JPH02154201A - Preparation of reflection preventing film - Google Patents
Preparation of reflection preventing filmInfo
- Publication number
- JPH02154201A JPH02154201A JP63309030A JP30903088A JPH02154201A JP H02154201 A JPH02154201 A JP H02154201A JP 63309030 A JP63309030 A JP 63309030A JP 30903088 A JP30903088 A JP 30903088A JP H02154201 A JPH02154201 A JP H02154201A
- Authority
- JP
- Japan
- Prior art keywords
- reflection preventing
- reflection
- film
- preventing film
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 46
- 229920003023 plastic Polymers 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 4
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 26
- 239000011521 glass Substances 0.000 claims description 16
- 238000009832 plasma treatment Methods 0.000 claims description 14
- 150000002736 metal compounds Chemical class 0.000 claims description 8
- -1 SiO_2 Chemical class 0.000 claims description 6
- 239000004033 plastic Substances 0.000 abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 7
- 230000008859 change Effects 0.000 abstract description 7
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052593 corundum Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 2
- 239000006121 base glass Substances 0.000 abstract 3
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 15
- 230000000694 effects Effects 0.000 description 13
- 238000012545 processing Methods 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 230000003667 anti-reflective effect Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000007123 defense Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004043 dyeing Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000010025 steaming Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241001340534 Eido Species 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241000283283 Orcinus orca Species 0.000 description 1
- 208000002193 Pain Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- ZFXYFBGIUFBOJW-UHFFFAOYSA-N theophylline Chemical compound O=C1N(C)C(=O)N(C)C2=C1NC=N2 ZFXYFBGIUFBOJW-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
の ′−
本発明は透明なプラスチ・ツク素置オおよびガラス素材
表面の反射率低≧織方法に間するものである。更に詳し
くは、 コーティングされた、透明なプラスチック素材
およびガラス素材を無一物、特に金属類を原着すること
なく、低温プラズマ処理することのみによって素材表面
に反射防止ＩＩ能膿を作成する方法に間するものである
。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a transparent plastic substrate and a glass material surface with a low reflectance. More specifically, we describe a method for creating anti-reflection II coatings on the surface of coated transparent plastic and glass materials by simply subjecting them to low-temperature plasma treatment without attaching any metals. It is something that will take place.
１１且遣
光学機器に使われるレンズおよび窓なとは必ずフレネル
反射あるいはゴースト現象（化学と工業 第３４巻１７
１ （１９８１，Ｎｏ８）＠照）が起きるので、反射防
止膜加工を施して使用されている。このような反射防止
技術は主として光学材料の性能白玉を目的に発鳴してき
たが、近年各挿表示装者の視角性の改良や太陽熱ｆ１１
用技両技術の材料による反射ロスの減少等、池の分野に
おいても反射防止の重要性はとｈに高まっている。方法
的には、薄膜コーティングおよびカラスなとの素材表面
変成の２通りある。11. Lenses and windows used in optical equipment are always affected by Fresnel reflection or ghost phenomena (Chemistry and Industry Vol. 34, 17).
1 (1981, No. 8) @ Teru), so it is used with an anti-reflection coating. Such anti-reflection technology has mainly been used to improve the performance of optical materials, but in recent years it has been used to improve the visibility of individual display devices and to improve solar heat F11.
The importance of anti-reflection is increasing in the field of ponds as well, such as the reduction of reflection loss due to the use of materials that are both practical and technical. There are two methods: thin film coating and material surface modification with glass.
これらの方法には、■低屈折率膜、■多層干渉膜、■多
孔質層のいずれかによる必要がある。These methods require the use of one of (1) a low refractive index film, (2) a multilayer interference film, and (2) a porous layer.
■低屈折率膜は光の干渉効果を応用するもので、低屈折
率材料（例えば、Ｍｔ＜Ｆ２、氷晶石ＡＩＦ＋・３Ｎａ
Ｆ）の被膜を行う、他の例としては、低屈折率の含フツ
素ポリマーをレンズ表面にコーティングすることにより
臨界入射角を大きくシ。■Low refractive index film applies the interference effect of light, and low refractive index material (for example, Mt<F2, cryolite AIF+/3Na
Another example of applying the coating described in F) is to increase the critical angle of incidence by coating the lens surface with a fluorine-containing polymer having a low refractive index.
反射率を低下する方法がある。ハーフルオロフテン−２
をプラズマ重合法によりレンズ表面にコーティングさせ
、反射防ＩＥ機能を付与している。 （４ｐｐｌｉ
ｅｄ ０ｐｔｉｃｓ、Ｖｏｌ、１５．＋３２．１９７
Ｂ、Ｎｏ１）４ｊ多層干渉詳は光の干渉理論に基つき高
屈折率躾、低犀折率膜を交互に積層したもので、マルチ
コートと言われる由綽である。これは単層膜に比へＩｌ
ｋ低反脣４率が低く、かつその分光特性は層数に応した
広い低ＮＩ４域（波長域）を有している。材料的には、
通常、 低ＰＡ所率膜としてＭｇＦ２．５ｉＯａ（屈折
＄ １．４６）が、高屈折事績としてＴ１０２（ｌａｔ
Ｒ率２．３）がよく用いられろ、この方法が、レンズな
との透明な嚢材表面の反＊４＄低減および増Ｘ！！効果
（反Ｉｔ防１と膜は吸収が少ないので反＠１防止効果と
ともに増透効果をも、もっている）を行う方法として刊
用されている。これには真空蒸着法あるいはスパッタリ
ンク法なとがある。There are ways to reduce reflectance. Half olophthene-2
is coated on the lens surface using a plasma polymerization method, giving it an anti-reflection IE function. (4ppli
ed 0ptics, Vol. 15. +32.197
B, No. 1) 4j Multilayer Interference Based on the theory of light interference, high refractive index films and low refractive index films are alternately laminated, which is why it is called multi-coat. This is compared to a single layer film.
It has a low k low reflection 4 ratio, and its spectral characteristics have a wide low NI4 range (wavelength range) corresponding to the number of layers. In terms of materials,
Usually, MgF2.5iOa (refraction $ 1.46) is used as a low PA coverage film, and T102 (lat refractive index) is used as a high refraction film.
R rate 2.3) is often used, and this method reduces and increases the resistance of transparent capsule surfaces such as lenses by $4! ! It has been published as a method to achieve the anti-It-1 effect (because the anti-It-1 film has low absorption, it has not only the anti-@1-preventing effect but also the transparency-enhancing effect). This includes a vacuum evaporation method and a sputter link method.
現在使用されている蒸１オ料として（ｉ、この池にＡｌ
ａＯｒ、ＴｉＯ２ＺｒＯ；なとが用いｉ、れてい■多孔
′Ｍ層は、カラス表面を！Ｉｋ機酸で処理したときに得
られるスケルトン層で代表されろように、 シリカなと
１氏屈ｉ斤５Ｘ誘電１本の針４大またはスホンン秋構造
より成る。As the steaming material currently used (i.
aOr, TiO2ZrO; Nato is used i, and the porous 'M layer covers the surface of the glass! As typified by the skeleton layer obtained when treated with an Ik organic acid, it consists of a silica fiber, a 5X dielectric, a 4-needle structure, or a 5X dielectric structure.
本発明の低温プラズマ処理による方法は→＋１１Ｊ孔質
層によるものであり５本弁明に関する文献なとは皆職て
、全く新規な方法である。The low-temperature plasma treatment method of the present invention uses a →+11J porous layer, and there are no references to this defense, and it is a completely new method.
が ゛ する
これら■、（■の金嘱蒸看法においては、カラスレンズ
では３００〜４１） Ｏｔ：の高温下で、慎看しうるの
に対し、プラスチックレンズでは高温処理によるレンズ
の白１嘲・比のために常温に近い低温下でＭＩＦＩ、な
けれはならず、いろいろな工夫が必要となり、装置の複
雑化と操作の煩雑化か問題となっている。また、プラス
チックしンスの場合易染性と言った長所が金Ｉｘ類の薄
膜をレンズ表面にコートするため槽中性になり、反利防
止膜加工堵の染色か不ｉｉＴ能となる。それ故、反１防
市膜加工前に染色しなければならず、プラスチックレン
ズの易染性と言った長所が半減し、この問題点を解決す
るのがＩｌｌ ｌ今されている。However, in the case of plastic lenses, the whiteness of the lens due to high temperature treatment can be observed with care at a high temperature of 300 to 41 for crow lenses. Because of the ratio, MIFI must be operated at a low temperature close to room temperature, and various measures are required, leading to problems such as complication of the device and complicated operation. In addition, in the case of plastic lenses, the advantage of easy dyeing is that since the lens surface is coated with a thin film of gold Ix, it becomes tank neutral and cannot be dyed without being coated with an anti-reactive film. Therefore, it is necessary to dye the plastic lens before processing the film, which reduces the advantage of plastic lenses by half, such as the ease of dyeing, and efforts are now being made to solve this problem.
す の
本発明者らは上記の点に着目し、さらに矯正用プラスチ
ックレンズの将来性および太１１１１１利用に看目し、
透明なカラス素材およびプラスチック素Ｉ才のＮ１１防
ＩＪニー能付与について鋭童広範囲な不読的研究を１テ
った結果、コーティングされた、プラスチック素を才お
よびカラス素材を１氏、！フラスマ曜Ｉ４ずろことによ
って所間の効果が躊られろことを見い出し、本発明を完
成した。The inventors of the present invention have focused on the above-mentioned points, and have also focused on the future potential of plastic lenses for correction and the use of Tai 11111,
As a result of extensive and unreadable research on imparting N11 anti-IJ knee properties to transparent glass materials and plastic materials, Mr. Eido has made a coated plastic material and glass materials! They discovered that the effect of the time can be suppressed by using the 14th column of flames, and completed the present invention.
低温７ラスマによ７て素材表面Ｓｉ域数しり２）０シ〜
教千イツク”２）０＞のｉ！開内でエツチングされ、分
解されることは既知の如くである。この現象に注目し、
表面領域でシリコン系ハードコートを才をエツチングし
、分解することによってＳｉＯ，ＳｉＯ２の多孔質層の
反射防止膜を作成することに成功した。このことについ
ては特許願６３−２２７３１７に申請した。Calculate the number of Si regions on the material surface by low-temperature 7 lasma 2) 0~
As is known, it is etched and decomposed within the i!
By etching and decomposing the silicon-based hard coat in the surface region, we succeeded in creating an anti-reflection coating of a porous layer of SiO, SiO2. Regarding this matter, we applied for patent application No. 63-227317.
そのバートコ−１才中に８１以外の池の金属化合物を導
入したり、−ａの有機コーティング材に、低温プラズマ
処理によって１反射防１Ｆ機能を有する金属１ヒ物（例
えは、 ５ｉＯｐ、Ａｌ２Ｏ３なと）になりつる金属化
合物の１つ以上を加えたりすることにより更に反鴫寸防
止機能を上げろと同時に１反１１防＋ｈ ＩＩＩ特有の
色を目を自由に変えることもできた。During the first year of Bartko's life, a metal compound other than 81 was introduced, or a metal compound (for example, 5iOp, Al2O3, etc. By adding one or more of the metal compounds that become (and), it was possible to further increase the anti-glare effect, and at the same time, it was possible to freely change the color unique to the 1-11 defense + h III eyes.
本発明の目的は、従来の技術である金Ｉｘ頚の真空蒸着
法を用いずに、低温プラズマ処理法により透明なプラス
チックおよびカラス素材表面領域に、反射防ＩＪ：ｌｌ
ｌとして知られている金＠酸化（ヒ合物（酬えは、 ５
ｉＯａ、Ａｌ２０ｔなと）の多孔質層を形成し、反射防
止４１１１１！膜を作成する方法を提供することにある
。The object of the present invention is to apply anti-reflective IJ:ll to transparent plastic and glass material surface areas by low temperature plasma treatment method without using the conventional vacuum deposition method of gold Ix neck.
Gold @ oxide (compound) known as 5
Forms a porous layer of iOa, Al20t, etc. to prevent reflection 41111! The object of the present invention is to provide a method for creating a membrane.
他の目的は、反射防＋ｈ嗅作成１肴に染色可能な利点を
提供することにある。すなわち、環１防止矯正プラスチ
ックレンズを消費者好みの色相に染色可能な利点にある
。Another objective is to provide dyeable benefits to anti-reflection + odor-creating products. That is, it has the advantage that the ring 1 prevention orthodontic plastic lens can be dyed to a hue of the consumer's preference.
すなわち、低温プラズマ処理によって、反刺防止機能を
有する金属酸１ヒ物（削えは、Ｓ＋０２１．八１２０：
なと）になりうろ金属化合物の１つ以上を加えたコーテ
ィング１才（金属含有＄１．０重量％以上）によって処
理された、透明なプラスチック素材およびカラス素材を
低温フ゛ラス゛マ処理し、素材表面に反４１防１ヒ８Ｉ
能を１１与することを特徴とした反射防＋ｈ Ｉｌｌ１
作成法である。That is, by low-temperature plasma treatment, metal acid 1 arsenic having anti-stinging function (S+021.8120:
Transparent plastic materials and glass materials treated with a coating containing one or more metal compounds (metal content of $1.0% by weight or more) are treated with a low-temperature polymer to coat the surface of the material. anti-41 defense 1hi 8I
Anti-reflection +h Ill1 characterized by giving 11 functions
This is the creation method.
１１立盈ｊ
本発明の透明なフラスナックＷ材およびカラス素材とは
嘴色および有色のレンズを意味しているのであって、そ
れらの板状素材をも意味する。11 Standing Lens The transparent frassnack W material and crow material of the present invention mean beak-colored and colored lenses, and also mean plate-like materials thereof.
一般に用いられているハードコーティング争才としては
マルチラジカル架橋アクリル系剤や、７ミノＩｌ詣硬化
系ハードコーティング剤なとの炭素鎖系、およびオルカ
ッシリコン化学に基礎を置くポリオルカッシロキサン系
コーティング剤のケイ索鎖系のＩｔ を１料か用いられ
て（する。Commonly used hard coating agents include multi-radical cross-linked acrylic agents, carbon chain-based coating agents such as 7-mino-Il hard coating agents, and polyorcasiloxane-based coating agents based on orcasilicon chemistry. It is used as a single material for the It of the silica chain system.
本発明のコーチインク材とはＬ記の有機系ＦＭ脂、合成
樹脂および天然Ｆ！Ａ詣口こＳｌ、Ａ１、Ｍ ｇなとの
有機および％ｊｉｌｌｌ金１ヒ台物の１つ以上を加えた
コーティング化 およびＳｌ、Ａ１、ｆＶＩ ｇなとの
有機金属化合物（例え（ｉ、上記のホリオルカノシロキ
サン系コーティング材）の単独あるいＣｉそれらにＳｉ
、 ＡＩ、Ｍｇなとの有機および輿晴金属化合物の１
つ以上を加えたコーティング争才をン味するのであって
、これらの金１類はＳｌ。The coach ink material of the present invention is an organic FM resin listed in L, a synthetic resin, and a natural F! Coatings with one or more organic and gold compounds such as Sl, A1, Mg and organometallic compounds such as Sl, A1, fVIg (e.g. (i, above) (Si) alone or in addition to Si
, AI, Mg, etc., and one of the organic and transparent metal compounds
We are looking at the coating technique with more than one metal, and these gold class 1 are Sl.
ＡｌｔｉよひＭ ｇ金属化合物に限定されるものでなく
、低温プラズマ処理により反喝檀防止機能を有する金Ｉ
Ｘ＃（ヒ物になりうる金１１１ＥＩヒ合物を意味する。Altiyohi Mg Not limited to metal compounds, but also gold I which has a repulsion prevention function through low temperature plasma treatment.
X# (Means gold 111EI which can become a Himono).
また、そのコート処理法には湿式法および乾式法（ＣＶ
Ｄ法をも含む）があり、いずれの方法も本発明に過用す
る。In addition, the coating treatment methods include wet method and dry method (CV
(including Method D), and both methods are overused in the present invention.
本発明のコーティングされた、透明なプラスチック素を
才およびカラス素材を低温プラズマ処理し、素を４表面
領域がエツチングされ、金属酸化物（例えは、 ５ｉＯ
５ＳｉＯ２、Ａｌ２０１なと）の多孔′Ｍ層の反射防Ｉ
Ｆ膜が形成される。この素材表面領域の活性１ヒをｌ？
うプラズマ処理条件の決定要素はガスの成分、圧力、流
量であり、さら二こ出力、 ’ＲＦ！時間で６す、
これらにより反射防ＩＩ：機能を有する金属酸１ヒ物の
多孔質層の反射防上膜形成の可能性が決定される。The coated, transparent plastic element of the present invention is coated with a glass material by low-temperature plasma treatment, and four surface areas of the element are etched and coated with metal oxides (e.g., 5iO
5SiO2, Al201, etc.) anti-reflection of porous M layer
An F film is formed. Is the active level of the surface area of this material l?
The determining factors for plasma processing conditions are gas composition, pressure, and flow rate. It's 6 in time.
These determine the possibility of forming an anti-reflective film on a porous layer of anti-reflective II: functional metal acid monomer.
本発明の７ラスマカスは窒素、酸素、水素、アルコン、
ネオン、・ｈリウム、空気、水蒸気、Ｉ！素、アンモ
ニア、−酸化炭素、二酸化炭素。The 7 rasmacas of the present invention include nitrogen, oxygen, hydrogen, alkones,
Neon, hrium, air, water vapor, I! element, ammonia, -carbon oxide, carbon dioxide.
ｉＩＩ＋酸１ヒ窒素、二酸１ヒ望素、二酸化イオウ、フ
ロン等か有り、ざらに重合性プラズマカスかあり、これ
らは単！！Ｉ！または混合して使用５′ｒ能であるが、
１キに金属酸１ヒ物の多孔Ｎ層の環１１防【Ｌ膜彫銭の
可能性から酸素カスが有７ｈである。−万、酸素を滑ま
ないカスでも低温フラスマ処理によってランカル１ヒし
、大気中に取り出すとき酸素と結合するか、あるいく！
コート材中の酸素と結合して金属酸１ヒ物の多孔質層の
反射防止ＩＩ Ｉｌｌを形成すると考えられ１反１１防
上勃果はある。There is iII + acid 1 arsenic, diacid 1 arsenic, sulfur dioxide, chlorofluorocarbons, etc., and there is also polymerizable plasma scum, these are simple! ! I! Or it can be used in combination, but
1st ring, 1st layer of metal acid, 1st ring of porous N layer. - 10,000, even the scum that doesn't slip oxygen is lancarized by low-temperature flask treatment, and when it is taken out to the atmosphere, it will combine with oxygen, or it will go away!
It is thought that it combines with oxygen in the coating material to form a porous layer of anti-reflection of the metal acid, and there is an anti-reflection effect of 1 to 11.
本発明の目的を達成するには、低温プラズマ処理カスの
分圧５０トル以下、より好ましくは５ｘ（ｔ：＋−＋ト
ル以下の雰囲χとする二とが望ましい。 ２０トルを越
えろ分圧をもつブ、ラズマ雰囲気中では、プラズマ処理
の幼果が急激に低下する。プラズマガスの流量は反応器
の容積およびプラズマガスの分圧により決定される。In order to achieve the object of the present invention, it is desirable that the partial pressure of the low-temperature plasma processing residue be 50 torr or less, more preferably 5x (t: + - + torr or less). Partial pressure exceeding 20 torr In the plasma atmosphere, the plasma-treated seedlings decrease rapidly.The flow rate of the plasma gas is determined by the volume of the reactor and the partial pressure of the plasma gas.
出力は一般に１５００ワツト以下で使用されろ場合が多
いが、処理時間との絹合せにより目的の性能をうること
が可能である。Although the output is generally 1500 watts or less, it is possible to obtain the desired performance by adjusting the processing time.
プラズマ処理時間は素亭才の鏝ＩＩや旧状および％理装
置などによって異なるが、通常数秒から数分間であり、
好ましくは１分〜５分間程度であ る。The plasma processing time varies depending on the Soutei Trowel II, the old model, and the processing equipment, but it is usually from a few seconds to a few minutes.
Preferably it is about 1 minute to 5 minutes.
プラズマカスを、コーティングされたプラスチック素亭
オおよびカラス素材の表面に作用させる場合、多くの絹
合せが考えられる。すなわち、反応器の構造、電源の積
ｘｉ、 ｍ波数、放電旧式および電極の位置なとさま
ざまの選択が可能であ る。When applying plasma scum to the surface of coated plastic and glass materials, many silk combinations are possible. That is, various choices can be made regarding the reactor structure, power supply product xi, m wave number, discharge type, and electrode position.
プラズマ処理にあたり、電源としては高Ｆ＃１波（１３
，５６Ｍ）ｌ ｚ）、マイクロ−＆（２，４５ＧＨｚ）
、低迎波（数Ｋ Ｈｚ ）なとがある０放電方式として
はグロー放電が有効である。また、電極の＋ｉ１７ Ｉ
Ｉについては内部式および外部式等があるが、効果の均
一性を考えれＦ、？内部式の方が操作が容易である。For plasma processing, a high F#1 wave (13
,56M)l z),Micro-&(2,45GHz)
, glow discharge is effective as a zero discharge method with a low interception wave (several kHz). Also, +i17 I of the electrode
There are internal and external formulas for I, but consider the uniformity of the effect. The internal type is easier to operate.
川下、実施例によフて本発明をざらに詳綱に説明ｆるか
、本発明は以下の実Ｋ １％１に限定されるものてＣｉ
ない。Below, the present invention will be explained in more detail with reference to examples, or the present invention is limited to the following examples.
do not have.
実施例１
マルチランカル架（ｆ！アクリル系ｌ！ＩＮ￥１にオル
カッシロキサン系化合物（市版名 ＴＳ−５６−Ｔ 應
山ソーダ■製）を５０省置％添加したコーティング材で
処理された透明なフラスナックレンズ（ＣＲ−３９）お
よびカラスレンズを下記の条件で低温プラズマ処理した
。Example 1 A multi-lancar frame (f! Acrylic l! IN ¥1 was treated with a coating material in which 50% of an orcas siloxane compound (city edition name TS-56-T manufactured by Oyama Soda ■) was added. A transparent glass lens (CR-39) and a glass lens were subjected to low temperature plasma treatment under the following conditions.
［プラズマ処理条件］
雰囲気カス： Ｏｔ ２０ ＋ＴＩ Ｉ ／ ｍ
ｉ ｎ減圧度 ：０．２ｔｏｒｒ
出力 ： ３００〜Ｖ
処理時間 ： ２分
なお、比較のために上記のコーチインク材で処理されて
いない同様の素を才、フラスチックレンス（ＣＲ−３９
）およびカラスレンズについても同一の条件で低温プラ
ズマ処理した。[Plasma treatment conditions] Atmosphere scum: Ot 20 +TI I / m
In pressure reduction degree: 0.2 torr Output: 300~V Processing time: 2 minutes For comparison, a similar raw material that was not treated with the above coach ink material was used as Plastic Lens (CR-39).
) and crow lenses were also treated with low-temperature plasma under the same conditions.
その結果、コーチインクされたカラスレンズ、フラスナ
ックレンズのいずれの素材もｓｌｏ、５ｉ０２金属酸化
物の多孔Ｍ１特有の反＋１４防１ｈ機＃ｌｉ （マセン
タの色相）を示していたが、コーチインク されていな
いカラスレンズ、フラスチソクレンスのいずれの素手オ
も反ｑｔ防１１：横特有の色相を呈していなかった。As a result, both the coach-inked crow lenses and the flask nac lens materials showed anti-+14-proof 1h #li (macenta hue) characteristic of porous M1 of slo and 5i02 metal oxides, but coach-inked materials did not. Neither the unglazed crow lens nor the frustisoclens had a hue peculiar to anti-qt protection 11:horizontal.
なお、プラズマ処理されていないコーティングプラスチ
ックレンズ（拭ＨＮｏ＋）およびプラズマ処理されたコ
ーティングプラスチックレンズ”（試１４ Ｎ ｏｎ〉
ζこっｔマ・てＳＥＭによるそれらの表面写真（写真ｌ
、２）、ＥＳＣＡによる表面分析結果（表１）および可
視光の反引ｆＳ（表２）および透過率（表３）を示す。In addition, a coated plastic lens that has not been plasma treated (Wipe HNo+) and a coated plastic lens that has been plasma treated (Trial 14 N on)
A photo of their surface by SEM (Photo 1)
, 2), the surface analysis results by ESCA (Table 1), visible light retraction fS (Table 2) and transmittance (Table 3) are shown.
以下余白 試料Ｎｏｔの表面写真 試料Ｎｏ■の表面写真 Ｘ ｌ ００００ ｘｉｏｏｏ。Margin below Surface photo of sample Not Surface photo of sample No. X 0000 xiooo.
表、１
Ｅ Ｓ Ｃ−１によろフ５ス“７処理前漫の表面状態分
析った０表！では、０／Ｓｉの比が変わらないのに対し
てＳｉ／Ｃの比が大きくなっていることより５ｉ−Ｃ結
合か分解され５ｉ−０結台になっている。また、表２．
３では反射率は非常に小きくなり反射防止効果を、また
透過率は非常に高くなり増＋！ｌ効果を同時にそれぞれ
著しく改良させることかでき た。In Table 1, the surface state of the surface state was analyzed before the 5th treatment with ESC-1. In Table 0, the 0/Si ratio remained unchanged, while the Si/C ratio increased. Because of this, the 5i-C bond is decomposed and becomes a 5i-0 bond. Also, Table 2.
At 3, the reflectance is very small, resulting in an anti-reflection effect, and the transmittance is very high, increasing +! At the same time, we were able to significantly improve each of the l effects.
表 ２ 反 射 ５Ｊ（％）低温プラズマ
処理によって、写ｘ１，２では素劃オ表面が鋭く工・フ
チングされ、多孔質層とな表
；３ 通
過
＄ （％ ）
これらの結果より太陽エネルキー、旦、２日（１９８０
，Ｎｏ２） ニ記載さＪＬ Ｔ ＬｌるＳｉＯおよＵＳ
０２のポーラスな反Ｉｌ櫨防正機能膿を作成ずろことか
てきた。Table 2 Reflection 5J (%) Low-temperature plasma treatment has sharply carved and edged the surface of the raw material in photos x1 and 2, creating a porous layer; , 2nd (1980
, No. 2) JL T Ll SiO and US
02's porous anti-Il-protective functional pus was created.
実施例２
実＃Ｉｌ！ｍｌと同様なハートコーチインク亭オで処理
された透明なプラスチック板およびカラス板についても
実権例１と同様の条件で低温プラスマク３理した結果、
同様な反１１防ｊヒ鴎能が付与され た。Example 2 Real #Il! Transparent plastic plates and glass plates treated with Heart Coach Ink Tei O similar to ml were also subjected to low temperature plasma treatment under the same conditions as Example 1.
A similar anti-11 defense ability was given.
また、実施例１の７クリル系樹脂の代わりに天然樹脂あ
るいは曲の合成ｌＳ１詣を用いても同様な革古果が１４
られた。Moreover, even if a natural resin or a synthetic lS1 of the song is used instead of the 7 acrylic resin of Example 1, the same leather old fruit can be obtained.
It was done.
実１４５！１１のハードコーティング争才にアルミニウ
ム５ｅｅ−フチレート（市販名、へＳＢＤ： 用研フ
ァインケミカル圏製）を加える二とによって反射防＋ｈ
膜特有の色相を変化させることができた。By adding aluminum 5ee-phthalate (commercial name, SBD: manufactured by Yoken Fine Chemical Co., Ltd.) to the hard coating of 145!11, anti-reflection + h is achieved.
It was possible to change the unique hue of the film.
なお、実権例１のフラスマ処理条件の１つτあろ’！；
１７ｉｌ気カスをアルゴンにし、、 ＋１１！：、１
実施例１と同様の条件てフラスマ処理を１〒つた結果、
多少の反射防止効果かえられた。In addition, one of the flame processing conditions in Actual Example 1 is τ Aro'! ;
Convert 17il scum into argon, +11! :, 1
As a result of one flask treatment under the same conditions as in Example 1,
The anti-reflection effect has been slightly improved.
実権例３
エホキシ系樹脂（平、均讃、子ｔ ：３０００ ’）に
エチルアセトアセテートアルミニウムシイソブロヒレー
ト（市販名、入Ｌ（コＨ： 用研ファインケミカル曲％
りを金属含有率が１．０１ｉ ｔ％以−ヒになるよ″）
二二添加したハードコーティング側オで処理された透明
なプラスチックしンス（ＣＦ−３９）およびカラスレン
スを実施例１と同様の条件で低温フラスマ処理した。Actual Example 3 Ethyl acetoacetate aluminum cyisobrohylate (commercial name, Iruri L (ko H: Yoken Fine Chemicals) is added to epoxy resin (Average, Hitoshi, Child T: 3000')
The metal content will be 1.01it% or more'')
Transparent plastic resin (CF-39) and glass glass treated with a hard coating side added with 22% were subjected to low-temperature flask treatment under the same conditions as in Example 1.
１１Ｉと同様な多孔質層の反１１４ ＧＲＩｔ：機能か
付与されたが、その効果は小さい。Anti-114 GRIt of a porous layer similar to 11I: Function was imparted, but the effect was small.
フラスマ処理されていないコーティングプラスチックレ
ンス（試料Ｎｏ−ｌ１ｌ）およびフラズマ処理されたコ
ーティングフラスチソクレンス（試￥ＪＮｏへ・）につ
いて、可現光の反４１率（表４）および透Ｉ／８１ｍ（
表５）を示す。For coated plastic lenses that have not been subjected to the flame treatment (sample No. 11) and coated plastic lenses that have been subjected to the plasma treatment (sample No. 1), the reciprocal ratio of developable light (Table 4) and the transmission I/81 m (
Table 5) is shown.
表 ４ 反 １１＄（％ ）表
透過
墨 （％ ）
なお、上記のハードコーティングを才にエチルホリシリ
ケート霞縮合物を添加したハードコーティング参オで処
理した場合−層の反噌′ｌ防市効果を与えた。また、こ
のコーティングを才にマグネンウムアルコレートＭｇ（
ＯＲ）；を添加した塙合反射防＋ｈ ＩＩＩ特有の色相
を変化させることかでき た。Table 4: 11$ (%) Transparent ink (%) In addition, when the above hard coating is treated with a hard coating to which ethyl phosilicate haze condensate is added - the layer's anti-corrosion effect gave. In addition, with this coating, we can also use magnenium alcoholate Mg (
We were able to change the unique hue of Hanai anti-reflection +h III by adding OR);
及」ＬΩＪＩＪ
本発明の持重は金Ｉｘ！Ｉの真空蒸胃法と言ったば来の
技術を用いないで素材表面領楠のケイ業績系化合物およ
び金属化合物が低温フラスマ処理によって表面活性化さ
れ１次いで反射防止機能を有する５ｉＯ１５１０２なと
の金［１ヒ物の膜が素材表面に容易に本代されるので真
空蒸着の高温やイオンブレーティングの高真空と言った
必要もない、そのため、装置の複雑化と操作の煩１ヒが
なく、熟練を要しない。"LΩJIJ The weight of this invention is gold Ix! The silicon compound and metal compound on the surface of the material are surface-activated by low-temperature flask treatment without using conventional techniques such as the vacuum vaporization method, and then gold such as 5iO15102, which has an antireflection function, is produced. [1] Since the film is easily transferred to the surface of the material, there is no need for high temperatures for vacuum evaporation or high vacuum for ion blating.Therefore, there is no need for complicated equipment or troublesome operations. No skill required.
また、金属の幡寥貢によって反射防止膜の色相が変化す
ることは知られている０例えは、ンリカ系ではマゼンタ
色、１ヒンルコニュ、ラムではグリーン色を呈する。前
記の真空蒸Ｗ法では金属混合物を藺単に蒸胃すにとがて
きないため及側防１ヒ膿の色相を***に変えろことがで
きない、これに対し本発明法で：ｉ、金属製合物のハー
トコート躾に低温プラズマ処理し、反射防止機能を有す
る様々なＭ属１ヒ合物が生成ずろことによって、反利防
ＩＬ膿の色相を任童に変える二とかできると同時に１反
射防止機能も向りさせることかできる。Furthermore, it is known that the hue of the anti-reflection film changes depending on the color of the metal.For example, the anti-reflection film exhibits a magenta color, while the color of the anti-reflection film exhibits a magenta color, and the color of the anti-reflection film exhibits a green color. In the vacuum steaming method described above, it is not possible to change the hue of the metal mixture into a stamp because the metal mixture cannot be steamed easily.In contrast, the method of the present invention: i. By applying low-temperature plasma treatment to the heart coat of the object, various M genus 1 compounds with anti-reflection properties are generated, which can change the hue of the anti-IL pus into an anti-reflective effect at the same time. You can also change the functionality.
また、Ｘ空蒸Ｗ法でｔテった反射防止８Ｉ能付与法では
フラスチック素財の易染性を変え、ｉｌ染性になるのに
対して、本発明法ではプラスチック素側オの易染性を変
えることがないなと多くの特徴を有している。In addition, in the anti-reflection 8I ability imparting method, which is used in the X air vapor W method, the dyeability of the plastic material changes and becomes IL dyeable, whereas in the method of the present invention, the plastic material is easily dyed. It has many characteristics such as never changing its gender.
また素材については、単にＦＪ ｉＥ用レしスに阻ろも
のてなく、例えはサンシャイン計画の１分野である太Ｆ
４ａ＋ｉａ給、鴎藁熱機器なと、その応用範囲は多岐に
、ドパいる。In addition, regarding the material, it is not enough to simply rely on the resin for FJ iE.
The range of applications is wide-ranging, such as 4A + IA power supply and Owara heating equipment.
Claims (1)
酸化物（例えば、ＳｉＯ＿２、Ａｌ＿２Ｏ＿３など）に
なりうる金属化合物の１つ以上を加えたコーティング材
（金属含有率１．０重量％以上）によって処理された、
透明なプラスチック素材およびガラス素材を低温プラズ
マ処理し、素材表面に反射防止機能を付与することを特
徴とした反射防止膜作成法。Treated with a coating material (metal content of 1.0% by weight or more) added by low-temperature plasma treatment to one or more metal compounds that can become metal oxides (e.g. SiO_2, Al_2O_3, etc.) with antireflection function. ,
A method for creating an anti-reflection film characterized by applying low-temperature plasma treatment to transparent plastic and glass materials to impart an anti-reflection function to the surface of the material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63309030A JPH02154201A (en) | 1988-12-07 | 1988-12-07 | Preparation of reflection preventing film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63309030A JPH02154201A (en) | 1988-12-07 | 1988-12-07 | Preparation of reflection preventing film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02154201A true JPH02154201A (en) | 1990-06-13 |
Family
ID=17988037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63309030A Pending JPH02154201A (en) | 1988-12-07 | 1988-12-07 | Preparation of reflection preventing film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02154201A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04191701A (en) * | 1990-11-26 | 1992-07-10 | Akifumi Nishikawa | Antireflection optical material and its manufacture |
| EP0529268A2 (en) * | 1991-08-28 | 1993-03-03 | Leybold Aktiengesellschaft | Anti-reflex hard coating for plastic lenses |
| JP2009276511A (en) * | 2008-05-14 | 2009-11-26 | Renias:Kk | Antireflection resin and production method of the same |
| JP2013003383A (en) * | 2011-06-17 | 2013-01-07 | Nissan Motor Co Ltd | Abrasion-resistant fine structure and method of manufacturing the same |
| CN111690904A (en) * | 2020-06-11 | 2020-09-22 | 国家纳米科学中心 | High-temperature-resistant anti-reflection optical film and preparation method and application thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63128180A (en) * | 1986-11-17 | 1988-05-31 | Canon Inc | Formation of functional thin tin oxide film |
-
1988
- 1988-12-07 JP JP63309030A patent/JPH02154201A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63128180A (en) * | 1986-11-17 | 1988-05-31 | Canon Inc | Formation of functional thin tin oxide film |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04191701A (en) * | 1990-11-26 | 1992-07-10 | Akifumi Nishikawa | Antireflection optical material and its manufacture |
| EP0529268A2 (en) * | 1991-08-28 | 1993-03-03 | Leybold Aktiengesellschaft | Anti-reflex hard coating for plastic lenses |
| JP2009276511A (en) * | 2008-05-14 | 2009-11-26 | Renias:Kk | Antireflection resin and production method of the same |
| JP2013003383A (en) * | 2011-06-17 | 2013-01-07 | Nissan Motor Co Ltd | Abrasion-resistant fine structure and method of manufacturing the same |
| CN111690904A (en) * | 2020-06-11 | 2020-09-22 | 国家纳米科学中心 | High-temperature-resistant anti-reflection optical film and preparation method and application thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW562841B (en) | Multilayer interference pigment with transparent middle layer | |
| MY123962A (en) | Tunable and removable plasma deposited antireflective coatings | |
| JP2009237551A (en) | Anti-reflection coating and its production method | |
| JPH10500609A (en) | High wear resistance and flexible coatings for flexible substrates | |
| JP2007156017A (en) | Transparent film, optical member and manufacturing method of transparent film | |
| US20070059942A1 (en) | Plasma cvd process for manufacturing multilayer anti-reflection coatings | |
| US4091166A (en) | Boron trifluoride coatings for thermoplastic materials and method of applying same in glow discharge | |
| CN105859153A (en) | Antifogging antireflection visible-light double-function coated glass and preparation method thereof | |
| Ducros et al. | Optical performances of antireflective moth-eye structures. Comparison with standard vacuum antireflection coatings for application to outdoor lighting LEDs | |
| JP4337164B2 (en) | Optical product and manufacturing method thereof | |
| JPH02154201A (en) | Preparation of reflection preventing film | |
| JPH07300346A (en) | Antifouling low-reflectance glass and its production | |
| Selhofer et al. | Comparison of pure and mixed coating materials for AR coatings for use by reactive evaporation on glass and plastic lenses | |
| CN113862616A (en) | One-step coating forming method of anti-reflection anti-UV vehicle-mounted display panel | |
| JP2007504500A (en) | Antireflection coating treatment method on optical substrate, coated optical substrate, and coating treatment execution apparatus | |
| JP2010128423A (en) | Optical article and manufacturing method thereof | |
| Hsu et al. | Anti-reflective effect of transparent polymer by plasma treatment with end-hall ion source and optical coating | |
| Zajíčková et al. | Protection coatings for polycarbonates based on PECVD from organosilicon feeds | |
| JPH04247427A (en) | Coating liquid for forming transparent film, base material with film and liquid crystal display cell | |
| JPH0274901A (en) | Method of imparting antireflection function | |
| JP2684364B2 (en) | High refractive index coating film | |
| JPH04191701A (en) | Antireflection optical material and its manufacture | |
| JPS6193402A (en) | Dyed optical article having antireflective property | |
| JPH0823063B2 (en) | Manufacturing method of plastic articles coated with inorganic thin film. | |
| JPS62148339A (en) | Transparent substrate coated with ultraviolet ray absorbing film |