JPH01168867A - Production of article coated with copper film - Google Patents

Production of article coated with copper film

Info

Publication number
JPH01168867A
JPH01168867A JP62325569A JP32556987A JPH01168867A JP H01168867 A JPH01168867 A JP H01168867A JP 62325569 A JP62325569 A JP 62325569A JP 32556987 A JP32556987 A JP 32556987A JP H01168867 A JPH01168867 A JP H01168867A
Authority
JP
Japan
Prior art keywords
copper
article
acid
copper film
thermosetting resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62325569A
Other languages
Japanese (ja)
Inventor
Shigemasa Kawakami
川上 殷正
Kazuhiro Ando
和弘 安藤
Takatsugu Fujiura
隆次 藤浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP62325569A priority Critical patent/JPH01168867A/en
Priority to KR1019880017274A priority patent/KR960010822B1/en
Priority to EP88121504A priority patent/EP0322764B1/en
Priority to DE8888121504T priority patent/DE3879441T2/en
Priority to US07/288,928 priority patent/US4913938A/en
Publication of JPH01168867A publication Critical patent/JPH01168867A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material

Abstract

PURPOSE:To form a copper film having an excellent adhesive property with a simple means by applying a liq. mixture of copper hydroxide or the copper compd. of an org. acid and a polyhydric alcohol on an article of a thermosetting resin, and heating the article in a specified temp. range in a nonoxidizing atmosphere. CONSTITUTION:A liq. mixture contg. copper hydroxide or a copper compd. selected from the copper compds. of an org. acid and a polyhydric alcohol as the essential components is applied on the desired part of an article of a thermosetting resin. The article is then heated in a nonoxidizing atmosphere at a temp. higher than 165 deg.C and lower than the heat-deformation temp. of the article. For example, a liq. mixture consisting of 100 parts of copper formate and 200 parts of glycerin is applied in 120mu thickness on one side of a glass fiber-reinforced cyanic ester-maleimideepoxy resin laminated sheet. The laminated sheet is then heated to 180 deg.C in 30min in a gaseous N2 atmosphere, and kept at that temp. for 60min.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、熱硬化性樹脂物品に銅被膜を形成する新規な
方法に関するものであり、本製造法による銅膜形成物品
は、特別の前処理をすることなく銅が強固に付着したも
のであり、しかもハロゲンなどの腐食性を有する元素を
全く含まないものであるので、そのままで或いは更に銅
その他の金属をメツキして、フィルム、シート、成形品
、繊維、布、粉、その他の各種形態の各種用途用物品に
好適に使用されるものである。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a novel method for forming a copper film on a thermosetting resin article, and the copper film-formed article produced by this manufacturing method is manufactured using a special preparatory process. Copper is firmly attached to it without any treatment, and it does not contain any corrosive elements such as halogens, so it can be used as it is or plated with copper or other metals to form films, sheets, etc. It is suitably used for molded articles, fibers, cloth, powder, and other articles for various purposes in various forms.

〔従来の技術およびその問題点〕[Conventional technology and its problems]

熱硬化性樹脂物品、例えば積層板に、銅被膜を形成する
方法としては、無電解メツキ法、蒸着法、圧接法、接着
剤による接着などがある。
Methods for forming a copper coating on a thermosetting resin article, such as a laminate, include electroless plating, vapor deposition, pressure bonding, and bonding with an adhesive.

無電解メツキ法は、最も一般的であり優れた方法である
が、通常は用いる熱硬化性樹脂に応じた前処理を必須と
するものであり、その工程が煩雑であるという欠点を有
している。また、前処理工程を省くため或いは簡略化し
するためにジエン系ゴム等を予め配合してなる組成物層
を表面に形成した積層板を使用する方法があるが、熱硬
化性樹脂本来の性能が劣化する欠点があった。
The electroless plating method is the most common and excellent method, but it usually requires pretreatment depending on the thermosetting resin used, and has the disadvantage that the process is complicated. There is. In addition, in order to omit or simplify the pretreatment process, there is a method of using a laminate on the surface of which a composition layer is formed by pre-blending diene rubber, etc., but the original performance of the thermosetting resin is It had the disadvantage of deterioration.

更に、通常の繊維や充填材強化された熱硬化性樹脂成形
品の場合、充填材等が成形品の表面に露出した部分には
、良好な密着性が得られないという欠点があった。
Furthermore, in the case of thermosetting resin molded articles reinforced with ordinary fibers or fillers, there is a drawback in that good adhesion cannot be obtained in areas where the fillers and the like are exposed on the surface of the molded article.

蒸着法は、蒸着のための特別の設備を必須とし、大型品
の製造が困難であり、また樹脂の種類によっては接着性
を向上させるための前処理が必要であった。
The vapor deposition method requires special equipment for vapor deposition, making it difficult to manufacture large products, and depending on the type of resin, pretreatment is required to improve adhesiveness.

更に、熱硬化性樹脂は通常接着剤としての性能を有する
ものであるので、銅張積層板などを製造することは容易
であるが、この場合、極薄銅膜を形成するこきは極めて
高価であり、また接着を適用する成形品の形状が限定さ
れたり、接着層が厚くなるなどの欠点があるものであっ
た。
Furthermore, since thermosetting resins usually have properties as adhesives, it is easy to manufacture copper-clad laminates, etc., but in this case, the wood used to form ultra-thin copper films is extremely expensive. However, there are also disadvantages such as the shape of the molded product to which adhesive is applied is limited and the adhesive layer becomes thick.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記の事情に鑑み、簡便な方法により、経済
的で高品質の銅膜の形成された材料を提供する方法につ
いて検討した結果、完成したものである。
In view of the above circumstances, the present invention was completed as a result of studies on a method of providing an economical and high-quality material with a copper film formed thereon by a simple method.

すなわち、本発明は、熱硬化性樹脂物品の所望部に、水
酸化銅又は有機酸銅から選択された銅化合物と多価アル
コールとを必須成分とする混合液を塗布した後、非酸化
性雰囲気中で165℃以上で該熱硬化性樹脂物品の変形
劣化温度以下の温度に加熱し保持することを特徴とする
銅膜形成物品の製造法である。
That is, in the present invention, after applying a liquid mixture containing a copper compound selected from copper hydroxide or organic acid copper and a polyhydric alcohol as essential components to a desired part of a thermosetting resin article, a non-oxidizing atmosphere is applied. This is a method for producing a copper film-formed article, characterized by heating and holding the thermosetting resin article at a temperature of 165° C. or higher and lower than the deformation deterioration temperature of the thermosetting resin article.

以下、本発明について説明する。The present invention will be explained below.

本発明の熱硬化性樹脂物品とは、フィルム、シート、射
出成形、圧縮成形、積層成形その他手段で成形してなる
成形品、繊維、布、粉等の各梯形の成形体である。具体
的な熱硬化性樹脂としては、フェノール樹脂、ジアリル
フタレート樹脂、エポキシ樹脂、ポリアミン−ビスマレ
イミド樹脂、ポリマレイミド−エポキシ樹脂、ポリマレ
イミド−イソシアネート樹脂、シアナト樹脂、シアネー
ト−エポキシ樹脂、シアネート−ポリマレイミド樹脂、
シアネート−エポキシ−ポリマレイミド樹脂などの通常
の熱硬化性樹脂類:上記の熱硬化性樹脂類とポリアミド
(ナイロン)、芳香族ポリエステル、ポリエーテルイミ
ド、ポリエーテルエーテルケトン、ポリサルホン、ポリ
フェニレンエーテルなどのエンジニアリングプラスチッ
クとを配合し、さらに適宜触媒類を添加してなる熱硬化
性の所謂rIP、Nにポリエチレンなどのポリオレフィ
ン、1.2−ポリブタジェンなどの樹脂に架橋剤として
の有機過酸化物、更に適宜ラジカル重合性の多官能性の
化合物、熱硬化性樹脂などを配合してなる架橋硬化性の
樹脂類など、並びにこれらにガラス、炭素、アルミナ、
その他の#a維、繊維織布、粉体、その他充填材を配合
した強化物等が挙げられる。これらの中でも、ガラス転
位温度が160℃以上のものが好ましく、特に180℃
以上のものが、銅膜形成のための処理条件がより広くと
れること等から好ましい。
The thermosetting resin article of the present invention is a film, a sheet, a molded article formed by injection molding, compression molding, lamination molding or other means, a trapezoid-shaped molded article such as fiber, cloth, powder, etc. Specific thermosetting resins include phenol resin, diallyl phthalate resin, epoxy resin, polyamine-bismaleimide resin, polymaleimide-epoxy resin, polymaleimide-isocyanate resin, cyanato resin, cyanate-epoxy resin, cyanate-polymaleimide. resin,
Common thermosetting resins such as cyanate-epoxy-polymaleimide resins: engineering of the above thermosetting resins and polyamides (nylons), aromatic polyesters, polyetherimides, polyetheretherketones, polysulfones, polyphenylene ethers, etc. Thermosetting so-called rIP, which is made by blending with plastic and adding appropriate catalysts, N is a polyolefin such as polyethylene, resin such as 1,2-polybutadiene, an organic peroxide as a crosslinking agent, and an appropriate radical. Polymerizable polyfunctional compounds, crosslinked curable resins made by blending thermosetting resins, etc., as well as glass, carbon, alumina,
Examples include other #a fibers, fiber woven fabrics, powders, and reinforcements containing other fillers. Among these, those with a glass transition temperature of 160°C or higher are preferred, particularly those with a glass transition temperature of 180°C.
The above methods are preferable because a wider range of processing conditions can be used for forming the copper film.

上記の熱硬化性樹脂物品に銅膜を形成するために使用す
る本発明の水酸化銅又は有機酸銅から選択された銅化合
物と多価アルコールとを必須成分とする混合液(以下、
処理液と記す)に使用する銅化合物とは、水酸化銅又は
有機酸の銅塩であり、これらは特に限定されないもので
あるが、銅膜形成に使用する温度にふいて表面から離脱
し易い化合物が好ましく、価格や入手のし易さを考慮し
て適宜選択する。具体的には、蟻酸、酢酸、プロピオン
酸、醋酸、ピバリン酸、カプロン酸、カプリン酸、ラウ
リン酸、ステアリン酸、ナフテン酸、安息香酸、オレイ
ン酸、アクリル酸、メタクリル酸、クロトン酸、ペンテ
ン酸などのモノカルボン酸の銅塩;蓚酸、マロン酸、コ
ハク酸、グルタル酸、アジピン酸、ピメリン酸、コハク
酸、アゼライン酸、ブラシリン酸、マレイン酸、フマル
酸、フタル酸、トリメリット酸、マレイン酸などのポリ
カルボン酸のの銅塩;更に、モノ−或いはポリカルボン
酸のエステル、アミドなど、グリコール酸などの水酸基
、グルタミン酸などのアミノ酸などの銅塩も挙げられる
A mixed solution (hereinafter referred to as
The copper compound used in the treatment solution is copper hydroxide or a copper salt of an organic acid, and is not particularly limited, but it is easy to separate from the surface when exposed to the temperature used for forming the copper film. Compounds are preferred and are appropriately selected in consideration of price and availability. Specifically, formic acid, acetic acid, propionic acid, acetic acid, pivalic acid, caproic acid, capric acid, lauric acid, stearic acid, naphthenic acid, benzoic acid, oleic acid, acrylic acid, methacrylic acid, crotonic acid, pentenoic acid, etc. Copper salts of monocarboxylic acids; oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, succinic acid, azelaic acid, brassylic acid, maleic acid, fumaric acid, phthalic acid, trimellitic acid, maleic acid, etc. Further examples include copper salts of polycarboxylic acids such as esters and amides of mono- or polycarboxylic acids, hydroxyl groups such as glycolic acid, and amino acids such as glutamic acid.

また、多価アルコールとは、水酸基を2個以上含有する
化合物であり、これらは特に限定されないものであるが
、用いる成形体の表面との濡れ特性が良好で、銅膜形成
に使用する温度において表面から離脱し易い化合物が好
ましい。具体的には、エチレングリコール、プロピレン
グリj−ル、ブタンジオール、ベンタンジオール、ヘキ
サンジオール、1.5−へキサジエン−3,4−ジオー
ル、2.6−オクタジエン−4,5−ジオール、グリセ
リン、1.2゜3−ブタントリオール、1.2.3−ペ
ンタントリオール、ペンタメチルグリセリン、エリトリ
ット、ペンタエリトリット、アトニット、アラビット、
ジエチレングリコール、トリエチレングリコール、ジプ
ロピレングリコール、その他のポリアルキレングリコー
ル類、さらはジェタノールアミン、トリエタノールアミ
ンなどが挙げられる。
In addition, polyhydric alcohol is a compound containing two or more hydroxyl groups, and although it is not particularly limited, it has good wettability with the surface of the molded product and is suitable for use at the temperature used for forming the copper film. Compounds that are easily released from the surface are preferred. Specifically, ethylene glycol, propylene glycol, butanediol, bentanediol, hexanediol, 1,5-hexadiene-3,4-diol, 2,6-octadiene-4,5-diol, glycerin, 1.2゜3-butanetriol, 1.2.3-pentanetriol, pentamethylglycerin, erythritol, pentaerythritol, attonite, aravit,
Examples include diethylene glycol, triethylene glycol, dipropylene glycol, other polyalkylene glycols, jetanolamine, triethanolamine, and the like.

本発明の処理液は、上記した水酸化銅又は有機酸銅と多
価アルコールとを混合して調整する。処理液中の水酸化
銅又は有機酸銅と多価アルコールとの組成比は、塗布し
たときに均一な塗膜となる程度に均一な液が調整出来る
範囲であれば特に限定されないが、水酸化銅又は有機酸
銅をより多く使用することが好ましく、通常、水酸化銅
又は有機酸銅を10〜70重量%の範囲、好ましくは2
0〜60重量%の範囲で用い、常温乃至加熱下に混練し
て均一とする。
The treatment liquid of the present invention is prepared by mixing the above-described copper hydroxide or organic acid copper with a polyhydric alcohol. The composition ratio of copper hydroxide or organic acid copper and polyhydric alcohol in the treatment solution is not particularly limited as long as it can be adjusted to a uniform solution to form a uniform coating when applied. It is preferable to use a larger amount of copper or organic acid copper, and usually copper hydroxide or organic acid copper is used in a range of 10 to 70% by weight, preferably 2% by weight.
It is used in a range of 0 to 60% by weight, and is homogenized by kneading at room temperature or under heating.

なお、本発明の処理液の調整にあたっては、適宜、上記
以外の添加剤類を併用してもよいものであり、有機酸、
アミン、有機溶剤、界面活性剤、銅その他金属の塩類、
ポリビニルアルコールなどが例示される。
In addition, in preparing the treatment liquid of the present invention, additives other than those mentioned above may be used in combination, as appropriate, such as organic acids,
Amines, organic solvents, surfactants, salts of copper and other metals,
Examples include polyvinyl alcohol.

上記の処理液を熱硬化性物品の所望部に、印刷、刷毛像
、デイピング、スプレーコート、バーコード、ロールコ
ートなどし、バッチ式或いは連続的に不活性雰囲気中で
熱処理することにより本発明の銅膜形成物品を製造する
The above-mentioned treatment liquid is applied to a desired part of a thermosetting article by printing, brushing, dipping, spray coating, bar code, roll coating, etc., and then heat-treated in a batchwise or continuous manner in an inert atmosphere. A copper film forming article is manufactured.

非酸化性雰囲気としては、N2. Ar、 COz、 
CD、 Lなどのガス雰囲気下とする方法や、単に、塗
布面を耐熱性のフィルム類で被い加熱して、塗布層より
の分解発生ガス雰囲気に維持することによる。
The non-oxidizing atmosphere is N2. Ar, COz,
This can be done by using a gas atmosphere such as CD or L, or by simply covering the coated surface with a heat-resistant film and heating it to maintain an atmosphere of decomposed gas from the coated layer.

又、加熱は、赤外線、電子線、マイクロ波などの放射線
加熱、電気炉、オーブン、オイル加熱、加圧蒸気その他
の手段を適宜使用する温度等により選択し、バッチ或い
は連続的に行う。通常、昇温速度 50〜b tl:/Hrで加熱し、所定の温度、すなわち165℃
から熱硬化性樹脂物品の変形劣化温度以下の範囲、好ま
しくは170℃以上から熱硬化性樹脂物品の変形劣化温
度以下の範囲、0〜3時間、好ましくは数分〜2時間程
度保持することによる。
The heating may be carried out batchwise or continuously by selecting appropriate temperatures such as radiation heating such as infrared rays, electron beams, or microwaves, electric furnaces, ovens, oil heating, pressurized steam, or other means. Usually, heating is performed at a heating rate of 50 to 165°C, i.e., 165°C.
to below the deformation deterioration temperature of the thermosetting resin article, preferably from 170°C or higher to the deformation deterioration temperature of the thermosetting resin article, for 0 to 3 hours, preferably several minutes to 2 hours. .

〔実施例〕〔Example〕

以下、実施例、比較例によって本発明をさらに具体的に
説明する。尚、実施例中の部は特に断らない限り重量基
準である。
Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples. In addition, parts in the examples are based on weight unless otherwise specified.

実施例1 蟻酸銅100部とグリセリン200部とを撹拌混合して
粘性のある青色の処理液(以下、処理液1と記す)を得
た。
Example 1 100 parts of copper formate and 200 parts of glycerin were stirred and mixed to obtain a viscous blue treatment liquid (hereinafter referred to as treatment liquid 1).

この処理液1をガラス繊維強化シアン酸エステル−マレ
イミド−エポキシ系樹脂積層板(商品名、 BT−GH
L 800、三菱瓦斯化学■製)の片面に厚み120p
で塗布した後、ボンベよりの窒素ガス雰囲気下において
、30分間で180℃まで昇温し、この温度で60分間
保持した後、取り出した。
This treatment solution 1 was applied to a glass fiber-reinforced cyanate ester-maleimide-epoxy resin laminate (trade name: BT-GH).
L 800, made by Mitsubishi Gas Chemical ■), thickness 120p on one side
After coating, the temperature was raised to 180° C. in 30 minutes under a nitrogen gas atmosphere from a cylinder, and after being held at this temperature for 60 minutes, it was taken out.

得られた積層板表面には、銅膜が均一密着していた。The copper film was uniformly adhered to the surface of the obtained laminate.

この銅膜の厚みは3−1体積抵抗1.0X10−’Ω・
印、セロテープ基盤目(クロスカット)テストによる剥
離試験結果は100/100、煮沸2時間後も膨れ剥が
れなどは生じなかった。
The thickness of this copper film is 3-1 volume resistance 1.0X10-'Ω・
The cross-cut test result of the cellophane tape was 100/100, and no swelling or peeling occurred even after 2 hours of boiling.

実施例2 水酸化銅100部とグリセリン200部とを撹拌混合し
て粘性のある青色の処理液(以下、処理液2と記す)を
得た。
Example 2 100 parts of copper hydroxide and 200 parts of glycerin were stirred and mixed to obtain a viscous blue treatment liquid (hereinafter referred to as treatment liquid 2).

この処理液2を使用する他は実施例1と同様にして光沢
ある銅膜が均一密着した積層板を得た。
A laminate with a glossy copper film uniformly adhered was obtained in the same manner as in Example 1 except that this treatment liquid 2 was used.

この銅膜の厚みは6−1体積抵抗?、 OX 10−’
Ω・国、セロテープ基盤目(クロスカット)テストによ
る剥離試験結果は100/100、煮沸2時間後も膨れ
剥がれなどは生じなかった。
Is the thickness of this copper film 6-1 volume resistance? , OX 10-'
The peel test result of Ω・Country and Cellotape base cross-cut test was 100/100, and no swelling or peeling occurred even after 2 hours of boiling.

また、上記において処理液2の塗布厚みを20−とする
他は同様にして光沢ある銅膜が均一密着した積層板を得
た。
Further, a laminate with a glossy copper film uniformly adhered was obtained in the same manner as described above except that the coating thickness of treatment liquid 2 was changed to 20 -.

この銅膜の厚みは0.5p、体積抵抗1.0X10−’
Ω・国、セロテープ基盤目(クロスカット)テストによ
る剥離試験結果は100/100、煮沸2時間後も膨れ
剥がれなどは生じなかった。
The thickness of this copper film is 0.5p, and the volume resistance is 1.0X10-'
The peel test result of Ω・Country and Cellotape base cross-cut test was 100/100, and no swelling or peeling occurred even after 2 hours of boiling.

実施例3 実施例1において、蟻酸銅100部に代えて酢酸1m 
100gBを使用する他は同様にして処理液(以下、処
理液3と記す)を得、この処理液3を用いる他は同様に
して同様にして光沢ある銅膜が均−密着した積層板を得
た。
Example 3 In Example 1, 1 m of acetic acid was substituted for 100 parts of copper formate.
A treatment solution (hereinafter referred to as treatment solution 3) was obtained in the same manner except that 100 gB was used, and a laminate with a glossy copper film evenly adhered was obtained in the same manner except that this treatment solution 3 was used. Ta.

実施例4 実施例1において、グリセリン200部に代えてトリエ
タノールアミン200部を使用する他は同様にして処理
液(以下、処理液4と記す)を得、この処理液4を用い
る他は同様にして同様にして銅膜が均一密着した積層板
を得た。
Example 4 A treatment liquid (hereinafter referred to as treatment liquid 4) was obtained in the same manner as in Example 1, except that 200 parts of triethanolamine was used instead of 200 parts of glycerin; In the same manner as above, a laminate in which the copper film was uniformly adhered was obtained.

実施例5〜9 実施例1〜4において、ガラス繊維強化シアン酸エステ
ル−マレイミド−エポキシ系樹脂積層板に代えて、ガラ
ス繊維強化エポキシ樹脂積層板(商品名;カラスエポキ
シGt!P 170 、三菱瓦斯化学■製、以下、GR
PIと記す)、キシリレンジアミンとエビクロリヒドリ
ンとの反応により合成される四官能エポキシ樹脂(商品
名;テトラッドx1三菱瓦斯化学■製)を使用してなる
ガラス繊維強化エポキシ樹脂積層板(以下、GBP2と
記す)を使用し、第1表に記載の条件にて処理して銅膜
が均一に形成された成形品を得た。結果を第1表に示し
た。
Examples 5 to 9 In Examples 1 to 4, a glass fiber reinforced epoxy resin laminate (trade name: Karasu Epoxy Gt!P 170, manufactured by Mitsubishi Gas) was used instead of the glass fiber reinforced cyanate ester-maleimide-epoxy resin laminate. Made by Kagaku ■, hereinafter referred to as GR
Glass fiber-reinforced epoxy resin laminate (hereinafter referred to as PI) made using a tetrafunctional epoxy resin (product name: Tetrad , GBP2) was processed under the conditions listed in Table 1 to obtain a molded product in which a copper film was uniformly formed. The results are shown in Table 1.

なお、第1表中の処理液5は、水酸化銅100部とトリ
エタノールアミン200部とを撹拌混合して得たもので
あり、また、銅膜外観は目視観察によるもので、○は均
一密着していたことを示す。
In addition, treatment liquid 5 in Table 1 was obtained by stirring and mixing 100 parts of copper hydroxide and 200 parts of triethanolamine, and the appearance of the copper film was determined by visual observation, and ○ indicates uniformity. Indicates that they were in close contact.

〔発明の作用および効果〕[Operation and effects of the invention]

以上の如くである本発明の製造法によれば、極めて簡単
な手段により容易に密着性に優れた銅膜が形成された物
品が得られるので、この銅膜を電気メツキ、無電解メツ
キ、真空蒸着、銅箔接着の代替、溶接用下地などの下地
処理として、銅張フィルム、銅張積層板その他の用途に
、或いは、そのまま或いは耐酸化塗膜を、形成して、導
電性、熱伝導性膜、粉体、繊維、布等として好適に使用
されるものである。
According to the manufacturing method of the present invention as described above, an article on which a copper film with excellent adhesion is formed can be easily obtained by extremely simple means. It can be used as a base treatment for vapor deposition, as a substitute for copper foil adhesion, as a base for welding, for copper-clad films, copper-clad laminates, and other uses, or as it is or by forming an oxidation-resistant coating to improve electrical conductivity and thermal conductivity. It is suitably used as a film, powder, fiber, cloth, etc.

Claims (1)

【特許請求の範囲】[Claims] 熱硬化性樹脂物品の所望部に、水酸化銅又は有機酸銅か
ら選択された銅化合物と多価アルコールとを必須成分と
する混合液を塗布した後、非酸化性雰囲気中で165℃
以上で該熱硬化性樹脂物品の変形劣化温度以下の温度に
加熱し保持することを特徴とする銅膜形成物品の製造法
After applying a liquid mixture containing a copper compound selected from copper hydroxide or organic acid copper and a polyhydric alcohol as essential components to a desired part of a thermosetting resin article, the mixture is heated at 165°C in a non-oxidizing atmosphere.
A method for producing a copper film-forming article, which comprises heating and maintaining the above temperature at a temperature below the deformation deterioration temperature of the thermosetting resin article.
JP62325569A 1987-12-24 1987-12-24 Production of article coated with copper film Pending JPH01168867A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62325569A JPH01168867A (en) 1987-12-24 1987-12-24 Production of article coated with copper film
KR1019880017274A KR960010822B1 (en) 1987-12-24 1988-12-22 Method for porducing copper film-formed articles
EP88121504A EP0322764B1 (en) 1987-12-24 1988-12-22 Method for producing copper film-formed articles
DE8888121504T DE3879441T2 (en) 1987-12-24 1988-12-22 METHOD FOR PRODUCING BODIES WITH A COPPER COVER.
US07/288,928 US4913938A (en) 1987-12-24 1988-12-23 Method for producing copper film-formed articles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62325569A JPH01168867A (en) 1987-12-24 1987-12-24 Production of article coated with copper film

Publications (1)

Publication Number Publication Date
JPH01168867A true JPH01168867A (en) 1989-07-04

Family

ID=18178351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62325569A Pending JPH01168867A (en) 1987-12-24 1987-12-24 Production of article coated with copper film

Country Status (1)

Country Link
JP (1) JPH01168867A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003075455A (en) * 2001-09-07 2003-03-12 Sysmex Corp Automatic blood analyzer and lock device for specimen rack used therefor
JP2008111093A (en) * 2006-10-03 2008-05-15 Shinko Electric Ind Co Ltd Method for producing copper membrane
WO2013136937A1 (en) 2012-03-16 2013-09-19 株式会社Adeka Copper film-forming composition, and method for producing copper film by using the composition
KR20160027174A (en) 2013-07-25 2016-03-09 가부시키가이샤 아데카 Composition for copper film formation and copper film production method using same
KR20160114175A (en) 2014-03-12 2016-10-04 가부시키가이샤 아데카 Copper film forming composition and process for manufacturing copper film using same
JP2019529599A (en) * 2016-07-28 2019-10-17 ナショナル リサーチ カウンシル オブ カナダ Copper ink and conductive solderable copper traces made therefrom
EP3662027A4 (en) * 2017-08-01 2021-04-14 National Research Council of Canada Copper ink

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003075455A (en) * 2001-09-07 2003-03-12 Sysmex Corp Automatic blood analyzer and lock device for specimen rack used therefor
JP2008111093A (en) * 2006-10-03 2008-05-15 Shinko Electric Ind Co Ltd Method for producing copper membrane
WO2013136937A1 (en) 2012-03-16 2013-09-19 株式会社Adeka Copper film-forming composition, and method for producing copper film by using the composition
US9028599B2 (en) 2012-03-16 2015-05-12 Adeka Corporation Copper film-forming composition, and method for producing copper film by using the composition
KR20160027174A (en) 2013-07-25 2016-03-09 가부시키가이샤 아데카 Composition for copper film formation and copper film production method using same
KR20160114175A (en) 2014-03-12 2016-10-04 가부시키가이샤 아데카 Copper film forming composition and process for manufacturing copper film using same
JP2019529599A (en) * 2016-07-28 2019-10-17 ナショナル リサーチ カウンシル オブ カナダ Copper ink and conductive solderable copper traces made therefrom
EP3662027A4 (en) * 2017-08-01 2021-04-14 National Research Council of Canada Copper ink
US11505712B2 (en) 2017-08-01 2022-11-22 National Research Council Of Canada Copper ink

Similar Documents

Publication Publication Date Title
TWI815895B (en) Thermoplastic liquid crystal polymer shaped article and production method thereof
JPS6144645A (en) Fluoroelastomer laminate
US4859530A (en) High temperature adhesive for polymide films
EP0508368A2 (en) Process for treating film comprising liquid crystal polymer
JPH01168867A (en) Production of article coated with copper film
JPH08325713A (en) Formation of metallic film on organic substrate surface
TW200808516A (en) Mold release film, mold release cushion material, and process for manufacturing printed board
KR960010822B1 (en) Method for porducing copper film-formed articles
JP2008291168A (en) Method for producing liquid crystal polymer film and substrate for printed circuit board
EP0178762B1 (en) Composites
JPH0784522B2 (en) Water-soluble imide composition for forming film and method for producing the same
JPH01168865A (en) Production of article coated with copper film
CN106494021A (en) A kind of PET overlay films aluminium sheet and preparation method thereof
JPH01168866A (en) Production of article coated with copper film
JPH01168868A (en) Production of article coated with copper film
KR101640840B1 (en) Method for manufacturing flexible printed circuit board, and flexible printed circuit board manufactured thereby
WO1996012752A2 (en) Curable epoxy resin accelerated by boric acid and its analogs
JP2005313407A (en) Polyimide/metal laminated sheet manufacturing method
JP2751335B2 (en) Manufacturing method of copper-plated resin molded product
JP2745677B2 (en) Manufacturing method of copper-clad board
JPH0693455A (en) Production of copper film forming base material
JPH04268313A (en) Production of synthetic resin molding excellent in mar resistance
JPH02129380A (en) Production of copper plated resin molded product
JP2730218B2 (en) Manufacturing method of through-hole plated substrate
JPS62225539A (en) Production of modified aramid material