜１３としてＳｉＯ□膜が所定の膜厚
で形成される。限定されるものではないが、通常、合金
磁性膜１２は５μｍ、眉間膜１３は０．１μｍにて形成
される。On the other hand, on the other surface of the substrate 11, as shown in FIG. 7, a Fe-Si-AI2 alloy magnetic film 12 is formed to a predetermined thickness. Subsequently, a SiO□ film is formed as an interlayer film 13 on this Fe-Si-Aβ alloy magnetic film 12 to a predetermined thickness. Although not limited to this, the alloy magnetic film 12 is usually formed to have a thickness of 5 μm, and the glabellar film 13 to have a thickness of 0.1 μm.
次いで、前記層間膜工３上に合金磁性膜１２及び層間膜
１３の順に所定回数、例えば４回繰り返し、積層磁性合
金膜１４を形成する。本実施例では、該積層磁性合金膜
１４の全膜厚は２０ｔｉｍであった。Next, a laminated magnetic alloy film 14 is formed on the interlayer film 3 by repeating the alloy magnetic film 12 and the interlayer film 13 in this order a predetermined number of times, for example, four times. In this example, the total thickness of the laminated magnetic alloy film 14 was 20 tim.
片面に金属層１６が形成され、他方の面に積層磁性合金
膜１４が形成された積層用基板１１°が第８図に図示さ
れる。該積層用基板１１’は、第９図に図示するように
、チップ状に切断された後、第１０図に図示するように
、その両面にスパッタによりガラス膜１５が０．５μｍ
程度の所定の膜厚にて成膜される。FIG. 8 shows a lamination substrate 11° having a metal layer 16 formed on one side and a laminated magnetic alloy film 14 formed on the other side. The lamination substrate 11' is cut into chips as shown in FIG. 9, and then a glass film 15 of 0.5 μm is coated on both sides by sputtering as shown in FIG.
The film is formed to a predetermined film thickness of about 100 ml.
本発明にて、ガラス膜１５としては任意のものを使用し
得るが、Ｓｉ０！ −Ｎａｇ ０−Ａｘｚ０３系ガラス
が好適である。In the present invention, any material can be used as the glass film 15, but Si0! -Nag 0-Axz03 type glass is preferred.
両面にガラスｌ１１１１５が形成されたチップ状の積層
用基板１１°は、個々に分離された後、第１１図に図示
するように、互いに重ね合わせられ、積層ブロック形成
治具（図示せず）にて両側より押圧され、加熱される。After the chip-shaped lamination substrates 11° with glass l11115 formed on both sides are separated into individual pieces, they are stacked on top of each other as shown in FIG. 11, and placed in a lamination block forming jig (not shown). It is pressed from both sides and heated.
一方の端部には合金磁性膜１４が成膜されていない基板
１１を配置するのが好ましい。It is preferable to arrange the substrate 11 on which the alloy magnetic film 14 is not formed at one end.
これにより、各チップ状積層用基板１１゛はガラス膜１
５が溶融することにより接合され、バー材とされる積層
ブロック４０が形成される。As a result, each chip-like laminated substrate 11'' has a glass film 1
5 are melted and joined together to form a laminated block 40 which is a bar material.
次に、このようにして作製した積層ブロック４０は、積
層した厚さ方向に切断して、複数個の積層ヘッドピース
４２を作製する。該積層ヘッドピース４２は、次いで、
第１２図に図示するように、横溝４３の加工、又必要に
応じて巻き線溝２０のための巻き線溝入れ加工、更には
、第２図に図示されるような面取り２２、凹所２３など
の加工（第１２図には図示せず）を施した後、第１３図
に図示するように、二つの積層ヘッドピース４２．４２
を接合面２１にて接合ガラスなどのギャップ材を用いて
、突き合せて接合する。Next, the laminated block 40 produced in this way is cut in the direction of the laminated thickness to produce a plurality of laminated head pieces 42. The laminated headpiece 42 then
As shown in FIG. 12, processing of the lateral groove 43 and, if necessary, processing of winding grooves for the winding groove 20, as well as chamfering 22 and recess 23 as shown in FIG. After processing (not shown in FIG. 12), the two laminated head pieces 42, 42 are assembled as shown in FIG.
are butted and joined at the joining surface 21 using a gap material such as joining glass.
次に、第１４図に図示するように、接合された積層ヘッ
ドピース４２．４２のテープ摺動面となるフロント部を
Ｒ研削加工した後、該積層ヘッドピース４２．４２は、
第１５図に図示するように、各非磁性基板１１部より輪
切り切断され、第１図及び第２図に図示するような、積
層構造体１７とされる所望形状のコア１８．１９が作製
される。Next, as shown in FIG. 14, the front portion of the joined laminated head piece 42.42, which becomes the tape sliding surface, is subjected to R-grinding, and then the laminated head piece 42.42 is
As shown in FIG. 15, each non-magnetic substrate 11 is cut into rings to produce cores 18 and 19 of a desired shape to form the laminated structure 17 as shown in FIGS. 1 and 2. Ru.
その後、コアの巻き線溝２ｏを利用して巻き線が施され
、磁気ヘッドが作製される。Thereafter, winding is performed using the winding groove 2o of the core to produce a magnetic head.
上記方法にて５０個の磁気ヘッドを作製したが、基板１
１ｂが積層磁性合金膜１４に溶着しないことに起因した
不良品は１個発生したに過ぎず、歩留りは９８％であっ
た。又、長時間の使用により、基板１１ｂが積層磁性合
金膜１４がら剥離するという事故は起こらなかった。つ
まり、本発明に係る磁気ヘッドは、製造時における基板
１１ｂの接合が極めて安定して行なわれ、又、十分な接
合力を得ることができた。Fifty magnetic heads were manufactured using the above method.
There was only one defective product due to the fact that 1b was not welded to the laminated magnetic alloy film 14, and the yield was 98%. Moreover, no accident occurred in which the substrate 11b peeled off from the laminated magnetic alloy film 14 due to long-term use. In other words, in the magnetic head according to the present invention, the substrate 11b was bonded extremely stably during manufacture, and sufficient bonding force could be obtained.
１艶立豆１
以上の如くに構成される本発明に係る磁気ヘッドは、積
層磁性合金膜を両非磁性基板にて完全に接合して挟持す
ることができ、それによって、耐久性のある且つ優れた
磁気特性を得ることができる。又、本発明の製造方法に
よれば、このような磁気ヘッドを、従来に比し歩留り良
く製造し得る。1 Polished beans 1 The magnetic head according to the present invention constructed as described above can completely bond and sandwich the laminated magnetic alloy film between both non-magnetic substrates, thereby providing a durable and magnetic head. Excellent magnetic properties can be obtained. Further, according to the manufacturing method of the present invention, such a magnetic head can be manufactured with a higher yield than conventional methods.
第４図は、第２図の磁気ヘッドのギャップ部を示す平面
図である。4 is a plan view showing the gap portion of the magnetic head of FIG. 2. FIG.
第５図〜第１５図は、本発明の製造方法を説明する図で
ある。5 to 15 are diagrams for explaining the manufacturing method of the present invention.
：磁気ヘッド （ｌｌａ、１ｌｂ） 二積層磁性合金膜 ニガラス膜 ：金属層 １９：コア半体 ギャップ部 １８． ２１ ： コ基板:Magnetic head (lla, 1lb) Double-layer magnetic alloy film Nigarasu membrane : Metal layer 19: Core half Gap part 18. 21: Co-board
第１図は、本発明に係る磁気ヘッドの層構成を示す部分
平面図である。
第２図は、本発明を具現化し得る薄膜積層磁気ヘッドの
斜視図である。
第３図は、従来の磁気ヘッドの層構成を示す部分平面図
である。
第１図
第２図
第１１図
第１２図
手続ネ甫正書（自発）
平成 ２年ｌＯ月１６日FIG. 1 is a partial plan view showing the layer structure of a magnetic head according to the present invention. FIG. 2 is a perspective view of a thin film laminated magnetic head that can embody the present invention. FIG. 3 is a partial plan view showing the layer structure of a conventional magnetic head. Figure 1 Figure 2 Figure 11 Figure 12 Procedure Nefusho (self-proposal) 16th October 1990
Claims (1)
を所定のギャップ長にて接合して構成される磁気ヘッド
において、前記各コア半体は、一方の基板と、該基板の
上にＦｅ−Ｓｉ−Ａｌ合金磁性膜と層間膜とが交互に積
層されて成る積層磁性合金膜と、該積層磁性合金膜の上
に成膜されたガラス膜と、該ガラス膜の上に金属層を介
して接合された他方の基板とを有した積層膜構造体から
成る磁気ヘッド。 ２）金属層は、Ｃｒ、Ｔｉ若しくはこれら各々の金属の
合金；これら金属若しくは合金の酸化物；又は、金属若
しくは合金と、金属若しくは合金の酸化物との混合物に
て形成される請求項１記載の磁気ヘッド。 ３）（ａ）非磁性基板を準備する工程； （ｂ）前記非磁性基板の一つの面に金属層を形成する工
程； （ｃ）前記非磁性基板の他の面に、Ｆｅ−Ｓｉ−Ａｌ合
金磁性膜と層間膜とを交互に積層してなる積層磁性合金
膜が成膜された積層用基板を作製する工程； （ｄ）前記積層用基板をチップ状に切断する工程（ｅ）
前記チップ状に切断された積層用基板の両面にガラス膜
を成膜する工程； （ｆ）前記工程（ｅ）にて得られたチップ状積層用基板
を個々に分離し、互いに積層し溶着することによって積
層ブロックを形成する工程； （ｇ）前記積層ブロックを積層方向に沿った方向に切断
し、積層ヘッドピースを作製する工程；（ｈ）必要に応
じて前記積層ヘッドピースに横溝、巻き線溝入れ加工な
どを施した後、二つの積層ヘッドピースを突き合せ接合
し、フロントＲ研削加工の後、輪切り切断し所望形状の
コアを作製する工程； （１）前記工程（ｈ）にて作製されたコアに巻き線を施
す工程； を有することを特徴とする磁気ヘッドの製造方法。[Claims] 1) In a magnetic head configured by forming two core halves and joining the abutting surfaces of the two core halves with a predetermined gap length, each of the core halves has one a laminated magnetic alloy film formed by alternately laminating Fe-Si-Al alloy magnetic films and interlayer films on the substrate; a glass film formed on the laminated magnetic alloy film; A magnetic head comprising a laminated film structure having the glass film and another substrate bonded via a metal layer. 2) The metal layer is formed of Cr, Ti, or an alloy of each of these metals; an oxide of these metals or alloys; or a mixture of a metal or alloy and an oxide of a metal or alloy. magnetic head. 3) (a) Step of preparing a non-magnetic substrate; (b) Step of forming a metal layer on one surface of the non-magnetic substrate; (c) Step of forming a metal layer on the other surface of the non-magnetic substrate; Step of producing a laminated substrate on which a laminated magnetic alloy film formed by alternately laminating alloy magnetic films and interlayer films; (d) Cutting the laminated substrate into chips; (e)
Step of forming a glass film on both sides of the lamination substrate cut into chips; (f) Separating the chip-shaped lamination substrates obtained in step (e) individually, stacking and welding them together; (g) Cutting the laminated block in the direction along the lamination direction to produce a laminated head piece; (h) Cutting the laminated head piece in the laminated head piece with horizontal grooves and windings as necessary; After performing grooving, etc., the two laminated head pieces are butt-joined, and after front R grinding, round cutting is performed to produce a core of the desired shape; (1) Produced in step (h) above. A method of manufacturing a magnetic head, comprising the steps of: winding the core.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2114242A JP2542946B2 (en) | 1990-04-27 | 1990-04-27 | Magnetic head and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2114242A JP2542946B2 (en) | 1990-04-27 | 1990-04-27 | Magnetic head and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0411305A true JPH0411305A (en) | 1992-01-16 |
| JP2542946B2 JP2542946B2 (en) | 1996-10-09 |
Family
ID=14632838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2114242A Expired - Lifetime JP2542946B2 (en) | 1990-04-27 | 1990-04-27 | Magnetic head and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2542946B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60187909A (en) * | 1984-03-07 | 1985-09-25 | Matsushita Electric Ind Co Ltd | Magnetic head |
| JPS63249913A (en) * | 1987-04-03 | 1988-10-17 | Matsushita Electric Ind Co Ltd | Magnetic head |
| JPS6437705A (en) * | 1987-07-31 | 1989-02-08 | Nippon Mining Co | Magnetic head |
-
1990
- 1990-04-27 JP JP2114242A patent/JP2542946B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60187909A (en) * | 1984-03-07 | 1985-09-25 | Matsushita Electric Ind Co Ltd | Magnetic head |
| JPS63249913A (en) * | 1987-04-03 | 1988-10-17 | Matsushita Electric Ind Co Ltd | Magnetic head |
| JPS6437705A (en) * | 1987-07-31 | 1989-02-08 | Nippon Mining Co | Magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2542946B2 (en) | 1996-10-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH05182137A (en) | Production of floating type magnetic head | |
| US5001590A (en) | Magnetic head having core halves with a barrier layer therebetween | |
| JPS5870418A (en) | Manufacture of magnetic head | |
| JP2542946B2 (en) | Magnetic head and manufacturing method thereof | |
| JP3524421B2 (en) | Magnetic head | |
| JPS60231903A (en) | Composite type magnetic head and its production | |
| JPH02137104A (en) | Magnetic head and manufacture thereof | |
| US5584116A (en) | Method for fabricating a magnetic head | |
| JPS59117729A (en) | Production of magnetic head core | |
| JPH0156445B2 (en) | ||
| JPS62183012A (en) | Magnetic head and its manufacture | |
| JPS6374103A (en) | Composite type magnetic head and its production | |
| JPH0354704A (en) | Magnetic head and its manufacture | |
| JPS59203210A (en) | Magnetic core and its production | |
| JPS63288407A (en) | Production of magnetic head | |
| JPH05234029A (en) | Magnetic head and its production | |
| JPS63214906A (en) | Production of magnetic head | |
| JP2002304707A (en) | Magnetic head and its manufacturing method and magnetic recording/reproducing device using the same | |
| JPH09147315A (en) | Manufacture of magnetic head | |
| JPH0721512A (en) | Production of magnetic head | |
| JPS62145515A (en) | Magnetic head | |
| JPS61204909A (en) | Composite magnetic material | |
| JPS6334708A (en) | Magnetic head and its production | |
| JPH0689407A (en) | Magnetic head and its production | |
| JPH06180816A (en) | Production of magnetic head |