JPH0312307B2 - - Google Patents
Info
- Publication number
- JPH0312307B2 JPH0312307B2 JP59191353A JP19135384A JPH0312307B2 JP H0312307 B2 JPH0312307 B2 JP H0312307B2 JP 59191353 A JP59191353 A JP 59191353A JP 19135384 A JP19135384 A JP 19135384A JP H0312307 B2 JPH0312307 B2 JP H0312307B2
- Authority
- JP
- Japan
- Prior art keywords
- silver
- silver salt
- image
- acrylate
- latent image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 19
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000003638 chemical reducing agent Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 7
- 239000011230 binding agent Substances 0.000 claims description 5
- -1 silver halide Chemical class 0.000 description 27
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 229910052709 silver Inorganic materials 0.000 description 16
- 239000004332 silver Substances 0.000 description 16
- 239000000839 emulsion Substances 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- DETXZQGDWUJKMO-UHFFFAOYSA-N 2-hydroxymethanesulfonic acid Chemical compound OCS(O)(=O)=O DETXZQGDWUJKMO-UHFFFAOYSA-N 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 7
- 230000008313 sensitization Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- MESJRHHDBDCQTH-UHFFFAOYSA-N 3-(dimethylamino)phenol Chemical compound CN(C)C1=CC=CC(O)=C1 MESJRHHDBDCQTH-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- 108010010803 Gelatin Proteins 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 4
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 4
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 4
- 150000003378 silver Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical class NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- WFGGATFAWQWKRI-UHFFFAOYSA-N 2-prop-2-enyl-1h-imidazole Chemical compound C=CCC1=NC=CN1 WFGGATFAWQWKRI-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 235000021357 Behenic acid Nutrition 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229940048053 acrylate Drugs 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 2
- 229940107816 ammonium iodide Drugs 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229940116226 behenic acid Drugs 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 2
- XUIVKWAWICCWIQ-UHFFFAOYSA-M sodium;formaldehyde;hydrogen sulfite Chemical compound [Na+].O=C.OS([O-])=O XUIVKWAWICCWIQ-UHFFFAOYSA-M 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N 1,4-Benzenediol Natural products OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 1
- ZRHUHDUEXWHZMA-UHFFFAOYSA-N 1,4-dihydropyrazol-5-one Chemical class O=C1CC=NN1 ZRHUHDUEXWHZMA-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- CBXGIYSFAJVJOB-UHFFFAOYSA-N 1-[4,6-di(prop-2-enoyl)triazin-5-yl]prop-2-en-1-one Chemical compound C=CC(=O)C1=NN=NC(C(=O)C=C)=C1C(=O)C=C CBXGIYSFAJVJOB-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- CCHRVFZBKRIKIX-UHFFFAOYSA-N 1-nitro-3-(3-nitrophenyl)benzene Chemical compound [O-][N+](=O)C1=CC=CC(C=2C=C(C=CC=2)[N+]([O-])=O)=C1 CCHRVFZBKRIKIX-UHFFFAOYSA-N 0.000 description 1
- JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- APJRQJNSYFWQJD-GGWOSOGESA-N 2-[(e)-but-2-enoyl]oxyethyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OCCOC(=O)\C=C\C APJRQJNSYFWQJD-GGWOSOGESA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- GNUGVECARVKIPH-UHFFFAOYSA-N 2-ethenoxypropane Chemical compound CC(C)OC=C GNUGVECARVKIPH-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- LIPRUDRQZVPYCL-UHFFFAOYSA-N 2-prop-2-enylpyridine Chemical compound C=CCC1=CC=CC=N1 LIPRUDRQZVPYCL-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ZAWQXWZJKKICSZ-UHFFFAOYSA-N 3,3-dimethyl-2-methylidenebutanamide Chemical compound CC(C)(C)C(=C)C(N)=O ZAWQXWZJKKICSZ-UHFFFAOYSA-N 0.000 description 1
- PRCIXKQBKWRGMA-UHFFFAOYSA-N 3,4-dimethyl-1,4-dihydropyrazol-5-one Chemical compound CC1C(C)=NNC1=O PRCIXKQBKWRGMA-UHFFFAOYSA-N 0.000 description 1
- CRIPAJJQMUPNMA-UHFFFAOYSA-N 3-[2-(3-amino-3-oxoprop-1-enyl)phenyl]prop-2-enamide Chemical compound NC(=O)C=CC1=CC=CC=C1C=CC(N)=O CRIPAJJQMUPNMA-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- UHBAWOXYQROEIH-UHFFFAOYSA-N 3-chloro-4-(2-chlorobut-3-enoxy)but-1-ene Chemical compound C=CC(Cl)COCC(Cl)C=C UHBAWOXYQROEIH-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- NHDKSTHWEVLRFW-UHFFFAOYSA-N 4-(2-hydroxyethyl)-2,5-dimethyl-4H-pyrazol-3-one Chemical compound CN1N=C(C)C(CCO)C1=O NHDKSTHWEVLRFW-UHFFFAOYSA-N 0.000 description 1
- GCKLKGJKIRVDQB-UHFFFAOYSA-N 4-(2-hydroxyethyl)-3-methyl-1,4-dihydropyrazol-5-one Chemical compound CC1=NNC(=O)C1CCO GCKLKGJKIRVDQB-UHFFFAOYSA-N 0.000 description 1
- ABJQKDJOYSQVFX-UHFFFAOYSA-N 4-aminonaphthalen-1-ol Chemical compound C1=CC=C2C(N)=CC=C(O)C2=C1 ABJQKDJOYSQVFX-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 240000007320 Pinus strobus Species 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000001502 aryl halides Chemical class 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- TXTCTCUXLQYGLA-UHFFFAOYSA-L calcium;prop-2-enoate Chemical compound [Ca+2].[O-]C(=O)C=C.[O-]C(=O)C=C TXTCTCUXLQYGLA-UHFFFAOYSA-L 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- QPFVCZRPJLXDJI-UHFFFAOYSA-N cyclohexanone;sulfurous acid Chemical compound OS(O)=O.O=C1CCCCC1 QPFVCZRPJLXDJI-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 229910001502 inorganic halide Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- VJPLIHZPOJDHLB-UHFFFAOYSA-N lead titanium Chemical compound [Ti].[Pb] VJPLIHZPOJDHLB-UHFFFAOYSA-N 0.000 description 1
- 150000004988 m-phenylenediamines Chemical class 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- UICBCXONCUFSOI-UHFFFAOYSA-N n'-phenylacetohydrazide Chemical compound CC(=O)NNC1=CC=CC=C1 UICBCXONCUFSOI-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- PMHOLXNNEPPFNZ-UHFFFAOYSA-N n-(3-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=CC(NC(=O)C=C)=C1 PMHOLXNNEPPFNZ-UHFFFAOYSA-N 0.000 description 1
- CHDKQNHKDMEASZ-UHFFFAOYSA-N n-prop-2-enoylprop-2-enamide Chemical compound C=CC(=O)NC(=O)C=C CHDKQNHKDMEASZ-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- JRNGUTKWMSBIBF-UHFFFAOYSA-N naphthalene-2,3-diol Chemical compound C1=CC=C2C=C(O)C(O)=CC2=C1 JRNGUTKWMSBIBF-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920006316 polyvinylpyrrolidine Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- AQRYNYUOKMNDDV-UHFFFAOYSA-M silver behenate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O AQRYNYUOKMNDDV-UHFFFAOYSA-M 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/0285—Silver salts, e.g. a latent silver salt image
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は画像形成法に関するものである。特に
潜像を有する銀塩の存在する部分に、熱を利用し
て高分子化合物を形成させる画像形成法に関す
る。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to an image forming method. In particular, the present invention relates to an image forming method in which a polymer compound is formed using heat in an area where a silver salt having a latent image is present.
「従来の技術」
本発明者らは、既に感光性銀塩のもつ、高い感
光性を利用して高分子化合物を生成せしめるこ
と、特に画像状に生成せしめることを試みてき
た。例えば特公昭47−20741号に詳しいが、そこ
では、露光されたハロゲン化銀写真乳剤を付加重
合性化合物の存在下に還元剤水溶液で処理し、そ
の処理過程で生じる反応中間体を重合開始剤とし
て利用しようとするものであつた。"Prior Art" The present inventors have already attempted to utilize the high photosensitivity of photosensitive silver salts to produce polymeric compounds, particularly in the form of images. For example, as detailed in Japanese Patent Publication No. 47-20741, an exposed silver halide photographic emulsion is treated with an aqueous reducing agent solution in the presence of an addition polymerizable compound, and a reaction intermediate produced in the treatment process is used as a polymerization initiator. It was intended to be used as a
「発明が解決しようとする問題点」
従来は、湿式での現像と同時に重合反応を行わ
せる事によつて潜像の部分に選択的に高分子化合
物を生じさせるものであり、現像の過程が必要で
あつた。いいかえると、一旦、湿つた状態での処
理過程が不可欠のものであつた。更にまたその方
法では一般に重合反応を行わせる時間は早くても
一分間程度は必要であつた。``Problems to be solved by the invention'' Conventionally, a polymerization reaction was carried out simultaneously with wet development to selectively produce a polymer compound in the latent image area, and the development process was It was necessary. In other words, a treatment process in a wet state was essential. Furthermore, in this method, the polymerization reaction generally requires about one minute at the earliest.
「問題点を解決するための手段」
本発明は、感光性銀塩、還元剤、架橋性化合物
及びバインダーを支持体上に担持した記録材料に
画像露光して潜像を形成した後、前記記録材料を
実質的に均一に加熱することにより、感光性銀塩
の潜像が形成された部分に、高分子化合物を形成
させることを特徴とする画像形成法である。"Means for Solving the Problems" The present invention provides a method for forming a latent image by imagewise exposure on a recording material carrying a photosensitive silver salt, a reducing agent, a crosslinking compound, and a binder on a support. This is an image forming method characterized by substantially uniformly heating a material to form a polymer compound in the area where a latent image of a photosensitive silver salt has been formed.
本発明はDry処理で画像形成が出来るという著
しい特徴をもつ。特に系を80℃以上に加熱する事
によつて架橋ないし重合反応が促進される際に、
潜像を有する部分が選択的に促進されることは全
く予想外のことである。 The present invention has the remarkable feature that image formation can be performed by dry processing. In particular, when crosslinking or polymerization reactions are accelerated by heating the system to 80°C or higher,
It is completely unexpected that areas with latent images are selectively promoted.
反応により生じた高分子化合物を画像形成に使
うことも、高分子化合物が生じた部分又は生じな
かつた部分を転写して、画像形成に使うこともで
きる。 The polymer compound generated by the reaction can be used for image formation, or the portion where the polymer compound has been generated or the portion where the polymer compound has not been generated can be transferred and used for image formation.
感光性銀塩としては露光により潜像核を与えら
れるものが用いられる。即ち、感光性銀塩が好都
合であり、ハロゲン化銀、有機酸銀、あるいはこ
れらの共存する銀塩等が好都合である。有機酸銀
自体の感光性はハロゲン化銀に比べて低い。主と
して有機酸銀を用いる場合は、ハロゲン化銀を共
存させることが好ましい。 As the photosensitive silver salt, one that can give latent image nuclei upon exposure to light is used. That is, a photosensitive silver salt is convenient, and a silver halide, an organic acid silver, or a silver salt containing these together is convenient. The photosensitivity of organic acid silver itself is lower than that of silver halide. When organic acid silver is mainly used, it is preferable to coexist silver halide.
潜像とは電磁波又は粒子線の作用に依つてハロ
ゲン化銀写真乳剤に生じた、通常そのままでは目
に見えない像状の変化であり、現像する事に依つ
て可視像となるものである。通常の陰画を生ずる
乳剤では、電磁波又は粒子線で照射されたハロゲ
ン化銀粒子に現像核が生ずる事に依つて線像が生
じ、直接陽画乳剤では最初全粒子に存在していた
現像核が照射に依つて消失するために、潜像が生
ずる。 A latent image is an image-like change that occurs in a silver halide photographic emulsion due to the action of electromagnetic waves or particle beams and is normally invisible to the naked eye, but becomes a visible image when developed. . In emulsions that produce normal negative images, line images are produced by the formation of development nuclei in silver halide grains that are irradiated with electromagnetic waves or particle beams, whereas in direct positive emulsions, development nuclei that were initially present in all grains are irradiated. A latent image is generated because the image disappears depending on the image.
本発明に用いられる感光性銀塩たとえばハロゲ
ン化銀写真乳剤は電磁波又は粒子線の作用に依つ
て照射された部分に現像核を生ずるような即ち、
現像に依つて陰画を生ずる様な通常のハロゲン化
銀写真乳剤も使用できるし、画像状の光の照射を
受けた部分よりもそれ以外の部分の方が多数のハ
ロゲン銀粒子に現像核が存在する様ないわゆる直
接陽画乳剤も使用できる。 The photosensitive silver salts used in the present invention, such as silver halide photographic emulsions, are capable of producing development nuclei in irradiated areas by the action of electromagnetic waves or particle beams.
Ordinary silver halide photographic emulsions that produce negative images upon development can also be used, and there are more development nuclei in silver halide grains in areas other than those irradiated with image-like light. It is also possible to use so-called direct positive emulsions.
本発明において、陰画を生ずるようなハロゲン
化銀写真乳剤としては、通常の現像処理に対して
用いられるハロゲン化銀写真乳剤が好都合に使用
されうる。即ち塩化銀、臭化銀、塩臭化銀、沃臭
化銀、塩沃臭化銀写真乳剤が使用可能である。本
発明に使用される写真乳剤には、通常の写真乳剤
に対して行われる様な化学増感、光学増感を適用
する事が出来る。即ち、化学増感としては、硫黄
増感、貴金属増感、還元増感を行う事が出来る。 In the present invention, silver halide photographic emulsions used for ordinary development processing can be conveniently used as silver halide photographic emulsions capable of producing negative images. That is, silver chloride, silver bromide, silver chlorobromide, silver iodobromide, and silver chloroiodobromide photographic emulsions can be used. The photographic emulsion used in the present invention can be subjected to chemical sensitization and optical sensitization as applied to ordinary photographic emulsions. That is, as chemical sensitization, sulfur sensitization, noble metal sensitization, and reduction sensitization can be performed.
又、光学増感には、シアニン色素、メロシアニ
ン色素等通常の写真法で用いられる光学増感色素
が有効である。又、本発明で使用する乳剤は通常
の写真法で利用される様な安定剤を含んでいても
良い。 For optical sensitization, optical sensitizing dyes used in ordinary photography, such as cyanine dyes and merocyanine dyes, are effective. The emulsion used in the present invention may also contain stabilizers such as those used in conventional photography.
本発明に使用出来る直接陽画ハロゲン化銀写真
乳剤は、ソラリゼーシヨン、ハーシエル効果、ク
ライデン効果、サバチエ効果を利用して作成する
ことができる。 Direct positive silver halide photographic emulsions that can be used in the present invention can be prepared by utilizing solarization, Herschel effect, Kleiden effect, and Sabatier effect.
上記の写真乳剤は高分子物質の溶液中にハロゲ
ン化銀粒子の分散した系からなつており、その高
分子物質としてはゼラチンが広く用いられている
が、それ以外の親水性コロイドも用いることがで
きる。 The above photographic emulsion consists of a system in which silver halide grains are dispersed in a solution of a polymeric substance, and gelatin is widely used as the polymeric substance, but other hydrophilic colloids can also be used. can.
又、感光性銀塩として有機酸銀塩を用いること
ができる。 Furthermore, an organic acid silver salt can be used as the photosensitive silver salt.
感光性銀塩の製法については既に良く知られて
おり、特公昭43−4921号、特公昭55−30498号等
の手法に詳しい。 The method of producing photosensitive silver salts is already well known, and the methods disclosed in Japanese Patent Publications No. 4921-1983 and No. 30498-1985 are well known.
一般的には炭素数10以上の長鎖脂肪族酸のアル
カリ金属塩、アルカリ土類金属塩又はアンモニウ
ム塩の水溶液と水溶性銀塩水溶液を混合して調製
されるが、その際に、種々の高分子化合物、ラテ
ツクス、非水溶性ないし水溶性の各種添加剤を共
存させることができる。 Generally, it is prepared by mixing an aqueous solution of an alkali metal salt, alkaline earth metal salt, or ammonium salt of a long-chain aliphatic acid with a carbon number of 10 or more and an aqueous solution of a water-soluble silver salt. A polymer compound, latex, and various water-insoluble or water-soluble additives can be present together.
還元剤としては、特公昭45−11149号（レゾル
シン類）、特公昭46−6581号（ｍ−アミノフエノ
ール類）、特公昭47−14667号（５−ピラゾロン
類）、特公昭47−14668号（アルキルフエノール
類）、特公昭47−14669号（アルコキシナフトール
類）、特公昭47−20741号（ｍ−フエニレンジアミ
ン類）、特公昭49−1569号（ナフトール類）、特公
昭49−10697号（ヒドラジン類）に記載の化合物、
あるいは特開昭57−138632号、特開昭57−142638
号、特開昭57−176033号、米国特許第3585030号
に記載の化合物等が利用出来る。これらの具体的
な例としては、フロログリシン、ｍ−アミノフエ
ノール、ｍ−ジメチルアミノフエノール、３，４
−ジメチル−５−ピラゾロン、３−メチル−４−
ヒドロキシエチル−５−ピラゾロン、１，３−ジ
メチル−４−ヒドロキシエチル−５−ピラゾロ
ン、ｐ−メトキシフエノール、β−アセチルフエ
ニルヒドラジン、１−アリール−３−メチル−５
−ピラゾロン、２，３−ナフタレンジオール等が
ある。必要に応じて、これらの二種以上を併用し
ても差し控えない。これらの銀塩に対する添加量
は0.01ないし1500パーセント特に50ないし300モ
ルパーセントが好都合である。更には、又、特公
昭47−20741に記載した如く、これらの還元剤と
通常の写真現像薬を併用する事も好都合である。 As reducing agents, Japanese Patent Publication No. 45-11149 (resorcinols), Japanese Patent Publication No. 46-6581 (m-aminophenols), Japanese Patent Publication No. 47-14667 (5-pyrazolones), Japanese Patent Publication No. 47-14668 ( (Alkylphenols), Japanese Patent Publication No. 47-14669 (Alkoxynaphthols), Japanese Patent Publication No. 47-20741 (m-phenylenediamines), Japanese Patent Publication No. 1569-1986 (Naphthols), Japanese Patent Publication No. 197-10697 ( Compounds described in hydrazines),
Or JP-A-57-138632, JP-A-57-142638
Compounds described in JP-A-57-176033 and US Pat. No. 3,585,030 can be used. Specific examples of these include phloroglycin, m-aminophenol, m-dimethylaminophenol, 3,4
-dimethyl-5-pyrazolone, 3-methyl-4-
Hydroxyethyl-5-pyrazolone, 1,3-dimethyl-4-hydroxyethyl-5-pyrazolone, p-methoxyphenol, β-acetylphenylhydrazine, 1-aryl-3-methyl-5
-pyrazolone, 2,3-naphthalene diol, etc. If necessary, two or more of these may be used in combination. The amount added to these silver salts is advantageously from 0.01 to 1500 percent, particularly from 50 to 300 mole percent. Furthermore, as described in Japanese Patent Publication No. 47-20741, it is also convenient to use these reducing agents in combination with ordinary photographic developers.
通常の現像薬（例えばkendallの規則に従う化
合物−ハイドロキノン、ピロガロール、カテコー
ル、４−アミノ−１−ナフトール、４−アミノー
フエノール、ナフトハイドロキノン、フエニルピ
ラゾリドン等）を併用する場合には、これらの添
加量は重合反応に影響を及ぼさない範囲で広く変
えられる。例えば還元剤に対して10−６ないし10
−２モルパーセント特に10−５ないし10−２モル
パーセント用いると好都合である。 When using common developing agents (e.g. compounds according to Kendall's rules - hydroquinone, pyrogallol, catechol, 4-amino-1-naphthol, 4-aminophenol, naphthohydroquinone, phenylpyrazolidone, etc.), these The amount added can be varied widely within a range that does not affect the polymerization reaction. For example, 10−6 to 10 for the reducing agent
It is advantageous to use -2 mole percent, especially from 10@-5 to 10@-2 mole percent.
架橋性化合物としては、付加重合性化合物及び
前記還元剤層格をもつポリマーがあげられる。 Examples of the crosslinkable compound include addition polymerizable compounds and polymers having the above-mentioned reducing agent layer.
まず付加重合性化合物としてはビニル又はビニ
リデン基を１個以上、好しくは複数個有する化合
物が利用出来る。これらの化合物であれば特に制
限はないが、特に沸点が60℃以上の化合物が取り
扱いの点から好都合である。これらの例としては
アクリル酸、メタクリル酸、スチレン、ビニルエ
ーテル、ビニルエステル及びこれらの誘導体があ
る。具体例としては、アクリル酸、アクリル酸ナ
トリウム、アクリル酸カルシユウム、アクリル酸
バリウム、アクリルアマイド、アクリロイルモル
フオリン、ｔ−ブチルアクリルアマイド、ダイア
セトンアクリルアマイド、アクリル酸エチル、ア
クリル酸ブチル、ヒドロキシエチル、アクリレー
ト、グリシジルアクリレート、３−クロロ−２−
ヒドロキシ−プロピルアクリレート、エチルヘキ
シルアクリレート、ラウリルアクリレート、メタ
クリル酸メチル、メタクリルアマイド、メタクリ
ロイルアニリド、β−ヒドロキシプロピルメタク
リレート等のα，β−不飽和酸及びその誘導体、
スチレン、α−メチルスチレン、ビニルトルエ
ン、クロルスチレン、メトキシスチレン、ビニル
フエノール、クロルメチルスチレン、ビニルイミ
ダゾール、ビニルメチルイミダゾール、ビニルピ
リジン、ビニルメチルピリジン、ビニルメチルイ
ミダゾール、ｐ−トルエンスルホネート、ビニル
ピロリドン、ビニルイソプロピルエーテル、ビニ
ルクロロエチルエーテル、ビニルベンジルエーテ
ル、酢酸ビニル、メチレンビスアクリルアマイ
ド、エチレンジアミンジアクリルアマイド、フエ
ニレンジアクリルアマイド、キシリレンジアクリ
ルアマイド、トリアミノヘキサントリアクリルア
ミド、トリアクリルロイルトリアジン、エチレン
グライコールジアクリレート、プロピレングライ
コールジメタクリレート、ジエチレングライコー
ルジアクリレート、ポリエチレンオキサイドジメ
タクリレート、エチレングライコールジソルベー
ト、エチレングリコールジクロトネート、ペンタ
エリスリトールトリアクリレート、ペンタエリス
リトールトリメタクリレートおよび付加重合性基
を有する高分子化合物（例えば水酸基、アミノ
基、エポキシ基又は酸無水物基等を有する高分子
化合物のアクリル酸、メタクリル酸誘導体）等が
あげられる。これらは必要に応じて二種又はそれ
以上用いる事も出来る。更には又、必要に応じ
て、アゾ基、アゾメチン基、活性メチル基、活性
メチレン基等の基を有する付加重合性単量体等を
用いることも出来る。 First, as the addition polymerizable compound, a compound having one or more, preferably a plurality of vinyl or vinylidene groups can be used. There are no particular restrictions on these compounds, but compounds with a boiling point of 60° C. or higher are particularly convenient from the viewpoint of handling. Examples of these are acrylic acid, methacrylic acid, styrene, vinyl ethers, vinyl esters and derivatives thereof. Specific examples include acrylic acid, sodium acrylate, calcium acrylate, barium acrylate, acrylamide, acryloylmorpholine, t-butyl acrylamide, diacetone acrylamide, ethyl acrylate, butyl acrylate, hydroxyethyl, acrylate. , glycidyl acrylate, 3-chloro-2-
α,β-unsaturated acids and derivatives thereof, such as hydroxy-propyl acrylate, ethylhexyl acrylate, lauryl acrylate, methyl methacrylate, methacrylamide, methacryloylanilide, β-hydroxypropyl methacrylate;
Styrene, α-methylstyrene, vinyltoluene, chlorstyrene, methoxystyrene, vinylphenol, chloromethylstyrene, vinylimidazole, vinylmethylimidazole, vinylpyridine, vinylmethylpyridine, vinylmethylimidazole, p-toluenesulfonate, vinylpyrrolidone, vinyl Isopropyl ether, vinyl chloroethyl ether, vinyl benzyl ether, vinyl acetate, methylene bisacrylamide, ethylene diamine diacrylamide, phenylene diacrylamide, xylylene diacrylamide, triaminohexane triacrylamide, triacryloyl triazine, ethylene glycol diacrylate, propylene glycol dimethacrylate, diethylene glycol diacrylate, polyethylene oxide dimethacrylate, ethylene glycol disolbate, ethylene glycol dicrotonate, pentaerythritol triacrylate, pentaerythritol trimethacrylate and polymers with addition polymerizable groups. Examples include molecular compounds (for example, acrylic acid and methacrylic acid derivatives of polymeric compounds having hydroxyl groups, amino groups, epoxy groups, acid anhydride groups, etc.). Two or more types of these can be used as necessary. Furthermore, addition-polymerizable monomers having groups such as an azo group, an azomethine group, an active methyl group, and an active methylene group can also be used, if necessary.
又、ｍ−アクリルアミノフエノール、ｍ−ヒド
ロキシフエノキシエチルアクリレート、１−β−
メタクリルアミノエチル−３−メチル−５−ピラ
ゾロン等の如き、前述の還元剤骨格部を有する単
量体の共重合体を架橋性化合物として用いること
できる。その場合には還元剤と架橋性化合物を兼
ねる働きをする。 Also, m-acrylaminophenol, m-hydroxyphenoxyethyl acrylate, 1-β-
Copolymers of monomers having the aforementioned reducing agent skeleton, such as methacrylaminoethyl-3-methyl-5-pyrazolone, can be used as the crosslinkable compound. In that case, it acts both as a reducing agent and as a crosslinking compound.
更に又、感光性銀塩の感光波長域に応じたカラ
ー画像を得るために写真業界で知られているカプ
ラー、付加重合性カプラーを併用することもでき
る。 Furthermore, couplers and addition-polymerizable couplers known in the photographic industry can be used in combination to obtain color images corresponding to the wavelength range to which the photosensitive silver salt is sensitive.
これらは銀塩に対して0.05ないし／200重量パ
ーセント特に５ないし950重量パーセント用いる
事が出来る。 These can be used in amounts of 0.05 to 200% by weight, especially 5 to 950% by weight, based on the silver salt.
又、有機銀塩を用いる場合には、有機又は無機
のハロゲン化物を併用すると都合が良い。 Further, when using an organic silver salt, it is convenient to use an organic or inorganic halide in combination.
それらの例としてはアンモニウム塩、アルキル
ハライド、アリールハライド等があり、ハライド
としては臭素、沃素、塩素などである。これらは
必要に応じて、二種以上併用することもさしつか
えない。 Examples of these include ammonium salts, alkyl halides, aryl halides, etc., and halides include bromine, iodine, chlorine, etc. Two or more of these may be used in combination, if necessary.
又、銀塩、還元剤、架橋性化合物、添加剤等を
一つの層又は別の層にして支持体上に担持するこ
とも出来る。その場合には、必要に応じて高分子
化合物をバインダーとして用いることが出来る。 Further, a silver salt, a reducing agent, a crosslinking compound, an additive, etc. can be supported on the support in one layer or another layer. In that case, a polymer compound can be used as a binder if necessary.
支持体としては亜鉛、アルミ等の金属板、トリ
アセチルセルロース、ポリエチレンテレフタレー
ト等のプラスチツクフイルム、ガラスあるいは
紙、レジンコート紙等がある。 Examples of the support include metal plates such as zinc and aluminum, plastic films such as triacetylcellulose and polyethylene terephthalate, glass, paper, and resin-coated paper.
特に平滑度200秒以上の支持体が、熱の伝達性
によると思われる画像の鮮明さの点ですぐれてい
る、バインダー用高分子化合物としてはゼラチ
ン、ヒドロキシエチルセルロース、メチルセルロ
ース、カルボメトキシセルロース、ナイロン、ポ
リビニルブチラール、ポリビニルアルコール、ポ
リビニルベンザール、ポリビニルピロリドン、ポ
リビニルメチルイミダゾール、ポリヒドロキシエ
チルアクリレートの天然高分子化合物又は合成高
分子化合物があり、必要に応じて二種以上用いる
こともさしつかえない。 In particular, supports with a smoothness of 200 seconds or more have excellent image clarity, which is thought to be due to heat transfer properties. Examples of binder polymer compounds include gelatin, hydroxyethyl cellulose, methyl cellulose, carbomethoxy cellulose, nylon, Natural or synthetic polymer compounds include polyvinyl butyral, polyvinyl alcohol, polyvinyl benzal, polyvinylpyrrolidone, polyvinylmethylimidazole, and polyhydroxyethyl acrylate, and two or more types may be used as necessary.
特にアミド基を有する高分子化合物が好しい。 Particularly preferred are polymeric compounds having an amide group.
付加重合性化合物として高分子化合物誘導体を
用いる場合にはバインダーを省略することも出来
る。 When a polymer compound derivative is used as the addition polymerizable compound, the binder can be omitted.
又、必要に応じて、カブリ防止剤、界面活性
剤、写真用増感剤、安定剤、増粘剤、帯電防止
剤、可塑剤、染料、アルカリ発生剤、水放出剤、
あるいは顔料等を添加する事も出来る。 In addition, if necessary, antifoggants, surfactants, photographic sensitizers, stabilizers, thickeners, antistatic agents, plasticizers, dyes, alkali generators, water release agents,
Alternatively, pigments etc. can also be added.
これらを層にして用いる時には塗布層の厚さは
0.001mmないし10mm程度の範囲で任意に変更出来
る。 When using these as a layer, the thickness of the coating layer is
It can be changed arbitrarily within the range of 0.001mm to 10mm.
又、塗布に際しては常法に従つて下塗り層、保
護層などを設けることができる。特に加熱時の熱
の伝達性、記録層の加熱部への貼り付き防止の点
で保護層があることが好しい。又、高分子化合物
が形成される層の下に着色層を設けておくと画像
状に着色層を可視化できる利点がある。 Further, upon coating, an undercoat layer, a protective layer, etc. can be provided according to a conventional method. In particular, it is preferable to provide a protective layer from the viewpoint of heat transferability during heating and prevention of the recording layer from sticking to the heated portion. Further, if a colored layer is provided under the layer in which the polymer compound is formed, there is an advantage that the colored layer can be visualized in an image form.
本発明においては種々の露光手段を用いること
ができる。潜像は、可視光を含む輻射線の画像状
露光によつて得られる。一般には、通常使われる
光源例えば太陽光、ストロボ、フラツシユ、タン
グステンランプ、水銀灯、ヨードランプなどのハ
ロゲンランプ、キセノンランプ、レーザー光線、
およびCRT光源、プラズマ光源、螢光管、発光
ダイオードなどを光源として使うことができる。
また、LCD（液晶）やPLZT（ランタンをドープし
たチタンジルコニウム酸鉛）などを利用したマイ
クロシヤツターアレイと線状光源もしくは平面状
光源を組合わせた露光手段を用いることもでき
る。 Various exposure means can be used in the present invention. The latent image is obtained by imagewise exposure to radiation, including visible light. In general, commonly used light sources such as sunlight, strobes, flashlights, tungsten lamps, mercury lamps, halogen lamps such as iodine lamps, xenon lamps, laser beams,
Also, CRT light sources, plasma light sources, fluorescent tubes, light emitting diodes, etc. can be used as light sources.
It is also possible to use an exposure means that combines a microshutter array using an LCD (liquid crystal) or PLZT (lanthanum-doped lead titanium zirconate) with a linear light source or a planar light source.
光源の種類及び露光量は感光性銀塩の感光波長
や感度に応じて適当に選ぶことができる。 The type of light source and the amount of exposure can be appropriately selected depending on the wavelength and sensitivity of the photosensitive silver salt.
本発明において加熱温度は70℃以上、好しくは
75℃以上、特に80℃以上である。65℃でも長時間
加熱すれば画像は得られるが、鮮明でなく操作性
も悪いため画像形成法としては好しくはない。 In the present invention, the heating temperature is 70°C or higher, preferably
The temperature is 75℃ or higher, especially 80℃ or higher. Although images can be obtained even at 65° C. by heating for a long time, they are not clear and have poor operability, so this is not preferred as an image forming method.
以下に実施例を用いて本発明の手法を具体的に
記述するが、これらは本発明の思想と技術分野の
範囲内での一例を示すものであつて本発明の用途
がこれらのみに限定されるものではない。 The method of the present invention will be specifically described below using Examples, but these are examples within the scope of the idea and technical field of the present invention, and the application of the present invention is not limited to these only. It's not something you can do.
実施例 １
ポリエチレンテレフタレートフイルム上に、コ
ーテイングロツド20番を用いて以下の液を塗布
し、70℃で風を送りながら乾燥した。Example 1 The following solution was applied onto a polyethylene terephthalate film using coating rod No. 20, and dried at 70° C. while blowing air.
メタノール20ml、ポリビニルピロリドン３ｇ、
アクリルアマイド２ｇ、メチレンビスアクリルア
マイド0.25ｇ、および２モルのベヘン酸と１モル
の硝酸銀とから調製したベヘン酸銀1.44ｇからな
る分散液。 20ml methanol, 3g polyvinylpyrrolidone,
A dispersion consisting of 2 g of acrylamide, 0.25 g of methylenebisacrylamide, and 1.44 g of silver behenate prepared from 2 moles of behenic acid and 1 mole of silver nitrate.
ついで、ｍ−ジメチルアミノフエノール137mg、
臭化アンモニユウム2.5mgおよび沃化アンモニユ
ウム0.2mgをメタノール５mlに溶解した液を塗布
した。 Then, 137 mg of m-dimethylaminophenol,
A solution prepared by dissolving 2.5 mg of ammonium bromide and 0.2 mg of ammonium iodide in 5 ml of methanol was applied.
乾燥したのち、４％ゼラチン、１％ラウリルベ
ンゼンスルホン酸ナトリウム、ホルムアルデヒド
重亜硫酸ナトリウム塩をそれぞれ100ｇ、１ｇ、
0.001ｇ含む液を塗布し乾燥した。 After drying, add 100 g and 1 g of 4% gelatin, 1% sodium laurylbenzenesulfonate, and formaldehyde sodium bisulfite salt, respectively.
A solution containing 0.001g was applied and dried.
こうして得られた記録材料の半分を黒紙でおお
つて60W螢光灯より１ｍの距離から２秒間露光
し、露光部分に潜像核を形成させた。この場合プ
リントアウトにより、露光部分が黒化することは
観察されなかつた。ついで、この記録材料を85℃
ないし95℃に保つた平坦な加熱板ではさんだ。約
30秒間その温度に保持したのち、メタノール浴を
用いて強くすすいだ。するといずれの場合にも、
露光された部分のみが、強い膜となつて残存し、
重合反応が選択的に生じている事が確認された。
加熱温度を約65℃にした場合には、加熱時間を３
分間程度に延長した場合にのみ画像が得られた。 Half of the recording material thus obtained was covered with black paper and exposed to light from a 60 W fluorescent lamp from a distance of 1 m for 2 seconds to form latent image nuclei in the exposed areas. In this case, no blackening of the exposed area was observed due to printout. Next, this recording material was heated to 85℃.
Or sandwiched between flat heating plates kept at 95℃. about
After holding the temperature for 30 seconds, it was rinsed vigorously using a methanol bath. Then, in either case,
Only the exposed areas remain as a strong film,
It was confirmed that the polymerization reaction occurred selectively.
When heating temperature is about 65℃, heating time is 3.
Images were obtained only when extended to about minutes.
実施例 ２
ｍ−ジメチルアミノフエノールをポリビニルピ
ロリドン等とまぜて用いたこと、およびゼラチン
を除いたことの他は実施例１と同様な方法で記録
材料を調製し、実施例１と同様に試験をした。こ
の場合にも露光部分に良好な膜を得た。Example 2 A recording material was prepared in the same manner as in Example 1, except that m-dimethylaminophenol was mixed with polyvinylpyrrolidone, etc., and gelatin was omitted, and the test was carried out in the same manner as in Example 1. did. In this case as well, a good film was obtained in the exposed area.
実施例 ３
ホルムアルデヒド重亜硫酸ナトリウム塩0.006
ｇをｍ−ジメチルアミノフエノール等とまぜて用
いた他は実施例２と同様な操作を行つた。Example 3 Formaldehyde sodium bisulfite salt 0.006
The same operation as in Example 2 was performed except that g was mixed with m-dimethylaminophenol and the like.
この場合にも良好な結果が得られた。ホルムア
ルデヒド重亜硫酸塩を0.06ｇ用いた場合にもほぼ
実施例２と同様な結果を得た。ホルムアルデヒド
重亜硫酸塩を用いた方が用いない場合に比べてウ
オツシユオフ後に残つた膜の力学的強度が強く、
またこの強さはホルムアルデヒド重亜硫酸塩の量
にほぼ依存するものであつた。 Good results were also obtained in this case. Almost the same results as in Example 2 were obtained when 0.06 g of formaldehyde bisulfite was used. The mechanical strength of the film remaining after washing off is stronger when formaldehyde bisulfite is used than when it is not used.
Moreover, this strength was approximately dependent on the amount of formaldehyde bisulfite.
実施例 ４
ベンツアルデハイド又はシクロヘキサノンの重
亜硫酸塩をホルムアルデヒド重亜硫酸塩のかわり
に用いて実施例３と同様な操作を行つた。Example 4 The same procedure as in Example 3 was carried out using benzaldehyde or cyclohexanone bisulfite instead of formaldehyde bisulfite.
実施例１と同様な良好な結果を得た。 Good results similar to those in Example 1 were obtained.
実施例 ５
通常の写真現像薬を還元剤と併用した例を示
す。Example 5 An example is shown in which a common photographic developer is used in combination with a reducing agent.
１−フエニル−３−ピラゾリドンをｍ−ジメチ
ルアミノフエノールに対して0.1重量パーセント
用いたほかは実施例４と同様な操作を行つた。 The same procedure as in Example 4 was carried out except that 0.1 weight percent of 1-phenyl-3-pyrazolidone was used based on m-dimethylaminophenol.
但し、露光時間は30秒とした。この場合にもほ
ぼ同様な結果を得た。１−フエニル−３−ピラゾ
リドンのかわりにカテコールを0.01重量パーセン
ト用いた場合にも同様な結果を得た。 However, the exposure time was 30 seconds. Almost similar results were obtained in this case as well. Similar results were obtained when 0.01 weight percent of catechol was used in place of 1-phenyl-3-pyrazolidone.
実施例 ６
６，６−ナイロンをポリビニルピロリドンに対
して20重量パーセント用いた他は実施例１と同様
な操作を行つた。加熱温度を115℃ないし120℃に
し約20秒間保つと、露光部にのみ高分子化合物が
生じていることが判明した。Example 6 The same procedure as in Example 1 was carried out except that 20% by weight of 6,6-nylon was used based on polyvinylpyrrolidone. It was found that when the heating temperature was raised to 115°C to 120°C and held for about 20 seconds, a polymer compound was formed only in the exposed areas.
実施例 ７
テトラエチレングリコールジメタクリレート
1.87ml、ポリビニルピロリドン（Ｋ−90、）2.0
ｇ、ベヘン酸の銀塩0.96ｇ、亜硫酸水素ナトリウ
ムアルデヒド付加物0.001ｇ、および酸化亜鉛0.4
ｇないし1.73ｇをメタノール20mlに分散した。こ
れをコーテイングロツド20番を用いて高分子支持
体上に塗布し、加熱乾燥した。ついで、ｍ−ジメ
チルアミノフエノール500mg、カテコール0.04mg、
臭化アンモニユウム10ないし20mg、および沃化ア
ンモニユウム0.5ないし１mgをメタノール５mlに
溶解した液を塗布し、加熱乾燥した。Example 7 Tetraethylene glycol dimethacrylate
1.87ml, polyvinylpyrrolidone (K-90,) 2.0
g, silver salt of behenic acid 0.96 g, sodium bisulfite aldehyde adduct 0.001 g, and zinc oxide 0.4
g to 1.73 g was dispersed in 20 ml of methanol. This was coated onto a polymer support using coating rod No. 20 and dried by heating. Next, m-dimethylaminophenol 500mg, catechol 0.04mg,
A solution prepared by dissolving 10 to 20 mg of ammonium bromide and 0.5 to 1 mg of ammonium iodide in 5 ml of methanol was applied and dried by heating.
更に４％ゼラチン10mlと１％ラウリルベンゼン
スルフオン酸ナトリウム１mlからなる液で表面を
湿らしたのち、乾燥した。実施例５と同様に露光
したのち実施例６と同様な後処理を施した。50℃
ないし60℃の温水中ですすぐ事によりいずれの場
合にも鮮明な像が得られた。メタノール浴を用い
ても同様であつた。 The surface was further moistened with a solution consisting of 10 ml of 4% gelatin and 1 ml of 1% sodium laurylbenzenesulfonate, and then dried. After exposure in the same manner as in Example 5, the same post-treatment as in Example 6 was performed. 50℃
Clear images were obtained in all cases by rinsing in warm water at 60°C. The same result was obtained using a methanol bath.
Claims (1)
ンダーを支持体上に担持した記録材料に画像露光
して潜像を形成した後、前記記録材料を実質的に
均一に加熱することにより、感光性銀塩の潜像が
形成された部分に、高分子化合物を形成させるこ
とを特徴とする画像形成法。1. A recording material carrying a photosensitive silver salt, a reducing agent, a crosslinkable compound, and a binder on a support is imagewise exposed to form a latent image, and then the recording material is heated substantially uniformly to make it photosensitive. An image forming method characterized by forming a polymer compound on a portion where a latent image of a silver salt is formed.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19135384A JPS6169062A (en) | 1984-09-12 | 1984-09-12 | Image forming method |
| AT85111416T ATE31368T1 (en) | 1984-09-12 | 1985-09-10 | IMAGE GENERATION PROCESS. |
| DE8585111416T DE3561179D1 (en) | 1984-09-12 | 1985-09-10 | Image forming method |
| EP85111416A EP0174634B1 (en) | 1984-09-12 | 1985-09-10 | Image forming method |
| US06/775,273 US4629676A (en) | 1984-09-12 | 1985-09-12 | Image forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19135384A JPS6169062A (en) | 1984-09-12 | 1984-09-12 | Image forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6169062A JPS6169062A (en) | 1986-04-09 |
| JPH0312307B2 true JPH0312307B2 (en) | 1991-02-19 |
Family
ID=16273161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19135384A Granted JPS6169062A (en) | 1984-09-12 | 1984-09-12 | Image forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6169062A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0619570B2 (en) | 1986-02-07 | 1994-03-16 | 富士写真フイルム株式会社 | Photosensitive material |
| JPH0623851B2 (en) * | 1986-05-30 | 1994-03-30 | 富士写真フイルム株式会社 | Image forming method |
| JPH0623850B2 (en) * | 1986-05-06 | 1994-03-30 | 富士写真フイルム株式会社 | Dry image forming method |
| JPH0623845B2 (en) * | 1986-06-23 | 1994-03-30 | 富士写真フイルム株式会社 | Photosensitive image-receiving sheet material and image transfer method |
| JPH0619563B2 (en) * | 1986-09-26 | 1994-03-16 | 富士写真フイルム株式会社 | Photosensitive material for heat development |
| JPS6332536A (en) * | 1986-07-25 | 1988-02-12 | Fuji Photo Film Co Ltd | Photosensitive material |
| JPS6368830A (en) * | 1986-09-10 | 1988-03-28 | Fuji Photo Film Co Ltd | Photosensitive material |
| JPH0623837B2 (en) * | 1986-10-17 | 1994-03-30 | 富士写真フイルム株式会社 | Photosensitive material for heat development |
| JPH0625864B2 (en) * | 1986-11-05 | 1994-04-06 | 富士写真フイルム株式会社 | Method of manufacturing lithographic printing original plate |
| JP2582876B2 (en) * | 1988-11-16 | 1997-02-19 | キヤノン株式会社 | Image forming medium |
| US5266441A (en) * | 1989-07-29 | 1993-11-30 | Canon Kabushiki Kaisha | Image forming medium and image forming method |
| JP2696434B2 (en) | 1991-01-23 | 1998-01-14 | 富士写真フイルム株式会社 | Image forming method |
| JP2832765B2 (en) * | 1991-05-07 | 1998-12-09 | 富士写真フイルム株式会社 | Method of making color proof and photosensitive material |
| JP2007101935A (en) * | 2005-10-05 | 2007-04-19 | Fujifilm Corp | Composition for hologram recording medium, hologram recording medium, hologram recording method, and hologram reproduction method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5151933A (en) * | 1974-11-01 | 1976-05-07 | Fuji Photo Film Co Ltd | NETSUGENZOKANKOZAIRYO |
| JPS5816231A (en) * | 1981-07-23 | 1983-01-29 | Fuji Photo Film Co Ltd | Formation of image using polymer |
| JPS58121031A (en) * | 1982-01-13 | 1983-07-19 | Fuji Photo Film Co Ltd | Silver halide sensor type polymerizable photosensitive material |
-
1984
- 1984-09-12 JP JP19135384A patent/JPS6169062A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5151933A (en) * | 1974-11-01 | 1976-05-07 | Fuji Photo Film Co Ltd | NETSUGENZOKANKOZAIRYO |
| JPS5816231A (en) * | 1981-07-23 | 1983-01-29 | Fuji Photo Film Co Ltd | Formation of image using polymer |
| JPS58121031A (en) * | 1982-01-13 | 1983-07-19 | Fuji Photo Film Co Ltd | Silver halide sensor type polymerizable photosensitive material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6169062A (en) | 1986-04-09 |
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