JPH0250104A - Metallic reflecting mirror - Google Patents
Metallic reflecting mirrorInfo
- Publication number
- JPH0250104A JPH0250104A JP16937788A JP16937788A JPH0250104A JP H0250104 A JPH0250104 A JP H0250104A JP 16937788 A JP16937788 A JP 16937788A JP 16937788 A JP16937788 A JP 16937788A JP H0250104 A JPH0250104 A JP H0250104A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- aluminum
- vapor
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 31
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 20
- 239000010408 film Substances 0.000 claims abstract description 16
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 6
- 239000012788 optical film Substances 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 229920003002 synthetic resin Polymers 0.000 claims 1
- 239000000057 synthetic resin Substances 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 19
- 238000005260 corrosion Methods 0.000 abstract description 19
- 238000007740 vapor deposition Methods 0.000 abstract description 13
- 238000010438 heat treatment Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 67
- 238000012360 testing method Methods 0.000 description 8
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は金属反射鏡、さらに詳しくは耐腐食性に優れた
金属反射鏡に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a metal reflecting mirror, and more particularly to a metal reflecting mirror with excellent corrosion resistance.
従来技術およびその課題
金属反射鏡は、ガラス基板あるいは樹脂基板表面上にア
ルミニウム金属等を蒸着してなり、さらるために該アル
ミニウム金属蒸着層上に一酸化ケイ素や二酸化ケイ素よ
りなる厚さ約０．５λｏ（λｏは設計主波長を表す）の
保護膜が形成される。Prior art and its problems A metal reflecting mirror is made by depositing aluminum metal or the like on the surface of a glass substrate or resin substrate, and in order to expose the aluminum metal deposited layer, a layer of silicon monoxide or silicon dioxide with a thickness of about 0 is deposited. A protective film of .5λo (λo represents the designed dominant wavelength) is formed.
しかし、基板として平面状あるいはそれに近い形状のも
のを使用し、その表面上に従来法に従いアルミニラ蒸着
層および厚さ約０．５λｏの保護膜を形成した金属反射
鏡は、目的とする耐傷性および耐腐食性が得られるが、
第１図に示したようなダハ型状の基板上に、従来法に従
い通常の蒸着装置を使用し、上記したように、アルミニ
ウム蒸着層を設け、さらに厚さ０．５λｏの保護層を設
けＩ；金属反射鏡はアルミニウムの耐腐食性に問題があ
り、その腐食は高温高湿下で特に著しい。However, metal reflecting mirrors that use a planar or nearly planar substrate and have an aluminium-deposited layer and a protective film of about 0.5λo thick formed on the surface according to the conventional method have the desired scratch resistance and Provides corrosion resistance, but
On a roof-shaped substrate as shown in FIG. 1, an aluminum evaporated layer was formed as described above, and a protective layer with a thickness of 0.5λo was formed using an ordinary evaporation apparatus according to the conventional method. ; Metal reflecting mirrors have a problem with the corrosion resistance of aluminum, and the corrosion is particularly severe under high temperature and high humidity.
腐食の防止に関しては、例えば特開昭５４−２４０４６
号公報が知られている。上記技術は空気と金属層との間
に高充填率の物質を蒸着することにより腐食の問題を解
決するものであり、本願がアルミニウムの酸化被膜によ
り腐食を防止するのとは異なる。Regarding the prevention of corrosion, for example, Japanese Patent Application Laid-Open No. 54-24046
No. Publication is known. The above technique solves the corrosion problem by depositing a material with a high filling rate between the air and the metal layer, unlike the present invention which prevents corrosion by using an oxide layer on aluminum.
にこの金属反射鏡に耐傷性や耐腐食性等を持たせ発明が
解決しようとする課題
本発明は上記したような問題点を解決し、従来の蒸着装
置等を使用してダハ形状の基板を使用して金属反射鏡を
構成した場合でも耐傷性および耐腐食性に優れている金
属反射鏡を提供することを目的とする。The present invention solves the above-mentioned problems by imparting scratch resistance, corrosion resistance, etc. to this metal reflecting mirror. An object of the present invention is to provide a metal reflecting mirror that has excellent scratch resistance and corrosion resistance even when used to construct a metal reflecting mirror.
上記目的は、アルミニウム蒸着層上に設ける保護層の厚
さを従来の約０．５λｏに比べてごく薄くすることによ
り達成される。The above object is achieved by making the thickness of the protective layer provided on the aluminum vapor deposited layer very thin compared to the conventional thickness of about 0.5λo.
課題を解決するための手段
すなわち、本発明は、基板上に形成した蒸着膜において
、空気側からみて、光学的膜厚が０．０３〜０．１５λ
ｏ（λｏは設計主波長を表す）であるケイ素の酸化物あ
るいは７ツ化マグネシウムからなる第１層、および機械
的膜厚が５００〜２０００人のアルミニウムからなる第
２層を有する金属反射鏡に関する。Means for Solving the Problems That is, the present invention provides a vapor deposited film formed on a substrate with an optical film thickness of 0.03 to 0.15λ when viewed from the air side.
o (λo represents the design dominant wavelength), a first layer made of silicon oxide or magnesium heptadide, and a second layer made of aluminum with a mechanical thickness of 500 to 2000 people. .
本発明の金属反射鏡は、基板上に少なくともアルミニウ
ム蒸着層およびケイ素の酸化物あるいはフッ化マグネシ
ウムの蒸着層の２層をその順に設けてなる。本発明にお
いては、空気側に存在するケイ素の酸化物あるいはフッ
化マグネシウムの蒸着層を第１層、アルミニウム蒸着層
を第２層とする。The metal reflecting mirror of the present invention has at least two layers, an aluminum vapor deposited layer and a silicon oxide or magnesium fluoride vapor deposited layer, provided in this order on a substrate. In the present invention, the vapor deposited layer of silicon oxide or magnesium fluoride present on the air side is the first layer, and the vapor deposited aluminum layer is the second layer.
基板の材質としては、特に限定されるものではなく、例
えば各種のガラスあるいは一脂基板等を使用することが
でき、係る基板上に第２層および１１層を設ける。The material of the substrate is not particularly limited, and, for example, various types of glass or monolithic substrates can be used, and the second layer and the eleventh layer are provided on such a substrate.
第２層はアルミニウム金属を蒸着することにより、機械
的膜厚が５００Ａ〜２０００Ａとなるように設ける。そ
の膜厚が５００人より薄いと光が透過して反射率が低下
し、２０００人より厚いとクラックが生じやすい。The second layer is provided by vapor depositing aluminum metal so that the mechanical thickness is 500A to 2000A. If the film thickness is less than 500 mm, light will pass through and the reflectance will decrease, and if it is thicker than 2000 mm, cracks will likely occur.
第１層は一酸化ケイ素あるいは二酸化ケイ素等のケイ素
の酸化物あるいはフッ化マグネシウムを蒸着する。それ
らの物質を第１層に使用するのは特に第２層との関係で
反射率の低下が小さいからである。The first layer is deposited with an oxide of silicon, such as silicon monoxide or silicon dioxide, or with magnesium fluoride. The reason why these materials are used for the first layer is that the decrease in reflectance is small especially in relation to the second layer.
ｗＩ１層は光学的膜厚として０．０３〜０，１５λｏ（
λｏは設計主波長を表す）になるように設ける。The wI1 layer has an optical thickness of 0.03 to 0.15λo (
λo represents the design dominant wavelength).
１１１層の膜厚が０．０３λ・より薄いと表面硬度が不
足し、金属反射鏡の表面に傷が付きやすくなる。If the thickness of the 111 layer is less than 0.03λ, the surface hardness will be insufficient and the surface of the metal reflecting mirror will be easily scratched.
一方、膜厚が０．１５λｏより厚いと第２層のアルミニ
φム金属蒸着層表面でのアルミニウムの酸化被膜の形成
が阻害され、得られる金属反射鏡は耐腐食性に劣るもの
となる。On the other hand, if the film thickness is thicker than 0.15λo, the formation of an aluminum oxide film on the surface of the second aluminum φ metal vapor deposited layer is inhibited, and the resulting metal reflecting mirror has poor corrosion resistance.
第１層および第２層の蒸着層は、公知の蒸着法および蒸
着装置を使用することができるが、その際、例えば抵抗
加熱法により蒸気化された蒸着状物質の基板への入射角
度に注意することが重要である。例えば、平板状の基板
に蒸着する場合を第２図を参号にしてそのことを説明す
る。第２図中、（１）は蒸着層を形成しようとする、基
板で、矢印（２）は抵抗加熱等の手段で蒸気化された物
質の基板（１）上への入射方向を示し、その矢印と基板
における法線（３）とのなす角度を蒸着物質の入射角度
θとする。The first and second vapor deposition layers can be formed by using a known vapor deposition method and vapor deposition apparatus, but in this case, care should be taken, for example, regarding the angle of incidence of the vaporized substance vaporized by a resistance heating method onto the substrate. It is important to. For example, the case of vapor deposition on a flat substrate will be explained with reference to FIG. In Figure 2, (1) is the substrate on which the vapor deposition layer is to be formed, and the arrow (2) indicates the direction of incidence of the substance vaporized by means such as resistance heating onto the substrate (1). The angle between the arrow and the normal line (3) to the substrate is defined as the incident angle θ of the vapor-deposited substance.
蒸着物質の入射角度θが０度に近いほど、基板上には充
填密度の高い膜が形成され、入射角度θが９０度に近く
成る程充填密度の低い瞑が形成される。従って、入射角
度θが０度に近い条件で第１層が形成される場合は、得
られる蒸着膜は充填密度の高い膜であるので、第１層が
第２．層のアルミニウム蒸着層への水蒸気の侵入を妨げ
ることがセサ、第２層のアルミニウム蒸着層の腐食を防
止する。さらにアルミニウム蒸着層の劣化による反射率
低下が防止されるｉ
しかし、入射角度θが次第に大きくなり、９０・度に近
くなれば成る程、特に入射角度が２０度以上になると、
蒸着層の充填率が低くなり、高充填率で形成された蒸着
層と同じよう優れた特性、特に耐腐食性を期待すること
ができない。従来の方法に従って、厚さが０．５０λｏ
程度であり、低い充填率で形成された第１層は酸素が透
過するよりも、水分が通りやすいためと考えられ、特に
高温高湿下においては１１１層を通過した水蒸気が、ア
ルミニウムの第２層に侵入し、アルミニウムを腐食させ
ることが顕著である。そこで、このような腐食を防止す
るために種々検討した結果、上記したようにｗ１１層の
厚さを従来より大幅に薄くすることにより、対腐食性、
耐傷性に優れた金属反射鏡とすることができる。これは
第２層のアルミニウム層表面上に酸素の第１層を通過し
ての侵入が水蒸気のその侵入よりも容易に−なり、その
酸素がアルミニウムと化合し、水蒸気に対して対腐食性
のあるアルミニウム酸化物が第２層表面上に被服形成さ
れるからであると考えられる。The closer the incident angle θ of the vapor deposition material is to 0 degrees, the more densely packed a film is formed on the substrate, and the closer the incident angle θ is to 90 degrees, the lower the film is formed on the substrate. Therefore, when the first layer is formed under conditions where the incident angle θ is close to 0 degrees, the resulting deposited film is a film with high packing density, so that the first layer becomes the second layer. Preventing water vapor from entering the aluminum deposited layer of the second layer prevents corrosion of the second aluminum deposited layer. Furthermore, a decrease in reflectance due to deterioration of the aluminum vapor deposited layer is prevented.However, as the incident angle θ gradually increases and approaches 90 degrees, especially when the incident angle becomes 20 degrees or more,
The filling rate of the deposited layer becomes low, and it is not possible to expect the same excellent properties, especially corrosion resistance, as with a deposited layer formed with a high filling rate. According to the conventional method, the thickness is 0.50λo
This is thought to be due to the fact that water vapor passes through the first layer formed at a low filling rate more easily than oxygen permeates through it.Especially in high temperature and high humidity conditions, water vapor that has passed through the 111 layer passes through the aluminum second layer. It is noticeable that it penetrates the layers and corrodes the aluminum. Therefore, as a result of various studies to prevent such corrosion, as mentioned above, by making the thickness of the W11 layer significantly thinner than before, corrosion resistance and
A metal reflecting mirror with excellent scratch resistance can be obtained. This is because oxygen penetrates through the first layer onto the surface of the second aluminum layer more easily than water vapor, and the oxygen combines with aluminum, making it corrosion resistant to water vapor. This is believed to be because some aluminum oxide is coated on the surface of the second layer.
本発明に従うと、第１図に示したダハ形状等のの複雑な
基板を使用して耐腐食性および耐優性に優れた金属反射
鏡を得ることができる。従来、ダハ形状の等の複雑な形
状の金属反射鏡を作製する場合は、平板状等の簡単な形
状の金属反射鏡を作製し、それを組み立てることにより
作製していたが、本発明によりそのような複雑な形状の
金属反射鏡でもその形状のまま蒸着を行ない、耐傷性お
よび耐腐食性に優れた金属反射鏡を作製することができ
、また従来のような組み立て工程を必要としない。According to the present invention, a metal reflecting mirror with excellent corrosion resistance and superior resistance can be obtained using a complicated substrate such as the roof shape shown in FIG. Conventionally, when manufacturing a metal reflector with a complicated shape such as a roof shape, it was done by manufacturing a metal reflector with a simple shape such as a flat plate and assembling them. Even a metal reflecting mirror with a complicated shape can be vapor-deposited in its shape, making it possible to produce a metal reflecting mirror with excellent scratch resistance and corrosion resistance, and there is no need for the conventional assembly process.
本発明の金属反射鏡においては第２層の下にさらに一酸
化ケイ素からなる第３層を設け、基板と蒸着膜との付着
力の向上等を図ってもよい。In the metal reflecting mirror of the present invention, a third layer made of silicon monoxide may be further provided below the second layer to improve adhesion between the substrate and the deposited film.
以下に比較例および実施例を挙げて本発明を説明する。The present invention will be explained below with reference to comparative examples and examples.
坦箆！
インジェクション成形された第１図に示した形状のポリ
カーボネート樹脂基板（第１図において角度θ″９０度
）の上に、第３図に示した蒸着装置を使用して、第３層
、第２層および第１層を形成しＩこ。Tanpaku! Using the vapor deposition apparatus shown in Fig. 3, the third layer and second layer are deposited on the injection molded polycarbonate resin substrate having the shape shown in Fig. 1 (angle θ''90 degrees in Fig. 1). and form the first layer.
第３図中、（７）は排気管（６）を有する真空チャンバ
ーであり、真空チャンバー内は排気管を通じて脱気され
る。（４）および（５）は抵抗加熱電極であり、該電極
間には蒸着物質の容器を兼ねる抵抗加熱容器（ｌＯ）お
よび（１１）が取り付けられている。該抵抗加熱容器（
ｌＯ）、（ｌ ｌ）は該電極（４）、（５）から電力を
供給され、抵抗加熱容器（Ｉ Ｏ）、（１１）中の蒸着
物質を加熱気化させる。抵抗加熱容器（ｌＯ）、（１１
）をおおって、回転可能な回転ドーム（８）が設けられ
、該回転ドーム（８）の上に被蒸着体である基板（９）
が載置される。回転ドームは蒸着操作中回転し、基板表
面上に均一な蒸着膜が形成される。In FIG. 3, (7) is a vacuum chamber having an exhaust pipe (6), and the inside of the vacuum chamber is evacuated through the exhaust pipe. (4) and (5) are resistance heating electrodes, and resistance heating containers (lO) and (11), which also serve as containers for the vapor deposition material, are attached between the electrodes. The resistance heating container (
1O), (11) are supplied with power from the electrodes (4), (5), and heat and vaporize the deposition material in the resistance heating container (I2O), (11). Resistance heating container (lO), (11
), a rotatable rotating dome (8) is provided, and a substrate (9) to be deposited is placed on the rotating dome (8).
is placed. The rotating dome rotates during the deposition operation to form a uniform deposited film on the substrate surface.
以上の構成を有する蒸着装置を使用し、上記基板上に以
下に示す第１層〜第３層の蒸着層を形成し金属反射鏡を
得た。Using the vapor deposition apparatus having the above configuration, the following first to third vapor deposition layers were formed on the substrate to obtain a metal reflecting mirror.
第３層として真空度Ｉ Ｘ ｌ Ｏ−’Ｔｏｒｒで光学
的膜厚０．２５λｏ（λｏ（設計主波長）は６５０ｎｍ
である。以下において同じ）の−酸化ケイ素の層を上記
基板表面上に蒸着形成した。第２層として真空度２ Ｘ
Ｉ Ｏ−’Ｔｏｒｒで機械的膜厚１０００Ａのアルミ
ニウムの層を第３層上に蒸着形成した。第１層として真
空度２．５Ｘ Ｉ Ｏ−’Ｔｏｒｒで光学的膜厚０．５
０λｏの−酸化ケイ素の層を第２層の上に蒸着形成した
。The third layer has an optical thickness of 0.25λo (λo (design dominant wavelength) is 650nm at a vacuum degree of IXlO-'Torr).
It is. A layer of -silicon oxide (hereinafter the same) was deposited on the surface of the substrate. Vacuum degree 2X as the second layer
A layer of aluminum with a mechanical thickness of 1000 Å was deposited on the third layer at IO-'Torr. As the first layer, the optical thickness is 0.5 at a vacuum level of 2.5X IO-'Torr.
A layer of 0λo -silicon oxide was deposited over the second layer.
衷凰匹
上記比較例で使用した装置および基板と同様のものを使
用し、以下に示した第１層〜第３層を有する金属反射鏡
を得た。A metal reflecting mirror having the first to third layers shown below was obtained using the same apparatus and substrate as those used in the above comparative example.
第３層として真空度Ｉ Ｘ ｌ Ｏ−’Ｔｏｒｒで光学
的膜厚０．２５λｏの−酸化ケイ素の層を上記基板表面
上に蒸着形成した。第２層として真空度２Ｘ１０−’Ｔ
ｏｒｒで機械的膜厚１０００人のアルミニウムの層を第
３層上に蒸着形成した。第１層として真空度２．５Ｘ
Ｉ ０−４Ｔｏｒｒで光学的膜厚０．０９λｏの−酸化
ケイ素の層を第２層の上に蒸着形成した。As a third layer, a layer of -silicon oxide having an optical thickness of 0.25 λo was deposited on the surface of the substrate at a vacuum degree of I X l O-' Torr. Vacuum degree 2X10-'T as the second layer
A layer of aluminum with a mechanical thickness of 1000 nm was deposited on the third layer at orr. Vacuum degree 2.5X as the first layer
A layer of -silicon oxide with an optical thickness of 0.09 λo was deposited on top of the second layer at I 0-4 Torr.
匠囁
上記比較例および実施例で得られた金属反射鏡について
以下の試験を行った。The following tests were conducted on the metal reflective mirrors obtained in the above Comparative Examples and Examples.
ａ）耐溶剤性試験・・・７０ンソルプとアルコールの混
合溶液を浸したレンズ拭き紙（シルボン紙）を使用し、
０ 、５〜ｌ ｋｇ／ ｃｍ”の圧で１０往復こすり、
金属反射鏡表面に傷等の異常がないかどうかを調べた。a) Solvent resistance test: Using lens wiping paper (Silbon paper) soaked in a mixed solution of 70 NSORP and alcohol,
Rub it back and forth 10 times with a pressure of 0.5 to 1 kg/cm.
The surface of the metal reflector was checked to see if there were any scratches or other abnormalities.
結果を表１中に示した。The results are shown in Table 1.
表中○は試験後変化が認められなかったことを示す。In the table, ○ indicates that no change was observed after the test.
ｂ）耐温湿試験・・・温度７０℃、湿度８０％に調整し
た恒温槽中に１００時間放置し、金属反射鏡の反射率を
調べた。結果を表１中に示めした。b) Temperature and humidity resistance test: The product was left in a constant temperature bath adjusted to a temperature of 70° C. and a humidity of 80% for 100 hours, and the reflectance of the metal reflector was examined. The results are shown in Table 1.
表中○は試験後変化が認められなかったことを示す。In the table, ○ indicates that no change was observed after the test.
Ｃ）温度−３０℃雰囲気から温度７０℃の雰囲気下に置
く工程を１０回連続してサイクル試験を行った。結果を
表１に示した。C) A cycle test was conducted in which the process of placing the sample in an atmosphere ranging from a temperature of -30°C to an atmosphere of 70°C was repeated 10 times. The results are shown in Table 1.
表中○は試験径変化が認められなかったことを示す。In the table, ○ indicates that no change in the test diameter was observed.
以上の試験結果を表１に示した。The above test results are shown in Table 1.
表！table!
第１図は実施例および比較例で用いた基板の形状を示す
図である。
第２図は蒸着物質の入射角度を説明するための図である
。
第３図は蒸着装置の１例を示す該略構成を示す図である
。FIG. 1 is a diagram showing the shapes of substrates used in Examples and Comparative Examples. FIG. 2 is a diagram for explaining the incident angle of the vapor-deposited substance. FIG. 3 is a diagram showing the general configuration of an example of a vapor deposition apparatus.
Claims (1)
、光学的膜厚が０．０３〜０．１５λ＿ｏ（λ＿ｏは設
計主波長を表す）であるケイ素の酸化物あるいはフッ化
マグネシウムからなる第１層、および機械的膜厚が５０
０〜２０００Åのアルミニウムからなる第２層を有する
金属反射鏡。 ２、基板が合成樹脂である請求項１記載の金属反射鏡。[Scope of Claims] 1. Silicon oxide or silicon oxide having an optical film thickness of 0.03 to 0.15λ_o (λ_o represents the designed dominant wavelength) when viewed from the air side in the vapor deposited film formed on the substrate. A first layer consisting of magnesium fluoride and a mechanical thickness of 50
A metal reflector with a second layer of aluminum of 0-2000 Å. 2. The metal reflecting mirror according to claim 1, wherein the substrate is made of synthetic resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63169377A JP2780174B2 (en) | 1988-05-16 | 1988-07-07 | Manufacturing method of metal reflector |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11866188 | 1988-05-16 | ||
| JP63-118661 | 1988-05-16 | ||
| JP63169377A JP2780174B2 (en) | 1988-05-16 | 1988-07-07 | Manufacturing method of metal reflector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0250104A true JPH0250104A (en) | 1990-02-20 |
| JP2780174B2 JP2780174B2 (en) | 1998-07-30 |
Family
ID=26456561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63169377A Expired - Lifetime JP2780174B2 (en) | 1988-05-16 | 1988-07-07 | Manufacturing method of metal reflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2780174B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7465960B2 (en) | 2003-11-14 | 2008-12-16 | Sharp Kabushiki Kaisha | Submount for light emitting/receiving device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53133747U (en) * | 1977-03-30 | 1978-10-23 | ||
| JPS5872106A (en) * | 1981-10-24 | 1983-04-30 | Matsushita Electric Works Ltd | Light reflector |
| JPS61196221A (en) * | 1985-02-27 | 1986-08-30 | Canon Inc | Rotating polygohn mirror and its preparation |
-
1988
- 1988-07-07 JP JP63169377A patent/JP2780174B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53133747U (en) * | 1977-03-30 | 1978-10-23 | ||
| JPS5872106A (en) * | 1981-10-24 | 1983-04-30 | Matsushita Electric Works Ltd | Light reflector |
| JPS61196221A (en) * | 1985-02-27 | 1986-08-30 | Canon Inc | Rotating polygohn mirror and its preparation |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7465960B2 (en) | 2003-11-14 | 2008-12-16 | Sharp Kabushiki Kaisha | Submount for light emitting/receiving device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2780174B2 (en) | 1998-07-30 |
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