JPH01282502A - Method of reproducing diffraction grating - Google Patents
Method of reproducing diffraction gratingInfo
- Publication number
- JPH01282502A JPH01282502A JP11279888A JP11279888A JPH01282502A JP H01282502 A JPH01282502 A JP H01282502A JP 11279888 A JP11279888 A JP 11279888A JP 11279888 A JP11279888 A JP 11279888A JP H01282502 A JPH01282502 A JP H01282502A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- diffraction grating
- methyl methacrylate
- grooves
- monomer state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 34
- 239000000178 monomer Substances 0.000 claims abstract description 17
- 229920000642 polymer Polymers 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 11
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract description 16
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract description 11
- 239000004926 polymethyl methacrylate Substances 0.000 abstract description 11
- 229920003023 plastic Polymers 0.000 abstract description 5
- 239000004033 plastic Substances 0.000 abstract description 5
- 230000000379 polymerizing effect Effects 0.000 abstract description 3
- 239000011295 pitch Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- 238000000465 moulding Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 3
- 230000003362 replicative effect Effects 0.000 description 3
- 238000000748 compression moulding Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、光の分散素子として用いられる回折格子を複
製する回折格子複製方法に関し、より詳細には、プラス
チック製の回折格子を複製する回折格子複製方法に関す
るものである。[Detailed Description of the Invention] [Technical Field] The present invention relates to a diffraction grating duplication method for duplicating a diffraction grating used as a light dispersion element, and more particularly, a diffraction grating duplication method for duplicating a plastic diffraction grating. It is related to.
ホログラムディスクなどの複製法として従来知られてい
る紫外線硬化成形法（２Ｐ法）をプラスチック製の回折
格子の複製に応用することが提案されている。It has been proposed to apply the ultraviolet curing molding method (2P method), which is conventionally known as a method for replicating hologram disks, to replicating plastic diffraction gratings.
第２図（ａ）乃至（ｈ）は、紫外線硬化成形法による回
折格子複製の各］−程を示す図である。紫外線硬化成形
法では先づ、ガラス基板５０にレジスト５１を塗布後、
マスク６３に覆われていない部分においてＨｅ−Ｃｄレ
ーザ光８Ｍを干渉させレジスト５１にホログラム像を記
録させる（第２図（ａ））、次いで、レジスト５１をア
ルカリ性現像液で現像し溝５２を得る（第２図（ｂ）
） 、 Ｌかる後、レジスト５１上にスパッタ装置く例
えばトクダ８ＥＰ）によりＮｉスパッタ膜５３を約５０
０八程度形成する（第２図（Ｃ） ） 、次いでこのＮ
ｉスパッタ膜５３を電極として電鋳層（図示せず）で数
時間電鋳を行ない、Ｎ１層５４を所定の厚さまで形成す
る（第２図（ｄ））。しかる後、ガラス基板５０からＮ
１層５４を剥離し円筒状に成型し、これをスタンパ５５
として裏打台５６に接着する（第２図（ｅ））。このよ
うにして作製されたスタンパ５５は、レジスト５１の７
ｆ４５２とは逆の凸凹をもつ消６０を有し、このスタン
パ５５によりプラスチック製の回折格子を以下の工程で
複製する。FIGS. 2(a) to 2(h) are diagrams showing various stages of diffraction grating replication by the ultraviolet curing molding method. In the ultraviolet curing molding method, first, after coating the resist 51 on the glass substrate 50,
A hologram image is recorded on the resist 51 by interfering with the He-Cd laser beam 8M in the portion not covered by the mask 63 (FIG. 2(a)), and then the resist 51 is developed with an alkaline developer to obtain the grooves 52. (Figure 2(b)
), then a Ni sputtered film 53 with a thickness of approximately 50% is deposited on the resist 51 using a sputtering device (for example, Tokuda 8EP).
08 (Fig. 2 (C)), and then this N
Electroforming is performed using the i-sputtered film 53 as an electrode for several hours with an electroformed layer (not shown) to form the N1 layer 54 to a predetermined thickness (FIG. 2(d)). After that, from the glass substrate 50
One layer 54 is peeled off and formed into a cylindrical shape, and this is stamped with a stamper 55.
It is adhered to the backing table 56 as shown in FIG. 2(e). The stamper 55 manufactured in this way has seven parts of the resist 51.
The stamper 60 has a concave and convex shape opposite to that of the stamper 55, and a plastic diffraction grating is reproduced in the following steps using this stamper 55.
すなわち先づポリメタクリル酸メチルのアクリル基板５
７上に紫外線硬化樹脂５８（例えばフジハード）を塗布
後、紫外線ＵＶを照射する（第２図（ｆ） ） ６次に
スタンパ５５上に２Ｐｔｉｌ脂５９を滴下し２Ｐ樹脂５
９上に第２図（ｆ）の工程で形成されたアクリル基板５
７上の紫外線硬化樹脂５８を押し当てて紫外線Ｕ■を露
光して重合させる（第２図（（］））、Ｌかる後、２Ｐ
樹脂５９の付いたアクリル基板５７をスタンパ５５から
剥離することによって、第２図（ｈ）のようにプラスチ
ック製の回折格子６１を複製することができる。なお上
述の工程で紫外線硬化樹脂はアクリル基板５７と２Ｐｌ
！）ｆ脂５９との密着性を良くするために用いられてい
る。また回折格子６１すなわち２２樹脂５つの溝６２は
スタンパ５５の溝６０と凸凹が逆になっており、回折格
子６１の溝６２の深さ、ピッチはスタンパ５５の消６０
の深さによって定められる。That is, first, the acrylic substrate 5 of polymethyl methacrylate
After applying an ultraviolet curable resin 58 (for example, Fuji Hard) on the stamper 55, irradiate it with ultraviolet rays (Fig. 2 (f)). 6 Next, drop 2Ptil resin 59 on the stamper 55
The acrylic substrate 5 formed on the acrylic substrate 9 in the process shown in FIG. 2(f)
Press the ultraviolet curing resin 58 on 7 and expose it to ultraviolet rays U to polymerize it (Fig. 2 (())).
By peeling off the acrylic substrate 57 coated with the resin 59 from the stamper 55, a plastic diffraction grating 61 can be duplicated as shown in FIG. 2(h). In addition, in the above process, the ultraviolet curing resin is used for the acrylic substrate 57 and 2Pl.
! ) It is used to improve the adhesion with the fat 59. In addition, the grooves 62 of the diffraction grating 61, that is, the five grooves 62 of the 22 resin, have the grooves 60 of the stamper 55 and the concaves and convexities opposite to each other.
Determined by the depth of
このように、紫外線硬化成形法によれば、１つのスタン
パ５５によって同様な回折格子を多数複製できて、ガラ
ス基板上のレジストに１枚１枚露光して複製するような
方法に比べて生産性、コストなどの点で優れている。ま
たレコード盤作製に用いられている圧縮成形法、あるい
は金型に樹脂を溶融させて射出し冷却させて硬化させる
射出成形法に比べて、ピッチが小さい場合にも清の深い
すなわち回折効率の高い回折格子を複製できるという利
点がある。As described above, according to the ultraviolet curing molding method, a large number of similar diffraction gratings can be replicated using one stamper 55, and productivity is improved compared to a method in which each resist on a glass substrate is exposed and replicated one by one. It is superior in terms of cost, etc. In addition, compared to the compression molding method used to make vinyl records, or the injection molding method in which resin is melted and injected into a mold and then cooled and hardened, the crystal clarity is deep even when the pitch is small, that is, the diffraction efficiency is high. This has the advantage that the diffraction grating can be replicated.
しかしながら紫外線硬化成形法の上述したような工程は
、圧縮成形法、射出成形法の工程に比べて複雑であり生
産性が悪いという問題があった。However, the above-mentioned steps of the ultraviolet curing molding method are more complicated than the steps of compression molding and injection molding, and have a problem of poor productivity.
また紫外線硬化樹脂によってアクリル基板５７と２ＰＭ
！４脂５９との密着性を良くしているものの、密着の度
合によって、スタンパ５５から回折格子６１を剥離する
際に２ＰｖＡ脂５９がアクリル基板５７から剥離する場
合があった。さらに２ＰＶＩｊ脂５９は架橋性ポリマー
であるため、スタンパ５５から剥離する際に細かな欠け
（割れ、ひびなど）が生ずる場合があり、回折格子を確
実にかつ信頼性高く複製できない恐れかあった。In addition, the acrylic substrate 57 and 2PM are made of ultraviolet curing resin.
! Although the 2PvA resin 59 has good adhesion with the acrylic substrate 59, depending on the degree of adhesion, the 2PvA resin 59 may be peeled off from the acrylic substrate 57 when the diffraction grating 61 is peeled off from the stamper 55. Further, since the 2PVIj resin 59 is a crosslinkable polymer, small chips (cracks, cracks, etc.) may occur when it is peeled off from the stamper 55, and there is a fear that the diffraction grating cannot be accurately and reliably replicated.
本発明は、ピッチが小さい場合にも清が深く回折効率の
高い回折格子を簡単な工程で確実にかつ信頼性良く複製
することの可能な回折格子複製方法を提供することを目
的としている。An object of the present invention is to provide a method for duplicating a diffraction grating that can reliably and reliably reproduce a diffraction grating with deep clarity and high diffraction efficiency through a simple process even when the pitch is small.
本発明は上記の目的を達成させるため、重合することに
より線形ポリマーとなるモノマー状態の材料をスタンパ
上に流入させる工程と、スタンパ上に流入したモノマー
状態の材料を重合させる工程と、重合した透明な線形ポ
リマーをスタンパから薊離し回折格子として複製する工
程とを備えていることを特徴としたものである。In order to achieve the above object, the present invention comprises a step of flowing onto a stamper a material in a monomer state that becomes a linear polymer by polymerization, a step of polymerizing the material in a monomer state that has flowed onto the stamper, and a step of polymerizing a material in a monomer state that becomes a linear polymer by polymerization. The method is characterized by comprising a step of separating a linear polymer from a stamper and replicating it as a diffraction grating.
以下、本発明の一実施例に基づいて具体的に説明する。Hereinafter, a detailed explanation will be given based on one embodiment of the present invention.
第１図（ａ）乃至（ｄ）は本発明に係る回折格子複製方
法の一実施例の各工程を示す図である。FIGS. 1(a) to 1(d) are diagrams showing each step of an embodiment of the diffraction grating duplication method according to the present invention.
本実施例では、先づ第１図（ａ）のように回折格子複製
用の清６０を有するスタンパ５５を形成し、このスタン
パ５５に囲い１を設ける。なおスタンパ５５の形成工程
は、前述した第２図（ａ）乃至（ｅ）の工程と同じであ
るので説明を省略する。次いで第１図（ｆｉ）のように
、囲い１の中にモノマー状態のメタクリル酸メチル２を
流し込む。メタクリル酸メチル２はモノマー状態では粘
性が低い液体であり、これによってスタンパ５５の漬６
０の奥まで流れ込む。メタクリル酸メチル２には、不純
物を除去、精製しＮ２置換を充分性なった後、重合開始
剤（例えばベンゾイルペルオキシド）が溶解される。な
おＮ２置換は、重合禁止作用のある酸素０２をメタクリ
ル酸メチル２から除去するためである。In this embodiment, first, as shown in FIG. 1(a), a stamper 55 having a groove 60 for duplicating a diffraction grating is formed, and a enclosure 1 is provided on this stamper 55. Note that the process of forming the stamper 55 is the same as the process shown in FIGS. 2(a) to 2(e) described above, so a description thereof will be omitted. Next, as shown in FIG. 1(fi), methyl methacrylate 2 in a monomer state is poured into enclosure 1. Methyl methacrylate 2 is a liquid with low viscosity in its monomer state, which makes it difficult to soak the stamper 55 in the 6
It flows deep into 0. A polymerization initiator (for example, benzoyl peroxide) is dissolved in methyl methacrylate 2 after impurities are removed and purified to ensure sufficient N2 substitution. The purpose of the N2 substitution is to remove oxygen 02, which has a polymerization inhibiting effect, from methyl methacrylate 2.
このようにして囲い１の中に流し込んだモノマー状態の
メタクリル酸メチル２を熱重合あるいは光重合させ、第
１図ｆｃ）に示すように透明でかつ線形ポリマーのポリ
メタクリル酸メチル３にする。The monomeric methyl methacrylate 2 poured into the enclosure 1 is thermally or photopolymerized to form a transparent linear polymer polymethyl methacrylate 3 as shown in FIG. 1 fc).
しかる後、ポリメタクリル酸メチル３をスタンパ５５か
ら剥離して、これを第１図（ｄ）に示すようにスタンパ
５５の涌６０と凸凹が逆の消４を有する透明な回折格子
として複製できる。なお剥離の際に回折格子の倒れが生
じる場合にはこれをアニール等によって是正することが
できる。Thereafter, the polymethyl methacrylate 3 is peeled off from the stamper 55, and it can be reproduced as a transparent diffraction grating having a concave and convex concave portion 4 having a concavity and convexity opposite to that of the concave portion 60 of the stamper 55, as shown in FIG. 1(d). Note that if the diffraction grating collapses during peeling, this can be corrected by annealing or the like.
上述した工程において、粘性の低いモノマー状態のメタ
クリル酸メチル２はスタンパ５５の１６０のピッチが小
さい場合でもスタンパ５５の消６０の奥まで流れるので
、プラスチック材料が講の奥まで入らないといった従来
の射出成形法で懸念されていた問題が解決され、ピッチ
が小さい場合にも回折効率の高い回折格子を複製するこ
とが可能となる。In the above-mentioned process, methyl methacrylate 2 in a monomer state with low viscosity flows to the depths of the eraser 60 of the stamper 55 even if the pitch of 160 of the stamper 55 is small. This solves the problems associated with the molding method, and makes it possible to replicate diffraction gratings with high diffraction efficiency even when the pitch is small.
また重合したポリメタクリル酸メチル３は、線形ポリマ
ーであるなめ、紫外線硬化成形法に用いられる架橋性ポ
リマーの２Ｐ樹脂に比べてそりに強く、欠けにくい特性
を有しており、これにより、ポリメタクリル酸メチル３
をスタンパ５５から剥離する際にポリメタクリル酸メチ
ル３すなわち複製された回折格子に割れやひびが生ずる
確率を著しく低減できる。In addition, polymerized polymethyl methacrylate 3 has characteristics that are more resistant to warping and less likely to chip than the linear polymer 2P resin, which is a crosslinkable polymer used in ultraviolet curing molding methods. methyl acid 3
When peeling off the polymethyl methacrylate 3 from the stamper 55, the probability that cracks will occur in the polymethyl methacrylate 3, that is, the replicated diffraction grating, can be significantly reduced.
さらに、紫外線硬化成形法におけるアクリル基板や紫外
線硬化樹脂の形成処理工程等が不要となり、メタクリル
酸メチル３の重合工程を行なうだけで良いので、工程を
著しく簡単化することが可能となるとともに、複製され
た回折格子は基板として機能する部分をも含めて全て同
成分のポリメタクリル酸メチル３で一体に形成されてい
るので、紫外線硬化成形法において２Ｐｔ！Ｊ脂がアク
リル基板から剥離するというような問題は生じない６以
上のように、本実施例によれば、モノマー状態のメタク
リル酸メチル２をスタンパ５５上に流し込み、メタクリ
ル酸メチルを重合させてポリメタクリル酸メチル３とし
、これをスタンパ５５から剥離するだけで、回折効率が
高い回折格子を極めて簡単な工程で確実にかつ信頼性良
く複製できる。Furthermore, the process of forming an acrylic substrate and UV-curable resin in the ultraviolet-curing molding method is no longer necessary, and only the polymerization process of methyl methacrylate 3 is required, which significantly simplifies the process and allows for duplication. The entire diffraction grating, including the part that functions as a substrate, is integrally formed from polymethyl methacrylate 3, which has the same composition. No problem such as peeling of J resin from the acrylic substrate occurs.6 According to the present example, methyl methacrylate 2 in a monomer state is poured onto the stamper 55, and the methyl methacrylate is polymerized to form a polyester. By simply peeling methyl methacrylate 3 from the stamper 55, a diffraction grating with high diffraction efficiency can be reliably and reliably reproduced in an extremely simple process.
なお、上述の実施例では、スタンパ５５に流し込む材料
としてモノマー状態のメタクリル酸メチル２を用いたが
、他のモノマー状態の材料を用いても良い、ただし、架
橋性モノマーは、これを重合させてスタンパ５５から剥
離する際に割れることが多く用いることができない。従
って、モノマー状態の材料としては、重合することによ
って透明な線形ポリマーを与えるものが望ましい。In the above embodiment, methyl methacrylate 2 in a monomer state was used as the material poured into the stamper 55, but other monomer materials may also be used. It cannot be used because it often breaks when peeled off from the stamper 55. Therefore, it is desirable that the material in the monomer state be one that can be polymerized to give a transparent linear polymer.
以上に説明したように、本発明によれば、モノマー状態
の材料をスタンパ上に流入させ、これを重合することに
より透明な線形ポリマーとし、重合した線形ポリマーを
スタンパから剥離し回折格子として複製するようにして
いるので、回折効率の高い回折格子を簡単な工程で確実
にかつ信頼性良く複製できる。As explained above, according to the present invention, a material in a monomer state is flowed onto a stamper, polymerized to form a transparent linear polymer, and the polymerized linear polymer is peeled off from the stamper and replicated as a diffraction grating. As a result, a diffraction grating with high diffraction efficiency can be reliably and reliably replicated through a simple process.
第１図（ａ）乃至（ｄ）は本発明に係る回折格子複製方
法の各工程を示す図、第２図（ａ）乃至（ｈ）は紫外線
硬化成形法に基づ〈従来の回折格子複製方法の各工程を
示す図である。
２・・・モノマー状態のメタクリル酸メチル、３・・・
線形ポリマーのポリメタクリル酸メチル、５５・・・ス
タンパ
特許出願人 株式会社 リ コ −
第１図
第２図Figures 1 (a) to (d) are diagrams showing each step of the diffraction grating duplication method according to the present invention, and Figures 2 (a) to (h) are diagrams showing the steps of the diffraction grating duplication method according to the present invention. FIG. 3 is a diagram showing each step of the method. 2... Methyl methacrylate in monomer state, 3...
Linear polymer polymethyl methacrylate, 55... Stamper patent applicant Rico Co., Ltd. - Figure 1 Figure 2
Claims (1)
材料をスタンパ上に流入させる工程と、スタンパ上に流
入したモノマー状態の材料を重合させる工程と、重合し
た透明な線形ポリマーをスタンパから剥離し回折格子と
して複製する工程とを備えていることを特徴とする回折
格子複製方法。A process in which a material in a monomer state that becomes a linear polymer by polymerization is flowed onto the stamper, a process in which the material in a monomer state that has flowed onto the stamper is polymerized, and the polymerized transparent linear polymer is peeled off from the stamper and used as a diffraction grating. A method for duplicating a diffraction grating, comprising the step of duplicating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11279888A JPH01282502A (en) | 1988-05-10 | 1988-05-10 | Method of reproducing diffraction grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11279888A JPH01282502A (en) | 1988-05-10 | 1988-05-10 | Method of reproducing diffraction grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01282502A true JPH01282502A (en) | 1989-11-14 |
Family
ID=14595786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11279888A Pending JPH01282502A (en) | 1988-05-10 | 1988-05-10 | Method of reproducing diffraction grating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01282502A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006091555A (en) * | 2004-09-24 | 2006-04-06 | Fuji Photo Film Co Ltd | Method for forming rugged pattern and method for manufacturing optical element |
-
1988
- 1988-05-10 JP JP11279888A patent/JPH01282502A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006091555A (en) * | 2004-09-24 | 2006-04-06 | Fuji Photo Film Co Ltd | Method for forming rugged pattern and method for manufacturing optical element |
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