JPH01248335A - Substrate for optical recording medium and its production - Google Patents
Substrate for optical recording medium and its productionInfo
- Publication number
- JPH01248335A JPH01248335A JP63075080A JP7508088A JPH01248335A JP H01248335 A JPH01248335 A JP H01248335A JP 63075080 A JP63075080 A JP 63075080A JP 7508088 A JP7508088 A JP 7508088A JP H01248335 A JPH01248335 A JP H01248335A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- curable resin
- glass substrate
- optical recording
- coupling agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 83
- 230000003287 optical effect Effects 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229920005989 resin Polymers 0.000 claims abstract description 46
- 239000011347 resin Substances 0.000 claims abstract description 46
- 239000011521 glass Substances 0.000 claims abstract description 37
- 238000004140 cleaning Methods 0.000 claims abstract description 20
- 239000003999 initiator Substances 0.000 claims abstract description 13
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000007822 coupling agent Substances 0.000 claims abstract 3
- 229910000077 silane Inorganic materials 0.000 claims abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 17
- -1 methacryloyl group Chemical group 0.000 claims description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 7
- 150000004756 silanes Chemical class 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000004417 polycarbonate Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 239000004814 polyurethane Substances 0.000 claims description 4
- 229920002635 polyurethane Polymers 0.000 claims description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 239000006087 Silane Coupling Agent Substances 0.000 abstract description 21
- 230000007547 defect Effects 0.000 abstract description 13
- 239000000178 monomer Substances 0.000 abstract description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 3
- 239000003085 diluting agent Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 230000007613 environmental effect Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 8
- 229920005862 polyol Polymers 0.000 description 7
- 150000003077 polyols Chemical class 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- YNTQTLGBCMXNFX-UHFFFAOYSA-N [5-ethyl-2-(2-methyl-1-prop-2-enoyloxypropan-2-yl)-1,3-dioxan-5-yl]methyl prop-2-enoate Chemical compound C=CC(=O)OCC1(CC)COC(C(C)(C)COC(=O)C=C)OC1 YNTQTLGBCMXNFX-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- BRWYXBQGVNYOBM-UHFFFAOYSA-N 2,2-dichloro-1-(3-phenoxyphenyl)ethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC(OC=2C=CC=CC=2)=C1 BRWYXBQGVNYOBM-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- 229940095095 2-hydroxyethyl acrylate Drugs 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- XQTJQXCPQYOAIJ-UHFFFAOYSA-N 4-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OC(CC)CCCOC(=O)C=C XQTJQXCPQYOAIJ-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- UXMQORVHJMUQFD-UHFFFAOYSA-N Heptanophenone Chemical compound CCCCCCC(=O)C1=CC=CC=C1 UXMQORVHJMUQFD-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-BREBYQMCSA-N [(1r,3r,4r)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] prop-2-enoate Chemical compound C1C[C@@]2(C)[C@H](OC(=O)C=C)C[C@@H]1C2(C)C PSGCQDPCAWOCSH-BREBYQMCSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- FPODCVUTIPDRTE-UHFFFAOYSA-N bis(prop-2-enyl) hexanedioate Chemical compound C=CCOC(=O)CCCCC(=O)OCC=C FPODCVUTIPDRTE-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- RBVLUTAXWVILBT-UHFFFAOYSA-N ethyl prop-2-eneperoxoate Chemical compound CCOOC(=O)C=C RBVLUTAXWVILBT-UHFFFAOYSA-N 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical class CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229940042596 viscoat Drugs 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光ビームにより再生のみ記録・再生または消
去・記録・再生を行うことが可能な光学的記録媒体用基
盤及びその製造方法に関する。より詳しくは、２Ｐ （
Ｐｈｏｔｏ Ｐｏｌｙｍｅｒｉｚａｔｉｏｎ）法と呼
ばれる方法で案内溝及び／又はプリフォーマット信号の
信号ピットを形成する光学的記録媒体用基盤及びその製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical recording medium base capable of recording/reproducing only reproduction or erasing/recording/reproducing using a light beam, and a method for manufacturing the same. For more details, please refer to 2P (
The present invention relates to an optical recording medium substrate in which guide grooves and/or signal pits for preformat signals are formed by a method called a photo polymerization method, and a method for manufacturing the same.
２Ｐ （Ｐｈｏｔｏ Ｐｏｌｙｍｅｒｉｚａｔｉｏｎ
）法は、特公昭６１−２９０５３号等に記載されている
ように、ガラス基板を用い、該基板が案内溝及び／又は
プリフォーマット信号の信号ピットを形成する硬化型樹
脂層と接触すべき面上に、前処理としてシランカップリ
ング剤処理を行うことにより、ガラス基板と硬軟樹脂層
が良好に固着されるとされている。2P (Photo Polymerization
) method, as described in Japanese Patent Publication No. 61-29053, etc., uses a glass substrate, and the surface of the substrate that is to be in contact with a hardening resin layer forming guide grooves and/or signal pits of preformat signals. Moreover, it is said that by performing a silane coupling agent treatment as a pretreatment, the glass substrate and the hard/soft resin layer can be bonded well.
また特開昭６１−２９０５３に記載されているように、
ガラス基板」二にＵＶ／Ｏ３洗浄処理を施した後、シラ
ンカップリング剤としてヘキサメチルジシラザンを用い
て、シランカップリング剤処理を施した後、このヘキサ
メチルジシラザン膜上にフォトレジスト膜を形成すると
、カラス基板とフォトレジスト膜との密着性が向上する
とされている。Also, as described in Japanese Patent Application Laid-Open No. 61-29053,
After UV/O3 cleaning treatment is applied to the glass substrate 2, a silane coupling agent treatment is performed using hexamethyldisilazane as a silane coupling agent, and then a photoresist film is formed on the hexamethyldisilazane film. It is said that when formed, the adhesion between the glass substrate and the photoresist film is improved.
〔発明が解決しようとしている問題点〕しかしながら、
上記のような２Ｐ法においては、ガラス基板と硬化型樹
脂層との間にシランカップリング剤層を設けるシランカ
ップリング剤処理を施すにあたり、ガラス基板表面上に
おけるシランカップリング剤とカラス基板表面との反応
が均一に起りに＜（、カラス基板とシランカップリング
剤層との部分的な固着不良が生じる場合がある。[Problem that the invention is trying to solve] However,
In the above-mentioned 2P method, when performing silane coupling agent treatment to provide a silane coupling agent layer between the glass substrate and the curable resin layer, the silane coupling agent on the glass substrate surface and the glass substrate surface are If the reaction occurs uniformly, partial adhesion failure between the glass substrate and the silane coupling agent layer may occur.
その結果、２Ｐ層（硬化型樹脂層）がガラス基板に均一
に固着せず、外観上の欠陥を生じ、これが光学的記録媒
体用の基板の光学的欠陥となるという問題があった。ま
た、ガラス基板表面に均一なシランカップリング剤層が
形成されないため、２Ｐ層の塗布ムラを生じ、２Ｐ層の
厚みのバラツキが大となるという問題があった。また、
ガラス基板と２Ｐ層の密着性も十分ではなく、環境耐久
試験で２Ｐ層がカラス基板より剥離を生じるという問題
があった。As a result, the 2P layer (curable resin layer) does not adhere uniformly to the glass substrate, causing defects in appearance, which cause optical defects in the substrate for optical recording media. Furthermore, since a uniform silane coupling agent layer is not formed on the surface of the glass substrate, there is a problem in that uneven coating of the 2P layer occurs and the thickness of the 2P layer becomes highly uneven. Also,
The adhesion between the glass substrate and the 2P layer was also insufficient, and there was a problem in that the 2P layer peeled off from the glass substrate in an environmental durability test.
また、ガラス基板上にＵＶ／Ｏ３洗浄処理を施した後、
シランカップリング剤としてヘキサメチルジシラザンを
用いて、ヘキサメチルジシラザン膜を形成し、この上に
２Ｐ法により硬化型樹脂製の案内溝及びプリフォーマッ
ト信号を形成しても、カラス基板と２Ｐ層の密着性は十
分てなく、環境耐久試験で２Ｐ層がカラス基板より剥離
するという問題があった。In addition, after performing UV/O3 cleaning treatment on the glass substrate,
Even if a hexamethyldisilazane film is formed using hexamethyldisilazane as a silane coupling agent, and a curable resin guide groove and preformat signal are formed on this film by the 2P method, the glass substrate and the 2P layer The adhesion was not sufficient, and there was a problem that the 2P layer peeled off from the glass substrate during an environmental durability test.
また、２Ｐ層上に記録層及び保護層を形成した光学的記
録媒体は、環境耐久試験（７０°Ｃ１８５％ＲＨ。In addition, the optical recording medium in which a recording layer and a protective layer were formed on the 2P layer was subjected to an environmental durability test (70°C, 185%RH).
５．０００）時間放置後に記録特性の低下を生じるとい
う問題があった。特に、記録層として磁気記録層を用い
た場合、Ｃ／Ｎ、記録感度が初期に比べて変化するとい
う問題があった。また、２Ｐ層上に記録層及び保護層と
して応力の大きい膜を形成した場合、成膜中の基板温度
の上昇により２Ｐ層が軟化し、また基板温度の上昇を防
いて成膜しても、２Ｐ層上に形成した膜の応力により環
境耐久試験後に２Ｐ層にクラック或いはフクレなどの外
観上の欠陥が発生した。5.000) There was a problem in that recording characteristics deteriorated after being left for a period of time. In particular, when a magnetic recording layer is used as the recording layer, there is a problem that the C/N and recording sensitivity change compared to the initial state. Furthermore, if a film with high stress is formed as a recording layer and a protective layer on the 2P layer, the 2P layer will soften due to the rise in substrate temperature during film formation, and even if the film is formed while preventing the rise in substrate temperature, Due to the stress of the film formed on the 2P layer, external defects such as cracks or blisters occurred in the 2P layer after the environmental durability test.
本発明の目的は上記問題点を解決し、ガラス基板と案内
溝及び／又は信号ピットを形成している硬化性樹脂層と
の密着性のすぐれた光学的記録媒体用基盤及びその製造
方法を提供することにある。An object of the present invention is to solve the above-mentioned problems and provide a base for an optical recording medium that has excellent adhesion between a glass substrate and a curable resin layer forming guide grooves and/or signal pits, and a method for manufacturing the same. It's about doing.
本発明の上記目的は、基板上に２Ｐ法を用いて硬化型樹
脂製の案内溝及び／又は信号ピットを設けて光学的記録
媒体用基盤を製造する際に、まず基板表面にＵＶ／Ｏ３
洗浄及び／又はプラズマ洗浄を施し、次いでエテン系不
飽和シランを塗布し、最後に該塗布膜上に硬化型樹脂製
の案内溝及び／又は信号ピットを形成することによって
達成される。また、この硬化型樹脂としては、（Ａ）１
０〜５０重量％のポリウレタンアクリレート又はポリカ
ーボネートアクリレート、（Ｂ）下記の構造、を有する
１０〜８０重量％のアクリル酸エステル及び（Ｃ） １
．０〜４．０重量％の光重合開始剤を含み、２個のアク
リロイル基又はメタクリロイル基を有するものが用いら
れる。The above-mentioned object of the present invention is to first apply UV/O3 to the surface of the substrate when producing a substrate for an optical recording medium by providing guide grooves and/or signal pits made of curable resin on the substrate using the 2P method.
This is accomplished by performing cleaning and/or plasma cleaning, then applying ethene-based unsaturated silane, and finally forming guide grooves and/or signal pits made of a curable resin on the coating film. Moreover, as this curable resin, (A)1
0 to 50% by weight polyurethane acrylate or polycarbonate acrylate, (B) 10 to 80% by weight acrylic ester having the following structure, and (C) 1
．． One containing 0 to 4.0% by weight of a photopolymerization initiator and having two acryloyl groups or methacryloyl groups is used.
以下、本発明の実施例を図面を用いて詳細に説明する。 Embodiments of the present invention will be described in detail below with reference to the drawings.
本発明によれば、２Ｐ法を用いて基盤を製造する方法に
おいて、基板としては化学強化ガラス、青色ガラス等の
透明カラス基板が用いられ、シランカップリング剤処理
前に該基板表面をＵ■１０３洗浄及び／又はプラズマ洗
浄等を行い、カラス基板表面に付着する有機物を分解除
去し、ガラス表面に○Ｉ（基が形成するようにしてお（
。ＵＶ／Ｏ３洗浄、プラズマ洗浄の処理の程度はガラス
表面上の水の接触角が００ となる程度にすることが
好ましい。According to the present invention, in the method of manufacturing a substrate using the 2P method, a transparent glass substrate such as chemically strengthened glass or blue glass is used as the substrate, and the surface of the substrate is Cleaning and/or plasma cleaning is performed to decompose and remove organic matter adhering to the surface of the glass substrate, and to form ○I (groups) on the glass surface.
. The degree of UV/O3 cleaning and plasma cleaning is preferably such that the contact angle of water on the glass surface is 00.
ここで、Ｕ■１０３洗浄て用いられるＵＶランプとして
はＵＶ波長〜３００ｎｍの範囲の低圧水銀ランプが用い
られる。シランカップリング剤としては、エテン系不飽
和シラン、メルカプトシラン、アミノシラン、エポキシ
シラン、ヘキサメチルジシラザンが挙げられる。硬化型
樹脂としては、プレポリマー成分（Ａ）、反応性稀釈剤
としてのモノマー成分（Ｂ）、光重合開始剤成分（Ｃ）
の組成よりなるものが挙げられ、（Ａ）成分としては、
ポリオールポリアクリレ−１・（多価アルコールまたは
ポリエーテルポリオールアクリレート）で特に３官能以
上のポリオールポリアクリレート（ペンタエリスリトー
ルトリアクリレート、ジペンクエリスリトリトール、ヘ
キサアクリレートなど）、変性ポリオールポリアクリレ
ート、多価フェノールであるビスフェールＡやビスフェ
ノールＳにエポキシドを付加させた変性ジオールのジア
クリレート、ポリエステルアクリレート（多価アルコー
ル、多塩基酸あるいはその無水物およびアクリル酸のｃ
ｏｎｄｅｎｓａｔｉｏｎ ｔｅｌｏｍｅｒｉｚａｔｏ
ｎにより製造される）、ウレタンアクリレート（ポリエ
ーテルポリオール、ポリエステルポリオールなどのポリ
オールとポリイソシアネートとヒドロキシ基をもつアク
リレートとを反応させたもの）、エポキシアクリレート
（エポキシ化合物にアクリル酸または末端カルホキシル
基を有するアクリレートを付加反応させて得られるオリ
ゴマー）、ビスフェールＡシグリシジエーテル型、ノボ
ラックグリシジルエーテル型、エポキシ化油脂、エポキ
シ化ブタジェン、脂肪酸変性エポキシ樹脂、或いはポリ
カーボネートアクリレート（ポリカーボネートポリオー
ルとヒドロキシ基をもつアクリレートとを反応させて得
られるもの）などが用いられる。（Ｂ）成分としては、
多価アルコールのアクリル酸エステルが用いられ、単官
能性アクリル系モノマーとしては、シクロへキシルアク
リレート、ベンジルアクリレ−１−、カルピトールアク
リレート、２−エチルへキシルアクリレ−１・、ラウリ
ルアクリレート、２−ヒドロキシ−エチルアクリレート
、グリシジルアクリレート、ジシクロペンタジェンエト
キシアクリレート、イソボルニルアクリレート、水素化
ジシクロペンタジェンアクリレート、ジシクロペンテン
ルーアクリレート等が挙げられる。多官能性アクリル系
モノマーとしては、エチレングリコールジアクリレート
、ジエチレングリコールジアクリレート、トリエチレン
グリコールジアクリレート、ポリエチレングリコールジ
アクリレート、ポリプロピレングリコールジアクリレー
ト、ブチレングリコールジアクリレート、ネオペンチル
グリコールジアクリレート、１，４−ブタン−ジオール
ジアクリレート、１，４−ヘキサンジオールジアクリレ
ート、１．６−ヘキサンジオールジアクリレート、ペン
タエリスリトールジアクリレート等のジアクリレート類
、ペンタエリスリトールトリアクリレート、トリメチロ
ールプロパントリアクリレート等のトリアクリレート類
が挙げられる。アリル系の多官能性モノマーとしては、
ジアリルフタレート、ジアリルイソフタラード、ジアリ
ルクロレンダ−１・、ジアリルアジパート、ジアリルグ
リコラート、トリアリルシアヌラート、ジエチレングリ
コール−ビスアリルカーボネート等が挙げられる。（Ｂ
）成分はこれらの一種または二種以上の混合系でもよい
。Here, as the UV lamp used for U103 cleaning, a low pressure mercury lamp having a UV wavelength in the range of 300 nm is used. Examples of the silane coupling agent include ethene-based unsaturated silane, mercaptosilane, aminosilane, epoxysilane, and hexamethyldisilazane. The curable resin includes a prepolymer component (A), a monomer component (B) as a reactive diluent, and a photopolymerization initiator component (C).
Component (A) includes:
Polyol polyacrylate-1 (polyhydric alcohol or polyether polyol acrylate), especially trifunctional or higher functional polyol polyacrylate (pentaerythritol triacrylate, dipene querrythritol, hexaacrylate, etc.), modified polyol polyacrylate, polyhydric Diacrylates of modified diols made by adding epoxide to bisphenol A and bisphenol S, polyester acrylates (polyhydric alcohols, polybasic acids or their anhydrides, and acrylic acid c)
ondensation telomerizato
n), urethane acrylates (products made by reacting polyols such as polyether polyols and polyester polyols with polyisocyanates and acrylates with hydroxy groups), epoxy acrylates (products with acrylic acid or terminal carboxyl groups in the epoxy compound) (oligomer obtained by addition reaction of acrylate), bisphenol A siglycidyl ether type, novolac glycidyl ether type, epoxidized oil or fat, epoxidized butadiene, fatty acid-modified epoxy resin, or polycarbonate acrylate (polycarbonate polyol and acrylate with hydroxyl group) (obtained by reacting), etc. are used. (B) As the component,
Acrylic esters of polyhydric alcohols are used, and monofunctional acrylic monomers include cyclohexyl acrylate, benzyl acrylate-1-, carpitol acrylate, 2-ethylhexyl acrylate-1, lauryl acrylate, 2- Hydroxy-ethyl acrylate, glycidyl acrylate, dicyclopentadiene ethoxy acrylate, isobornyl acrylate, hydrogenated dicyclopentadiene acrylate, dicyclopentene-acrylate, and the like. Examples of polyfunctional acrylic monomers include ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, butylene glycol diacrylate, neopentyl glycol diacrylate, and 1,4-butane. -Diacrylates such as diol diacrylate, 1,4-hexanediol diacrylate, 1,6-hexanediol diacrylate, and pentaerythritol diacrylate; and triacrylates such as pentaerythritol triacrylate and trimethylolpropane triacrylate. It will be done. As an allylic polyfunctional monomer,
Examples include diallyl phthalate, diallyl isophthalate, diallyl chlorenda-1., diallyl adipate, diallyl glycolate, triallyl cyanurate, diethylene glycol-bisallyl carbonate, and the like. (B
) The component may be one kind or a mixture of two or more kinds thereof.
（Ｃ）成分としては、公知のどのような光重合開始剤で
も使用てきるが、配合後の貯蔵安定性のよいものが望ま
しい。例えばベンゾインエチルエーテル、ベンゾインブ
チエーテルなどのベンゾインアルキルエーテル系、２，
２′ −ジェトキシアセトフェノン、４′ −フェノキ
シ−２，２−ジクロロアセトフェノンなどのアセトフェ
ノン系、２−ヒドロキシ−２−メチルプロピオフェノン
、４′ −イソプロピル−２−ヒドロキシ−２−メチル
プロピオフェノンなどのプロピオフェノン系、ベンジル
メチルケタール、１−ヒドロキシシクロへキシルフェニ
ルケトン及び２−エチルアントラキノン、２−クロルア
ントラキノンなどアントラキノン系、２，４−ジメチル
チオキサントン、ミヒラーケトンなどのチオキサントン
系などが挙げられる。これは一種または二種以上を任意
の割合で混合して用いられる。As component (C), any known photopolymerization initiator can be used, but those with good storage stability after blending are desirable. For example, benzoin alkyl ethers such as benzoin ethyl ether and benzoin butiether, 2,
Acetophenones such as 2'-jetoxyacetophenone, 4'-phenoxy-2,2-dichloroacetophenone, 2-hydroxy-2-methylpropiophenone, 4'-isopropyl-2-hydroxy-2-methylpropiophenone, etc. Examples include propiophenone series, benzyl methyl ketal, 1-hydroxycyclohexylphenyl ketone, anthraquinone series such as 2-ethylanthraquinone and 2-chloroanthraquinone, and thioxanthone series such as 2,4-dimethylthioxanthone and Michler's ketone. These can be used alone or in a mixture of two or more in any proportion.
光学的記録媒体の環境耐久試験後のＣ／Ｎ、感度低下の
原因を分析、調査した結果、２Ｐ樹脂硬化物中の未硬化
モノマー前記（Ｂ）成分、光重合開始剤前記（Ｃ）成分
及び（Ｃ）成分の分解生成物としての、ベンズアルデヒ
ド、アセトアルデヒド等のアルデヒド類、ヘキシルフェ
ニルケトン、アセトン等のケトン類、ペンジルアルコー
ルン、メタノール等のアルコール類等の低分子量物の記
録層への揮発、拡散であることがわかった。特に記録層
として、ＴｂＣｏ、ＧｃｌＴｂＦｅ、ＴｂＦｅＣｏ、Ｇ
ｄＴｂＦｅＣ。As a result of analyzing and investigating the causes of C/N and sensitivity reduction after environmental durability tests of optical recording media, we found that the uncured monomer (B) component, the photopolymerization initiator (C) component, and the photopolymerization initiator (C) component in the 2P resin cured product (C) Volatilization of low molecular weight substances such as aldehydes such as benzaldehyde and acetaldehyde, ketones such as hexyl phenyl ketone and acetone, and alcohols such as pendylalcoholne and methanol into the recording layer as decomposition products of component (C). , was found to be diffuse. In particular, as a recording layer, TbCo, GclTbFe, TbFeCo, G
dTbFeC.
等の非晶質磁気記録層を用い、保護層としてＳｉＮ。using an amorphous magnetic recording layer such as SiN as a protective layer.
ＳｉＯｘ、 ＺｎＳ、 ＳｉＣ等の一種あるいは二
種の組み合わせの積層膜を該２Ｐ樹脂層上に真空蒸着又
はスパッタリング等で形成した光磁気記録媒体の場合、
前記低分子量物の記録層への揮発、拡散により、該磁気
記録層のキュリー温度が１５〜２０°Ｃ上昇することが
判り、これによりＣ／Ｎ記録感度が変化することが判っ
た。この結果から、本発明者らは、揮発、拡散する該低
分子量物が少ない２Ｐ樹脂を用いればよいことを見い出
した。即ち、２Ｐ樹脂特性の検討より、２Ｐ樹脂硬化物
の加熱減量開始温度が１５０°Ｃ以上のものを用いれば
良い。In the case of a magneto-optical recording medium in which a laminated film of one or a combination of two of SiOx, ZnS, SiC, etc. is formed on the 2P resin layer by vacuum evaporation or sputtering,
It has been found that the Curie temperature of the magnetic recording layer increases by 15 to 20°C due to the volatilization and diffusion of the low molecular weight substance into the recording layer, and that this changes the C/N recording sensitivity. From this result, the present inventors found that it is sufficient to use a 2P resin containing less low molecular weight substances that volatilize and diffuse. That is, from a study of the 2P resin properties, it is sufficient to use a 2P resin cured product having a heating loss start temperature of 150° C. or higher.
さらに、２Ｐ樹脂の特性と成膜時の２Ｐ層クラック発生
、環境耐久試験後でのクラック発生成いはフクレの発生
などの外観上の欠陥の発生との関係を鋭意研究した結果
、クラック発生については２Ｐ樹脂として該硬化物のガ
ラス転移温度（Ｔｇ）が１３０℃以上の高いものを用い
れば発生しないということ、フクレの発生については、
該硬化物の吸水による部分的膨潤であることが判り、硬
化物の吸水率が１％以下のものを用いれば前記欠陥を生
じないことを見い出した。Furthermore, as a result of intensive research into the relationship between the characteristics of 2P resin and the occurrence of cracks in the 2P layer during film formation, and the occurrence of external defects such as cracks or blisters after environmental durability tests, we found that This means that blistering will not occur if a 2P resin with a high glass transition temperature (Tg) of 130°C or higher is used for the cured product.
It was found that this was due to partial swelling due to water absorption of the cured product, and it was found that the above-mentioned defect does not occur if a cured product with a water absorption rate of 1% or less is used.
本発明では、これらのことから２Ｐ樹脂とじて前記の硬
化型樹脂組成物を見い出すに至った。In the present invention, we have discovered the above-mentioned curable resin composition as a 2P resin based on these facts.
本発明で用いられる下記構造式
を有するアクリル酸エステル（Ｂ）とは、特開昭６０−
２０２１１２号に記載のごとく、トリメチロールプロパ
ンと２，２−ジメチル−３−オキシプロパナールとを縮
合して得られる化合物にアクリル酸を反応させて得られ
るものである。The acrylic ester (B) having the following structural formula used in the present invention is
As described in No. 202112, it is obtained by reacting a compound obtained by condensing trimethylolpropane and 2,2-dimethyl-3-oxypropanal with acrylic acid.
また、本発明の硬化型樹脂組成物において、モノマー成
分として（Ｂ）成分の他に、親水性の低いモノマーとし
て具体的にはジシクロペンタジェンエトキシモノ（メタ
）アクリレート、イソボルニル（メタ）アクリレート、
水素化ジシクロペンタジェン−モノ（メタ）アクリレー
ト、２，２−ヒス（４−（メタ）アクリロイルオキシエ
トキシフェニル）プロパン、２，２〜ビス（４−（メタ
）アクリロイルオキシエトキシフェニル）メタン、２，
２−ビス（４−（メタ）アクリロイルオキシプロポキシ
フェニル）プロパン、トリメチロールプロパントリ（メ
タ）アクリレート等の（メタ）アクリレートモノマー類
を含み、これら一種または二種以上と（Ｂ）成分との混
合系を用いることが出来る。本発明の硬化型樹脂組成物
の（Ａ）成分及び（Ｂ）成分の使用の割合は硬化物のＴ
ｇが１３０ ’Ｃ以上、吸水率が１％以下であることが
望ましいという点より、重量％で（Ａ）成分１０〜５０
％、（Ｂ）成分】０〜８０％であることが好ましい。（
Ｃ）成分の使用割合は、該組成物の硬化性ということか
ら、０．５重量％〜３重量％の範囲が好ましい。即ち、
（Ｃ）成分０．５％以下では該組成物の硬化が不十分で
あり、３％以上では該硬化物中の（Ｃ）成分の残存量が
多く、これが揮発・拡散し、記録層へ悪影響を与え好ま
しくない。In the curable resin composition of the present invention, in addition to component (B) as a monomer component, specific examples of monomers with low hydrophilicity include dicyclopentadiene ethoxy mono(meth)acrylate, isobornyl(meth)acrylate,
Hydrogenated dicyclopentadiene mono(meth)acrylate, 2,2-his(4-(meth)acryloyloxyethoxyphenyl)propane, 2,2-bis(4-(meth)acryloyloxyethoxyphenyl)methane, 2 ，
Contains (meth)acrylate monomers such as 2-bis(4-(meth)acryloyloxypropoxyphenyl)propane and trimethylolpropane tri(meth)acrylate, and a mixed system of one or more of these and component (B) can be used. The ratio of the components (A) and (B) in the curable resin composition of the present invention is determined by the T of the cured product.
Since it is desirable that g is 130'C or more and the water absorption rate is 1% or less, component (A) is 10 to 50% by weight.
%, component (B)] is preferably 0 to 80%. (
The proportion of component C) used is preferably in the range of 0.5% by weight to 3% by weight in view of the curability of the composition. That is,
If component (C) is less than 0.5%, the curing of the composition will be insufficient, and if it is more than 3%, the amount of component (C) remaining in the cured product will be large, which will volatilize and diffuse, adversely affecting the recording layer. I don't like it.
上記の硬化型樹脂を用いた光学的記録媒体用基盤より光
学的記録媒体を作成すれば、環境耐久試験後のＣ／Ｎ、
記録感度の低下を少な（することが出来た。またクラッ
ク、フクレなどの外観上の欠陥の発生もなくすることが
出来た。If an optical recording medium is made from the optical recording medium substrate using the above-mentioned curable resin, the C/N after the environmental durability test,
It was possible to reduce the decrease in recording sensitivity. Also, it was possible to eliminate appearance defects such as cracks and blisters.
本発明を完成するに当たり、本発明の硬化型樹脂とカラ
ス基板との密着性不良及び該樹脂の塗布ムラによる光学
的欠陥をなくするため、カラス基板表面をＵＶ１０３洗
浄、プラズマ洗浄等を行ったのち、シランカップリング
剤処理の検討を行った。この結果、本発明の硬化型樹脂
を用いて光学的記録媒体用基板を製造するにおいては、
エテン系不飽和シラ（メタクリロアルキルシラン、ビニ
ルシラン）を用いればよいということを見い出した。メ
ルカプトシラン、アミノシラン、エポキシシラン、ヘキ
ザメチルシシラザン等はカラス基板と２Ｐ層との密着性
、該樹脂の塗布ムラによる光学的欠陥の発生等で十分な
特性を得られなかった。In completing the present invention, in order to eliminate poor adhesion between the curable resin of the present invention and the glass substrate and optical defects due to uneven coating of the resin, the surface of the glass substrate was subjected to UV103 cleaning, plasma cleaning, etc. , we investigated silane coupling agent treatment. As a result, when manufacturing an optical recording medium substrate using the curable resin of the present invention,
It has been found that ethene-based unsaturated silanes (methacryloalkylsilane, vinylsilane) can be used. With mercaptosilane, aminosilane, epoxysilane, hexamethylsilazane, etc., sufficient characteristics could not be obtained due to the adhesion between the glass substrate and the 2P layer and the occurrence of optical defects due to uneven coating of the resin.
即ち、本発明の方法により製造した光学的記録媒体用基
盤を用いて光学的記録媒体を作成すれば、環境耐久試験
後の基板と２Ｐ層の剥離の発生及び光学的欠陥もなかっ
た。That is, when an optical recording medium was prepared using the optical recording medium substrate manufactured by the method of the present invention, there was no occurrence of peeling between the substrate and the 2P layer and no optical defects after the environmental durability test.
以下、具体的実施例を挙げて、本発明を更に詳細に説明
する。Hereinafter, the present invention will be explained in more detail with reference to specific examples.
実」ｌ殊ユ
基板として、外周φ１３０、円周φ１５、厚さ１．１ｍ
ｍのドーナツ状青色ガラスを用いて、第１図に矢印で示
しているシランカップリング剤処理を施すべきガラス基
板１の表面にＵＶ１０３洗浄処理２（低圧水銀灯４．５
０ Ｗ ／ ｃ ｍ 、照射距離２５ｍｍ、１分間照射
、ＵＶ１０３の条件（２５４ｎｍ光照度で該基板表面上
８０ ｍ Ｗ ／ ｃ ｒｔｒ ） ）を施した。その
後、１時間以内にエデン系不飽和シランのメタクリロキ
シアルキルシランＡ−１７４（日本ユニカー（株制）を
メタノールに混合（メタノール：シランカップリング剤
−９９，５： ０．５） した塗布液を、ガラス基板上
にスピンコード（主回転２，０ＯＯｒ、ｐ、ｍで２０秒
）し、第２図に示すように厚さ１００人のメタクリロキ
シアルキルシラン膜３を設けた。その後、１１０℃で３
０分間加熱乾燥処理を施した。次に、第３図に示すよう
に所望の案内溝形状及びプリーフォーマット信号に対応
した凹凸を設けたスタンパ４の上に、紫外線硬化型樹脂
５として、（Ａ）ポリウレタンアクリレ−１−（ＮＫエ
ステル Ｕ−１０８Ａ（新中村化学工業（株制）２官能
）３０ｗｔ％、（Ｂ）アクリル酸エステル［カヤラッド
Ｒ−６０４（日本化薬■製）］６６７ｗｔ％び（Ｃ）
光重合開始剤〔イルガキュア１８４（日本チバガイキー
■製）：］ ３３ｗｔの混合物を塗布した。その上に前
記基板を、シランカップリング剤処理面と前記硬化型樹
脂が接する様に載置し、ガラス基板を通して波長３６５
ｎｍのＵＶ光をＵＶ強度２３３ｍｗ／ｃｒｒｒで１分間
照射して、該紫外線硬化型樹脂を硬化させた。その後、
第４図に示すようにスタンパ−より剥離し、ガラス基板
上に紫外線硬化型樹脂製の案内溝７及びプリフォーマッ
ト信号の信号ピットが形成された基盤を作成した。As a real special board, outer circumference φ130, circumference φ15, thickness 1.1m
UV103 cleaning treatment 2 (low-pressure mercury lamp 4.5
The conditions were 0 W/cm, irradiation distance 25 mm, irradiation for 1 minute, and UV103 (254 nm light illuminance, 80 m W/cm rtr) on the substrate surface). Thereafter, within 1 hour, a coating solution containing methacryloxyalkylsilane A-174 (Nippon Unicar Co., Ltd.), an edene-based unsaturated silane, mixed with methanol (methanol: silane coupling agent -99.5: 0.5) was applied. Then, a methacryloxyalkylsilane film 3 with a thickness of 100 mm was formed on a glass substrate by spin cording (main rotation 2,0 OOr, p, m for 20 seconds) as shown in Fig. 2. Thereafter, at 110°C. 3
Heat drying treatment was performed for 0 minutes. Next, as shown in FIG. 3, (A) polyurethane acrylic resin 1-(NK Ester U-108A (Shin Nakamura Chemical Co., Ltd. bifunctional) 30 wt%, (B) acrylic ester [Kayarad R-604 (manufactured by Nippon Kayaku ■)] 667 wt% and (C)
A mixture of 33 wt of photopolymerization initiator [Irgacure 184 (manufactured by Nippon Ciba Gaiki ■)] was applied. The substrate is placed thereon so that the silane coupling agent-treated surface and the curable resin are in contact with each other, and the wavelength 365
The ultraviolet curable resin was cured by irradiating it with UV light of 100 nm wavelength at a UV intensity of 233 mw/crrr for 1 minute. after that,
As shown in FIG. 4, the substrate was peeled off from the stamper to create a base on which guide grooves 7 made of ultraviolet curable resin and signal pits for preformat signals were formed on the glass substrate.
Ｋ五１」
硬化型樹脂を、（Ａ）ポリカーホネートアクリレート〔
アートレシンＵＮ−９０００（板上工業＠））３０ｗｔ
％、（Ｂ）アクリル酸エステル〔カヤラッドＲ−６０４
（日本化薬（株制））６７ｗｔ％及び（Ｃ）光重合開始
剤〔イルカキュア１８４（日本チバカイキー■）〕３３
ｗｔの混合物とした以外は、実施例１と同様にして、前
記樹脂製の案内溝が形成された基盤を作成した。K51'' Curing resin is made of (A) polycarbonate acrylate [
Artreshin UN-9000 (Itagami Kogyo@)) 30wt
%, (B) Acrylic ester [Kayarad R-604
(Nippon Kayaku Co., Ltd.) 67wt% and (C) photopolymerization initiator [Irukacure 184 (Nihon Kayaku ■)] 33
A base plate on which the resin guide grooves were formed was prepared in the same manner as in Example 1, except that the wt mixture was used.
支血舅」−」
エテン系不飽和シランをビニルシラン剤Ａ−１７１（日
本ユニカー（株制）とした以外は、実施例１及び２と同
様に基盤を作成した。A substrate was prepared in the same manner as in Examples 1 and 2, except that the vinyl silane agent A-171 (Nippon Unicar Co., Ltd.) was used as the ethene-based unsaturated silane.
九旌朋５−８
シランカップリング剤処理を施すガラス基板表面を、Ｕ
Ｖ１０３洗浄処理する代わりに、プラズマ洗浄処理（０
企ガス０．７Ｐａ、高周波投入電力５００Ｗ。5-8 The surface of the glass substrate to be treated with a silane coupling agent is
Instead of V103 cleaning treatment, plasma cleaning treatment (0
Input gas: 0.7 Pa, high frequency input power: 500 W.
１５分間）をする以外は、実施例１〜４と同様に基盤を
作成した。The substrates were prepared in the same manner as in Examples 1 to 4, except that the test was carried out for 15 minutes.
２Ｐ樹脂として、（Ａ）ポリウレタンアクリレート（Ｃ
−９５０４（サートマー社製）２官能） ３０ｗｔ％、
（Ｂ）アクリル酸エステル〔カヤラッドＲ−６０４（日
本化薬■製）４０ｗｔ％、（Ｃ）ジシクロペンタニルア
クリレート（ＦＡ−５１３Ａ （日立化成■製〕２７ｗ
ｔ％及び（Ｄ）光重合開始剤〔イルガキュア１８４（日
本チバガイギー（掬）製）３ｗｔ％の混合物を用いた以
外は実施例１と同様にして基盤を作成した。As the 2P resin, (A) polyurethane acrylate (C
-9504 (manufactured by Sartomer) 30 wt%,
(B) Acrylic acid ester [Kayarad R-604 (manufactured by Nippon Kayaku ■) 40wt%, (C) dicyclopentanyl acrylate (FA-513A (manufactured by Hitachi Chemical ■)] 27w
A substrate was prepared in the same manner as in Example 1, except that a mixture of 3 wt % and (D) photopolymerization initiator [Irgacure 184 (manufactured by Nippon Ciba Geigy)] was used.
支１肥Ｉ
２Ｐ樹脂として、（Ａ）ポリカーボネートアクリレート
〔アートレジンＵＮ−９０００（根土工業（掬）〕２２
５ｗｔ％（Ｂ）アクリル酸エステル〔カヤラッドＲ−６
０４（日本化薬■製）５５ｗｔ％、（Ｃ）イソボルニル
アクリレート（ＳＲ−５０６（サートマー社製）〕１１
７ｗｔ％び（Ｄ）光重合開始剤〔イルガキュア１８４（
日本チバガイギー■製）’ｌ ３ｗｔ％の混合物を用い
た以外は実施例１と同様に基盤を作成した。Support 1 fertilizer I 2P resin as (A) polycarbonate acrylate [Art Resin UN-9000 (Nedo Kogyo (Shiki))] 22
5wt% (B) Acrylic ester [Kayarad R-6
04 (manufactured by Nippon Kayaku ■) 55 wt%, (C) isobornyl acrylate (SR-506 (manufactured by Sartomer)) 11
7wt% (D) Photopolymerization initiator [Irgacure 184 (
A substrate was prepared in the same manner as in Example 1, except that a 3 wt % mixture of Nippon Ciba Geigy ■)'1 was used.
匿較珊」
シランカップリング剤としてヘキサメチルジシラザン（
商品名：ＨＭＤＳ、日本ユニカー（株制）を用いた以外
は実施例１と同様に基盤を作成した。Hexamethyldisilazane (as a silane coupling agent)
A base was created in the same manner as in Example 1, except that product name: HMDS, Nippon Unicar Co., Ltd. was used.
雌帽狙ヒづ
ガラス基板表面に、シランカップリング剤処理を施す前
に、ＵＶ／Ｏ３洗浄、プラズマ洗浄処理を施さない以外
は、実施例１〜４と同様に基盤を作成した。A substrate was prepared in the same manner as in Examples 1 to 4, except that the surface of the glass substrate was not subjected to UV/O3 cleaning or plasma cleaning treatment before being treated with the silane coupling agent.
文教１」
シランカップリング剤として、エポキシシランＡ−１８
７（日本ユニカー（株制）を用いた以外は実施例１と同
様に基盤を作成した。Bunkyo 1” Epoxysilane A-18 as a silane coupling agent
A base was created in the same manner as in Example 1 except that Nippon Unicar Co., Ltd. (stock system) was used.
匿較上ニ
シランカップリング剤として、アミノシランＡ−１１２
０（日本ユニカー株製）を用いた以外は実施例１と同様
に基盤を作成した。Aminosilane A-112 was used as a silane coupling agent for comparison.
A substrate was prepared in the same manner as in Example 1 except that 0 (manufactured by Nippon Unicar Co., Ltd.) was used.
塩較Ｌ」
シランカップリング剤として、メルカプトシランＡ−１
８９（日本ユニカー株製）を用いた以外は実施例１と同
様にして基盤を作成した。Mercaptosilane A-1 as a silane coupling agent
A substrate was prepared in the same manner as in Example 1 except that 89 (manufactured by Nippon Unicar Co., Ltd.) was used.
ル較舅副
シランカップリング剤として、クロルシランＡ−１４３
（日本ユニカー（株制）を用いた以外は実施例１と同様
にして基盤を作成した。As a secondary silane coupling agent, chlorsilane A-143
(A base was created in the same manner as in Example 1 except that Nippon Unicar Co., Ltd. (stock system) was used.
３帽［」
２Ｐ樹脂として（Ａ）エポキシアクリレート〔ビスコー
ト＃５４０（大阪有機化学工業（株制）６０ｗｔ％、（
Ｂ）１．６−ヘキサンシオールジアクリレート［ＨＤＤ
Ａ（日本化薬（株制）３６ｗｔ％及び（Ｃ）光重合開始
剤〔ダロキュア１１７３（メルク株製）４ｗｔ％の混合
物を用いた以外は実施例１と同様にして基盤を作成した
。3. As a 2P resin, (A) Epoxy acrylate [Viscoat #540 (Osaka Organic Chemical Industry Co., Ltd.) 60 wt%, (
B) 1,6-hexanethiol diacrylate [HDD
A substrate was prepared in the same manner as in Example 1, except that a mixture of 36 wt % A (Nippon Kayaku Co., Ltd.) and 4 wt % photopolymerization initiator (DAROCURE 1173 (manufactured by Merck)) was used.
比」１例」」工
２Ｐ樹脂として、（Ａ）ＰＥＴＡ （ペンタエリスリー
ドトリアクリレートとペンタエリスリトールテトラアク
リレートの混合物（大阪有機化学工業■製〕４５ｗｔ％
、（Ｂ）ネオペンチルグリコールジアクリルレートＣＮ
ＰＧＤ’Ａ（日本化薬■製）５０ｗｔ％及び（Ｃ）光重
合開始剤〔〔ダロキュア１１７３（メルク株製）：］
５５ｗｔの混合物を用いた以外は実施例１と同様にして
基盤を作成した。Example 1: As a 2P resin, (A) PETA (mixture of pentaerythreed triacrylate and pentaerythritol tetraacrylate (manufactured by Osaka Organic Chemical Industry) 45 wt%
, (B) neopentyl glycol diacrylate CN
PGD'A (manufactured by Nippon Kayaku ■) 50 wt% and (C) photopolymerization initiator [Darocure 1173 (manufactured by Merck & Co., Ltd.):]
A substrate was prepared in the same manner as in Example 1 except that a 55 wt mixture was used.
これらの試料の基板と２Ｐとの密着性を評価するため、
基盤目試験（ＪＩＳ５４００）を行った。その結果、実
施例１〜１０は、評価点数１０で、密着性は良好であっ
た。また、比較例１〜１１も同様に基板と２Ｐ層との密
着性の評価を行ったところ、評価点数２で密着性は良く
なかった。比較例２〜５の基板表面の水の接触角は２０
〜３００ て、実施例１〜１０は、ＵＶ／Ｏ３・プラズ
マ洗浄処理を施すことにより、該基板表面に付着する有
機物は分解除去され、該基板表面の水の接触角は７〜８
° となっていた。In order to evaluate the adhesion between the substrate and 2P of these samples,
A board test (JIS5400) was conducted. As a result, Examples 1 to 10 had an evaluation score of 10, indicating good adhesion. Further, when Comparative Examples 1 to 11 were similarly evaluated for adhesion between the substrate and the 2P layer, the evaluation score was 2, indicating that the adhesion was not good. The contact angle of water on the substrate surface of Comparative Examples 2 to 5 was 20
~300 In Examples 1 to 10, organic matter adhering to the substrate surface was decomposed and removed by UV/O3/plasma cleaning treatment, and the contact angle of water on the substrate surface was 7 to 8.
° It was.
次に、前記実施例１〜１０及び比較例１１で作成した基
盤上に、光磁気記録膜（材料Ｇｄ、 Ｔｂ、 Ｆｅ。Next, a magneto-optical recording film (materials Gd, Tb, Fe) was formed on the substrates prepared in Examples 1 to 10 and Comparative Example 11.
Ｃｏ）をスパッタリングで（８００人厚に）形成して光
磁気記録媒体を作成した。この媒体に環境耐久試験（７
５°Ｃ９８０％ＲＨ２，０００時間）を行った後、ガラ
ス基板と２Ｐ層との剥離を評価した。その結果、実施例
１〜１０の基板は２Ｐ層の剥離はなかったが、比較例１
〜１１の基盤は、基板と２Ｐ層の間で剥離が発生した。Co) was formed by sputtering (to a thickness of 800 mm) to create a magneto-optical recording medium. Environmental durability test (7
After heating at 5° C., 980% RH for 2,000 hours, peeling between the glass substrate and the 2P layer was evaluated. As a result, there was no peeling of the 2P layer in the substrates of Examples 1 to 10, but in Comparative Example 1
In the substrates No. 1 to 11, peeling occurred between the substrate and the 2P layer.
以上のように本発明により光学的記録媒体用基板を作成
すれば、ガラス基板と２Ｐ層は強固に密着する。If a substrate for an optical recording medium is produced according to the present invention as described above, the glass substrate and the 2P layer will be firmly adhered to each other.
また、光磁気記録媒体の環境耐久試験（７５°Ｃ１８０
％ Ｒ９Ｈ，５，０００時間）前後のＣ／Ｎ 、記録感
度の測定の結果及びクラック、フクレなどの外観上の欠
陥の発生の結果とを、用いた硬化型樹脂の特性に着目し
てまとめたものを表−１に示す。In addition, we conducted an environmental durability test (75°C, 180°C) for magneto-optical recording media.
% R9H, 5,000 hours), the results of measuring C/N, recording sensitivity, and the occurrence of external defects such as cracks and blisters were summarized with a focus on the characteristics of the curable resin used. The items are shown in Table-1.
Ｃ／Ｎおよび記録感度の測定は光磁気情報記録再生装置
を用い、３ Ｍ Ｉ−Ｔ ｚの信号を記録再生して測定
した。また記録感度の測定は、Ｃ／Ｎ４０ｄＢ以」二を
得るためのレーザーパワーを測定した。The C/N and recording sensitivity were measured using a magneto-optical information recording and reproducing device, recording and reproducing a 3 M I-T z signal. The recording sensitivity was measured by measuring the laser power required to obtain a C/N of 40 dB or more.
表−１をみると明らかなように、本発明の光学的媒体用
基盤を用いて光磁気記録媒体を作成すれば、環境耐久試
験の条件下においてもＣ／Ｎ、記録感度の変化がほとん
どなく、環境耐久試験でのクラック、フクレ等が発生す
ることがなく、外観が良好で、長期信頼性を維持するこ
とができた。As is clear from Table 1, if a magneto-optical recording medium is made using the optical media substrate of the present invention, there will be almost no change in C/N and recording sensitivity even under the conditions of the environmental durability test. No cracks or blisters occurred during environmental durability tests, and the product had a good appearance and maintained long-term reliability.
尚、２Ｐ樹脂特性の測定は以下のような方法で行った。The 2P resin properties were measured in the following manner.
１）カラス転移温度Ｔｇ（’Ｃ）は動的粘弾性測定によ
り求めた。1) The glass transition temperature Tg ('C) was determined by dynamic viscoelasticity measurement.
２）吸水率は２Ｐ樹脂硬化物を２５°Ｃ水中に２０日間
放置し、その前後の重量差より２Ｐ樹脂硬化物の吸水率
を測定した。2) Water absorption was determined by leaving the cured 2P resin in water at 25°C for 20 days, and measuring the water absorption of the cured 2P resin from the difference in weight before and after.
３）加熱減量開始温度は、熱分析装置（ＴＧ−ＤＳＣ）
を用いて、２Ｐ樹脂硬化物の重量減少の始まる温度を加
熱減量開始温度とした。3) The heating loss start temperature is measured using a thermal analyzer (TG-DSC).
The temperature at which the weight of the cured 2P resin material started to decrease was defined as the heating weight loss start temperature.
以」二説明したように本発明の光学的記録媒体用基盤及
びその製造方法によれば、光学的欠陥のない、高信頼性
の光学的記録媒体用基盤が得られる。As explained above, according to the optical recording medium substrate and the manufacturing method thereof of the present invention, a highly reliable optical recording medium substrate free of optical defects can be obtained.
第１図乃至第４図は夫々本発明に基づ（光学的記録媒体
用基盤の製造過程を示す略断面図である。1 to 4 are schematic cross-sectional views showing the manufacturing process of an optical recording medium substrate according to the present invention.
Claims (3)
系不飽和シランから成るカップリング剤と、該カップリ
ング剤を介して前記基板上に設けられた案内溝及び／又
は信号ピットを有する硬化型樹脂層とから成る光学的記
録媒体用基盤。(1) A glass substrate, a coupling agent made of ethene-based unsaturated silane applied to the surface of the substrate, and a guide groove and/or signal pit provided on the substrate via the coupling agent. A substrate for optical recording media consisting of a curable resin layer.
はポリカーボネートアクリレート、 （Ｂ）下記の構造、 ▲数式、化学式、表等があります▼ を有する１０〜８０重量％のアクリル酸エステル及び （Ｃ）１．０〜４．０重量％の光重合開始剤を含み、２
個のアクリロイル基又はメタクリロイル基を有するもの
を用いた特許請求の範囲第１項記載の光学的記録媒体用
基盤。(2) As the curable resin, (A) 10 to 50% by weight of polyurethane acrylate or polycarbonate acrylate, (B) 10 to 80% by weight of acrylic having the following structure, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Containing an acid ester and (C) 1.0 to 4.0% by weight of a photopolymerization initiator, 2
2. The substrate for an optical recording medium according to claim 1, which uses a substrate having 1 acryloyl group or methacryloyl group.
又はプラズマ洗浄を施し、次いでこの表面にエテン系不
飽和シランを塗布し、このシラン膜上に案内溝及び／又
は信号ピットを有する硬化型樹脂層を形成する光学的記
録媒体用基盤の製造方法。(3) First, the surface of the glass substrate is cleaned with UV/O_3 and /
Alternatively, a method of manufacturing a substrate for an optical recording medium includes performing plasma cleaning, then coating the surface with ethene-based unsaturated silane, and forming a curable resin layer having guide grooves and/or signal pits on the silane film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63075080A JPH01248335A (en) | 1988-03-28 | 1988-03-28 | Substrate for optical recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63075080A JPH01248335A (en) | 1988-03-28 | 1988-03-28 | Substrate for optical recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01248335A true JPH01248335A (en) | 1989-10-03 |
Family
ID=13565847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63075080A Pending JPH01248335A (en) | 1988-03-28 | 1988-03-28 | Substrate for optical recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01248335A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0982720A1 (en) * | 1998-08-26 | 2000-03-01 | Fairchild Holding Corp. | Method for making digital versatile discs |
| JP4543117B1 (en) * | 2009-03-13 | 2010-09-15 | 株式会社東芝 | Ultraviolet curable resin material for pattern transfer and method for producing magnetic recording medium using the same |
| JP2010218657A (en) * | 2009-03-18 | 2010-09-30 | Toshiba Corp | Method for manufacturing magnetic recording medium |
| JP2010218605A (en) * | 2009-03-13 | 2010-09-30 | Toshiba Corp | Ultraviolet-curable resin material for pattern transfer and method for manufacturing magnetic recording medium using the same |
| JP2011081902A (en) * | 2010-12-08 | 2011-04-21 | Toshiba Corp | Method of manufacturing magnetic recording medium |
| JP2011090775A (en) * | 2010-12-08 | 2011-05-06 | Toshiba Corp | Manufacturing method of semiconductor device |
| JP2011100538A (en) * | 2010-11-29 | 2011-05-19 | Toshiba Corp | Method for manufacturing magnetic recording medium |
-
1988
- 1988-03-28 JP JP63075080A patent/JPH01248335A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0982720A1 (en) * | 1998-08-26 | 2000-03-01 | Fairchild Holding Corp. | Method for making digital versatile discs |
| US8070968B2 (en) | 2009-03-13 | 2011-12-06 | Kabushiki Kaisha Toshiba | Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| JP2010218595A (en) * | 2009-03-13 | 2010-09-30 | Toshiba Corp | Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| JP2010218605A (en) * | 2009-03-13 | 2010-09-30 | Toshiba Corp | Ultraviolet-curable resin material for pattern transfer and method for manufacturing magnetic recording medium using the same |
| JP4543117B1 (en) * | 2009-03-13 | 2010-09-15 | 株式会社東芝 | Ultraviolet curable resin material for pattern transfer and method for producing magnetic recording medium using the same |
| US8372575B2 (en) | 2009-03-13 | 2013-02-12 | Kabushiki Kaisha Toshiba | Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| US8551685B2 (en) | 2009-03-13 | 2013-10-08 | Kabushiki Kaisha Toshiba | Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
| JP2010218657A (en) * | 2009-03-18 | 2010-09-30 | Toshiba Corp | Method for manufacturing magnetic recording medium |
| JP4729114B2 (en) * | 2009-03-18 | 2011-07-20 | 株式会社東芝 | Method for manufacturing magnetic recording medium |
| US8173029B2 (en) | 2009-03-18 | 2012-05-08 | Kabushiki Kaisha Toshiba | Magnetic recording medium manufacturing method |
| JP2011100538A (en) * | 2010-11-29 | 2011-05-19 | Toshiba Corp | Method for manufacturing magnetic recording medium |
| JP2011081902A (en) * | 2010-12-08 | 2011-04-21 | Toshiba Corp | Method of manufacturing magnetic recording medium |
| JP2011090775A (en) * | 2010-12-08 | 2011-05-06 | Toshiba Corp | Manufacturing method of semiconductor device |
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