JPH01225730A - Method for recovering ruthenium from ruthenium resistant body - Google Patents
Method for recovering ruthenium from ruthenium resistant bodyInfo
- Publication number
- JPH01225730A JPH01225730A JP5030488A JP5030488A JPH01225730A JP H01225730 A JPH01225730 A JP H01225730A JP 5030488 A JP5030488 A JP 5030488A JP 5030488 A JP5030488 A JP 5030488A JP H01225730 A JPH01225730 A JP H01225730A
- Authority
- JP
- Japan
- Prior art keywords
- ruthenium
- chloride
- metal oxide
- oxide
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 title claims description 28
- 229910052707 ruthenium Inorganic materials 0.000 title claims description 28
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 30
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 23
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 23
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims abstract description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000011521 glass Substances 0.000 claims abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 13
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 10
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 19
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 150000001805 chlorine compounds Chemical class 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- 239000005355 lead glass Substances 0.000 abstract description 6
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 abstract description 5
- 229910001626 barium chloride Inorganic materials 0.000 abstract description 5
- 238000011084 recovery Methods 0.000 abstract description 5
- 239000010953 base metal Substances 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 4
- 229910000033 sodium borohydride Inorganic materials 0.000 abstract description 4
- 239000012279 sodium borohydride Substances 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229910052878 cordierite Inorganic materials 0.000 description 3
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 3
- 239000001103 potassium chloride Substances 0.000 description 3
- 235000011164 potassium chloride Nutrition 0.000 description 3
- 229910001631 strontium chloride Inorganic materials 0.000 description 3
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 3
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明の方法は、反応部分においてルテニウム酸化物と
金属酸化物（ガラス）との混合物の被覆の塩化物化反応
を行い、揮発してくるルテニウム塩化物と被覆金属酸化
物の塩化物を塩化物の錯塩形成剤で捕集回収することに
よるルテニウムの回収方法に係るものである。Detailed Description of the Invention (Industrial Field of Application) The method of the present invention involves carrying out a chloride reaction of a coating of a mixture of ruthenium oxide and metal oxide (glass) in a reaction part, and removing the ruthenium that volatilizes. This invention relates to a method for recovering ruthenium by collecting and recovering chloride and chloride of a coated metal oxide using a chloride complex salt forming agent.
（従来技術とその問題点）
アルミナ、シリカ、ムライト、コージェライト、フォル
ステライト、ジルコニア等の金属酸化物基体上にルテニ
ウム酸化物と金属酸化物（ガラス）との混合被覆を設け
た抵抗体が電子工業分野で大量に使用されている。(Prior art and its problems) A resistor with a mixed coating of ruthenium oxide and metal oxide (glass) on a metal oxide substrate such as alumina, silica, mullite, cordierite, forsterite, zirconia, etc. Used in large quantities in the industrial field.
このような材料が、製造工程での不良や、部品、装置等
の寿命による交換で大量に発生する。A large amount of such materials is generated due to defects in the manufacturing process or replacement due to the end of the lifespan of parts, equipment, etc.
これを回収し有効利用することは工業上重要である。It is industrially important to collect and effectively utilize this.
従来の方法としては、塩酸、硝酸、アルカリなどの溶解
法があるが、ルテニウム酸化物がガラスと混合され被覆
されているので、これらの方法では溶解することが不可
能である。Conventional methods include dissolving with hydrochloric acid, nitric acid, alkali, etc., but since ruthenium oxide is mixed with glass and coated, it is impossible to dissolve with these methods.
また塩化揮発法においてもルテニウム塩化物の捕集法と
して活性炭吸着捕集や、スクラバによる洗浄捕集などが
あるが、活性炭吸着は、温度を下げて捕集する必要があ
るばかりでなく、捕集後の処理が面倒であるという問題
があり、スクラバ洗浄法では乾式法で生成する無水塩化
ルテニウムは、酸、アルカリに対して難溶であるため大
量の洗浄液を濾過しなければならないことや、洗浄液中
に溶は出した少々のルテニウム塩化物を回収しなければ
ならない等の問題に加え、塩素ガスを再利用するために
は、塩素ガス乾燥工程を設ける必要があった。In addition, in the chloride volatilization method, there are activated carbon adsorption collection and cleaning collection using a scrubber as methods for collecting ruthenium chloride, but activated carbon adsorption not only requires lowering the temperature to collect the ruthenium chloride. There is a problem that post-processing is troublesome, and in the scrubber cleaning method, the anhydrous ruthenium chloride produced by the dry method is poorly soluble in acids and alkalis, so a large amount of cleaning solution must be filtered, and the cleaning solution In addition to problems such as the need to recover a small amount of ruthenium chloride that had dissolved into it, it was necessary to provide a chlorine gas drying process in order to reuse the chlorine gas.
（発明の目的）
本発明は叙上の事情に鑑みなされたもので、その目的は
ルテニウム酸化物と金属酸化物（ガラス）との混合物の
被覆をした、基体金属酸化物（ルテニウム抵抗体）より
ルテニウムを簡便かつ効率良く回収する方法を提供する
ことにある。(Object of the Invention) The present invention was made in view of the above-mentioned circumstances, and its purpose is to provide a base metal oxide (ruthenium resistor) coated with a mixture of ruthenium oxide and metal oxide (glass). An object of the present invention is to provide a method for simply and efficiently recovering ruthenium.
（発明の構成）
本発明は、ルテニウムを回収する方法において、ルテニ
ウム酸化物と金属酸化物（ガラス）との混合物を被覆し
た基体金属酸化物（ルテニウム抵抗体）をカーボンの存
在下で加熱しながら塩素ガスを流すか、又は加熱しなが
ら塩素と還元性ガスとの混合ガスを流すことによりルテ
ニウム酸化物と金属酸化物（ガラス）を塩化物にして揮
発させる。(Structure of the Invention) The present invention provides a method for recovering ruthenium, in which a base metal oxide (ruthenium resistor) coated with a mixture of ruthenium oxide and a metal oxide (glass) is heated in the presence of carbon. Ruthenium oxide and metal oxide (glass) are converted into chloride and volatilized by flowing chlorine gas or flowing a mixed gas of chlorine and reducing gas while heating.
ルテニウム抵抗体に使用される基体金属酸化物はα−ア
ルミナ、ムライト、コージェライト等の緻密で表面の平
滑なものが使用され塩化物化反応を起こしにくいもので
あり、塩化物となって移動しない。The base metal oxide used in the ruthenium resistor is a dense and smooth surface material such as α-alumina, mullite, cordierite, etc., which is difficult to cause a chloride reaction and does not migrate as chloride.
反応部の温度は３００℃以上が好ましい。The temperature of the reaction section is preferably 300°C or higher.
これはこの温度以下になるとルテニウム酸化物と金属酸
化物（ガラス）との混合物の被覆の塩化物化ならびにル
テニウム塩化物の揮発が良好に行えなくなる為である。This is because, below this temperature, the coating of the mixture of ruthenium oxide and metal oxide (glass) cannot be converted into chloride and the ruthenium chloride cannot be evaporated well.
又、１２００℃よりも高い温度ではルテニウム塩化物が
金属ルテニウムと塩素とに解離してしまい揮発効率が大
きく低下する。Further, at a temperature higher than 1200° C., ruthenium chloride dissociates into metal ruthenium and chlorine, resulting in a significant decrease in volatilization efficiency.
反応はカーボンの流動した状態で行う事がより好ましい
。It is more preferable to carry out the reaction in a state where carbon is fluid.
これはルテニウム酸化物と金属酸化物（ガラス）との混
合物の被覆の塩化物化反応がこの被覆とカーボンと塩素
ガスの接触部で行われる為、カーボンを流動した状態に
することで全面にカーボンが接触するため反応が良好に
進行する。This is because the chloride reaction of the coating of a mixture of ruthenium oxide and metal oxide (glass) takes place at the contact point between this coating, carbon, and chlorine gas, so by keeping the carbon in a fluidized state, carbon is formed over the entire surface. Because of the contact, the reaction progresses well.
また塩素と還元性ガスとの混合ガスでも全面、反応が良
好に進行する。揮発してくるルテニウム塩化物と金属酸
化物（ガラス）の塩化物は、塩化物の錯塩形成剤によっ
て捕集される。Furthermore, the reaction proceeds favorably across the entire surface even with a mixed gas of chlorine and reducing gas. The volatilized ruthenium chloride and metal oxide (glass) chloride are collected by a chloride complex forming agent.
塩化物の錯塩形成剤を用いる理由は、塩化物は、塩素雰
囲気中で変質がないことと、錯塩を形成することにより
ルテニウム塩化物の捕集効率は他のものと比べ飛躍的に
良いものとなる。The reason for using a chloride complex salt forming agent is that chloride does not deteriorate in a chlorine atmosphere, and that by forming a complex salt, the collection efficiency of ruthenium chloride is dramatically better than other agents. Become.
又、これにより形成されたルテニウム塩化物錯塩は、水
溶性であるという副次的効果も持っている。The ruthenium chloride complex salt thus formed also has the secondary effect of being water-soluble.
なお塩化物の錯塩形成剤の代表的なものは以下の通りで
ある。Note that typical chloride complex salt forming agents are as follows.
塩化ナトリウム （ＮａＣ／） 融点 ８００”Ｃ
塩化カリウム （ＫＣｊ） ／／ ７７
６℃塩化カルシウム （ＣａｌＪ、） ／／
７７２℃塩化マグネシウム （、Ｍｇ１Ｊｚ） ”
７１２℃塩化バリウム （ＢａＣＺｚ） 〃
９６２℃塩化ストロンチウム（ＳｒｌＪｚ） ”
８７３℃（実施例１）
α−アルミナのセラミック基板に酸化ルテニウム（Ｒｕ
ｎｇ）と鉛ガラスの混合物を被覆した基板（Ｒｕ （０
，６４ｗｔ％））５００ｇ、カーボン粉末１ ｋｇｌを
図に示す如く塩化物化容器４中に入れ、電気炉２により
塩化物化容器４を９００℃に加熱し、塩素ガスを塩素ガ
ス導入管３から５ｆｆｉ／ｍｉｎ流ずことにより、カー
ボンを流動させ、ルテニウム酸化物および金属酸化物（
ガラス）を塩化物にして揮発させ、それを塩化物の錯塩
形成剤層５に充填した塩化バリウム（ＢａＣｆｚ）によ
り捕捉した。Sodium chloride (NaC/) Melting point 800"C
Potassium chloride (KCj) // 77
6℃ Calcium chloride (CalJ,) //
772℃ Magnesium chloride (, Mg1Jz)
712℃ Barium chloride (BaCZz)
962℃ Strontium Chloride (SrlJz)”
873°C (Example 1) Ruthenium oxide (Ru
ng) and a substrate coated with a mixture of lead glass (Ru (0
, 64wt%)) and 1 kgl of carbon powder were placed in the chloride container 4 as shown in the figure, the chloride container 4 was heated to 900°C by the electric furnace 2, and chlorine gas was introduced from the chlorine gas introduction pipe 3 at 5ffi/ ruthenium oxide and metal oxide (
(glass) was converted into chloride and volatilized, which was captured by barium chloride (BaCfz) filled in the chloride complex forming agent layer 5.
これを３時間続けた後、塩化バリウムを取り出し水で溶
解し水素化ホウ素ナトリウムで還元し、ルテニウムを回
収したところ回収率は９３％であった。After this continued for 3 hours, barium chloride was taken out, dissolved in water, and reduced with sodium borohydride to recover ruthenium, with a recovery rate of 93%.
（実施例２）
コージェライトのセラミック（円筒状）に酸化ルテニウ
ム（Ｒｕｎｇ）と鉛ガラスの混合物を被覆したルテニウ
ム抵抗体（Ｒｕ （０，７６ｗｔ％））５００ｇを６Ｎ
塩酸により端部の金属を除去し、残ったセラミック部と
カーボン粉末７００ｇ、１を図に示す如く塩化物化容器
４中に入れ、電気炉２により塩化物化容器４を８５０℃
に加熱し、塩素ガスを塩素ガス導入管３から５ｆ／ｍｉ
ｎ流すことにより、カーボンを流動させ、ルテニウム酸
化物および金属酸化物（ガラス）を塩化物にして揮発さ
せ、それを塩化物の錯塩形成剤層５に充填した塩化カリ
ウム（ＫＣｆ）により捕捉した。(Example 2) 500 g of a ruthenium resistor (Ru (0.76 wt%)) made of cordierite ceramic (cylindrical) coated with a mixture of ruthenium oxide (Rung) and lead glass was 6N
The metal at the end was removed with hydrochloric acid, and the remaining ceramic part and 700 g of carbon powder 1 were placed in a chloride container 4 as shown in the figure, and the chloride container 4 was heated to 850°C in an electric furnace 2.
5 f/mi from the chlorine gas introduction pipe 3.
By flowing carbon, the ruthenium oxide and metal oxide (glass) were converted into chloride and volatilized, which was captured by potassium chloride (KCf) filled in the chloride complex forming agent layer 5.
これを３時間続けた後、塩化カリウムを取り出し水で溶
解し水素化ホウ素ナトリウムで還元し、ルテニウムを回
収したところ回収率は９１％であった。After continuing this for 3 hours, potassium chloride was taken out, dissolved in water, and reduced with sodium borohydride to recover ruthenium, with a recovery rate of 91%.
（実施例３）
α−アルミナのセラミック基板に酸化ルテニウム（Ｒｕ
Ｏ□）と鉛ガラスの混合物を被覆した基板（Ｒｕ （０
，６４ｗｔ％））５００ｇ、ｌを図に示す如く塩化物化
容器４中に入れ、電気炉２により塩化物化容器４を８０
０℃に加熱し、塩素ガスと一酸化炭素
（２０％）の混合ガスを導入管３から３ｆｆｉ／ｍｉｎ
流すことにより、ルテニウム酸化物および金属酸化物（
ガラス）を塩化物にして揮発させ、それを塩化物の錯塩
形成剤層５に充填した塩化ストロンチウム（ＳｒＣ１ｚ
）により捕捉した。(Example 3) Ruthenium oxide (Ru) was applied to an α-alumina ceramic substrate.
A substrate coated with a mixture of lead glass (Ru (0
, 64wt%)) was placed in the chloride container 4 as shown in the figure, and the chloride container 4 was heated to 80% by weight using the electric furnace 2.
Heat to 0°C and feed a mixed gas of chlorine gas and carbon monoxide (20%) from the inlet pipe 3 at 3ffi/min.
By flowing, ruthenium oxide and metal oxide (
Strontium chloride (SrC1z
) was captured by
これを４時間続けた後、塩化ストロンチウムを取り出し
水で溶解し水素化ホウ素ナトリウムで還元し、ルテニウ
ムを回収したところ回収率は９０％であった。After this was continued for 4 hours, strontium chloride was taken out, dissolved in water, and reduced with sodium borohydride to recover ruthenium, with a recovery rate of 90%.
（従来例１）
α−アルミナのセラミ・レフ基板に酸化ルテニウム（Ｒ
ｕＯ□）と鉛ガラスの混合物を被覆した基板（Ｒｕ （
０，６４ｗｔ％））５００ｇを６Ｎ塩酸溶液２１に２昼
夜浸した。(Conventional example 1) Ruthenium oxide (R
A substrate coated with a mixture of uO□) and lead glass (Ru(
0.64 wt%))) was immersed in 6N hydrochloric acid solution 21 for two days and nights.
この塩酸を取り出し分析したところ、ルテニウム濃度は
２５．３ｐｐｍでありほとんどルテニウムは溶は出さな
かった。When this hydrochloric acid was taken out and analyzed, the ruthenium concentration was 25.3 ppm, and almost no ruthenium was dissolved.
（従来例２）
α−アルミナのセラミック基板に酸化ルテニウム（Ｒｕ
Ｏ□）と鉛ガラスの混合物を被覆した基板（Ｒｕ （０
，６４ｗｔ％）３５００ｇを１２％水酸化ナトリウム溶
液（ＮａＯＨ）−１５％次亜塩素酸ナトリウム溶液（Ｎ
ａＣＩ！、Ｏ）１ ： ６の溶液２．１１で８時間浸出
した。(Conventional Example 2) Ruthenium oxide (Ru
A substrate coated with a mixture of lead glass (Ru (0
, 64 wt%) was added to 12% sodium hydroxide solution (NaOH) - 15% sodium hypochlorite solution (N
aCI! , O) 1:6 solution 2.11 for 8 hours.
その後この液を取り出し分析したところルテニウムは未
検出であった。When this liquid was then taken out and analyzed, ruthenium was not detected.
（発明の効果）
以上詳述のように本発明によれば従来に比し、効率良く
ルテニウムを分離回収でき、経済的にしかも短時間で回
収することができるという効果がある。(Effects of the Invention) As described in detail above, the present invention has the effect that ruthenium can be separated and recovered more efficiently than in the past, and can be recovered economically and in a short time.
図は本発明の回収方法を示す概略図である。 出願人 田中貴金属工業株式会社 The figure is a schematic diagram showing the recovery method of the present invention. Applicant: Tanaka Kikinzoku Kogyo Co., Ltd.
Claims (1)
物を被覆した金属酸化物の回収物を、カーボンの存在下
で、加熱しながら塩素ガスを流すか、又は加熱しながら
塩素と還元性ガスの混合ガスを流すことにより、ルテニ
ウム酸化物と金属酸化物（ガラス）を塩化物にして揮発
分離することを特徴とするルテニウム抵抗体からルテニ
ウムを回収する方法。２、揮発したルテニウム塩化物を
塩化物の錯塩形成剤で捕集することを特徴とする請求項
１記載のルテニウム抵抗体からルテニウムを回収する方
法。 ３、ルテニウム酸化物と金属酸化物（ガラス）を塩化物
にする反応をカーボンの流動した状態で行うことを特徴
とする請求項１記載のルテニウム抵抗体からルテニウム
を回収する方法。 ４、加熱温度が３００〜１２００℃であることを特徴と
する請求項１乃至３に記載のルテニウム抵抗体からルテ
ニウムを回収する方法。 ５、錯塩形成剤の温度が、その融点以下であることを特
徴とする請求項２乃至４に記載のルテニウム抵抗体から
ルテニウムを回収する方法。[Claims] 1. A recovered metal oxide coated with a mixture of ruthenium oxide and metal oxide (glass) is heated in the presence of carbon while flowing chlorine gas or heated. A method for recovering ruthenium from a ruthenium resistor, characterized in that ruthenium oxide and metal oxide (glass) are converted into chloride and separated by volatilization by flowing a mixed gas of chlorine and reducing gas. 2. The method for recovering ruthenium from a ruthenium resistor according to claim 1, characterized in that the volatilized ruthenium chloride is collected with a chloride complex salt forming agent. 3. The method for recovering ruthenium from a ruthenium resistor according to claim 1, characterized in that the reaction of converting ruthenium oxide and metal oxide (glass) into chlorides is carried out in a state where carbon is fluid. 4. A method for recovering ruthenium from a ruthenium resistor according to any one of claims 1 to 3, characterized in that the heating temperature is 300 to 1200°C. 5. The method for recovering ruthenium from a ruthenium resistor according to any one of claims 2 to 4, wherein the temperature of the complex salt forming agent is below its melting point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5030488A JPH01225730A (en) | 1988-03-03 | 1988-03-03 | Method for recovering ruthenium from ruthenium resistant body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5030488A JPH01225730A (en) | 1988-03-03 | 1988-03-03 | Method for recovering ruthenium from ruthenium resistant body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01225730A true JPH01225730A (en) | 1989-09-08 |
Family
ID=12855156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5030488A Pending JPH01225730A (en) | 1988-03-03 | 1988-03-03 | Method for recovering ruthenium from ruthenium resistant body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01225730A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010215999A (en) * | 2009-03-19 | 2010-09-30 | Eco-System Recycling Co Ltd | Method for concentrating ruthenium and method for recovering the same |
| JP2010222595A (en) * | 2009-03-19 | 2010-10-07 | Eco-System Recycling Co Ltd | Method for recovering ruthenium |
| WO2012111542A1 (en) | 2011-02-18 | 2012-08-23 | 三菱瓦斯化学株式会社 | Method for collection of ruthenium or ruthenium compound |
| CN107419103A (en) * | 2017-07-21 | 2017-12-01 | 浙江师范大学 | A kind of recycling processing method of discarded piezo-resistance |
-
1988
- 1988-03-03 JP JP5030488A patent/JPH01225730A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010215999A (en) * | 2009-03-19 | 2010-09-30 | Eco-System Recycling Co Ltd | Method for concentrating ruthenium and method for recovering the same |
| JP2010222595A (en) * | 2009-03-19 | 2010-10-07 | Eco-System Recycling Co Ltd | Method for recovering ruthenium |
| WO2012111542A1 (en) | 2011-02-18 | 2012-08-23 | 三菱瓦斯化学株式会社 | Method for collection of ruthenium or ruthenium compound |
| KR20140007437A (en) | 2011-02-18 | 2014-01-17 | 미츠비시 가스 가가쿠 가부시키가이샤 | Method for collection of ruthenium or ruthenium compound |
| US8940257B2 (en) | 2011-02-18 | 2015-01-27 | Mitsubishi Gas Chemical Company, Inc. | Method for collection of ruthenium or ruthenium compound |
| CN107419103A (en) * | 2017-07-21 | 2017-12-01 | 浙江师范大学 | A kind of recycling processing method of discarded piezo-resistance |
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