JPH01303404A - Laser reflecting mirror - Google Patents
Laser reflecting mirrorInfo
- Publication number
- JPH01303404A JPH01303404A JP13502488A JP13502488A JPH01303404A JP H01303404 A JPH01303404 A JP H01303404A JP 13502488 A JP13502488 A JP 13502488A JP 13502488 A JP13502488 A JP 13502488A JP H01303404 A JPH01303404 A JP H01303404A
- Authority
- JP
- Japan
- Prior art keywords
- reflecting mirror
- laser
- copper
- molybdenum
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010949 copper Substances 0.000 claims abstract description 26
- 239000010409 thin film Substances 0.000 claims abstract description 20
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 16
- 239000011733 molybdenum Substances 0.000 claims abstract description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 8
- 239000000956 alloy Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 25
- 238000007733 ion plating Methods 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 239000004677 Nylon Substances 0.000 abstract description 3
- 229920001778 nylon Polymers 0.000 abstract description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 10
- 239000010931 gold Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000003595 mist Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- -1 composed of copper Chemical compound 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野〕
この発明は、ＣＯ２レーザ、ＣＯレーザなどの赤外レー
ザに用いられるレーザ反射鏡に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a laser reflecting mirror used for infrared lasers such as CO2 lasers and CO lasers.
［従来の技術］
従来の赤外レーザ用反射鏡としては、大きく分けて２つ
のタイプがある。１つのタイプは、鏡面加工されたＣｕ
またはＭｏの反射鏡基板を用いるものである。Ｃｕは、
被加工性および熱伝導性等の性質に優れ、かつ赤外レー
ザの理論反射率も９９％以上と高（、また素材価格も安
いため、最も多く用いられている材質である。Ｃｕは鏡
面加工されたままの状態で、レーザ反射鏡として使用さ
れることもあるが、Ｃｕ表面が酸化しやすいため、第２
図′に示すように、Ａｕ薄膜２をめっきやイオンプレー
ティング等の方法で、Ｃｕ基板１上に形成して使用して
いる。また、硬度を増加させるため、第３図に示すよう
に、Ｎｉ薄膜３をＣｕ基板１上に形成し、このＮｉ薄膜
３上にＡｕ薄膜２を形成することも行なわれている。[Prior Art] Conventional infrared laser reflecting mirrors are roughly divided into two types. One type is mirror-finished Cu
Alternatively, a Mo reflecting mirror substrate is used. Cu is
It is the most commonly used material because it has excellent properties such as workability and thermal conductivity, and the theoretical reflectance of infrared lasers is over 99% (and the material price is low.) It is sometimes used as a laser reflector in the same state as it is, but since the Cu surface is easily oxidized, the second
As shown in FIG. 1, an Au thin film 2 is formed on a Cu substrate 1 by a method such as plating or ion plating. Furthermore, in order to increase the hardness, as shown in FIG. 3, a Ni thin film 3 is formed on a Cu substrate 1, and an Au thin film 2 is formed on this Ni thin film 3.
ＭＯもＣｕと同様に鏡面加工して用いられるが、他の材
質に比べ硬度が高いので、反射鏡として使用している際
にスパッタなどの汚れが付いても、ブラシ等で汚れを擦
り落すことができるという特徴がある。Ｍｏの場合には
、その硬度を維持するため、通常Ａｕなどの薄膜を形成
しない。Like Cu, MO is also used after being mirror-finished, but it is harder than other materials, so if it gets spatter or other dirt when it is used as a reflector, it must be rubbed off with a brush, etc. It has the characteristic of being able to In the case of Mo, a thin film of Au or the like is usually not formed in order to maintain its hardness.
もう１つのタイプのものは、鏡面加工された５ｉ９Ｇｅ
の反射鏡基板を用いるものである。このタイプのレーザ
反射鏡では、金属基板の反射率をさらに向上させる目的
で、第４図に示すように、ＳｉまたはＧｅ基板４の上に
、ＡｕまたはＡｇ薄膜５を形成し、この薄膜の上にＴｈ
Ｆ４やＺｎ５ｅの誘電体薄膜を多数層積層した誘電体多
層膜４を形成して使用している。Another type is mirror-finished 5i9Ge.
This uses a reflective mirror substrate. In this type of laser reflector, in order to further improve the reflectance of the metal substrate, an Au or Ag thin film 5 is formed on a Si or Ge substrate 4, as shown in FIG. ni Th
A dielectric multilayer film 4 is formed and used by laminating a large number of dielectric thin films of F4 or Zn5e.
［発明が解決しようとする課題］
しかしながら、このような従来のレーザ反射鏡には、以
下に述べるような種々の欠点があった。[Problems to be Solved by the Invention] However, such conventional laser reflecting mirrors have various drawbacks as described below.
まず、Ｃｕ基ｆＮの上にＡｕ薄膜を形成したレーザ反射
鏡では、使用中表面が汚れた場合にガーゼ等で拭取ろう
とすると、表面のＡｕ薄膜がｆｆｉ＋Ｊがれてしまい、
反射性能が劣化してしまうという欠点があった。First, in a laser reflector with a thin Au film formed on a Cu-based fN, if the surface becomes dirty during use and you try to wipe it off with gauze, the thin Au film on the surface will ffi+J peel off.
The drawback was that the reflection performance deteriorated.
また、〜１ｏを基板とするレーザ反射鏡は、Ｃｕに比べ
ると高度がはるかに高く、使用の際に汚れが付いても傷
をつけることなくガーゼ等で拭取ることが可能であるが
、材料が高価であり、また研磨仕上げによらなければ鏡
面加工することができず、非球面を形成する際に、超精
密切削加工ができないという欠点があった。In addition, the laser reflector with ~1o as a substrate has a much higher altitude than Cu, and even if it gets dirty during use, it can be wiped off with gauze etc. without damaging it, but the material However, it has the disadvantage that it is expensive, that it cannot be mirror-finished without polishing, and that ultra-precision cutting cannot be performed when forming an aspherical surface.
また、ＳｌまたはＧｅ基板上にＡｕまたはＡｇ薄膜をＩ
ヒ成し、その上に誘電体多層膜を形成したレーザ反射鏡
の場合には、誘電体多層膜が、銅基板の上に金薄膜を形
成したものより、さらに剥がれやすく、使用の際表面が
？ｒｊれてこれを除去しようとすると、誘電体多層膜が
容易に剥がれてしまうという欠点があった。In addition, an Au or Ag thin film is deposited on an Sl or Ge substrate.
In the case of a laser reflector that has a dielectric multilayer film formed on it, the dielectric multilayer film peels off more easily than one in which a thin gold film is formed on a copper substrate, and the surface becomes rough during use. ? If an attempt is made to remove the dielectric multilayer film, there is a drawback that the dielectric multilayer film easily peels off.
この発明の目的は、かかる従来のレーザ反射鏡の欠点を
解消し、安価で、しかも表面の汚れを落しても表面を傷
つけることのないレーザ反射鏡を提供することにある。An object of the present invention is to eliminate the drawbacks of the conventional laser reflector, and to provide a laser reflector that is inexpensive and does not damage the surface even when dirt is removed from the surface.
［課題を解決するための手段および作用］この発明のレ
ーザ反射鏡は、銅または銅を主成分とする合金からなる
反射鏡基数の上に、モリブデンの薄膜を形成したことを
特徴としている。[Means for Solving the Problems and Effects] The laser reflecting mirror of the present invention is characterized in that a thin film of molybdenum is formed on a reflecting mirror base made of copper or an alloy containing copper as a main component.
第１図は、この発明の一実施例であって、１はＣｕ基板
、７はＭｏ薄膜を示している。FIG. 1 shows an embodiment of the present invention, in which numeral 1 indicates a Cu substrate and numeral 7 indicates a Mo thin film.
この発明では、反射鏡基板に銅またはその合金を使用し
ているので、波加工性が良く、研磨による鏡面加工はも
ちろんのことながら、超精密旋盤による放物面などの非
球面の鏡面加工仕上げも可能である。また、銅またはそ
の合金を反射鏡基板に用いているので、安価に製造する
ことができる。In this invention, since copper or its alloy is used for the reflector substrate, it has good corrugation properties, and can be mirror-finished by polishing, as well as aspherical surfaces such as paraboloids can be mirror-finished using an ultra-precision lathe. is also possible. Furthermore, since copper or its alloy is used for the reflecting mirror substrate, it can be manufactured at low cost.
さらに、銅またはその合金を基板に用いているので、熱
伝導性に優れており、レーザ反射鏡として使用する際に
水冷による反射鏡の冷却効果を最大限に発揮させること
ができる。すなわち、レーザによる反射鏡の温度上昇を
小さく抑えることができ、熱膨張による形状変化を非常
に小さくすることができるので、レーザビームのモード
を極めて安定化させることができる。Furthermore, since copper or its alloy is used for the substrate, it has excellent thermal conductivity, and when used as a laser reflecting mirror, the cooling effect of the reflecting mirror by water cooling can be maximized. That is, the temperature rise of the reflecting mirror caused by the laser can be suppressed to a small level, and the change in shape due to thermal expansion can be made very small, so that the mode of the laser beam can be extremely stabilized.
この発明のレーザ反射鏡では、反射鏡基板の上にモリブ
デンの薄膜を形成しているので、モリブデンを基板とし
たレーザ反射鏡と同様に、その表面の硬度が高くなる。In the laser reflecting mirror of the present invention, since a thin molybdenum film is formed on the reflecting mirror substrate, the hardness of the surface thereof is increased like a laser reflecting mirror using molybdenum as a substrate.
すなわち、ビッカース硬度で２５０程度になる。したが
って、反射鏡を使用中、スパッタやミストの焼きつき等
が生じても、トリクレンやアルコール等の溶媒中で拭取
り、表面を洗浄することができる。また、ナイロンブラ
シ等でスパッタ等の汚れを除去することもできる。That is, it has a Vickers hardness of about 250. Therefore, even if spatter or mist burn-in occurs while the reflecting mirror is in use, the surface can be cleaned by wiping it off in a solvent such as trichloride or alcohol. Further, stains such as spatter can also be removed using a nylon brush or the like.
また、モリブデンの融点は２６１０’Ｃと高いので、使
用時にスパッタや異物等が付き、レーザの照射により焼
きつきや蒸発を起こしても、モリブデンに損傷を生じる
おそれがない。Further, since the melting point of molybdenum is as high as 2610'C, there is no risk of damage to molybdenum even if spatter or foreign matter is attached during use and burn-in or evaporation occurs due to laser irradiation.
この発明において、モリブデンの薄膜は、たとえばイオ
ンプレーティングにより形成することができる。また、
モリブデンの薄膜の厚みは、０゜１〜２０μｍの範囲内
であることが好ましい。０゜１μｍより厚みが少ないと
、モリブデンを基板としたレーザ反射鏡のような硬度を
期待することができず、また２０μｍより厚くしても、
厚みに比例した、より顕著な効果が得られなくなるがら
である。In this invention, the molybdenum thin film can be formed, for example, by ion plating. Also,
The thickness of the molybdenum thin film is preferably in the range of 0.1 to 20 μm. If the thickness is less than 0.1 μm, you cannot expect the hardness of a laser reflector using molybdenum as a substrate, and even if it is thicker than 20 μm,
However, a more pronounced effect proportional to the thickness cannot be obtained.
［実施例］ 無酸素銅（ＯＦＨＣ）を用いて、直径４０ｍｍ。[Example] Made of oxygen-free copper (OFHC), diameter 40mm.
焦点距離１５０ｍｍの軸外し放物面鏡の基板を５ＰＤＴ
加工で切削し、Ｒａ−０，０８ｕｍ、面精度λ／２０（
λ−１０．６μｍ）とした。5PDT the substrate of an off-axis parabolic mirror with a focal length of 150 mm.
Cut by processing, Ra-0.08um, surface accuracy λ/20 (
λ-10.6 μm).
次に、この軸外し放物面鏡基板の上に、純度９９．９９
％のモリブデンペレットを原料として、イオンプレーテ
ィング法により、厚み５μｍのモリブデン薄膜を形成し
た。得られた放物面鏡のＣＯ２レーザの反射率は９８．
３％であり、前面のビッカース硬度は２４８であった。Next, on this off-axis parabolic mirror substrate, a 99.99 purity
% molybdenum pellets as a raw material, a molybdenum thin film with a thickness of 5 μm was formed by an ion plating method. The CO2 laser reflectance of the obtained parabolic mirror was 98.
3%, and the Vickers hardness of the front surface was 248.
この放物面鏡を、出力５ｋｗのＣＯ２レーザ加工機の加
工ヘッドに取付け、鉄系材料の切断工程に使用した。使
用につれて、放物面鏡の表面ではスパッタや工場雰囲気
中のミストの焼きつきを生じた。このような放物面鏡の
表面に付着したスパッタやミストを、水中でナイロンブ
ラシにより擦ったところ、はぼ完全に除去することがで
きた。This parabolic mirror was attached to the processing head of a CO2 laser processing machine with an output of 5 kW, and used in the cutting process of ferrous materials. As it was used, the surface of the parabolic mirror developed spatter and burned-in mist in the factory atmosphere. When the spatter and mist adhering to the surface of such a parabolic mirror were rubbed under water with a nylon brush, most of it could be completely removed.
この後、放物面鏡の反射率および面積度を測定したとこ
ろ、初期の値と同じλ／２０および９８゜３％の値が得
られた。Thereafter, when the reflectance and area degree of the parabolic mirror were measured, the same values as the initial values of λ/20 and 98°3% were obtained.
［発明の効果］
以上説明したように、この発明のレーザ反射鏡は、安価
でかつ高いレーザ反射率を有する銅または銅を主成分と
する合金を反射鏡基板に使用しているため、低価格でか
つ高い反射率のレーザ反射鏡とすることができる。[Effects of the Invention] As explained above, the laser reflector of the present invention uses copper or an alloy mainly composed of copper, which is inexpensive and has a high laser reflectivity, for the reflector substrate, so it is inexpensive. It is possible to obtain a laser reflecting mirror that is large and has a high reflectance.
また、この発明のレーザ反射鏡では、モリブデンの薄膜
が反射鏡基板の上に形成されているため、表面硬度が硬
く、反射鏡使用の際に汚れが付着しても、表面を損傷さ
せることなくこの汚れを除去することができる。In addition, in the laser reflector of this invention, since a thin molybdenum film is formed on the reflector substrate, the surface hardness is hard, and even if dirt adheres during use of the reflector, the surface will not be damaged. This stain can be removed.
したがって、この発明のレーザ反射鏡は、ｃ。Therefore, the laser reflecting mirror of this invention has c.
２レーザやＣＯレーザなどの赤外レーザ用のレーザ反射
鏡として使用すると特に有用である。It is particularly useful when used as a laser reflector for infrared lasers such as 2 lasers and CO lasers.
第１図は、この発明の一実施例を示す断面図である。第
２図は、従来のレーザ反射鏡の一例を示す断面図である
。第３図は、従来のレーザ反射鏡の他の例を示す断面図
である。第４図は、従来のレーザ反射鏡のさらに他の例
を示す断面図である。
図において、１はＣｕ基板、７はＭＯ薄膜を示す。
第１図
７Ｍｏ薄膜
／Ｃｕ基板
第４図FIG. 1 is a sectional view showing an embodiment of the present invention. FIG. 2 is a sectional view showing an example of a conventional laser reflecting mirror. FIG. 3 is a sectional view showing another example of a conventional laser reflecting mirror. FIG. 4 is a sectional view showing still another example of a conventional laser reflecting mirror. In the figure, 1 indicates a Cu substrate and 7 indicates an MO thin film. Fig. 1 7Mo thin film/Cu substrate Fig. 4
Claims (5)
板の上に、モリブデンの薄膜を形成したことを特徴とす
る、レーザ反射鏡。(1) A laser reflector characterized in that a thin film of molybdenum is formed on a reflector substrate made of copper or an alloy containing copper as a main component.
とする、請求項１記載のレーザ反射鏡。(2) The laser reflecting mirror according to claim 1, wherein the reflecting mirror substrate is mirror-finished.
工されている、請求項２記載のレーザ反射鏡。(3) The laser reflecting mirror according to claim 2, wherein the reflecting mirror substrate is mirror-finished by an ultra-precision cutting method.
より形成されていることを特徴とする、請求項１記載の
レーザ反射鏡。(4) The laser reflecting mirror according to claim 1, wherein the molybdenum thin film is formed by ion plating.
ｍであることを特徴とする、請求項１記載のレーザ反射
鏡。(5) The thickness of the molybdenum thin film is 0.1 to 20μ
The laser reflecting mirror according to claim 1, wherein the laser reflecting mirror is m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63135024A JPH0715523B2 (en) | 1988-05-31 | 1988-05-31 | Aspherical mirror for laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63135024A JPH0715523B2 (en) | 1988-05-31 | 1988-05-31 | Aspherical mirror for laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01303404A true JPH01303404A (en) | 1989-12-07 |
| JPH0715523B2 JPH0715523B2 (en) | 1995-02-22 |
Family
ID=15142152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63135024A Expired - Lifetime JPH0715523B2 (en) | 1988-05-31 | 1988-05-31 | Aspherical mirror for laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0715523B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03171001A (en) * | 1989-11-30 | 1991-07-24 | Toshiba Corp | Reflecting mirror |
| US5066611A (en) * | 1990-08-31 | 1991-11-19 | Micron Technology, Inc. | Method for improving step coverage of a metallization layer on an integrated circuit by use of molybdenum as an anti-reflective coating |
| US20130301151A1 (en) * | 2011-01-21 | 2013-11-14 | Carl Zeiss Smt Gmbh | Substrate for an euv-lithography mirror |
| JP2019203946A (en) * | 2018-05-22 | 2019-11-28 | 三菱重工業株式会社 | Fiber coupling device and laser processing apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5652701U (en) * | 1979-09-27 | 1981-05-09 |
-
1988
- 1988-05-31 JP JP63135024A patent/JPH0715523B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5652701U (en) * | 1979-09-27 | 1981-05-09 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03171001A (en) * | 1989-11-30 | 1991-07-24 | Toshiba Corp | Reflecting mirror |
| US5066611A (en) * | 1990-08-31 | 1991-11-19 | Micron Technology, Inc. | Method for improving step coverage of a metallization layer on an integrated circuit by use of molybdenum as an anti-reflective coating |
| US20130301151A1 (en) * | 2011-01-21 | 2013-11-14 | Carl Zeiss Smt Gmbh | Substrate for an euv-lithography mirror |
| US10935704B2 (en) | 2011-01-21 | 2021-03-02 | Carl Zeiss Smt Gmbh | Substrate for an EUV-lithography mirror |
| JP2019203946A (en) * | 2018-05-22 | 2019-11-28 | 三菱重工業株式会社 | Fiber coupling device and laser processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0715523B2 (en) | 1995-02-22 |
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