JPH0191419A - Aligner - Google Patents
AlignerInfo
- Publication number
- JPH0191419A JPH0191419A JP62249497A JP24949787A JPH0191419A JP H0191419 A JPH0191419 A JP H0191419A JP 62249497 A JP62249497 A JP 62249497A JP 24949787 A JP24949787 A JP 24949787A JP H0191419 A JPH0191419 A JP H0191419A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- masking
- light
- exposure
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004804 winding Methods 0.000 claims description 10
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims 2
- 230000000873 masking effect Effects 0.000 abstract description 20
- 230000007246 mechanism Effects 0.000 abstract description 18
- 230000003287 optical effect Effects 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 4
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000005286 illumination Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
［発明の属する分野の説明コ
本発明は被露光体に原板上のパターン像、例えば半導体
回路を露光転写する露光装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Description of the Field to Which the Invention Pertains] The present invention relates to an exposure apparatus for exposing and transferring a pattern image, such as a semiconductor circuit, on an original plate onto an exposed object.
［従来の技術の説明］
半導体露光装置てはマスク上の不要な部分を焼き付けな
いようマスキング機構をそなえているものかある。[Description of the Prior Art] Some semiconductor exposure apparatuses are equipped with a masking mechanism to prevent unnecessary portions of the mask from being printed.
この種のマスキング機構は、ステップアンドリピート露
光を行なう縮小投影露光装置、いわゆるステッパには、
備えられている場合か多い。第６図は、一般的なステッ
パの構成を示すものて、Ａは露光光を照射する為の照明
光学系、Ｂはマスク（レチクル）のパターンをウェハに
結像させる為の縮小投影レンズ、Ｃはウェハをステップ
する為のＸＹステージを示す。また、図中ａ、ｂは、そ
れぞれマスク及びウェハの焦点面を示している。This type of masking mechanism is used in a reduction projection exposure device that performs step-and-repeat exposure, a so-called stepper.
In many cases, it is provided. Figure 6 shows the configuration of a general stepper, where A is an illumination optical system for irradiating exposure light, B is a reduction projection lens for imaging a mask (reticle) pattern onto a wafer, and C is indicates an XY stage for stepping the wafer. Further, a and b in the figure indicate the focal planes of the mask and wafer, respectively.
ステッパの場合、図の様な構成において、照明光学系の
中にマスクの焦点面ａと光学的に共役な面を設け、この
位置にマスキンク４１！！４１を備えている。図中Ｃか
マスク面ａと共役となる面で、１かマスキング機構を示
す。このようにマスク面と共役な而て、遮光板を駆動す
ることにより、露光光の照射サイズを任意に選択し、露
光範囲を制限することか可能となる。In the case of a stepper, in the configuration shown in the figure, a surface optically conjugate to the focal plane a of the mask is provided in the illumination optical system, and a mask 41! ! It is equipped with 41. In the figure, C is a surface that is conjugate with mask surface a, and 1 indicates a masking mechanism. By driving the light shielding plate, which is conjugate with the mask surface, it becomes possible to arbitrarily select the irradiation size of the exposure light and limit the exposure range.
［発明が解決しようとしている問題点コしかし、この方
式は光学系の光路に対し、マスクが固定であるという前
提か無ければマスク上のマスキングされる部分か移動に
伴って変化するのて不都合である。第５図にミラープロ
ジェクション方式の露光装置の構成を示す。図中りは照
明光学系、Ｅは投影ミラー、Ｆはキャリジと呼ばれ、マ
スク２と被露光体３を一体て拘束しているものである。[Problems to be solved by the invention] However, this method requires the assumption that the mask is fixed relative to the optical path of the optical system; otherwise, the masked portion of the mask changes as it moves, which is inconvenient. be. FIG. 5 shows the configuration of a mirror projection type exposure apparatus. In the figure, the illumination optical system, E is a projection mirror, and F is called a carriage, which restrains the mask 2 and the object 3 to be exposed together.
ＧはキャリジＦを走査方向に駆動するキャリジドライバ
である。このような反射型光学系を用いた露光装置ては
、光束は幅２〜６ｍｍ程度の円孤状となり、マスク全面
を同時に照射することはできない。そこで、キャリジド
ライバＧによりマスク２と被露光体３を一体として図中
矢印の方向に走査（スキャン）することで、マスクの全
面照射を行なう。G is a carriage driver that drives the carriage F in the scanning direction. In an exposure apparatus using such a reflective optical system, the light beam has a circular arc shape with a width of about 2 to 6 mm, and the entire surface of the mask cannot be irradiated at the same time. Therefore, the entire surface of the mask is irradiated by scanning the mask 2 and the object 3 to be exposed together in the direction of the arrow in the figure using the carriage driver G.
従って、ミラープロジェクション方式の露光装置におい
ては、ステッパて用いられているように、照明光学系の
中の光学的に共役な面に、遮光板を設けて、選択的に露
光範囲を限定するという方式は使用てきなかった。最近
てはウェハを複数箇所に分割し、別々に焼き付けを行な
う方式（ステップアンドスキャン方式）も行なわれてき
ており、この時分割を正確に行なうためマスキングの必
要性が生じてきた。またさらに、従来のマスキング方式
は遮光板（いわゆるマスキングツレード）という板か駆
動されて露光光を遮光するものである為、当然マスク全
面の任意の領域をマスキングしようとすれば、−枚の遮
光板はマスク以上大きな面積か必要てあり、マスキング
機構を備える為には非常に大きなスペースが必要であっ
た。Therefore, in a mirror projection type exposure apparatus, a light shielding plate is provided on an optically conjugate surface in the illumination optical system to selectively limit the exposure range, as is used in steppers. has not been used. Recently, a method (step-and-scan method) has been used in which a wafer is divided into multiple parts and baked separately, and masking has become necessary to perform this time division accurately. Furthermore, in the conventional masking method, a plate called a masking plate (so-called masking plate) is driven to block the exposure light, so of course if you try to mask an arbitrary area on the entire mask surface, you will need to block - The plate required an area larger than the mask, and a very large space was required to accommodate the masking mechanism.
本発明は、上記問題に対応し、マスクか光学系に対し固
定されていない露光装置においても、露光範囲を選択的
に限定てきるようになる機能を達成することを目的とし
ている。The present invention addresses the above-mentioned problems and aims to achieve a function that allows selectively limiting the exposure range even in an exposure apparatus that is not fixed to a mask or an optical system.
を保持する手段と、前記光源と保持手段とを相対変位さ
せる手段と、を有し、前記相対変位手段で前記光源と保
持手段とを相対変位させて、前記光源からの光て前記第
一の物体に形成されたパターンを前記第二の物体に露光
転写する装置に於て、前記光源から前記第一物体を経て
前記第二物体に達する光の一部を遮光して前記第二物体
上の露光範囲を制限する手段を、前記相対変位時に前記
光源に対し前記保持手段と一緒に変位する様に設けて上
記目的を達成している。and means for relatively displacing the light source and the holding means. In an apparatus that exposes and transfers a pattern formed on an object onto the second object, a part of the light from the light source that reaches the second object via the first object is blocked and the pattern formed on the second object is transferred. The above object is achieved by providing means for limiting the exposure range so as to be displaced together with the holding means with respect to the light source upon the relative displacement.
［実施例］
本発明の一実施例を具体的に説明する。第１図はマスキ
ング機構全体の斜視図である。この機構は第５図のマス
ク２の下である４の位置に、キャリジＦに固定して備え
られている。[Example] An example of the present invention will be specifically described. FIG. 1 is a perspective view of the entire masking mechanism. This mechanism is fixedly provided on the carriage F at a position 4 below the mask 2 in FIG.
１０ａ〜１０ｄの４枚の遮光フィルムか、それぞれパル
スモータｌｌａ〜ｌｉｄにより独立に駆動され、このフ
ィルムによってマスクを透過する光か選択的に遮光され
、結果的に斜線部１２の領域のみ露光か行なわれること
になる。Four light-shielding films 10a to 10d are driven independently by pulse motors lla to lid, respectively, and these films selectively block the light that passes through the mask, so that only the shaded area 12 is exposed. It will be.
ここで１３はパルスモータｌｌａ〜ｌｉｄは不図示の制
御機構によって、所望の遮光域か形成される様駆動制御
される。ミラープロジェクション方式の露光光束て幅２
〜６ｍｌの円弧状を成している。このマスキンク機構を
もう少しわかり易く説明する為、第２図から第４図に４
個のうち１個の遮光ユニットを取り出しである。第２図
において、遮光フィルム１０ａはその一端かフィルム固
定金具１０２に接着固定され、他端は巻き取りローラー
１０１に末端を接着された上１巻き取られている。この
フィルム１０ａの全長はマスク２の全面をおおうのに充
分な長さをもっている。フィルム固定金具１０２の両端
にはリボン１０３ａ、１０３ｂの一端か接着固定され、
リボン１０３ａ、１０３ｂの他端は巻き取りローラー１
０５ａ、１０５ｂに末端を接着された上、巻き取られて
いる。ローラー１０４ａ、１０４ｂはたんなるアイドラ
ーである。このような構成において、パルスモータ１１
ａにより巻き取りローラー１０５ａ。Here, the pulse motors 13 to 13 are driven and controlled by a control mechanism (not shown) so that a desired light shielding area is formed. Mirror projection method exposure light beam width 2
It forms an arc of ~6 ml. In order to explain this masking mechanism a little more easily, Figures 2 to 4 show 4.
One of the light shielding units is taken out. In FIG. 2, one end of the light-shielding film 10a is adhesively fixed to a film fixing fitting 102, and the other end is glued to a winding roller 101 and wound up once. The total length of this film 10a is sufficient to cover the entire surface of the mask 2. One end of ribbons 103a and 103b is adhesively fixed to both ends of the film fixing fitting 102,
The other ends of the ribbons 103a and 103b are winding rollers 1
The ends are glued to 05a and 105b and then wound up. Rollers 104a, 104b are just idlers. In such a configuration, the pulse motor 11
Take-up roller 105a by a.
１０５ｂを矢印の方向に駆動すると、リボン１０３ａ、
１０３ｂは巻き取りローラー１０５ａ、１０５ｂに巻き
取られ、これにともない遮光フィルム１０ａは（−）Ｙ
方向に駆動される。また逆に回転すると、リボン
１０３ａ、１０３ｂは巻き取りローラー１０５ａ、１０
５ｂから送り出される。すると遮光フィルム１０ａは巻
き取りローラー１０１に巻き取られ（＋）Ｙ方向に進ん
でゆく。When the ribbon 105b is driven in the direction of the arrow, the ribbon 103a,
103b is wound up by winding rollers 105a and 105b, and along with this, the light-shielding film 10a becomes (-)Y.
driven in the direction. When the ribbons 103a and 103b rotate in the opposite direction, the take-up rollers 105a and 10
Sent from 5b. Then, the light-shielding film 10a is wound up by the winding roller 101 and advances in the (+) Y direction.
巻き取りローラーの断面図を第４図に示す。A sectional view of the take-up roller is shown in FIG.
巻き取りローラー１０１はエンドキャップ１０７ａ、１
０７ｂに支持され、エンドキャップ１０７ａ、１０７ｂ
は軸受１０８ａ。The winding roller 101 has end caps 107a, 1
07b, end caps 107a, 107b
is the bearing 108a.
１０８ｂにより固定軸１１０を中心に回転する。またロ
ーラー内部にはコイルへネ１１Ｏがあり、その一端は軸
１０９に、他端はエンドキャップ１０７ａに固定されて
いる。このコイルへネ１１０により巻き取りローラーｌ
ｏｔは常に遮光フィルムｌｏａを巻き取る方向に回転力
か加えられている。尚、本実施例ては遮光フィルムの材
質は厚さ２０ＪＬｍのスポンジチタンてあり、リボン１
０３の材質は布を用いている。108b rotates around a fixed shaft 110. Further, there is a coil heel 11O inside the roller, one end of which is fixed to the shaft 109, and the other end fixed to the end cap 107a. This coil winder 110 allows the winding roller l to
A rotational force is always applied to the ot in the direction of winding up the light-shielding film loa. In this example, the material of the light-shielding film is titanium sponge with a thickness of 20 JLm, and the ribbon 1
The material of 03 is cloth.
またここてはアイドラー１０４を介してリボン１０３を
巻き取っているか、これは端に本実施例に於てスペース
の制約を受けたたけてスペースさえ許されるならこのア
イドラー１０４の場所に巻き取りローラー１０５を配置
しても同等問題は無い。Also, here, the ribbon 103 is wound up via the idler 104, or if the ribbon 103 is wound up at the end in this embodiment due to space constraints, a winding roller 105 is installed at the place of the idler 104 if space is allowed. There is no problem with the same placement.
以上の機構を第１図に示すとうり４個備え、これらを独
立に駆動してやることにより、マスク２の全面に関し任
意のポジションのマスキングが可能となる。By providing four of the above-mentioned mechanisms as shown in FIG. 1 and driving them independently, masking can be performed at any position on the entire surface of the mask 2.
前記実施例ては、このマスキング機構をマスク２の真下
である４の位置に置いたか、被露光基板３の真上にこの
機構を置いても全く同し効果か得られる。In the embodiment described above, the same effect can be obtained even if the masking mechanism is placed at the position 4 directly below the mask 2 or directly above the substrate 3 to be exposed.
また、マスク２と基板３の間には第１図の遮光フィルム
１０ａとｌＯｃたけをほき、１０ｂと１０ｄは、照明光
学系りの中に置いても同様の効果か得られる。Further, the same effect can be obtained even if the light-shielding films 10a and 1Oc shown in FIG. 1 are placed between the mask 2 and the substrate 3, and the films 10b and 10d are placed in the illumination optical system.
［効果の説明］
学系の中にマスキング機構を置にことては不可能てあっ
た反射型投影露光装置に於けるマスキングが可能となっ
た。[Explanation of Effects] Masking in a reflection type projection exposure apparatus, which was impossible without a masking mechanism installed in the optical system, has become possible.
また従来、マスキンクツレード自体か非常に大きく、そ
のスペースの確保かなかなか困難であったか、これをフ
レキシブルなフィルムに替え、これを巻き取るという手
法を用いたことにより非常にコンパクトな機構とするこ
とが可能となった。In addition, in the past, the Maskinkutsulade itself was very large, and it was difficult to secure space for it, but by replacing it with a flexible film and winding it up, it was possible to create a very compact mechanism. It has become possible.
【図面の簡単な説明】
第１図は本発明によるところのマスキング機構全体の側
視図、
第２図は第１図の一部の側視図、
第３図は第２図の断面図、
第４図は第３図の断面図、
第５図は反射投影露光装置の構成の概略図、第６図は縮
小投影露光装置、いわゆるステッパの構成の概略図であ
る。
図中Ａはステッパの照明光学系、Ｂは投影レンズ、Ｃは
ＸＹ反テーシ、Ｄは反射投影露光装置の照明光学系、Ｅ
は投影ミラー、Ｆはキャリジ、２はマスク、３は被露光
基板、４はマスキング機構取付位置、１０ａ〜１０ｄは
遮光フィルム、１２は露光領域、１３は露光光束、１０
１は巻取ローラー、１０３はリボン、１０５は巻取ロー
ラーである。[Brief Description of the Drawings] Fig. 1 is a side view of the entire masking mechanism according to the present invention, Fig. 2 is a side view of a part of Fig. 1, Fig. 3 is a sectional view of Fig. 2, 4 is a sectional view of FIG. 3, FIG. 5 is a schematic diagram of the configuration of a reflection projection exposure apparatus, and FIG. 6 is a schematic diagram of the configuration of a reduction projection exposure apparatus, a so-called stepper. In the figure, A is the illumination optical system of the stepper, B is the projection lens, C is the XY mirror, D is the illumination optical system of the reflection projection exposure device, and E is the illumination optical system of the stepper.
1 is a projection mirror;
1 is a take-up roller, 103 is a ribbon, and 105 is a take-up roller.
Claims (2)
持する手段と、前記光源と保持手段とを相対変位させる
手段と、を有し、前記相対変位手段で前記光源と保持手
段とを相対変位させて、前記光源からの光で前記第一の
物体に形成されたパターンを前記第二の物体に露光転写
する装置に於て、前記光源から前記第一物体を経て前記
第二物体に達する光の一部を遮光して前記第二物体上の
露光範囲を制限する手段を、前記相対変位時に前記光源
に対し前記保持手段と一緒に変位する様に設けた事を特
徴とする露光装置。(1) A light source for exposure, means for holding a first object and a second object, and means for relatively displacing the light source and the holding means, wherein the relative displacement means allows the light source to In an apparatus for exposing and transferring a pattern formed on the first object using light from the light source onto the second object by relatively displacing the holding means, The feature is that means for blocking a part of the light reaching the second object to limit the exposure range on the second object is provided so as to be displaced together with the holding means with respect to the light source at the time of the relative displacement. exposure equipment.
めのシート部材と、前記シート部材を巻き取るためのロ
ーラー手段と、前記ローラー手段を露光範囲に応じて回
転させる為の回転駆動手段とを有することを特徴とする
特許請求の範囲第１項記載の露光装置。(2) The limiting means includes a sheet member for blocking light from the light source, a roller means for winding up the sheet member, and a rotation drive means for rotating the roller means according to the exposure range. An exposure apparatus according to claim 1, characterized in that it has:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62249497A JPH0191419A (en) | 1987-10-01 | 1987-10-01 | Aligner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62249497A JPH0191419A (en) | 1987-10-01 | 1987-10-01 | Aligner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0191419A true JPH0191419A (en) | 1989-04-11 |
Family
ID=17193847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62249497A Pending JPH0191419A (en) | 1987-10-01 | 1987-10-01 | Aligner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0191419A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6411364B1 (en) | 1993-02-01 | 2002-06-25 | Nikon Corporation | Exposure apparatus |
| US6462807B1 (en) | 1993-05-28 | 2002-10-08 | Nikon Corporation | Projection exposure apparatus and method |
| JP2004356633A (en) * | 2003-05-28 | 2004-12-16 | Asml Netherlands Bv | Lithographic equipment |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
| US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
| US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
-
1987
- 1987-10-01 JP JP62249497A patent/JPH0191419A/en active Pending
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6411364B1 (en) | 1993-02-01 | 2002-06-25 | Nikon Corporation | Exposure apparatus |
| US6462807B1 (en) | 1993-05-28 | 2002-10-08 | Nikon Corporation | Projection exposure apparatus and method |
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