JPH03283421A - Projection optical device and projection exposure device using the same - Google Patents
Projection optical device and projection exposure device using the sameInfo
- Publication number
- JPH03283421A JPH03283421A JP2080854A JP8085490A JPH03283421A JP H03283421 A JPH03283421 A JP H03283421A JP 2080854 A JP2080854 A JP 2080854A JP 8085490 A JP8085490 A JP 8085490A JP H03283421 A JPH03283421 A JP H03283421A
- Authority
- JP
- Japan
- Prior art keywords
- projection
- projected
- optical device
- projection optical
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims description 22
- 230000004075 alteration Effects 0.000 claims description 25
- 238000000034 method Methods 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 230000004304 visual acuity Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000037303 wrinkles Effects 0.000 description 4
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（発明の目的）
〔産業上の利用分野〕
本発明は、被投影物体の投影面が一方向に長いものであ
る投影光学装置及びこのような投影光学装置を利用した
投影露光装置に関する。Detailed Description of the Invention (Objective of the Invention) [Industrial Application Field] The present invention relates to a projection optical device in which the projection surface of an object to be projected is long in one direction, and a projection system using such a projection optical device. Related to exposure equipment.
カメラ、映写機、計算機等に用いられるフレキシブルプ
リンティラドサーキット（以下ＦＰＣという）、プリン
ティラドサーキットボード（以下ＰＣＢという）、液晶
表示板（以下ＬＣＤという）等の需要が近年高まってい
る。そして、それらＦＰＣ，ＰＣＢ、ＬＣＤの製造には
投影露光装置が必要であり、その製造工程の自動化、高
速化のための合理化と共に大面積露光やレチクルパター
ンの微細化が要求されてきているが、その成果は投影レ
ンズの性能に左右される点が大である。Demand for flexible printed circuits (hereinafter referred to as FPCs), printed circuit boards (hereinafter referred to as PCBs), liquid crystal display boards (hereinafter referred to as LCDs), etc. used in cameras, projectors, computers, etc. has been increasing in recent years. Projection exposure equipment is required to manufacture these FPCs, PCBs, and LCDs, and there is a demand for automation of the manufacturing process and rationalization for speeding up, as well as large-area exposure and miniaturization of reticle patterns. The results largely depend on the performance of the projection lens.
高級なレンズにおいては、設計段階で、また異質なガラ
スの組合せ手段や加工手段等によってレンズの収差を最
小限に抑えてその性能を高めているが、特にこの種の投
影光学装置では像面の湾曲の収差を小さくすることが重
要である。レチクルパターンを投影する際に、露光面の
中心部にレンズの焦点を合わせると周辺部がぼけたり、
周辺部に焦点を合わせると中央部がぼける。いわゆる像
面湾曲の収差があるが、それについては、複数のレンズ
に互いに像面湾曲の収差を補正しあうように組み合わせ
て像面湾曲の収差を小さくすることは可能である。しか
し、この手法も完全に像面湾曲の収差をなくすことは困
難であり、しかもレンズを多数組み合わせるために高価
なものなってしまうという問題がある。In high-grade lenses, lens aberrations are minimized and their performance is improved by combining different types of glasses and processing methods at the design stage, but especially in this type of projection optical device, the image plane It is important to reduce the aberration of curvature. When projecting a reticle pattern, if you focus the lens on the center of the exposure surface, the periphery may become blurred.
When you focus on the periphery, the center becomes blurred. There is so-called curvature of field aberration, but it is possible to reduce the aberration of curvature of field by combining a plurality of lenses so that they mutually correct the aberration of curvature of field. However, this method also has the problem that it is difficult to completely eliminate the aberration of curvature of field, and that it becomes expensive because a large number of lenses are combined.
また、像面湾曲の収差は、露光するレチクルパターンの
微細化の障害となることは勿論だが、露光面か大面積化
した場合より深刻な問題となる。Further, the aberration of field curvature is of course an obstacle to miniaturization of the reticle pattern to be exposed, but it becomes a more serious problem when the exposure surface becomes large.
このような問題を解決するため、例えば特開平１−２５
０９６０号公報に開示されているように、被投影物体の
投影面を、投影レンズの像面湾曲の収差に起因する湾曲
した像面と一致するよう保持することが提案されている
。In order to solve such problems, for example, Japanese Patent Laid-Open No. 1-25
As disclosed in Japanese Patent No. 0960, it has been proposed to maintain the projection plane of the object to be projected so as to coincide with the curved image plane caused by the aberration of field curvature of the projection lens.
〔発明が解決しようとする技術的課題〕上記の解決方法
は原理的には優れているが、投影面のすべての方向につ
いて、像面湾曲の収差に起因する湾曲した像面と一致す
るよう保持することは、実際にはかなり難しい。[Technical problem to be solved by the invention] The above solution is excellent in principle, but it is difficult to maintain the projection plane in all directions so that it coincides with the curved image plane caused by the aberration of field curvature. It's actually quite difficult to do.
例えば、ＦＰＣの製作の際に行われるフィルムの投影露
光では、フィルムを二次方向の凹曲面を有する保持台で
真空吸着により保持した場合、曲面の湾曲度の程度やフ
ィルムの厚さ、材質等によって差はあるが、どうしても
フィルムに皺が発生することがあり、同公報の技術か実
現不可能な場合もある。For example, in film projection exposure performed during FPC production, when the film is held by vacuum suction on a holding table with a concave curved surface in the secondary direction, the degree of curvature of the curved surface, the thickness of the film, the material, etc. Although there are differences depending on the method, wrinkles may inevitably occur in the film, and the technology disclosed in the publication may not be practical in some cases.
また、同公報のように、被投影物体を凹曲面を有する保
持台で保持した場合、当該凹曲面を像面湾曲の収差に起
因する湾曲した像面と一致するよう加工して成形するこ
とが必要であるが、このような加工は、非常−に難しく
コストかかかる。かつ加工精度上限界があり、その限界
は、例えば投影される像の微細化の限界になってしまう
。Furthermore, as in the same publication, when the object to be projected is held on a holding table having a concave curved surface, it is possible to process and shape the concave curved surface so that it matches the curved image surface caused by the aberration of field curvature. Although necessary, such processing is extremely difficult and costly. Moreover, there is a limit to the processing accuracy, and this limit becomes, for example, the limit to the miniaturization of the projected image.
一方、ＦＰＣ等の製作の際の投影露光では、方向に長い
長方形の投影面に少ない収差で投影する必要が生じてき
ている。このような場合には、上記の像面湾曲の収差に
よる影響は、長方形の露光面の長さ方向でのみ問題とな
り、幅方向ではその影響は殆ど無視できる。On the other hand, in projection exposure during the production of FPCs and the like, it has become necessary to project onto a rectangular projection surface that is long in the direction with little aberration. In such a case, the influence of the aberration of field curvature becomes a problem only in the length direction of the rectangular exposure surface, and the influence in the width direction can be almost ignored.
本発明はかかる観点からなされたものであり、ＦＰＣ用
のフィルムのようにフレキシブルな被投影物体であって
も皺が発生することがなく、像面湾曲の収差による影響
を実用上無視できる程度に小さくされた解像度の高い像
の投影が可能な投影光学装置及びこの投影光学装置を用
いた投影露光装置の提供を目的とする。The present invention has been made from this point of view, and wrinkles do not occur even on a flexible projection object such as a film for FPC, and the influence of aberrations due to curvature of field can be practically ignored. An object of the present invention is to provide a projection optical device capable of projecting a small, high-resolution image and a projection exposure device using this projection optical device.
（発明の構成）
〔課題を解決するための手段〕
上記課題を解決するため、本発明の投影光学装置は、被
投影物体の投影面が、第一の方向においては投影レンズ
の像面湾曲の収差に一致した曲線であり第一の方向と直
角な第二の方向においては直線であるような曲面になる
ように、被投影物体を保持する保持台を具備したことを
特徴とする。(Structure of the Invention) [Means for Solving the Problems] In order to solve the above problems, the projection optical device of the present invention provides a projection optical device in which the projection plane of the object to be projected is adjusted to the field curvature of the projection lens in the first direction. The present invention is characterized in that it includes a holder that holds the object to be projected so that it forms a curved surface that matches the aberration and is a straight line in a second direction perpendicular to the first direction.
また、本発明の投影露光装置は、上記投影光学装置を用
い、投影レンズによりレチクルのパターンを投影して露
光することを特徴とする。Further, the projection exposure apparatus of the present invention is characterized in that the projection optical apparatus described above is used to project and expose a pattern on a reticle using a projection lens.
上記構成にかかる本発明の投影光学装置によれば、第一
の方向においては像面湾曲の収差が補正されて結像精度
の高い像の投影がされる。第一の方向に直角な方向にお
いては、投影面の長さが短いため、像面湾曲の収差の影
響が実質上無視しうる。According to the projection optical device of the present invention having the above configuration, the aberration of field curvature is corrected in the first direction, and an image with high imaging accuracy is projected. In the direction perpendicular to the first direction, the length of the projection surface is short, so the influence of aberration due to curvature of field can be substantially ignored.
さらに、被投影物体の投影面は略円筒面状になるため、
フレキシブルな被投影物体であっても皺が発生しにくく
なる。Furthermore, since the projection surface of the projected object is approximately cylindrical,
Even if the object to be projected is flexible, wrinkles are less likely to occur.
以下、本発明の詳細な説明する。 The present invention will be explained in detail below.
第１図は、本発明の実施例の投影光学装置及びこの投影
光学装置を使用した投影露光装置を説明する側面図であ
る。第２図は、第１図の保持台の斜視図である。FIG. 1 is a side view illustrating a projection optical device according to an embodiment of the present invention and a projection exposure apparatus using this projection optical device. FIG. 2 is a perspective view of the holding base of FIG. 1.
第１図において、ｌは光源部、２は投影光学装置、３は
被投影物体としてのフィルムを示す。In FIG. 1, 1 is a light source, 2 is a projection optical device, and 3 is a film as an object to be projected.
光源部１は、超高圧水銀灯等のショートアーク型で高輝
度のランプ１）．楕円集光鏡１２．インテグレータレン
ズ１３．コンデンサレンズ１４からなり、この光源部１
から、高照度で均一度の高い光が出射される。The light source unit 1 is a short-arc type high-intensity lamp 1) such as an ultra-high pressure mercury lamp. Elliptical condenser mirror 12. Integrator lens 13. This light source section 1 consists of a condenser lens 14.
Light is emitted with high illuminance and high uniformity.
本実施例の投影光学装置２は、投影レンズ２２゜投影レ
ンズ２２の物点の位置に配置されたレチクル２１及び保
持台２３からなる。The projection optical device 2 of this embodiment includes a projection lens 22.degree., a reticle 21 disposed at the object point position of the projection lens 22, and a holding table 23.
ＦＰＣ製作のための投影露光においては、帯状のフィル
ムＳ３の長さ方向（第一の方向）に１コマづつレチクル
２１の像を投影して露光する必要かある。そのため本実
施例では、フィルム３を、所定距離定寸送りする送りロ
ーラ４３により、１コマの露光の合間に定寸送りすると
ともに、スプロケットローラ４１により、送り方向かず
れないようにしている。押えローラ４２．４４は、スプ
ロケットローラ４１や送りローラ４３にフィルム３を押
さえ込むものである。尚、本実施例のフィルム３の投影
面（１コマ）の大きさは、第１の方向が３２５ＡＩＪ、
第２の方向が１）０”ｌＪである。In projection exposure for producing an FPC, it is necessary to project and expose the image of the reticle 21 one frame at a time in the length direction (first direction) of the strip-shaped film S3. Therefore, in this embodiment, the film 3 is fed by a feed roller 43 for a predetermined distance between exposures of one frame, and a sprocket roller 41 is used to prevent the film 3 from shifting in the feeding direction. The pressing rollers 42 and 44 press the film 3 against the sprocket roller 41 and the feed roller 43. The size of the projection surface (one frame) of the film 3 in this example is 325 AIJ in the first direction,
The second direction is 1) 0"lJ.
第２図に示すように、第一の方向においては投影レンズ
２２の像面湾曲の収差に起因する湾曲した像面に一致し
た曲線であり第一の方向と直角な第二の方向においては
直線であるような曲面２８３２が多数段けられ、この真
空吸着口２３２により、フィル１４３の投影面（１コマ
）の下面が曲面２３１に真空吸着される。これにより、
フィルム３の投影面は、第一の方向において投影レンズ
２２の像面湾曲の収差に起因する湾曲した像面に一致し
た曲線であり第一の方向と直角な第二の方向においては
直線であるような曲面に整形されて保持される。上記の
曲面２３１を有する保持台２３は、通常研削加工によっ
て製作されるが、像面湾曲の収差に起因する湾曲した像
面に一致するように成形する方向か一方向のみであるた
め、前掲の公報の場合よりも加工法によっては容易であ
り、面精度も出し易い。尚、保持台は通常の立方体とし
、この上にシムを介在させて板をボルト等で固定し、シ
ムの厚さによって上記のような曲面の精度を出すように
しても良い。As shown in FIG. 2, in the first direction, it is a curve that matches the curved image plane due to the aberration of field curvature of the projection lens 22, and in the second direction, which is perpendicular to the first direction, it is a straight line. A large number of curved surfaces 2832 are arranged in stages, and the lower surface of the projection surface (one frame) of the fill 143 is vacuum-sucked onto the curved surface 231 by the vacuum suction port 232 . This results in
The projection surface of the film 3 is a curved line that corresponds to a curved image surface caused by the field curvature aberration of the projection lens 22 in the first direction, and is a straight line in the second direction perpendicular to the first direction. It is shaped into a curved surface and held. The holding base 23 having the above-mentioned curved surface 231 is usually manufactured by grinding, but since it is only formed in one direction or in one direction to match the curved image plane caused by the aberration of field curvature, the above-mentioned Depending on the processing method, it is easier than in the case of the publication, and it is easier to achieve surface accuracy. The holding stand may be a normal cube, and a shim may be interposed thereon to fix the plate with bolts or the like, and the accuracy of the curved surface as described above may be achieved by adjusting the thickness of the shim.
第１図において、均一な力でフィルム３の１コマ部分を
真空吸着した場合、曲面２３１までの距離が短い第一の
方向の周辺部が強く吸着され、中央部は曲面２３１まで
の距離が長いため充分に吸着されないと考えられる。In Figure 1, when one frame of film 3 is vacuum-adsorbed with uniform force, the peripheral part in the first direction where the distance to the curved surface 231 is short is strongly adsorbed, and the central part has a long distance to the curved surface 231. Therefore, it is thought that the adsorption is not sufficient.
ここで、第１図に示すように、本実施例では、真空吸着
口群を三つに区分けし、この区分けされた各々の真空吸
着口群Ａ、 Ｂ、 Ｃに対応して電磁弁ａ、ｂ、ｃがそ
れぞれ設けられている。この電磁弁ａ、ｂ、ｃにより、
真空吸着口群Ａ、 Ｂ、 Ｃの順に時間差をつけて
排気できるようになっている。従って、フィルムＦの１
コマ部分の各部か曲面２３１に確実に吸着される。Here, as shown in FIG. 1, in this embodiment, the vacuum suction port group is divided into three groups, and the solenoid valves a, corresponding to the divided vacuum suction port groups A, B, and C are installed. b and c are provided respectively. With these solenoid valves a, b, and c,
Vacuum suction port groups A, B, and C can be evacuated at different times. Therefore, 1 of film F
Each part of the frame part is surely attracted to the curved surface 231.
第１図において、コントーラ６から定寸送り信号か送り
ローラ４３の駆動源（不図示）に送られ、フィルム３の
１コマを定寸送りして、次の１コマか投影位置に送られ
る。そして、コントローラ６から電磁弁ａ、ｂ、ｃの順
に時間差をつけて開信号か送られて電磁弁ａ、 ｂ、
ｃか所定の時間差で開き、真空ポンプ５と真空吸着
口２３２か連通してフィルム３の１コマが曲面２３１に
確実に吸着される。そして、真空系に配置された圧力セ
ンサ（不図示）からの信号により、真空吸着が正常に作
動していると判断すると、シャッタ（不図示）が開いて
露光が行われる。In FIG. 1, a constant feed signal is sent from the controller 6 to a driving source (not shown) for the feed roller 43, and one frame of the film 3 is fed by a constant distance, and the next frame is sent to the projection position. Then, an open signal is sent from the controller 6 to solenoid valves a, b, and c at different times in the order of solenoid valves a, b, and c.
c is opened at a predetermined time difference, the vacuum pump 5 and the vacuum suction port 232 are communicated with each other, and one frame of the film 3 is reliably suctioned onto the curved surface 231. When it is determined that the vacuum suction is operating normally based on a signal from a pressure sensor (not shown) disposed in the vacuum system, a shutter (not shown) is opened and exposure is performed.
ランプ１）からの光は楕円集光鏡１２によりインテグレ
ータレンズ１３の位置に集光され、インテグレータレン
ズ１３により均一な光になった後コンデンサレンズ１４
で再度集光される。コンデンサレンズ１４を経た光は、
レチクル２１に照射され、レチクル２工を透過した光が
、投影レンズノ
２２によりフィルム３に結び、レチクル２ネの像がフィ
ルム３に投影される。ここで、前述のように、フィルム
３の投影面は、第一の方向において投影レンズ２２の像
面湾曲の収差に起因する湾曲した像面に一致した曲線で
あるような曲面に成形ボケたり歪んだりすることがない
。The light from the lamp 1) is focused by the elliptical condensing mirror 12 onto the integrator lens 13, and after being made uniform by the integrator lens 13, the light is passed through the condenser lens 14.
The light is focused again. The light passing through the condenser lens 14 is
Light irradiated onto the reticle 21 and transmitted through the reticle 2 is connected to the film 3 by the projection lens 22, and the image of the reticle 2 is projected onto the film 3. Here, as described above, the projection surface of the film 3 is formed into a curved surface that matches the curved image surface caused by the field curvature aberration of the projection lens 22 in the first direction, and is not distorted or blurred. There is nothing to do.
尚、フィルム３の側端がら空気が入り込んで充分真空吸
着できないような場合には、重し等の押しつけ手段でフ
ィルム３の幅方向の周辺部等を保持台２３に押しつける
と良い。If air enters the side edges of the film 3 and vacuum suction cannot be performed sufficiently, it is preferable to press the periphery of the film 3 in the width direction against the holding table 23 using a pressing means such as a weight.
一方、第一の方向と直角な第合の方向においては直線で
あるが、この方向の投影面の長さは短いため実用上問題
とならない。どの程度短くなったら、直線でかまわない
かは、必要とするパターンの精度や投影レンズの特性等
によって決まる。On the other hand, although it is a straight line in the second direction perpendicular to the first direction, the length of the projection plane in this direction is short and does not pose a practical problem. How short the line must be to be a straight line is determined by the required accuracy of the pattern, the characteristics of the projection lens, etc.
（発明の効果）
以上説明した通り、本発明においては、像面湾曲の収差
に一致して保持する方向が、投影面の長い方の一方向の
みであるので、ＦＰＣ用のフィルムのようにフレキシブ
ルな被投影物体であっても皺が発生することかなく、像
面湾曲の収差による影響を実用上無視てきる程度に小さ
くされた解像度の高い像の投影か可能となる。(Effects of the Invention) As explained above, in the present invention, since the direction in which the aberration of field curvature is maintained in accordance with the aberration is only one direction, which is the long direction of the projection plane, the film is flexible like a film for FPC. This makes it possible to project a high-resolution image that does not cause wrinkles even when the object is projected, and is so small that the influence of aberrations due to curvature of field can be practically ignored.
第１図は、本発明の実施例の投影光学装置及びこの投影
光学装置を使用した投影露光装置を説明する側面図であ
る。第２図は、第１図の保持台の斜視図である。
図中、
１−・・・・−・・・・・・・光源部
２ ・・・・・・・・・・・投影光学装置３ ・・・・
・・・・・・・被投影物体としてのフィルム２１・・・
・・−・−・・ レチクル２２ ・・・・・・・・−
・投影レンズ２３−・・・・・・・・保持台
２３１ ・−・−保持台の曲面
を示す。FIG. 1 is a side view illustrating a projection optical device according to an embodiment of the present invention and a projection exposure apparatus using this projection optical device. FIG. 2 is a perspective view of the holding base of FIG. 1. In the figure, 1-...--... Light source section 2... Projection optical device 3...
...Film 21 as a projected object...
・・−・−・・ Reticle 22 ・・・・・・・・−
- Projection lens 23 --- Holding stand 231 - The curved surface of the holding stand is shown.
Claims (3)
投影する投影光学装置において、被投影物体の投影面は
、第一の方向に長い形状を有し、被投影物体の投影面が
、第一の方向においては投影レンズの像面湾曲の収差に
一致した曲線であり第一の方向と直角な第二の方向にお
いては直線であるような曲面になるように、被投影物体
を保持する保持台を具備したことを特徴とする投影光学
装置。(1) In a projection optical device that projects an image of the object onto the object to be projected by a projection lens, the projection surface of the object to be projected has a shape elongated in the first direction, and the projection surface of the object to be projected is The object to be projected is held so that it forms a curved surface that corresponds to the field curvature aberration of the projection lens in a first direction and is a straight line in a second direction perpendicular to the first direction. A projection optical device characterized by comprising a holding stand.
の像面湾曲の収差に一致した曲線であり第一の方向と直
角な方向においては直線であるような曲面を有し、該曲
面で被投影物体を吸着する真空吸着口群を具備し、かつ
真空吸着口群は複数の真空吸着口群に区分けされてなる
とともに前記曲面にフィルムを順次連続的に吸着するよ
う各真空吸着口群の吸引が制御されてなることを特徴と
する請求項（１）に記載の投影光学装置。(2) The holding table has a curved surface that is a curve that matches the aberration of field curvature of the projection lens in the first direction and is a straight line in a direction perpendicular to the first direction, and the curved surface The vacuum suction port group is provided with a vacuum suction port group for suctioning the object to be projected, and the vacuum suction port group is divided into a plurality of vacuum suction port groups, and each vacuum suction port group is configured to sequentially and continuously suction the film onto the curved surface. 2. The projection optical device according to claim 1, wherein the suction of the projection optical device is controlled.
装置を用い、投影レンズによりレチクルのパターンを投
影して露光することを特徴とする投影露光装置。(3) A projection exposure apparatus characterized in that the projection optical apparatus according to claim (1) or (2) is used to project and expose a pattern on a reticle using a projection lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2080854A JP2793000B2 (en) | 1990-03-30 | 1990-03-30 | Projection exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2080854A JP2793000B2 (en) | 1990-03-30 | 1990-03-30 | Projection exposure equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03283421A true JPH03283421A (en) | 1991-12-13 |
| JP2793000B2 JP2793000B2 (en) | 1998-09-03 |
Family
ID=13729934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2080854A Expired - Fee Related JP2793000B2 (en) | 1990-03-30 | 1990-03-30 | Projection exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2793000B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8023105B2 (en) | 2007-11-19 | 2011-09-20 | Orc Manufacturing Co., Ltd. | Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns |
-
1990
- 1990-03-30 JP JP2080854A patent/JP2793000B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8023105B2 (en) | 2007-11-19 | 2011-09-20 | Orc Manufacturing Co., Ltd. | Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2793000B2 (en) | 1998-09-03 |
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