JPH02300607A - Slit inspection instrument - Google Patents
Slit inspection instrumentInfo
- Publication number
- JPH02300607A JPH02300607A JP12213289A JP12213289A JPH02300607A JP H02300607 A JPH02300607 A JP H02300607A JP 12213289 A JP12213289 A JP 12213289A JP 12213289 A JP12213289 A JP 12213289A JP H02300607 A JPH02300607 A JP H02300607A
- Authority
- JP
- Japan
- Prior art keywords
- slit
- light
- measured
- light source
- photodetector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 title claims description 11
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 102100027340 Slit homolog 2 protein Human genes 0.000 abstract description 8
- 101710133576 Slit homolog 2 protein Proteins 0.000 abstract description 8
- 230000002950 deficient Effects 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 2
- 229920002554 vinyl polymer Polymers 0.000 abstract description 2
- 230000002159 abnormal effect Effects 0.000 abstract 1
- 230000004907 flux Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、ガラス、ビニール等の透明体」−にAI、C
r、Au等を付着し、その一部を除去することによって
スリットを形成する工程において、そのスリットを自動
検査する装置に関するものである。[Detailed Description of the Invention] Industrial Application Field The present invention is directed to the use of AI, C and other transparent materials such as glass and vinyl.
The present invention relates to an apparatus for automatically inspecting a slit in a process of forming a slit by depositing R, Au, etc. and removing a portion thereof.
従来の技術
第4図に従来のスリット検査装置を示す。51はほぼ平
行な光を出射する光源であり、半導体レーザやLED、
ハロゲンランプ等が用いられる。Prior Art FIG. 4 shows a conventional slit inspection device. 51 is a light source that emits almost parallel light, and is a semiconductor laser, LED,
A halogen lamp or the like is used.
52は被測定スリットで、53が凸レンズ、54が2分
割光検出器、55が演算回路である。光源51を出射し
た光は被測定スリット52の開口部を透過し、凸レンズ
53で集光する。2分割光検出器54は、凸レンズ53
によって被測定・スリット52がほぼ結像する位置に設
置する。凸レンズ53の焦点距離と被測定スリット52
.2分割光検出器54の距離を選ぶことにより光学系の
倍率は任意に設定できる。倍率は被測定スリット52の
幅と2分割光検出器54の分割像に直角方向の大きさで
決定する。このような構成において、2分割光検出器5
4の出力をA、Bとするとき、スリット幅は(A−1−
B)、スリット位置ずれは(A−B)で測定する。これ
は、スリット透過光量が幅に比例し、その位置ずれは2
分割光検出器54の2素子の光量バランスに比例するこ
七を用いている。52 is a slit to be measured, 53 is a convex lens, 54 is a two-split photodetector, and 55 is an arithmetic circuit. The light emitted from the light source 51 passes through the opening of the slit to be measured 52 and is focused by the convex lens 53. The two-split photodetector 54 includes a convex lens 53
It is installed at a position where the slit 52 to be measured is substantially imaged. Focal length of convex lens 53 and measured slit 52
.. By selecting the distance of the two-split photodetector 54, the magnification of the optical system can be set arbitrarily. The magnification is determined by the width of the slit 52 to be measured and the size in the direction perpendicular to the divided image of the two-split photodetector 54. In such a configuration, the two-split photodetector 5
When the outputs of 4 are A and B, the slit width is (A-1-
B), slit position deviation is measured in (A-B). This means that the amount of light transmitted through the slit is proportional to the width, and the positional deviation is 2
This is proportional to the light intensity balance of the two elements of the split photodetector 54.
発明が解決しようとする課題
しかしながら、上記のような構成では、光源5]の光量
が変動した場合、スリット幅測定値(A+B) 、スリ
ット位置出力(A−B)共に変動し測定誤差が生じると
いう問題点を有していた。Problems to be Solved by the Invention However, with the above configuration, if the light intensity of the light source 5 changes, both the slit width measurement value (A+B) and the slit position output (A-B) will change, resulting in measurement errors. It had some problems.
そのため光源51の光量をビームスプリッタ−と光検出
器を挿入して検出し、光量で規格化する必要があった。Therefore, it was necessary to detect the amount of light from the light source 51 by inserting a beam splitter and a photodetector, and to standardize it by the amount of light.
この場合でも光源がコストアップになると同時に2分割
光検出器と光量検出器が離れているため温度差による特
性の補正が必要であるという問題点を有している。Even in this case, there are problems in that the cost of the light source increases and at the same time, since the two-split photodetector and the light amount detector are separated, it is necessary to correct the characteristics due to the temperature difference.
課題を解決するだめの手段
上記課題を解決するために、第1の発明のスリット検査
装置は、ほぼ平行光を出射する光源と、被測定スリット
を透過した光を集束する凸レンズと、被測定スリットが
ほぼ結像する位置に設けた3分割光検出器と、演算回路
とを有し、3分割光検出器の光出力をA、B、Cとする
とき(A+C)/Bてスリット幅を検出するものである
。Means for Solving the Problems In order to solve the above problems, the slit inspection apparatus of the first invention includes a light source that emits substantially parallel light, a convex lens that focuses the light transmitted through the slit to be measured, and a slit to be measured. The slit width is detected by (A+C)/B when the optical outputs of the 3-split photodetector are A, B, and C. It is something to do.
また第2の発明のスリット検査装置は、ほぼ平行光を出
射する光源と、被測定スリットを透過した光を集束する
凸レンズと、被測定スリットがほぼ結像する位置に設け
た3分割光検出器と、演算回路とを有し、3分割光検出
器の光出力をA。Further, the slit inspection device of the second invention includes a light source that emits substantially parallel light, a convex lens that focuses the light transmitted through the slit to be measured, and a three-part photodetector provided at a position where the slit to be measured is substantially imaged. and an arithmetic circuit, and the optical output of the 3-split photodetector is A.
B、Cとするとき、(A−C)/Bてスリット位置を検
出するものである。When B and C, the slit position is detected by (A-C)/B.
作 用
上記の構成により、第1の発明はスリット幅が変化する
と透過光量が変化し(A+C)が変化する。Effect With the above configuration, in the first invention, when the slit width changes, the amount of transmitted light changes and (A+C) changes.
スリット像がBの幅より広い場合はBは一定である。光
源の光量が変化した場合(A+C)もBも同じ比率で変
化するので(A+C)/Bは一定である。このようにし
て、光源の光量変動にかかわりなくスリット幅が測定で
きる。When the slit image is wider than the width of B, B is constant. When the amount of light from the light source changes, both (A+C) and B change at the same ratio, so (A+C)/B is constant. In this way, the slit width can be measured regardless of variations in the amount of light from the light source.
第2の発明はスリット位置を測定するもので、スリット
位置が変化すると、3分割光検出器」二の−〇
−
スリット像も移動する。この移動量は(A−C)に比例
する。スリット像がBからはずれない場合はBも一定で
ある。光源の光量が変化した場合、(A−C)もBも同
し比率で変化するので(Δ−C)/Bは一定である。こ
のようにして、光源の光量変動にかかわりなくスリット
位置が測定できる。The second invention measures the slit position, and when the slit position changes, the 3-split photodetector "2-0
− The slit image also moves. This amount of movement is proportional to (A-C). If the slit image does not deviate from B, B is also constant. When the amount of light from the light source changes, (A-C) and B change at the same rate, so (Δ-C)/B is constant. In this way, the slit position can be measured regardless of variations in the amount of light from the light source.
実施例
以下、第1の発明の実施例を第1図にもとづいて説明す
゛る。1は、ほぼ平行な光束を出射する光源であり、単
色光でも白色光でもよい。レーザ光でもさしつかえない
。2は被測定スリットて、カラス、ビニール等の透明体
上にA1.Cr等の金属を付着した後、その一部を除去
して作成する。EXAMPLE Hereinafter, an example of the first invention will be explained based on FIG. Reference numeral 1 denotes a light source that emits a substantially parallel light beam, which may be monochromatic light or white light. Laser light is also acceptable. 2 is the slit to be measured, and A1. After attaching a metal such as Cr, a part of the metal is removed.
3は凸レンズであり、4は3分割光検出器である。3 is a convex lens, and 4 is a 3-split photodetector.
凸レンズ3の焦点距離はたとえば15mmのものを使用
し、被測定スリット2と3分割光検出器4−の間隔を6
0m、m、凸レンズ3をそれらから等距離の位置に設置
ずれば等倍の光学系となる。このときは、被測定スリッ
ト2と等倍の像が3分割光検出器4上にできる。スリッ
ト幅を100μmとすると、3分割光検出器4の中央部
の幅は20μm程度が望ましい。5は第1の演算回路で
あり、3分割光検出器4の3素子からの出力を第2図に
示すようにA、B、Cとするとき、(A + C)/B
を出力する。Bで割り算するのは光源の光量変化を規格
化するためである。これは、オペアンプとアナログ割り
算器により構成してもよいし、A/D変換器てディジタ
ル信号に変換後マイクロプロセッサで演算してもよい。The focal length of the convex lens 3 is, for example, 15 mm, and the distance between the slit 2 to be measured and the 3-split photodetector 4- is 6 mm.
0m, m, and if the convex lens 3 is installed at a position equidistant from them, an optical system of equal magnification will be obtained. At this time, an image of the same size as the slit 2 to be measured is formed on the three-split photodetector 4. If the slit width is 100 μm, the width of the central portion of the three-split photodetector 4 is preferably about 20 μm. 5 is the first arithmetic circuit, and when the outputs from the three elements of the 3-split photodetector 4 are A, B, and C as shown in FIG. 2, (A + C)/B.
Output. The reason for dividing by B is to normalize the change in the light amount of the light source. This may be constituted by an operational amplifier and an analog divider, or may be converted into a digital signal by an A/D converter and then calculated by a microprocessor.
スリット像6は3分割光検出器4の中央部Bを完全にお
おっている必要がある。そのため、中央部Bの幅を20
μmとすると20μm以下のスリット幅は測定できない
。The slit image 6 must completely cover the central portion B of the three-part photodetector 4. Therefore, the width of the center part B is set to 20
If it is μm, a slit width of 20 μm or less cannot be measured.
このような構成では、被測定スリット2を紙面、に直角
、方向に連続的に送り、第1の演算回路5の出力(A+
C)/Bが上限と下限のしきい値をはずれた時は、スリ
ット幅に異常が生じているので不良品としてチェックす
る。被測定スリット2が紙面に対して左右に振れても、
Bの部分をおおっている範囲では正しくスリット幅が測
定できるごとは明らかである。In such a configuration, the slit 2 to be measured is continuously fed in a direction perpendicular to the plane of the paper, and the output (A+
C) When /B is outside the upper and lower thresholds, an abnormality has occurred in the slit width, so the product is checked as a defective product. Even if the slit 2 to be measured swings from side to side with respect to the paper surface,
It is clear that the slit width can be measured correctly in the range covering part B.
次に第2の発明の実施例を第3図にもとづいて説明する
。1は、ほぼ平行光を出射する光源、2は被測定スリッ
ト、3は凸lノンズ、4は3分割光検出器、7は第2の
演算回路て、(A−C)/Bを出力する。Bて割り算す
るのは光源の光量変化を規格化するためである。光学系
の定数例、第2の演算回路の構成例は、第1の発明の実
施例と同等なのでここては述べない。Next, an embodiment of the second invention will be described based on FIG. 1 is a light source that emits almost parallel light, 2 is a slit to be measured, 3 is a convex l-lens, 4 is a 3-split photodetector, and 7 is a second arithmetic circuit that outputs (A-C)/B. . The purpose of dividing by B is to normalize the change in the light amount of the light source. Examples of the constants of the optical system and an example of the configuration of the second arithmetic circuit are the same as those in the embodiment of the first invention, so they will not be described here.
このような構成で、被測定スリット2を紙面に直角方向
に端面基準で蛇行しないように送る。第2の演算回路7
の出力(A−C)/Bが」1限と下限のしきい値をはず
れた時は、スリブI・位置に異常が生しているので不良
品としてチェックする。With this configuration, the slit 2 to be measured is fed in a direction perpendicular to the plane of the paper without meandering with reference to the end face. Second arithmetic circuit 7
When the output (A-C)/B is outside the 1 and lower thresholds, an abnormality has occurred in the position of the sleeve I, so it is checked as a defective product.
被測定スリブ+−2の幅が変動してもスリット像がBの
部分をおおっている範囲では正しくスリット位置が測定
できることは明らかである。It is clear that even if the width of the measured sleeve +-2 varies, the slit position can be accurately measured within the range where the slit image covers the portion B.
また、第1の発明と第2の発明を組み合わせば、スリッ
ト幅とスリット位置が同時に検査てきる。Furthermore, by combining the first invention and the second invention, the slit width and slit position can be inspected at the same time.
発明の効果
以上述べたように、第1の発明のスリット検査装置は、
3分割光検出器の中央部の光量で規格化するため、光源
光量が変動した場合も正確にスリット幅を測定できる。Effects of the Invention As mentioned above, the slit inspection device of the first invention has the following effects:
Since the light intensity at the center of the 3-split photodetector is normalized, the slit width can be measured accurately even if the light source light intensity fluctuates.
また第2の発明のスリット検査装置は、3分割光検出器
の中央部の光量で規格化するため、光源光量が変動した
場合も正確にスリット位置を測定できる。Furthermore, since the slit inspection device of the second aspect of the invention normalizes the amount of light at the center of the three-split photodetector, it is possible to accurately measure the slit position even when the amount of light from the light source varies.
しかも、どちらも1個の光検出器で光量変動の検出を行
うので2個の光検出器を使用する場合のように温度差等
による特性の変動による測定誤差が生じない。Moreover, since both of them use one photodetector to detect variations in light intensity, measurement errors due to variations in characteristics due to temperature differences and the like do not occur, unlike when two photodetectors are used.
第1図は第1の発明の実施例におけるスリット検査装置
の構成図、第2図はその説明図、第3図は第2の発明の
実施例におけるスリット検査装置の構成図、第4図は従
来のスリット検査装置の構成図である。
1・・・・・・光源、2・・・・・・被測定スリット、
3・・・・・・凸レンズ、4・・・・・・3分割光検出
器、5・・・・・・第1の演代理人の氏名 弁理士 粟
野重孝 はが1名3−6bンス゛
、−yz、+tす**z!、
第2図FIG. 1 is a configuration diagram of a slit inspection device in an embodiment of the first invention, FIG. 2 is an explanatory diagram thereof, FIG. 3 is a configuration diagram of a slit inspection device in an embodiment of the second invention, and FIG. FIG. 1 is a configuration diagram of a conventional slit inspection device. 1... light source, 2... slit to be measured,
3... Convex lens, 4... 3-split photodetector, 5... Name of first acting agent: Patent attorney Shigetaka Awano, 1 person 3-6b screen, -yz, +tsu**z! , Figure 2
Claims (2)
透過した光を集束する凸レンズと、被測定スリットがほ
ぼ結像する位置に設けた3分割光検出器と、この3分割
光検出器の光出力A、B、Cを入力とし(A+C)/B
でスリット幅を検出する演算回路とを備えたスリット検
査装置。(1) A light source that emits nearly parallel light, a convex lens that focuses the light that has passed through the slit to be measured, a 3-split photodetector installed at a position where the slit to be measured almost forms an image, and this 3-split photodetector With the optical outputs A, B, and C as input, (A+C)/B
A slit inspection device equipped with an arithmetic circuit that detects the slit width.
透過した光を集束する凸レンズと、被測定スリットがほ
ぼ結像する位置に設けた3分割光検出器と、この3分割
光検出器の光出力A、B、Cを入力とし(A−C)/B
でスリット位置を検出する演算回路とを備えたスリット
検査装置。(2) A light source that emits nearly parallel light, a convex lens that focuses the light that has passed through the slit to be measured, a 3-split photodetector installed at a position where the slit to be measured almost forms an image, and this 3-split photodetector With optical outputs A, B, and C as input, (A-C)/B
A slit inspection device equipped with an arithmetic circuit that detects the slit position.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12213289A JPH02300607A (en) | 1989-05-16 | 1989-05-16 | Slit inspection instrument |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12213289A JPH02300607A (en) | 1989-05-16 | 1989-05-16 | Slit inspection instrument |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02300607A true JPH02300607A (en) | 1990-12-12 |
Family
ID=14828411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12213289A Pending JPH02300607A (en) | 1989-05-16 | 1989-05-16 | Slit inspection instrument |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02300607A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102998096A (en) * | 2012-12-17 | 2013-03-27 | 吉林大学 | Method for measuring focal distance of convex lens |
-
1989
- 1989-05-16 JP JP12213289A patent/JPH02300607A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102998096A (en) * | 2012-12-17 | 2013-03-27 | 吉林大学 | Method for measuring focal distance of convex lens |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0314124B2 (en) | ||
KR890005522A (en) | Space filter type speed measuring device | |
JPS61139747A (en) | Particle analyser | |
JPS603537A (en) | Tension tester | |
JPS63145926A (en) | Color sensor | |
US5315373A (en) | Method of measuring a minute displacement | |
JPS63169521A (en) | Displacement gauge | |
JPH02300607A (en) | Slit inspection instrument | |
JPS63163150A (en) | Printed circuit board inspecting device | |
JPS58113839A (en) | Detector for dew point | |
JPH01254841A (en) | Signal processing method for gas sensor | |
JPH02114146A (en) | Method and device for measuring crack length and strain in structure part and test piece | |
JPH01284742A (en) | Surface defect detecting device | |
KR200211258Y1 (en) | Semiconductor Wafer Deposition Thickness Measuring Equipment | |
JPS6459037A (en) | In-liquid particle measuring instrument | |
JPS6288942A (en) | Liquid concentration detector | |
RU2073200C1 (en) | Optico-electronic measuring device | |
JPS6166139A (en) | Filter-film examining device | |
JPS6316249A (en) | Plasma emission analyzing instrument | |
JPH02167413A (en) | Interval measuring instrument | |
JPH0599620A (en) | Edge detection device | |
SE514088C2 (en) | Method for calibrating equipment for detecting contaminants in transparent material | |
JPH04315020A (en) | Light-absorption photometer | |
JPH0293316A (en) | Optical displacement measuring apparatus | |
JPS6348439A (en) | Angle measuring instrument |