JPH01172582A - Embossed plate and its production - Google Patents
Embossed plate and its productionInfo
- Publication number
- JPH01172582A JPH01172582A JP62328874A JP32887487A JPH01172582A JP H01172582 A JPH01172582 A JP H01172582A JP 62328874 A JP62328874 A JP 62328874A JP 32887487 A JP32887487 A JP 32887487A JP H01172582 A JPH01172582 A JP H01172582A
- Authority
- JP
- Japan
- Prior art keywords
- grooves
- embossed
- plate
- light
- directions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 23
- 238000005530 etching Methods 0.000 claims description 6
- 238000004049 embossing Methods 0.000 claims description 4
- 238000001259 photo etching Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 14
- 239000002184 metal Substances 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 229910052755 nonmetal Inorganic materials 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005338 frosted glass Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
本発明は意匠効果に優れた精密なエンボス面を有するエ
ンボス板とその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an embossed plate having a precise embossed surface with excellent design effects and a method for manufacturing the same.
近年、各種構成からなるエンボス面を有するエンボス板
が知られているが、従来この種のエンボス板はそのエン
ボス面のエンボス加工が極めて精密のものは存在せず、
例えば精密なエンボス加工を施したものであっても、エ
ンボス加工による凹凸、溝等の加工部は肉眼で充分に視
認できる程度のものであり、また異種のエンボス加工面
を組み合わせたエンボス面においてもその種類別のエン
ボス加工面の範囲（面積）は肉眼で容易に判断し得る程
度の広さを有するものであった。In recent years, embossed plates having embossed surfaces with various configurations have become known, but until now, there have been no embossed plates of this type that have extremely precise embossing on their embossed surfaces.
For example, even if the embossed surface is precisely embossed, the unevenness, grooves, and other processed parts caused by the embossment are sufficiently visible to the naked eye. The range (area) of the embossed surface for each type was wide enough to be easily judged with the naked eye.
本発明は上記の点に鑑みなされたもので、従来にはなか
った優れた意匠効果をもつ精密なエンボス加工面を有す
るエンボス板及びその製造方法を提供することを目的と
するものである。The present invention has been made in view of the above points, and an object of the present invention is to provide an embossed plate having a precisely embossed surface with an excellent design effect not previously seen, and a method for manufacturing the same.
〔問題点を解決するための手段］
本発明のひとつはエンボス面が、所定方向に平行した複
数の溝を設けた区画領域にて細分化されて構成されてお
り、隣接し合う各区画領域における溝の方向が少なくと
も５°の割合で相互に異なることを特徴とするエンボス
板を要旨とし、本発明のいまひとつはｌピッチ分の版下
を、所定方向に平行した溝を設けるべき区画領域にてパ
ターン形成するとともに、隣接し合う各区画領域におけ
る溝の方向を少なくとも５°の割合で相異なるように組
み合わせて配分設定する版下作成工程と、
上記版下作成工程にて得られた版下を所定の大きさに拡
大し、同一方向の溝形成を行う区画領域のみを抜き出し
てその形状を打抜いた遮光フィルムを溝方向の数に応じ
てそれぞれ作成し、それらの遮光フィルムの１枚ずつに
対して、多数の平行細線からなる万線スクリーンを平行
細線の方向が溝の方向と一部するように設定して重ね合
わせ、同一の感光フィルム上に載置して露光する作業を
遮光フィルムの枚数分だけ繰り返して行い、該感光フィ
ルムを現像した後、実寸法のサイズに縮小するとともに
殖版して原版を作製する製版工程と、上記製版工程にて
得られた原版を用いてフォトエツチング法にて被加工基
材表面に溝加工を行うエツチング工程から構成されるこ
とを’ｌとするエンボス板の製造方法を要旨とする。[Means for Solving the Problems] One of the present invention is that the embossed surface is divided into divided regions each having a plurality of grooves parallel to a predetermined direction, and each adjacent divided region has a The gist of the present invention is an embossing plate characterized in that the directions of the grooves are different from each other by at least 5 degrees, and another aspect of the present invention is to apply a printing plate for l pitch in a divided area where grooves parallel to a predetermined direction are to be provided. A block creation step in which a pattern is formed and the directions of the grooves in each adjacent divided area are combined and distributed so that they differ by at least 5 degrees; Enlarge it to a predetermined size, extract only the partitioned areas where grooves will be formed in the same direction, punch out the shape of each light-shielding film according to the number of groove directions, and make each one of these light-shielding films. On the other hand, the work of overlapping a line screen consisting of many parallel thin lines so that the direction of the parallel thin lines partially coincides with the direction of the grooves, placing them on the same photosensitive film and exposing them to light is now possible using a light-shielding film. A plate making process is repeated for the number of sheets, and after the photosensitive film is developed, it is reduced to the actual size and plated to produce an original plate, and the original plate obtained in the above plate making process is used to perform a photoetching process. The gist of this invention is a method for manufacturing an embossed plate, which comprises an etching process in which grooves are formed on the surface of a workpiece substrate.
以下、本発明の実施例を図面に基づいて説明す第１図は
本発明のエンボス板の一実施例を示す平面図、第２図は
エンボス板の一部拡大平面図、第３図は第２図の■−■
線に沿う縦断面図である。Hereinafter, embodiments of the present invention will be explained based on the drawings. Fig. 1 is a plan view showing an embodiment of the embossed plate of the present invention, Fig. 2 is a partially enlarged plan view of the embossed plate, and Fig. 3 is a plan view showing an embodiment of the embossed plate of the present invention. ■−■ in Figure 2
It is a longitudinal cross-sectional view along the line.
本発明のエンボス板ｌは、そのエンボス面が所定方向に
平行した複数の溝２を設けた区画領域３にて細分化して
構成されている。上記区画領域３の形状は、モザイク模
様、ストライプ模様、格子縞模様等の模様を形成するよ
うな形状のものや、この他にもランダムな任意形状から
なるものである。尚、区画領域３の境界線は設けても、
設けなくてもよい。The embossed plate 1 of the present invention has an embossed surface divided into divided regions 3 having a plurality of grooves 2 parallel to each other in a predetermined direction. The shape of the divided area 3 may be a shape forming a pattern such as a mosaic pattern, a striped pattern, a checkered pattern, or any other random arbitrary shape. In addition, even if the boundary line of divided area 3 is set,
It does not need to be provided.
区画領域３内における溝２は、第３図に図示したような
凹凸からなる断面形状で直線状に伸びる複数の溝が、全
て同一方向に向けて平行した状態で設けられており、そ
れらの溝２の向きは、任意に特定した基線に対してなす
角度によって定めた所定の方向である。溝２は互いに離
間した状態で設けても、或いは隣接した状態で設けても
よい。The grooves 2 in the divided area 3 are provided with a plurality of linearly extending grooves having a cross-sectional shape consisting of unevenness as shown in FIG. 3, all facing in the same direction in parallel. The direction No. 2 is a predetermined direction determined by an angle made with an arbitrarily specified base line. The grooves 2 may be provided spaced apart from each other or may be provided adjacent to each other.
溝２の深さは５〜１００μｍが好ましく、溝の操り返し
ピッチは５〜１００μｍが好ましい。The depth of the groove 2 is preferably 5 to 100 μm, and the groove pitch is preferably 5 to 100 μm.
一方、隣接し合う各区画領域３における満２はその溝方
向が、少なくとも５°の割合で相互に異なるものである
。換言すれば、隣接する各区画領域の溝はできる限り異
なった方向で設けられていることが好ましく、但し、溝
方向の数、一つの区画領域に対して隣接する領域の数等
の条件によっては、当然のことながら同一方向の溝が設
けられた領域どうしが隣接することがあるが、この場合
であっても可能な限りその方向を異ならしめて構成した
ものである。On the other hand, the groove directions of the two adjacent divided regions 3 are different from each other by at least 5 degrees. In other words, it is preferable that the grooves in each adjacent divided area are provided in different directions as much as possible, but depending on conditions such as the number of groove directions and the number of adjacent areas for one divided area, etc. Of course, regions provided with grooves in the same direction may be adjacent to each other, but even in this case, the directions are made to differ as much as possible.
本発明のエンボス板ｌは、金属、非金属の材質からなる
被加工基材４の表面に、上記の如き構成からなるエンボ
ス面を形成してなるものであり（第３図）、そのエンボ
ス面は区画領域内に溝を複数設けてなるとともに、隣合
う領域において溝の方向が殆どランダムな組み合わせで
異なったものであるため、エンボス面上に入射する光線
が区画領域によってそれぞれ異なった方向に反射する作
用を有する。そのため、特に金属からなる被加工基材に
よりエンボス板を形成した場合、そのエンボス板を異な
る角度から鑑賞したり、或いはエンボス板自体を回転さ
せて鑑賞すると、エンボス面がきらびやかな金属光沢を
放つという優れた意匠効果が得られる。一方、合成樹脂
等の非金属からなる被加工基材によりエンボス板を形成
した場合、それ自体では曇りガラスの如く微細なる粗面
となり、特にこのエンボス板を金属面上に積層した場合
、上記金属製加工基材からなるエンボス板と同様の優れ
た意匠効果が得られる。The embossed plate l of the present invention is formed by forming an embossed surface having the above-described structure on the surface of a workpiece base material 4 made of a metal or non-metallic material (Fig. 3). The embossed surface has multiple grooves in each divided area, and the directions of the grooves in adjacent areas are different in almost random combinations, so the light rays incident on the embossed surface are reflected in different directions depending on the divided area. It has the effect of Therefore, especially when an embossed plate is formed from a workpiece base material made of metal, when the embossed plate is viewed from different angles or when the embossed plate itself is rotated, the embossed surface gives off a glittering metallic luster. Excellent design effects can be obtained. On the other hand, when an embossed plate is formed from a non-metallic workpiece base material such as a synthetic resin, it becomes a finely rough surface like frosted glass. Excellent design effects similar to those of embossed plates made of processed base materials can be obtained.
次に、本発明の製造方法について詳述する。Next, the manufacturing method of the present invention will be explained in detail.
本発明のエンボス板の製造方法は版下作成工程、製版工
程及びエツチング工程にて構成されるものであり、第４
図〜第６図は上記各工程をそれぞれ示す説明図である。The method for manufacturing an embossed plate of the present invention consists of a block preparation process, a plate making process, and an etching process, and the fourth step is
6 to 6 are explanatory diagrams showing each of the above steps, respectively.
まず、版下作成工程により１ピッチ（最終的に必要な所
定寸法を適宜分割した一つの単位）分の版下（下図）を
作成する。この版下５の作成は、第４図に示すように所
定方向に平行した溝を設けるべき区画領域３にて細分化
してパターン形成し、しかる後、各区画領域３内に形成
すべき溝の方向を配分設定して行う。区画領域の作図に
当たり、後述する殖版におけるつなぎ目を考慮し、版下
端部に配される区画領域の形状を工夫する。溝の方向を
配分設定するに当たっては、異なる溝方向の数に応じて
特定した基線に対する角度をそれぞれ適宜選択する（こ
の溝方向の角度：Ｘの選択範囲は、０″≦ｘ ＜ １８
０°である）。そして、隣接し合う各区画領域における
溝の方向が少なくとも５°の割合で相異なるようにラン
ダムに組み合わせて配分し、各種角度の溝方向を全区画
領域に割り付ける。First, a block (see the figure below) for one pitch (one unit obtained by appropriately dividing a predetermined dimension finally required) is created in a block production process. To create this block 5, as shown in FIG. 4, the partitioned areas 3 in which grooves parallel to a predetermined direction are to be formed are divided into sections and patterns are formed, and then the grooves to be formed in each partitioned area 3 are formed. This is done by setting the distribution of the direction. When drawing the divided area, the shape of the divided area placed at the bottom edge of the plate is devised, taking into account the joints in the printing plate, which will be described later. When distributing and setting the groove directions, angles with respect to the specified base line are appropriately selected depending on the number of different groove directions (the selection range of the angle of this groove direction: X is 0''≦x<18
0°). Then, the grooves are randomly combined and distributed so that the directions of the grooves in adjacent partitioned areas differ by at least 5 degrees, and the groove directions at various angles are assigned to all the partitioned areas.
ここで具体的例示を挙げて説明すると、溝方向の数を６
種類とし、その方向を下記ａ、ｂ、ｃ。To give a specific example and explain it here, the number of groove directions is 6.
The types and directions are a, b, and c below.
ｄ、ｅ、ｒに示す如き角度に設定し、このａ −ｆから
なる方向を上述の如き隣接し合う各区画領域の溝の方向
条件を満たすように、例えば第４図に示すように区画領
域にａ ％ ｆなる記号を付記する手段等にて割り付け
て配分設定する。The angles shown in d, e, and r are set, and the divided areas are set so that the direction consisting of a - f satisfies the direction condition of the grooves of each adjacent divided area as described above, for example, as shown in FIG. 4. The distribution is set by assigning the symbols a % f to the numbers.
ａ−−０’、ｂ−・・３０″ｌ、ｃ、、、６０ａ、ｄ
−−９０＠、ｅ −・１２０” 、 ｆ ・
・１５０’（尚、上記角度は第４図中に示す基線１３と
なす角度の数値である）
次いで、本発明製造方法は上記版下作成工程により得ら
れた版下に払づき、エッチング工程に使用する原板を作
製する。a--0', b-...30''l, c, , 60a, d
--90@, e-・120", f・
・150' (The above angle is the numerical value of the angle formed with the base line 13 shown in FIG. 4.) Next, in the manufacturing method of the present invention, the printing plate obtained in the printing plate preparation process described above is wiped, and the printing plate is subjected to an etching process. Prepare the original plate to be used.
まず、版下５を作業し易い程度の大きさに拡大（通常、
５〜１００倍に拡大）し、この拡大した版下をもとに、
同一方向の溝形成を行う区画領域のみを抜粋して咳各領
域の形状を版下における位置と同一位置に各々打ち抜い
た遮光フィルム６を作る（第５図（イ）、図中７は打ち
抜いた各区画領域部を示す）。この遮光フィルム６は溝
方向の数（種類）に応じた枚数だけ作製される。First, enlarge the block copy 5 to a size that is easy to work with (usually
(enlarged 5 to 100 times) and based on this enlarged version,
A light-shielding film 6 is made by extracting only the divided areas where grooves are to be formed in the same direction and punching out the shape of each area at the same position as the original (Fig. 5 (a), 7 in the figure is punched out). (indicates each partition area). The number of light-shielding films 6 to be produced corresponds to the number (types) of the grooves.
具体的には、前記方向ａの溝を設ける区画領域３ａのみ
を抜き出して、その形状を打ち抜いて遮光フィルム６ａ
を作製し、他の方向ｂ−ｒについても同様にして遮光フ
ィルム６ｂ、６ｃ、６ｄ。Specifically, only the divided area 3a in which the groove in the direction a is to be provided is extracted and its shape is punched out to form the light shielding film 6a.
Light-shielding films 6b, 6c, and 6d were prepared in the same manner in other directions b-r.
６ｅ、６ｆを作製するもので、従って本実施例では６枚
の遮光フィルムが得られる。6e and 6f. Therefore, in this example, six light shielding films are obtained.
作製した遮光フィルム６の１枚ずつに対して、第５図（
ハ）に示すように万緑スクリーン８と常に同一の感光フ
ィルム９を重ね合わせ、露光を行い、この作業を遮光フ
ィルム６の枚数分だけ同様にして順次行う。万緑スクリ
ーン８は第５図（ロ）に示す如き多数の平行細線１０が
配されたもので、上記露光に際しては、該スクリーン８
の平行細線１０の方向が、各遮光フィルムにおける区画
領域の溝方向と一致するようにその都度調整して設置す
る。上記平行細線１０は、線幅及び線間隔（ピッチ）が
共に数百μｍ程度の構成からなるものである。感光フィ
ルム９としては従来周知のものを使用することができ、
また露光はカーボンアーク灯、高圧水銀灯等による紫外
線を照射する。For each piece of the produced light shielding film 6, as shown in FIG.
As shown in c), the green screen 8 and the same photosensitive film 9 are always overlapped and exposed, and this operation is repeated in the same manner for the number of light-shielding films 6. The green screen 8 has a large number of parallel thin lines 10 as shown in FIG.
The direction of the parallel thin wires 10 is adjusted and installed each time so that it matches the direction of the groove of the divided area in each light shielding film. The parallel thin wires 10 have a line width and a line interval (pitch) of approximately several hundred μm. As the photosensitive film 9, conventionally known ones can be used,
For exposure, ultraviolet rays are irradiated using a carbon arc lamp, a high pressure mercury lamp, or the like.
具体的には、前記遮光フィルム６ａと万緑スクリーン８
を、スクリーン８の平行細線１０が基線に対して０°と
なるように設置して重ね合わせ、これを感光フィルム９
上に密着させて載置し、露光を行う。続いて、遮光フィ
ルム６ｂと万緑スクリーン８を、スクリーン８の平行細
線１０が基線に対して３０″となるように設置して重ね
合わせ、これを上記同一の感光フィルム８上に載置して
露光を行い、以下同様にして遮光フィルム６０〜６ｆを
順次スクリーン８及び感光フィルム９とに重ね合わせて
露光を行う。Specifically, the light shielding film 6a and the green screen 8
are placed and overlapped so that the parallel thin lines 10 of the screen 8 are at 0° with respect to the base line, and this is placed on the photosensitive film 9.
Place it in close contact with the top and perform exposure. Next, the light-shielding film 6b and the green screen 8 are placed and overlapped so that the parallel thin lines 10 of the screen 8 are 30'' from the base line, and this is placed on the same photosensitive film 8. Exposure is performed, and the light-shielding films 60 to 6f are sequentially superimposed on the screen 8 and the photosensitive film 9 and exposed in the same manner.
全ての遮光フィルム６に対する露光作業を完了した後、
露光後の感光フィルム９を現像する。この現像により感
光フィルムにスクリーンの平行細線による画線からなる
潜画像が定着する。現像後の感光フィルムを実寸法のサ
イズに縮小し、しかる後、この感光フィルムをもとに所
定の数を繋ぎ合わせて殖版して原版を作製する。この原
版には最終的に得られるエンボス面に設ける潜画像が形
成されている。尚、原版における潜画像はネガ型若しく
はポジ型のいずれのタイプで構成してもよく、適宜設定
する。After completing the exposure work for all the light-shielding films 6,
The exposed photosensitive film 9 is developed. By this development, a latent image consisting of parallel thin lines of the screen is fixed on the photosensitive film. The developed photosensitive film is reduced to its actual size, and then a predetermined number of photosensitive films are connected and printed to produce an original plate. A latent image is formed on this original plate to be provided on the finally obtained embossed surface. The latent image on the original plate may be of either negative type or positive type, and is set as appropriate.
次いで、本発明製造方法は上記製版工程により得られた
原版を用いて、従来周知のフォトエツチング法にて被加
工基材表面に溝加工を行う。即ち、第６図に示すように
被加工基材４の溝加工を行う面に、フォトレジスト（感
光性樹脂）１１を塗布、乾燥し、その上に原版１２を密
着させて露光し、しかる後、レジストのない部分を基材
４の材質に応したエツチング液にて溶解除去することに
より、第１図〜第３図に示されるような所望の溝２が形
成されたエンボス板１が得られる。区画領域３の境界線
をエンボス面に付す場合は、この段階で溝２と同時に得
られる。Next, in the manufacturing method of the present invention, grooves are formed on the surface of the substrate to be processed by a conventionally well-known photoetching method using the original plate obtained in the above-described plate-making process. That is, as shown in FIG. 6, a photoresist (photosensitive resin) 11 is applied to the surface of the substrate 4 to be grooved, dried, and an original plate 12 is brought into close contact with the photoresist 11 for exposure. By dissolving and removing the portions without resist using an etching solution suitable for the material of the base material 4, an embossed plate 1 in which desired grooves 2 as shown in FIGS. 1 to 3 are formed can be obtained. . If the boundary line of the divided area 3 is to be attached to the embossed surface, it can be obtained at the same time as the groove 2 at this stage.
本発明のエンボス板は、上記の如き構成からなるエンボ
ス面を有する装飾用等の化粧板として使用することがで
きる。また、合成樹脂シート等に上記エンボス面を賦形
するための゛エンボス版°。The embossed board of the present invention can be used as a decorative decorative board having an embossed surface configured as described above. Also, an emboss plate for forming the above-mentioned embossed surface on a synthetic resin sheet, etc.
として構成して用いることも可能であり、特にこの用途
に用いて合成樹脂シート等にエンボス面を施したものは
、金属面上に積層することにより前記した如くの優れた
意匠効果を発揮することができ、実益大である。It is also possible to construct and use it as a sheet, and in particular, a synthetic resin sheet etc. with an embossed surface used for this purpose can exhibit the excellent design effect as described above by laminating it on a metal surface. can be done, and it is very profitable.
以上説明したように、本発明のエンボス板はそのエンボ
ス面が区画領域内に溝が多数設けてなるとともに、隣合
う領域において溝の方向が略相互に異なったものである
ため、エンボス面上に入射する光線が区画領域によって
それぞれ異なった方向に反射する作用を有するものであ
り、その結果、金属材質にてエンボス板を構成した場合
には、迄賞する方向等の変化によりきらびやかな金属光
沢を発散するという従来にはない優れた意匠効果が得ら
れる。この効果は合成樹脂等の非金属材質にてエンボス
板を構成した場合であっても、そのエンボス板を金属面
に積層することにより容易に得られるものである。また
本発明エンボス板は上記の如くエンボス面を構成したこ
とにより光の干渉作用が生じ、その結果、光の干渉によ
る虹色の色彩効果も得られる。As explained above, in the embossed plate of the present invention, the embossed surface has a large number of grooves in the divided areas, and the directions of the grooves are substantially different in adjacent areas. It has the effect of reflecting incident light rays in different directions depending on the divided area, and as a result, when the embossed plate is made of metal material, it can take on a brilliant metallic luster depending on the direction of the embossing. An excellent design effect that has not been seen before can be obtained. This effect can be easily obtained even when the embossed plate is made of a non-metallic material such as synthetic resin by laminating the embossed plate on a metal surface. Further, in the embossed plate of the present invention, since the embossed surface is configured as described above, a light interference effect occurs, and as a result, a rainbow color effect can be obtained due to the light interference.
更に本発明製造方法によれば、上記の如き優れた意匠（
色彩）効果を有する精密なるエンボス面を付したエンボ
ス板を筒便且つ確実に製造し得ることができる。Furthermore, according to the manufacturing method of the present invention, excellent designs as described above (
It is possible to easily and reliably produce an embossed plate with a precise embossed surface that has a color effect.
第１図は本発明エンボス板の一実施例を示す平面図、第
２図はエンボス板の一部拡大平面図、第３図は第２図の
■−■線に沿う縦断面図、第４図〜第６図は本発明製造
方法の各工程の１例を示す説明図であり、第４図は版下
作成工程を、第５図は製版工程を、第６図はエツチング
液程をそれぞれ示す説明図である。また、第５図（イ）
は遮光フィルム、第５図（ロ）は万線スクリーン、第５
図（ハ）は遮光フィルム、万線スクリーン及び感光フィ
ルムの露光時の重ね合わせ状態を示す説明図である。
■・・エンボス板 ２・・溝
３・・区画領域 ４・・被加工基材５・・版下
６・・遮光フィルム８・・万線スクリーン
９・・感光フィルム１０・・平行細線 １２・・
原版第２図
第３図 。０に工基材
りFig. 1 is a plan view showing one embodiment of the embossed plate of the present invention, Fig. 2 is a partially enlarged plan view of the embossed plate, Fig. 3 is a longitudinal sectional view taken along the line ■-■ in Fig. 2, and Fig. 4 Figures to Figures 6 are explanatory diagrams showing one example of each process of the manufacturing method of the present invention. Figure 4 shows the block preparation process, Figure 5 shows the plate making process, and Figure 6 shows the etching process. FIG. Also, Figure 5 (a)
is a light-shielding film, Figure 5 (b) is a line screen, and
Figure (c) is an explanatory diagram showing the overlapping state of a light-shielding film, line screen, and photosensitive film during exposure. ■・・Emboss board 2・・Groove 3・・Divided area 4・・Workpiece base material 5・・Base
6. Light shielding film 8. Line screen
9...Photosensitive film 10...Parallel thin lines 12...
Figures 2 and 3 of the original version. 0 base material
Claims (2)
けた区画領域にて細分化されて構成されており、隣接し
合う各区画領域における溝の方向が少なくとも５゜の割
合で相互に異なることを特徴とするエンボス板。(1) The embossed surface is composed of subdivided regions each having a plurality of grooves parallel to a predetermined direction, and the directions of the grooves in each adjacent divided region are at least 5 degrees from each other. Embossed board with different features.
けるべき区画領域にて細分化してパターン形成するとと
もに、隣接し合う各区画領域における溝の方向を少なく
とも５゜の割合で相異なるように組み合わせて配分設定
する版下作成工程と、 上記版下作成工程にて得られた版下を所定の大きさに拡
大し、同一方向の溝形成を行う区画領域のみを抜き出し
てその形状を打抜いた遮光フィルムを溝方向の数に応じ
てそれぞれ作成し、それらの遮光フィルムの１枚ずつに
対して、多数の平行細線からなる万線スクリーンを平行
細線の方向が溝の方向と一致するように設定して重ね合
わせ、同一の感光フィルム上に載置して露光する作業を
遮光フィルムの枚数分だけ繰り返して行い、該感光フィ
ルムを現像した後、実寸法のサイズに縮小するとともに
殖版して原版を作製する製版工程と、 上記製版工程にて得られた原版を用いてフォトエッチン
グ法にて被加工基材表面に溝加工を行うエッチング工程
から構成されることを特徴とするエンボス板の製造方法
。(2) A pattern is formed by dividing the block for one pitch into divided areas in which grooves parallel to a predetermined direction are to be provided, and at the same time, the direction of the grooves in each adjacent divided area is made to differ at a ratio of at least 5°. A block creation process in which the blocks are combined and distributed in different ways, and a block plate obtained in the above block production process is enlarged to a predetermined size, and only the partitioned areas where grooves are to be formed in the same direction are extracted and the shape is determined. A number of light-shielding films are punched out according to the number of grooves, and for each of these light-shielding films, a line screen consisting of a large number of parallel thin lines is made so that the direction of the parallel thin lines matches the direction of the grooves. The process of placing and exposing the light-shielding film on the same photosensitive film is repeated for the number of sheets of light-shielding film, and after the photosensitive film is developed, it is reduced to the actual size and expanded. An embossing process characterized by comprising a plate-making process in which a master plate is produced by printing, and an etching process in which grooves are formed on the surface of a workpiece base material by a photo-etching method using the master plate obtained in the plate-making process. Method of manufacturing the board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62328874A JPH01172582A (en) | 1987-12-25 | 1987-12-25 | Embossed plate and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62328874A JPH01172582A (en) | 1987-12-25 | 1987-12-25 | Embossed plate and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01172582A true JPH01172582A (en) | 1989-07-07 |
Family
ID=18215059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62328874A Pending JPH01172582A (en) | 1987-12-25 | 1987-12-25 | Embossed plate and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01172582A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0313944A (en) * | 1989-06-13 | 1991-01-22 | Dainippon Printing Co Ltd | Original plate for manufacturing embossing plate and manufacture of embossing plate |
| US20140147626A1 (en) * | 2007-07-11 | 2014-05-29 | Omnova Solutions, Inc. | Printer-compatible, pre-embossed films |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6233434B2 (en) * | 1977-10-26 | 1987-07-21 | Uooma Aparaatebau Uorufuganku Maasuberuku Unto Co Gmbh |
-
1987
- 1987-12-25 JP JP62328874A patent/JPH01172582A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6233434B2 (en) * | 1977-10-26 | 1987-07-21 | Uooma Aparaatebau Uorufuganku Maasuberuku Unto Co Gmbh |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0313944A (en) * | 1989-06-13 | 1991-01-22 | Dainippon Printing Co Ltd | Original plate for manufacturing embossing plate and manufacture of embossing plate |
| US20140147626A1 (en) * | 2007-07-11 | 2014-05-29 | Omnova Solutions, Inc. | Printer-compatible, pre-embossed films |
| US9676132B2 (en) * | 2007-07-11 | 2017-06-13 | Omnova Solutions Inc. | Printer-compatible, pre-embossed films |
| US10625457B2 (en) | 2007-07-11 | 2020-04-21 | Omnova Solutions Inc. | Printer-compatible, pre-embossed films |
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