JPH0229521U - - Google Patents

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Publication number
JPH0229521U
JPH0229521U JP10715788U JP10715788U JPH0229521U JP H0229521 U JPH0229521 U JP H0229521U JP 10715788 U JP10715788 U JP 10715788U JP 10715788 U JP10715788 U JP 10715788U JP H0229521 U JPH0229521 U JP H0229521U
Authority
JP
Japan
Prior art keywords
reaction tube
gas introduction
raw material
material gas
introduction pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10715788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10715788U priority Critical patent/JPH0229521U/ja
Publication of JPH0229521U publication Critical patent/JPH0229521U/ja
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案MOCVD装置の一実施例を示
す断面図、第2図は従来のMOCVD装置の断面
図である。 1…反応管、2…第1原料ガス導入管、3…排
気管、4…サセプタ、5…基板、6…高周波加熱
コイル、7…第2原料ガス導入管、8…シヤツタ
、9…雰囲気ガス導入管。
FIG. 1 is a sectional view showing an embodiment of the MOCVD apparatus of the present invention, and FIG. 2 is a sectional view of a conventional MOCVD apparatus. DESCRIPTION OF SYMBOLS 1... Reaction tube, 2... First source gas introduction tube, 3... Exhaust pipe, 4... Susceptor, 5... Substrate, 6... High frequency heating coil, 7... Second source gas introduction tube, 8... Shutter, 9... Atmospheric gas Introductory tube.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 反応管と、該反応管に連通した原料ガス導入管
と上記反応管内に配され、基板を載置するサセプ
タと、上記原料ガス導入管と上記サセプタの間に
設けられた開閉自在のシヤツタと、を具備するこ
とを特徴とするMOCVD装置。
a reaction tube, a raw material gas introduction pipe communicating with the reaction tube, a susceptor disposed within the reaction tube on which a substrate is placed, and a shutter that can be opened and closed between the raw material gas introduction pipe and the susceptor; An MOCVD apparatus comprising:
JP10715788U 1988-08-12 1988-08-12 Pending JPH0229521U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10715788U JPH0229521U (en) 1988-08-12 1988-08-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10715788U JPH0229521U (en) 1988-08-12 1988-08-12

Publications (1)

Publication Number Publication Date
JPH0229521U true JPH0229521U (en) 1990-02-26

Family

ID=31341319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10715788U Pending JPH0229521U (en) 1988-08-12 1988-08-12

Country Status (1)

Country Link
JP (1) JPH0229521U (en)

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