JPH0339466A - Vacuum deposition device having magnetic shielding function - Google Patents
Vacuum deposition device having magnetic shielding functionInfo
- Publication number
- JPH0339466A JPH0339466A JP17292989A JP17292989A JPH0339466A JP H0339466 A JPH0339466 A JP H0339466A JP 17292989 A JP17292989 A JP 17292989A JP 17292989 A JP17292989 A JP 17292989A JP H0339466 A JPH0339466 A JP H0339466A
- Authority
- JP
- Japan
- Prior art keywords
- shroud
- source
- electron beam
- vapor
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract description 3
- 239000002887 superconductor Substances 0.000 claims abstract description 19
- 238000010894 electron beam technology Methods 0.000 claims abstract description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 238000001704 evaporation Methods 0.000 claims description 15
- 230000008020 evaporation Effects 0.000 claims description 14
- 238000007738 vacuum evaporation Methods 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 abstract description 9
- 239000010409 thin film Substances 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 230000004907 flux Effects 0.000 abstract description 6
- 238000000151 deposition Methods 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract description 2
- 230000008016 vaporization Effects 0.000 abstract 2
- 238000009834 vaporization Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、Ｔ＃ｌＩＩ膜の形成に用いる真空蒸着装置に
係わり、特に軟磁性薄膜の形成に適した超高真空蒸着装
置に関するものである。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a vacuum evaporation apparatus used for forming a T#lII film, and particularly to an ultra-high vacuum evaporation apparatus suitable for forming a soft magnetic thin film. .
〈従来の技術〉
近年真空蒸着法の主流となっている電子ビーム加熱法は
、蒸発源への不純物の混入が少なく高純度の薄膜が得ら
れ、高融点物質の蒸着も可能であるが、電子ビームを偏
向するために磁場を用いるので漏洩磁場を生じる欠点が
ある。特に、軟磁性薄膜の蒸着においては磁場の影響が
大きく、僅かな漏洩磁場でも薄膜に異方性が誘起される
ため、薄膜の磁気特性に悪影響がある。<Conventional technology> Electron beam heating, which has become the mainstream vacuum evaporation method in recent years, allows for the production of highly pure thin films with less contamination of impurities into the evaporation source, and is also capable of evaporating high-melting-point substances. Since a magnetic field is used to deflect the beam, it has the disadvantage of producing leakage magnetic fields. In particular, in the deposition of soft magnetic thin films, the influence of the magnetic field is large, and even a small leakage magnetic field induces anisotropy in the thin film, which has an adverse effect on the magnetic properties of the thin film.
この誘導異方性による悪影響を除去するために、形成さ
れた薄膜に磁場中で熱処理を施しているが、薄膜の種類
によっては、かかる熱処理によって組成の変化や拡散に
よる構造の変化を起こすことがある。In order to remove the adverse effects of this induced anisotropy, the formed thin film is heat treated in a magnetic field, but depending on the type of thin film, such heat treatment may cause changes in composition or structure due to diffusion. be.
一方、電子ビーム加熱法による蒸発源の漏洩磁場をシー
ルドするために、従来のシールド技術、即ち磁性体で磁
場の発生源を覆うことも考えられるが、蒸着物質の蒸気
の通路が確保できないため不可能である。On the other hand, in order to shield the leakage magnetic field from the evaporation source caused by the electron beam heating method, conventional shielding techniques, that is, covering the source of the magnetic field with a magnetic material, can be considered, but this is not practical because it does not ensure a passage for the vapor of the evaporation material. It is possible.
〈発明が解決しようとするｉ！＄！題〉本発明の目的は
、偏向された電子ビームを加熱源とした真空蒸着装置に
おいて、蒸発源からの漏洩磁場の大きさを軽減した磁気
シール１１ｍ能を有する真空蒸着装置を提（Ｊｊするこ
とである。<The invention tries to solve i! $! The object of the present invention is to provide a vacuum evaporation apparatus that uses a deflected electron beam as a heating source and has a magnetic sealing capability of 11 m that reduces the magnitude of the leakage magnetic field from the evaporation source. It is.
く課題を解決するための手段〉
本発明は、偏向された電子ビームを加熱源とし、蒸発源
の周囲に液体窒素により冷却されたシュラウドを有する
真空蒸着装置において、蒸着物質の蒸気の通路となる該
シュラウドの開口部の周囲に環状の超電導体を配置した
ことを特徴とする磁気シールドｍ能を有する真空蒸着装
置である。Means for Solving the Problems> The present invention provides a vacuum evaporation apparatus that uses a deflected electron beam as a heating source and has a shroud around the evaporation source cooled by liquid nitrogen, which serves as a passage for the vapor of the evaporation material. The present invention is a vacuum evaporation apparatus having magnetic shielding capability, characterized in that an annular superconductor is arranged around the opening of the shroud.
〈作 川〉
本発明の真空蒸着装置は、液体窒素によって冷却するシ
ュラウド（５ｈｒｏｕｄ ）の蒸気の通路となる開口部
の周囲に環状の超電導体を配置したので、この超電導体
の環を通る漏洩磁束は、この磁束により環に誘起される
永久電流で相殺される。従って、蒸気の通路であるシュ
ラウドの開口部を通って基板へ到達する漏洩磁場を有効
にシールドすることができる。またシュラウドは一般に
液体窒素で冷却されているので超電導体として、Ｙ Ｒ
ａｔＣｕｓ Ｏ，、（Ｂｉ、 Ｐｂ）ｔ Ｓｒｔ Ｃａ
ｔ Ｃｕｓ Ｏｗｎ Ｔｅｘ ＢａｇＣａｇ Ｃｕ３
０．などの臨界温度が液体窒素温度未満のものを用いる
ことができ、この場合は特に超電導体のための冷却は必
要としない。<Saku Kawa> In the vacuum evaporation apparatus of the present invention, a ring-shaped superconductor is arranged around the opening that serves as a passage for steam in a shroud (5 hours) cooled by liquid nitrogen, so that leakage magnetic flux passing through the ring of this superconductor is reduced. is canceled by the persistent current induced in the ring by this magnetic flux. Therefore, it is possible to effectively shield leakage magnetic fields that reach the substrate through the opening of the shroud, which is a vapor passage. In addition, since the shroud is generally cooled with liquid nitrogen, YR
atCus O,, (Bi, Pb)t Srt Ca
t Cus Own Tex BagCag Cu3
0. A superconductor having a critical temperature below the liquid nitrogen temperature can be used, and in this case, no cooling is particularly required for the superconductor.
本発明の真空蒸着装置の構成の一例を第１図に示す、真
空槽９内に電子ビーム加熱式蒸発源ｌ、液体窒素で冷却
されたシュラウド４、環状超電導体５、蒸着を行う基板
６、基板ホルダ７を配置する。電子ビーム加熱式蒸発源
１は蒸着物質３を加熱するための電子ビーム２を発生す
るｅａｔｌＩを有し、電子線源１ｃからの電子ビーム２
を蒸着物質３の任意の位置へ偏向ヨークＩｂにより偏向
するために磁場を用いるため基板６近傍に漏洩磁場を生
じるのである。一方、シュラウド４は超高真空を維持す
るために液体窒素で冷却されており、基板６に面する部
分に蒸着物質３からの蒸気が基Ｆｉ６に到達するための
開口部８を有している。そこで開口部８の周囲に環状の
超電導体５を超電導体５がシュラウド４と接触して冷却
されるように置くことによって蒸発源ｌの漏洩磁場のう
ち基［６へ到達する分を有効にシールドすることができ
る。An example of the configuration of the vacuum evaporation apparatus of the present invention is shown in FIG. 1, which includes an electron beam heated evaporation source l in a vacuum chamber 9, a shroud 4 cooled with liquid nitrogen, an annular superconductor 5, a substrate 6 on which evaporation is performed, Place the substrate holder 7. The electron beam heating type evaporation source 1 has an eatlI that generates an electron beam 2 for heating the vapor deposition material 3, and includes an electron beam 2 from an electron beam source 1c.
Since a magnetic field is used to deflect the evaporated material 3 to an arbitrary position by the deflection yoke Ib, a leakage magnetic field is generated in the vicinity of the substrate 6. On the other hand, the shroud 4 is cooled with liquid nitrogen to maintain an ultra-high vacuum, and has an opening 8 in the portion facing the substrate 6 for vapor from the vapor deposition material 3 to reach the base Fi6. . Therefore, by placing an annular superconductor 5 around the opening 8 so that the superconductor 5 contacts the shroud 4 and is cooled, the leakage magnetic field from the evaporation source 1 that reaches the base 6 can be effectively shielded. can do.
環状の超電導体５としてはＹ Ｂａ＠ Ｃｕ２０□Ｉｌ
ｌ。The annular superconductor 5 is Y Ba@Cu20□Il
l.
Ｓｒｓ Ｃａｔ Ｃｕｘ Ｏｗｎ Ｔｉｔ Ｂａｔ
Ｃａｔ Ｃｕ３０ｘなどの臨界温度が液体窒素温度未満
のものをシュラウドに接するように配置することによっ
て超電導体のための特別な冷却の手段を必要とすること
なく容易に磁気遮蔽効果を得ることができる。Srs Cat Cux Own Tit Bat
By arranging a material such as Cat Cu30x whose critical temperature is lower than the liquid nitrogen temperature in contact with the shroud, a magnetic shielding effect can be easily obtained without requiring special cooling means for the superconductor.
第１図では環状の超電導体５をシュラウド４の基Ｆｉ６
ｆｌ！ｌの表面に置いたが、環状の超電導体５はシュラ
ウド４の蒸発源ｌ側やシュラウド４内部に置いてもよい
。In FIG. 1, the annular superconductor 5 is the base Fi6 of the shroud 4.
Fl! Although the annular superconductor 5 is placed on the surface of the shroud 4, the annular superconductor 5 may be placed on the evaporation source side of the shroud 4 or inside the shroud 4.
本発明ではシュラウド４の冷却を行う以前に開口部８を
通っていた漏洩磁場をシールドすることはできないから
シュラウド４の冷却前に蒸発源ｌを基板６から離してお
くための移動設備を設けたり、シュラウド４の冷却が完
了するまで蒸発１ｌ１１の磁場を遮蔽しておくための移
動式のシールドを設けてもよい。In the present invention, since it is not possible to shield the leakage magnetic field that passed through the opening 8 before cooling the shroud 4, moving equipment is provided to keep the evaporation source l away from the substrate 6 before cooling the shroud 4. , a movable shield may be provided to shield the magnetic field of the evaporator 1l11 until the cooling of the shroud 4 is completed.
〈実施例〉
第１図のように真空槽９．蒸発源！、シュラウド４．基
板ホルダ７からなる真空蒸着装置に（ＹＢａｇ Ｃｕｓ
０１１ ）からなる環状の超電導体５を配置したとき
基板６の表面に°おける漏洩磁場は０．８Ｇであった。<Example> As shown in FIG. 1, a vacuum chamber 9. Evaporation source! , Shroud 4. A vacuum evaporation device consisting of a substrate holder 7 (YBag Cus
When the annular superconductor 5 consisting of 011) was placed, the leakage magnetic field at the surface of the substrate 6 was 0.8G.
環状の超電導体５の無い場合には漏洩磁場は５Ｇであり
、本発明の磁気遮蔽効果が確認された。In the absence of the annular superconductor 5, the leakage magnetic field was 5G, confirming the magnetic shielding effect of the present invention.
〈発明の効果〉
本発明の真空蒸着装置により、実質的に漏洩磁気の影響
がない真空蒸着が可能になった。<Effects of the Invention> The vacuum evaporation apparatus of the present invention enables vacuum evaporation that is substantially free from the influence of magnetic leakage.
第１図は本発明の真空蒸着装置の断面図である。 １ａ・・・水冷銅ハース、 ｌｃ・・・電子線源、 ３・・・蒸着物質、 ５・・・環状の超電導体、 ７・・・基板ホルダ、 ９・・・真空槽、 １１・・・液体窒素供給口。 ｔｂ・・・偏向ヨーク、 ２・・・電子ビーム、 ４・・・シュラウド、 ６・・・基 板、 ８・・・開口部、 ｌＯ・・・排気口、 特許出廓人 川崎製鉄株式会社 FIG. 1 is a sectional view of the vacuum evaporation apparatus of the present invention. 1a...water-cooled copper hearth, lc...electron beam source, 3... Vapor deposition substance, 5... Annular superconductor, 7... Board holder, 9...vacuum chamber, 11...Liquid nitrogen supply port. tb...deflection yoke, 2...electron beam, 4...Shroud, 6... base plate, 8... opening, lO...exhaust port, patent distributor Kawasaki Steel Co., Ltd.
Claims (1)
液体窒素により冷却されたシュラウドを有する真空蒸着
装置において、蒸着物質の蒸気の通路となる該シュラウ
ドの開口部の周囲に環状の超電導体を配置したことを特
徴とする磁気シールド機能を有する真空蒸着装置。In a vacuum evaporation apparatus that uses a deflected electron beam as a heating source and has a shroud cooled by liquid nitrogen around the evaporation source, an annular superconductor is placed around an opening in the shroud that serves as a passage for the vapor of the vapor to be deposited. A vacuum evaporation device having a magnetic shielding function, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17292989A JPH0339466A (en) | 1989-07-06 | 1989-07-06 | Vacuum deposition device having magnetic shielding function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17292989A JPH0339466A (en) | 1989-07-06 | 1989-07-06 | Vacuum deposition device having magnetic shielding function |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0339466A true JPH0339466A (en) | 1991-02-20 |
Family
ID=15950971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17292989A Pending JPH0339466A (en) | 1989-07-06 | 1989-07-06 | Vacuum deposition device having magnetic shielding function |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0339466A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6774627B2 (en) * | 2000-10-18 | 2004-08-10 | Kawasaki Steel Corporation | Leak magnetism detection sensor for magnetic flaw detection system |
| JP2007301100A (en) * | 2006-05-10 | 2007-11-22 | Chikuma:Kk | Photograph frame |
-
1989
- 1989-07-06 JP JP17292989A patent/JPH0339466A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6774627B2 (en) * | 2000-10-18 | 2004-08-10 | Kawasaki Steel Corporation | Leak magnetism detection sensor for magnetic flaw detection system |
| JP2007301100A (en) * | 2006-05-10 | 2007-11-22 | Chikuma:Kk | Photograph frame |
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