JPH03146435A - Glass for substrate - Google Patents
Glass for substrateInfo
- Publication number
- JPH03146435A JPH03146435A JP28596289A JP28596289A JPH03146435A JP H03146435 A JPH03146435 A JP H03146435A JP 28596289 A JP28596289 A JP 28596289A JP 28596289 A JP28596289 A JP 28596289A JP H03146435 A JPH03146435 A JP H03146435A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- viscosity
- chemical resistance
- na2o
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 64
- 239000000758 substrate Substances 0.000 title claims abstract description 19
- 239000000126 substance Substances 0.000 claims abstract description 21
- 239000003513 alkali Substances 0.000 claims description 25
- 238000010828 elution Methods 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000000465 moulding Methods 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 13
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract description 8
- 230000004888 barrier function Effects 0.000 abstract description 5
- 239000007791 liquid phase Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 229910011255 B2O3 Inorganic materials 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052593 corundum Inorganic materials 0.000 abstract description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 abstract 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 abstract 1
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 5
- 238000006124 Pilkington process Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 206010040925 Skin striae Diseases 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000008395 clarifying agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、主に液晶やエレクトロルミネセンスのデイス
プレィ、太陽電池、イメージセンサ等の電子機器装置の
基板として用いられる基板用ガラスに関するものである
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to substrate glass used mainly as a substrate for electronic devices such as liquid crystal or electroluminescent displays, solar cells, and image sensors. .
［従来技術とその問題点コ
従来より液晶やエレクトロルミネセンスのデイスプレィ
、太陽電池、イメージセンサ等の電子機器装置に用いら
れるガラス基板としては、板厚が２問以下のソーダライ
ムガラス、低アルカリガラスまたは無アルカリガラスの
薄板が用いられている。その中でもソーダライムガラス
は安価であるため大量に生産されているが、ガラスのア
ルカリ溶出量が高いために電子機器装置の素子特性がア
ルカリイオンによって損なわれるという問題を引き起こ
す。通常５Ｉ０２等のバリヤー被膜を表面に施してこれ
らの問題を回避しているが、８１０□等のバリヤー被膜
は高価なうえに、ピンホール等の発生を皆無にすること
が難しく、被膜のバリヤー効果の信頼性が低くなるとい
う欠点がある。そこで高い信頼性を必要とする電子機器
装置の場合、アルカリ溶出量の少ない低アルカリガラス
または無アルカリガラスを基板として使用する例が多い
。[Prior art and its problems] Soda lime glass and low alkali glass with a thickness of 2 mm or less have traditionally been used as glass substrates for electronic devices such as liquid crystal and electroluminescent displays, solar cells, and image sensors. Alternatively, a thin plate of alkali-free glass is used. Among them, soda lime glass is produced in large quantities because it is inexpensive, but the high amount of alkali elution from the glass causes the problem that the element characteristics of electronic devices are impaired by alkali ions. Normally, these problems are avoided by applying a barrier coating such as 5I02 to the surface, but barrier coatings such as 810□ are expensive, and it is difficult to completely eliminate the occurrence of pinholes, etc., and the barrier coating effect of the coating is The disadvantage is that the reliability is low. Therefore, in the case of electronic devices that require high reliability, low-alkali glass or alkali-free glass, which has a small amount of alkali elution, is often used as a substrate.
ところでガラスを２ｍｍ以下の薄板状に成形するには、
すＶロー法、フュージョン法、スロットダウンドロー法
、ロールアウト法、フロート法等の成形法が公知である
。一般に、液相温度を下回る温度でガラスを成形すると
ガラス中に結晶が生成されるため、成形温度は液相温度
以上でなければならない。従って、液相温度の低いガラ
スはど成形温度の選択幅が大きくなり、安定した成形が
可能になる。フロート法はガラスの成形時の粘度が低い
ために高い液相温度のガラスでも容易に成形できるとい
う利点があるが、ガラス表面からかなり深い部分までＳ
ｎが拡散するため、電子機器装置に用いられる基板とし
ての信頼性に欠けるという欠点がある。また前述した公
知の成形法のうちフロート法以外の成形法は、フロート
法のような異成分のガラス内部への拡散は少ないが、フ
ロート法に比べて成形する粘度が高いため液相温度の低
いガラスでないと成形できないという制約がある。By the way, in order to form glass into a thin plate shape of 2 mm or less,
Molding methods such as the V-row method, fusion method, slot down-draw method, roll-out method, and float method are known. Generally, when glass is molded at a temperature below its liquidus temperature, crystals are generated in the glass, so the molding temperature must be equal to or higher than its liquidus temperature. Therefore, the selection range of molding temperature for glass molding having a low liquidus temperature is widened, and stable molding becomes possible. The float method has the advantage of being able to easily mold glass with a high liquidus temperature due to its low viscosity during molding.
Since n is diffused, there is a drawback that it lacks reliability as a substrate used in electronic equipment. Furthermore, among the known molding methods mentioned above, molding methods other than the float method have less diffusion of different components into the interior of the glass, but compared to the float method, the molding viscosity is higher and the liquidus temperature is lower. There is a restriction that it cannot be molded unless it is made of glass.
このような成形法（以下、高粘度型成形法と呼ぶ）にお
いては通常、そのガラスの液相温度における粘度（以下
、液相粘度と呼ぶ）が１０５°０ポイズ、望ましくはｌ
θ′５・５ポイズ以上あることが必要であると言われて
いる。In such a molding method (hereinafter referred to as high-viscosity molding method), the viscosity at the liquidus temperature of the glass (hereinafter referred to as liquidus viscosity) is usually 105°0 poise, preferably l
It is said that it is necessary to have θ′5·5 poise or more.
また電子機器装置に用いられる基板は、装置の製造工程
において各種の薬品と接触するため耐薬品性に優れてい
ることが要求される。Further, substrates used in electronic devices are required to have excellent chemical resistance because they come into contact with various chemicals during the manufacturing process of the devices.
しかしながら実際のところ低アルカリガラスや無アルカ
リガラスといったアルカリ溶出量の少ないガラスで上記
した基板に要求される液相粘度と耐薬品性を満足するも
のは存在しないのが現状である。例えば、この範嗜には
いるガラスとして知られるコーニング社製の７０５３ガ
ラスは液相粘度が高く、成形性に優れているが、ガラス
の耐薬品性に劣るという欠点を有しており、電子機器装
置の製造工程で用いられる各種の薬品によってガラスの
表面が変質しやすいといった問題がある。また耐薬品性
に優れたガラスとして知られるホーヤ社製のＬＥ−３０
ガラスは液相粘度が非常に低く、公知の高粘度型成形法
では成形できないという欠点がある。However, in reality, there is currently no glass with a small amount of alkali elution, such as low-alkali glass or non-alkali glass, that satisfies the liquid phase viscosity and chemical resistance required of the above-mentioned substrates. For example, Corning's 7053 glass, which is known as a glass that falls into this category, has a high liquidus viscosity and excellent moldability, but it has the disadvantage of poor chemical resistance, and it is used in electronic devices. There is a problem in that the surface of the glass is easily deteriorated by various chemicals used in the manufacturing process of the device. In addition, LE-30 manufactured by Hoya Co., Ltd. is known as a glass with excellent chemical resistance.
Glass has a drawback in that it has a very low liquidus viscosity and cannot be molded using known high-viscosity molding methods.
［発明の目的コ
本発明の目的は、アルカリ溶出量が少なく、耐薬品性に
も優れ、さらに２■以下の板厚の薄板ガラスを公知の高
粘度型成形法でも安定して成形できるように、液相粘度
がＩＯＢ・０ポイズ以上である基板用ガラスを提供する
ことである。[Purpose of the Invention] The purpose of the present invention is to provide a glass that has a small amount of alkali elution, has excellent chemical resistance, and can stably mold thin glass with a thickness of 2 mm or less using a known high-viscosity molding method. An object of the present invention is to provide a glass for a substrate having a liquidus viscosity of IOB·0 poise or more.
［発明の構成コ
本発明者らは、種々の研究を重ねた結果、以下に示す組
成範囲のガラスが前述した目的を達成しうることを見い
だし、本発明として提案するものである。[Structure of the Invention] As a result of various studies, the present inventors found that a glass having the composition range shown below can achieve the above-mentioned object, and proposes it as the present invention.
すなわち本発明の基板用ガラスは、モル百分率で、５１
０２７１〜７７％、Ａｌ２Ｏ３２〜７％、Ｂ、０．９〜
１５％、ＣａＯ０．２〜２．５％、Ｂａ８０．２〜１．
５％、Ｎａ２Ｏ５〜９％、Ｋ２Ｏ０〜２％、Ｎａ、０．
＋Ｋ２Ｏ５〜１０％からなる組成を有し、本質的にＺｎ
Ｏを含有せず、液相温度における粘度が１０５．０ボイ
ズ以上であり、耐薬品性に優れ、アルカリ溶出量の少な
いことを特徴とする。That is, the glass for substrates of the present invention has a molar percentage of 51
0271~77%, Al2O32~7%, B, 0.9~
15%, CaO0.2-2.5%, Ba80.2-1.
5%, Na2O5-9%, K2O0-2%, Na, 0.
+K2O5-10%, essentially Zn
It is characterized by not containing O, having a viscosity of 105.0 voids or more at the liquidus temperature, excellent chemical resistance, and a small amount of alkali elution.
また本発明の基板用ガラスは、より好ましくはモル百分
率で、５ＩＯ２７２〜７６％、Ａｌ２Ｏ３３，８〜６％
、８２０３１０〜１４％、ＣａＯ０．３〜１．２％、Ｂ
ａＯＯ。Further, the glass for a substrate of the present invention is more preferably 5IO272 to 76%, Al2O33,8 to 6% in molar percentage.
, 820310-14%, CaO0.3-1.2%, B
aOO.
３〜１．１％、Ｎａ２Ｏ［ｉ 〜８％、Ｋ２Ｏ０〜２％
、Ｎａ２Ｏ＋Ｋ２Ｏ１Ｅ〜３％からなる組成を有し、本
質的にＺｎＯを含有せず、液相温度における粘度が！０
５・５ポイズ以上であり、耐薬品性に優れ、アルカリ溶
出量の少ないことを特徴とする。3-1.1%, Na2O[i ~8%, K2O0-2%
, has a composition of ~3% Na2O+K2O1E, contains essentially no ZnO, and has a viscosity at liquidus temperature! 0
It is 5.5 poise or higher, has excellent chemical resistance, and is characterized by a small amount of alkali elution.
以下に本発明の基板用ガラスの組成範囲を上記のように
限定した理由について説明する。The reason why the composition range of the glass for substrates of the present invention is limited as described above will be explained below.
Ｓｉｎ、はガラス構造の骨格をなす基本成分であり、そ
の含量は７Ｉ〜７７％である。７１％より少ないとアル
カリ溶出量が多くなると共に耐薬品性が悪化する。一方
７７％より多いとガラスの溶融性が悪化する。Sin is a basic component forming the skeleton of the glass structure, and its content is 7I to 77%. When it is less than 71%, the amount of alkali elution increases and chemical resistance deteriorates. On the other hand, if it exceeds 77%, the meltability of the glass deteriorates.
Ａｌ２Ｏ３の含量は２〜７％である。２％より少ないと
ガラスのアルカリ溶出量が多くなり、また液相温度が上
がる。一方７％より多いとガラスの溶敵性が悪化する。The content of Al2O3 is 2-7%. When it is less than 2%, the amount of alkali elution from the glass increases and the liquidus temperature increases. On the other hand, if the amount is more than 7%, the meltability of the glass will deteriorate.
Ｂ２Ｏ３の含量は９〜１５％である。３％より少ないと
ガラスのアルカリ溶出量が多くなると共にガラスの溶融
性が悪化する。また１５％より多くなってもガラスのア
ルカリ溶出量が多くなる。The content of B2O3 is 9-15%. If it is less than 3%, the amount of alkali elution from the glass will increase and the meltability of the glass will deteriorate. Moreover, even if it exceeds 15%, the amount of alkali elution from the glass increases.
ＣａＯの含量は０．２〜２．５％である。０．２％より
少ないと液相温度が高くなり、また２、５％より多いと
ガラスの高温粘度を下げるために相対的に液相粘度が低
くなる。The content of CaO is 0.2-2.5%. When it is less than 0.2%, the liquidus temperature becomes high, and when it is more than 2.5%, the liquidus viscosity becomes relatively low because it lowers the high temperature viscosity of the glass.
ＢａＯの含量は０．２〜１．５％である。０．２％より
少ないと液相温度が高くなり、１．５％より多いとガラ
スの高温粘度を下げるために相対的に液相粘度が低くな
る。The content of BaO is 0.2-1.5%. When it is less than 0.2%, the liquidus temperature becomes high, and when it is more than 1.5%, the liquidus viscosity becomes relatively low because it lowers the high temperature viscosity of the glass.
Ｎａ２Ｏ及びに２０の含量は、各々５〜９％と０〜２％
である。Ｎａ２Ｏが５％より少ないとガラスの溶融性が
悪化する。またＮａ、Ｏが９％、Ｋ２Ｏが２％より多い
とガラスのアルカリ溶出量が多くなるとともにガラスの
溶融時における蒸発が多くなりガラスに脈理が発生しや
すくなる。Ｎａ２Ｏとに２０の合量は５〜１０％である
。５％より少ないとガラスの溶融性が悪化する。一方、
１０％より多いとガラスのアルカリ溶出量が多くなると
ともにガラス溶融時の蒸発が多くなりガラスに脈理が発
生しやすくなる。The contents of Na2O and Ni20 are 5-9% and 0-2%, respectively.
It is. If Na2O is less than 5%, the meltability of the glass will deteriorate. Furthermore, if the Na and O contents exceed 9% and the K2O content exceeds 2%, the amount of alkali eluted from the glass will increase, and evaporation during melting of the glass will also increase, making striae more likely to occur in the glass. The total amount of Na2O and 20 is 5 to 10%. If it is less than 5%, the meltability of the glass will deteriorate. on the other hand,
If it is more than 10%, the amount of alkali eluted from the glass increases, and evaporation during glass melting increases, making it easy for striae to occur in the glass.
尚、本発明においては上記成分に加えて清澄剤としてＡ
ｓ２０．，５ｂ２０３ 、ＮａＣ１、Ｎａ２５０．およ
びＣａＦ２等の弗化物の中から、少なくとも一種の成分
を、モル百分率で０．５％まで含有することが可能であ
る。In addition, in the present invention, in addition to the above components, A is used as a clarifying agent.
s20. , 5b203, NaCl, Na250. It is possible to contain at least one component from fluorides such as and CaF2 in a molar percentage of up to 0.5%.
しかしながらＺｎＯは、ガラス溶融時に蒸発しやすく、
ガラスに脈理が発生する原因になるため含有しないこと
が肝要である。However, ZnO easily evaporates during glass melting,
It is important not to contain it because it causes striae to occur in the glass.
［実施例］
以下本発明の基板用ガラスを実施例に基づいて説明する
。[Example] The glass for substrates of the present invention will be described below based on Examples.
次表は本発明の実施例（試料Ｎ０．１〜３）及び比較例
（試料Ｎ。、１０〜１２）を示すものである。The following table shows Examples (Samples No. 1 to 3) of the present invention and Comparative Examples (Samples No. 10 to 12).
以下余白
表のＮ。、１〜１２のガラス試料は、表に示す組成にな
るように調合した原料バッチを白金ルツボに入れて１５
５０℃で８時間溶融した後、カーボン板上に流し出して
板状に成形したものであり、各ガラス試料について液相
粘度、耐薬品性、アルカリ溶出量を調べた。N in the margin table below. For glass samples 1 to 12, a raw material batch prepared to have the composition shown in the table was placed in a platinum crucible and heated for 15 minutes.
After melting at 50° C. for 8 hours, it was poured onto a carbon plate and formed into a plate shape. Each glass sample was examined for liquidus viscosity, chemical resistance, and amount of alkali elution.
液相粘度は温度勾配炉を使用して求めた液相温度の特性
値と周知の白金味引き上げ法によって測定した粘度特性
値を組み合わせて算出した。耐薬品性は、試料ガラスを
鏡面に研磨して、１０％の硫酸に各々８０℃、８時間の
条件で処理した後の外観上の変化の有無を調べ、外観上
の変化が認められなかったものをＯ印、外観上の変化が
認められたものを×印で示した。またアルカリ溶出量は
、ＪＩＳ Ｒ−３５０２に基づいて測定した。The liquidus viscosity was calculated by combining the characteristic value of liquidus temperature obtained using a temperature gradient furnace and the characteristic value of viscosity measured by the well-known platinum taste pulling method. For chemical resistance, the sample glass was polished to a mirror surface and treated with 10% sulfuric acid at 80℃ for 8 hours, and then examined for any change in appearance.No change in appearance was observed. Those in which a change in appearance was observed are marked with an O mark, and those in which a change in appearance was observed are marked with an X mark. Moreover, the amount of alkali elution was measured based on JIS R-3502.
この結果、本発明の実施例であるＮ。１〜３の試料は、
液相粘度が１０５．６ボイズ以上であり、耐薬品性に優
れ、且つアルカリ溶出量が０ 、１ｍｇ以下であること
がわかった。As a result, N, which is an example of the present invention. Samples 1 to 3 are
It was found that the liquid phase viscosity was 105.6 voids or more, excellent chemical resistance, and the amount of alkali elution was 0.1 mg or less.
一方、通常のソーダライムガラス相当として作製したＮ
。、！０の試料は、アルカリ溶出量が極めて大きかった
。またＮ、、 １１及びＮ。、 １２の試料は、いずれ
もアルカリ溶出量は０．１ｍｇ以下と少なかったが、Ｎ
ｏ、 １１の試料は耐薬品性に劣り、Ｎ、、 １２の試
料は液相粘度が１０３１と低かった。On the other hand, N
. ,! Sample No. 0 had an extremely large amount of alkali elution. Also N,, 11 and N. , 12 samples had a small alkali elution amount of 0.1 mg or less, but N
Samples No. 11 had poor chemical resistance, and samples No. 12 had a low liquidus viscosity of 1031.
［発明の効果］
以上のように本発明の基板用ガラスはアルカリ溶出量が
少ないために、電子機器装置のガラス基板として用いる
際に５１０２等のバリヤー被膜を必要としない。また耐
薬品性に優れているために、これらの電子機器装置の製
造工程で用いられる各種の薬品に対して安定である。し
かも液相粘度が高いために、公知の高粘度型成形法によ
って２ｍｍ以下の厚さの薄板に安定して成形することが
可能である。[Effects of the Invention] As described above, since the glass for substrates of the present invention has a small amount of alkali elution, it does not require a barrier coating such as 5102 when used as a glass substrate for electronic equipment. Furthermore, since it has excellent chemical resistance, it is stable against various chemicals used in the manufacturing process of these electronic devices. Moreover, since the liquid phase viscosity is high, it is possible to stably mold it into a thin plate with a thickness of 2 mm or less by a known high-viscosity molding method.
Claims (2)
２Ｏ＿３２〜７％、Ｂ＿２Ｏ＿３９〜１５％、ＣａＯ０
．２〜２．５％、ＢａＯ０．２〜１．５％、Ｎａ＿２Ｏ
５〜９％、Ｋ＿２Ｏ０〜２％、Ｎａ＿２Ｏ＋Ｋ＿２Ｏ５
〜１０％からなる組成を有し、本質的にＺｎＯを含有せ
ず、液相温度における粘度が１０＾５＾．＾０ポイズ以
上であり、耐薬品性に優れ、アルカリ溶出量の少ないこ
とを特徴とする基板用ガラス。(1) In molar percentage, SiO_271-77%, Al_
2O_32-7%, B_2O_39-15%, CaO0
．． 2-2.5%, BaO0.2-1.5%, Na_2O
5-9%, K_2O0-2%, Na_2O+K_2O5
~10%, is essentially free of ZnO, and has a viscosity at liquidus temperature of 10^5^. A glass for substrates that has a poise of 0 or more, has excellent chemical resistance, and has a small amount of alkali elution.
２Ｏ＿３３．８〜６％、Ｂ＿２Ｏ＿３１０〜１４％、Ｃ
ａＯ０．３〜１．２％、ＢａＯ０．３〜１．１％、Ｎａ
＿２Ｏ６〜８％、Ｋ＿２Ｏ０〜２％、Ｎａ＿２Ｏ＋Ｋ＿
２Ｏ６〜３％からなる組成を有し、本質的にＺｎＯを含
有せず、液相温度における粘度が１０＾５＾．＾５ポイ
ズ以上であり、耐薬品性に優れ、アルカリ溶出量の少な
いことを特徴とする特許請求の範囲第１項記載の基板用
ガラス。(2) In molar percentage, SiO_272-76%, Al_
2O_33.8-6%, B_2O_310-14%, C
aO0.3-1.2%, BaO0.3-1.1%, Na
_2O6-8%, K_2O0-2%, Na_2O+K_
It has a composition consisting of 6 to 3% of 2O, essentially contains no ZnO, and has a viscosity of 10^5^. 5 poise or more, excellent chemical resistance, and a small amount of alkali elution. The glass for a substrate according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285962A JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285962A JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03146435A true JPH03146435A (en) | 1991-06-21 |
| JP2743333B2 JP2743333B2 (en) | 1998-04-22 |
Family
ID=17698214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1285962A Expired - Fee Related JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2743333B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001056941A1 (en) | 2000-02-04 | 2001-08-09 | Schott Glas | Alkali-containing aluminum borosilicate glass and utilization thereof |
| JP2007039315A (en) * | 2005-06-29 | 2007-02-15 | Nippon Electric Glass Co Ltd | Optical glass |
| JP2010527892A (en) * | 2007-05-18 | 2010-08-19 | コーニング インコーポレイテッド | Chemically reinforced glass for cover plates that can be manufactured by the downdraw method |
| JP4643863B2 (en) * | 2001-07-11 | 2011-03-02 | 富士電機ホールディングス株式会社 | SUBSTRATE FOR INFORMATION RECORDING MEDIUM, INFORMATION MAGNETIC RECORDING MEDIUM, AND METHOD FOR PRODUCING THEM |
| WO2011092546A2 (en) | 2009-12-24 | 2011-08-04 | Gerresheimer Pisa S.P.A. | Use of a glass composition for making a solar collector with a glass-metal joint |
| CN115321818A (en) * | 2016-11-30 | 2022-11-11 | 康宁公司 | Fusion formable automotive glass compositions, articles, and laminates |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8975199B2 (en) | 2011-08-12 | 2015-03-10 | Corsam Technologies Llc | Fusion formable alkali-free intermediate thermal expansion coefficient glass |
| US8445394B2 (en) | 2008-10-06 | 2013-05-21 | Corning Incorporated | Intermediate thermal expansion coefficient glass |
| US8647995B2 (en) | 2009-07-24 | 2014-02-11 | Corsam Technologies Llc | Fusion formable silica and sodium containing glasses |
| KR102225583B1 (en) | 2013-04-29 | 2021-03-10 | 코닝 인코포레이티드 | Photovoltaic module package |
-
1989
- 1989-10-31 JP JP1285962A patent/JP2743333B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001056941A1 (en) | 2000-02-04 | 2001-08-09 | Schott Glas | Alkali-containing aluminum borosilicate glass and utilization thereof |
| JP4643863B2 (en) * | 2001-07-11 | 2011-03-02 | 富士電機ホールディングス株式会社 | SUBSTRATE FOR INFORMATION RECORDING MEDIUM, INFORMATION MAGNETIC RECORDING MEDIUM, AND METHOD FOR PRODUCING THEM |
| JP2007039315A (en) * | 2005-06-29 | 2007-02-15 | Nippon Electric Glass Co Ltd | Optical glass |
| JP2010527892A (en) * | 2007-05-18 | 2010-08-19 | コーニング インコーポレイテッド | Chemically reinforced glass for cover plates that can be manufactured by the downdraw method |
| WO2011092546A2 (en) | 2009-12-24 | 2011-08-04 | Gerresheimer Pisa S.P.A. | Use of a glass composition for making a solar collector with a glass-metal joint |
| CN115321818A (en) * | 2016-11-30 | 2022-11-11 | 康宁公司 | Fusion formable automotive glass compositions, articles, and laminates |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2743333B2 (en) | 1998-04-22 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |