JPH02297492A - Plate surface protection agent for lithography printing plate - Google Patents
Plate surface protection agent for lithography printing plateInfo
- Publication number
- JPH02297492A JPH02297492A JP11938789A JP11938789A JPH02297492A JP H02297492 A JPH02297492 A JP H02297492A JP 11938789 A JP11938789 A JP 11938789A JP 11938789 A JP11938789 A JP 11938789A JP H02297492 A JPH02297492 A JP H02297492A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- plate surface
- acid
- water
- surface protection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001459 lithography Methods 0.000 title abstract 4
- 239000011814 protection agent Substances 0.000 title abstract 4
- -1 acetylene alcohol Chemical compound 0.000 claims abstract description 33
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 26
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000003223 protective agent Substances 0.000 claims description 20
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract description 7
- 229920000084 Gum arabic Polymers 0.000 abstract description 6
- 239000000205 acacia gum Substances 0.000 abstract description 6
- 235000010489 acacia gum Nutrition 0.000 abstract description 6
- 241000978776 Senegalia senegal Species 0.000 abstract description 5
- 239000001913 cellulose Substances 0.000 abstract description 4
- 229920002678 cellulose Polymers 0.000 abstract description 4
- 230000006866 deterioration Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 3
- 239000003925 fat Substances 0.000 abstract 3
- 229940117927 ethylene oxide Drugs 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 17
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 14
- 229920001577 copolymer Polymers 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 239000004375 Dextrin Substances 0.000 description 10
- 229920001353 Dextrin Polymers 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 235000019425 dextrin Nutrition 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 150000008049 diazo compounds Chemical class 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 239000003945 anionic surfactant Substances 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 206010012442 Dermatitis contact Diseases 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 238000000866 electrolytic etching Methods 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 239000002518 antifoaming agent Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000006071 cream Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 239000011707 mineral Substances 0.000 description 3
- 235000010755 mineral Nutrition 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000010186 staining Methods 0.000 description 3
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- VZQBDGHUOBRFAA-UHFFFAOYSA-N 2-(2,6-dihydroxyphenyl)benzaldehyde Chemical compound C1(O)=C(C(O)=CC=C1)C1=CC=CC=C1C=O VZQBDGHUOBRFAA-UHFFFAOYSA-N 0.000 description 2
- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 2
- LAIUFBWHERIJIH-UHFFFAOYSA-N 3-Methylheptane Chemical compound CCCCC(C)CC LAIUFBWHERIJIH-UHFFFAOYSA-N 0.000 description 2
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 2
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 239000001768 carboxy methyl cellulose Substances 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920003145 methacrylic acid copolymer Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 239000010680 novolac-type phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000008054 sulfonate salts Chemical class 0.000 description 2
- 229960004418 trolamine Drugs 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical class COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- BMRVLXHIZWDOOK-UHFFFAOYSA-N 2-butylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCC)=CC=C21 BMRVLXHIZWDOOK-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
- GJMPSRSMBJLKKB-UHFFFAOYSA-N 3-methylphenylacetic acid Chemical compound CC1=CC=CC(CC(O)=O)=C1 GJMPSRSMBJLKKB-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- 244000171897 Acacia nilotica subsp nilotica Species 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000858 Cyclodextrin Polymers 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 239000004288 Sodium dehydroacetate Substances 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- ACIAHEMYLLBZOI-ZZXKWVIFSA-N Unsaturated alcohol Chemical compound CC\C(CO)=C/C ACIAHEMYLLBZOI-ZZXKWVIFSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 229940000635 beta-alanine Drugs 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- UDHMTPILEWBIQI-UHFFFAOYSA-N butyl naphthalene-1-sulfonate;sodium Chemical compound [Na].C1=CC=C2C(S(=O)(=O)OCCCC)=CC=CC2=C1 UDHMTPILEWBIQI-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 229920003064 carboxyethyl cellulose Polymers 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000001896 cresols Chemical group 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 229940116349 dibasic ammonium phosphate Drugs 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- JMGZBMRVDHKMKB-UHFFFAOYSA-L disodium;2-sulfobutanedioate Chemical compound [Na+].[Na+].OS(=O)(=O)C(C([O-])=O)CC([O-])=O JMGZBMRVDHKMKB-UHFFFAOYSA-L 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 206010016256 fatigue Diseases 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 239000001341 hydroxy propyl starch Substances 0.000 description 1
- 235000013828 hydroxypropyl starch Nutrition 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229940040102 levulinic acid Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000019259 sodium dehydroacetate Nutrition 0.000 description 1
- 229940079839 sodium dehydroacetate Drugs 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- DSOWAKKSGYUMTF-GZOLSCHFSA-M sodium;(1e)-1-(6-methyl-2,4-dioxopyran-3-ylidene)ethanolate Chemical compound [Na+].C\C([O-])=C1/C(=O)OC(C)=CC1=O DSOWAKKSGYUMTF-GZOLSCHFSA-M 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 239000001593 sorbitan monooleate Substances 0.000 description 1
- 235000011069 sorbitan monooleate Nutrition 0.000 description 1
- 229940035049 sorbitan monooleate Drugs 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229940117957 triethanolamine hydrochloride Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は平版印刷版用版面保護剤に関し、特に、乳化型
及び可溶化型の版面保護剤に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a plate surface protective agent for lithographic printing plates, and particularly to emulsifying type and solubilizing type plate protective agents.
〔従来の技術及びその解決すべき課題〕平版印刷版を製
版する際、その最終工程で非画像部を保護するために版
面保護剤（いわゆる、ガム液）を塗布する「ガム引き」
といわれる工程が行なわれる。ガム引きは、平版印刷版
の非画像部の親水性を高めるため、製版後印刷するまで
の期間又は印刷を中断してから再び開始するまでの間に
平版印刷版が劣化する。のを防止するため、印刷機に取
りつける場合などのように平版印刷版を取り扱う時に指
の油、インキなどが付着して非画像がインキ受容性とな
り、汚れるのを防止するため、更に、平版印刷版を取り
扱う時に非画像部及び画像部に傷が発生することを防止
するため、などの種々の目的をもって行われる。[Prior art and problems to be solved] When making a lithographic printing plate, "gumming" is a process in which a plate surface protective agent (so-called gum solution) is applied to protect the non-image areas in the final process.
A process called. Gumming increases the hydrophilicity of the non-image areas of the lithographic printing plate, so that the lithographic printing plate deteriorates during the period after plate making until printing or after printing is interrupted and before it is restarted. In order to prevent this, when handling the lithographic printing plate, such as when installing it on a printing press, oil from fingers, ink, etc. may get on the plate, making the non-image receptive to ink and staining it. This is done for various purposes, such as to prevent scratches from occurring in non-image areas and image areas when handling the plate.
従来より、平版印刷版のガム組成物は一般的にアラビア
ガム、セルロースガム又は分子中にカルホキシル基を有
する水溶性高分子物質の水溶液から成り、必要に応じて
溶剤、界面活性剤、ｐＨ調整剤、防腐剤などを含む。Conventionally, gum compositions for lithographic printing plates generally consist of gum arabic, cellulose gum, or an aqueous solution of a water-soluble polymeric substance having a carboxyl group in the molecule, and optionally include a solvent, a surfactant, and a pH adjuster. , preservatives, etc.
しかしながら、このような従来より知られている組成物
を使用する場合、自動現像機で現像処理した後、そのま
ま不感脂化処理したり、多量の平版印刷版を処理すると
、それにより疲労劣化した現像液がガム槽に持ち込まれ
、ガム液のｐＨが上り、ガム液が塗布された時にムラが
生じる（面状不良）など問題となっていた。その結果、
ガムが厚塗りされた部分の画像部は印刷時、インキが付
着しにくくなり、所望のインキ濃度の印刷物を得るのに
時間を要した。一方、ガムが薄塗りされた部分の非画像
部は印刷時親水性が低下し、そのため汚れやすいなど問
題となっていた。However, when such conventionally known compositions are used, if they are developed with an automatic processor and then subjected to desensitization treatment, or if a large amount of lithographic printing plates are processed, the developed image may suffer from fatigue and deterioration. When the liquid is brought into the gum tank, the pH of the gum liquid increases, causing problems such as unevenness (poor surface condition) when the gum liquid is applied. the result,
During printing, it was difficult for ink to adhere to the image areas where the gum was thickly applied, and it took time to obtain printed matter with the desired ink density. On the other hand, the hydrophilicity of the non-image area where the gum was thinly applied decreased during printing, which caused problems such as easy staining.
従って、本発明の目的は、非画像部に対する不感脂化作
用が強く、しかも画像部の感脂性を低下させることの少
ない平版印刷版用版面保護剤を提供することである。Therefore, an object of the present invention is to provide a plate surface protective agent for lithographic printing plates that has a strong desensitizing effect on non-image areas and does not reduce the oil sensitivity of image areas.
また、本発明の別の目的は、高処理能力を有す平版印刷
版用版面保護剤を提供することである。Another object of the present invention is to provide a surface protective agent for lithographic printing plates that has high throughput.
本発明者らは上記目的を達成すべく種々検討を重ねた結
果、皮膜形成性を有する水溶性樹脂と、アセチレンアル
コール、アセチレングリコール又はそのアルキレンオキ
シド付加物を含有する平版印刷版用版面保護剤で平版印
刷版の表面を処理すると、多量の平版印刷版を処理して
も、非画像部が高度に不感脂化されるとともに、画像領
域の着肉不良（印刷時にインキが画像部に付着しない現
象）が少なくなることを見い出し、本発明を完成するに
至ったものである。As a result of various studies to achieve the above object, the present inventors have developed a plate surface protective agent for lithographic printing plates containing a water-soluble resin having film-forming properties and acetylene alcohol, acetylene glycol, or an alkylene oxide adduct thereof. When the surface of a lithographic printing plate is processed, even if a large amount of lithographic printing plates are processed, the non-image area becomes highly desensitized and the image area becomes poorly inked (a phenomenon in which ink does not adhere to the image area during printing). ), and have completed the present invention.
以下、本発明について詳述する。The present invention will be explained in detail below.
本発明に使用されるアセチレンアルコールは、分子内に
アセチレン結合を有す不飽和アルコールを意味し、例え
ば、以下の化合物：
１） ＣＨ＝ＣＣＨ２０１１
２） Ｃｌ１＝ＣＣＨ２ＣＨ２０Ｈ
Ｃ１１３Ｃ）＋３
３） ＣＨ＝Ｃ−Ｃ−ＣＨ２ＣＨＣＨ３Ｈ
ＣＨ３
４） Ｃ）Ｉ＝Ｃ−Ｃ−ＣＨ。Acetylene alcohol used in the present invention means an unsaturated alcohol having an acetylene bond in the molecule, and includes, for example, the following compounds: 1) CH=CCH2011 2) Cl1=CCH2CH20H C113C)+3 3) CH=C- C-CH2CHCH3H CH3 4) C) I=C-C-CH.
叶 Ｃ１ｌ。leaf C1l.
■ ５） Ｃ）Ｉ＝Ｃ−Ｃ−Ｃ）１２ｃＨ。■ 5) C)I=C-C-C)12cH.
叶
等が挙げられる。また、アセチレングリコールは分子内
にアセチレン結合を有す不飽和グリコールであり、例え
ば、以下の化合物：
６） １１０ＣＨ２Ｃ＝ＣＣ１（，０１（）Ｈ・
冒・
ＣＨ３
ＦＨ・ １
８） ＣＨ３−Ｃ−ＣミＣ−Ｃ−ＣＬ叶 叶
等が挙げられる。Examples include leaves. In addition, acetylene glycol is an unsaturated glycol having an acetylene bond in the molecule, for example, the following compound: 6) 110CH2C=CC1(,01()H・
Examples include CH3-C-CmiC-C-CL Kano Kano.
また、これらのアセチレンアルコール及び／又はアセチ
レングリコールのアルキレンオキシド付加物も同様に使
用できる。アルキレンオキシドとしては、エチレンオキ
シド、プロピレンオキシドが好ましく、特にエチレンオ
キシドが好ましい。Furthermore, alkylene oxide adducts of these acetylene alcohols and/or acetylene glycols can also be used. As the alkylene oxide, ethylene oxide and propylene oxide are preferred, and ethylene oxide is particularly preferred.
アルキレンオキシドの付加モル数は３０以下が好ましい
。好ましい具体例として前記７）や９）のエチレンオキ
シド付加物（付加モル数３０）を挙げることができる。The number of moles of alkylene oxide added is preferably 30 or less. Preferred specific examples include the ethylene oxide adducts (added mole number: 30) of 7) and 9) above.
本発明に使用されるアセチレンアルコール、アセチレン
グリコール又はそのアルキレンオキシド付加物の量は、
全平版印刷版用版面保護剤に対して０．０１〜ｌＯ重量
％が適当であり、好ましい範囲は０．０５〜３重量％で
ある。The amount of acetylene alcohol, acetylene glycol or alkylene oxide adduct thereof used in the present invention is:
A suitable amount is 0.01 to 10% by weight, and a preferable range is 0.05 to 3% by weight based on the total plate surface protectant for lithographic printing plates.
本発明に使用される皮膜形成性を有する水溶性樹脂の好
ましい具体例としては、例えばアラビアガム、繊維素誘
導体（例えば、カルボキシメチルセルローズ、カルボキ
シエチルセルローズ、メチルセルローズ等）及びその変
性体、ポリビニルアルコール及びその誘導体、ポリビニ
ルピロリドン、ポリアクリルアミド及びその共重合体、
アクリル酸共重合体、ビニルメチルエーテル／無水マレ
イン酸共重合体、酢酸ビニル／無水マレイン酸共重合体
、スチレン／無水マレイン酸共重合体、焙焼デキス）
ＩＪン、酸素分解デキストリン、酵素分解エーテル化デ
キストリン等が挙げられる。Preferred specific examples of the water-soluble resin with film-forming properties used in the present invention include gum arabic, cellulose derivatives (e.g., carboxymethyl cellulose, carboxyethyl cellulose, methyl cellulose, etc.) and modified products thereof, polyvinyl alcohol and derivatives thereof, polyvinylpyrrolidone, polyacrylamide and copolymers thereof,
(acrylic acid copolymer, vinyl methyl ether/maleic anhydride copolymer, vinyl acetate/maleic anhydride copolymer, styrene/maleic anhydride copolymer, roasted dextrin)
IJ, oxygen-decomposed dextrin, enzymatically decomposed etherified dextrin, and the like.
本発明の平版印刷版用版面保護剤中の上記水溶性樹脂の
含有量は、３〜２５重量％が適当であり、好ましい範囲
は１０〜２５重量％である。The content of the water-soluble resin in the plate surface protective agent for lithographic printing plates of the present invention is suitably 3 to 25% by weight, and preferably 10 to 25% by weight.
なお、本発明においては上記水溶性樹脂を２種以上混合
使用しても良い。In the present invention, two or more of the above water-soluble resins may be used in combination.
また、本発明の平版印刷版用版面保護剤には種々の界面
活性剤を添加してもよい。使用できる界面活性剤として
はアニオン界面活性剤又はノニオン界面活性剤が挙げら
れる。アニオン界面活性剤としては脂肪族アルコール硫
酸エステル塩類、脂肪族アルコール燐酸エステル塩類、
二塩基性脂肪酸エステルのスルホン酸塩類、脂肪酸アミ
ドスルホン酸塩、アルキルアリールスルホン酸塩類、ホ
ルムアルデヒド縮合ナフタレンスルホン酸塩類ｓが用い
られる。ノニオン界面活性剤としてはポリエチレングリ
コールアルキルエーテル、ポリエチレングリコールアル
キルエステル、ソルビタンアルキルエステル類、ポリオ
キシプロピレンポリオキシエチレンエーテル類等が用い
られる。該界面活性剤は二重以上併用することもできる
。使用量は特に限定する必要はないが好ましい範囲とし
ては平版印刷版用版面保護剤の０．０１〜１０重量％で
ある。Furthermore, various surfactants may be added to the surface protective agent for lithographic printing plates of the present invention. Surfactants that can be used include anionic surfactants and nonionic surfactants. Examples of anionic surfactants include aliphatic alcohol sulfate ester salts, aliphatic alcohol phosphate ester salts,
Sulfonate salts of dibasic fatty acid esters, fatty acid amide sulfonate salts, alkylaryl sulfonate salts, and formaldehyde condensed naphthalene sulfonate salts are used. As the nonionic surfactant, polyethylene glycol alkyl ether, polyethylene glycol alkyl ester, sorbitan alkyl ester, polyoxypropylene polyoxyethylene ether, etc. are used. Two or more surfactants can be used in combination. The amount used is not particularly limited, but the preferred range is 0.01 to 10% by weight of the plate surface protectant for lithographic printing plates.
本発明の平版印刷版用版面保護剤は一般的に酸性領域、
即ち、ｐＨ３〜６の範囲で使用する方が有利である。ｐ
ｈ値を３〜６にするためには一般的には平版印刷版用版
面保護剤中に鉱酸、有機酸又は無機塩等を添加する。そ
の添加量は０．０１〜２重量％が適当である。上記有機
酸としてはクエン酸酢酸、蓚酸、マロン酸、ｐ−）ルエ
ンスルホン酸酒石酸、リンゴ酸、乳酸、レブリン酸、有
機スルホン酸などがあり、鉱酸としては硝酸、硫酸、燐
酸等が有用である。鉱酸、有機酸又は無機塩等の少なく
とも１種もしくは２種以上併用してもよい。The plate surface protective agent for lithographic printing plates of the present invention is generally in an acidic region,
That is, it is more advantageous to use the pH within the range of 3 to 6. p
In order to adjust the h value to 3 to 6, mineral acids, organic acids, inorganic salts, etc. are generally added to the plate surface protectant for lithographic printing plates. The appropriate amount of addition is 0.01 to 2% by weight. Examples of the organic acids mentioned above include citric acid, acetic acid, oxalic acid, malonic acid, p-)luenesulfonic acid, tartaric acid, malic acid, lactic acid, levulinic acid, and organic sulfonic acids, and useful mineral acids include nitric acid, sulfuric acid, and phosphoric acid. be. At least one or two or more of mineral acids, organic acids, inorganic salts, etc. may be used in combination.
上記成分の他必要により湿潤剤としてグリセリン、エチ
レングリコール、トリエチレンクリコール等の低級多価
アルコールも使用することができる。これら湿潤剤の使
用量は保護剤中に０．１〜５．０重量％が適当であり、
好ましい範囲は０．５〜３．０重量％である。以上の他
に本発明の平版印刷版用版面保護剤には、防腐剤などを
添加することができる。例えば安息香酸及びその誘導体
、フェノール、ホルマリン、デヒドロ酢酸ナトリウム等
を０．００５〜２．０重量％の範囲で添加できる。In addition to the above components, lower polyhydric alcohols such as glycerin, ethylene glycol, and triethylene glycol can also be used as wetting agents if necessary. The appropriate amount of these wetting agents used is 0.1 to 5.0% by weight in the protective agent.
The preferred range is 0.5-3.0% by weight. In addition to the above, preservatives and the like may be added to the plate surface protectant for lithographic printing plates of the present invention. For example, benzoic acid and its derivatives, phenol, formalin, sodium dehydroacetate, etc. can be added in an amount of 0.005 to 2.0% by weight.
本発明の版面保護剤には消泡剤を添加することもてきる
。好ましい消泡剤には有機シリコーン化合物が含まれ、
その添加量は０．０００１〜０．１重量％の範囲が好ま
しい。An antifoaming agent may also be added to the plate surface protectant of the present invention. Preferred antifoam agents include organosilicone compounds;
The amount added is preferably in the range of 0.0001 to 0.1% by weight.
本発明の版面保護剤には画像部の感脂性低下を防ぐため
有機溶剤を含有させることができる。好ましい有機溶剤
には水難溶性のものであり、沸点が約り２０℃〜約２５
０℃の石油留分、例えばジブチルフタレート、ジオクチ
ルアジペートなどの凝固点が１５℃以下で沸点が３００
℃以上の可塑剤が挙げられる。このような有機溶剤は０
．０５〜５重量％の範囲で添加される。The plate surface protective agent of the present invention may contain an organic solvent in order to prevent a decrease in the oil sensitivity of the image area. Preferred organic solvents include those that are poorly soluble in water and have a boiling point of about 20°C to about 25°C.
Petroleum fractions at 0°C, such as dibutyl phthalate and dioctyl adipate, have a freezing point of 15°C or less and a boiling point of 300°C.
Examples include plasticizers with a temperature of ℃ or higher. Such organic solvents are 0
．． It is added in an amount of 0.05 to 5% by weight.
本発明の版面保護剤は均一溶液型、サスペンション型、
エマルジョン型のいずれの形態をもとることができるが
、特に上記のような有機溶剤を含むエマルジョン型にお
いて、すぐれた性能を発揮する。この場合、特開昭５５
−１０５５８１号公報に記載されているように界面活性
剤を組合せて含有させることが好ましい。The plate surface protectant of the present invention can be of homogeneous solution type, suspension type,
Although it can take any form of emulsion type, particularly the emulsion type containing an organic solvent as described above exhibits excellent performance. In this case, JP-A-55
It is preferable to contain a combination of surfactants as described in Japanese Patent No.-105581.
本発明の平版印刷版用版面保護剤は、種々の平版印刷版
に対して使用することができるが、特にアルミニウム板
を支持体とし、その上に感光層を有する感光性平版印刷
版（予め感光性を付与した印刷版で、ＰＳ版と呼ばれる
。）を画像露光及び現像して得られた平版印刷版に対し
て好適に使用できる。The plate surface protective agent for lithographic printing plates of the present invention can be used for various lithographic printing plates, but in particular, it can be used for photosensitive lithographic printing plates (previously exposed to light) having an aluminum plate as a support and a photosensitive layer thereon. It can be suitably used for a lithographic printing plate obtained by imagewise exposure and development of a printing plate (called a PS plate) which has been imparted with properties.
本発明に用いられる感光性平版印刷版は親水性表面を有
する支持体の上に感光性組成物を含有する感光層を設け
たものであり、該感光性組成物にはジアゾ化合物を含む
感光性組成物、英国特許第１、２３５．２８１号及び同
第１．４９５’、 ８６１号明細書に記載されるような
アジド化合物を含む感光性組成物、米国特許第３．８６
０．４２６号明細書に記載されているような光架橋性フ
ォトポリマーを含む感光性組成物、米国特許第４．０７
２．５２８号及び同第４．０７２．５２７号各明細書に
記載されているような光重合型フォトポリマーを含む感
光性組成物、特開昭５６−１９０６３号及び同５６−２
９２５０号明細書に記載されているような光導電性組成
物、特開昭５２−６２５０１号及び同５６−１１１’８
５２号各明細書に記載されてい、るようなハロゲン化銀
乳剤組成物などが挙げられる。The photosensitive lithographic printing plate used in the present invention has a photosensitive layer containing a photosensitive composition on a support having a hydrophilic surface, and the photosensitive composition contains a photosensitive layer containing a diazo compound. compositions, photosensitive compositions comprising azide compounds as described in British Patent No. 1,235.281 and British Patent No. 1.495', 861, U.S. Pat. No. 3.86
0.426, a photosensitive composition comprising a photocrosslinkable photopolymer as described in U.S. Patent No. 4.07.
2.528 and 4.072.527; photosensitive compositions containing photopolymerizable photopolymers as described in JP-A-56-19063 and JP-A-56-2;
Photoconductive compositions as described in JP-A-52-62501 and JP-A-56-111'8
Examples include silver halide emulsion compositions described in each specification of No. 52.
これらの感光性組成物の中で、ジアゾ化合物を含む感光
性組成物は、感光層の保存性、現像ラチチュードなどの
現像性能、画質などの画像性能、インキ着肉性、感脂性
、耐摩耗性などの印刷性能、適用する現像液の低公害性
等、総合的にすぐれているため好ましく用いられる。Among these photosensitive compositions, photosensitive compositions containing a diazo compound have excellent storage stability of the photosensitive layer, development performance such as development latitude, image performance such as image quality, ink receptivity, oil sensitivity, and abrasion resistance. It is preferably used because of its overall excellent printing performance, low pollution properties of the developer used, etc.
ジアゾ化合物を含む感光性組成物は、ネガ型とポジ型に
分けられる。Photosensitive compositions containing diazo compounds are classified into negative type and positive type.
ジアゾ化合物を含むネガ型感光性組成物は、感光性ジア
ゾ化合物及び好ましくは高分子化合物を含有するもので
、感光性ジアゾ化合物としては従来知られたものが使用
できるが、好ましいものとしては有機溶媒可溶のジアゾ
樹脂の塩、例えばｐ−ジアゾジフェニルアミンとホルム
アルデヒド又はアセトアルデヒドの縮合物とへキサフル
オロ燐酸塩との塩、２−ヒドロキシ−４−メトキシベン
ゾフェノン−５−スルフォン酸塩との塩などが挙げられ
る。The negative photosensitive composition containing a diazo compound contains a photosensitive diazo compound and preferably a polymer compound. Conventionally known photosensitive diazo compounds can be used, but organic solvents are preferably used. Examples include salts of soluble diazo resins, such as salts of p-diazodiphenylamine, formaldehyde or acetaldehyde condensates, and hexafluorophosphates, and 2-hydroxy-4-methoxybenzophenone-5-sulfonate salts. .
高分子化合物としては、例えばアクリル酸又はメタアク
リル酸共重合体、クロトン酸共重合体、イタコン酸共重
合体、マレイン酸共重合体、側鎖にカルボキシル基を有
するセルロース誘導体、側鎖にカルボキシル基を有する
ポリビニルアルコール誘導体、側鎖にカルボキシル基を
有するヒドロキシアルキルアクリレート又はメタクリレ
ート共重合体、カルボキシル基を有する不飽和ポリエス
テル樹脂などが好ましく用いられる。Examples of polymer compounds include acrylic acid or methacrylic acid copolymers, crotonic acid copolymers, itaconic acid copolymers, maleic acid copolymers, cellulose derivatives having carboxyl groups in their side chains, and carboxyl groups in their side chains. Polyvinyl alcohol derivatives having a carboxyl group in the side chain, hydroxyalkyl acrylate or methacrylate copolymers having a carboxyl group, unsaturated polyester resins having a carboxyl group, etc. are preferably used.
ポジ型感光性組成物に用いられるジアゾ化合物としては
従来知られたものが使用できるが、代表的なものとして
は０−キノンジアジド類が挙げられ、好ましくは０−ナ
フトキノンジアジド化合物が挙げられる。０−ナフトキ
ノンジアジド化合物の内でも、特に種々のヒドロキシ化
合物の。−ナフトキノンジアジドスルホン酸エステル又
は。−ナフトキノンジアジドカルボン酸エステル、及び
芳香族アミノ化合物の０−ナフトキノンジアジドスルホ
ン酸アミド又は０−ナフトキノンジアジドカルボン酸ア
ミドが好適である。好ましいヒドロキシル化合物として
はフェノール類とカルボニル基含有化合物との縮合樹脂
が挙げられる。該フェノール類としてはフェノール、ク
レゾール、レゾルシン及びピロガロール等を挙げられ、
該カルボニル基含有化合物としてはホルムアルデヒド、
ベンズアルデヒド及びアセトン等が挙げられる。好まし
いヒドロキシル化合物としては、フェノール、・ホルム
アルデヒド、クレゾール・ホルムアルデヒド樹脂、ピロ
ガロール・アセトン樹脂、レゾルシン・ベンズアルデヒ
ド樹脂が挙げられる。Conventionally known diazo compounds can be used as the diazo compound used in the positive photosensitive composition, but typical examples include 0-quinonediazides, and preferably 0-naphthoquinonediazide compounds. Among the 0-naphthoquinonediazide compounds, especially the various hydroxy compounds. - naphthoquinone diazide sulfonic acid ester or. -Naphthoquinonediazidecarboxylic acid esters and 0-naphthoquinonediazide sulfonic acid amides or 0-naphthoquinonediazidecarboxylic acid amides of aromatic amino compounds are preferred. Preferred hydroxyl compounds include condensation resins of phenols and carbonyl group-containing compounds. Examples of the phenols include phenol, cresol, resorcinol, pyrogallol, etc.
The carbonyl group-containing compound includes formaldehyde,
Examples include benzaldehyde and acetone. Preferred hydroxyl compounds include phenol, formaldehyde, cresol formaldehyde resin, pyrogallol acetone resin, and resorcinol benzaldehyde resin.
０−キノンジアジド化合物の代表的な具体例としては、
ベンゾキノン−（１，２）−ジアジドスルホン酸又はナ
フトキノン−（１，２）−ジアジドスルホン酸とフェノ
ール・ホルムアルデヒド樹脂又はクレゾール・ホルムア
ルデヒド樹脂とのエステル、特開昭５６−１０４４号公
報に記載されているナフトキノン−（１，２）−ジアジ
ド−（２）−５−スルホン酸とレゾルシン−ベンズアル
デヒド樹脂とのエステル、米国特許第３．６３５．７０
９号明細書に記載されているナフトキノン−（１゜２）
−ジアジドスルホン酸とピロガロール・アセトン樹脂と
のエステル、特開昭５５−７６３４６号公報に記載され
ているナフトキノン−（１，２）−ジアジド−（２）
−５−スルホン酸とレゾルシン−ピロガロール−アセト
ン共重縮合物トのエステルが挙げられる。その他有用な
０−キノンシアシト化合物としては、特開昭５０−１１
７５０３号公報に記載されているに末端ヒドロキシル基
を有するポリエステルに０−ナフトキノンジアジドスル
ホニルクロライドをエステル化反応させたもの、特開昭
５０−１１３３０５号公報に記載されているようなｐ−
ヒドロキシスチレンのホモポリマー又は他の共重合し得
る千ツマ−との共重合体に０−ナフトキノンジアジドス
ルホニルクロライドをエステル化反応させたもの、特開
昭５４−２９９２２号公報に記載されているビスフェノ
ール・ホルムアルデヒド樹脂と０−キノンジアジドスル
ホン酸とのエステル、米国特許第３．８５９．０９９号
明細書に記載されているアルキルアクリレート、アクリ
ロイルオキシアルキルカルボネート及びヒドロキシアル
キルアクリレートの共重合体との０−キノンジアジドス
ルホニルクロライドとの縮合物、特公昭４９−１７４８
１号公報記載のスチレンとフェノール誘導体との共重合
体生成物と０−キノンジアジドスルホン酸との反応生成
物、米国特許第３．７５９．７１１号明細書に記載され
ているようなｐ−アミノスチレンと共に共重合しつるモ
ノマーとの共重合体と０−ナフトキノンジアジドスルホ
ン酸又は、０−ナフトキノンジアジドカルボン酸とのア
ミド、及びそのほかにポリヒドロキシベンゾフェノンと
０−ナフトキノンジアジドスルホニルクロライドとのエ
ステル化合物等が挙げられる。Typical specific examples of 0-quinonediazide compounds include:
Ester of benzoquinone-(1,2)-diazide sulfonic acid or naphthoquinone-(1,2)-diazide sulfonic acid with phenol-formaldehyde resin or cresol-formaldehyde resin, as described in JP-A-56-1044. Esters of naphthoquinone-(1,2)-diazide-(2)-5-sulfonic acid and resorcinol-benzaldehyde resin, U.S. Pat. No. 3.635.70
Naphthoquinone (1°2) described in Specification No. 9
-Ester of diazide sulfonic acid and pyrogallol acetone resin, naphthoquinone-(1,2)-diazide-(2) described in JP-A-55-76346
Examples include esters of -5-sulfonic acid and resorcinol-pyrogallol-acetone copolycondensate. Other useful 0-quinone cyacyto compounds include JP-A-50-11
7503, in which a polyester having a terminal hydroxyl group is esterified with 0-naphthoquinonediazide sulfonyl chloride;
Hydroxystyrene homopolymer or other copolymerizable copolymer with 0-naphthoquinonediazide sulfonyl chloride is subjected to esterification reaction, and bisphenol described in JP-A-54-29922 is used. Esters of formaldehyde resins and 0-quinonediazide sulfonic acid, 0-quinonediazide sulfonyl with copolymers of alkyl acrylates, acryloyloxyalkyl carbonates and hydroxyalkyl acrylates as described in U.S. Pat. No. 3,859,099. Condensate with chloride, Special Publication No. 49-1748
1, the reaction product of a copolymer product of styrene and a phenol derivative with O-quinonediazide sulfonic acid, and p-aminostyrene as described in U.S. Pat. No. 3,759,711. Examples include amides of copolymers with vine monomers copolymerized with 0-naphthoquinonediazide sulfonic acid or 0-naphthoquinonediazidecarboxylic acid, and ester compounds of polyhydroxybenzophenone and 0-naphthoquinonediazide sulfonyl chloride. It will be done.
これらの０−キノンジアジド化合物は単独で使用するこ
とができるが、アルカリ可溶性樹脂と混合し、この混合
物を感光層として設ける方が好ましい。好適なアルカリ
可溶性樹脂には、ノボラック型フェノール樹脂が含まれ
、具体的にはフェノールホルムアルデヒド樹脂、クレゾ
ールホルムアルデヒド樹脂、特開昭５５−５７８４１号
公報に記載されているようなフェノール・クレゾールホ
ルムアルデヒド共重縮合体樹脂などが含まれる。Although these 0-quinonediazide compounds can be used alone, it is preferable to mix them with an alkali-soluble resin and provide this mixture as a photosensitive layer. Suitable alkali-soluble resins include novolac type phenolic resins, specifically phenol formaldehyde resins, cresol formaldehyde resins, and phenol/cresol formaldehyde copolycondensation resins as described in JP-A-55-57841. Includes body resin, etc.
更に、特開昭５０−１２５８０６号公報に記されている
様に、上記のようなフェノール樹脂と共にｔ−ブチルフ
ェノール・ホルムアルデヒド樹脂のような炭素数３〜８
のアルキル基で置換されたフエノール又はクレゾールと
ホルムアルデヒドとの縮合物とを併用すると、一層好ま
しい。Furthermore, as described in JP-A No. 50-125806, in addition to the above-mentioned phenol resins, t-butylphenol formaldehyde resins having 3 to 8 carbon atoms can be used.
It is more preferable to use a condensate of formaldehyde and phenol or cresol substituted with an alkyl group.
更に上記アルカリ可溶性ノボラック型フェノール樹脂以
外のアルカリ可溶性樹脂を必要に応じて配合することが
できる。例えば、スチレン−アクリル酸共重合体、メチ
ルメタクリレート−メタクリル酸共重合体、アルカリ可
溶性ポリウレタン樹脂、特公昭５２−２８４０１号公報
記載のアルカリ可溶性ビニル系樹脂及びアルカリ可溶性
ポリブチラール樹脂等を挙げることができる。Furthermore, alkali-soluble resins other than the above-mentioned alkali-soluble novolac type phenolic resins can be blended as necessary. Examples include styrene-acrylic acid copolymer, methyl methacrylate-methacrylic acid copolymer, alkali-soluble polyurethane resin, alkali-soluble vinyl resin and alkali-soluble polybutyral resin described in Japanese Patent Publication No. 52-28401. .
０−キノンジアジド化合物の含有量は感光性組成物全固
形分に対し、５〜８０重量％が好ましく、特に好ましく
は１０〜５０重量％である。アルカリ可溶性樹脂の含有
量は感光性組成物の全固形分に対し３０〜９０重量％が
好ましく、特に好ましくは５０〜８５重量％である。The content of the 0-quinonediazide compound is preferably 5 to 80% by weight, particularly preferably 10 to 50% by weight, based on the total solid content of the photosensitive composition. The content of the alkali-soluble resin is preferably 30 to 90% by weight, particularly preferably 50 to 85% by weight, based on the total solid content of the photosensitive composition.
感光層は多層に分けて設けることもでき、また、必要に
応じてさらに染料、可塑剤、プリントアウト性能を与え
る成分などの添加剤を加えることもできる。The photosensitive layer can be provided in multiple layers, and additives such as dyes, plasticizers, and components imparting printout performance can also be added as necessary.
支持体上に設けられる上記感光性組成物の塗布量は０．
１〜７ ｇ ／ ｍ’が好ましく、より好ましくは０．
５〜４ ｇ ／ ｍ’である。The coating amount of the photosensitive composition provided on the support is 0.
1-7 g/m' is preferred, more preferably 0.
5-4 g/m'.
必要により、支持体と感光性組成物層の間に特公昭５７
−１６３４９号公報記載の金属塩と親水性セルロース、
特公昭４６−３５６８５号公報記載のポリビニルスルホ
ン酸、特開昭６０−１４９４９１号公報記載のβ−アラ
ニン、又は特開昭６０−２３２９９８号公報記載のトリ
エタノールアミン・塩酸塩などの下塗層を設けてもよい
。If necessary, a Japanese Patent Publication No. 57
Metal salt and hydrophilic cellulose described in -16349 publication,
An undercoat layer such as polyvinyl sulfonic acid described in JP-B-46-35685, β-alanine as described in JP-A-60-149491, or triethanolamine hydrochloride as described in JP-A-60-232998. It may be provided.
本発明に用いられる感光性平版印刷版に使用される支持
体としては、アルミニウム（アルミニウム合金も含む）
、紙、プラスチック（例えば、ポリエチレン、ポリプロ
ピレン、ポリエチレンテレフタレート、二酢酸セルロー
ス、三酢酸セルロース、プロピオン酸セルロース、ポリ
ビニルアセタール、ポリカーボネート、等）及び亜鉛、
銅等の金属の上にアルミニウムがラミネート又は蒸着さ
れた複合支持体が好適に用いられる。The support used in the photosensitive lithographic printing plate used in the present invention includes aluminum (including aluminum alloy).
, paper, plastics (e.g. polyethylene, polypropylene, polyethylene terephthalate, cellulose diacetate, cellulose triacetate, cellulose propionate, polyvinyl acetal, polycarbonate, etc.) and zinc,
A composite support in which aluminum is laminated or vapor-deposited on a metal such as copper is preferably used.
また、アルミニウム材の表面は、保水性を高め感光層と
密着性を向上させる目的で粗面化処理されていることが
望ましい。Further, the surface of the aluminum material is preferably roughened for the purpose of increasing water retention and improving adhesion to the photosensitive layer.
粗面化方法としては、一般に公知のブラシ研磨法、ボー
ル研磨法、電解エツチング、化学的エツチング、液体ホ
ーニング、サンドブラスト等の方法及びこれらの組合せ
が挙げられ、好ましくはブラシ研磨法、電解エツチング
、化学的エツチング、及び液体ホーニングがｉげられ、
これらのうちで特に電解エツチングの使用を含む粗面化
方法が好ましい。また、電解エツチングの際に用いられ
る電解浴としては、酸、アルカリ又はそれらの塩を含む
水溶液あるいは有機溶剤を含む水性溶液が用いられ、こ
れらのうちで特に塩酸、硝酸又はそれらの塩を含む電解
液が好ましい。更に粗面化処理の施されたアルミニウム
板は、必要に応じて酸又はアルカリの水溶液にてデスマ
ット処理される。Examples of the surface roughening method include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical etching, liquid honing, and sandblasting, and combinations thereof, and preferably brush polishing, electrolytic etching, and chemical etching. Target etching and liquid honing are performed,
Among these, surface roughening methods involving the use of electrolytic etching are particularly preferred. In addition, as the electrolytic bath used in electrolytic etching, an aqueous solution containing an acid, an alkali, or a salt thereof or an aqueous solution containing an organic solvent is used. Liquid is preferred. Further, the roughened aluminum plate is desmutted with an acid or alkali aqueous solution, if necessary.
こうして得られたアルミニウム板は陽極酸化処理される
ことが望ましく、特に好ましくは、硫酸又はリン酸を含
む浴で処理する方法が挙げられる。It is desirable that the aluminum plate thus obtained be anodized, and particularly preferred is a method of treatment in a bath containing sulfuric acid or phosphoric acid.
また、必要に応じて封孔処理、その他弗化ジルコニウム
酸カリウム水溶液への浸漬などによる表面処理を行うこ
とができる。Further, if necessary, pore sealing treatment and other surface treatments such as immersion in a potassium fluorozirconate aqueous solution can be performed.
次にＰＳ版を用いた場合に於ける本発明の版面保護剤の
一使用例を記す。Next, an example of the use of the plate surface protective agent of the present invention when a PS plate is used will be described.
先づＰＳ版を画像露光、次いで、現−して平版印刷版を
作成する。First, the PS plate is subjected to image exposure and then developed to create a lithographic printing plate.
上記現像処理工程に際して使用される現像液は水を主溶
媒とするアルカリ性溶液であり、アルカリ剤の他必要に
応じて有機溶剤、アニオン界面活性剤、無機塩等を含む
ものが用いられる。The developer used in the above development process is an alkaline solution containing water as a main solvent, and contains an alkaline agent and, if necessary, an organic solvent, an anionic surfactant, an inorganic salt, and the like.
アルカリ剤としてはケイ酸ナトリウム、ケイ酸カリウム
、水酸化カリウム、水酸化ナトリウム、水酸化リチウム
、第三リン酸ナトリウム、重炭酸ナトリウム、炭酸ナト
リウム、炭酸カリウム、炭酸アンモニウム等の無機アル
カリ剤、又はモノ、ジもしくはトリエタノールアミンあ
るいはプロパツールアミンのような有機アルカリ剤が有
利に使用される。アルカリ剤の現像液中における含有量
は０．０５〜４重量％が好ましく、０．１〜２重量％の
範囲がより好ましい。Examples of alkali agents include inorganic alkali agents such as sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc. Organic alkaline agents such as , di- or triethanolamine or propatoolamine are advantageously used. The content of the alkaline agent in the developer is preferably 0.05 to 4% by weight, more preferably 0.1 to 2% by weight.
有機溶剤としてはｎ−プロピルアルコール、ベンジルア
ルコールの如きアルコール類、及びフェニルセロソルブ
の如きグリコールエーテルが有用である。有機溶剤の現
像液中における含有量としては０．５〜１５重量％が好
ましく、１〜５重量％の範囲がより°好ましい。Useful organic solvents include alcohols such as n-propyl alcohol and benzyl alcohol, and glycol ethers such as phenylcellosolve. The content of the organic solvent in the developer is preferably 0.5 to 15% by weight, more preferably 1 to 5% by weight.
アニオン界面活性剤としては、例えばラウリル硫酸ナト
リウム等のアルキル硫酸エステル塩、例えばドデシルベ
ンゼンスルホン酸等のアルキルアリルスルホン酸塩、例
えばジ（２−エチルヘキシル）スルホコハク酸ナトリウ
ム等の二塩基性脂肪酸エステルのスルホン酸塩、例えば
ｎ−ブチルナフタレンスルホン酸ナトリウム等のアルキ
ルナフタレンスルホン酸塩、ポリオキシエチレンアルキ
ル（フェノール）エーテル硫酸塩等が挙げられるが、こ
れらの中でｎ−ブチルナフタレンスルホン酸等のアルキ
ルナフタレンスルホン酸塩が好適に使用される。アニオ
ン型界面活性剤の現像液中における含有量は０．１〜５
重量％が好適であり、０．５〜１．５重量％の範囲がよ
り好ましい。Examples of anionic surfactants include alkyl sulfate salts such as sodium lauryl sulfate, alkylaryl sulfonates such as dodecylbenzenesulfonic acid, and sulfonates of dibasic fatty acid esters such as sodium di(2-ethylhexyl)sulfosuccinate. Examples of acid salts include alkylnaphthalenesulfonates such as sodium n-butylnaphthalenesulfonate, polyoxyethylene alkyl (phenol) ether sulfates, etc. Among these, alkylnaphthalenesulfones such as n-butylnaphthalenesulfonic acid Acid acids are preferably used. The content of anionic surfactant in the developer is 0.1 to 5.
% by weight is preferred, with a range of 0.5 to 1.5% by weight being more preferred.
無機塩としては、リン酸、ケイ酸、炭酸、亜硫酸等のア
ルカリ又はアルカリ土類金属の水溶性塩が用いられるが
、特にアルカリ又はアルカリ土類亜硫酸塩がｔｔｊ適に
用いられる。無機塩の現像液中における含有塩０１０５
〜５重量％の範囲であり、好ましくは０．１〜１重量％
の範囲である。As the inorganic salt, water-soluble salts of alkali or alkaline earth metals such as phosphoric acid, silicic acid, carbonic acid, sulfite, etc. are used, and alkali or alkaline earth sulfites are particularly suitable. Salt content in inorganic salt developer 0105
-5% by weight, preferably 0.1-1% by weight
is within the range of
現像液中には必要に応じて更に消泡剤、潤滑剤ｉを含有
させておくことも有用である。It is also useful to further contain an antifoaming agent and a lubricant i in the developer, if necessary.
上記のような現像液で画像感光させたＰＳ版を現像する
方法としては従来公知の種々の方法が可能であ纂。具体
的には、画像露光されたＰＳ版を現像液中に浸漬す右方
法、ＰＳ版の感光層に対して多数のノズルから現像液を
噴射する方法、現像液で湿潤さ孔たスポンジでＦＭＳ版
の感光層を拭う方法、ＰＳ版の感光層の表面に現像液を
ローラ塗布する方法などが挙げられる。Various conventionally known methods can be used to develop the PS plate image-exposed with the developer described above. Specifically, the method is as follows: immersing the image-exposed PS plate in a developer, spraying the developer from multiple nozzles onto the photosensitive layer of the PS plate, and using a perforated sponge moistened with the developer to perform FMS. Examples include a method of wiping the photosensitive layer of the plate, and a method of applying a developer to the surface of the photosensitive layer of the PS plate using a roller.
これら上記方法で現像された平版印刷版を水洗し、版面
上の水をスクイズしたのち、本発明の平版印刷版用版面
保護剤を版面上に適量注ぎ、これを版全面に塗布するよ
うにスポンジでこする。これにより、版面上の非画像領
域が保護され、平版印刷版を保管することができる。After washing the lithographic printing plates developed by the above method with water and squeezing the water on the plate surface, pour an appropriate amount of the plate surface protectant for lithographic printing plates of the present invention onto the plate surface, and apply it to the entire surface of the plate using a sponge. Rub it. This protects the non-image area on the printing plate and allows the lithographic printing plate to be stored.
例えば、現像・水洗の後行なわれる自動ガＬ塗布機処理
、自動現像機で現像の後水洗を行うこと無しに直ちに行
なわれるガム塗布、現像の後少量の水洗水で水洗するか
、界面活性剤を含有するリンス液で処理した後行なわれ
る自動ガム塗布機処理の例を挙げることができる。本発
明は、現像後直ちに行なわれるガム塗布に対しては特に
有効である。For example, automatic GAL coating machine processing is carried out after development and washing, gum coating is carried out immediately without washing after development in an automatic processing machine, washing with a small amount of washing water after development, or surfactant coating. An example may be given of an automatic gumming machine treatment carried out after treatment with a rinse solution containing. The present invention is particularly effective for gum coating performed immediately after development.
印刷を開始する場合には一般に版面上のガムを水洗して
落しくいわゆるガム落し）、その後通常の手順に従って
印刷を行なってもよいし又、本発明の版面保護剤におい
てはいわゆるガム落しすることなく直ちに印刷を開始す
ることもできる。印刷時に於いては従来の様に数多くの
不良印刷物を出すことなく、印刷の直後から充分に満足
する鮮明な印刷物を得ることができ、又一方の非画像領
域は強い親水性を保持しており、印刷汚れのない良好な
印刷物を得ることができる。When starting printing, the gum on the plate surface is generally washed with water to remove it (so-called gum removal), and then printing may be carried out according to the usual procedure, or in the case of the plate surface protective agent of the present invention, it is possible to perform so-called gum removal. You can also start printing immediately. During printing, it is possible to obtain satisfactorily clear prints immediately after printing, without producing many defective prints as in conventional methods, and the non-image area retains strong hydrophilicity. , it is possible to obtain good printed matter without printing stains.
以下、実施例をもって本発明を更に詳細に説明する。 Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例１、比較例１
純水６２０部にクリームデキストリン（焙焼デキストリ
ン）２００部を撹拌しながら、７０℃に加温して溶解し
た。次に１４°Ｂｅに溶解したアラビアガム１００部を
加え、更にリン酸（８５％）４部、硝酸マグネシウム２
部を溶解し、湿潤剤としてグリセリン２０Ｂを溶解し、
水相を調製した。Example 1, Comparative Example 1 200 parts of cream dextrin (roasted dextrin) was dissolved in 620 parts of pure water by heating to 70°C while stirring. Next, 100 parts of gum arabic dissolved in 14°Be was added, followed by 4 parts of phosphoric acid (85%) and 2 parts of magnesium nitrate.
and glycerin 20B as a wetting agent,
An aqueous phase was prepared.
一方、２−エチル−１，３−ヘキサンジオール１０部、
２，４，７．９−テトラメチル−５−デシン−４，７−
ジオール１８部、ポリオキシエチレンノニルフェニルエ
ーテル（商品名エマルゲン＃９０３花王アトラス■製）
１５部、ソルビタンモノオレート （商品名スパン−８
０花王アトラス■製）５部を溶解し油相を調製した。On the other hand, 10 parts of 2-ethyl-1,3-hexanediol,
2,4,7.9-tetramethyl-5-decyne-4,7-
18 parts of diol, polyoxyethylene nonylphenyl ether (trade name: Emulgen #903 manufactured by Kao Atlas ■)
15 parts, sorbitan monooleate (trade name Span-8
0 (manufactured by Kao Atlas ■) was dissolved to prepare an oil phase.
次に上記のように調製した水相を撹拌加温し４０℃に調
整し、ゆっくりよ油相を滴下し分散液を作成しホモジナ
イザーに通し、乳白色の乳化型の平版印刷版用版面保護
剤を作成した（実施例１）。Next, the aqueous phase prepared as above was stirred and heated, adjusted to 40°C, and the oil phase was slowly added dropwise to create a dispersion, passed through a homogenizer, and a milky white emulsion-type lithographic printing plate surface protectant was added. (Example 1).
一方、２，４．’ｌ、９−テトラメチルー５−デシン−
４，７−ジオールの代りに、ジアルキルスルホコハク酸
エステルソーダを同量加え、その他は実施例１と同様の
ものを作成した（比較例１）。On the other hand, 2, 4. 'l, 9-tetramethyl-5-decyne-
A similar product as in Example 1 was prepared except that the same amount of dialkyl sulfosuccinate sodium was added instead of 4,7-diol (Comparative Example 1).
次に、厚さ０．２４ ｍｍのアルミニウム板を６０℃の
第３燐酸ナトリウムの６％水溶液に浸漬して脱脂し、水
洗した後パミスを水に懸濁した液を流しながらナイロン
ブラシで擦って砂目立てした。水洗後６５℃に保たれた
珪酸カリウム（ＳｉＯ２／に２０モル比２０）の５％水
溶液に６０秒浸漬し、充分水洗した後、乾燥した。Next, an aluminum plate with a thickness of 0.24 mm was immersed in a 6% aqueous solution of tertiary sodium phosphate at 60°C to degrease it, and after washing with water, the pumice was rubbed with a nylon brush while running a solution suspended in water. I sanded it. After washing with water, it was immersed for 60 seconds in a 5% aqueous solution of potassium silicate (20 to SiO2 molar ratio) maintained at 65°C, thoroughly washed with water, and then dried.
２−ヒドロキシエチルメタアクリレート共重合体（英国
特許第１５０５７３９号明細書・実施例１の製法で合成
したもの）２．０Ｒ１ｐ−ジアゾジフェニルアミンとパ
ラホルムアルデヒドの縮合物の２−メトキシ−４−ヒド
ロオキシ−５−ベンゾイルベンゼンスルホン酸塩０．１
２部、オイルブルー＃６０３（オリエント化学工業■製
）０．０３部、２−メトキシエタノール１５部、メタノ
ール１０部、エチレンクロライド５．０部からなる液状
感光性組成物を前記支持体に塗布し、塗布乾燥重量１、
５ ｇ ／ ｍ’の感光性平版印刷版を得た。この印刷
版に網点ネガフィルムを用いて露光し、自動現像機８０
０ＥＩ［（富士写真フィルム■製）に下記現像液を現像
浴に仕込み、第二浴には上記ガム液を仕込み、現像及び
ガム処理を施した。2-Hydroxyethyl methacrylate copolymer (synthesized by the method described in British Patent No. 1505739, Example 1) 2.0R1 2-methoxy-4-hydroxy-5 condensate of p-diazodiphenylamine and paraformaldehyde -benzoylbenzenesulfonate 0.1
A liquid photosensitive composition consisting of: , coated dry weight 1,
A photosensitive lithographic printing plate of 5 g/m' was obtained. This printing plate was exposed to light using a halftone negative film, and an automatic developing machine 80
0EI (manufactured by Fuji Photo Film ■) was charged with the following developing solution in a developing bath, and the above-mentioned gum solution was placed in the second bath, and was subjected to development and gum treatment.
〈現像液組成〉
亜硫酸ナトリウム ３．０ベンジ
ルアルコール ３０．０トリエタノール
アミン ２０．０モノエタノールアミン
５．０純 水
１０００平版印刷版を１０ｍ
’／ｊ７処理したところ、比較例１を用いたサンプルＡ
は実施例１を用いたサンプル已に比べ、ガムの塗布ムラ
が見られた。また、ハイデルベルクＫＯＲ−Ｄ印刷機で
通常の方法に従って印刷をしたところ、Δは部分的にイ
ンキの付着の遅い部分が見られ、完全な印刷物を得るま
でに１００枚以上の不良が出たのに対し、Ｂは１０〜２
０枚程で鮮明な印刷物が得られた。また、ＡはＢに比べ
て非画像部も若干汚れ易かった。これにより本発明によ
る平版印刷版用版面保護剤を用いた場合、画像部の感脂
性、及び非画像部の不感脂性両方に優れたものであるこ
とがわかった。<Developer composition> Sodium sulfite 3.0 Benzyl alcohol 30.0 Triethanolamine 20.0 Monoethanolamine 5.0 Pure water
1000 lithographic printing plate 10m
'/j7 After processing, sample A using comparative example 1
Compared to the sample using Example 1, uneven application of the gum was observed. In addition, when printing according to the normal method on a Heidelberg KOR-D printing machine, Δ was found to have slow ink adhesion in some parts, and more than 100 defective sheets were produced before a perfect print was obtained. On the other hand, B is 10-2
Clear printed matter was obtained with about 0 sheets. In addition, the non-image areas of A were also slightly more likely to be stained than those of B. This revealed that when the plate surface protective agent for lithographic printing plates according to the present invention was used, it was excellent in both the oil-sensitivity of image areas and the oil-insensitivity of non-image areas.
実施例２、比較例２
水可溶性のヒドロキシプロピル澱粉を酵素で分解したエ
ーテル化デキストリン１５０部、クリームデキストリン
（焙焼デキストリン）７０部を純水６５０部へ７０℃に
加温し溶解した。次に１４’Ｂｅに溶解したアラビアガ
ム水溶液１００部、リン酸（８５％）３部、第１リン酸
アンモニウム５部を溶解して水相を調製した。Example 2, Comparative Example 2 150 parts of etherified dextrin obtained by enzymatically decomposing water-soluble hydroxypropyl starch and 70 parts of cream dextrin (roasted dextrin) were dissolved in 650 parts of pure water by heating to 70°C. Next, an aqueous phase was prepared by dissolving 100 parts of an aqueous gum arabic solution dissolved in 14'Be, 3 parts of phosphoric acid (85%), and 5 parts of dibasic ammonium phosphate.
一方、２−エチル−１，３−ヘキサンジオール５部と２
．４，７．９−テトラメチル−５−デシン−４，７ジオ
ールエチレンオキシド付加物（エチレンオキシドの付加
モル数１０モル）８部を溶解して油相を調製した。次に
、上記のように調製した水相を撹拌加温し３０℃に調整
し、とくにゆつくりと油相を滴下し、微白色透明な可溶
化型の版面保護剤を調製した（実施例２）。一方、２゜
４．７．９−テトラメチル−５−デシン−４，７ジオー
ルエチレンオキシド付加物の代りに、アルキルジフェニ
ルエーテルジスルホン酸ナトリウム（商品′名すンデッ
）ＢＬ三洋化成■製）４０％水溶液１５部を加え、その
他は実施例２と同様のものを作成した（比較例２）。On the other hand, 5 parts of 2-ethyl-1,3-hexanediol and 2
．． An oil phase was prepared by dissolving 8 parts of 4,7.9-tetramethyl-5-decyne-4,7diol ethylene oxide adduct (number of moles of ethylene oxide added: 10 moles). Next, the aqueous phase prepared as above was stirred and heated to 30°C, and the oil phase was added dropwise, especially slowly, to prepare a pale white transparent solubilized printing plate protectant (Example 2 ). On the other hand, instead of the 2゜4.7.9-tetramethyl-5-decyne-4,7diol ethylene oxide adduct, a 40% aqueous solution of sodium alkyldiphenyl ether disulfonate (trade name Sunde, manufactured by BL Sanyo Chemical) 15 Example 2 was prepared in the same manner as in Example 2 except for the addition of 50% by weight (Comparative Example 2).
次に、特公昭４３−２８４０３号公報に記載されている
アセトンとピロガロールの縮重合により得られたポリヒ
ドロキシフェニルのナフトキノン−１，２−ジアジド−
５−スルホン酸エステル１部とノボラック型クレゾール
ホルムアルデヒド樹脂２部を４０部のメチルセロソルブ
に溶解して液状感光性組成物を作製した。厚さ０．２祁
の砂目立てされたアルミニウム版をよく洗滌した後乾燥
し、その上に上記感光性組成物を回転塗布機によって塗
布乾燥し、約１．８ ｇ ／ ｍ’の感光層を有する１
ポジ一ポジ型感光性印刷版を作製した。Next, naphthoquinone-1,2-diazide of polyhydroxyphenyl obtained by condensation polymerization of acetone and pyrogallol as described in Japanese Patent Publication No. 43-28403.
A liquid photosensitive composition was prepared by dissolving 1 part of 5-sulfonic acid ester and 2 parts of novolac type cresol formaldehyde resin in 40 parts of methyl cellosolve. A grained aluminum plate with a thickness of 0.2 mm was thoroughly washed and dried, and the above photosensitive composition was coated on it using a rotary coater and dried to form a photosensitive layer of about 1.8 g/m'. have 1
A positive-type photosensitive printing plate was prepared.
この印刷版に網点ポジフィルムを用いて露光し、２
’／
自動現像機８’００Ｅ（富士写真フィルム■製）の現像
浴に３％珪酸ソーダ水溶液を仕込み、第二浴には上記ガ
ム液を仕込み、現像及びガム処理を施した。その結果、
平版印刷版を５ ｍ’ ／ ｊ！処理したところ、比較
例２を用いたサンプルＣは、実施例２を用いたサンプル
Ｄに比べ、ガムの塗布ムラが強くみられた。更に印刷機
で通常の方法に従って印刷したところ、サンプルＣはス
ジムラ状にインキの付着の遅い部分が見られ、完全な印
刷物を得るまでに１００枚以上の不良物が出た。一方、
サンプルＤは１０枚程で長打な印刷物が得られた。This printing plate was exposed to light using halftone positive film, and
'/ A 3% aqueous sodium silicate solution was charged into the developing bath of an automatic processor 8'00E (manufactured by Fuji Photo Film ■), and the above-mentioned gum solution was charged into the second bath, and development and gum processing were performed. the result,
A lithographic printing plate of 5 m'/j! When processed, Sample C using Comparative Example 2 showed more uneven application of gum than Sample D using Example 2. Furthermore, when printing was carried out using a printing press according to the usual method, sample C showed uneven streaks in areas where the ink was slow to adhere, and more than 100 defective sheets were produced before a perfect print was obtained. on the other hand,
Sample D produced long prints after about 10 sheets.
また、サンプルＣはサンプルＤに比べて、非画像部も部
分的に汚れやすかった。In addition, in Sample C, non-image areas were also partially stained more easily than in Sample D.
実施例３、比較例３
（水相） 純水 ６７０部サイク
ロデキストリン ３０部
ポリビニルピロリドンに−３０１０部
クリームデキストリン １５０部
（焙焼デキストリン）
アラビアガム １００部
（１３°Ｂｅ水溶液）
リン酸（８５％） ４部リン酸ソーダ
２部保護剤
（油相） ■ ■・２−エ
チルヘキサン−７部 ７部
１．３−ジオール
・ナフタレンスルホン酸 ３部 ３部ソーダホル
マリン縮合物
実施例２と同様にして調製した版面保護剤■ ・（比較
例３）及び■（実施例３）を、実施例２と同様にしてポ
ジ型感光性平版印刷版に用いたところ、高処理時（５ｍ
’ ／ ｊｉ！処理）の印刷性能については、保護剤■
の方が優れており、鮮明な印刷画像が数枚で得られ、汚
れも全く発生しなかった。Example 3, Comparative Example 3 (Aqueous phase) Pure water 670 parts Cyclodextrin 30 parts Polyvinylpyrrolidone -3010 parts Cream dextrin 150 parts (roasted dextrin) Gum arabic 100 parts (13°Be aqueous solution) Phosphoric acid (85%) 4 parts sodium phosphate
2 parts Protective agent (oil phase) ■ ■・2-Ethylhexane - 7 parts 7 parts 1.3-diol・naphthalenesulfonic acid 3 parts 3 parts Soda-formalin condensate Plate protective agent prepared in the same manner as in Example 2 ■ - (Comparative Example 3) and ■ (Example 3) were used in a positive photosensitive lithographic printing plate in the same manner as in Example 2.
' / ji! Regarding the printing performance of processing), please refer to the protective agent■
was superior, with clear printed images obtained on several sheets and no staining at all.
手続補正書
特許庁長官 吉 １）文 毅 殿
１、事件の表示 平成１年特許願第１１９３８７号
２、発明の名称 平版印刷版用版面保護剤３、
補正をする者
事件との関係 出願人
名 称 （５２０）富士写真フィルム株式会社４、代
理人
５、補正命令の日付 自 発
６、補正の対象 明細書の発明の詳細な説明の欄
明細書の下記箇所を以下の通り訂正する。Written amendment by the Commissioner of the Patent Office Yoshi 1) Takeshi Moon 1, Indication of the case: Patent Application No. 119387 of 1999 2, Title of the invention: Plate protective agent for lithographic printing plates 3,
Person making the amendment Relationship to the case Applicant name (520) Fuji Photo Film Co., Ltd. 4, Agent 5, Date of amendment order Initiator 6, Subject of amendment Detailed explanation of the invention in the specification The following in the description Correct the following points.
Claims (1)
ル、アセチレングリコール又はそのアルキレンオキシド
付加物とを含有することを特徴とする平版印刷版用版面
保護剤。A surface protective agent for a lithographic printing plate, comprising a water-soluble resin having film-forming properties and acetylene alcohol, acetylene glycol, or an alkylene oxide adduct thereof.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1119387A JP2808133B2 (en) | 1989-05-12 | 1989-05-12 | Plate surface protective agent for lithographic printing plates |
| EP90304862A EP0397407B1 (en) | 1989-05-12 | 1990-05-04 | Lithographic plate finisher |
| DE1990601272 DE69001272T2 (en) | 1989-05-12 | 1990-05-04 | FINISHING SOLUTION FOR LITHOGRAPHIC PLATES. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1119387A JP2808133B2 (en) | 1989-05-12 | 1989-05-12 | Plate surface protective agent for lithographic printing plates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02297492A true JPH02297492A (en) | 1990-12-07 |
| JP2808133B2 JP2808133B2 (en) | 1998-10-08 |
Family
ID=14760241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1119387A Expired - Fee Related JP2808133B2 (en) | 1989-05-12 | 1989-05-12 | Plate surface protective agent for lithographic printing plates |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0397407B1 (en) |
| JP (1) | JP2808133B2 (en) |
| DE (1) | DE69001272T2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
| US20020187427A1 (en) | 2001-05-18 | 2002-12-12 | Ulrich Fiebag | Additive composition for both rinse water recycling in water recycling systems and simultaneous surface treatment of lithographic printing plates |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2284005B1 (en) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| TWI465562B (en) * | 2012-03-29 | 2014-12-21 | Chi Mei Corp | Cleaning solution composition and method for cleaning substrate by using the same |
| NL2013272B1 (en) * | 2014-07-29 | 2016-09-13 | S+S Patente Gmbh | Moisture additive for a printing process and method for reducing carbon monoxide in a printing process. |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS571792A (en) * | 1980-06-03 | 1982-01-06 | Ricoh Co Ltd | Desensitizing liquid for lithographic plate |
| JPS5957242A (en) * | 1982-09-20 | 1984-04-02 | Konishiroku Photo Ind Co Ltd | Photoengraving method of lithographic printing plate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4266481A (en) * | 1975-04-07 | 1981-05-12 | The Dow Chemical Company | Image-bearing lithographic plates with desensitizing coating |
| CA1305296C (en) * | 1986-07-02 | 1992-07-21 | Robert Bassemir | Fountain solutions |
| EP0269760A1 (en) * | 1986-12-02 | 1988-06-08 | Bernd Schwegmann GmbH & Co. KG | Fountain solution for lithographic printing |
-
1989
- 1989-05-12 JP JP1119387A patent/JP2808133B2/en not_active Expired - Fee Related
-
1990
- 1990-05-04 DE DE1990601272 patent/DE69001272T2/en not_active Expired - Fee Related
- 1990-05-04 EP EP90304862A patent/EP0397407B1/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS571792A (en) * | 1980-06-03 | 1982-01-06 | Ricoh Co Ltd | Desensitizing liquid for lithographic plate |
| JPS5957242A (en) * | 1982-09-20 | 1984-04-02 | Konishiroku Photo Ind Co Ltd | Photoengraving method of lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0397407B1 (en) | 1993-04-07 |
| EP0397407A2 (en) | 1990-11-14 |
| JP2808133B2 (en) | 1998-10-08 |
| EP0397407A3 (en) | 1991-05-15 |
| DE69001272D1 (en) | 1993-05-13 |
| DE69001272T2 (en) | 1993-07-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4253999A (en) | Agent for protecting the surface of lithographic printing plate comprising a plasticizer containing oil phase and a surfactant and a hydrophilic high molecular weight compound containing aqueous phase | |
| JPS648819B2 (en) | ||
| US5064749A (en) | Dampening water composition for lithographic plate | |
| US4268613A (en) | Agent for protecting the surface of lithographic printing plate | |
| US4348954A (en) | Agent for protecting the surface of lithographic printing plate | |
| JPH0470627B2 (en) | ||
| JP2533793B2 (en) | Lithographic printing plate manufacturing method | |
| JPS622254A (en) | Method for developing photosensitive material | |
| US4475460A (en) | Process for desensitizing lithographic printing plates | |
| JPH02297492A (en) | Plate surface protection agent for lithography printing plate | |
| US4601974A (en) | Desensitizing gum for lithographic printing | |
| JPS6216834B2 (en) | ||
| JPH07102753B2 (en) | Planographic printing plate making method and burning pretreatment liquid | |
| JPH0363187A (en) | Concentrated damping water for planographic printing | |
| JPH02269094A (en) | Dampening water composition for lithographic printing and additive for dampening water | |
| JPS5957242A (en) | Photoengraving method of lithographic printing plate | |
| JPS6225118B2 (en) | ||
| JP2516000B2 (en) | How to make a planographic printing plate | |
| EP0066990B1 (en) | Process for production of presensitized lithographic printing plates | |
| JPH0362263B2 (en) | ||
| US5081003A (en) | Developer compositions for newspaper plates | |
| JP3138350B2 (en) | Plate making method | |
| JPH0390389A (en) | Damping water concentrate for planographic printing | |
| JPH04161385A (en) | Correction fluid for lithographic printing plate | |
| JPS6262339B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |