JPH0323458A - Manufacture of electrophotographic sensitive body - Google Patents
Manufacture of electrophotographic sensitive bodyInfo
- Publication number
- JPH0323458A JPH0323458A JP15672089A JP15672089A JPH0323458A JP H0323458 A JPH0323458 A JP H0323458A JP 15672089 A JP15672089 A JP 15672089A JP 15672089 A JP15672089 A JP 15672089A JP H0323458 A JPH0323458 A JP H0323458A
- Authority
- JP
- Japan
- Prior art keywords
- charge
- layer
- electrode
- charge transport
- surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims abstract description 62
- 238000000034 method Methods 0.000 claims abstract description 43
- 230000000903 blocking effect Effects 0.000 claims abstract description 26
- 239000010409 thin film Substances 0.000 claims abstract description 23
- 239000004094 surface-active agent Substances 0.000 claims abstract description 21
- 239000012736 aqueous medium Substances 0.000 claims abstract description 13
- 239000006185 dispersion Substances 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims abstract description 6
- 108091008695 photoreceptors Proteins 0.000 claims description 29
- 239000007772 electrode material Substances 0.000 claims description 11
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical class [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 11
- 230000003381 solubilizing effect Effects 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 239000000969 carrier Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 84
- 238000005868 electrolysis reaction Methods 0.000 description 24
- 239000000693 micelle Substances 0.000 description 21
- -1 polyoxyethylene Polymers 0.000 description 14
- 150000003839 salts Chemical class 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical class [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229920000767 polyaniline Polymers 0.000 description 5
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical class C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical class [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical class [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000011591 potassium Chemical class 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 229910052701 rubidium Inorganic materials 0.000 description 4
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical class [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Chemical class 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000007569 slipcasting Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229910021397 glassy carbon Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000005063 solubilization Methods 0.000 description 2
- 230000007928 solubilization Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000003115 supporting electrolyte Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- MUBKMWFYVHYZAI-UHFFFAOYSA-N [Al].[Cu].[Zn] Chemical compound [Al].[Cu].[Zn] MUBKMWFYVHYZAI-UHFFFAOYSA-N 0.000 description 1
- OBASDBHRXUCXKQ-UHFFFAOYSA-N [F].[Br] Chemical compound [F].[Br] OBASDBHRXUCXKQ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical class [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- UZBQIPPOMKBLAS-UHFFFAOYSA-N diethylazanide Chemical compound CC[N-]CC UZBQIPPOMKBLAS-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 150000005324 oxide salts Chemical class 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は電子写真感光体の製造方法に関し、詳しくは各
種の電荷発生材料及び電荷輸送祠料を素材として、特定
のＨＬＢ （親水性親油性バランス）値の界面活性剤を
用いるとともに、特定の電極にて電気化学的手法を講じ
ることにより、電荷発生層から電荷輸送層へのキャリア
注入速度及びキャリア生成効率を高めた感度の良好な電
子写真感光体を効率よく製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing an electrophotographic photoreceptor. By using a surfactant with a balanced value and using an electrochemical method with a specific electrode, electrophotography with good sensitivity increases the carrier injection rate from the charge generation layer to the charge transport layer and the carrier generation efficiency. The present invention relates to a method for efficiently manufacturing a photoreceptor.
〔従来の技術及び発明が解決しようとする課題］従来か
ら、電子写真感光体として、機能分離型感光体が材料の
選択性が大きく有効なものとして実用化されている。そ
のうち特に電極材料，電荷発生層及び電荷輸送層を順次
積層してなる積層タイプ機能分離型感光体が注目されて
おり、近年その開発が進められている。[Prior Art and Problems to be Solved by the Invention] Conventionally, functionally separated photoreceptors have been put to practical use as electrophotographic photoreceptors, as they have great material selectivity and are effective. Among these, a laminated type functionally separated photoreceptor in which an electrode material, a charge generation layer, and a charge transport layer are sequentially laminated has attracted particular attention, and its development has been progressing in recent years.
このような積層タイプ機能分離型感光体における電荷発
生層や電荷輸送層の形戒方法としては、一般に、蒸着法
，ポリマーバインド法，スリップキャスト法などが知ら
れている。しかし、このうち蒸着法は感光材料の種類に
よっては分解するおそれがあり、また、ボリマーバイン
ド法では、電荷輸送層の製造の際に電荷発生層が剥離し
たり、均一な膜を得るのが非常に困難であるという問題
がある。さらに、スリップキャスト法にあっては、溶媒
等の不純物が入り、その結果、溶媒乾燥時に歪みが生ず
るという問題がある。また、有機溶媒を大量に使用する
ため環境上大きな問題となっている。Vapor deposition methods, polymer binding methods, slip casting methods, and the like are generally known as methods for forming the charge generation layer and charge transport layer in such a laminated type functionally separated photoreceptor. However, with the vapor deposition method, there is a risk of decomposition depending on the type of photosensitive material, and with the polymer binding method, the charge generation layer may peel off during the manufacture of the charge transport layer, and it may be difficult to obtain a uniform film. The problem is that it is extremely difficult. Furthermore, the slip casting method has a problem in that impurities such as solvents enter, resulting in distortion during solvent drying. Furthermore, since large amounts of organic solvents are used, this poses a major environmental problem.
近年、所謂ミセル電解法により、各種の疎水性有機物質
の薄膜を形成する方法が開発されている（電気化学協会
（第５４回）春季大会Ｆ２０１（１９８７）など）。In recent years, methods for forming thin films of various hydrophobic organic substances have been developed by so-called micelle electrolysis (Electrochemical Society of Japan (54th) Spring Conference F201 (1987), etc.).
このミセル電解法は、様々な疎水性物質の蕩膜を効率よ
く製造することができ、工業的に有利な方法として注目
されている。This micelle electrolysis method can efficiently produce membranes of various hydrophobic substances, and is attracting attention as an industrially advantageous method.
この方法は電子写真感光体の製造法として有用なものの
、この手法により製造される電子写真感光体は、帯電さ
せてもすぐに電気を感光体中に注入してしまうため、帯
電電圧が低く、実用レベルに及ばないという欠点があっ
た。Although this method is useful as a method for manufacturing electrophotographic photoreceptors, the electrophotographic photoreceptors manufactured by this method have a low charging voltage because electricity is immediately injected into the photoreceptor even after charging. The drawback was that it did not reach a practical level.
そこで本発明者らは、上記方法の欠点を解消して、高い
電位を帯電させることができ、感度の良好な積層タイプ
機能分離型感光体を製造すべく鋭意研究を重ねた。The inventors of the present invention therefore conducted extensive research in order to eliminate the drawbacks of the above methods and produce a laminated type functionally separated photoreceptor that can be charged to a high potential and has good sensitivity.
その結果、電荷発生層や電荷輸送層を形或するにあたっ
て、特定のＨＬＢ値の界面活性剤を用いて、キャリアの
ブロッキングを行う電極に電荷発生層や電荷輸送層を積
層することによって、目的とする感度の良好な積層タイ
プ機能分離型の電子写真感光体が製造できることを見出
した。As a result, when forming a charge generation layer or a charge transport layer, by using a surfactant with a specific HLB value and laminating the charge generation layer or charge transport layer on an electrode that blocks carriers, it is possible to form a charge generation layer or a charge transport layer to achieve the desired purpose. We have discovered that it is possible to produce a laminated type, functionally separated electrophotographic photoreceptor with good sensitivity.
本発明はかかる知見に基づいて完成したものである。す
なわち、本発明は電極材料に電荷発生層を積層し、次い
で該電荷発生層に電荷輸送層を積層して電子写真感光体
を製造するにあたり、電荷発生材料及び／又は電荷輸送
材料を水性媒体中でＨ Ｌ Ｂ値１０．０〜２０．０の
界面活性剤によって分敗あるいは可溶化して得た分散液
あるいは溶液を、ブロッキング層を禎層したブロッキン
グ電極上に前記材料の薄膜が生成する条件下で通電処理
することによって、前記材料からなる電荷発生層及び／
又は電荷輸送層を形戒することを特徴とする電子写真感
光体の製造方法を提供するものである。The present invention was completed based on this knowledge. That is, in the present invention, when manufacturing an electrophotographic photoreceptor by laminating a charge generation layer on an electrode material and then laminating a charge transport layer on the charge generation layer, the charge generation material and/or the charge transport material are mixed in an aqueous medium. Conditions under which a thin film of the material is formed on a blocking electrode on which a blocking layer is formed by dissolving or solubilizing a dispersion or solution with a surfactant having an HLB value of 10.0 to 20.0. By applying current to the charge generating layer and/or the material made of the above material,
Another object of the present invention is to provide a method for manufacturing an electrophotographic photoreceptor, which is characterized in that the shape of the charge transport layer is changed.
本発明の方法は、電子写真感光体の電荷発生層（Ｃ Ｇ
Ｌ ）と電荷輸送層（ＣＴＬ）の少なくとも一層を、
所謂ミセル電解法で形成するものである。The method of the present invention applies to the charge generation layer (CG) of an electrophotographic photoreceptor.
L) and at least one layer of a charge transport layer (CTL),
It is formed by a so-called micelle electrolysis method.
例えば電荷発生層をミセル電解法で形成する場合には、
薄膜形成素材として電荷発生材料を用いて特定のＨＬＢ
値をもつミセル化剤を使用して、さらにブロッキング層
を積層した電極を用いて、ミセル電解法を適用すればよ
い。つまり、水に必要に応じて支持電解質等を加えて電
気伝導度を調節した水性媒体に、特定のＨ Ｌ Ｂ値を
もつ界面活性剤（ミセル化剤）と電荷発生材料を加えて
充分に混合撹拌して分散させると、該電荷発生材料を内
部にとり込んだミセルが形成され、これを通電処理する
ことによりブロッキング層を積層した電極上に薄膜が形
成される。ここで界面活性剤してフェロセン誘導体を使
用すると、処理効率が高く、また繰り返し使用すること
ができるなど工業的に有利である。For example, when forming the charge generation layer by micelle electrolysis,
A specific HLB using a charge generating material as a thin film forming material
The micelle electrolysis method may be applied by using a micelle agent having a certain value and using an electrode further laminated with a blocking layer. In other words, a surfactant (micellar agent) with a specific HLB value and a charge-generating material are added to an aqueous medium in which electrical conductivity is adjusted by adding a supporting electrolyte as necessary to water, and the mixture is thoroughly mixed. When the mixture is stirred and dispersed, micelles incorporating the charge-generating material are formed, and by applying electricity to the micelles, a thin film is formed on the electrode on which the blocking layer is laminated. The use of a ferrocene derivative as a surfactant is industrially advantageous, as it has high treatment efficiency and can be used repeatedly.
また、電荷輸送層をξセル電解法で形成する場合には、
薄膜形成素材として電荷輸送材料を用いて、以降は上述
した電荷発生層をミセル電解法で形成する場合と同様の
操作を行えば、所望する電荷輸送層が形成される。なお
、この場合、電極として電極材料上に電荷発生層を形成
したものを用いれば、該電荷発生層上に電荷輸送層が積
層され、目的とする電子写真感光体が得られる。In addition, when forming the charge transport layer by the ξ cell electrolysis method,
By using a charge transporting material as the thin film forming material and performing the same operations as in the case of forming the above-described charge generation layer by micelle electrolysis, a desired charge transporting layer can be formed. In this case, if an electrode in which a charge generation layer is formed on an electrode material is used, a charge transport layer is laminated on the charge generation layer, and the intended electrophotographic photoreceptor can be obtained.
さらに、電荷発生層と電荷輸送層の両層を、ミセル電解
法で形成する場合には、まず電荷発生材料を用いてξセ
ル電解法を適用し、ブロッキング層を積層した電極材料
上に電荷発生層を形成して、次に電荷輸送材料を用いて
再度ミセル電解法を適用し、前記電荷発生層の上に電荷
輸送層を積層するように形成して、目的とする電子写真
感光体を製造することとなる。また、この場合ミセル電
解法で電荷輸送層を積層した後、スビンコート法，蒸着
法，キャスト法等の常法により電荷輸送層をさらに形成
してもよい。Furthermore, when forming both the charge generation layer and the charge transport layer by the micelle electrolysis method, the charge generation material is first used to apply the ξ cell electrolysis method to generate charge on the electrode material laminated with the blocking layer. A layer is formed, and then the micelle electrolysis method is applied again using a charge transport material, and a charge transport layer is formed to be laminated on the charge generation layer to produce the desired electrophotographic photoreceptor. I will do it. Further, in this case, after the charge transport layer is laminated by the micelle electrolysis method, a charge transport layer may be further formed by a conventional method such as a spin coating method, a vapor deposition method, a casting method, or the like.
本発明の方法で用いる界面活性剤は所謂ミセル化剤とも
称されるものであって、好ましくはＨ ＬＢ値が１０．
０〜２０．０のものである。ここでＨ ＬＢ値が１０．
０未満のものでは、水に分解しにくいという問題があり
、また２０．０を超えるものでは、水溶液に均一に溶解
し、ミセルを形成しにくいという不都合が生ずる。The surfactant used in the method of the present invention is also called a micellar agent, and preferably has an HLB value of 10.
0 to 20.0. Here, the HLB value is 10.
If it is less than 0, there is a problem that it is difficult to decompose in water, and if it is more than 20.0, it is inconvenient that it is difficult to dissolve uniformly in an aqueous solution and form micelles.
このような界面活性剤としては、各種のものを用いるこ
とができるが、具体的にはフェロセン誘導体，ポリオキ
シエチレンアルキルエーテル，ポリオキシエチレン脂肪
酸エステル，ポリオキシエチレンアルキルフェニルエー
テル，ポリオキシエチレンポリオキシブロビレンアルキ
ルエーテルなどの非イオン系界面活性剤をあげることが
できる。Various types of surfactants can be used, but specific examples include ferrocene derivatives, polyoxyethylene alkyl ethers, polyoxyethylene fatty acid esters, polyoxyethylene alkylphenyl ethers, and polyoxyethylene polyoxy Examples include nonionic surfactants such as brobylene alkyl ether.
その他、アルキル硫酸塩，ポリオキシエチレンアルキル
エーテル硫酸塩，塩化アルキルトリメチルアンモニウム
，脂肪酸ジエチルア２ノエチルア旦ドなどを使用するこ
とも可能である。このうち、前述した如き理由によりフ
ェロセン誘導体が好ましい。このようなフェロセン誘導
体としては、各種のものをあげることができる。例えば
一般式〔式中、ＲＩ及びＲ２はそれぞれ炭素数６以下の
アルキル基，炭素数６以下のアルコキシ基．アミノ基，
ジメチルアミノ基．水．酸基，アセチルアミノ基，カル
ボキシル基．メトキシ力ルボニル基，アセトキシ基，ア
ルデヒド基あるいは／Ｓロゲンを示し、Ｒ３は水素又は
炭素数４〜ｌ８の直鎖あるいは分岐アルキル基又はアル
ケニル基を示し、Ｒ４及びＲ５はそれぞれ水素又はメチ
ル基を示す。Ｙは酸素あるいはオキシカルボニル基を示
し、ａは０〜４の整数，ｂはＯ〜４の整数．ｍは１〜１
８の整数．ｎは２．０〜７０．０の実数を示す。］
で表わされるフェロセン誘導体を代表的なものとしてあ
げることができる。ここで、一般式（１）中の各記号は
前述した通りである。つまり、国際公開Ｗ０８Ｂ／０７
５３Ｂ，Ｗ０８９／０１．９３９，特願昭６３−２３３
７９７号、その他に記載される如く、Ｒｌ及びＲ２はそ
れぞれ炭素数６以下のアルキル基（メチル基（ＣＨｆｆ
），エチル基（Ｃ２ＨＳ）等），アルコキシ基（メトキ
シ基（ＯＣＨ３）， エトキシ基（ＯＣｚＨｓ）等）
５ アミノ基（ＮＨ２）ジメチルアミノ基 （Ｎ（ＣＨ
ｘ）ｚ））１水酸基（○■４），アセチルアミノ基（Ｎ
Ｈ Ｃ Ｏ Ｃ Ｒ，）．カルボキシル基（ＣＯＯＨ
），アセトキシ基（ＯＣＯＣＨ：Ｉ），メトキシ力ルボ
ニルｉ（ＣＯＯＣＨｆｆ），アルデヒド基（ＣＨ○）あ
るいはハロゲン（塩素，臭素フッ素，沃素等）を示す。In addition, it is also possible to use alkyl sulfates, polyoxyethylene alkyl ether sulfates, alkyltrimethylammonium chlorides, fatty acid diethyl amide, and the like. Among these, ferrocene derivatives are preferred for the reasons mentioned above. Various types of ferrocene derivatives can be mentioned. For example, the general formula [wherein RI and R2 are an alkyl group having 6 or less carbon atoms, an alkoxy group having 6 or less carbon atoms, respectively]. amino group,
Dimethylamino group. water. Acid group, acetylamino group, carboxyl group. Methoxy carbonyl group, acetoxy group, aldehyde group or /S rogene, R3 represents hydrogen or a straight chain or branched alkyl group or alkenyl group having 4 to 18 carbon atoms, and R4 and R5 each represent hydrogen or methyl group. . Y represents oxygen or an oxycarbonyl group, a is an integer of 0 to 4, and b is an integer of O to 4. m is 1~1
An integer of 8. n represents a real number from 2.0 to 70.0. ] A typical example is a ferrocene derivative represented by the following. Here, each symbol in general formula (1) is as described above. In other words, international publication W08B/07
53B, W089/01.939, patent application 1986-233
As described in No. 797 and others, Rl and R2 are each an alkyl group having 6 or less carbon atoms (methyl group (CHff
), ethyl group (C2HS), etc.), alkoxy group (methoxy group (OCH3), ethoxy group (OCzHs), etc.)
5 Amino group (NH2) dimethylamino group (N(CH
x) z)) 1 hydroxyl group (○■4), acetylamino group (N
H C O C R, ). Carboxyl group (COOH
), acetoxy group (OCOCH:I), methoxy carbonyl i (COOCHff), aldehyde group (CH○), or halogen (chlorine, bromine fluorine, iodine, etc.).
Ｒ１及びＲ２は同一であっても異なってもよく、さらに
Ｒ１及びＲ２がそれぞれ複数個フェロセンの五員環に存
在した場合にも、複数の置換基がそれぞれ同一であって
も異なっていてもよい。また、Ｒ３は水素又は炭素数４
〜ｌ８の直鎖あいは分岐アルキル基またはアルケニル基
を示している。R1 and R2 may be the same or different, and even if a plurality of R1 and R2 are present in the five-membered ring of ferrocene, the plurality of substituents may be the same or different. . Also, R3 is hydrogen or has 4 carbon atoms.
The straight chain of ~18 represents a branched alkyl group or alkenyl group.
さらにＹは酸素（−０−）又はアジルオキシ基（−Ｃ−
０−）を示し、Ｒ４，ＲＳは水素又はメ１１
０
チル基（ＣＨ３）を示す。従って、
Ｙ−（ＣＨＣＨＯ−）Ｉ，Ｈは、
Ｒ’ Ｒ５
０（ＣＨ．ＣＨ２０），ｌＨ，
０（ＣＨ２ＣＨＯ）ｌｌＨ，−Ｃ
］Ｉ
Ｃ Ｈ， ０
○（Ｃ Ｈ Ｃ Ｈ ｚｏ）。Ｈ
ＣＨ３
等である。Further, Y is oxygen (-0-) or aziloxy group (-C-
0-), and R4 and RS represent hydrogen or a methyl group (CH3). Therefore, Y-(CHCHO-)I,H is R' R5 0(CH.CH20), lH, 0(CH2CHO)llH, -C ]I C H, 0 ○(C H C H zo). H CH3 and the like.
またｍは１〜ｌ８の整数を示す。従って、環員炭素原子
と上記酸素又はオキシカルボニル基との間に、エチレン
基，プロピレン基等の炭素数ｌ〜ｌ８のアルキレン基が
介在したものとなる。さらにｎは上記オキシエチレン基
などのオキシアルキレン基の繰り返し数を示すもので、
２．０〜７０．０の整数のみならず、これらを含む実数
を意味し、オキシアルキレン基などの繰り返し数の平均
値を示すものである。Further, m represents an integer of 1 to 18. Therefore, an alkylene group having 1 to 18 carbon atoms, such as an ethylene group or a propylene group, is interposed between the ring carbon atom and the oxygen or oxycarbonyl group. Furthermore, n indicates the number of repeats of the oxyalkylene group such as the above oxyethylene group,
It means not only integers from 2.0 to 70.0 but also real numbers including these, and indicates the average value of the repeating number of oxyalkylene groups, etc.
本発明に方法で用いるフェロセン誘導体は、上記一般式
（１）で表わされるもののほかに、様々なものがあり、
アンモニウムタイプ，ピリジンクイブ（国際公開Ｗ０８
８／０７５３８等）をはしめ、特願昭６３−２３３７９
７号明細書，同６３−２３３７９８号明細書，同６１−
２４８６００号明細書，同６３−２４８６０１号明細書
，特願平１−４５３７０号明細書，同１−５４９５６号
明細書．同１−７０６８０号明細書．同１７０６８ １
号明細書，同１−７６４９８号明細書および同１−７６
４９９号明細書に記載されたフェロセン誘導体を挙げる
ことができる。There are various ferrocene derivatives used in the method of the present invention in addition to those represented by the above general formula (1),
Ammonium type, pyridine Quib (International Publication W08
8/07538 etc.), patent application No. 63-23379
Specification No. 7, Specification No. 63-233798, Specification No. 61-
Specification No. 248600, Specification No. 63-248601, Specification of Japanese Patent Application No. 1-45370, Specification No. 1-54956. Specification No. 1-70680. 17068 1
Specification of No. 1-76498 and No. 1-76
Mention may be made of the ferrocene derivatives described in No. 499.
本発明の方法では、この界面活性剤の使用濃度は特に制
限はないが、通常はＩＯμＭ〜０．１Ｍ、好ましくは０
．５ｍＭ〜５ｍＭの範囲で選定する。In the method of the present invention, the concentration of this surfactant used is not particularly limited, but is usually IOμM to 0.1M, preferably 0
．． Select in the range of 5mM to 5mM.
また本発明の方法において、使用される電荷発生材料及
び電荷輸送材料としては各種のものが挙げられる。例え
ば電荷発生材料としては、フタロシアニン，フタロシア
ニン金属ｊｌ，ペリレン，セレン．硫化カドミニウム．
アントラセン，アントラキノン．インジゴ．チオインジ
ゴ，スクワリリウム，ジクロ口ヘンジジン，チアピリリ
ウムボルフィリン，ボルフィリン金属錯体等の化合物あ
るいはその誘導体、さらにはこれらの化合物や誘導体を
置換基として含有する重合体，共重合体、または前記化
合物や誘導体と各種重合体，共重合体とのブレンド物な
どがあげられる。また、電荷輸送材料としては、インド
リン，キノリン，トリフェニルアξン，ビスアヅ，ピラ
ゾール，ピラゾリン，オキサジアゾール，チアゾール，
イミダゾール，ヒドラゾン，トリフエニルメタン，カル
ハゾール，ヘンズアルデヒド等の化合物あるいはその誘
導体、さらにはこれらの化合物や誘導体を置換基として
含有する重合体．共重合体、または前記化合物や誘導体
と各種重合体．共重合体とのブレンド物などがあげられ
る。Further, in the method of the present invention, various charge generating materials and charge transporting materials can be used. For example, charge generating materials include phthalocyanine, phthalocyanine metal, perylene, selenium. Cadmium sulfide.
Anthracene, anthraquinone. indigo. Compounds such as thioindigo, squarylium, dichlorohenzidine, thiapyrylium volphyrin, voluphyline metal complex, etc., or derivatives thereof, as well as polymers and copolymers containing these compounds or derivatives as substituents, or various combinations with the above compounds and derivatives. Examples include blends with polymers and copolymers. In addition, charge transport materials include indoline, quinoline, triphenylane, bisuzu, pyrazole, pyrazoline, oxadiazole, thiazole,
Compounds such as imidazole, hydrazone, triphenylmethane, carhazole, henzaldehyde, etc., or derivatives thereof, and polymers containing these compounds or derivatives as substituents. Copolymers, or various polymers with the above compounds or derivatives. Examples include blends with copolymers.
本発明においてこれらの電荷発生材料及び電荷輸送材料
、すなわち薄膜の形成材料の濃度は、電解時間．材料の
種Ｌ”ｉｉＪ膜の所望の厚さなどによって異なるが、通
常は１μＭ−ＩＭ、好ましくは１００μＭ〜１００ｍＭ
程度である。In the present invention, the concentrations of these charge-generating materials and charge-transporting materials, that is, the thin film forming materials, are determined by the electrolysis time. Although it varies depending on the type of material L"iiJ and the desired thickness of the film, it is usually 1 μM-IM, preferably 100 μM to 100 mM.
That's about it.
本発明の方法では、まず水性媒体中に上記の界面活性剤
ならびに電荷発生材料あるいは電荷輸送材料等の薄膜形
成材料を、所定の濃度となるように加えて、超音波，ホ
モジナイザーあるいは撹拌機等により充分に分散あるい
は可溶化させてミセルを形成せしめ、その後必要に応し
て過剰の簿膜形戒材料を除去し、電荷発生材料あるいは
電荷輸送材料の分散液あるいは溶液を製造する。ここで
水性媒体としては、水をはしめ、水とアルコールとの混
合液，水とアセトンの混合液など様々な媒体を挙げるこ
とができる。In the method of the present invention, first, the above-mentioned surfactant and a thin film-forming material such as a charge-generating material or a charge-transporting material are added to an aqueous medium to a predetermined concentration, and the mixture is heated using an ultrasonic wave, a homogenizer, a stirrer, etc. After sufficient dispersion or solubilization to form micelles, excess membrane-forming material is removed if necessary to produce a dispersion or solution of the charge generating material or charge transporting material. Here, the aqueous medium includes various media such as water, a mixture of water and alcohol, and a mixture of water and acetone.
また、ここでは、水性媒体の電気伝導度を調節するため
に必要に応じて支持塩（支持電解質）を加えることもで
きる。この支持塩の添加量は、可溶化あるいは分散して
いる薄膜の形成材料の析出を妨げない範囲であればよく
、通常は上記界面活性剤のＯ〜３００倍程度の濃度、好
ましくはｌ０〜２００倍程度の濃度を目安とする。この
支持塩を加えずに通電を行うこともできるが、この場合
支持塩を含まない純度の高い薄膜が得られる。また、支
持塩を用いる場合、その支持塩の種類は、可溶化の進行
や電極への前記薄膜形成材料の析出を妨げることなく、
水性媒体の電気伝導度を調節しうるちのであれば特に制
限はない。Further, here, a supporting salt (supporting electrolyte) can be added as necessary to adjust the electrical conductivity of the aqueous medium. The amount of supporting salt added may be within a range that does not interfere with the precipitation of the thin film forming material that has been solubilized or dispersed, and is usually at a concentration of 0 to 300 times that of the surfactant, preferably 10 to 200 times. Aim for about twice the concentration. Although it is also possible to conduct current application without adding this supporting salt, in this case a highly pure thin film containing no supporting salt can be obtained. In addition, when using a supporting salt, the type of the supporting salt can be selected without hindering the progress of solubilization or precipitation of the thin film forming material on the electrode.
There is no particular restriction as long as the electrical conductivity of the aqueous medium can be adjusted.
具体的には、一般広く支持塩として用いられている硫酸
塩（リチウム，カリウム，ナトリウム，ルビジウム，ア
ルミニウムなどの塩）．酢酸塩（リチウム，カリウム，
ナトリウム，ルビジウム，ベリリウム．マグネシウム，
カルシウム，ストロンチウム．バリウム，アルミニウム
などの塩），ハロゲン化物塩（リチウム，カリウム，ナ
トリウム，ルビジウム，カルシウム，マグネシウム，ア
ルミニウムなどの塩），水溶性酸化物塩（リチウム，カ
リウム．ナトリウム，ルビジウム，カルシウム，マグネ
シウム，アルξニウムなどの塩）が好適である。また、
（Ｒ）３ＮＢＦ．（Ｒはメチル基，エチル基，イソプロ
ビル基， ｔｅｒｔ−プチル基などのアルキル基を示す
。）で表されるフン化ホウ素のアンモニウム化合物など
も使用することができる。Specifically, sulfates (salts of lithium, potassium, sodium, rubidium, aluminum, etc.) are commonly used as supporting salts. Acetate (lithium, potassium,
Sodium, rubidium, beryllium. magnesium,
Calcium, strontium. salts of barium, aluminum, etc.), halide salts (salts of lithium, potassium, sodium, rubidium, calcium, magnesium, aluminum, etc.), water-soluble oxide salts (lithium, potassium, sodium, rubidium, calcium, magnesium, aluminum ξ salts such as Ni) are preferred. Also,
(R)3NBF. (R represents an alkyl group such as a methyl group, an ethyl group, an isoprobyl group, or a tert-butyl group.) An ammonium compound of boron fluoride can also be used.
さらに、水性媒体中に所望に応して適量のパインダーボ
リマーを加えて、形成する電荷発生層や電荷輸送層中の
取り込ませ、それらの機械的強度を高めることも有効で
ある。ここで使用できるパインダーポリマーとしては、
薄膜形戒素材が電荷発生材料のときは、ポリビニルブチ
ラール．ポリメチルメタクリレート，ポリエステル，ポ
リ塩化ビニリデン，ボリア短ド，スチレンー無水マレイ
ン酸重合体などをあげることができ、また薄膜形成素材
が電荷輸送材料のときは、ポリスルホン，アクリル樹脂
，メタクリル樹脂，ポリ塩化ビニル，ポリ酢酸ビニル，
フェノール樹脂．エポキシ樹脂，ボリカーボネート樹脂
，アルキド樹脂，ポリウレタン樹脂などをあげることが
できる。Furthermore, it is also effective to add an appropriate amount of a binder polymerer to the aqueous medium as desired to incorporate it into the charge generation layer or charge transport layer to be formed, thereby increasing their mechanical strength. The binder polymers that can be used here include:
When the thin film material is a charge generating material, polyvinyl butyral is used. Examples include polymethyl methacrylate, polyester, polyvinylidene chloride, boria shortened, styrene-maleic anhydride polymer, and when the thin film forming material is a charge transport material, polysulfone, acrylic resin, methacrylic resin, polyvinyl chloride. , polyvinyl acetate,
Phenolic resin. Examples include epoxy resin, polycarbonate resin, alkyd resin, and polyurethane resin.
このようにして得られる分散液あるいは？８液に若干の
撹拌を加えながらブロッキング層を積層した電極を用い
て電解処理する。Dispersion obtained in this way or? Electrolytic treatment is performed using an electrode laminated with a blocking layer while slightly stirring the 8 liquid.
本発明においては、電極としてブロッキング層を積層し
たもの（ブロッキング電極）を用いる。In the present invention, an electrode in which blocking layers are laminated (blocking electrode) is used.
このような電極を用いることにより、得られる電子写真
感光体の性能が向上する。ブロンキング電極は、通常は
次の如き操作により得られる。By using such an electrode, the performance of the resulting electrophotographic photoreceptor is improved. A bronking electrode is usually obtained by the following operation.
まず、基本となる電極については、通常のミセル電解法
で用いられるものであれば特に制限なく使用できる。例
えば、賜極としてはＩＴＯ（酸化インジウムと酸化スズ
との混合酸化物），白金．銀グラシーカーボン，導電性
金属酸化物，有機ポリマー導電体等及び結晶シリコン，
アモルファスシリコン等の半導体が好適である。また、
陰極としてはアルミニウム，銅，亜鉛，鉄，ニッケル．
マグネシウム，白金．銀．グラシーカーボン，導電性金
属酸化物，有機ボリマー導電体等及び結晶シリコン，ア
モルファスシリコン等の半ｓ体などが挙げられる。本発
明の方法では、上記ブロッキング電極を、条件を適宜選
沢することにより、陽極，陰極のいずれにも適用できる
。First, the basic electrode can be used without any particular restriction as long as it is used in normal micelle electrolysis. For example, suitable electrodes include ITO (mixed oxide of indium oxide and tin oxide), platinum. Silver glassy carbon, conductive metal oxides, organic polymer conductors, etc. and crystalline silicon,
Semiconductors such as amorphous silicon are suitable. Also,
Aluminum, copper, zinc, iron, and nickel are used as the cathode.
Magnesium, platinum. Silver. Examples include glassy carbon, conductive metal oxides, organic polymer conductors, and semi-s-forms such as crystalline silicon and amorphous silicon. In the method of the present invention, the blocking electrode can be applied to either the anode or the cathode by appropriately selecting the conditions.
次いで、これらの電極にブロッキング層（材料）を積層
する。プロソキング材料としては種々のものが使用でき
るが、通常ポリビロール．ポリアニリン．ポリチオフエ
ンなどが用いられる。これらの積層は種々の手法により
行われる。例えば、これらのブロッキング材料をスピン
コート法により電極上に積層してもよく、あるいはこれ
らブロッキング材料の七ノマーを水，アセトニトリル．
プロピレンカーボネート，ジメチルホルムアミド，テト
ラヒドロフランなどの溶媒に０．１〜１Ｍ程度に溶解し
、通電処理することにより電解重合してボリマー層を電
極上に形成してもよい。ここで、電解重合条件としては
、液温をＯ〜８０゜Ｃとし、定電位電解では電圧を±０
，５〜±５．０■に設定し、また定電流電解では電流密
度±１ ０ ｕ Ａ ／ｃＪ〜±１０ｍＡ／ｄに設定す
ればよい。Next, a blocking layer (material) is laminated on these electrodes. Various materials can be used as the prosoking material, but polyvirol is usually used. Polyaniline. Polythiophene and the like are used. These laminations are performed by various methods. For example, these blocking materials may be laminated onto an electrode by spin coating, or heptamers of these blocking materials may be mixed with water, acetonitrile, etc.
A polymer layer may be formed on the electrode by dissolving it in a solvent such as propylene carbonate, dimethylformamide, or tetrahydrofuran to a concentration of about 0.1 to 1 M, and subjecting it to electrolytic polymerization by applying electricity. Here, the electrolytic polymerization conditions include a liquid temperature of 0 to 80°C, and a voltage of ±0 in constant potential electrolysis.
, 5 to ±5.0■, and in constant current electrolysis, the current density may be set to ±10 u A /cJ to ±10 mA/d.
このようにして電極上にブロッキング材料が積層され、
ブロッキング電極が形成される。ここで、ブロッキング
層の厚さは積層条件により異なるが通常は１０〜１μｍ
程度である。In this way, the blocking material is laminated on the electrode,
A blocking electrode is formed. Here, the thickness of the blocking layer varies depending on the lamination conditions, but is usually 10 to 1 μm.
That's about it.
なお、本発明の方法で電極としてアルミニウムを使用す
る場合は、酸化膜があるため、ブロッキングを必ずしも
必要とはしない。Note that when aluminum is used as an electrode in the method of the present invention, blocking is not necessarily required because of the presence of an oxide film.
本発明はこのようにして得られたブロッキング電極を用
いて、上述の薄膜の形成材料の電解液中にて通電処理し
て電荷発生層及び／あるいは電荷輸送層を形成する。電
解条件は、該ブロッキング材料を積層した電極上に電荷
発生層及び／あるいは電荷輸送層を形成し得る条件であ
れば特に制限ない。各種状況に応して適宜選定すればよ
いが、通常は液温０〜１ ０ ０ ’Ｃ、好ましくは５
〜８０℃であり、また電圧は使用する界面活性剤の酸化
還元電位以上で水素発生電位以下の電圧、具体的には０
．０３〜Ｉ． ０ ０ Ｖ、好ましくは０．１５〜０．
７■とし、’ｉｔ流密度は１０ｍＡ／ｃ一以下、好まし
くは５０〜３００μＡ／ｃｉとする。In the present invention, using the blocking electrode thus obtained, a charge generation layer and/or a charge transport layer is formed by applying current to the above-mentioned thin film forming material in an electrolytic solution. The electrolytic conditions are not particularly limited as long as they can form a charge generation layer and/or a charge transport layer on the electrode laminated with the blocking material. It may be selected as appropriate depending on various situations, but usually the liquid temperature is 0 to 100'C, preferably 5.
~80°C, and the voltage is higher than the oxidation-reduction potential of the surfactant used and lower than the hydrogen generation potential, specifically 0.
．． 03-I. 0 0 V, preferably 0.15-0.
7■, and the current density is 10 mA/c or less, preferably 50 to 300 μA/ci.
この電解処理を行うと、ミセル電解法の原理にしたがっ
た反応が進行する。例えば、界面活性剤としてフエロセ
ン誘導体を使用した場合、陽極ではフエロセンのＦｅ”
がＦｅ ２ ＋となって、ξセルが崩壊し，薄膜形成材
料の粒子（３００〜２０００人程度）が陽極上に析出す
る。一方、陰極では陽極で酸化されたＦ ｅ”がＦｅ”
に還元されてもとのミセルに戻るので、繰返し同じ溶液
で製膜操作を行うことができる。また、条件を変えれば
、陰極上にも薄膜形成材料の薄膜が製造できる。When this electrolytic treatment is performed, a reaction proceeds according to the principle of micellar electrolysis. For example, when a ferrocene derivative is used as a surfactant, the Fe" of ferrocene is used at the anode.
becomes Fe 2 +, the ξ cell collapses, and particles (approximately 300 to 2000 particles) of the thin film forming material are deposited on the anode. On the other hand, at the cathode, Fe" oxidized at the anode becomes Fe"
Since the solution returns to the original micelle, membrane forming operations can be performed repeatedly using the same solution. Furthermore, by changing the conditions, a thin film of the thin film forming material can be produced also on the cathode.
このような電解処理により、電極材料上には所望する電
荷発生材料を使用した時には電荷発生層あるいは電荷輸
送材料を使用した時には電荷輸送層が形成される．
前述したように、本発明の方法では、電荷発生層と電荷
輸送層のいずれか一層あるいは両層をミセル電解法で形
或すればよいが、両層とも名セル電解法で形成したもの
でもよい。By such electrolytic treatment, a charge generation layer is formed on the electrode material when a desired charge generation material is used, or a charge transport layer is formed when a charge transport material is used. As mentioned above, in the method of the present invention, either one or both of the charge generation layer and the charge transport layer may be formed by micelle electrolysis, but both layers may be formed by cell electrolysis. .
ここで、電荷発生層のみをミセル電解法で形或する場合
は、まず、電極材料上にミセル電解法で電荷発生層を形
成せしめ、次いで、従来の方法（スビンコート法，スリ
ップキャスト法，ポリマーバインド法，蒸着法等）にし
たがって電荷輸送層を電荷発生層上に積層すればよい。Here, when forming only the charge generation layer by the micelle electrolysis method, the charge generation layer is first formed on the electrode material by the micelle electrolysis method, and then the conventional method (subin coating method, slip casting method, polymer binding method) is used. The charge transport layer may be laminated on the charge generation layer according to the method (method, vapor deposition method, etc.).
また、電荷輸送層のみをミセル電解法で形或する場合は
、まず、電極材料上に従来法にて電荷発生層を形成せし
め、次いで、ξセル電解法で電荷輸送層を電荷発生層上
に積層するように形成すればよい。In addition, when forming only the charge transport layer by micelle electrolysis, first, a charge generation layer is formed on the electrode material by a conventional method, and then the charge transport layer is formed on the charge generation layer by ξ cell electrolysis. What is necessary is just to form it so that it may laminate|stack.
なお、本発明の方法では、電極材料上に電荷発生層を形
成した後、その上に電荷輸送層を形戊するに先立って、
両層の間に必要に応じて接着層を介在させることもでき
る。この接着層はボリア果ド，ニトロセルロース，カゼ
イン，ポリビニルアルコールなどから構戒される。In addition, in the method of the present invention, after forming the charge generation layer on the electrode material and before forming the charge transport layer thereon,
An adhesive layer can also be interposed between both layers, if necessary. This adhesive layer is made of boria, nitrocellulose, casein, polyvinyl alcohol, etc.
さらに本発明で得られる電荷発生層あるいは電荷輸送層
は、形成後洗浄することが好ましい。これらの層の洗浄
方法としては様々な方法がある。Furthermore, the charge generation layer or charge transport layer obtained in the present invention is preferably washed after formation. There are various methods for cleaning these layers.
具体的には、水，メタノール，エタノール．アセトン．
アセトニトリル，ＴＨＦ，ＤＭＦ，｝ルエンなどの溶媒
で洗浄する方法、通電することにより洗浄する方法、超
音波での洗浄方法などである。Specifically, water, methanol, and ethanol. acetone.
Examples include a method of cleaning with a solvent such as acetonitrile, THF, DMF, and toluene, a method of cleaning by applying electricity, and a method of cleaning with ultrasonic waves.
このようにして、電極上にブロッキング層／電荷発生層
／ｉｔ荷輸送層からなる層を形成した感光体を製造する
ことができる。In this way, a photoreceptor can be manufactured in which a layer consisting of a blocking layer/charge generation layer/IT charge transport layer is formed on an electrode.
次に本発明を実施例及び比較例により、さらに詳しく説
明する．
実施例ｌ
１００−の水にＦＰＥＧ（下記式Ａで表される化合物）
を加え、２ｍＭ溶液とし、このミセル溶液２０ｄに銅フ
タ口シアニン（東京化成■製）を０．１ｇ加え、超音波
で１０分間攪拌して分散，可溶化させた。さらに、スタ
ーラーで二昼夜攪拌した後、臭化リチウムを加え、０．
１モル／ｌの支持塩濃度に調整した。この溶液を充分撹
拌し、電解液とした。Next, the present invention will be explained in more detail with reference to Examples and Comparative Examples. Example 1 FPEG (compound represented by the following formula A) in 100- water
was added to make a 2mM solution, and 0.1 g of copper cap cyanine (manufactured by Tokyo Kasei ■) was added to 20 d of this micelle solution, and the mixture was stirred with ultrasonic waves for 10 minutes to disperse and solubilize. Furthermore, after stirring with a stirrer for two days and nights, lithium bromide was added and 0.
The supporting salt concentration was adjusted to 1 mol/l. This solution was sufficiently stirred to form an electrolytic solution.
一方、ＩＴＯ透明ガラス電極を陽極、白金を陰極として
、アニリン０，ＩＭ及びテトラエチルアンモニウムテト
ラフルオロボレー｝０．１Ｍを含む水に浸漬し、電流密
度０．１ｍＡ／ｃｆｆｌで定電流電解して、０．１クー
ロン（ Ｃ ） ／ ｃｉの電荷量を通電し、ボリアニ
リンの薄膜（ブロッキング層）をＩＴＯ透明ガラス電極
上に生威させた。膜厚は４０００人であった。On the other hand, an ITO transparent glass electrode was used as an anode and platinum was used as a cathode, and the electrode was immersed in water containing 0.1 M of aniline and 0.1 M of tetraethylammonium tetrafluoroborey, and constant current electrolysis was carried out at a current density of 0.1 mA/cffl. A charge amount of .1 coulomb (C)/ci was applied to form a thin film (blocking layer) of polyaniline on the ITO transparent glass electrode. The film thickness was 4000 people.
このようにして得られたポリアニリン層を積層したＩＴ
Ｏ透明ガラス電極を陽極とし、白金を陰極として、上記
電解液に浸漬し、電流密度０．１ｍ Ａ ／ ｃｉで定
電流電解して、０．０５Ｃ／ｃｎｌの電荷量を通電した
。その結果、電極に０．１μｍの銅フタ口シアニンの層
（電荷発生層）が積層された。IT laminated with polyaniline layers obtained in this way
The O2 transparent glass electrode was used as an anode and platinum was used as a cathode, and the electrode was immersed in the above electrolytic solution, and constant current electrolysis was carried out at a current density of 0.1 mA/ci to pass a charge amount of 0.05 C/cnl. As a result, a 0.1 μm copper capped cyanine layer (charge generation layer) was laminated on the electrode.
さらに、この電極（銅フタ口シアニン／ボリアニリン／
ＩＴＯ透明ガラス電極）を水で洗浄後、乾燥してその上
にポリビニルカルバゾールｌｌｗｔ％を含むクロロベン
ゼン溶液をスピンコートし、厚さ１０μｍの薄膜（電荷
輸送層）を形成した。Furthermore, this electrode (copper cap cyanine/boriananiline/
The ITO transparent glass electrode (ITO transparent glass electrode) was washed with water, dried, and a chlorobenzene solution containing 11 wt % polyvinylcarbazole was spin-coated thereon to form a 10 μm thick thin film (charge transport layer).
このようにして、ＩＴ○透明ガラス電極上に順次ポリア
ニリン（ブロッキング材料）．銅フタ口シアニン（電荷
発生層），ポリビニル力ルバゾール（電荷輸送層）を積
層した感光体を得た。In this way, polyaniline (blocking material) is sequentially placed on the IT○ transparent glass electrode. A photoreceptor was obtained in which copper cyanine (charge generation layer) and polyvinyl Rubazole (charge transport layer) were laminated.
この感光体の性能評価をターンテーブル型帯電測定装置
（川口電機製，ＳＰ４２８型）を用いて次のように行っ
た。即ち、この感光体に電圧−８ｋＶでコロナ帯電を行
って、感光体表面を負に帯電させた。この時の表面電位
は−８８０Ｖであった。またこの表面に波長６１０ｎｍ
または６３０ｎｍの光（出力１μＷ）を照射して、半減
露光強度を求めたところ１３６μＪ／ｃｔＪであった。The performance of this photoreceptor was evaluated using a turntable charge measuring device (manufactured by Kawaguchi Electric, Model SP428) as follows. That is, this photoreceptor was corona charged at a voltage of -8 kV to negatively charge the surface of the photoreceptor. The surface potential at this time was -880V. Also, this surface has a wavelength of 610 nm.
Alternatively, 630 nm light (output 1 μW) was irradiated, and the half-reduced exposure intensity was determined to be 136 μJ/ctJ.
比較例１
実施例１においてポリアニリンの層（ブロッキング層）
を形成しなかったこと以外は、実施例１と同様にしてＩ
ＴＯ透明ガラス電極上に順次１［４フタ口シアニン（電
荷発生Ｎ），ポリビニル力ルハゾール（電荷輸送層）を
積層した感光体を得た。Comparative Example 1 Polyaniline layer (blocking layer) in Example 1
I was prepared in the same manner as in Example 1 except that I was not formed.
A photoreceptor was obtained in which 1[4 capacitor cyanine (charge generation N) and polyvinyl ruhasol (charge transport layer) were sequentially laminated on a TO transparent glass electrode.
この感光体を実施例１と同様にして性能評価を行った。The performance of this photoreceptor was evaluated in the same manner as in Example 1.
表面電位は−４２０Ｖ，半減露光強度は２９０μＪ／ｃ
一であった．
〔発明の効果〕
以上の如く、本発明の方法によれば、種々の界面活性剤
を用いて、高い帯電電位を有する感度の良好な感光体を
効率良く製造することができる。Surface potential is -420V, half-decreased exposure intensity is 290μJ/c
It was one. [Effects of the Invention] As described above, according to the method of the present invention, a photoreceptor having a high charging potential and good sensitivity can be efficiently produced using various surfactants.
したがって、本発明の方法で製造される感光体は、コピ
ー用等の感光ドラムやレーザープリンターなどに幅広く
かつ有効に利用される。Therefore, the photoreceptor produced by the method of the present invention can be widely and effectively used in photoreceptor drums for copying, laser printers, and the like.
ヒ二Hiji
Claims (5)
生層に電荷輸送層を積層して電子写真感光体を製造する
にあたり、電荷発生材料及び／又は電荷輸送材料を水性
媒体中でＨＬＢ値１０．０〜２０．０の界面活性剤によ
って分散あるいは可溶化して得た分散液あるいは溶液を
、ブロッキング層を積層したブロッキング電極上に前記
材料の薄膜が生成する条件下で通電処理することによっ
て、前記材料からなる電荷発生層及び／又は電荷輸送層
を形成することを特徴とする電子写真感光体の製造方法
。(1) When producing an electrophotographic photoreceptor by laminating a charge generation layer on an electrode material and then laminating a charge transport layer on the charge generation layer, the charge generation material and/or the charge transport material are subjected to HLB in an aqueous medium. A dispersion or solution obtained by dispersing or solubilizing with a surfactant having a value of 10.0 to 20.0 is subjected to electrical current treatment under conditions such that a thin film of the material is formed on a blocking electrode on which a blocking layer is laminated. A method for manufacturing an electrophotographic photoreceptor, comprising forming a charge generation layer and/or a charge transport layer made of the above material.
あるいは可溶化し、得られる分散液あるいは溶液を電解
することによって、前記材料の薄膜からなる電荷発生層
を電極材料上に形成する請求項１記載の製造方法。(2) A charge generating layer consisting of a thin film of the material is formed on the electrode material by dispersing or solubilizing the charge generating material in an aqueous medium with a surfactant and electrolyzing the resulting dispersion or solution. The manufacturing method according to claim 1.
あるいは可溶化し、得られる分散液あるいは溶液を電解
することによって、前記材料の薄膜からなる電荷輸送層
を形成する請求項１記載の製造方法。(3) A charge transport layer made of a thin film of the material is formed by dispersing or solubilizing the charge transport material in an aqueous medium with a surfactant and electrolyzing the resulting dispersion or solution. manufacturing method.
あるいは可溶化し、得られる分散液あるいは溶液を電解
することによって、前記電荷発生材料の薄膜からなる電
荷発生層を電極材料上に形成し、次いで電荷輸送材料を
水性媒体中で界面活性剤にて分散あるいは可溶化し、得
られる分散液あるいは溶液を電解することによって、前
記電荷輸送材料の薄膜からなる電荷輸送層を、前記電荷
発生層上に形成する請求項１記載の製造方法。(4) A charge generation layer consisting of a thin film of the charge generation material is formed on the electrode material by dispersing or solubilizing the charge generation material in an aqueous medium with a surfactant and electrolyzing the resulting dispersion or solution. A charge transport layer consisting of a thin film of the charge transport material is formed by dispersing or solubilizing the charge transport material in an aqueous medium with a surfactant and electrolyzing the resulting dispersion or solution. 2. The manufacturing method according to claim 1, wherein the manufacturing method is formed on a generation layer.
剤である請求項１〜４のいずれかに記載の製造方法。(5) The manufacturing method according to any one of claims 1 to 4, wherein the surfactant is a micellizing agent comprising a ferrocene derivative.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15672089A JPH0323458A (en) | 1989-06-21 | 1989-06-21 | Manufacture of electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15672089A JPH0323458A (en) | 1989-06-21 | 1989-06-21 | Manufacture of electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0323458A true JPH0323458A (en) | 1991-01-31 |
Family
ID=15633863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15672089A Pending JPH0323458A (en) | 1989-06-21 | 1989-06-21 | Manufacture of electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0323458A (en) |
-
1989
- 1989-06-21 JP JP15672089A patent/JPH0323458A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5203974A (en) | Process for producing thin films | |
| US5122247A (en) | Process for producing thin films | |
| JPH0359998B2 (en) | ||
| JPH0832320B2 (en) | Thin film manufacturing method | |
| JPH0323458A (en) | Manufacture of electrophotographic sensitive body | |
| JPH05333575A (en) | Electrophotographic sensitive body | |
| CN112286016B (en) | Single-layer electropositive organic photosensitive drum and preparation method thereof | |
| JP2885467B2 (en) | Method for producing thin film and electrophotographic photoreceptor | |
| JPH0468626B2 (en) | ||
| JP2738457B2 (en) | Thin film manufacturing method | |
| JPH0430172A (en) | Manufacture of thin film and electrophotographic sensitive body | |
| JPH068516B2 (en) | Thin film manufacturing method | |
| JPH0826476B2 (en) | Organic thin film manufacturing method | |
| JPH0296585A (en) | Novel ferrocene derivative, surfactant and production of organic thin film | |
| JPH02258843A (en) | Washing of thin film | |
| JPH02173295A (en) | Production of thin film | |
| JPH0794718B2 (en) | Organic thin film manufacturing method | |
| JPH05249707A (en) | Production of photosensitive body | |
| JPH07181704A (en) | Electrophotographic photoreceptor and its production | |
| JPH02163745A (en) | Production of electrophotographic photosensitive body | |
| JPH05241356A (en) | Production of photosensitive body | |
| JPH02164435A (en) | Production of thin membrane | |
| JPH08211643A (en) | Electrophotographic photoreceptor and its production | |
| JPH0283386A (en) | Novel ferrocene derivative, surfactant containing the same derivative and production of organic thin film | |
| JPH0751594B2 (en) | Novel ferrocene derivative, production method thereof and thin film production method |