JPH0235912A - Removing process for special material gas - Google Patents
Removing process for special material gasInfo
- Publication number
- JPH0235912A JPH0235912A JP63182803A JP18280388A JPH0235912A JP H0235912 A JPH0235912 A JP H0235912A JP 63182803 A JP63182803 A JP 63182803A JP 18280388 A JP18280388 A JP 18280388A JP H0235912 A JPH0235912 A JP H0235912A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- special material
- material gas
- reaction
- chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims description 22
- 238000006243 chemical reaction Methods 0.000 claims abstract description 18
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 8
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 51
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims description 25
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 4
- 229910000077 silane Inorganic materials 0.000 claims description 4
- -1 diborane Chemical compound 0.000 claims description 3
- 239000005708 Sodium hypochlorite Substances 0.000 claims description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 2
- 238000005868 electrolysis reaction Methods 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 6
- 239000003513 alkali Substances 0.000 abstract 2
- 229910000070 arsenic hydride Inorganic materials 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 108091006629 SLC13A2 Proteins 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 101100284258 Euplotes crassus H2B2 gene Proteins 0.000 description 1
- 108091006587 SLC13A5 Proteins 0.000 description 1
- 101100338264 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) HTB2 gene Proteins 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000009841 combustion method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体製造工場等で使用されて微量であって
も極めて有害な特殊材料ガスの効率的な除去方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an efficient method for removing special material gases that are used in semiconductor manufacturing factories and the like and are extremely harmful even in minute amounts.
特殊材料ガスとは、微量であっても、人体の極めて有害
なガス成分が数多く含有され、その代表的なものにシラ
ン、ジボラン、ホスフィン及びアルシンがある。Special material gases contain many gas components that are extremely harmful to the human body, even in trace amounts, and typical examples include silane, diborane, phosphine, and arsine.
特殊材料ガスは、半導体の製造に使用されるが、その使
用量は、年々増加の傾向にアシ、使用後の該ガスの有効
な除去技術の確立が強く要望されていたものである。Special material gases are used in the manufacture of semiconductors, and the amount used has been increasing year by year, and there has been a strong desire to establish an effective removal technique for the gases after use.
しかして、従来の方法は、共存する単位ガスを各個に固
体吸着剤を使用して固相吸着せしめて除去するもの、又
は湿式に吸収するもの、さらに、燃焼せしめて除去する
方法等があるが、結局は単−成分を夫々別異の条件で反
応せしめて除去するものであシ、上記の従来方法には下
記の如き欠点を有していた。即ち、
ａ、吸着法は、比較的高除去率が期待できるが、高濃度
処理の場合、コスト高となる
す、湿式吸収法は、７ランの除去率が低く、後処理工程
における空気酸化によるダストの処理が煩わしい
Ｃ２燃焼方式は、安全性及びＳ１０□ダストの発生の問
題が残る
等でありさらに解決すべき課題が多く存在していた。Conventional methods include methods in which the coexisting unit gases are removed by solid-phase adsorption using a solid adsorbent, wet absorption methods, and methods in which the coexisting unit gases are removed by combustion. In the end, each single component is removed by reacting under different conditions, and the above-mentioned conventional method has the following drawbacks. That is, a. Although the adsorption method can be expected to have a relatively high removal rate, it is expensive in the case of high-concentration treatment. The wet absorption method has a low removal rate in 7 runs, and the removal rate is low due to air oxidation in the post-treatment process. The C2 combustion method, which requires troublesome dust disposal, still has many problems to be solved, such as safety and the generation of S10□ dust.
本発明は、上記の実状に鑑みてなされたもので、特殊材
料ガスに共存するシラン、ジボラｙ、ホスフィン及びア
ルシンなどの代表的な有毒成分を一挙に高除去率をもっ
て除去し、しかも、高濃度から低濃度までの広い範囲の
特殊材料ガスが処理が可能で、ダストの発生がなく、安
全でかつ低コストな除去方法を提供することをその目的
とするものである。The present invention was made in view of the above-mentioned circumstances, and it removes typical toxic components such as silane, dibora y, phosphine, and arsine that coexist in special material gases at once with a high removal rate. The purpose is to provide a safe and low-cost removal method that can process a wide range of special material gases from low concentrations to low concentrations, does not generate dust.
本発明は、
料ガスを
１ｉ） 塩素ガスと反応せしめ
（ｉｉｉ） 反応生成物をアルカリ溶液に誘導して該
溶液に吸収して除去する
以上を要旨として成立するもので、特に、特殊材料ガス
中の代表的な猛毒の単位成分であるシラン、？５−）ｙ
、ホスフィン及びアルシンなどの各ガスと塩素ガスとを
ガス−ガス反応せしめて一挙に除去することをその重要
な特徴部分とするものである。The present invention is based on the following aspects: 1i) Reacting a raw material gas with chlorine gas (iii) Inducing the reaction product to an alkaline solution and absorbing and removing it in the solution. Silane, which is a representative highly toxic unit component of ? 5-)y
An important characteristic of this method is that each gas such as phosphine, arsine, and chlorine gas is subjected to a gas-gas reaction to be removed all at once.
以下、図面を参照し実施例に基づいて本発明を説明する
。Hereinafter, the present invention will be described based on examples with reference to the drawings.
第１図は、本発明の原理図でガス供給箱１から定量的に
排出される特殊材料ガスが導管２をとおシ、塩素ガス源
（図示せず）から導管３に導かれる塩素ガスと会合して
、ガス反応塔４内でガス−ガス反応せしめられる。FIG. 1 is a diagram showing the principle of the present invention, in which a special material gas quantitatively discharged from a gas supply box 1 passes through a conduit 2 and combines with chlorine gas led from a chlorine gas source (not shown) to a conduit 3. A gas-gas reaction is then carried out in the gas reaction tower 4.
この場合、各単位ガスは、下記の如く反応する。In this case, each unit gas reacts as follows.
ＳｉＨ４＋ ２Ｃ１２→５ＩＣｔ４＋２ Ｈ２（又は）
ＳｉＨ４＋ ＣＬ２→ ５ＩＨ２ＣＬ２＋ Ｈ２Ｂ２
Ｈ６＋３Ｃ２２→２ＢＣ２，＋ ３Ｈ２２ＰＨ３＋ ３
Ｃ１２→２ＰＣ１３＋ ３Ｈ２２に８Ｈ，＋ ３Ｃ１２
→２ＡｓＣｔ、 ＋ ３Ｈ２上記の各反応生成物は、導
管５を通シ、吸収塔６に導かれるが、この際、該塔上部
から撒布されるアルカリ吸収液により充填層６１内で吸
収される。吸収は、下式の如く行われる。SiH4+ 2C12→5ICt4+2 H2 (or)
SiH4+ CL2→ 5IH2CL2+ H2B2
H6+3C22→2BC2,+ 3H22PH3+ 3
C12→2PC13+ 3H22 to 8H, + 3C12
→2AsCt, +3H2 Each of the above reaction products is led to the absorption tower 6 through the conduit 5, where it is absorbed in the packed bed 61 by the alkaline absorption liquid sprayed from the upper part of the tower. Absorption is performed as shown below.
５ＩＣＬ４＋ ６ ＮａＯＨ−＋Ｎａ５Ａ０３ ＋ ４
ＮａＣ１＋３ Ｈ２０ＢＣ４＋ ６ ＮａＯＨ−＋
Ｎａｓ Ｂｏ３＋ ３ ＮａＣ４＋ ３Ｈ２０ＰＣＬｓ
＋ ６ＮａＯＨ→Ｎａ３ＰＯ３＋ ３ＮａＣ６＋ ３
Ｈ２０ＡｓＣｔ３＋ ６ＮａＯＨ−＋Ｎａ５Ａｓ０３
＋ ３ＮａＣｔ＋ ３Ｈ２０次に第２図には、塩素ガス
が塩素ガスボンベ１４Ａから供給される例が、また、第
３図には、塩素ガス発生器１４Ｂから供給される例が示
される。後者は、塩素ガスが下式の如く、導管１５から
誘導される次亜塩素酸塩又は過酸化水素の各溶液と導管
１６から誘導される塩酸とを攪拌器１７で攪拌作用せし
めて製造される。5ICL4+ 6 NaOH-+Na5A03 + 4
NaC1+3 H20BC4+ 6 NaOH-+
Nas Bo3+ 3 NaC4+ 3H20PCLs
+ 6NaOH→Na3PO3+ 3NaC6+ 3
H20AsCt3+ 6NaOH-+Na5As03
+ 3NaCt+ 3H20 Next, FIG. 2 shows an example in which chlorine gas is supplied from a chlorine gas cylinder 14A, and FIG. 3 shows an example in which chlorine gas is supplied from a chlorine gas generator 14B. The latter is produced by stirring each solution of hypochlorite or hydrogen peroxide derived from a conduit 15 and hydrochloric acid derived from a conduit 16 with a stirrer 17 using chlorine gas as shown in the following formula. .
ＮａＣｔＯ＋ ２ ＨＣｔ→ＮａＣ２＋ Ｈ２０＋ Ｃ
ｔ２↑Ｈ２０□＋２ ＨＣＡ→２Ｈ２０＋Ｃ２２↑ガス
反応筒４は、円筒状で内径１００ｍ、高さ１ｍに形成さ
れ、また、吸収塔６も円筒状で内径１００■、高さ１ｍ
に形成されるが、この内部で１５ｍφの２ツヒシリング
が６００目高に充填されて対抗接触の湿式充填塔となっ
ている。さらに、吸収液は１０ ％ ＮａＯＨ溶液で、
塔内通過ガス速度は、３０薗／秒となっている。処理さ
れる前のガンμＳ−１で、また、処理後のガスはＳ−２
で採取され、夫々のガス濃度が測定される。NaCtO+ 2 HCt→NaC2+ H20+ C
t2↑H20□+2 HCA→2H20+C22↑The gas reaction cylinder 4 is cylindrical and has an inner diameter of 100 m and a height of 1 m, and the absorption tower 6 is also cylindrical and has an inner diameter of 100 m and a height of 1 m.
Inside this tower, two 15 mφ double-sided rings are packed to a height of 600 meshes to form a wet-type packing tower with counter-contact. Furthermore, the absorption liquid was a 10% NaOH solution,
The gas velocity passing through the tower was 30 m/sec. The gun μS-1 before being treated, and the gas S-2 after being treated.
and the concentration of each gas is measured.
吸収塔６内でガス吸収反応によｐ ＮａＣ１等が混入し
た吸収液は導管１３からタンクＩＯＫ貯えられたのち、
ポンプ１１で導管１２ｔ−揚液され吸収塔６に再循環せ
しめられる。処理された後のガスは、導管７．排気プロ
ワ８を通シ排出９される。この際Ｓ−２で、ガス濃度が
測定される。各種濃度のＣｔ２ガスを使用して、本発明
に係る処理を実施した結果の特殊材料ガスにおける各成
分ガスの除去率は第１表のとお）である。After the absorption liquid mixed with p-NaC1 etc. due to the gas absorption reaction in the absorption tower 6 is stored in the tank IOK from the conduit 13,
The liquid is pumped up through the conduit 12t by the pump 11 and recirculated to the absorption tower 6. After being treated, the gas is transferred to conduit 7. It is discharged 9 through an exhaust blower 8. At this time, gas concentration is measured in S-2. Table 1 shows the removal rate of each component gas in the special material gas as a result of carrying out the treatment according to the present invention using Ct2 gas of various concentrations.
また、別の実施例として、第４図に示す生成ＮａＣ１の
電解槽１４Ｄを設けたものがある。この方式では、上側
におけるタンク１０が電解槽として使用されるのが一般
的である。即ち、吸収塔６を通過した吸収液が導管１３
をとおシ、陽極１８と陰極１９とが隔膜２０を介して対
設されてなる電解槽１４Ｄに供給される。通電により陽
極１８側に発生した塩素ガスが導管３を通りて導管２に
供給されることは前掲のとおシである。夕次に、別の実
施例をして、防爆構造化されたガス反応塔が第５図に示
される。ガス供給箱１から供給される特殊材料ガスは導
管２を通電がス反応塔に誘導されるが、比較的激しいｊ
スーガス反応による不慮の災害等を防ぐためガス反応塔
を防爆構造とすることが望ましい。即ち、ガ？反応塔内
部には、塩素ガスの導管３に接続される２重構造の多数
のパイプ２１ 、２１ 、ｅ・・が設けられ、Ａ？パイ
プは側壁に多数の孔２２．２２．・・・が穿設される。Further, as another example, there is one provided with an electrolytic cell 14D for generated NaC1 shown in FIG. In this system, the upper tank 10 is generally used as an electrolytic cell. That is, the absorption liquid that has passed through the absorption tower 6 is transferred to the conduit 13.
Through this, the anode 18 and the cathode 19 are supplied to an electrolytic cell 14D which is arranged opposite to each other with a diaphragm 20 in between. As mentioned above, the chlorine gas generated on the anode 18 side by energization is supplied to the conduit 2 through the conduit 3. Next, another embodiment of a gas reaction tower having an explosion-proof structure is shown in FIG. The special material gas supplied from the gas supply box 1 is guided to the reaction tower by energizing the conduit 2, but the current is relatively strong.
In order to prevent unexpected disasters caused by soogas reactions, it is desirable that the gas reaction tower has an explosion-proof structure. In other words, moth? Inside the reaction tower, a large number of pipes 21, 21, e, etc. with a double structure connected to the chlorine gas conduit 3 are provided. The pipe has a number of holes 22.22 in the side wall. ... is drilled.
このため、特殊材料ガスはノ々イブの間隙をＸ方向に分
流するのに対し、塩素ガスはＹ方向から衝突するように
なシ、両ガスは塔内全域に分布する多数の会合点で反応
し、爆発の危険性も減少する許シでなく、パイプの存在
がガスの流れを円滑にし、反応を促進する効果をも有し
て極めて好都合である。For this reason, the special material gas is split in the X direction through the gap between Nonobu, while the chlorine gas collides from the Y direction, and both gases react at numerous meeting points distributed throughout the tower. However, the presence of the pipe not only reduces the risk of explosion, but also has the effect of smoothing the flow of gas and promoting the reaction, which is extremely convenient.
実施例２〜４の方法はいずれも有効であって、就中、塩
素ガスゲンベを使用するものは、操作が簡単であり、ま
た、塩素ガスを、次亜塩素酸ナトリウム溶液と塩酸又は
過酸化水素水と塩酸との夫夫の反応に基づいて生成する
方式は塩素ガスを必要量のみ発生させうるので、安全性
の問題が解決され、さらに、電解法は、塩素ガス供給と
吸収液補給の一連のサイクルが一体化され、これをリサ
イクルすることによシ吸収液の薬品等の消耗が殆んどな
くて２ンニングコストが低減され、管理が比較的容易で
ある。All of the methods of Examples 2 to 4 are effective, and in particular, the method using chlorine gas is easy to operate, and the chlorine gas is mixed with sodium hypochlorite solution and hydrochloric acid or hydrogen peroxide. The method of generating chlorine gas based on the reaction between water and hydrochloric acid can generate only the required amount of chlorine gas, which solves the safety problem. The two cycles are integrated, and by recycling this, there is almost no consumption of chemicals in the absorption liquid, reducing running costs and making management relatively easy.
本発明は以上の構成に基づくものであって、少なくとも
、特殊材料ガス中の主要成分が、−挙に、高除去率をも
って除去されるもので、しかも高濃度から低濃度までの
広め範囲のガス成分の処理が可能であり、ダストの発生
がなく、安全で費用も少なくてすむ等多くの利点を有す
るもので、特殊材料ガスの除去手段として極めて有用で
あ、る。The present invention is based on the above structure, and at least the main components in the special material gas can be removed with a high removal rate, and moreover, the main components in the special material gas can be removed in a wide range from high concentration to low concentration. It has many advantages such as being able to process components, not generating dust, being safe and being inexpensive, and is extremely useful as a means for removing special material gases.
第１図は本発明の原理を示す説明図、第２図は塩素源に
塩素ガスゲンペを使用する例の説明図、第３図は塩素源
として塩素ガス発生器で生成する塩素？使用する例の説
明図、第４図はＮａＣＬの電解による塩素を使用する例
の説明図、第５図は防傷構造のガス反応塔を示す説明図
である。
１・・・ガス供給箱、４・・・ガス反応塔、６・・・吸
収塔、８・・・排気ブロワ、１０・・・タンク、１４Ａ
・・・塩素がスビンペ、１４Ｂ・・・塩素ガス発生器、
１４Ｄ・・・電解槽。
特許出願人 協和化工株式会社Fig. 1 is an explanatory diagram showing the principle of the present invention, Fig. 2 is an explanatory diagram of an example of using a chlorine gas generator as a chlorine source, and Fig. 3 is an explanatory diagram showing an example of using a chlorine gas generator as a chlorine source. FIG. 4 is an explanatory diagram of an example in which chlorine is used by electrolyzing NaCL, and FIG. 5 is an explanatory diagram showing a gas reaction tower with a scratch-proof structure. 1... Gas supply box, 4... Gas reaction tower, 6... Absorption tower, 8... Exhaust blower, 10... Tank, 14A
...Chlorine is Subinpe, 14B...Chlorine gas generator,
14D... Electrolytic cell. Patent applicant Kyowa Kako Co., Ltd.
Claims (1)
単位ガスの１種類又は２種類以上を共存する特殊材料ガ
ス（以下特殊材料ガスという。）を塩素ガスと反応せし
め、反応生成物をアルカリ溶液に誘導して該溶液に吸収
して除去することを特徴とする特殊材料ガスの除去方法 ２、塩素ガスがガスボンベから発生する請求項１に記載
の特殊材料ガスの除去方法 ３、塩素ガスが次亜塩素酸ナトリウムと塩酸との反応で
発生する請求項１に記載の特殊材料ガスの除去方法 ４、塩素ガスが塩酸と過酸化水素との反応で発生する請
求項１に記載の特殊材料ガスの除去方法５、塩素ガスが
電気分解で発生する請求項１に記載の特殊材料ガスの除
去方法 ６、特殊材料ガスと塩素ガスとを反応せしめるために使
用する反応塔が防爆構造に形成される請求項１に記載の
特殊材料ガスの除去方法。[Claims] 1. A special material gas (hereinafter referred to as "special material gas") in which one or more types of unit gases such as silane, diborane, phosphine, and arsine coexist is reacted with chlorine gas to produce a reaction product. A method for removing a special material gas according to claim 1, wherein the chlorine gas is generated from a gas cylinder. The special material gas removal method 4 according to claim 1, wherein the gas is generated by a reaction between sodium hypochlorite and hydrochloric acid, and the method according to claim 1, wherein the chlorine gas is generated by a reaction between hydrochloric acid and hydrogen peroxide. Method 5 for removing material gas; Method 6 for removing special material gas according to claim 1, wherein chlorine gas is generated by electrolysis; 6, the reaction tower used for reacting the special material gas and chlorine gas is formed in an explosion-proof structure; The method for removing special material gas according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63182803A JPH0235912A (en) | 1988-07-23 | 1988-07-23 | Removing process for special material gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63182803A JPH0235912A (en) | 1988-07-23 | 1988-07-23 | Removing process for special material gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0235912A true JPH0235912A (en) | 1990-02-06 |
Family
ID=16124701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63182803A Pending JPH0235912A (en) | 1988-07-23 | 1988-07-23 | Removing process for special material gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0235912A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6086838A (en) * | 1998-12-17 | 2000-07-11 | Morgan; Vernon E. | Removal of silane from gas streams |
| JP2017132652A (en) * | 2016-01-27 | 2017-08-03 | 住友電気工業株式会社 | Production method of porous carbon material |
| US10415443B2 (en) | 2015-06-11 | 2019-09-17 | Kubota Corporation | Engine |
-
1988
- 1988-07-23 JP JP63182803A patent/JPH0235912A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6086838A (en) * | 1998-12-17 | 2000-07-11 | Morgan; Vernon E. | Removal of silane from gas streams |
| US10415443B2 (en) | 2015-06-11 | 2019-09-17 | Kubota Corporation | Engine |
| JP2017132652A (en) * | 2016-01-27 | 2017-08-03 | 住友電気工業株式会社 | Production method of porous carbon material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2016288473B2 (en) | Method and apparatus for removing nitrogen oxides from air flow | |
| US4612174A (en) | Method of removing noxious substances from gases | |
| US2871097A (en) | Production of chlorine dioxide | |
| US4110183A (en) | Process for denitration of exhaust gas | |
| HUT67738A (en) | Process for removing hydrogen sulphide and/or carbon disulphide from exhaust gases | |
| JPH0235912A (en) | Removing process for special material gas | |
| US4024219A (en) | Process for removing nitrogen oxide from a waste gas | |
| CN214635350U (en) | Device for treating hydrogen fluoride gas | |
| AU637686B2 (en) | Process of purifying exhaust gas | |
| US4355015A (en) | Process for the production of finely divided oxides of metals | |
| CA1219113A (en) | Process and apparatus for the manufacture of hypochlorous acid | |
| KR100521652B1 (en) | Apparatus and Method for Producing Chlorine Dioxide Gas in a High-Purity and Long-Term Storage of Chlorine Dioxide | |
| EA010599B1 (en) | Process for production of chlorine dioxide | |
| US5433938A (en) | Chlorine-destruct method | |
| CN108821315A (en) | The method and device of thermochemical cycles mineralising CO2 while decomposing H 2O H2 | |
| US4584178A (en) | Apparatus for the manufacture of hypochlorous acid | |
| JPS62176592A (en) | Apparatus for treating waste liquid containing sodium hypochlorite | |
| TW200535088A (en) | Process for production of chlorine dioxide | |
| JP3188830B2 (en) | Method and apparatus for removing NF3 exhaust gas | |
| JP4362894B2 (en) | How to collect bromine | |
| CN220703436U (en) | Safety treatment device for mask cleaning waste liquid | |
| JPS61129026A (en) | Purification of exhaust gas | |
| JPS63162025A (en) | Removing method for arsine and phosphine | |
| CN213885626U (en) | Waste chlorine treatment device in chlorinated polyethylene production | |
| JPH0356123A (en) | Removal of mercury and nox in gas |