JPH0256443U - - Google Patents

Info

Publication number
JPH0256443U
JPH0256443U JP13511388U JP13511388U JPH0256443U JP H0256443 U JPH0256443 U JP H0256443U JP 13511388 U JP13511388 U JP 13511388U JP 13511388 U JP13511388 U JP 13511388U JP H0256443 U JPH0256443 U JP H0256443U
Authority
JP
Japan
Prior art keywords
electrostatic chuck
ceramic layers
resistive film
base material
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13511388U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13511388U priority Critical patent/JPH0256443U/ja
Publication of JPH0256443U publication Critical patent/JPH0256443U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の第１実施例に係る静電チヤツ
クの縦断面図、第２図は第１図Ａ方向矢視図、第
３図は発熱抵抗膜のパタンを示す図、第４図は本
考案の第２実施例に係る静電チヤツクの縦断面図
、第５図はトランスデユーサ用抵抗膜のパタンを
示す図、第６図は第４図Ｂ方向矢視図、第７図は
本考案の第３実施例に係る静電チヤツクを示す縦
断面図、第８図は第７図Ｃ方向矢視図、第９図は
トランスデユーサ用抵抗膜のパタンを示す図であ
る。 尚、図面中１は基材、２は電極膜、３は誘電体
膜、６は半導体ウエハー、７は発熱抵抗膜、１０
はトランスデユーサ用抵抗膜である。 FIG. 1 is a longitudinal cross-sectional view of an electrostatic chuck according to the first embodiment of the present invention, FIG. 2 is a view taken in the direction of arrow A in FIG. 1, FIG. 3 is a diagram showing the pattern of the heating resistive film, and FIG. 4 5 is a longitudinal sectional view of an electrostatic chuck according to a second embodiment of the present invention, FIG. 5 is a diagram showing a pattern of a resistive film for a transducer, FIG. 6 is a view taken in the direction of arrow B in FIG. 4, and FIG. 8 is a longitudinal sectional view showing an electrostatic chuck according to a third embodiment of the present invention, FIG. 8 is a view taken in the direction of arrow C in FIG. 7, and FIG. 9 is a diagram showing a pattern of a resistive film for a transducer. In the drawings, 1 is a base material, 2 is an electrode film, 3 is a dielectric film, 6 is a semiconductor wafer, 7 is a heating resistive film, and 10
is a resistive film for transducer.

Claims (1)

【実用新案登録請求の範囲】 (1) 基材上に電極膜と誘電体膜とを積層してな
る静電チヤツクにおいて、前記基材はグリーンシ
ート積層法による複数のセラミツクス層から構成
され、これらセラミツクス層の間には発熱抵抗膜
が形成されていることを特徴とする静電チヤツク
。 (2) 前記基材を構成するセラミツクス層間には
温度を抵抗に変換するトランスデユーサ用抵抗膜
が発熱抵抗膜とは別に形成されていることを特徴
とする請求項１に記載の静電チヤツク。 (3) 前記トランスデユーサ用抵抗膜と発熱抵抗
とは異なるセラミツクス層間に形成されているこ
とを特徴とする請求項２に記載の静電チヤツク。[Claims for Utility Model Registration] (1) In an electrostatic chuck formed by laminating an electrode film and a dielectric film on a base material, the base material is composed of a plurality of ceramic layers formed by a green sheet lamination method; An electrostatic chuck characterized by a heat generating resistive film formed between ceramic layers. (2) The electrostatic chuck according to claim 1, wherein a transducer resistive film for converting temperature into resistance is formed separately from the heat generating resistive film between the ceramic layers constituting the base material. . (3) The electrostatic chuck according to claim 2, wherein the transducer resistive film and the heating resistor are formed between different ceramic layers.
JP13511388U 1988-10-17 1988-10-17 Pending JPH0256443U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13511388U JPH0256443U (en) 1988-10-17 1988-10-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13511388U JPH0256443U (en) 1988-10-17 1988-10-17

Publications (1)

Publication Number Publication Date
JPH0256443U true JPH0256443U (en) 1990-04-24

Family

ID=31394457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13511388U Pending JPH0256443U (en) 1988-10-17 1988-10-17

Country Status (1)

Country Link
JP (1) JPH0256443U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04133443U (en) * 1991-05-30 1992-12-11 京セラ株式会社 Ceramic electrostatic chuck
JPH058140A (en) * 1990-12-28 1993-01-19 Ngk Insulators Ltd Electrostatic chuck
JPH0513558A (en) * 1990-12-25 1993-01-22 Ngk Insulators Ltd Wafer heating device and its manufacture
JP2009218242A (en) * 2008-03-07 2009-09-24 Hitachi High-Technologies Corp Production method of plasma processing apparatus
JP2020077651A (en) * 2018-11-05 2020-05-21 日本特殊陶業株式会社 Holding device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0513558A (en) * 1990-12-25 1993-01-22 Ngk Insulators Ltd Wafer heating device and its manufacture
JPH058140A (en) * 1990-12-28 1993-01-19 Ngk Insulators Ltd Electrostatic chuck
JPH04133443U (en) * 1991-05-30 1992-12-11 京セラ株式会社 Ceramic electrostatic chuck
JP2009218242A (en) * 2008-03-07 2009-09-24 Hitachi High-Technologies Corp Production method of plasma processing apparatus
JP2020077651A (en) * 2018-11-05 2020-05-21 日本特殊陶業株式会社 Holding device

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