JPH0240441U - - Google Patents
Info
- Publication number
- JPH0240441U JPH0240441U JP11921888U JP11921888U JPH0240441U JP H0240441 U JPH0240441 U JP H0240441U JP 11921888 U JP11921888 U JP 11921888U JP 11921888 U JP11921888 U JP 11921888U JP H0240441 U JPH0240441 U JP H0240441U
- Authority
- JP
- Japan
- Prior art keywords
- mass flow
- flow rate
- flow controller
- controller
- systems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Flow Control (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11921888U JPH0240441U (zh) | 1988-09-10 | 1988-09-10 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11921888U JPH0240441U (zh) | 1988-09-10 | 1988-09-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0240441U true JPH0240441U (zh) | 1990-03-19 |
Family
ID=31364258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11921888U Pending JPH0240441U (zh) | 1988-09-10 | 1988-09-10 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0240441U (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140064868A (ko) * | 2011-08-17 | 2014-05-28 | 에드워즈 리미티드 | 가스 스트림을 처리하기 위한 장치 |
JP2019529081A (ja) * | 2016-09-02 | 2019-10-17 | フルイディック・アナリティクス・リミテッド | マイクロ流体デバイスのための流体流制御器の改良またはそれに関する改良 |
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1988
- 1988-09-10 JP JP11921888U patent/JPH0240441U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140064868A (ko) * | 2011-08-17 | 2014-05-28 | 에드워즈 리미티드 | 가스 스트림을 처리하기 위한 장치 |
JP2014529493A (ja) * | 2011-08-17 | 2014-11-13 | エドワーズ リミテッド | ガス流処理装置 |
JP2019529081A (ja) * | 2016-09-02 | 2019-10-17 | フルイディック・アナリティクス・リミテッド | マイクロ流体デバイスのための流体流制御器の改良またはそれに関する改良 |