JPH02132127A - Friction-reduced film - Google Patents
Friction-reduced filmInfo
- Publication number
- JPH02132127A JPH02132127A JP28630188A JP28630188A JPH02132127A JP H02132127 A JPH02132127 A JP H02132127A JP 28630188 A JP28630188 A JP 28630188A JP 28630188 A JP28630188 A JP 28630188A JP H02132127 A JPH02132127 A JP H02132127A
- Authority
- JP
- Japan
- Prior art keywords
- friction
- lubricant
- silicone resin
- film
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002050 silicone resin Polymers 0.000 claims abstract description 28
- 239000000314 lubricant Substances 0.000 claims abstract description 25
- -1 polysiloxane Polymers 0.000 claims abstract description 4
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 3
- 125000003944 tolyl group Chemical group 0.000 claims abstract 2
- 239000010408 film Substances 0.000 abstract description 30
- 239000011521 glass Substances 0.000 abstract description 25
- 239000010409 thin film Substances 0.000 abstract description 16
- 239000003921 oil Substances 0.000 abstract description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- 239000002904 solvent Substances 0.000 abstract description 4
- 238000007598 dipping method Methods 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 150000002576 ketones Chemical class 0.000 abstract description 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000012528 membrane Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Surface Treatment Of Glass (AREA)
- Holders For Sensitive Materials And Originals (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、例えば自動原稿送り装置付の複写機において
原稿をスムーズに搬送する目的で用いられる低摩擦処理
原稿台ガラス等のような、低摩擦処理を施した製品を得
るために、ガラスや合成樹脂等の基材の表面に形成され
る摩擦低減膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention is applicable to a low-friction platen glass used for the purpose of smoothly conveying a document in a copying machine equipped with an automatic document feeder. This invention relates to a friction-reducing film formed on the surface of a base material such as glass or synthetic resin in order to obtain a friction-treated product.
上述した摩擦低減膜として、従来、多孔質の薄膜に、潤
滑剤である直鎮状バーフルオロボリエーテル油やポリジ
メチルシロキサンを含浸させることで、機械的ならびに
化学的な安定性を高め、長期間にわたる紙との接触によ
っても潤滑剤の剥落に起因した＃擦抵抗の増大を防止し
て長期にわたって低摩擦状態を維持できるようにしたも
のが知られている（例えば、特願昭６２−３３０４２２
参照）。Conventionally, the above-mentioned friction-reducing film is made by impregnating a porous thin film with a lubricant such as linear barfluoroboriether oil or polydimethylsiloxane, which improves mechanical and chemical stability and provides long-term durability. A device is known that can maintain a low friction state for a long period of time by preventing an increase in frictional resistance caused by peeling off of lubricant even after contact with paper for a long period of time (for example, Japanese Patent Application No. 330422/1983).
reference).
しかし、上述した従来の摩擦低減膜においては、潤滑剤
を含浸させた薄膜の上に余分なオイル状の潤滑剤が滲み
出て層状となって存在することから、長期間使用すれば
紙等との接触でその余分な潤滑剤が除去されて問題はな
くなるものの、特に、ガラス等の基材の表面に形成され
た詐りの使用初期の暫くの間、紙等が粘り付く所謂ステ
ィック現象によって静電摩擦係数を充分に低減させるこ
とができない問題があった。However, in the conventional friction-reducing film described above, excess oil-like lubricant oozes out and forms a layer on top of the thin film impregnated with lubricant, so if used for a long period of time, paper etc. Although the problem disappears because the excess lubricant is removed by contact with the paper, the so-called sticking phenomenon in which the paper sticks to the surface of the base material, such as glass, may cause the paper to become sticky. There was a problem that the coefficient of electric friction could not be sufficiently reduced.
本発明の目的は、上記実情に鑑み、作成初期においてよ
り良好な低摩擦状態が得られ、しかも低摩擦状態を長期
にわたって維持することのできる摩擦低減膜を提供する
ことにある。In view of the above-mentioned circumstances, an object of the present invention is to provide a friction-reducing film that can obtain a better low-friction state at the initial stage of production and can maintain the low-friction state for a long period of time.
本発明による摩擦低減膜の特徴構成は、潤滑剤を含浸さ
せた多孔質膜の表面に、シリコーンレジン層を形成した
ことにある。The characteristic structure of the friction reducing film according to the present invention is that a silicone resin layer is formed on the surface of a porous film impregnated with a lubricant.
なお、シリコーンレジン層としては、メチルフェニルボ
リシロキサン系のものが好ましい。The silicone resin layer is preferably one based on methylphenylbolysiloxane.
つまり、摩擦低減膜の最も外側に、スティック現象のな
いメチルフェニルポリシロキサン系等のシリコーンレジ
ン層があって多孔質膜の表面を覆っているから、そのシ
リコーンレジン層の特性であるスティック現象がないこ
とと、多孔買膜中に含浸された潤滑剤の滲出しをシリコ
ーンレジン層によって押さえて余分なオイル状の潤滑剤
層ができることを防止することとによって、使用初期に
おい−Ｃ１単に多孔質膜に潤滑剤を含浸させただけの構
成に比して、より良好な低摩擦状態が得られる。In other words, since there is a silicone resin layer such as methylphenylpolysiloxane-based silicone resin on the outermost side of the friction reducing film that does not exhibit stick phenomenon and covers the surface of the porous membrane, there is no stick phenomenon that is a characteristic of the silicone resin layer. In addition, by suppressing the exudation of the lubricant impregnated into the porous membrane with the silicone resin layer and preventing the formation of an extra oily lubricant layer, -C1 is simply added to the porous membrane at the initial stage of use. A better low friction state can be obtained compared to a structure in which only a lubricant is impregnated.
そして、このシリコーンレジン層は多孔質膜には含浸し
にくいものであって多孔質膜の表面に付着する状態で形
成されるものであることから長期にわたる使用に伴なっ
て紙等と接触することによって摩耗されるものではある
ものの、それにより露出することとなる多孔買膜には潤
泄剤が含浸されているから、その潤滑剤の存在によって
低摩擦状態を維持できる。しがも、このとき、多孔質膜
から滲み出ず余分なオイル状の潤滑剤はシリコーンレジ
ン層が摩耗されるのに伴なって共に除去されることとな
るから、その余分な潤滑剤が層状になってスティック現
象を惹き起すこともないのである。This silicone resin layer is difficult to impregnate into the porous membrane and is formed by adhering to the surface of the porous membrane, so it may come into contact with paper, etc. during long-term use. However, since the porous membrane exposed by this is impregnated with a lubricant, a low friction state can be maintained due to the presence of the lubricant. However, at this time, the excess oily lubricant that does not ooze out from the porous membrane is removed as the silicone resin layer is worn away, so the excess lubricant is removed from the layer. This will not cause the sticking phenomenon.
その結果、シリコーンレジン層でスティック現象を防止
することによって初期のより良好な摩擦低減を可能にし
ながら、そのシリコーンレジン層が摩耗した場合であ−
っでも潤滑剤が含浸された多孔質膜によって低摩擦状態
を維持することが可能になり、初期から長い期間にわた
って低摩擦状態が継続する優れた摩擦低減膜を提供でき
た。As a result, while the silicone resin layer allows for better initial friction reduction by preventing the stick phenomenon, when the silicone resin layer wears out.
However, it has become possible to maintain a low friction state by using a porous film impregnated with a lubricant, and we have been able to provide an excellent friction-reducing film that maintains a low friction state for a long period of time from the initial stage.
以下、本発明の実施例を図面に基づいて説明する。 Embodiments of the present invention will be described below based on the drawings.
図面は、本発明による摩擦低減膜を有する製品の一例で
ある自動原稿送り装置付き複写機用の原稿台ガラスを示
す。The drawing shows a document table glass for a copying machine with an automatic document feeder, which is an example of a product having a friction-reducing film according to the present invention.
これは、ガラス板（１）の両面に多孔質の導電性薄膜（
２）をディッピング法にて付着させて帯電防止ガラスを
作製し、次に、潤滑剤として分子ｆｆｉ４５００の直鎖
状パーフルオロポリエーテル油（以下、フッ素油と略称
する）をフロン溶媒（バーフルオ口オクタン）で０．２
重ｌ％に希釈したものを膜面に塗布することにより膜中
に含浸させ、その上から、トルエン、ｎ・−ヘブタン、
ケトンで３０重潰％に希釈したメチルフェニルポリシロ
ヰサン系のシリニＪ−ンレジン（以下、単にシリコーン
レジンと称する）をさらにフロン溶媒（パーフルオ口オ
クタン）で０．０９重量％に希釈したものを塗布し、そ
の後膜面を布または紙で拭き取って、潤滑剤を含浸させ
た多孔質膜（２）の表面にシリコーンレジン層（３）を
形成して摩擦抵抗低減を施した帯電防止ガラスを製作し
た。This is a porous conductive thin film (
2) by a dipping method to prepare antistatic glass.Next, as a lubricant, linear perfluoropolyether oil (hereinafter abbreviated as fluorine oil) with a molecular ffi of 4500 was added to a Freon solvent (barfluoro-octane). ) is 0.2
It is impregnated into the membrane by applying it diluted to 1% by weight on the membrane surface, and then toluene, n-hbutane,
A methylphenylpolysiloxane-based silicone resin (hereinafter simply referred to as silicone resin) diluted to 30% by weight with ketone was further diluted to 0.09% by weight with a freon solvent (perfluoro-octane). After coating, the film surface is wiped with cloth or paper to form a silicone resin layer (3) on the surface of the porous film (2) impregnated with lubricant to produce antistatic glass that reduces frictional resistance. did.
前記直靖状バーフルオロボリエーテル油（フッ素油）の
構造は、次の通りである。The structure of the straight bar fluoroboriether oil (fluorine oil) is as follows.
（ｎは正の整数）
また、前記フッ素油に替えて、動粘度１００ｃｓｔのポ
リジメチルシロキサン（以下、シリコーン油と略称する
）を、潤滑剤として前記導電性薄膜（２）に含浸させて
もよい。このシリコーン油の構造は次の通りである。(n is a positive integer) Furthermore, instead of the fluorine oil, polydimethylsiloxane (hereinafter abbreviated as silicone oil) having a kinematic viscosity of 100 cst may be impregnated into the conductive thin film (2) as a lubricant. . The structure of this silicone oil is as follows.
（ｎは０または正の整数）
また、本発明者は、上述の如く製作された本発明の摩擦
低減膜を形成した帯電防止ガラスと、前記シリコーンレ
ジン層（３）を形成していない従来の帯電防止ガラスと
の特性を比較し、併せて、参考のために導電性薄膜（２
）に潤滑剤を含浸させずに単にその導電性薄膜（２）の
表面にシリコーンレジン層（３）を形成しただけの帯電
防止ガラスとの特性を比較するために、下記の実験を行
なった。(n is 0 or a positive integer) Furthermore, the present inventors have discovered that the antistatic glass formed with the friction reducing film of the present invention produced as described above and the conventional glass not formed with the silicone resin layer (3) We compared the characteristics with antistatic glass, and also used a conductive thin film (2
) and an antistatic glass in which a silicone resin layer (3) was simply formed on the surface of the conductive thin film (2) without impregnating it with a lubricant, the following experiment was conducted.
〈実験条件〉
ガラスザンブル寸法・・・４３Ｑｍｍ Ｘ ３５０ｍｍ
Ｘ ３． ２ｍｍ厚摩擦係数・・・・・・コピー用紙
をガラス面上に置き、その上に１００ｇの分ｆｌ３個を
乗せ、コピー紙を横向きに引っ張る。紙
が滑り出したときの引っ張り荷重
（ｇ）を３００ｇで割った値を摩擦係数とする。<Experimental conditions> Glass size...43Qmm x 350mm
X 3. 2mm thickness Coefficient of friction: Place copy paper on a glass surface, place 3 pieces of 100g fl on it, and pull the copy paper sideways. The value obtained by dividing the tensile load (g) when the paper starts to slide by 300 g is defined as the coefficient of friction.
摩擦係数の変化・・・・・・自動原稿送り装置付複写機
により実際に通紙テストを
行なった。Change in friction coefficient: A paper feeding test was actually conducted using a copying machine equipped with an automatic document feeder.
く実験結果〉 この実験結果から、以下のことがわかる。Experimental results> From this experimental result, the following can be understood.
■ 本発明による摩擦低減膜を有する帯電防止ガラス（
サンプルＮα３，４）によれば、使用初期において、シ
リコーンレジン層（３）のない従来の摩擦低減膜を有す
る帯電防止ガラス（サンプルＮｏ．１．２）に比して、
さらに良好な低摩擦状態が得られる。■ Antistatic glass with a friction-reducing film according to the present invention (
According to samples Nα3, 4), at the initial stage of use, compared to antistatic glass (sample No. 1.2) having a conventional friction reducing film without silicone resin layer (3),
Even better low friction conditions can be obtained.
■ 本発明によるＩｇ擦低減膜を有する帯電防止ガラス
（サンプルＮＯ．３．４）によれば、シリコーンレジン
Ｎ（３）の摩耗が生じる長期間にわたる使用時において
も、従来の摩擦低減膜を有する帯電防止ガラス（サンプ
ルＮα１，２）と同等の低摩擦状態が得られる。■ According to the antistatic glass (sample No. 3.4) having an Ig friction reducing film according to the present invention, the antistatic glass (sample No. 3.4) has a conventional friction reducing film even during long-term use where silicone resin N (3) wears out. A low friction state equivalent to that of antistatic glass (samples Nα1 and 2) can be obtained.
■ 導電性薄膜（２）に潤滑剤を含浸させずに、単にそ
の表面にシリコーンレジン層（３）を形成しただけの摩
擦低減膜を有する帯電防止ガラス（サンプルＮα５）の
場合、使用初期において良好な低Ｍ擦状態が得られるも
のの、シリコーンレジン石（３）の摩耗が生じると導電
性薄膜（２）の表面が露出することとなって、摩擦係数
の増加が見られる。■ In the case of antistatic glass (sample Nα5) with a friction-reducing film made by simply forming a silicone resin layer (3) on the surface of the conductive thin film (2) without impregnating it with lubricant, the performance is good at the initial stage of use. Although a low M friction state is obtained, when the silicone resin stone (3) wears out, the surface of the conductive thin film (2) is exposed, and the coefficient of friction increases.
次に、先の実施例中では言及しなかった本発明の別の実
施例を列記する。Next, other embodiments of the present invention not mentioned in the previous embodiments will be listed.
く１〉先の実施例では、導電性薄膜（２）に先ず潤滑剤
を塗布して含浸させた後に、その上にシリコーンレジン
を塗布することによって、シリコーンレジン層（３）を
得る方法を説明したが、それに替えて、適当な混合比に
よってシリコーンレジンを予め前述した潤滑剤と混合し
たものを導電性薄膜（２）に塗布することによって、浸
透性の高い潤滑剤のみを導電性薄膜（２）中に含浸させ
、浸透しにくいシリコーンレジンのみを導電性薄膜（２
）の表面に残してシリコーンレジン層（３）を形成する
ようにしてもよい。この場合には、製作工程の短縮化を
達成することができる。1> In the previous example, a method for obtaining a silicone resin layer (3) was explained by first applying a lubricant to the conductive thin film (2) and impregnating it, and then applying a silicone resin thereon. However, instead of that, by applying a mixture of silicone resin and the aforementioned lubricant at an appropriate mixing ratio to the conductive thin film (2), only the lubricant with high permeability can be applied to the conductive thin film (2). ) is impregnated into a conductive thin film (2
) may be left on the surface to form a silicone resin layer (3). In this case, it is possible to shorten the manufacturing process.
〈２〉先の実施例では、帯電防止ガラスとして、基材と
なるガラス板（１）の両側面に、導電性薄膜（２）とシ
リコーンレジン層（３）とからなる摩擦低減膜を設けた
ものを説明したが、それに替えて、帯電防止ガラスを得
るにあたって、片面側にのみ摩擦低減膜を設けてもよい
。<2> In the previous example, a friction reducing film consisting of a conductive thin film (2) and a silicone resin layer (3) was provided on both sides of a glass plate (1) serving as a base material as an antistatic glass. However, in order to obtain antistatic glass, a friction reducing film may be provided only on one side.
く３〉上述実施例では、ディッピング法による導電性薄
膜について説明したが、被処理面に形成される薄膜とし
ては摩擦抵抗が低減された無機膜であればよいから、そ
の膜付け方法や膜物質は問わない。3) In the above example, a conductive thin film was explained using a dipping method, but the thin film formed on the surface to be treated may be any inorganic film with reduced frictional resistance, so the method of applying the film and the material of the film may vary. I don't care.
く４〉前記摩擦低減膜が設けられるべき基体としては、
ガラス板のみならず合成樹脂板等でもよい。4> The substrate on which the friction reducing film is to be provided is as follows:
Not only a glass plate but also a synthetic resin plate or the like may be used.
〈５〉本発明による摩擦低減膜が設けられる対象として
は、先の実施例で説明した複写機の原稿台ガラスに限定
されるものではない。<5> The object on which the friction-reducing film according to the present invention is provided is not limited to the document table glass of a copying machine described in the previous embodiment.
尚、特許請求の範囲の項に図面との対照を便利にする為
に符号を記すが、該記入により本発明は添付図面の構造
に限定されるものではない。Incidentally, although reference numerals are written in the claims section for convenient comparison with the drawings, the present invention is not limited to the structure shown in the accompanying drawings.
図面は本発明に係る摩擦低減膜の実施例を示す断面図で
ある。
（２）・・・・・・多孔質膜、
ン層。
（３）・・・・・・シリコーンレジThe drawing is a sectional view showing an embodiment of the friction reducing film according to the present invention. (2) Porous membrane, layer. (3)・・・Silicone cash register
Claims (1)
ーンレジン層（３）を形成してある摩擦低減膜。 ２、前記シリコーンレジン層（３）が、メチルフェニル
ポリシロキサン系のものである請求項１記載の摩擦低減
膜。 ３、前記多孔質膜（２）が導電性を有するものである請
求項１又は２記載の摩擦低減膜。[Claims] 1. A friction-reducing film comprising a silicone resin layer (3) formed on the surface of a porous film (2) impregnated with a lubricant. 2. The friction reducing film according to claim 1, wherein the silicone resin layer (3) is based on methylphenyl polysiloxane. 3. The friction reducing film according to claim 1 or 2, wherein the porous film (2) is electrically conductive.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28630188A JPH02132127A (en) | 1988-11-11 | 1988-11-11 | Friction-reduced film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28630188A JPH02132127A (en) | 1988-11-11 | 1988-11-11 | Friction-reduced film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02132127A true JPH02132127A (en) | 1990-05-21 |
Family
ID=17702608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28630188A Pending JPH02132127A (en) | 1988-11-11 | 1988-11-11 | Friction-reduced film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02132127A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306478A (en) * | 1994-05-13 | 1995-11-21 | Nippon Sheet Glass Co Ltd | Top plate for copying machine and production thereof |
| US5942360A (en) * | 1998-03-31 | 1999-08-24 | Xerox Corporation | Photoreceptor with low surface energy and process of making |
| WO2010038749A1 (en) * | 2008-09-30 | 2010-04-08 | 東海ゴム工業株式会社 | Stabilizer bush |
| WO2010038746A1 (en) * | 2008-09-30 | 2010-04-08 | 東海ゴム工業株式会社 | Vibration-damping rubber member and process for producing same |
-
1988
- 1988-11-11 JP JP28630188A patent/JPH02132127A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306478A (en) * | 1994-05-13 | 1995-11-21 | Nippon Sheet Glass Co Ltd | Top plate for copying machine and production thereof |
| US5942360A (en) * | 1998-03-31 | 1999-08-24 | Xerox Corporation | Photoreceptor with low surface energy and process of making |
| WO2010038749A1 (en) * | 2008-09-30 | 2010-04-08 | 東海ゴム工業株式会社 | Stabilizer bush |
| WO2010038746A1 (en) * | 2008-09-30 | 2010-04-08 | 東海ゴム工業株式会社 | Vibration-damping rubber member and process for producing same |
| CN102171484A (en) * | 2008-09-30 | 2011-08-31 | 东海橡胶工业株式会社 | Vibration-damping rubber member and process for producing same |
| JP4792539B2 (en) * | 2008-09-30 | 2011-10-12 | 東海ゴム工業株式会社 | Anti-vibration rubber member and manufacturing method thereof |
| JP4842401B2 (en) * | 2008-09-30 | 2011-12-21 | 東海ゴム工業株式会社 | Stabilizer bush |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH01170932A (en) | Production with low-friction thin film | |
| Marchetto et al. | Friction and wear on single-layer epitaxial graphene in multi-asperity contacts | |
| CA1254556A (en) | Fluoropolyethers containing end groups endowed with anchoring capacity | |
| JPS6268828A (en) | Transparent cassette liner | |
| TW200408324A (en) | Material using patterned surface as template and manufacturing method thereof | |
| EP3106500A1 (en) | Silicone pressure sensitive adhesive composition, pressure sensitive adhesive tape, and method for manufacturing pressure sensitive adhesive tape | |
| Noel et al. | Sliding velocity dependence of adhesion in a nanometer-sized contact | |
| DE102014206705A1 (en) | fixing | |
| Singh et al. | Surface chemical modification for exceptional wear life of MEMS materials | |
| JPH02132127A (en) | Friction-reduced film | |
| JP3208130B2 (en) | Sliding board | |
| EP0752629A1 (en) | Fixing member and fixing apparatus including same | |
| US8563116B2 (en) | Fuser manufacture and apparatus | |
| JPH0959701A (en) | Gold powder for ornament and its production | |
| KR0138251B1 (en) | Magnetic recording medium and its manufacturing method | |
| Kondo et al. | Lubrication of modified perfluoropolyether on magnetic media | |
| Liu et al. | Friction and adhesion in boundary lubrication measured by microtribometers | |
| JP2011013629A (en) | Sliding member and method for producing the same | |
| JPH08109352A (en) | Resin-coating composition for sliding | |
| JPS60166975A (en) | Silicone rubber for heat fixing roll | |
| JPH11199691A (en) | Surface modification of rubber and rubber molded product obtained thereby | |
| JPS6013635Y2 (en) | plastic coated body | |
| JPS5811976A (en) | Heat fixing roller for electronic copying machine | |
| JPS585771A (en) | Cleaning roller for heat fixing device | |
| JP2004262161A (en) | Laminated tape of anisotropic conductive film and manufacturing method therefor |