JPH02187940A - Optical disk substrate - Google Patents
Optical disk substrateInfo
- Publication number
- JPH02187940A JPH02187940A JP1004962A JP496289A JPH02187940A JP H02187940 A JPH02187940 A JP H02187940A JP 1004962 A JP1004962 A JP 1004962A JP 496289 A JP496289 A JP 496289A JP H02187940 A JPH02187940 A JP H02187940A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- outer peripheral
- film material
- optical disc
- end part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 61
- 230000003287 optical effect Effects 0.000 title claims abstract description 53
- 239000011521 glass Substances 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 35
- 230000002093 peripheral effect Effects 0.000 abstract description 19
- 238000005336 cracking Methods 0.000 abstract description 4
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000000717 retained effect Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 15
- 229920005989 resin Polymers 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 230000008961 swelling Effects 0.000 description 11
- 230000000694 effects Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 240000001980 Cucurbita pepo Species 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光学的に情報の記録再生が可能な光ディスク
基板に関し、特に、反射膜または記録膜または保＠膜を
回転塗布する際に発生する、外周端部の膜材料の盛り上
がりを防止することが可能な光ディスク基板に関するも
のである。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to an optical disc substrate on which information can be optically recorded and reproduced, and in particular, the present invention relates to optical disc substrates capable of optically recording and reproducing information. The present invention relates to an optical disc substrate capable of preventing swelling of film material at the outer peripheral edge.
一般に光ディスク基板は、中心に回転軸を差し込む穴を
有し、厚さが１−前後の円盤状の回転体である。この基
板の外周端部の断面形状は矩形であり、その端部は２つ
の不連続な面（基板の主面と外周面）により構成されて
いるが、その端部の断面形状については従来、特に配慮
がなされていなかった。Generally, an optical disk substrate is a disk-shaped rotating body having a hole in the center into which a rotating shaft is inserted, and having a thickness of about 1 mm. The cross-sectional shape of the outer peripheral edge of this board is rectangular, and the end is composed of two discontinuous surfaces (the main surface and the outer peripheral surface of the board). No particular consideration was given.
また一方、この様な光ディスク基板上に反射膜または記
録膜または保護膜を形成する方法とじては、高速で回転
する光ディスク基板の中心あるいは中心付近に、上記膜
材料を滴下し、遠心力を利用して光ディスク基板上に均
一に広げる方法が知られている。On the other hand, a method for forming a reflective film, a recording film, or a protective film on such an optical disc substrate is to drop the film material at or near the center of an optical disc substrate rotating at high speed and utilize centrifugal force. A known method is to spread the film uniformly on an optical disc substrate.
なお、この様な回転筐布法に関するものとしては、例え
ば、特開昭５６−９０４３０号公報、特開昭５６−２２
２２２号公報、特開昭６１−２０２２４号公報等が挙げ
られる。In addition, regarding such a rotating housing method, for example, Japanese Patent Application Laid-Open No. 56-90430, Japanese Patent Application Laid-Open No. 56-22
222, JP-A No. 61-20224, and the like.
ところで、光ディスク基板上に反射膜または記録膜また
は保護膜を、上記した様にして回転塗布する場合、光デ
ィスク基板の外周端部の断面形状が矩形になっていて、
前述のように、２つの不連続な面で構成されていると、
この不連続面が交わる境界線上に膜材料が溜まり、表面
張力で盛り上がってしまう。By the way, when a reflective film, a recording film, or a protective film is spin-coated on an optical disc substrate as described above, the cross-sectional shape of the outer peripheral edge of the optical disc substrate is rectangular.
As mentioned above, if it is composed of two discontinuous surfaces,
The membrane material accumulates on the boundary line where these discontinuous surfaces intersect and swells due to surface tension.
従来、この様な盛り上がりに対しては、塗布時の回転条
件を最適化して、むだな膜材料を振り切り飛散させる方
法がとられていた。Conventionally, a method has been used to deal with such swelling by optimizing the rotation conditions during coating and shaking off the waste film material.
一般に、塗布膜の厚さは１μｍから数μｍの範囲であっ
て、光ディスク基板の外周端部の膜材料の盛り上がり量
も少ないため、上記した方法により十分振り切ることが
でき、従って、上記端部の断面形状に関して特に考慮す
る必要はなかった。In general, the thickness of the coating film is in the range of 1 μm to several μm, and the amount of swelling of the film material at the outer peripheral edge of the optical disk substrate is also small, so it can be sufficiently shaken off by the above-mentioned method. There was no need to particularly consider the cross-sectional shape.
ところが、塗布膜の経時安定性、例えば、耐湿性、耐熱
性を考慮して塗布膜厚さを厚くした場合、塗布膜の厚さ
が十数μｍから数十μｍの範囲では、光ディスク基板の
外周端部の膜材料の盛り上がり量が増大し、光ディスク
基板を高速で回転させても振り切れないことがわかった
。従って、それにより外周部の塗布膜の厚さが内周部に
比べて厚くなるため、応力が生じて、簡単にひび割れや
剥離が生じて問題になった。また、２枚の光ディスク基
板を向い合わせて貼り合わせる密着貼合せ仕様の光ディ
スクを作成した場合、膜材料の盛り上がり厚さが影響し
て、基板の傾き角度が増大し問題になった。However, when the thickness of the coating film is increased in consideration of the stability over time of the coating film, such as moisture resistance and heat resistance, when the thickness of the coating film is in the range of tens of micrometers to several tens of micrometers, the outer periphery of the optical disk substrate It was found that the amount of swelling of the film material at the edges increased and could not be shaken off even when the optical disk substrate was rotated at high speed. Therefore, the thickness of the coating film on the outer circumference becomes thicker than that on the inner circumference, which causes stress and easily causes cracking and peeling, which poses a problem. In addition, when an optical disk with a close bonding specification in which two optical disk substrates are bonded face to face is produced, the tilt angle of the substrate increases due to the effect of the thickness of the bulge of the film material, which poses a problem.
また、振り切れずに塗布面から流れ落ち始めた膜材料は
、そのまま光ディスク基板の裏面にまわり込み、そのた
め外観を著しく損ねるという問題が生じていた。In addition, the film material that could not be shaken off and began to flow down from the coated surface continued to flow onto the back surface of the optical disk substrate, resulting in a problem in that the appearance was significantly impaired.
本発明の第１の目的は、光ディスク基板の外周端部の膜
材料の盛り上がりを少なくすることにある。A first object of the present invention is to reduce the swelling of film material at the outer peripheral edge of an optical disc substrate.
また、本発明の第２の目的は、塗布面の裏面への膜材料
のまわり込みを無くすことにある。A second object of the present invention is to prevent the film material from wrapping around the back surface of the coated surface.
上記した第１の目的は、光ディスク基板外周端。 The first purpose mentioned above is the outer peripheral edge of the optical disc substrate.
部の断面形状を丸くすることにより達成される。This is achieved by rounding the cross-sectional shape of the section.
また、上記した第２の目的は、丸い端部に続いて基板の
外側に突出した肩部を形成することにより達成される。The second object mentioned above is also achieved by forming a shoulder projecting outwardly of the substrate following the rounded end.
光ディスク基板の外周端部の断面形状を丸くすると、基
板表面は外周端部でゆるやかに円弧を描きながら連続的
に下向きに傾斜する。この面に沿って流れ落ちる膜材料
は、はとんど溜まることなく遠心力により振り切られ飛
散する。When the cross-sectional shape of the outer peripheral edge of the optical disk substrate is rounded, the substrate surface slopes continuously downward while drawing a gentle arc at the outer peripheral edge. The membrane material that flows down along this surface is shaken off and scattered by the centrifugal force without accumulating.
それによって、光ディスク基板の外周端部の膜材料の盛
り上がりは少なくなり、均一な厚さの塗布膜を形成でき
るので、応力によるひび割れや剥離が生じない。また、
貼り合わせ時の光ディスク基板の傾斜角度は増大しない
。As a result, the swelling of the film material at the outer peripheral edge of the optical disk substrate is reduced, and a coating film with a uniform thickness can be formed, so that cracks and peeling due to stress do not occur. Also,
The angle of inclination of the optical disk substrate during bonding does not increase.
また、上記の丸い端部に続いて基板外側に突出したＭ部
な形成することにより、丸い端部で振り切れずに、流れ
落ち始めた膜材料がこのＭ部に溜り、とどまる。Furthermore, by forming the M portion that protrudes outward from the substrate following the rounded end, the film material that has begun to flow down without being able to shake off at the rounded end accumulates in the M portion and remains there.
それによって、膜材料塗布時に、塗布面の裏面への膜材
料のまわり込みは生じない。また、Ｍ部に溜まる膜材料
はわずかな量なので、Ｍ部における盛り上りは、塗布面
の高さを越えることはない。As a result, when the film material is applied, the film material does not wrap around to the back side of the coated surface. Further, since the amount of film material accumulated in the M portion is small, the bulge in the M portion does not exceed the height of the coated surface.
また、Ｍ部から流れ落ちて裏面へまわり込むこともない
。Moreover, it does not flow down from the M part and go around to the back side.
以下、本発明の実施例を図面を用いて詳細に説明する。 Embodiments of the present invention will be described in detail below with reference to the drawings.
第１図は本発明の光ディスク基板の一実施例の断面を示
す断面図である。FIG. 1 is a sectional view showing a cross section of an embodiment of an optical disk substrate of the present invention.
本実施例では、第１図に示す様に、ポリカーボネート樹
脂より成る、φ１３０ｍ＋厚さ１．２．の光ディスク基
板１において、膜材料塗布面２の外周の端部５の断面形
状を、曲率半径Ｒの円弧となるように丸くしている。In this example, as shown in FIG. 1, a diameter of 130 m and a thickness of 1.2 mm made of polycarbonate resin is used. In the optical disk substrate 1, the cross-sectional shape of the outer peripheral end 5 of the film material coating surface 2 is rounded to form an arc with a radius of curvature R.
この様な光ディスク基板を回転数１５０Ｏｒｐｍで３０
秒回転させ、保護膜材料として、粘度が５０ｃｐｓまた
は５００ ｃｐｓの紫外線硬化型樹脂５を１０ｃｃ塗布
する。このとき、曲率半径ＲＱ、１＋＋＋ｓから１．２
鱈まで変化させ、この樹脂５の盛り上がり量りを測定す
る。Such an optical disk substrate was rotated for 30 minutes at a rotation speed of 150 rpm.
It is rotated for seconds, and 10 cc of ultraviolet curing resin 5 having a viscosity of 50 cps or 500 cps is applied as a protective film material. At this time, the radius of curvature RQ is 1+++s to 1.2
Even the cod was changed, and the amount of swelling of the resin 5 was measured.
第２図にその測定結果、即ち１曲率半径Ｒと盛り上がり
ｉｈとの関係を示す。第２図から明らかな様に、曲率半
径Ｒがα３ＩＩＩｌから１，２■の範囲で盛り上がり量
りを少なくすることができる。FIG. 2 shows the measurement results, that is, the relationship between the radius of curvature R and the bulge ih. As is clear from FIG. 2, the amount of protrusion can be reduced when the radius of curvature R is in the range from α3IIIl to 1.2■.
つまり、第３図（ａ） 、 （ｂ）に示すように、外周
端部の断面形状が矩形であり、不連続な２つの面で構成
されている従来の光ディスク基板６に比べ、曲率をもっ
た丸い面で構成されている本実施例の光ディスク基板１
の方が、紫外線硬化型樹脂５の盛り上がりｌｈが少なく
なることがわかる。In other words, as shown in FIGS. 3(a) and 3(b), the cross-sectional shape of the outer circumferential end is rectangular and has a greater curvature than the conventional optical disk substrate 6 which is composed of two discontinuous surfaces. The optical disc substrate 1 of this embodiment is composed of round surfaces.
It can be seen that the swelling lh of the ultraviolet curable resin 5 is smaller in the case of FIG.
この様な曲率半径Ｒが０．３ｍから１．２瓢の範囲では
、外周部において、紫外線硬化型樹脂５のひび割れ、は
く離は生じなかった。また、貼り合せ後の光ディスク基
板の傾き角度も小さくて問題にはならなかった。When the radius of curvature R was in the range of 0.3 m to 1.2 m, no cracking or peeling of the ultraviolet curable resin 5 occurred at the outer periphery. Furthermore, the angle of inclination of the optical disc substrate after bonding was small and did not pose a problem.
本実施列では、光ディスク基板１としてポリカーボネー
ト樹脂を用いたが、ポリメチルメタクリレート（ＰＭＭ
Ａ）、その他のプラスチックでもよい。In this example, polycarbonate resin was used as the optical disc substrate 1, but polymethyl methacrylate (PMM
A) Other plastics may be used.
あるいは、ガラスでもよい。また、光ディスク基板１と
して厚さ１．２．のものを用いたが、これよりも薄くて
も、厚くてもよい。このとき、膜材料の盛り上がり量の
少ない曲率半径Ｒの最大値は、光ディスク基板の厚さと
する。Alternatively, it may be glass. Further, the thickness of the optical disc substrate 1 is 1.2. Although this material was used, it may be thinner or thicker than this. At this time, the maximum value of the radius of curvature R at which the amount of swelling of the film material is small is determined to be the thickness of the optical disc substrate.
第４図は本発明の他の実施例としての光ディスク基板の
断面を示す断面図である。FIG. 4 is a sectional view showing a cross section of an optical disc substrate as another embodiment of the present invention.
本実施例では、第４図に示す様Ｃ二、ポリカーボネート
樹脂より成る直径φが１６０１．厚さ１．２園の光ディ
スク基板７において、膜材料塗布面２の外周の端部３の
断面形状を、曲率半径Ｒの円弧となるように丸くシ、更
に、この端部６に続いて、基板外側に突き出した長さｔ
、淳さｄの肩部９を形成している。In this example, as shown in FIG. 4, C2 is made of polycarbonate resin and has a diameter φ of 1601 mm. In the optical disk substrate 7 having a thickness of 1.2 mm, the cross-sectional shape of the outer peripheral end 3 of the film material coating surface 2 is rounded to form an arc with a radius of curvature R, and further, following this end 6, Length t protruding to the outside of the board
, forming a shoulder 9 of length d.
この様な光ディスク基板７を回転数１５０Ｏｒｐｍで３
０秒回転させ、保穫膜材料として、粘度が５０ｃｐｓま
たは５００ｏｐｓの紫外線硬化ｔＪｌ樹脂５を１０ｃｃ
塗布する。このとき、曲率半径Ｒを１，０頷とし、肩部
９の突出し長さｔをＯｍから５諺まで変化させ、膜材料
塗布面２の裏面１１への紫外線硬化型樹脂５のまわり込
み量ｍを測定する。Such an optical disk substrate 7 is rotated at a rotation speed of 150 rpm.
Rotate for 0 seconds, and apply 10 cc of UV-curable tJl resin 5 with a viscosity of 50 cps or 500 ops as a protective film material.
Apply. At this time, the radius of curvature R is set to 1.0, the protrusion length t of the shoulder portion 9 is varied from Om to 500, and the amount m of the ultraviolet curable resin 5 wraps around the back surface 11 of the film material application surface 2. Measure.
第５図に、その測定結果、ａち、肩部９の突出し長さｔ
とまわり込み量ｍとの関係を示す。第５図から明らかな
様に、突出し長さｔをα１ｆｆｉ１１以上にすると、紫
外線硬化型樹脂は膜材料塗布面２の裏面１１にまわり込
まなくなる。FIG. 5 shows the measurement results, a, protrusion length t of the shoulder 9.
The relationship between the amount of wraparound and the wraparound amount m is shown. As is clear from FIG. 5, when the protrusion length t is set to α1ffi11 or more, the ultraviolet curing resin does not wrap around the back surface 11 of the film material application surface 2.
つまり、第６図（ａ） 、 （ｂ）に示すように、肩部
９を形成しない第１図の実施例の光ディスク基板１では
、紫外線硬化型樹脂５が膜材料塗布面２の裏面１１に、
まわり込みｉｎだけまわり込んでしまうが、肩部９を形
成した本実施例の光ディスク基板７では、肩部９の突出
し長さｔを適当な長さにすると、紫外線硬化型樹脂５が
膜材料塗布面２の裏面１１にまわり込まないことがわか
る。That is, as shown in FIGS. 6(a) and 6(b), in the optical disk substrate 1 of the embodiment shown in FIG. ,
However, in the optical disk substrate 7 of this embodiment in which the shoulder portion 9 is formed, if the protrusion length t of the shoulder portion 9 is set to an appropriate length, the ultraviolet curable resin 5 will wrap around the film material. It can be seen that it does not wrap around the back surface 11 of surface 2.
また、端部３の曲率半径ＲをＯ，Ｓ、とし、肩部９の突
出し長さｔを０．１簡とし、肩部９の厚さｄを０．１ｍ
から０９瓢まで変化させ、膜材料塗布面２の裏面１１へ
の紫外線硬化型樹脂５のまわり込みｔｍを測定する。In addition, the radius of curvature R of the end portion 3 is O, S, the protrusion length t of the shoulder portion 9 is 0.1 m, and the thickness d of the shoulder portion 9 is 0.1 m.
to 09 Gourd, and the wraparound tm of the ultraviolet curable resin 5 to the back surface 11 of the film material application surface 2 is measured.
第７図に、その測定結果、即ち、肩部９の淳さｄとまわ
り込み量ｍとの関係を示す。第７図から明らかな様に、
肩部９の厚さｄをｔ１２ｆｉ以上にすると、紫外線硬化
型樹脂５はまわり込まなくなる。FIG. 7 shows the measurement results, that is, the relationship between the depth d of the shoulder portion 9 and the wraparound amount m. As is clear from Figure 7,
When the thickness d of the shoulder portion 9 is set to t12fi or more, the ultraviolet curing resin 5 will not go around.
本実施例では、光ディスク基板７としてポリカーボネー
ト樹脂を用いたが、ＰＭＭＡ、その他プラスチックでも
よい。あるいは、ガラスでもよい。In this embodiment, polycarbonate resin is used as the optical disc substrate 7, but PMMA or other plastics may be used. Alternatively, it may be glass.
また、光ディスク基板７として厚さ１．２ｇｍのものを
用いたが、これよりも薄くても厚くてもよい。Further, although the optical disk substrate 7 used has a thickness of 1.2 gm, it may be thinner or thicker than this.
また、端部３の曲率半径Ｒは０．３ｔｍｒから１．０簡
の間の値を自由に選択できる。Further, the radius of curvature R of the end portion 3 can be freely selected from a value between 0.3 tmr and 1.0 tmr.
本発明では、光ディスク基板上に膜材料を塗布するとき
、外周端部の膜材料の盛り上がりを少なくできるので、
外周部における塗布膜のひび割れや剥離を防止する効果
がある。また、貼り合せ後の光ディスク基板の傾斜角度
を小さくする効果がある。In the present invention, when coating the film material on the optical disc substrate, it is possible to reduce the swelling of the film material at the outer peripheral edge.
It has the effect of preventing cracking and peeling of the coating film on the outer periphery. Moreover, there is an effect of reducing the inclination angle of the optical disc substrate after bonding.
また、本発明では、光ディスク基板上に膜材料を塗布す
るとき、塗布面の裏面への膜材料のまわり込みを無くす
こともできるので、光ディスク基板の外観を良好に保つ
ことができる。Furthermore, in the present invention, when coating a film material on an optical disc substrate, it is possible to prevent the film material from wrapping around the back side of the coated surface, so that the appearance of the optical disc substrate can be maintained in a good condition.
第１図は本発明の光ディスク基板の一実施例の断面を示
す断面図、第２図は第１図に記載の実施例における曲率
半径Ｒと盛り上がり量りとの関係を示す特性図、第３図
軸）は従来の光ディスク基板に紫外線硬化型樹脂を塗布
した時の状態の一例を示す断面図、第３図（ｂ）は第１
図に記載の実施例に紫外線硬化型樹脂を塗布した時の状
態の一例を示す断面図、第４図は本発明の光ディスク基
板の他の実施例の断面を示す断面図、第５図は第４図゛
に記載の実施例における突出し長さｔとまわり込み量ｍ
との関係を示す説明図、第６図（ａ）は第１図に記載の
実施例に紫外線硬化型樹脂を塗布した時の状態の他の例
を示す断面図、第６図（ｂ）は第４図に記載の実施例に
紫外線硬化型樹脂を塗布した時の状態の一例な示す断面
図、第７図は第４図に記載の実施例における肩部の厚さ
ｄとまわり込み量ｍとの関係を示す説明図である。
１．６．７・・・光ディスク基板、
２・・・膜材料塗布面（主面）、
３・・・端部、
５・・・紫外線硬化型樹脂、
９・・・肩部、
１１・・・裏面。FIG. 1 is a sectional view showing a cross section of an embodiment of the optical disk substrate of the present invention, FIG. 2 is a characteristic diagram showing the relationship between the radius of curvature R and the amount of swelling in the embodiment shown in FIG. 1, and FIG. (axis) is a cross-sectional view showing an example of the state when ultraviolet curable resin is applied to a conventional optical disc substrate, and Fig. 3 (b) is a
FIG. 4 is a sectional view showing an example of the state when an ultraviolet curable resin is applied to the embodiment shown in the figure. FIG. 4 is a sectional view showing another embodiment of the optical disc substrate of the present invention. FIG. Projection length t and wrapping amount m in the embodiment shown in Figure 4
FIG. 6(a) is a sectional view showing another example of the state when the ultraviolet curable resin is applied to the embodiment shown in FIG. 1, and FIG. 6(b) is an explanatory diagram showing the relationship between FIG. 4 is a cross-sectional view showing an example of the state in which the ultraviolet curable resin is applied to the embodiment shown in FIG. 4, and FIG. FIG. 1.6.7... Optical disc substrate, 2... Film material coated surface (principal surface), 3... Edge, 5... Ultraviolet curing resin, 9... Shoulder, 11...・Back side.
Claims (1)
その一方の面にデータの記録・再生を行うための案内溝
や凹凸のピットが形成される光ディスク基板において、 前記案内溝や凹凸のピットが形成される側の主面と外周
面との境界部分である端部の断面形状を丸くしたことを
特徴とする光ディスク基板。 ２、前記端部の断面形状は、曲率半径０．３ｍｍ以上の
円弧であることを特徴とする請求項１に記載の光ディス
ク基板。 ３、前記外周面に外側に向かって突出する肩部を設けた
ことを特徴とする請求項１または２に記載の光ディスク
基板。 ４、前記肩部は、外側に向かって突出する長さが０．１
ｍｍ以上５ｍｍ以下であることを特徴とする請求項３に
記載の光ディスク基板。 ５、前記肩部は、その厚さが０．２ｍｍ以上０．９ｍｍ
以下であることを特徴とする請求項３に記載の光ディス
ク基板。[Claims] 1. Made of disk-shaped glass or plastic,
In an optical disk substrate on which a guide groove or uneven pits for recording and reproducing data are formed on one side, the boundary between the main surface and the outer circumferential surface on the side where the guide grooves or uneven pits are formed. An optical disc substrate characterized in that the cross-sectional shape of the end portion is rounded. 2. The optical disc substrate according to claim 1, wherein the cross-sectional shape of the end portion is an arc with a radius of curvature of 0.3 mm or more. 3. The optical disc substrate according to claim 1 or 2, wherein the outer circumferential surface is provided with a shoulder portion projecting outward. 4. The length of the shoulder portion protruding outward is 0.1
4. The optical disc substrate according to claim 3, wherein the optical disc substrate has a length of 5 mm or more. 5. The shoulder portion has a thickness of 0.2 mm or more and 0.9 mm.
The optical disc substrate according to claim 3, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1004962A JPH02187940A (en) | 1989-01-13 | 1989-01-13 | Optical disk substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1004962A JPH02187940A (en) | 1989-01-13 | 1989-01-13 | Optical disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02187940A true JPH02187940A (en) | 1990-07-24 |
Family
ID=11598214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1004962A Pending JPH02187940A (en) | 1989-01-13 | 1989-01-13 | Optical disk substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02187940A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004107333A1 (en) * | 2003-05-30 | 2004-12-09 | Dainippon Ink And Chemicals, Inc. | Ink jet-use receptive layer forming method and device, and disk formed with ink jet-use receptive layer |
-
1989
- 1989-01-13 JP JP1004962A patent/JPH02187940A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004107333A1 (en) * | 2003-05-30 | 2004-12-09 | Dainippon Ink And Chemicals, Inc. | Ink jet-use receptive layer forming method and device, and disk formed with ink jet-use receptive layer |
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