JPH0232349A - Damping-waterless planographic printing plate and production thereof - Google Patents
Damping-waterless planographic printing plate and production thereofInfo
- Publication number
- JPH0232349A JPH0232349A JP18227788A JP18227788A JPH0232349A JP H0232349 A JPH0232349 A JP H0232349A JP 18227788 A JP18227788 A JP 18227788A JP 18227788 A JP18227788 A JP 18227788A JP H0232349 A JPH0232349 A JP H0232349A
- Authority
- JP
- Japan
- Prior art keywords
- ink
- printing plate
- layer
- silicone rubber
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000000203 mixture Substances 0.000 claims description 38
- 239000012229 microporous material Substances 0.000 claims description 26
- 239000005871 repellent Substances 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 230000002940 repellent Effects 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 7
- 229920002379 silicone rubber Polymers 0.000 abstract description 38
- 239000004945 silicone rubber Substances 0.000 abstract description 34
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 238000004132 cross linking Methods 0.000 abstract description 5
- 239000000654 additive Substances 0.000 abstract description 3
- 230000002411 adverse Effects 0.000 abstract description 3
- 230000000996 additive effect Effects 0.000 abstract 1
- 238000005728 strengthening Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 42
- -1 polypropylene Polymers 0.000 description 28
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 229920001296 polysiloxane Polymers 0.000 description 13
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000005470 impregnation Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229920005601 base polymer Polymers 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- HLMLWEGDMMDCDW-UHFFFAOYSA-N 2-butylphenol;formaldehyde Chemical compound O=C.CCCCC1=CC=CC=C1O HLMLWEGDMMDCDW-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 101100356682 Caenorhabditis elegans rho-1 gene Proteins 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical group CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical class OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical compound C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- VQXINLNPICQTLR-UHFFFAOYSA-N carbonyl diazide Chemical compound [N-]=[N+]=NC(=O)N=[N+]=[N-] VQXINLNPICQTLR-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 235000010980 cellulose Nutrition 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- JQZRVMZHTADUSY-UHFFFAOYSA-L di(octanoyloxy)tin Chemical compound [Sn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O JQZRVMZHTADUSY-UHFFFAOYSA-L 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
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- 235000011007 phosphoric acid Nutrition 0.000 description 1
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- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
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- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
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- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- HSVFKFNNMLUVEY-UHFFFAOYSA-N sulfuryl diazide Chemical compound [N-]=[N+]=NS(=O)(=O)N=[N+]=[N-] HSVFKFNNMLUVEY-UHFFFAOYSA-N 0.000 description 1
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- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
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- 229910052718 tin Inorganic materials 0.000 description 1
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- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、湿し水不要平版印刷版及びその製造方法に関
し、詳しくは非画線部の強度を落とさずにインキ反撥性
を向上させることができる湿し水不要平版印刷版及びそ
の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a lithographic printing plate that does not require dampening water and a method for manufacturing the same, and more specifically to improving ink repellency without reducing the strength of non-image areas. This invention relates to a lithographic printing plate that does not require dampening water and a method for producing the same.
[従来の技術]
従来、湿し水不要平版印刷版材料(以下必要に応じ「版
材」という)としては、支持体上に感光層及びシリコー
ンゴム層を順に塗設したものが知られている。この版材
に露光・現像して得られる湿し水不要平版印刷版(以下
必要に応じ「刷版」という)を用いれば、感光層の着肉
性とシリコーンゴム層のインキ反撥性により、印刷物を
得ることができるのである。[Prior Art] Conventionally, as a lithographic printing plate material that does not require dampening water (hereinafter referred to as "plate material" as necessary), one in which a photosensitive layer and a silicone rubber layer are sequentially coated on a support is known. . If you use a lithographic printing plate that does not require dampening water (hereinafter referred to as a "printing plate" as necessary) obtained by exposing and developing this plate material, the ink repellency of the photosensitive layer and the ink repellency of the silicone rubber layer will allow printed matter to be printed. can be obtained.
この刷版においては、非画線部に位置するシリコーンゴ
ム層の接着強度等の機械的強度が耐刷力を支配する因子
となるため、この非画線部の機械的強度を向上せんとし
て架橋度を増大させたり。In this printing plate, the mechanical strength such as the adhesive strength of the silicone rubber layer located in the non-printing area is a factor that governs the printing durability, so in order to improve the mechanical strength of this non-printing area, crosslinking is carried out. or increase the degree.
あるいはシラン化合物等の添加剤を加えたりする方法が
採られていた。Alternatively, a method of adding additives such as silane compounds has been adopted.
[発明が解決しようとする課題]
しかしながら、上記の方法によれば、確かに非画線部の
傷付き易さについては改良されるものの、シリコーンゴ
ム層が本来備えていなければならないインキ反撥性に悪
影響を及ぼし、結局耐刷力に問題があった。[Problems to be Solved by the Invention] However, although the above method does improve the scratchiness of non-print areas, it does not improve the ink repellency that the silicone rubber layer should originally have. This had a negative effect, and eventually there was a problem with printing durability.
本発明者はかかる問題を解決するために、先に昭和83
年6月28日付特許願(発明の名称「湿し水不要平版印
刷版材料」)において、シリコーンゴム層に特宥のシリ
コーングラフトポリマーを用いる技術を提案した。In order to solve this problem, the present inventor first developed the invention in 1983.
In a patent application dated June 28, 2009 (title of the invention: "Lithographic printing plate material that does not require dampening water"), a technique was proposed in which a special silicone graft polymer was used in the silicone rubber layer.
しかし、かかる先提案技術について、更に研究を継続し
た所1版面が低温の場合には良好な画像再現性を示した
が、夏場の高温度(28〜35℃)の゛環境下では、地
汚れを生じるという課題があることが判った。However, further research on this previously proposed technology showed good image reproducibility when the first plate surface was at a low temperature, but under an environment of high temperatures (28 to 35 degrees Celsius) in the summer, background smudges It was found that there was a problem in that the problem occurred.
[発明の目的]
そこで本発明の目的は、非画線部のインキ反撥性に悪影
響を及ぼさずに耐刷性を向上させることができ、高温環
境下でも地汚れが生じない湿し水不要平版印刷版及びそ
の製造方法を提供することにある。[Object of the Invention] Therefore, the object of the present invention is to provide a lithographic plate that does not require dampening water and can improve printing durability without adversely affecting ink repellency in non-image areas, and does not cause scumming even in high-temperature environments. The purpose of the present invention is to provide a printing plate and a method for manufacturing the same.
[課題を解決するための手段]
本発明者は、上記目的を達成すべく鋭意検討の結果1本
発明に至った。[Means for Solving the Problems] The inventors of the present invention have conducted intensive studies to achieve the above object, and have thus arrived at the present invention.
即ち、本発明に係る湿し水不要平版印刷版は、非画線部
にインキ反撥性物質の硬化物を含む微多孔質体層を有す
ることを特徴とする。That is, the lithographic printing plate that does not require dampening water according to the present invention is characterized by having a microporous layer containing a cured product of an ink-repellent material in the non-image area.
また本発明に係る湿し水不要平版印刷版の製造方法は、
支持体上に、微多孔質体層を設け、該微多孔質体層上に
、感光性組成物を塗布し含浸させた後、露光、現像して
非画線部の感光性組成物を除去し、次いで該微多孔質体
層上にインキ反撥性物質を塗布し含浸させ、次いで該イ
ンキ反撥性物質を硬化させた後、画線部上のインキ反撥
性物質を除去することを特徴とする。Furthermore, the method for producing a lithographic printing plate that does not require dampening water according to the present invention includes:
A microporous layer is provided on a support, and a photosensitive composition is coated and impregnated onto the microporous layer, and then exposed and developed to remove the photosensitive composition in non-image areas. Then, an ink repellent material is applied onto the microporous material layer to impregnate it, and after the ink repellent material is cured, the ink repellent material on the image area is removed. .
[作用]
本発明はインキ反撥性物質を微多孔質体に含浸させた層
を非画線部に使用するため、微多孔質体が機械的強度を
受は持つので機械的強度が低く架橋度合が低いシリコー
ンゴムを使用でき、その結果インキ反撥性が向上した。[Function] Since the present invention uses a layer in which a microporous material is impregnated with an ink-repellent material in the non-image area, the microporous material has mechanical strength, so the mechanical strength is low and the degree of crosslinking is low. It is possible to use silicone rubber with low viscosity, resulting in improved ink repellency.
またシラン力・ツブリング剤等の被膜を強化する添加剤
を入れる必要もないので、地汚れの問題が生じない。Furthermore, since there is no need to add additives to strengthen the film such as silane or tumbling agents, there is no problem of scumming.
[発明の具体的構成]
以下、本発明の湿し水不要平版印刷版の製造方法につい
て図面に基き説明する。[Specific Structure of the Invention] The method for producing a lithographic printing plate that does not require dampening water according to the present invention will be described below with reference to the drawings.
先ず第1図に示すように、支持体1上に微多孔質体層2
を設ける。First, as shown in FIG. 1, a microporous layer 2 is placed on a support 1.
will be established.
支持体lとしては、特に限定されず、上方に微多孔質体
層を形成できるものであれば通常用いられている材質(
例えばアルミニウムなど)以外のものでもよく、また導
電性、絶縁性のいずれのものでもよく、例えば、PET
フィルム等が用いられる。なお、該支持体lを透明性部
材で構成すれば支持体1側から露光を行うことが可能と
なり、露光作業が容易となり、刷版製造コストの低減に
寄与する効果がある。The support l is not particularly limited, and any commonly used material (
For example, it may be made of materials other than aluminum (for example, aluminum), or may be made of conductive or insulating materials, such as PET.
A film or the like is used. Note that if the support 1 is made of a transparent member, it becomes possible to perform exposure from the support 1 side, which facilitates the exposure work and contributes to a reduction in printing plate manufacturing costs.
微多孔質体層2に用いられる微多孔質体は、微多孔を有
する樹脂フィルム等が用いられ、例えばポリプロピレン
フィルム、ニトロセルロールフィルム、セルロースアセ
テートフィルム、ボ:リエーテルサルホンフィルL−、
ポリ四フッ化エチレンフィルム、ボイドのある合成紙等
が挙げられ、中でもポリ四フッ化エチレンフィルムが好
ましい。The microporous material used for the microporous material layer 2 is a resin film having micropores, such as a polypropylene film, a nitrocellulose film, a cellulose acetate film, a polyether sulfone film L-,
Examples include polytetrafluoroethylene film, voided synthetic paper, and polytetrafluoroethylene film is particularly preferred.
微多孔質体の気孔径は平均0.1〜2ルmが好ましい、
ここに気孔径は孔が円形の場合はその直径を、円形以外
の場合は円形に換算した直径をいフ。The average pore diameter of the microporous material is preferably 0.1 to 2 m.
Here, the pore diameter is the diameter if the pore is circular, or the diameter converted to a circle if it is not circular.
また微多孔質体の気孔率は25〜50%が好ましい、こ
こに気孔率は微多孔質体の体積に対する孔の体積の占め
る割合をいう。Further, the porosity of the microporous material is preferably 25 to 50%, and the porosity here refers to the ratio of the volume of the pores to the volume of the microporous material.
支持体上に微多孔質体層を形成する手段は、特に限定さ
れないが、簡便な方法としてラミネート法が挙げられる
。The means for forming the microporous material layer on the support is not particularly limited, but a lamination method may be mentioned as a simple method.
なお支持体−Eと微多孔質体層との間にはプライマー層
を有していてもよい。Note that a primer layer may be provided between the support E and the microporous layer.
支持体及び微多孔質体層の厚みは、特に限定されないが
、支持体1は、0.02〜1mmが好ましく、より好ま
しくは0.05〜0.3+*mであり、また微多孔質体
層2は0.1〜1OQJLa+が好ましく、より好まし
くは1〜10ルmである。The thickness of the support and the microporous material layer is not particularly limited, but the thickness of the support 1 is preferably 0.02 to 1 mm, more preferably 0.05 to 0.3+*m, and the thickness of the microporous material is Layer 2 preferably has a thickness of 0.1 to 1 OQJLa+, more preferably 1 to 10 lm.
次に第2図に示すように微多孔質体層2上に感光性組成
物を塗布し含浸させる。この時点で微多孔質体層は感光
層としても機能する。Next, as shown in FIG. 2, a photosensitive composition is applied and impregnated onto the microporous layer 2. At this point, the microporous material layer also functions as a photosensitive layer.
感光性組成物を含浸させるには、塗布後浸透等の作用に
よって自然含浸させることができるが、塗布後に圧力を
かけて強制的に含浸させることもできる。In order to impregnate the photosensitive composition, natural impregnation can be performed by an action such as penetration after application, but it can also be impregnated forcibly by applying pressure after application.
感光性組成物の塗布量は含浸が十分に行え、かつ含浸、
乾燥後に微多孔質体層よりも厚いことが好ましく、微多
孔質体層の気孔径、気孔率、厚み、塗布液粘度等によっ
て決定される0本発明において感光性組成物の塗布量は
、その厚さが微多孔質体層の1.0〜1.5倍が好まし
い。The coating amount of the photosensitive composition is such that it is sufficient for impregnation and
The coating amount of the photosensitive composition in the present invention is preferably thicker than the microporous material layer after drying, and is determined by the pore diameter, porosity, thickness, coating liquid viscosity, etc. of the microporous material layer. The thickness is preferably 1.0 to 1.5 times that of the microporous material layer.
感光性組成物を塗布するには、リバースロールコータ、
エアーナイフコータ、メーヤバーコータなどの通常のコ
ータあるいはホエラーのような回転塗布装置を用いるこ
とができる。To apply the photosensitive composition, a reverse roll coater,
A conventional coater such as an air knife coater or a Meyer bar coater, or a rotary coating device such as a Whaler can be used.
含浸、乾燥が終了したら、露光・現像を行う。After impregnation and drying are completed, exposure and development are performed.
即ち、原稿である例えばポジフィルムを微多孔質体層2
−Eに真空密着させ、露光する。ごの露光用の光源は、
紫外線を豊富に発生する水銀灯、カーボンアーク灯、キ
セノンランプ、メタルハライドランプ、蛍光灯などが用
いられる0次いで非画線部を現像液を用いて溶出除去し
て現像すると、微多孔質体から成る非画線部4が形成さ
れる。現像液としては感光性M1成物の現像液として公
知のものが使用できる。That is, the original, for example, a positive film, is placed in the microporous material layer 2.
-E is placed in vacuum contact and exposed. The light source for this exposure is
When a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, etc., which generate abundant ultraviolet rays are used, the non-image area is eluted and removed using a developer and developed. An image portion 4 is formed. As the developer, any known developer for photosensitive M1 products can be used.
現像は、現像液を含む現像用パッドでこすったり、現像
液を版面に注いだ後に現像ブラシでこする等、公知の方
法で行うことができる。これにより、非画線部の感光性
組成物が除かれる(第3図参照)、なお完全に除かれて
いることが好ましいが、インキ反撥性物質の含浸の障害
にならない量なら残存してもよい。Development can be performed by a known method, such as rubbing with a developing pad containing a developer, or pouring a developer onto the printing plate and then rubbing with a developing brush. As a result, the photosensitive composition in the non-image areas is removed (see Figure 3), and it is preferable that the photosensitive composition be completely removed, but it may remain in an amount that does not interfere with the impregnation of the ink-repellent material. good.
本発明に用いられる感光性組成物としては、特に限定さ
れず、先ず、従来公知の0−ナフトキノンジアジド化合
物の如さキノンジアジド型のポジ型感光性物質が挙げら
れる。好適なO−ナフトキノンジアジド化合物としては
、米国特許3,048,120号明細書中に記載されて
いるナフトキノン−(1,2)−ジアジド−(2)−ス
ルホン酸クロライドとフェノールまたはクレゾール−ホ
ルムアルデヒド樹脂とのエステルがある。その細布用な
O−ナフトキノンジアジド化合物としては、例えば米国
特許3.1335.709号に記載されているピロガロ
ール−アセトン樹脂と0−ナフトキノンジアジドスルホ
ン酸クロライドのエステル、特開昭55−78348号
、同5B−1044号及び同5B−1045号に記載さ
れているポリヒドロキシフェニル樹脂と0−ナフトキノ
ンジアジドスルホン酸クロライドのエステル、特開昭5
0−113305号に記載されているようなp−ヒドロ
キシスチレンのホモポリマーまたはこれと他の共重合し
得るモノマーとの共重合体に0−ナフトキノンジアジド
スルホン酸クロライドをエステル反応させたもの、特公
昭49−17481号記載のスチレンモノマーとフェノ
ール誘導体との重合体生成物とO−キノンジアジドスル
ホン酸との反応生成物、またポリヒドロキシベンゾフェ
ノンと0−ナフトキノンジアジドスルホン酸クロライド
のエステル等が挙げられる。The photosensitive composition used in the present invention is not particularly limited, and includes quinonediazide-type positive photosensitive materials such as conventionally known 0-naphthoquinonediazide compounds. Suitable O-naphthoquinone diazide compounds include naphthoquinone-(1,2)-diazide-(2)-sulfonic acid chloride and phenol or cresol-formaldehyde resins described in U.S. Pat. No. 3,048,120. There is an ester with. Examples of the O-naphthoquinonediazide compound for use in thin fabrics include esters of pyrogallol-acetone resin and O-naphthoquinonediazide sulfonic acid chloride described in U.S. Pat. No. 3,1335,709; Ester of polyhydroxyphenyl resin and 0-naphthoquinonediazide sulfonic acid chloride described in No. 5B-1044 and No. 5B-1045, JP-A No. 5B-1045
A homopolymer of p-hydroxystyrene as described in No. 0-113305 or a copolymer of this and other copolymerizable monomers with 0-naphthoquinonediazide sulfonic acid chloride is subjected to an ester reaction, Examples thereof include a reaction product of a polymer product of a styrene monomer and a phenol derivative described in No. 49-17481 and O-quinonediazide sulfonic acid, and an ester of polyhydroxybenzophenone and O-naphthoquinonediazide sulfonic acid chloride.
かかるキノンジアジド型のポジ型感光性物質を含有する
感光性組成物は必要に応じて結合剤を添加することがで
きる0例えば好適なものとしてアルカリ水溶液可溶性の
ノボラック樹脂が挙げられる。このようなノボラック樹
脂の例としては、フェノール−ホルムアルデヒド樹脂、
クレゾール−ホルムアルデヒド樹脂、 p−tert−
ブチルフェノール−ホルムアルデヒド樹脂、フェノール
変性キシレン樹脂などを代表例として挙げることができ
る。感光層中のキノンジアジド化合物の量は10〜50
重量%であり、より好ましくは20〜40重量%である
。また上記結合剤の配合量は感光層組成物中の45〜8
0重量%であり、好ましくは50〜70重量%である。A photosensitive composition containing such a quinone diazide type positive photosensitive material may optionally contain a binder. For example, a preferred example is a novolac resin soluble in an aqueous alkali solution. Examples of such novolac resins include phenol-formaldehyde resins,
Cresol-formaldehyde resin, p-tert-
Typical examples include butylphenol-formaldehyde resin, phenol-modified xylene resin, and the like. The amount of quinonediazide compound in the photosensitive layer is 10 to 50
% by weight, more preferably 20 to 40% by weight. The blending amount of the binder is 45 to 8 in the photosensitive layer composition.
0% by weight, preferably 50-70% by weight.
また本発明においては、以下の感光性物質を用いること
ができる0例えば、芳香族ジアゾニウム塩とホルムアル
デヒドとの縮合物で代表されるジアゾ樹脂である。特に
好ましくは、p−ジアゾジフェニルアミンとホルムアル
デヒドまたはアセトアルデヒドとの縮合物の塩、例えば
ヘキサ:フルオロ燐酸塩、テトラフルオロホウ酸塩、過
塩素酸塩または過ヨウ素酸塩と前記縮合物との反応生成
物であるジアゾ樹脂無機塩や、米国特許3,300,3
08号に記載されているような、前記縮合物とスルホン
酸類の反応生成物であるジアゾ樹脂有機塩等が挙げられ
る。ざらにジアゾ樹脂は、好ましくは結合剤と共に使用
される。かかる結合剤としては種々の高分子化合物が使
用され得るが、好ましくは特開昭54−98613号に
記載されているような芳香族性水酸基を有する単量体、
例えばN−(4−ヒドロキシフェニル)アクリルアミド
、 N−(4−ヒドロキシフェニル)メタクリルアミ
ド、ロー、履−1またはp−ヒドロキシスチレン、0−
9鵬−1またはp−ヒドロキシフェニルメタクリレート
等と他の単量体との共重合体、米国特許4,123,2
78号に記載されているようなヒドロキシエチルアクリ
レート単位またはヒドロキシエチルメタクリレート単位
を主なる繰り返し単位として含むポリマー、シェラツク
、ロジン等の天然樹脂、ポリビニルアルコール、米国特
許3,751,257号に記載されているポリアミド樹
脂、米国特許3,880,097号に記載されている線
状ポリウレタン樹脂、ポリビニルアルコールのフタレー
ト化樹脂、ビスフェノールAとエピクロルヒドリンから
縮合されたエポキシ樹脂、酢酸セルロース、セルロース
アセテートフタレート等のセルロース類が包含される。Further, in the present invention, the following photosensitive substances can be used. For example, a diazo resin typified by a condensate of an aromatic diazonium salt and formaldehyde. Particularly preferred are salts of condensates of p-diazodiphenylamine and formaldehyde or acetaldehyde, such as reaction products of hexa:fluorophosphates, tetrafluoroborates, perchlorates or periodates with said condensates. diazo resin inorganic salt, and U.S. Patent No. 3,300,3
Examples include diazo resin organic salts, which are reaction products of the condensate and sulfonic acids, as described in No. 08. The diazo resin is preferably used together with a binder. Various polymer compounds can be used as such a binder, but monomers having an aromatic hydroxyl group as described in JP-A No. 54-98613,
For example, N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, rho-1 or p-hydroxystyrene, 0-
9Peng-1 or copolymer of p-hydroxyphenyl methacrylate and other monomers, U.S. Pat. No. 4,123,2
Polymers containing hydroxyethyl acrylate units or hydroxyethyl methacrylate units as a main repeating unit as described in US Pat. No. 78, natural resins such as shellac and rosin, polyvinyl alcohol, polyamide resins, linear polyurethane resins described in U.S. Pat. No. 3,880,097, phthalated polyvinyl alcohol resins, epoxy resins condensed from bisphenol A and epichlorohydrin, celluloses such as cellulose acetate and cellulose acetate phthalate. is included.
また重合体主鎖または側鎖に感光基とじて類、ポリカー
ボネート類のような感光性重合体を主成分とするものも
挙げられる0例えば、特開昭55−40415号に記載
されているような、フェニレンジエチルアクリレートと
水素添加したビスフェノールAおよびトリエチレングリ
コールとの縮合で得られる感光性ポリエステル、米国特
許2.958,878号に記載されているような、シン
ナミリデンマロン酸等の(2−プロペリデン)マロン酸
化合物及び二官能性グリコール類から銹導される感光性
ポリエステル類等が挙げられる。In addition, there are also those whose main component is a photosensitive polymer such as polycarbonate, which has a photosensitive group in the main chain or side chain of the polymer. (2- Examples include photosensitive polyesters derived from malonic acid compounds (properidene) and difunctional glycols.
さらにアジド基が直接またはカルボニル基又はスルホニ
ル基を介して芳香環に結合している芳香族アジド化合物
も挙げられる0例えば、米国特許3.098,311号
に記載されているようなポリアジドスチレン、ポリビニ
ル−p−アジドベンゾアート、ポリビニル−p−アジド
ベンザール、特公昭45−9613号に記載の7ジドア
リールスルフアニルクロリドと不飽和炭化水素系ポリマ
ーとの反応生成物、また特公昭43−21087号、同
44−229号、同44−22954号及び同45−2
4915号に記載されているような、スルホニルアジド
やカルボニルアジドを持つポリマー等が挙げられる。Further examples include aromatic azide compounds in which the azide group is bonded directly or via a carbonyl or sulfonyl group to an aromatic ring. For example, polyazidostyrene as described in U.S. Pat. No. 3,098,311; Polyvinyl-p-azidobenzoate, polyvinyl-p-azidobenzal, the reaction product of 7didoarylsulfanyl chloride and an unsaturated hydrocarbon polymer described in Japanese Patent Publication No. 45-9613; No. 21087, No. 44-229, No. 44-22954 and No. 45-2
Examples include polymers having sulfonyl azide and carbonyl azide, as described in No. 4915.
感光性組成物には、上記以外に露光後或いは現像後に像
を可視化させるための色素(例えば、ビクトリアピュア
ブルー80)1 (保土谷化学社製)、オイルブルー8
603(オリエント化学工業社製)等のトリフェニルメ
タン系、ジフェニルメタン系色素等)、塗布性を改良す
るためのアルキルエーテル類(例えば、エチルセルロー
ス、メチルセルロース)、フッ素系界面活性剤、ノニオ
ン系界面活性剤(例えば、プルロニックL64(旭電化
社製゛)、塗膜の柔軟性を付与するための可塑剤(例え
ば、ポリエチレングリコール、リン酸トリクレジル、ア
クリル酸又はメタクリル酸ポリマー)、安定剤(例えば
リン酸、シュウ酸、酒石酸等)を含有することができる
。In addition to the above, the photosensitive composition also contains dyes (for example, Victoria Pure Blue 80) 1 (manufactured by Hodogaya Chemical Co., Ltd.) and Oil Blue 8 to make the image visible after exposure or development.
603 (manufactured by Orient Chemical Industry Co., Ltd.), alkyl ethers (e.g., ethyl cellulose, methyl cellulose), fluorine surfactants, nonionic surfactants to improve coating properties. (For example, Pluronic L64 (manufactured by Asahi Denka), plasticizers (for example, polyethylene glycol, tricresyl phosphate, acrylic acid or methacrylic acid polymers), stabilizers (for example, phosphoric acid, oxalic acid, tartaric acid, etc.).
次に、微多孔質体層上にインキ反撥性物質を塗布し含浸
させる0次いで該インキ反撥性物質を硬化させた後、画
線部上のインキ反撥性物質を除去する。その結果、第4
図に示すように、画線部3に感光性組成部の露光による
硬化物を含み、非画線部4′にインキ反撥性物質の硬化
物を含む刷版が得られた。インキ反撥性物質としては、
架橋する感応基ないしシリコーンオイルを50〜5%含
有するシリコーンゴムが好ましく用いられるが、限定さ
れる訳ではなく、例えばフッ素樹脂も用いることができ
る。Next, an ink repellent material is applied and impregnated onto the microporous material layer, and after the ink repellent material is cured, the ink repellent material on the image area is removed. As a result, the fourth
As shown in the figure, a printing plate was obtained in which the image area 3 contained a cured product of the photosensitive composition by exposure, and the non-image area 4' contained a cured product of the ink-repellent material. As an ink repellent material,
Silicone rubber containing 50 to 5% of crosslinkable sensitive groups or silicone oil is preferably used, but is not limited to this, and for example, fluororesins can also be used.
シリコーンゴムとしては、次のようなくり返し単位を有
する分子量数千〜数十万の主鎖中又は主鎖の末端にOH
基を有する線状有機ポリシロキサンを主成分とするもの
を用いることができる。Silicone rubber has the following repeating units with a molecular weight of several thousand to several hundred thousand, and has OH in the main chain or at the end of the main chain.
A material whose main component is a linear organic polysiloxane having groups can be used.
嘗
(−Si −0+、
ここでnは2以上の整数、Rは炭素数1〜10のアルキ
ル基、ハロゲン化アルキル基、アルキル基、ビニル基、
アリール基、シラノール基(OH基)であり、Hの80
%以上がメチル基であるものが好ましい、なお上記シラ
ノール基(OH基)は主鎖中又は主鎖の末端のどちらに
あってもよいが、末端にあることが好ましい。嘗(-Si -0+, where n is an integer of 2 or more, R is an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, an alkyl group, a vinyl group,
Aryl group, silanol group (OH group), H is 80
Preferably, % or more of the silanol groups (OH groups) are present in the main chain or at the end of the main chain, but preferably at the end.
本発明において有用なシリコーンゴムは、このようなシ
リコーン・ベースポリマーと1次にあげるようなシリコ
ーン架橋剤との縮合反応によって得られるものである。Silicone rubbers useful in the present invention are those obtained by condensation reactions between such silicone base polymers and primary silicone crosslinking agents.
(1) R−Si+ OR’)
(2) R−Si+ 0Ac)
(3)R−Si+ 0N=CR′2h
ここでRは先に説明したRと同じ意味であり、R′はメ
チル基、エチル基などのアルキル基であり、Acはアセ
チル基である。(1) R-Si+ OR') (2) R-Si+ 0Ac) (3) R-Si+ 0N=CR'2h Here, R has the same meaning as R explained earlier, and R' is a methyl group, ethyl and Ac is an acetyl group.
これらのシリコーンゴムは市販品としても入手でき、例
えば東芝シリコーンゴム社製YE−3085等がある。These silicone rubbers are also available as commercial products, such as YE-3085 manufactured by Toshiba Silicone Rubber Co., Ltd.
また、その他の有用なシリコーンゴムは、上に挙げたよ
うなベースポリマーと、次のような繰り返し単位を有す
るシリコーンオイルとの反応、或いはRの3%程度がビ
ニル基であるシリコーンベースポリマーとの付加反応、
或いは該シリコーンオイル同志の反応によっても得るこ
とができる。Other useful silicone rubbers can be produced by reacting the base polymers listed above with silicone oils having the following repeating units, or by reacting silicone base polymers in which about 3% of R is vinyl groups. addition reaction,
Alternatively, it can also be obtained by a reaction between the silicone oils.
)I R
(式中、 Rは先のRと同じ意味であり、 謂は2以上
の整数、nは0又は1以上の整数である。)このような
架橋反応によって、シリコーンゴムを得るためには、上
記の成分の他に、錫、亜鉛、コバルト、鉛、カルシウム
、マンガンなどの金属の有機カルボン酸塩、例えばラウ
リン酸ジブチルスズ、スズ(II )オクトエート、ナ
フテン酸コバルトなど、或いは塩化白金酸のような触媒
が添加される。) I R (In the formula, R has the same meaning as R above, and n is an integer of 2 or more, and n is an integer of 0 or 1 or more.) In order to obtain silicone rubber by such a crosslinking reaction, In addition to the above-mentioned components, organic carboxylates of metals such as tin, zinc, cobalt, lead, calcium, and manganese, such as dibutyltin laurate, tin(II) octoate, and cobalt naphthenate, or chloroplatinic acid. Such a catalyst is added.
また、シリコーンゴムの強度を向上し、印刷作業中に生
じる摩擦力に耐え得るシリコーンゴムを得るためには、
充填剤(フィラー)を混合することもできる。予めフィ
ラーの混合されたシリコーンゴムは、シリコーンゴムス
トック、或いはシリコーンゴムディスバージョンとして
重版されており、本発明のようにコーティングにより、
シリコーンゴム膜を得ることが好ましい場合には、RT
V 或いはLTvシリコーンゴムのディスバージョン
が好んで用いられる。このような例としては、トーL/
’l:/!J:l−7社製Syl Off 23.5R
X−257,5)1237などのペーパーコーティング
用シリコーンゴムディスへ−ジョンがある。In addition, in order to improve the strength of silicone rubber and obtain silicone rubber that can withstand the frictional forces generated during printing operations,
Fillers can also be mixed. Silicone rubber mixed with filler in advance is reprinted as silicone rubber stock or silicone rubber dispersion, and as in the present invention, by coating,
If it is preferred to obtain a silicone rubber film, RT
V or LTv silicone rubber dispersions are preferably used. An example of this is toe L/
'l:/! J: Syl Off 23.5R manufactured by l-7
There are silicone rubber dispersions for paper coating such as X-257, 5) 1237.
本発明においては、縮合架橋タイプのシリコーンゴムを
用いることが好ましい。In the present invention, it is preferable to use condensation and crosslinking type silicone rubber.
インキ反撥性物質の含浸は感光性m酸物と同様に行うこ
゛とができ、その塗布量は、乾燥硬化後の膜厚にして微
多孔質体層の0.9〜1.5倍が′好ましい。Impregnation of the ink-repellent substance can be carried out in the same manner as the photosensitive m-acid, and the coating amount is preferably 0.9 to 1.5 times the thickness of the microporous material layer after drying and curing. .
本発明において、シリコーンゴム層の上面には必要に応
じて保護層を有していてもよい。In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary.
以上の説明では、微多孔質体層をI Bとする場合に説
明したが、これに限定されず、2層以上の積層であって
もよく、また支持体の両面に有していてもよい。In the above explanation, the microporous material layer is IB, but it is not limited to this, and it may be a laminate of two or more layers, or it may be provided on both sides of the support. .
本発明では、公知の電子写真液体現像剤を用いて刷版を
作る技術を本発明に適用することによって、画線部に電
子写真液体現像剤の硬化物を含むようにしてもよい。In the present invention, a cured product of the electrophotographic liquid developer may be included in the image area by applying a technique for making a printing plate using a known electrophotographic liquid developer to the present invention.
本発明における、湿し水不要平版印刷版を得る別の方法
としては、感光性のインキ反撥性物質を用いる方法が挙
げられる。感光性インキ反撥性物質としては、光硬化性
フッ素樹脂組成物、光硬化性シリコーンゴム組成物が好
ましく用いられ、より好ましくは光硬化性シリコーンゴ
ム組成物が用いられる。Another method of the present invention for obtaining a lithographic printing plate that does not require dampening water is a method using a photosensitive ink-repellent material. As the photosensitive ink repellent material, a photocurable fluororesin composition or a photocurable silicone rubber composition is preferably used, and a photocurable silicone rubber composition is more preferably used.
本発明の光硬化性シリコーンゴム組成物は、重合性不飽
和二重結合と −esi−0+n(ここでnは2以上の
整数、 Rは炭素数1〜lOのアルキル基、ハロゲン化
アルキル基であり、 Rの60%以上がメチル基である
。)で表されるくり返し単位を有する化合物と光重合開
始剤を含有する組成物を用いることができ、また以下の
光硬化性シリコーンゴム組成物も用いることができる。The photocurable silicone rubber composition of the present invention has a polymerizable unsaturated double bond and -esi-0+n (where n is an integer of 2 or more, R is an alkyl group having 1 to 10 carbon atoms, or a halogenated alkyl group). A composition containing a photopolymerization initiator and a compound having a repeating unit represented by (60% or more of R is a methyl group) can be used, and the following photocurable silicone rubber compositions can also be used. Can be used.
ここに光重合性シリコーンとしては、紫外線の照射によ
って容易に硬化するものであればいずれのものでもよく
、これにはマレイミド基または置換原子もしくは基を含
有するマレイミド基が結合したシロキサン単位を有する
オルガノポリシロキサン(特開昭51−120804号
、同51−125277号、同52−13907号、同
52−105002号、同52−118304号等参照
)、アクリロキシ基または置換原子もしくは基を含有す
るアクリロキシ基が結合したシロキサン単位を有するオ
ルガノポリシロキサン(特開昭48−18991号、同
48−19882号、同48−21779号、同4B−
23880号、同48−47997号、同48−480
00号、同48−83722号、同51−34291号
、同51−52001号、同52−105003号、同
52−105004号、同52−113805号、同
52−113801号等参照)、メルカプト基含有シロ
キサン単位を有するオルガノポリシロキサンとビニル基
含有シロキサン単位を有するオルガノポリシロキサンと
の混和物(特開昭53−17405号等参照)、ビニル
基含有シロキサン単位を有するオルガノポリシロキサン
とオルガノハイドロジエンポリシロキサンとの混和物(
特開昭53−15!907号等参照)などの各種シリコ
ーンが例示される。Here, the photopolymerizable silicone may be any silicone as long as it is easily cured by irradiation with ultraviolet rays. Polysiloxane (see JP-A Nos. 51-120804, 51-125277, 52-13907, 52-105002, 52-118304, etc.), acryloxy groups or acryloxy groups containing substituent atoms or groups Organopolysiloxanes having siloxane units bonded with
No. 23880, No. 48-47997, No. 48-480
00, No. 48-83722, No. 51-34291, No. 51-52001, No. 52-105003, No. 52-105004, No. 52-113805, No. 52-113801), mercapto group Mixtures of organopolysiloxanes containing siloxane units and organopolysiloxanes containing vinyl group-containing siloxane units (see JP-A-53-17405, etc.), organopolysiloxanes containing vinyl group-containing siloxane units, and organohydrodiene polystyrenes. Mixture with siloxane (
Examples include various silicones such as JP-A No. 53-15!907, etc.).
光硬化性シリコーンゴム組成物は、その主成分であるポ
リジメチルシロキサン鎖のTgが低いことより、未硬化
の状態では粘度の高い液体状であり、形態保持性に問題
があり、従来水なし平版に用いることは困難であった。Due to the low Tg of the polydimethylsiloxane chain, which is the main component of photocurable silicone rubber compositions, photocurable silicone rubber compositions are in the form of liquids with high viscosity in the uncured state, which poses problems in shape retention. It was difficult to use it for
またこの形態保持性を改良するために、種々のポリジメ
チルシロキサン単位以外の構造単位を導入することも考
えられるが、いずれもインキ反撥性を低下させる方向で
あり問題があった。In order to improve this shape retention, it is also possible to introduce various structural units other than polydimethylsiloxane units, but all of these tend to reduce ink repellency, which poses a problem.
本発明においては、支持体上に微多孔質゛体層を設け、
その中に感光性インキ反撥性物質を含浸させ、その上を
カバーシートで覆うことにより、形態保持性や皮膜強度
では問題があるが、インキ反撥性が良好な、液状の感光
性インキ反撥性物質を使用した湿し水不要平版印刷版の
作成を可能とした。In the present invention, a microporous body layer is provided on a support,
By impregnating a photosensitive ink repellent material into it and covering it with a cover sheet, a liquid photosensitive ink repellent material that has good ink repellency, although there are problems with shape retention and film strength. It has become possible to create lithographic printing plates that do not require dampening water using this method.
上記湿し水不要平版印刷版は次いで露光後カバーシート
をはがし、未硬化部分を水スプレー有機溶剤等で洗い流
すことにより、giI出した微多孔質体層部分をインキ
着肉性の画線部とする湿し水不要平版印刷版が得られる
。また、微多孔質体層部分をインキ着肉性物質で埋めて
も良い。The cover sheet of the above-mentioned dampening water-free lithographic printing plate is then peeled off after exposure, and the uncured portion is washed away with a water spray organic solvent, etc., so that the giI exposed microporous material layer portion becomes an ink receptive image area. A lithographic printing plate that does not require dampening water is obtained. Further, the microporous material layer portion may be filled with an ink receptive substance.
[発明の効果]
本発明によれば、画線部のインキ反撥性に悪影響を及ぼ
さず耐刷性を向上させることができ、高温環境下でも地
汚れが生じない湿し水不要平版印刷版及びその製造方法
を提供することができる。[Effects of the Invention] According to the present invention, it is possible to improve printing durability without adversely affecting the ink repellency of the image area, and to provide a lithographic printing plate that does not require dampening water and does not cause scumming even in a high-temperature environment. A manufacturing method thereof can be provided.
[実施例] 以下に実施例を挙げて本発明を更に詳説・する。[Example] The present invention will be explained in more detail with reference to Examples below.
なお以下の記載で、「部」とあるのは特に断らない限り
「重量部」を意味する。In the following description, "parts" means "parts by weight" unless otherwise specified.
実施例1
厚さ10ルl、気孔径平均1pm 、気孔率30%のポ
リ四フッ化エチレンフィルムがラミネートされたPET
フィルム(厚さ 100JL11)に下記感光性組成物
をlOルmの厚さに塗布し、乾燥した。Example 1 PET laminated with a polytetrafluoroethylene film having a thickness of 10 l, an average pore diameter of 1 pm, and a porosity of 30%.
The following photosensitive composition was applied to a film (thickness 100JL11) to a thickness of 10Lm and dried.
(感光性組成物)
・ナフトキノン−(1,2)−ジアジド−(2)−5−
スルホン酸クロライドどピロガロール・アセトン樹脂と
のエステル化合物(数平均分子、11Mn−1850、
重量平均分子量Mw=2200、縮合率30モル%)1
.7g
−フェノールとm=+P−8合クレゾールとホルムアル
デヒドとの共重縮合樹脂(フェノール、m−クレゾール
及びp−クレゾールの各々のモル比が30:42:2B
、数平均分子量M n−13H,重量平均分子量Mw=
8140、住友デュレス社製、商品名5K−103)
6.48g* p−tart
−オクチルフェノールとホルムア゛ルデヒドより合成さ
れたノボラック樹脂とナタトキノン−(1,2)−ジア
ジド=(2)−5−スルホン酸クロライドとのエステル
化合物(重量平均分子量M w =1800、縮合率5
0モル%) 0.1B。(Photosensitive composition) Naphthoquinone-(1,2)-diazide-(2)-5-
Sulfonic acid chloride ester compound with pyrogallol acetone resin (number average molecule, 11Mn-1850,
Weight average molecular weight Mw = 2200, condensation rate 30 mol%) 1
.. 7g - Copolycondensation resin of phenol and m=+P-8 combined cresol and formaldehyde (the molar ratio of phenol, m-cresol and p-cresol is 30:42:2B)
, number average molecular weight M n-13H, weight average molecular weight Mw=
8140, manufactured by Sumitomo Dures, product name 5K-103)
6.48g* p-tart
- Ester compound of novolak resin synthesized from octylphenol and formaldehyde and natatoquinone-(1,2)-diazide=(2)-5-sulfonic acid chloride (weight average molecular weight M w = 1800, condensation rate 5
0 mol%) 0.1B.
−オイルブルー1803 (オリエンタル社製、染料)
0.06g
φエチレングリコールモノメチルエーテル3m l
上記版材の上面にポジフィルムを真空密着させてメタル
ハライドランプを用いて露光した0次いでコニカ社製現
像液5DR−1の9倍希釈液を用いて露光部である非画
線部を溶出除去して画線部のみを支持体に残した。-Oil Blue 1803 (manufactured by Oriental Co., Ltd., dye)
0.06 g φ Ethylene glycol monomethyl ether 3 ml A positive film was vacuum-adhered to the top surface of the above plate material and exposed using a metal halide lamp.The exposed area was then exposed using a 9-fold dilution of Konica developer 5DR-1. The non-printed areas were eluted and removed, leaving only the printed areas on the support.
次いでこの上に下記シリコーンゴム、ifl成物を乾燥
後の厚さ(支持体からの厚さをいう) 10uLmに塗
布し、110℃4分間加熱硬化してインキ反撥性物質含
有層を形成した。Next, the following silicone rubber, ifl composition, was coated onto this to a thickness after drying (thickness from the support) of 10 μLm, and heated and cured at 110° C. for 4 minutes to form an ink-repellent material-containing layer.
(シリコーンゴム組成物)
(a)ポリジメチルシロキサン
(分子量約3万末端OH基)70ffi′量部(b)ポ
リジメチルシロキサン
(分子権約5千末端メチル基)30重量部(C)ビニル
トリ(メチルエチル
ケトオキシム)シラン 8重量部(d)ジブチル
錫ジラウレート0.1重量部(e)γ−アミノブロピル
トリエ 3重量部トキシシラン
(「)アイソパー8400重量部
次いで画像部上方のインキ反撥性物質のみをアイソパー
G(エッソ化学社製溶剤)によりl1aii潤させスポ
ンジで擦ることにより剥離して本発明の湿し水不要平版
印刷版を得た。(Silicone rubber composition) (a) Polydimethylsiloxane (molecular weight: approx. 30,000 terminal OH group) 70 parts by weight (b) Polydimethylsiloxane (molecular weight: approx. 5,000 terminal methyl group) 30 parts by weight (C) Vinyl tri(methyl ethyl ketone) Oxime) Silane 8 parts by weight (d) Dibutyltin dilaurate 0.1 part by weight (e) γ-Aminopropyltrie 3 parts by weight Toxysilane (') Isopar 8400 parts by weight Next, only the ink repellent substance above the image area was treated with Isopar G. (Solvent manufactured by Esso Chemical Co., Ltd.) and peeled off by rubbing with a sponge to obtain a lithographic printing plate that does not require dampening water.
その結果、画線部に感光性組成物、非画線部に硬化シリ
コーンゴムを含む刷版が得られた。As a result, a printing plate containing the photosensitive composition in the image area and the cured silicone rubber in the non-image area was obtained.
上記の刷版を湿し水供給装置を外したハイデルベルグG
TO印刷機に取り付け、版面温度を25℃とし、東洋イ
ンキ社製TOYOKl)iG tlLTRA TKUア
クワレスG紅インキにより印刷して印刷物を得た。また
版面温度を35゛Cに代えた場合についても同様にして
印刷物を得た。Heidelberg G with the above printing plate dampened and the water supply device removed.
The plate was attached to a TO printing machine, the plate surface temperature was set to 25° C., and printed materials were obtained by printing with TOYOKl) iG tlLTRA TKU Aquares G red ink manufactured by Toyo Ink Co., Ltd. Printed matter was also obtained in the same manner when the plate surface temperature was changed to 35°C.
この印刷物の地汚れの有無及び刷版の画像品質を評価し
た。結果を表1に示す。The presence or absence of scumming on this printed matter and the image quality of the printing plate were evaluated. The results are shown in Table 1.
表中、■=2万枚印刷しても地汚れなしO:5千枚印刷
で地汚れ発生
Δ:2千枚印刷で地汚れ発生
X:500枚印刷で地汚れ発生
実施例2
実施例1と同様の微多孔質体層ラミネー) PETフィ
ルムに、次の組成の光硬化性シリコーンゴム組成物を塗
布し、溶媒を蒸発させた後、lOp■の厚さのポリプロ
ピレンフィルムで光硬化性シリコーンゴム組成物が含浸
された微多孔質体層の表面を被膜し、感光性湿し水不要
平版印刷版を得た。In the table, ■ = No background smudge even after printing 20,000 sheets O: Background smear occurs after printing 5,000 sheets Δ: Background smudge occurs after printing 2,000 sheets X: Background smear occurs after printing 500 sheets Example 2 Example 1 A photocurable silicone rubber composition having the following composition is applied to a PET film, the solvent is evaporated, and a photocurable silicone rubber composition is coated with a polypropylene film having a thickness of 1Op■. The surface of the microporous layer impregnated with the composition was coated to obtain a photosensitive lithographic printing plate that did not require dampening water.
(感光性シリコーンゴム組成物)
(a)両末端アクリロイル基ポリジメチルシロキサン(
分子量約3万)
(東亜合成化学工業社製AK−30) 50重量部(
b)片末端アクリロイル基ポリジメチルシロキサン(分
子量約5千)
(東亜合成化学工業社製AX−5) 50重量部(c
)2−メチル−[4−(メチルチオ)フェニル1−2−
モルフォリノ−1−プロパノン
(チバガイギー社製イルガキュア907)3重量部
(d)トルエン 100重量部上
記印刷板の上面にポジフィルムを真空密着させてメタル
ハライドランプを用いて露光した。(Photosensitive silicone rubber composition) (a) Polydimethylsiloxane with acryloyl groups at both ends (
Molecular weight: approx. 30,000) (AK-30 manufactured by Toagosei Kagaku Kogyo Co., Ltd.) 50 parts by weight (
b) Polydimethylsiloxane with acryloyl group at one end (molecular weight approximately 5,000) (AX-5 manufactured by Toagosei Chemical Industry Co., Ltd.) 50 parts by weight (c
)2-Methyl-[4-(methylthio)phenyl1-2-
Morpholino-1-propanone (Irgacure 907 manufactured by Ciba Geigy) 3 parts by weight (d) Toluene 100 parts by weight A positive film was vacuum-adhered to the top surface of the printing plate and exposed using a metal halide lamp.
次いでポリプロピレンフィルムを剥がし、アイソパーH
(エッソ化学社製)にて未露光部の光硬化性シリコーン
ゴムを洗い流し、水洗し、乾燥して刷版が得られた。こ
の刷版を用い、実施例1と同様に印刷し、同様に評価し
、その結果を表1に示す。Next, peel off the polypropylene film and apply Isopar H.
(manufactured by Esso Kagaku Co., Ltd.) to remove the photocurable silicone rubber in the unexposed areas, rinse with water, and dry to obtain a printing plate. Using this printing plate, printing was carried out in the same manner as in Example 1, and evaluation was made in the same manner. The results are shown in Table 1.
比較例1
PET支持体上に微多孔質体層を設けなかった以外は実
施例1と同様にして刷版を得た。この刷版を用い、実施
例1と同様に印刷し、同様に評価し、その結果を表1に
示す。Comparative Example 1 A printing plate was obtained in the same manner as in Example 1 except that the microporous layer was not provided on the PET support. Using this printing plate, printing was carried out in the same manner as in Example 1, and evaluation was made in the same manner. The results are shown in Table 1.
比較例2
PET支持体上に微多孔質体層を設けなか゛った以外は
実施例2と同様にして刷版を得た。この刷版を用い、実
施例1と同様に印刷し、同様に評価し、その結果を表1
に示す。Comparative Example 2 A printing plate was obtained in the same manner as in Example 2 except that the microporous layer was not provided on the PET support. Using this printing plate, printing was carried out in the same manner as in Example 1 and evaluated in the same manner, and the results are shown in Table 1.
Shown below.
比較例3
PET支持体上に微多孔質体層を設けなかったことと、
シリコーンゴム組成物の(b)ポリジメチルシロキサン
(分子量約5千末端メチル基)をポリジメチルシロキサ
ン(分子量約3万末端OH基)に換え、γ−アミノプロ
ピルトリエトキシシラン3瓜量部を加えた以外は実施例
2と同様にして刷版を得た。この刷版を用い、実施例1
と同様に印刷し、同様に評価し、その結果を表1に示す
。Comparative Example 3 No microporous layer was provided on the PET support,
In the silicone rubber composition, (b) polydimethylsiloxane (molecular weight: approximately 5,000 terminal methyl groups) was replaced with polydimethylsiloxane (molecular weight: approximately 30,000 terminal OH groups), and 3 parts of γ-aminopropyltriethoxysilane was added. A printing plate was obtained in the same manner as in Example 2 except for this. Using this printing plate, Example 1
The results were shown in Table 1.
表table
第1図〜第4図は本発明の製造方法の一例を示す概略断
面図である。
1:支持体
2:微多孔質体層
3:画線部
4:非画線部(微多孔質体にインキ反撥性物質を含まな
い)
4′:非画線部(インキ反撥性物質の硬化物を含む)
特許出願人 コ ニ カ 株 式 会 社代 理 人
弁理士 坂口信昭
第1
図
第3図
□1
□l
第2
図
第4図
□1
一−I1 to 4 are schematic cross-sectional views showing an example of the manufacturing method of the present invention. 1: Support 2: Microporous material layer 3: Image area 4: Non-image area (microporous material does not contain ink repellent material) 4': Non-image area (hardening of ink repellent material) Patent applicant Konica Co., Ltd. Representative Patent attorney Nobuaki Sakaguchi No. 1 Figure 3 □1 □l Figure 2 Figure 4 □1 1-I
Claims (1)
質体層を有することを特徴とする湿し水不要平版印刷板
。 2、画線部に感光性組成物の露光、現像によって得られ
たインキ着肉性物質層を有することを特徴とする請求項
1記載の湿し水不要平版印刷版。 3、インキ反撥性物質の硬化物が感光性インキ反撥性物
質の露光による硬化物であることを特徴とする請求項1
記載の湿し水不要平版印刷版。 4、支持体上に、微多孔質体層を設け、該微多孔質体層
上に、感光性組成物を塗布し含浸させた後、露光、現像
して非画線部の感光性組成物を除去し、次いで該微多孔
質体層上にインキ反撥性物質を塗布し含浸させ、次いで
該インキ反撥性物質を硬化させた後、画線部上のインキ
反撥性物質を除去することを特徴とする湿し水不要平版
印刷版の製造方法。[Scope of Claims] 1. A lithographic printing plate that does not require dampening water and has a microporous layer containing a cured product of an ink-repellent substance in the non-image area. 2. The dampening water-free lithographic printing plate according to claim 1, which has an ink receptive material layer obtained by exposing and developing a photosensitive composition in the image area. 3. Claim 1, wherein the cured product of the ink-repellent material is a cured product of a photosensitive ink-repellent material by exposure to light.
Lithographic printing plate that does not require dampening water. 4. A microporous material layer is provided on a support, and a photosensitive composition is coated on the microporous material layer to impregnate it, and then exposed and developed to form a photosensitive composition in a non-image area. is removed, then an ink repellent material is applied and impregnated onto the microporous material layer, and after the ink repellent material is cured, the ink repellent material on the image area is removed. A method for producing a lithographic printing plate that does not require dampening water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18227788A JPH0232349A (en) | 1988-07-21 | 1988-07-21 | Damping-waterless planographic printing plate and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18227788A JPH0232349A (en) | 1988-07-21 | 1988-07-21 | Damping-waterless planographic printing plate and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0232349A true JPH0232349A (en) | 1990-02-02 |
Family
ID=16115456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18227788A Pending JPH0232349A (en) | 1988-07-21 | 1988-07-21 | Damping-waterless planographic printing plate and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0232349A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017167537A (en) * | 2016-03-15 | 2017-09-21 | 東レ株式会社 | Silicone composition for printing plate, and method of manufacturing lithographic printing plate original plate, lithographic printing plate and printed matter |
-
1988
- 1988-07-21 JP JP18227788A patent/JPH0232349A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017167537A (en) * | 2016-03-15 | 2017-09-21 | 東レ株式会社 | Silicone composition for printing plate, and method of manufacturing lithographic printing plate original plate, lithographic printing plate and printed matter |
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