JPH032801A - Method for imparting antireflection function - Google Patents
Method for imparting antireflection functionInfo
- Publication number
- JPH032801A JPH032801A JP1138740A JP13874089A JPH032801A JP H032801 A JPH032801 A JP H032801A JP 1138740 A JP1138740 A JP 1138740A JP 13874089 A JP13874089 A JP 13874089A JP H032801 A JPH032801 A JP H032801A
- Authority
- JP
- Japan
- Prior art keywords
- low
- plasma treatment
- antireflection function
- temperature plasma
- reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000009832 plasma treatment Methods 0.000 claims abstract description 28
- 229920003023 plastic Polymers 0.000 claims abstract description 20
- 239000011521 glass Substances 0.000 claims abstract description 19
- 239000002253 acid Substances 0.000 claims abstract description 8
- 239000003513 alkali Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 33
- 239000012780 transparent material Substances 0.000 claims description 7
- 239000004033 plastic Substances 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 9
- 239000012298 atmosphere Substances 0.000 abstract description 5
- 238000005530 etching Methods 0.000 abstract description 3
- 239000002904 solvent Substances 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- WSJULBMCKQTTIG-OWOJBTEDSA-N (e)-1,1,1,2,3,4,4,4-octafluorobut-2-ene Chemical compound FC(F)(F)C(/F)=C(\F)C(F)(F)F WSJULBMCKQTTIG-OWOJBTEDSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910001872 inorganic gas Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
＋１′−
本発明は透明なプラスチック素瞥才およびガラス素材の
反り１防止機能１寸与法に関するものである。更に詳し
くは、透明なプラスチック素材およびガラス素材からな
るフィルム状、板状およびレンズ製品に低温プラズマ処
理することのみによって素瞥才の反射防止機能を増加さ
せるものである。また、素材の反射防止機能を一層増加
させるために低温プラズマ処理の前および後工程に酸、
アルカリおよび有ＷＡｍ剤で処理することを特徴とする
。
ＩＬ且Ｉ
光学機器に使われるレンズおよび窓などは必ずフレネル
反射あるいはプ・−スト現象（化学と工業第３４巻１７
１ （１９８１Ｎｏ８）＃照）が起きるので、反射防止
膜加工を施して使用されている。このような反Ｉｉ１防
止技術は主として光学材料の性能向上を目的に発展して
きたが、近年各種表示装置の視角性の改良や太陽熱利用
技術面での瞥才料による反射ロスの減少等、他の分野に
おいても反射防止の重要性はとみに高まっている。方法
的には、ＪＩＩＩコーティングおよびガラスなとの素材
表面変成の２通りある。
これらの方法には、■低圧ＩＦ？率膜、■多層干渉膜、
■多孔質層のいずれかによる必要がある。
■低屈折率膜は光の干渉効果を応用するもので、低屈折
ｆＸ材ｔ′４（例えは、ＭｇＦ２、氷晶石ＡＩＦ＋・３
ＮａＦ）の被膜を行う、 ｌｉｔ！の例としては、低
屈折率の含フッ素ホリマーをレンズ表面にコーティング
することにより臨Ｗ入射角を大きくし、反１１１ｆＸを
低下する方法がある。パーフルオロブテン−２をプラズ
マ重合法によりレンズ表面にコーティングさせ、反射防
止機能を付与している＊（ＡｐｐｌｉｅｄＯｐｔｉｃｓ
、〜）ｏｌ、１５，１３２．＋９７６、Ｎｏ１）■多層
干渉膜は光の干渉理論に基づき高屈ｆｆｉ率膜、低屈折
＄膜を交互に積層したもので、 マルチコートと言われ
る由縁である。これは単層膜に比へ最低反射率が低く５
かつその分光特性は層数に応した広い低反羽域（波長
域）を有している。ｔオｔ４的には、通常、低屈折率膜
としてＭｇＦ：、５ｉＯ２（屈をＨｆＩ 、 ４ Ｄ
） カ、高屈折率膜としてＴｉ０２（屈折率２．３）が
よく用いられる。この方法が、レンズなとの透明な素材
表面の反射率低減および増透効果（反射防止膜は吸収が
少ないのて反射防止効果とともに増透効果をも、もって
いる）を１〒う方法として利用されている。これには真
空蒸着法あるいはスパッタリンク法などがある。
現在使用されている蒸丘（オｔ４としては、この池にＡ
Ｉ＝ｏ＋、Ｔ ｉｏ、 Ｚ Ｉｏ ２すどが用イラ
れティる。
■多孔質層は、ガラス表面を無機酸で処理したときに得
られるスケルトン層で代表されるように、シリカなと（
氏屈を斤率誘ｉ！体の針状またはスポンジ状構造より成
る。
本発明の低温プラズマ処理による方法は+1'- The present invention relates to a method for preventing warping of transparent plastics and glass materials. More specifically, the antireflection function of Sometsuai is increased only by subjecting film, plate, and lens products made of transparent plastic and glass materials to low-temperature plasma treatment. In addition, in order to further increase the anti-reflection function of the material, we add acid to the process before and after low-temperature plasma treatment.
It is characterized by treatment with alkali and WAm-containing agents. IL&I Lenses and windows used in optical equipment always suffer from Fresnel reflection or the Pust phenomenon (Chemistry and Industry Vol. 34, 17).
1 (1981 No. 8)) occurs, so it is used with an anti-reflection coating. Such anti-Ii1 prevention technology has been developed primarily to improve the performance of optical materials, but in recent years it has been developed to improve the visibility of various display devices and reduce reflection loss due to glare in solar heat utilization technology. The importance of anti-reflection is rapidly increasing in this field as well. There are two methods: JIII coating and material surface modification with glass. These methods include ■Low pressure IF? rate film, multilayer interference film,
■It is necessary to use one of the porous layers. ■Low refractive index film applies the interference effect of light, and low refractive fX material t'4 (for example, MgF2, cryolite AIF
NaF) coating, lit! For example, there is a method of coating the lens surface with a fluorine-containing polymer having a low refractive index to increase the critical W incident angle and lower the anti-111fX. Perfluorobutene-2 is coated on the lens surface using a plasma polymerization method, giving it an anti-reflection function * (Applied Optics)
,~)ol, 15,132. +976, No. 1) ■Multilayer interference film is based on the theory of light interference and is made by alternately laminating high refractive index films and low refractive $ films, which is why it is called multi-coat. This has a lower minimum reflectance than that of a single layer film.
Moreover, its spectral characteristics have a wide low anti-wavelength range (wavelength range) corresponding to the number of layers. Generally speaking, MgF:, 5iO2 (reflection: HfI, 4D) is used as a low refractive index film.
) Ti02 (refractive index 2.3) is often used as a high refractive index film. This method is used to reduce the reflectance of the surface of transparent materials such as lenses, and to increase the transmission effect (anti-reflection coatings have low absorption, so they have an anti-reflection effect as well as a transmission enhancement effect). has been done. This includes a vacuum evaporation method, a sputter link method, and the like. Steam hill currently in use (as Ot4, this pond has A
I = o +, T io, Z Io 2 steps are irritating. ■Porous layers include silica (
Invite Mr. Kaku! The body consists of needle-like or spongy structures. The method using low temperature plasma treatment of the present invention is
【■多孔質層に
よるものであり、本発明に関する文献なとは皆無で、全
く新規な方法である。
う
これら■、■の金属蒸着法においては、３００〜４００
℃の高温下で蒸着しなけれはならず、装置の７ｊＩ９を
化と操作の煩雑化が問題となっている。簡単な工程でこ
の問題点を解決するのが開端されている。
の
本発明者らは上記の点に着目し、さらに１４正用プラス
チツクレンズ、宇宙ヘルメットのマスク、安全カバーな
との将来性および太陽熱利用に普目し、透明な素を才の
反射防止機能を増加させることについて鋭意広範囲な系
統的研究を行った結果、透明なプラスチック素材および
ガラス素材からなるフィルム状、板状およびレンズ製品
に低温プラズマ処理することのみによって素材の反射防
止機能を増加させ、また素材の反射防止機能を一層増加
させるために低温プラズマ処理の前および後工程に酸、
アルカリおよび有機イη剤で処理することによって所期
の効果が１与られることを見い出し、本発明を完成した
。
低温プラズマによって素材表面領域数４’ｉクー２）Ｏ
Ｊ〜数千オシクースト０ンの範囲内でエツチングされ、
分解されることは既ｙ０の如くである。この現象に注目
し、透明な素材表面領域に反射防止機能を有する多孔′
ＪＲ層を作成することが・出来た。
本発明の目的は、従来の技術である金属類の、真空蒸着
法を用いずに、低温プラズマ処理法により透明なプラス
チックおよびカラス素材表面領域に多孔Ｘ層を形成し、
反射防止機能を付与する方法を提供することにある。
他の目的は、低温プラズマ処理により同時に透明なプラ
スチックおよびガラス素を才に帯電防止性およびｊ安着
性の向上を提供することにある。
すなわち、透明なプラスチック素を才およびカラス素を
才からなるフィルム状、板状およびレンズ製品に低温プ
ラズマ処理することのみによって素材の反射防止８１１
能を増加させるものである。
また、素瞥オの反射防止機能を一層増加させるた・めに
低温プラズマ処理の前および後工程に酸、アルカリおよ
び有機溶剤で処理することを特徴とした反射防止８能付
与法である。
【１立１ｊ
本発明の透明なプラスチック素瞥才およびカラス素會才
とは無色および有色のレンズを意味しているのであって
、それらのフィルム状、板状素材をも書味する。
本発明の透明なプラスチック素材およびカラス素舎才の
反射防止機能を一層増加させるために低温プラズマ処理
の前および後工程に酸、アルカリおよび有ｖａ溶剤で処
理し、低、エブラスマ処理のエツチング効果による反射
防止機能をさらに高める。この場合プラスチック素材で
は、アルカリおよび有４１１溶剤で処理する方が有効で
あり、カラス素材では、酸く例えは、 Ｈ２Ｓ Ｉ Ｆ
６なと）で処理する方が有効である。
本発明の透明なプラスチック素材およびカラス素材を低
温プラズマ処理し、素を１表面領域がエツチングされ、
細かい多孔質層となり、反射防止ｎ蛯が付与される。こ
の素材表面領域のエツチングを行う低温プラズマ処理条
件の決定要素はガスの成分、圧力、流量であり、さらに
出力、処理時間であり、これらにより多孔′Ｍ層の反射
防止！ｌＩ能の可能性が決定されろ。
本発明のプラズマガスは窒素、１！Ｉｆ素、水素、アル
ゴン、 ネオン、 ヘリウム、空電、 水蒸電、塩素、
アンモニア、−酸化炭素、二酸化炭素、亜酸化窒素、二
酸１ヒ窒素、二酸化イオウ、フロン等が有り、さらに重
合性プラズマガスがあり、これらは単独または混合して
使用可能であるが、特に多孔８層の反射防止機能の可能
性から無機ガスが有効である。
本発明の目的を達成するには、低温プラズマ処理ガスの
分圧５０トル以下、より好ましくは５Ｘ１０−’トル以
下の雰囲篤とすることが望ましい、２０トルを越える分
圧をもつプラズマ雰囲ス中では、プラズマ処理の効果が
急激に低下する。プラズマガスの流量は反応器の容積お
よびプラズマガスの分圧により決定される。
出力は一般に５００ワツト以下で使用される場合が多い
が、処理時間との組合せにより目的の性能をうろことが
可能である。
プラズマ処理時間は素を才の！１頚や形状および処理装
置などによって異なるが、通常数秒から数十分間であり
、好ましくは５分〜１５分間程度である。
プラズマガスを、プラスチック素手才およびガラス索材
の表面に作用させる場合、多くの絹合せが考えられる。
すなわち、反応器の構造、電源の種類、周波数、放電ｎ
３式および電極の位置なとさまざまの選択が可能である
。
プラズマ処理にあたり、′ｒ４Ｒとしては高周波（１３
，５６ＭＨ２）、マイクロ波（２，４５ＧＨｚ）、
低周波く数Ｋ ＨＺ ）などがある、放電方式としては
グロー放電が有効である。また。
電極の位置については内部式および外部式等があるが、
効果の均一性を考えれば内部式の方が操作が容易である
。
以下、実施例によって本発明をさらに工ｆ細に説明する
が、本発明は以下の実施例に限定されるものではない。
実施例１
透明なプラスチックレンズ（ＣＲ−３９）およびカラス
レンズを下記の条件で低温プラズマ処理した。
［プラズマ処理条件］
雰囲スガス： ０２ ２０ ｎｌｌ ／ ｍ ｉ
ｎ減圧Ｉｔ ： ０．２ｔｏｒｒ
出力 ： ３００〜Ｖ
処理時間 ＝ ３．５．８、１５分
これら未処理およびプラズマ処理された試料の可視光の
反射率（表１）および透過率（表２）を示す。
以下余白
表
！
反 射
ｆ＄（％）
表 ２
透 過
率 （％）
実施例２
透明なポリカーボネートフィルム（，１００ミク０））
を下記の条件で低温プラズマ処理した。
［プラズマ処理条１′＃、］
雰囲気ガス： ０２ ２０ ｍ ｌ ／ ｍ ｉ
ｎ減圧度 ：０．２ｔｏｒｒ
出力 ： ３００〜Ｖ
処理時間 二 ８分、 １５分
これら未処理およびプラズマ処理された試料の可視光の
透過＄（表３）を示す。
低温プラズマ処理によって素材表面が鋭くエツチングさ
れ、多孔質層とな７た０表１、２，３では反射率は非常
に小さくなり反！ＪＶｉ正効果を、また透過率は非常に
高くなり増透効果を同時にそれぞれ著しく改良させるこ
とができた。
また、透明なプラスチック板およびカラス板についても
実施例３と同様の条件で低温プラズマ処理した結果、同
様な反７Ｊ：４防止機能が１寸与され た。
また、実ＩｉＩ！例の低温プラズマ処理の前および後工
程においてプラスチック素材を７アルカリおよび有機溶
剤で処理すると、ガラス素材を酸（６呼えば、Ｈ２Ｓ
Ｉ Ｆ ６）で処理すると、−層の反射防止Ｉｌ能が付
与されることができたゆＬ見立１】
本発明の特徴は金属類の真空蒸着法と１つた従来の技術
を用いないで低温プラズマ処理によってポーラスな表面
となり、反射防止機能が素材表面に容易に形成されるの
で真空蒸着の高温やイオンブレーティングの高真空と言
った必要もない、そのため、ｓａｌの複雑化と操作の煩
雑化がなく、熟練を要しない。
同時に、低温プラズマ処理により透明なプラスチックお
よびガラス素材に帯電防止性および接着性の向上するこ
とかできる。[■ This method is based on a porous layer, and there is no literature related to the present invention, so it is a completely new method. In these metal vapor deposition methods, 300 to 400
The vapor deposition must be carried out at a high temperature of .degree. C., which poses problems in terms of equipment size and complicated operations. Open ends have been developed to solve this problem with a simple process. The inventors of the present invention have focused on the above points, and have also developed a transparent material with a unique anti-reflection function, with a view to its future potential in 14-day plastic lenses, space helmet masks, safety covers, and solar heat utilization. As a result of intensive and extensive systematic research on increasing the anti-reflection function of transparent plastic and glass materials, we have found that only by applying low-temperature plasma treatment to films, plates, and lens products made of transparent plastic materials and glass materials, we can increase the anti-reflection function of the materials. In order to further increase the anti-reflection function of the material, acid,
It was discovered that the desired effect can be achieved by treatment with an alkali and an organic η agent, and the present invention was completed. Low-temperature plasma reduces the number of material surface areas to 4'i 2) O
Etched within the range of J~several thousand Osycousts,
It is already decomposed like y0. Focusing on this phenomenon, we created a porous film with an anti-reflection function on the surface area of the transparent material.
I was able to create the JR layer. The purpose of the present invention is to form a porous X layer on the surface area of transparent plastic and glass materials by low-temperature plasma processing method without using the conventional vacuum evaporation method of metals.
The object of the present invention is to provide a method for imparting an antireflection function. Another object is to provide improved antistatic properties and stability to transparent plastic and glass materials at the same time by low temperature plasma treatment. In other words, the anti-reflection of the material can be achieved by simply applying low-temperature plasma treatment to film-like, plate-like, and lens products made of transparent plastic material and glass material.
It increases the ability of In addition, in order to further increase the antireflection function of Sobetsuo, it is a method for imparting antireflection ability, which is characterized by treating it with an acid, alkali, or an organic solvent before and after the low-temperature plasma treatment. [1j] The transparent plastic materials and materials of the present invention refer to colorless and colored lenses, and also include film-like and plate-like materials thereof. In order to further increase the anti-reflection function of the transparent plastic material and glass material of the present invention, they are treated with acid, alkali and VA solvent before and after low-temperature plasma treatment, and due to the etching effect of low-temperature plasma treatment. Further enhances anti-reflection function. In this case, for plastic materials, it is more effective to treat with alkaline and 411 solvents, and for glass materials, it is more effective to treat with acid, for example, H2S I F
6) is more effective. The transparent plastic material and glass material of the present invention are subjected to low temperature plasma treatment, and one surface area of the element is etched,
It becomes a fine porous layer and provides anti-reflection properties. The determining factors of the low-temperature plasma processing conditions for etching the surface area of the material are the gas composition, pressure, and flow rate, as well as the output power and processing time. Determine the possibility of II ability. The plasma gas of the present invention is nitrogen, 1! If element, hydrogen, argon, neon, helium, static electricity, water vapor electricity, chlorine,
There are ammonia, carbon oxide, carbon dioxide, nitrous oxide, monoarsenic dioxide, sulfur dioxide, chlorofluorocarbons, etc., and there are also polymerizable plasma gases, which can be used alone or in combination, but are particularly porous. Inorganic gas is effective because of the possibility of antireflection function of 8 layers. To achieve the objects of the present invention, the plasma atmosphere has a partial pressure of more than 20 Torr, preferably an atmosphere with a partial pressure of the low temperature plasma processing gas of less than 50 Torr, more preferably less than 5X10-' Torr. During the plasma treatment, the effectiveness of the plasma treatment decreases rapidly. The flow rate of the plasma gas is determined by the volume of the reactor and the partial pressure of the plasma gas. Although the output is generally 500 watts or less, it is possible to adjust the desired performance depending on the combination with the processing time. The plasma processing time is extremely short! Although it varies depending on the neck, shape, processing equipment, etc., the time usually ranges from several seconds to several tens of minutes, preferably about 5 to 15 minutes. When applying plasma gas to the surface of plastic fibers and glass cords, many silk combinations are possible. That is, the structure of the reactor, the type of power source, the frequency, the discharge n
Various selections are possible, including the three types and the positions of the electrodes. In plasma processing, 'r4R is a high frequency (13
, 56MH2), microwave (2,45GHz),
As a discharge method, glow discharge is effective. Also. Regarding the position of the electrode, there are internal type and external type.
Considering the uniformity of the effect, the internal type is easier to operate. EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to the following examples. Example 1 A transparent plastic lens (CR-39) and a glass lens were subjected to low temperature plasma treatment under the following conditions. [Plasma treatment conditions] Atmosphere gas: 02 20 nll/mi
n Vacuum pressure It: 0.2 torr Output: 300~V Treatment time = 3.5.8, 15 minutes The visible light reflectance (Table 1) and transmittance (Table 2) of these untreated and plasma-treated samples are show. Margin table below! Reflection f$ (%) Table 2 Transmittance (%) Example 2 Transparent polycarbonate film (100 mic 0))
was subjected to low temperature plasma treatment under the following conditions. [Plasma treatment strip 1'#,] Atmosphere gas: 02 20 ml/mi
Degree of reduced pressure: 0.2 torr Output: 300~V Treatment time: 28 minutes, 15 minutes Visible light transmission of these untreated and plasma treated samples (Table 3) is shown. The surface of the material is sharply etched by low-temperature plasma treatment and becomes a porous layer.In Tables 1, 2, and 3, the reflectance becomes extremely small, and vice versa! The JVi positive effect and the transmittance became very high, making it possible to significantly improve the transparency effect at the same time. Furthermore, when a transparent plastic plate and a glass plate were subjected to low-temperature plasma treatment under the same conditions as in Example 3, they were given the same anti-7J:4 prevention function. Also, real IiI! When plastic materials are treated with 7 alkali and organic solvents before and after the low-temperature plasma treatment, glass materials are
When treated with IF 6), the antireflection ability of the layer could be imparted.The feature of the present invention is that it can be used without using the vacuum evaporation method of metals and the conventional technology. The surface becomes porous through low-temperature plasma treatment, and anti-reflection functionality is easily formed on the surface of the material, so there is no need for the high temperatures of vacuum evaporation or the high vacuum of ion blating, which makes SAL more complicated and the operation more complicated. There is no change and no skill is required. At the same time, low-temperature plasma treatment can improve the antistatic and adhesive properties of transparent plastic and glass materials.
Claims (1)
素材の反射防止機能を増加させることを特徴とした反射
防止機能付与法。 ２、透明な素材を酸、アルカリおよび有機溶剤で処理し
、次いで低温プラズマ処理することによって、素材の反
射防止機能を増加させることを特徴とした反射防止機能
付与法。 ３、透明な素材を低温プラズマ処理し、次いで酸、アル
カリおよび有機溶剤で処理することによって、素材の反
射防止機能を増加させることを特徴とした反射防止機能
付与法。 ４、透明な素材がプラスチックおよびガラスからなるフ
ィルム状、板状およびレンズである特許請求の範囲第１
、２および３項記載の反射防止機能付与法。 ５、低温プラズマ処理がガス圧０．０１〜１０トルの無
機および有機ガスの低温プラズマ照射である特許請求の
範囲第第１、２および３項記載の反射防止機能付与法。[Claims] 1. By treating a transparent material with low-temperature plasma,
A method for imparting anti-reflection function characterized by increasing the anti-reflection function of materials. 2. A method for imparting antireflection function, which comprises increasing the antireflection function of a transparent material by treating it with an acid, an alkali, or an organic solvent, and then subjecting it to low-temperature plasma treatment. 3. A method for imparting antireflection function, which comprises increasing the antireflection function of a transparent material by subjecting it to low-temperature plasma treatment and then treating it with acid, alkali, or organic solvent. 4. Claim 1 in which the transparent material is a film, a plate, or a lens made of plastic and glass.
, 2 and 3. 5. The method for imparting an antireflection function according to claims 1, 2, and 3, wherein the low-temperature plasma treatment is low-temperature plasma irradiation of an inorganic or organic gas at a gas pressure of 0.01 to 10 torr.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1138740A JPH032801A (en) | 1989-05-31 | 1989-05-31 | Method for imparting antireflection function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1138740A JPH032801A (en) | 1989-05-31 | 1989-05-31 | Method for imparting antireflection function |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH032801A true JPH032801A (en) | 1991-01-09 |
Family
ID=15229068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1138740A Pending JPH032801A (en) | 1989-05-31 | 1989-05-31 | Method for imparting antireflection function |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH032801A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002243902A (en) * | 2001-02-13 | 2002-08-28 | Toppan Printing Co Ltd | Antireflection film |
| US10675947B2 (en) | 2015-03-11 | 2020-06-09 | Denso Corporation | Air blower device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684729A (en) * | 1979-11-14 | 1981-07-10 | Toray Ind Inc | Production of transparent material having excellent reflection-preventing effect |
| JPH0274901A (en) * | 1988-09-10 | 1990-03-14 | Fukui Pref Gov | Method of imparting antireflection function |
-
1989
- 1989-05-31 JP JP1138740A patent/JPH032801A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5684729A (en) * | 1979-11-14 | 1981-07-10 | Toray Ind Inc | Production of transparent material having excellent reflection-preventing effect |
| JPH0274901A (en) * | 1988-09-10 | 1990-03-14 | Fukui Pref Gov | Method of imparting antireflection function |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002243902A (en) * | 2001-02-13 | 2002-08-28 | Toppan Printing Co Ltd | Antireflection film |
| US10675947B2 (en) | 2015-03-11 | 2020-06-09 | Denso Corporation | Air blower device |
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