JPH02302343A - Production of hermetic-covered optical fiber - Google Patents
Production of hermetic-covered optical fiberInfo
- Publication number
- JPH02302343A JPH02302343A JP1121273A JP12127389A JPH02302343A JP H02302343 A JPH02302343 A JP H02302343A JP 1121273 A JP1121273 A JP 1121273A JP 12127389 A JP12127389 A JP 12127389A JP H02302343 A JPH02302343 A JP H02302343A
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- hermetic
- gas
- coating
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000011248 coating agent Substances 0.000 claims abstract description 38
- 238000000576 coating method Methods 0.000 claims abstract description 38
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 9
- 150000002367 halogens Chemical class 0.000 claims abstract description 9
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 150000001722 carbon compounds Chemical class 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 4
- 238000002230 thermal chemical vapour deposition Methods 0.000 claims description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052801 chlorine Inorganic materials 0.000 abstract description 14
- 239000000460 chlorine Substances 0.000 abstract description 14
- 238000006243 chemical reaction Methods 0.000 abstract description 12
- 238000005979 thermal decomposition reaction Methods 0.000 abstract description 8
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 47
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/106—Single coatings
- C03C25/1061—Inorganic coatings
- C03C25/1062—Carbon
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、光ファイバ表面にカーボンまたはカーボン化
合物（ＳｉＣ、ＴｉＣ等）から成るハーメチック被覆を
被覆したハーメチック被覆光ファイバを得るための方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for obtaining a hermetic coated optical fiber in which the surface of the optical fiber is coated with a hermetic coat made of carbon or a carbon compound (SiC, TiC, etc.).
最近、第２図に示すように、コア３ａ、クラッド３ｂよ
りなる光ファイバ３の表面にカーボンまたはカーボン化
合物からなる被覆３０（以下ハーメチック被覆という）
を設け、外部から光ファイバ３の内部へＦＩＦＯやＨ！
が侵入するのを防止する、いわゆるハーメチック被覆光
ファイバ４０と称されるものが提案されている。Recently, as shown in FIG. 2, a coating 30 (hereinafter referred to as a hermetic coating) made of carbon or a carbon compound is coated on the surface of an optical fiber 3 consisting of a core 3a and a cladding 3b.
A FIFO or H! is provided from the outside to the inside of the optical fiber 3.
A so-called hermetic coated optical fiber 40 has been proposed that prevents the intrusion of light.
このハーメチック被覆光ファイバ４０の特徴は、前記外
部からのＨ２ＯやＨ２の侵入を防止でき、その結果耐水
素特性が向上するだけでなく、光ファイバの疲労特性も
向上することが見出され、現在その製造をいかにして安
定に、かつ効率良く行うか検討が急がれている。 ゛
第３図は従来行われているハーメチック被覆光ファイバ
４０の製造方法の一例を示すものである。The characteristics of this hermetic coated optical fiber 40 are that it can prevent the intrusion of H2O and H2 from the outside, and as a result, it has been found that not only the hydrogen resistance properties are improved, but also the fatigue properties of the optical fiber are improved. There is an urgent need to consider how to carry out the production stably and efficiently. 3 shows an example of a conventional method for manufacturing a hermetic coated optical fiber 40.
これは光ファイバ用母材１を線引炉２に導入してコア３
ａ、クラッド３ｂを有する光ファイバ３と成し、これを
熱ＣＶＤ用の反応炉５に導く。この反応炉５の外側には
必要に応じてヒータ６が配置されていて、該°ヒータ６
により反応炉５内には加熱ゾーン７が設定されている。This involves introducing the optical fiber preform 1 into the drawing furnace 2 and drawing the core 3.
a, an optical fiber 3 having a cladding 3b is formed, and the optical fiber 3 is guided to a reactor 5 for thermal CVD. A heater 6 is arranged outside the reactor 5 as required.
Accordingly, a heating zone 7 is set within the reactor 5.
符号８はハーメチック被覆用の原料ガス導入口で、ここ
から原料ガス、例えばメタン、エタン、エチレン、アセ
チレン、プロパン、ブタン等の炭化水素ガスが、必要に
応じて添加されるＮ、ガスと共に反応炉５へと供給され
る。Reference numeral 8 denotes a raw material gas inlet for hermetic coating, through which raw material gas, such as hydrocarbon gas such as methane, ethane, ethylene, acetylene, propane, butane, etc., is introduced into the reactor together with N and gas added as necessary. 5.
また符号９はガスの排気口を示している。加えて、符号
１０＾、ＩＯＢはそれぞれ前記反応炉５の両端部を示し
、ここにはシールガス導入口１１Ａ 、ＩＩＢが設けら
れていて、反応炉５内への外気の導入を防ぐため前記導
入口１１Ａ 、 ＩＩＢを介してシールガス、例えば不
活性ガスの１つであるＮ２ガスが供給されている。Further, reference numeral 9 indicates a gas exhaust port. In addition, numerals 10^ and IOB respectively indicate both ends of the reactor 5, where seal gas inlets 11A and IIB are provided to prevent the introduction of outside air into the reactor 5. A sealing gas, such as N2 gas, which is one of the inert gases, is supplied through ports 11A and IIB.
このようにして成る反応炉５内に導かれた光ファイバ３
の表面には、前記原料ガスが前記ヒータ６の加熱により
熱分解されてカーボンが生成され、これが気相化学反応
により光ファイバ３の表面上に堆積し、第２図に示すよ
うなハーメチック被覆３０が形成される０図中の符号４
は外径測定器で、この値により線引速度や光ファイバ用
母材１の送り速度が調整され光ファイバ３の外径が一定
になるように制御される。Optical fiber 3 guided into reactor 5 constructed in this way
Carbon is generated on the surface of the optical fiber 3 by thermal decomposition of the raw material gas by the heating of the heater 6, and this is deposited on the surface of the optical fiber 3 by a gas phase chemical reaction, forming a hermetic coating 30 as shown in FIG. 0 code 4 in the figure is formed
is an outer diameter measuring device, and the drawing speed and the feeding speed of the optical fiber preform 1 are adjusted based on this value, so that the outer diameter of the optical fiber 3 is controlled to be constant.
二のようにして得られたハーメチック被覆光ファイバ４
０の外側には通常の方法でプラスチック被覆が形成され
る。例えば紫外線硬化性樹脂を塗布装置１２でハーメチ
ック被覆光ファイバ４０上に塗布し、これを紫外線照射
炉等の硬化炉１３により硬化せしめ、巻取機１４で巻き
取る。ここで塗布する樹脂として熱硬化性樹脂や熱可塑
性樹脂も使用でき、熱硬化性樹脂を使用する場合であれ
ば、前記硬化炉１３として加熱炉を配すればよい。Hermetic coated optical fiber 4 obtained as in 2.
A plastic coating is applied to the outside of the 0 in the usual manner. For example, an ultraviolet curable resin is applied onto the hermetic coated optical fiber 40 using a coating device 12, cured using a curing furnace 13 such as an ultraviolet irradiation furnace, and wound up using a winder 14. A thermosetting resin or a thermoplastic resin can also be used as the resin to be applied here, and if a thermosetting resin is used, a heating furnace may be provided as the curing furnace 13.
ところが前述した従来の方法では、相対的に温度が高い
反応炉５の内周壁近傍で熱分解されたカーボンが反応炉
５内の空間に比較的粒径の大きなスス状粒子として浮遊
し易く、これがハーメチック被覆３０内に混入するとハ
ーメチック被覆３０の密度が低下し、かつ光ファイバ３
の表面から剥離し易くなる。その結果、前述した耐水素
特性や疲労特性が低下するという問題があった。However, in the conventional method described above, carbon that is thermally decomposed near the inner circumferential wall of the reactor 5, where the temperature is relatively high, tends to float in the space inside the reactor 5 as soot-like particles with a relatively large particle size. When mixed into the hermetic coating 30, the density of the hermetic coating 30 decreases, and the optical fiber 3
easily peels off from the surface. As a result, there was a problem in that the aforementioned hydrogen resistance properties and fatigue properties deteriorated.
そこで近年、線引直後の光ファイバ３自身の持つ熱を利
用して、原料ガスの熱分解をできるだけ光ファイバ３の
表面近傍でのみ行わせ、前述したように反応炉５の内周
壁近傍で熱分解が進んだ場合生じ易いと考えられている
スス状粒子の発生を防止するという提案も成されている
。Therefore, in recent years, using the heat of the optical fiber 3 itself immediately after drawing, the thermal decomposition of the raw material gas is performed only as close to the surface of the optical fiber 3 as possible, and as mentioned above, the heat is generated near the inner peripheral wall of the reactor 5. Proposals have also been made to prevent the generation of soot-like particles, which are thought to be likely to occur when decomposition progresses.
この方法を具体的に説明すると、例えば線引炉２に反応
炉５をできるだけ接近させて、線引後の光ファイバ３の
温度低下をできるだけ防ぐようにして光ファイバ３を反
応炉５へと導き、主として光ファイバ３の表面近傍にて
原料ガスの熱分解を行い、スス状粒子の混入しない、す
なわち高密度のハーメチック被覆３０を形成しようとす
るものである。To explain this method in detail, for example, the optical fiber 3 is guided into the reaction furnace 5 by bringing the reaction furnace 5 as close as possible to the drawing furnace 2 and preventing the temperature of the optical fiber 3 from decreasing as much as possible after drawing. The purpose is to thermally decompose the raw material gas mainly near the surface of the optical fiber 3 to form a hermetic coating 30 that is free from soot-like particles, that is, has a high density.
−しかしこの方法の場合、形成されるハーメチック被覆
３０の厚さはほとんど光ファイバ３の表面温度に依存し
てしまう、その結果低線速でハーメチック被覆３０を行
わなければならないような場合、光ファイバ５は線引炉
２と反応炉δの間で必要以上に冷却されてしまい、反応
炉５に入る直前には原料ガスを必要量熱分解せしめるに
足る表面温度を維持していない場合がでてくる。その場
合所望厚のハーメチック被覆３０を得ることができなく
なり、もって耐水素特性や疲労強度を充分に満足せしめ
る八−メチツク被覆光ファイバ４０が得られないという
問題があった。- However, in the case of this method, the thickness of the hermetic coating 30 to be formed depends mostly on the surface temperature of the optical fiber 3. As a result, when the hermetic coating 30 has to be performed at a low linear speed, the thickness of the optical fiber 5 is cooled more than necessary between the drawing furnace 2 and the reactor δ, and there are cases where the surface temperature is not maintained enough to thermally decompose the necessary amount of raw material gas just before entering the reactor 5. come. In that case, there was a problem that the hermetic coating 30 of the desired thickness could not be obtained, and therefore, the eight-metically coated optical fiber 40 that fully satisfied hydrogen resistance and fatigue strength could not be obtained.
前記問題に鑑み本発明の目的は、広い製造条件下で、例
えば製造線速の幅を広くとっても、充分なハーメチック
被覆厚さを有するハーメチック被覆光ファイバを得るこ
とのできる方法を提供することにある。In view of the above-mentioned problems, an object of the present invention is to provide a method capable of obtaining a hermetically coated optical fiber having a sufficient hermetic coating thickness under a wide range of manufacturing conditions, for example, even when the manufacturing speed is wide. .
前記目的を達成すべく本発明は、光ファイバ用母材から
光ファイバを線引し、しかる後に該光ファイバをして反
応炉内を通過せしめ、その表面上に熱ＣＶＤ法によりカ
ーボンまたはカーボン化合物からなるハーメチック被覆
を施すハーメチック被覆光ファイバの製造方法において
、前記反応炉内にハーメチック被覆用の原料ガスと共に
ハロゲンガスを供給することを特徴とするものである。In order to achieve the above object, the present invention involves drawing an optical fiber from an optical fiber base material, passing the optical fiber through a reactor, and applying carbon or a carbon compound onto its surface by thermal CVD. A method for producing a hermetic coated optical fiber comprising a hermetic coating, characterized in that a halogen gas is supplied into the reactor together with a raw material gas for the hermetic coating.
以下に本発明の実施例を図面を参照して詳細に説明する
０本発明者は前述した従来の製造方法を充分に検討した
結果、ハーメチック被覆用の原料ガス例えばＣＪ４に、
例えば塩素等のハロゲンガスを添加してやれば、光ファ
イバ３の表面温度が多少不足している場合でも、光ファ
イバ３の表面近傍における原料ガスの熱分解を促進でき
、所望厚のハーメチック被覆３０が得られることを見出
した。Embodiments of the present invention will be described below in detail with reference to the drawings. As a result of thorough study of the conventional manufacturing method described above, the present inventor has found that the raw material gas for hermetic coating, for example, CJ4,
For example, by adding halogen gas such as chlorine, even if the surface temperature of the optical fiber 3 is somewhat insufficient, thermal decomposition of the raw material gas near the surface of the optical fiber 3 can be promoted, and the hermetic coating 30 of the desired thickness can be obtained. I found out that it can be done.
このメカニズムは以下のように推論される。This mechanism is inferred as follows.
すなわち、Ｃ，Ｉ（、ガスと塩素とは反応炉５内で下記
反応式（１）が示すような発熱反応をする。この発熱反
応によって生ずる熱が（２）式に示す原料ガスであるＣ
ｚＨａガスの熱分解を助け、ハーメチック被覆３０の形
成が促進される、というものである。That is, C, I(, gas and chlorine undergo an exothermic reaction as shown in the following reaction formula (1) in the reactor 5. The heat generated by this exothermic reaction is
The thermal decomposition of the zHa gas is aided, and the formation of the hermetic coating 30 is promoted.
Ｃ！＋１４ ＋２ＣＩ□−ン４ＨＣ１＋２Ｃ＋ （熱〕
・・・（１）ＣｚＨ４２Ｇ ＋２Ｈｚ −・−−−
−−−−（２）尚、（２）式における２Ｃがハーメチッ
ク被覆３０として光ファイバ３の表面上に堆積するもの
である。C! +14 +2CI□-n4HC1+2C+ (heat)
...(1) CzH42G +2Hz -・---
----(2) Note that 2C in equation (2) is deposited on the surface of the optical fiber 3 as the hermetic coating 30.
尚、ハロゲンガスとしては前述した塩素の他に、例えば
ＣＦ４．５ＯＣ１ｚ等のガスも適用できる。またハーメ
チック被覆用の原料ガスについても前記ｃ８１１４ガス
の他に、ＣＨａ 、ＣＪｚ、Ｃ３ＨＩｌ、 ＣＪ＋ｏガ
ス等他の炭化水素ガスあるいはこれにＳｉＨ４やＴｉＣ
ｌ４等を添加したものも使用できる。In addition to the above-mentioned chlorine, gases such as CF4.5OC1z can also be used as the halogen gas. In addition to the above C8114 gas, raw material gases for hermetic coating include other hydrocarbon gases such as CHa, CJz, C3HIl, and CJ+o gases, or SiH4 and TiC gases.
Those to which l4 etc. are added can also be used.
以下に本発明め実施例を具体的に述べる。Examples of the present invention will be specifically described below.
実施例
前記第２図に示す装置において、まず反応炉５として内
径５０ｍｍ、厚さ２１、長さ４５０１の石英ガラス製の
炉を用意した。これをヒータ６にて包囲したが、本実施
例ではこのヒータ６は必要でなかったため使用しなかっ
た。但し、原料ガスの熱分解温度が高いとき等必要に応
じて補助手段として使用することができる。EXAMPLE In the apparatus shown in FIG. 2, a quartz glass furnace having an inner diameter of 50 mm, a thickness of 21 mm, and a length of 450 mm was prepared as the reactor 5. This was surrounded by a heater 6, but this heater 6 was not needed in this embodiment and was therefore not used. However, it can be used as an auxiliary means if necessary, such as when the thermal decomposition temperature of the raw material gas is high.
そして原料ガスとしてはＣｔＨ４ガスを、これにハロゲ
ンガスである塩素を添加して総量２．０１ ／ｍｉｎと
成して原料ガス導入口８より反応炉５に供給した。また
反応炉５を外気からシールするためにＮ！ガスをシール
ガス導入口１１Ａ 、 ＩＩＢを介して５１／鵡ｉｎづ
つ流し込んだ。CtH4 gas was used as the raw material gas, and chlorine, which is a halogen gas, was added thereto to give a total flow rate of 2.01/min, and the mixture was supplied to the reactor 5 through the raw gas inlet 8. Also, in order to seal the reactor 5 from the outside air, N! Gas was injected at a rate of 51/cm through the seal gas inlets 11A and IIB.
次に光ファイバ用母材１から線引を開始し、線速５００
ｓ／ｓｉｎで光ファイバ３を反応炉５内に導いた。Next, start drawing from optical fiber base material 1, and draw at a drawing speed of 500.
The optical fiber 3 was guided into the reactor 5 at s/sin.
この実験ではＣ＊Ｈ４ガスに添加する塩素量（重量％）
を変化せしめて、形成されるハーメチック被覆３０の厚
さの変化を調査した。In this experiment, the amount of chlorine added to C*H4 gas (wt%)
The changes in the thickness of the hermetic coating 30 formed were investigated by changing the .
得られた外径１２５Ｉ−のハーメチック被覆光ファイバ
４０上には従来法により紫外線硬化性樹脂から成る樹脂
被覆が形成された。A resin coating made of an ultraviolet curable resin was formed on the obtained hermetic coated optical fiber 40 having an outer diameter of 125 I by a conventional method.
このようにして得られた各光ファイバ心線から樹脂被覆
を除去し、しかる後これを軸に対して直角に切断して、
その横断面を電子類＠鏡にて観察してハーメチック被覆
３０の厚さを測定した。この結果を第１図に示す。この
図で縦軸はハーメチック被覆３０の厚さく人）で、横軸
は反応炉５に供給したＣ１Ｈ，ガス及び塩素の総量に占
める塩素の濃度（重量％）を示している。The resin coating was removed from each optical fiber core obtained in this way, and then it was cut at right angles to the axis.
The thickness of the hermetic coating 30 was measured by observing the cross section with an electronic mirror. The results are shown in FIG. In this figure, the vertical axis represents the thickness of the hermetic coating 30, and the horizontal axis represents the concentration (% by weight) of chlorine in the total amount of C1H, gas, and chlorine supplied to the reactor 5.
本図が示すようにハロゲンガスが０重量％の場合、すな
わち従来方法では原料ガス量が本発明の実施例のものと
同量あるいはそれより多いにもかかわらず、ハーメチッ
ク被覆３０の厚さは５００Å以下のものしか得られなか
らだ、しかしながら、反応炉５にＣｚＨａガスと共に塩
素を少しづつ添加供給していくとハーメチック被覆３０
の厚さが急激に増してきた。特に塩素量が０．２重量％
以上になると、光ファイバ３への）１２０や■、の侵入
を防止するのに最低限必要と言われている５００Å以上
の厚さを確保できた。As shown in this figure, when the halogen gas is 0% by weight, that is, in the conventional method, the thickness of the hermetic coating 30 is 500 Å even though the amount of raw material gas is the same as or greater than that of the embodiment of the present invention. This is because only the following can be obtained. However, if chlorine is added and supplied little by little together with CzHa gas to the reactor 5, the hermetic coating 30
The thickness has increased rapidly. In particular, the amount of chlorine is 0.2% by weight.
With the above, it was possible to secure a thickness of 500 Å or more, which is said to be the minimum necessary to prevent the intrusion of )120 and (2) into the optical fiber 3.
このように原料ガスの熱分解が塩素の添加により促進さ
れ、もってハーメチック被覆３ｏの形成が効率良く行わ
れるようになった。In this way, the thermal decomposition of the raw material gas is promoted by the addition of chlorine, and as a result, the hermetic coating 3o can be formed efficiently.
また本発明により得られたハーメチック被覆３゜の性能
を調べるため、得られたハーメチック被覆光ファイバ心
線を１００％水素雰囲気、７５°Ｃの条件下に８時間晒
し、しかる後そのロススペクトルを測定した。この測定
の結果とこの処理前の測定結果とを比較したところ、前
記処理によるロス増加、すなわち水素によるロス増加は
なんら認められなかった。In addition, in order to investigate the performance of the hermetic coating 3° obtained by the present invention, the obtained hermetic coated optical fiber was exposed to a 100% hydrogen atmosphere at 75°C for 8 hours, and then its loss spectrum was measured. did. When the results of this measurement were compared with the measurement results before this treatment, no increase in loss due to the treatment, that is, no increase in loss due to hydrogen was observed.
このように本発明の方法によれば、原料ガスにハロゲン
ガスを添加せしめたことにより、両ガスの反応により生
ずる反応熱を原料ガスの熱分解に寄与させることができ
、仮に熱ＣＶＤ用の反応炉に入る直前の光ファイバ自身
の表面温度が多少低かったとしても、有効厚さのハーメ
チック被覆を形成することができる。すなわち本発明に
よれば所望厚さのハーメチック被覆を形成できる製造条
件が従来に比して広がり、ハーメチック被覆光ファイバ
の製造がより容易になるという効果がある。As described above, according to the method of the present invention, by adding halogen gas to the raw material gas, the reaction heat generated by the reaction of both gases can contribute to the thermal decomposition of the raw material gas. Even if the surface temperature of the optical fiber itself just before entering the furnace is somewhat low, a hermetic coating of effective thickness can be formed. That is, according to the present invention, the manufacturing conditions under which a hermetic coating of a desired thickness can be formed are expanded compared to the conventional method, and the manufacturing of a hermetic-coated optical fiber becomes easier.
以上の如く本発明の方法によれば、ハーメチック被覆光
ファイバを製造するに際して、従来よりもより広い範囲
で製造条件を設定できるため、より容易に、しかも安定
してハーメチック被覆光ファイバを製造することができ
る。As described above, according to the method of the present invention, when manufacturing a hermetic coated optical fiber, manufacturing conditions can be set in a wider range than conventional methods, so that the hermetic coated optical fiber can be manufactured more easily and stably. I can do it.
第１図は本発明に係わるもので、ＣｔＬガス及び塩素の
総量に占める塩素の濃度と形成されるハーメチック被覆
厚の関係を示すグラフ、第２図はノ＼−メチツク被覆光
ファイバの一例を示す横断面図、第３図はハーメチック
被覆光ファイバの製造方法を説明するための説明図であ
る。
１〜光ファイバ用母材 ２〜線引炉 ３〜光ファイバ
５〜反応炉 ６〜ヒーク ８〜原料ガス導入口 １１Ａ
、ＩＩＢ〜シールガス導入口特許出願人 古河電
気工業株式会社第１図
第２図
第３図Figure 1 relates to the present invention, and is a graph showing the relationship between the concentration of chlorine in the total amount of CtL gas and chlorine and the thickness of the hermetic coating formed, and Figure 2 shows an example of a metal-coated optical fiber. The cross-sectional view and FIG. 3 are explanatory diagrams for explaining a method of manufacturing a hermetic coated optical fiber. 1 - Base material for optical fiber 2 - Drawing furnace 3 - Optical fiber
5~Reactor 6~Heat 8~Raw material gas inlet 11A
, IIB ~ Seal gas inlet Patent applicant Furukawa Electric Co., Ltd. Figure 1 Figure 2 Figure 3
Claims (1)
に該光ファイバをして反応炉内を通過せしめ、その表面
上に熱ＣＶＤ法によりカーボンまたはカーボン化合物か
らなるハーメチック被覆を施すハーメチック被覆光ファ
イバの製造方法において、前記反応炉内にハーメチック
被覆用の原料ガスと共にハロゲンガスを供給することを
特徴とするハーメチック被覆光ファイバの製造方法。A hermetic coated optical fiber in which an optical fiber is drawn from an optical fiber base material, and then the optical fiber is passed through a reactor, and a hermetic coating made of carbon or a carbon compound is applied to the surface of the optical fiber by thermal CVD. A method for manufacturing a hermetic coated optical fiber, characterized in that a halogen gas is supplied into the reactor together with a raw material gas for hermetic coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1121273A JPH02302343A (en) | 1989-05-15 | 1989-05-15 | Production of hermetic-covered optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1121273A JPH02302343A (en) | 1989-05-15 | 1989-05-15 | Production of hermetic-covered optical fiber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02302343A true JPH02302343A (en) | 1990-12-14 |
Family
ID=14807173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1121273A Pending JPH02302343A (en) | 1989-05-15 | 1989-05-15 | Production of hermetic-covered optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02302343A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03153549A (en) * | 1989-11-10 | 1991-07-01 | Sumitomo Electric Ind Ltd | Production of optical fiber coated with carbon |
| JPH0497925A (en) * | 1990-08-15 | 1992-03-30 | Fujikura Ltd | Production of optical fiber |
| EP0524090A2 (en) * | 1991-07-15 | 1993-01-20 | Mitsubishi Cable Industries, Ltd. | Method for producing silica glass optical fiber and reaction apparatus for carbon coating |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0283240A (en) * | 1987-09-18 | 1990-03-23 | American Teleph & Telegr Co <Att> | Airtight sealed treated optical fiber |
| JPH02167843A (en) * | 1988-12-21 | 1990-06-28 | Sumitomo Electric Ind Ltd | Production of element wire of optical fiber |
| JPH02263741A (en) * | 1988-12-27 | 1990-10-26 | Sumitomo Electric Ind Ltd | Production of carbon-coated optical fiber |
-
1989
- 1989-05-15 JP JP1121273A patent/JPH02302343A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0283240A (en) * | 1987-09-18 | 1990-03-23 | American Teleph & Telegr Co <Att> | Airtight sealed treated optical fiber |
| JPH02167843A (en) * | 1988-12-21 | 1990-06-28 | Sumitomo Electric Ind Ltd | Production of element wire of optical fiber |
| JPH02263741A (en) * | 1988-12-27 | 1990-10-26 | Sumitomo Electric Ind Ltd | Production of carbon-coated optical fiber |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03153549A (en) * | 1989-11-10 | 1991-07-01 | Sumitomo Electric Ind Ltd | Production of optical fiber coated with carbon |
| JPH0497925A (en) * | 1990-08-15 | 1992-03-30 | Fujikura Ltd | Production of optical fiber |
| US5354348A (en) * | 1991-05-12 | 1994-10-11 | Mitsubishi Cable Industries, Ltd. | Method for producing silica glass optical fiber with carbon coating |
| EP0524090A2 (en) * | 1991-07-15 | 1993-01-20 | Mitsubishi Cable Industries, Ltd. | Method for producing silica glass optical fiber and reaction apparatus for carbon coating |
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