JPH0151849B2 - - Google Patents
Info
- Publication number
- JPH0151849B2 JPH0151849B2 JP3550487A JP3550487A JPH0151849B2 JP H0151849 B2 JPH0151849 B2 JP H0151849B2 JP 3550487 A JP3550487 A JP 3550487A JP 3550487 A JP3550487 A JP 3550487A JP H0151849 B2 JPH0151849 B2 JP H0151849B2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- needle
- ion source
- electrode
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 50
- 238000000605 extraction Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 description 8
- 230000001133 acceleration Effects 0.000 description 7
- 238000010884 ion-beam technique Methods 0.000 description 5
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 description 3
- NLSCHDZTHVNDCP-UHFFFAOYSA-N caesium nitrate Chemical compound [Cs+].[O-][N+]([O-])=O NLSCHDZTHVNDCP-UHFFFAOYSA-N 0.000 description 2
- FLJPGEWQYJVDPF-UHFFFAOYSA-L caesium sulfate Chemical compound [Cs+].[Cs+].[O-]S([O-])(=O)=O FLJPGEWQYJVDPF-UHFFFAOYSA-L 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000004157 plasmatron Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
【発明の詳細な説明】
本発明は高輝度の金属成分イオンビームを引き
出すためのイオン源に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ion source for extracting a high-intensity metal component ion beam.
最近、イオンビームを利用したサブミクロン計
測および加工が微細構造製作技術分野に広く使わ
れるようになつてきた。このような応用分野に対
して、現在主としてデユオプラズマトロン型イオ
ン源が利用されている。 Recently, submicron measurement and processing using ion beams has become widely used in the field of microstructure fabrication technology. Duoplasmatron ion sources are currently mainly used for such application fields.
第１図に従来のデユオプラズマトロン型イオン
源の原理構成を示す。従来、イオン源は、ホロカ
ソード１、中間電極２、アノード３、引出電極
４、マグネツト５、放電安定化抵抗６、放電々源
７および加速電源８より構成されている。 FIG. 1 shows the principle configuration of a conventional dual plasmatron ion source. Conventionally, an ion source is composed of a hollow cathode 1, an intermediate electrode 2, an anode 3, an extraction electrode 4, a magnet 5, a discharge stabilizing resistor 6, a discharge source 7, and an accelerating power source 8.
動作原理は、次の通りである。先ずイオン源部
１，２，３および４を高真空に排気し、次にカソ
ード１、中間電極２、アノード３のつくる空間に
取り出すイオン種に相当するガスを導入し、放
電々源７により、カソード１とアノード３の間に
電圧を印加し、放電を発生させ、この空間にプラ
ズマを生成させる。中間電極２とアノード３との
間にマグネツトＳにより軸方向磁場が印加してあ
り、これによりプラズマがピンチされ、高密度化
される。最後に加速電源８により、引出し電極４
とアノード３の間にイオン引出し電圧を印加し、
イオンビーム９を取り出す。この場合、イオン源
の大きさは、アノード３の孔径により定まる。 The operating principle is as follows. First, the ion sources 1, 2, 3, and 4 are evacuated to a high vacuum, and then gas corresponding to the ion species to be taken out is introduced into the space created by the cathode 1, intermediate electrode 2, and anode 3, and the discharge source 7 is used to A voltage is applied between the cathode 1 and the anode 3 to generate discharge and generate plasma in this space. An axial magnetic field is applied between the intermediate electrode 2 and the anode 3 by a magnet S, thereby pinching the plasma and densifying it. Finally, the extraction electrode 4 is
Applying an ion extraction voltage between the anode 3 and the anode 3,
Take out the ion beam 9. In this case, the size of the ion source is determined by the pore diameter of the anode 3.
従来のイオン源の欠点は次の通りである。 The disadvantages of conventional ion sources are as follows.
(1) イオン源としての輝度（Ａ／cm2・sr）が低
い。(1) The brightness (A/cm 2 · sr) as an ion source is low.
(2) イオン源としての光源の大きさが大きい。(2) The size of the light source as an ion source is large.
(3) 高温に加熱することが困難なためイオン種に
制限がある。(3) There are restrictions on ion species because it is difficult to heat to high temperatures.
(4) 単一金属イオン種の取り出しが困難である。(4) It is difficult to extract single metal ion species.
上記欠点(1)の輝度は、100〜200A／cm2・sr程度
であり、この値は本質的な限界値を示しており改
善の余地がない。欠点(2)は、アノード３の孔径の
機械加工精度（能力）により定まり、100μｍが
限界となる。従来のイオン源では、ガス放電を利
用しているので、取り出せるイオン種に制限があ
る。欠点(3)は、この理由による。欠点(4)は従来の
ガス放電では、混合ガスを利用することが多く、
元素イオンの他にクラスタイオンや分子イオンが
混入する。したがつてイオン源として利用する場
合には質量分離が必要になる。 The luminance of the above drawback (1) is about 100 to 200 A/cm 2 ·sr, and this value represents an essential limit value and there is no room for improvement. Disadvantage (2) is determined by the machining accuracy (ability) of the hole diameter of the anode 3, and the limit is 100 μm. Conventional ion sources utilize gas discharge, which limits the types of ions that can be extracted. Disadvantage (3) is due to this reason. Disadvantage (4) is that conventional gas discharge often uses mixed gas;
In addition to elemental ions, cluster ions and molecular ions are mixed in. Therefore, when used as an ion source, mass separation is required.
従つて、本発明の目的は、上記従来のイオン源
の欠点を除去した高性能なイオン源を提供するこ
とにある。 Therefore, an object of the present invention is to provide a high-performance ion source that eliminates the drawbacks of the conventional ion sources.
本発明の特徴は、イオン化すべき物質の針状電
極先端へ供給される量を調整するため、針状電極
をその軸方向に移動させる手段を設けたイオン源
にある。イオン化すべき物質としては、金属およ
び化合物のすべてが対象となる。 A feature of the present invention is an ion source provided with means for moving the needle-like electrode in its axial direction in order to adjust the amount of the substance to be ionized supplied to the tip of the needle-like electrode. Substances to be ionized include all metals and compounds.
以下に実施例の詳細について述べる。 The details of the embodiment will be described below.
第２図に本発明の第１の実施例を示す。これは
仕事関数の大きい材料（例えばＷ、Mo、Ta、
Ir、Nb）を針状構造に形成し、この針の先端を
電子衝撃により加熱し、針の先端に付着している
イオン源材料によるイオンビームを取り出すもの
である。本イオン源は、針状電極１４を上下に移
動させるための微動機構を備えた可動棒１１、支
え１２、可動棒１１を可動させるためのベロー１
３、イオン源材料１５を入れる容器１６、電子銃
電極１７、電子銃フイラメント１８、イオン引出
し電極１０、フイラメント電源２２、電子加速電
源２３およびイオン加速電源２４により構成され
ている。 FIG. 2 shows a first embodiment of the present invention. This is a material with a large work function (e.g. W, Mo, Ta,
Ir, Nb) is formed into a needle-like structure, and the tip of the needle is heated by electron bombardment to extract an ion beam from the ion source material attached to the tip of the needle. This ion source includes a movable rod 11 equipped with a fine movement mechanism for moving the needle electrode 14 up and down, a support 12, and a bellows 1 for moving the movable rod 11.
3. It is composed of a container 16 containing an ion source material 15, an electron gun electrode 17, an electron gun filament 18, an ion extraction electrode 10, a filament power supply 22, an electron acceleration power supply 23, and an ion acceleration power supply 24.
本イオン源の動作原理は次の通りである。先ず
ネジ微動機構をもつ可動棒１１とベローズ１３に
より、針状電極１４の先端部を容器１６の底の孔
にしつかり押しつけた状態で硝酸セシウム
（CsNO3）、硫酸セシウム（Cs2SO4）、塩化セシウ
ム（CsCl）、セシウム（Cs）、ガリウム（Ga）、
バリウム（Ba）などのイオン源材料１５を容器
１６に入れ、フイラメント１８をフイラメント電
源２２により、約2700℃に加熱し、電子加速電圧
を電子加速電源２３により徐々に供給する。これ
により針状電極１４を電子衝撃により加熱し、イ
オン源材料１５の一部（針状電極１４の近傍）を
溶融状態に保つ。次にイオン加速電源２４を働か
せ、イオン電流１９を測定しながら針状電極１４
を上部に微動させ、溶融したイオン源材料１５を
針状電極１４の先端に供給する。針状電極１４
は、第２図に示すように、実効的に熱効果を高め
るために針状先端の近傍に細いくびれ２０を入
れ、熱抵抗を大きくしている。針状電極１４の先
端に供給されたイオン源材料１５のイオン化は、
熱電離、電界電離および電子衝撃電離の重畳効果
によつて行なう。 The operating principle of this ion source is as follows. First, cesium nitrate (CsNO 3 ), cesium sulfate (Cs 2 SO 4 ), Cesium chloride (CsCl), cesium (Cs), gallium (Ga),
An ion source material 15 such as barium (Ba) is placed in a container 16, the filament 18 is heated to about 2700° C. by a filament power source 22, and an electron acceleration voltage is gradually supplied by an electron acceleration power source 23. Thereby, the needle electrode 14 is heated by electron impact, and a part of the ion source material 15 (near the needle electrode 14) is kept in a molten state. Next, the ion accelerating power source 24 is activated, and the needle electrode 14 is heated while measuring the ion current 19.
is slightly moved upward to supply the molten ion source material 15 to the tip of the needle electrode 14. Needle electrode 14
As shown in FIG. 2, in order to effectively enhance the thermal effect, a thin constriction 20 is inserted near the needle tip to increase thermal resistance. Ionization of the ion source material 15 supplied to the tip of the needle electrode 14 is as follows:
This is done by the superimposed effects of thermal ionization, field ionization, and electron impact ionization.
取り出しうるイオン量は、イオン加速電圧２
４、フイラメント電流および針状電極１４の先端
形状などにより制御できるが、針状電極１４の先
端の曲率半径を30μｍにした場合、上記のCsCl、
CsNO3およびCS2SO4などで300μAを安定に取り
出すことができた。この値は、点イオン源として
は、サイズが従来の1/10に縮小され、電流密度が
約100倍に向上するものである。 The amount of ions that can be extracted is determined by the ion acceleration voltage 2
4. Although it can be controlled by the filament current and the shape of the tip of the needle electrode 14, when the radius of curvature of the tip of the needle electrode 14 is set to 30 μm, the above CsCl,
We were able to stably extract 300 μA from CsNO 3 and CS 2 SO 4 . This value means that, as a point ion source, the size is reduced to 1/10 of that of conventional sources, and the current density is improved approximately 100 times.
以上述べた如く、本発明によるイオン源は、次
のような特徴をもつものである。 As described above, the ion source according to the present invention has the following characteristics.
(1) 取り出すイオン種に制限がなく、任意イオン
種が安定に取り出せる。(1) There are no restrictions on the ion species to be extracted, and any ion species can be stably extracted.
(2) 輝度の高い点イオン源ができる。(2) A point ion source with high brightness can be created.
第１図は従来のイオン源の基本構成図、第２図
は本発明によるイオン源の基本構成図である。
１０……引出し電極、１１……可動棒、１２…
…支え、１３……ベロー、１４……針状電極、１
５……イオン源材料、１６……容器、１７……電
子銃電極、１８……電子銃フイラメント、１９…
…イオンビーム、２２……フイラメント電源、２
３……電子加速電源、２４……イオン加速電源、
２０……くびれ、２９……電子線。
FIG. 1 is a basic configuration diagram of a conventional ion source, and FIG. 2 is a basic configuration diagram of an ion source according to the present invention. 10... Extraction electrode, 11... Movable rod, 12...
... Support, 13 ... Bellows, 14 ... Needle electrode, 1
5... Ion source material, 16... Container, 17... Electron gun electrode, 18... Electron gun filament, 19...
...Ion beam, 22...Filament power supply, 2
3...Electron acceleration power supply, 24...Ion acceleration power supply,
20...constriction, 29...electron beam.
Claims (1)
べき物質を溶融状態で保持し、かつ上記針状電極
が挿通せしめられている開孔を有する容器と、上
記針状電極の先端からイオンを引き出すためのイ
オン引出電極と、上記針状電極をその軸方向に移
動させることによつて、上記針状電極と上記開孔
との間〓をイオン源非動作時に閉塞せしめ、イオ
ン源動作時に開放せしめる手段とを有することを
特徴とするイオン源。1 A needle-shaped electrode, a container surrounding the needle-shaped electrode that holds a substance to be ionized in a molten state, and having an opening into which the needle-shaped electrode is inserted, and a container that allows ions to flow from the tip of the needle-shaped electrode. By moving the ion extraction electrode for extracting the ion source and the needle electrode in the axial direction, the space between the needle electrode and the opening is closed when the ion source is not operating, and when the ion source is operating, the gap between the needle electrode and the opening is closed. An ion source comprising: means for opening the ion source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3550487A JPS62188127A (en) | 1987-02-20 | 1987-02-20 | Ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3550487A JPS62188127A (en) | 1987-02-20 | 1987-02-20 | Ion source |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2704684A Division JPS59160941A (en) | 1984-02-17 | 1984-02-17 | Ion source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62188127A JPS62188127A (en) | 1987-08-17 |
| JPH0151849B2 true JPH0151849B2 (en) | 1989-11-07 |
Family
ID=12443586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3550487A Granted JPS62188127A (en) | 1987-02-20 | 1987-02-20 | Ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62188127A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6727500B1 (en) * | 2000-02-25 | 2004-04-27 | Fei Company | System for imaging a cross-section of a substrate |
| US6914386B2 (en) * | 2003-06-20 | 2005-07-05 | Applied Materials Israel, Ltd. | Source of liquid metal ions and a method for controlling the source |
-
1987
- 1987-02-20 JP JP3550487A patent/JPS62188127A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62188127A (en) | 1987-08-17 |
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