JPH01138501A - Reflection preventive film - Google Patents
Reflection preventive filmInfo
- Publication number
- JPH01138501A JPH01138501A JP62298516A JP29851687A JPH01138501A JP H01138501 A JPH01138501 A JP H01138501A JP 62298516 A JP62298516 A JP 62298516A JP 29851687 A JP29851687 A JP 29851687A JP H01138501 A JPH01138501 A JP H01138501A
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- JP
- Japan
- Prior art keywords
- refractive index
- layer
- substrate
- low
- index material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003449 preventive effect Effects 0.000 title abstract 2
- 239000000463 material Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000000126 substance Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
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- Surface Treatment Of Optical Elements (AREA)
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- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は紫外領域の光に有効な反射防止膜に関する。[Detailed description of the invention] The present invention relates to an antireflection film that is effective against light in the ultraviolet region.
従来技術
最近、紫外領域（例えば３６５ ｎｍ）の光源を利用し
た投影型露光の半導体露光装置が実用化されている。投
影型露光の半導体露光装置の解像力は光源波長に比例す
るため、光源の短波長化は図られ、１９３層ｍ、 ２４
８層ｍあるいは３０８ ｎｍ等の紫外線が用いられてい
る。2. Description of the Related Art Recently, semiconductor exposure apparatuses for projection type exposure using light sources in the ultraviolet region (for example, 365 nm) have been put into practical use. Since the resolving power of a semiconductor exposure device for projection exposure is proportional to the wavelength of the light source, the wavelength of the light source was shortened, 193 layers m, 24
Ultraviolet light of 8 layers or 308 nm is used.
しかし、上記露光装置は通常１５〜２０枚の多数のレン
ズから構成される照明系、縮小系を有するため、それら
の系における各レンズ面での反射によるゴースト等が像
において照度むらを発生させる。係る反射を防止するた
めには上記の光を吸収しない材料で反射防止膜を設ける
ことが考えられるが、従来のカメラレンズ等に用いられ
る反射防止膜はほとんどの場合紫外領域において吸収が
あり、これらの反射防止材料をそのまま流用することは
できない。However, since the exposure apparatus described above usually has an illumination system and a reduction system composed of a large number of lenses (15 to 20 lenses), ghosts and the like caused by reflections from each lens surface in these systems cause uneven illuminance in the image. In order to prevent such reflection, it is possible to provide an anti-reflection film made of a material that does not absorb the above light, but most of the anti-reflection films used in conventional camera lenses absorb in the ultraviolet region. Anti-reflection materials cannot be used as is.
一方、波長１６０〜２３０ｎｍの真空紫外領域の光に有
効な反射防止膜が、例えば特開昭６１−７７００１号公
報、特開昭６１−７７００２号公報あるいは特開昭６１
−７７００３号公報に開示されている。上記技術は真空
紫外領域の光を透過する低屈折率（ｎ＜１．５）物質と
中間屈折率（ｎ＝１．６〜１．８）物質を使用し、所定
の厚さで３層あるいは５層に積層した反射防止膜に関す
るものである。しかし上記技術に開示されている反射防
止に有効な波長領域は約７０ｎｍと狭い問題がある。On the other hand, antireflection films that are effective against light in the vacuum ultraviolet region with a wavelength of 160 to 230 nm are disclosed in, for example, JP-A-61-77001, JP-A-61-77002, and JP-A-61-77001.
It is disclosed in Japanese Patent No.-77003. The above technology uses a low refractive index material (n<1.5) and an intermediate refractive index material (n=1.6 to 1.8) that transmit light in the vacuum ultraviolet region, and uses three or more layers with a predetermined thickness. The present invention relates to an antireflection film laminated in five layers. However, there is a problem that the effective wavelength range for antireflection disclosed in the above-mentioned technique is as narrow as about 70 nm.
発明が解決しようとする問題点
本発明は上記のような事情に鑑みなされたものであって
、その目的とするところは、広範囲の紫外領域の光に対
して有効な反射防止膜を提供することを目的とする。Problems to be Solved by the Invention The present invention was made in view of the above circumstances, and its purpose is to provide an antireflection film that is effective against light in a wide range of ultraviolet regions. With the goal.
問題点を解決するための手段
すなはち、本発明は入射媒質側から基板側へ順に基板よ
りも低い屈折率を有する低屈折率物質からなる第１層、
屈折率が基板の有する屈折率より高い１．５〜１．８の
値を有する中間屈折率物質からなる第２層、基板よりも
低い屈折率を有する低屈折率物質からなる第３層、第３
層で使用した低屈折率物質の存する屈折率より低い屈折
率を有する低屈折率物質からなる第４層及び屈折率が基
板の有する屈折率より高い１．５〜１．８である中間屈
折率物質からなる第５層の５層構造からなり、１６０＋
＋＋ｅ〜４００ｎｍの波長域に対して有効な反射防止膜
に関する。Means for solving the problem, that is, the present invention includes a first layer made of a low refractive index material having a refractive index lower than that of the substrate in order from the incident medium side to the substrate side;
a second layer made of an intermediate refractive index material having a refractive index of 1.5 to 1.8 higher than the refractive index of the substrate; a third layer made of a low refractive index material having a lower refractive index than the substrate; 3
A fourth layer made of a low refractive index material having a refractive index lower than that of the low refractive index material used in the layer, and an intermediate refractive index having a refractive index of 1.5 to 1.8 higher than the refractive index of the substrate. Consists of a 5-layer structure with the 5th layer consisting of a substance, 160+
The present invention relates to an antireflection film that is effective in the wavelength range of ++e to 400 nm.
本発明の反射防止膜は１８０〜４００＋＋ｍの広範囲の
紫外領域の光に対して有効に機能する。The antireflection film of the present invention functions effectively against light in a wide range of ultraviolet regions from 180 to 400++ m.
本発明の反射防止膜は第１図に示したように、入射媒質
側から、基板（６）より小さい屈折率を有する低屈折率
物質（以下単に低屈折率物質という）からなる膜を第１
層（１）、基板より大きい屈折率を有する中間屈折率物
質（以下単に中間屈折率物質という）からなる膜を第２
層（２）、低屈折率物質からなる膜を第３層（３）、低
屈折率物質からなる膜を第４層（４）、および中間屈折
率物質からなる膜を第５層（５）としてレンズ基板（６
）上に形成した構成である。As shown in FIG. 1, the antireflection film of the present invention includes a film made of a low refractive index material (hereinafter simply referred to as a low refractive index material) having a smaller refractive index than the substrate (6) from the incident medium side.
layer (1), a film made of an intermediate refractive index material (hereinafter simply referred to as intermediate refractive index material) having a higher refractive index than the substrate;
layer (2), a film made of a low refractive index material as a third layer (3), a film made of a low refractive index material as a fourth layer (4), and a film made of an intermediate refractive index material as a fifth layer (5). as a lens substrate (6
) is the configuration formed above.
本発明に使用できるレンズ基板（６）としては、屈折率
１．４７〜１．６０からなる物質、具体的にはＳｉｎｇ
、Ｃａ Ｆ ｔ、ＢＫ−７等から構成されるものを使用
することができる。The lens substrate (6) that can be used in the present invention is a material having a refractive index of 1.47 to 1.60, specifically Sing.
, Ca F t, BK-7, etc. can be used.
低屈折率物質としては屈折率が１．６以下の物質で紫外
領域において透明かつ安定な物質が好ましく、例えばＭ
ｇＦｔ、ＣａＦ、あるいはＳｆＯ，等を使用することが
でき、前述したレンズ基板と同じ屈折率の同じ物質を使
用することも可能である。The low refractive index material is preferably a material with a refractive index of 1.6 or less that is transparent and stable in the ultraviolet region, such as M
gFt, CaF, SfO, etc. can be used, and it is also possible to use the same material having the same refractive index as the lens substrate described above.
中間屈折率物質としては屈折率が１．５と１．８の間の
値を有する物質で紫外領域において透明かつ安定な物質
が好ましく、例えばＬ ａ Ｆ ｓ、ＮｄＦ’ 、、Ａ
Ｑ ｔ Ｏｓ、ＭｇＯ１Ｙ、Ｏ，等を使用スルコトカ
テキ、と（にＡ１２．０．、Ｌ ａ Ｆ ｓが好ましい
。屈折率が１．８以上の大きな値を有する物質は一般に
紫外領域に大きな吸収があるために、紫外領域光の反射
防止膜の構成に有効な材料は見当たらない。従って、本
発明は、紫外領域に大きな吸収がなく、紫外線に対して
透明かつ安定な物質の存在する中間屈折率物質を用いて
、紫外領域の光に有効な反射防止膜構成する。The intermediate refractive index material is preferably a material that has a refractive index between 1.5 and 1.8 and is transparent and stable in the ultraviolet region, such as L a F s, NdF', A
QtOs, MgO1Y, O, etc. are used, and A12.0., L aFs are preferred. Substances with a large refractive index of 1.8 or more generally have large absorption in the ultraviolet region. Therefore, no material has been found that is effective in constructing an antireflection film for light in the ultraviolet region.Therefore, the present invention is directed to an intermediate refractive index material that does not have significant absorption in the ultraviolet region and is transparent and stable to ultraviolet light. This is used to construct an antireflection film that is effective against light in the ultraviolet region.
本発明においては、レンズ基板の種類にもよるが低屈折
率物質としてＭｇＦ、あるいはＳｉ：ｎ１を使用し５、
中間屈折率物質としてＡｆｆｔＯｓを組み合わせて使用
するのが好ましい。In the present invention, MgF or Si:n1 is used as a low refractive index material, depending on the type of lens substrate5.
Preferably, AfftOs is used in combination as intermediate refractive index material.
基板上の第５層は厚さ約０゜５０λ。（λ０は設計主波
長）に中間屈折率物質によって構成される。The fifth layer on the substrate has a thickness of approximately 0°50λ. (λ0 is the design dominant wavelength) and is made of an intermediate refractive index material.
約というのは第５層の厚が０．５λ０から±０．１λ。Approximately means that the thickness of the fifth layer is 0.5λ0 to ±0.1λ.
の誤差であれば許容できることを意味する。This means that the error is acceptable.
それ以上の誤差になれば反射防止効果が低下する。If the error is larger than that, the antireflection effect will deteriorate.
第４層は第５層の上に低下屈折率物質から、厚さ約０．
５０λ。に形成する。本発明においては第４層の厚さは
±０．１λ。の範囲の誤差であれば許容できる。その誤
差が±０．１λ０より大きくなると反射防止効果が低下
する。A fourth layer is formed of a reduced refractive index material on top of the fifth layer and has a thickness of about 0.0 mm.
50λ. to form. In the present invention, the thickness of the fourth layer is ±0.1λ. An error within the range of is acceptable. When the error becomes larger than ±0.1λ0, the antireflection effect decreases.
第３層は第４層上に、厚さ約０．５０λ。の低屈折率物
質によって形成される。その厚さは、±０゜１λ。の範
囲の誤差であれば許容される。その誤差が±０．１λ。The third layer is on the fourth layer and has a thickness of about 0.50λ. It is formed from a low refractive index material. Its thickness is ±0°1λ. An error within the range of is acceptable. The error is ±0.1λ.
より大きくなると反射防止効果が低下する。If it becomes larger, the antireflection effect decreases.
第３層と第４層は共に低屈折率物質から構成されるが、
同一屈折率を示す膜として構成すべきでなく、第４層の
屈折率は第３層の屈折率より大きくなるように構成する
必要がある。この条件を満たす範囲において第３層およ
び第４層には同一物質を使用することは可能であり、そ
の物質が基板と同一物質であってもよい。しかし、反射
防止効果の面からは第３層と第４層は異なる低屈折率物
質から構成することが好ましい。Both the third layer and the fourth layer are composed of low refractive index materials,
They should not be constructed as films having the same refractive index, but should be constructed so that the refractive index of the fourth layer is greater than the refractive index of the third layer. As long as this condition is satisfied, it is possible to use the same material for the third layer and the fourth layer, and the material may be the same material as the substrate. However, from the viewpoint of antireflection effect, it is preferable that the third layer and the fourth layer are made of different low refractive index materials.
第２層は第３層上に、厚さ約０．２５λ。の中間屈折率
物質によって形成される。その膜厚は±０．０５λ。の
範囲の誤差であれば許容できる。その誤差が±０．０５
λ。より大きくなると反射防止効果が低下する。The second layer is on top of the third layer and has a thickness of approximately 0.25λ. formed by an intermediate refractive index material. The film thickness is ±0.05λ. An error within the range of is acceptable. The error is ±0.05
λ. If it becomes larger, the antireflection effect decreases.
第２層形成のための中間屈折率物質は第５層形成に使用
した中間屈折率物質と同じ物質あるいは異なる物質のい
ずれをも使用可能であるが、材料の種類をなるべく少な
くして製造面で扱いやすくするため等の理由により第５
層と同一の物質を使用することが好ましい。The intermediate refractive index material for forming the second layer can be the same as or different from the intermediate refractive index material used for forming the fifth layer, but it is possible to use as few types of materials as possible to improve manufacturing efficiency. For reasons such as ease of handling, the fifth
Preferably, the same material as the layer is used.
第１層は第２層上に、低屈折率物質から厚さ約０．２５
λ。に形成される。その膜厚は±０．０５λ。の範囲の
誤差であれば許容できる。その誤差が±０．０５λ。よ
り太き（なると反射防止効果が劣化する。The first layer is made of a low refractive index material and has a thickness of about 0.25 mm on the second layer.
λ. is formed. The film thickness is ±0.05λ. An error within the range of is acceptable. The error is ±0.05λ. If it becomes thicker (the anti-reflection effect will deteriorate).
第１層形成のための低屈折率物質は第３層あるいは第４
層形成に使用した低屈折率物質と同じ物質あるいは異な
る物質のいずれをも使用可能であるが、材料の種類をな
るべく少なくシ、て製造面で扱いやすくする等の理由に
より第３層あるいは第４層と同一の物質を用いることが
好ましい。The low refractive index material for forming the first layer is used as the third or fourth layer.
Although it is possible to use the same material as the low refractive index material used for layer formation or a different material, it is possible to use the third or fourth layer for reasons such as minimizing the variety of materials and making it easier to handle in terms of manufacturing. Preferably, the same material as the layer is used.
第１層から第５層の製造方法としては、公知の方法、例
えばイオンブレーティング法、スッパタリング法等の真
空蒸着法を使用することができる。As a method for manufacturing the first to fifth layers, a known method, for example, a vacuum deposition method such as an ion blasting method or a sputtering method can be used.
火旋刺
レンズ基板上に、表１から表６に示した膜構成の反射防
止膜を作製した。Antireflection films having the film configurations shown in Tables 1 to 6 were fabricated on the pyrotechnic lens substrate.
得られたレンズの反射防止特性を第２図〜第７図に示し
た。The antireflection properties of the obtained lenses are shown in FIGS. 2 to 7.
以上のようにして得られた膜構成１〜６の反射防止膜を
有するレンズの反射防止特性を第２図〜第７図に示した
。The antireflection properties of lenses having antireflection films having film configurations 1 to 6 obtained as described above are shown in FIGS. 2 to 7.
本発明の反射防止膜は、第２図から第７図より明らかな
ように膜構成を選択することにより波長１６０〜４００
ｎｍの広範囲の波長領域で反射率１％以下に押さえるこ
とができる。As is clear from FIGS. 2 to 7, the antireflection film of the present invention can be used at wavelengths of 160 to 400 by selecting the film structure.
The reflectance can be suppressed to 1% or less over a wide wavelength range of nm.
発明の効果
本発明の反射防止膜は広範囲の紫外線波長領域において
有効である。Effects of the Invention The antireflection film of the present invention is effective in a wide range of ultraviolet wavelength regions.
第１図は本発明の反射防止膜の措成例を示す模式的断面
図である。
第２図から第７図は反射防止特性を示す図である。
■・・・第１層 ２・・・第２層３・・・第３
層 ４・・・第４層５・・・第５層
６・・・レンズ基板第１図
第２図
第３図
第４図
第５ｒＩｆｆ
濠長＋ ｎｍｌFIG. 1 is a schematic cross-sectional view showing an example of the construction of the antireflection film of the present invention. FIGS. 2 to 7 are diagrams showing antireflection characteristics. ■...First layer 2...Second layer 3...Third
Layer 4...Fourth layer 5...Fifth layer
6...Lens substrate Figure 1 Figure 2 Figure 3 Figure 4 Figure 5rIff Moat length + nml
Claims (1)
率を有する低屈折率物質からなる第１層、屈折率が基板
の有する屈折率より高い１．５〜１．８の値を有する中
間屈折率物質からなる第２層、基板よりも低い屈折率を
有する低屈折物質からなる第３層、第３層で使用した低
屈折率物質の有する屈折率より低い屈折率を有する低屈
折率物質からなる第４層及び屈折率が基板の有する屈折
率より高い１．５〜１．８である中間屈折率物質からな
る第５層の５層構造からなり、１６０ｎｍ〜４００ｎｍ
の波長域に対して有効な反射防止膜。 ２、低屈折率物質が１．６以下の屈折率を有する特許請
求の範囲第１項記載の反射防止膜。 ３、更に以下の条件を満足することを特徴とする特許請
求の範囲第１項または第２項に記載の反射防止膜： 屈折率：光学的膜厚 第１層：ｎ＿１＜１．６：約０．２５λ＿０第２層：１
．５＜ｎ＿２＜１．８：約０．２５λ＿０第３層：ｎ＿
３＜１．６：約０．５０λ＿０第４層：ｎ＿４＜１．６
：約０．５０λ＿０第５層：１．５＜ｎ＿５＜１．８：
約０．５０λ＿０ここで、 ｎ＿１：第１層の屈折率 ｎ＿２：第２層の屈折率 ｎ＿３：第３層の屈折率 ｎ＿４：第４層の屈折率 ｎ＿５：第５層の屈折率 λ＿０：設計主波長 ４、低屈折率物質がＭｇＦ＿２、ＣａＦ＿２、ＳｉＯ＿
２からなるグループから選ばれる物質であり、中間屈折
率物質がＬａＦ＿３、ＮｄＦ＿３、Ａｌ＿２Ｏ＿３、Ｍ
ｇＯおよびＹ＿２Ｏ＿３からなるグループ選ばれる物質
である特許請求の範囲第１項記載の反射防止膜。[Claims] 1. In order from the incident medium side to the substrate side, a first layer made of a low refractive index material having a refractive index lower than that of the substrate, and a refractive index of 1.5 to 1 higher than the refractive index of the substrate. A second layer made of an intermediate refractive index material having a value of .8, a third layer made of a low refractive index material having a lower refractive index than the substrate, and a refractive index lower than the refractive index of the low refractive index material used in the third layer. It consists of a five-layer structure of a fourth layer made of a low refractive index material having a refractive index of 1.5 to 1.8, which is higher than the refractive index of the substrate, and a fifth layer made of an intermediate refractive index material having a refractive index of 1.5 to 1.8, which is higher than the refractive index of the substrate. 400nm
Anti-reflection coating that is effective in the wavelength range of 2. The antireflection film according to claim 1, wherein the low refractive index substance has a refractive index of 1.6 or less. 3. The antireflection film according to claim 1 or 2, which further satisfies the following conditions: Refractive index: Optical thickness first layer: n_1<1.6: approx. 0.25λ_0 2nd layer: 1
．． 5<n_2<1.8: Approximately 0.25λ_0 Third layer: n_
3<1.6: Approximately 0.50λ_0 4th layer: n_4<1.6
: Approximately 0.50λ_0 5th layer: 1.5<n_5<1.8:
Approximately 0.50λ_0 where, n_1: refractive index of the first layer n_2: refractive index of the second layer n_3: refractive index of the third layer n_4: refractive index of the fourth layer n_5: refractive index of the fifth layer λ_0: design Main wavelength 4, low refractive index materials are MgF_2, CaF_2, SiO_
The intermediate refractive index material is LaF_3, NdF_3, Al_2O_3, M
The antireflection coating according to claim 1, which is a material selected from the group consisting of gO and Y_2O_3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62298516A JP2586527B2 (en) | 1987-11-26 | 1987-11-26 | Anti-reflective coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62298516A JP2586527B2 (en) | 1987-11-26 | 1987-11-26 | Anti-reflective coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01138501A true JPH01138501A (en) | 1989-05-31 |
| JP2586527B2 JP2586527B2 (en) | 1997-03-05 |
Family
ID=17860731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62298516A Expired - Lifetime JP2586527B2 (en) | 1987-11-26 | 1987-11-26 | Anti-reflective coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2586527B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11142606A (en) * | 1997-11-13 | 1999-05-28 | Canon Inc | Reflection preventive film and its manufacture |
| WO2000003957A3 (en) * | 1998-07-14 | 2000-04-20 | Leica Microsystems | Double-range reflection reduction for the visible spectral range |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5438904A (en) * | 1977-06-28 | 1979-03-24 | Tenneco Chem | Paper sizing agent and method |
| JPS5917502A (en) * | 1982-07-21 | 1984-01-28 | Tokyo Optical Co Ltd | Infrared anti-reflection film of germanium substrate |
| JPS6177001A (en) * | 1984-09-25 | 1986-04-19 | Canon Inc | Optical antireflecting film |
-
1987
- 1987-11-26 JP JP62298516A patent/JP2586527B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5438904A (en) * | 1977-06-28 | 1979-03-24 | Tenneco Chem | Paper sizing agent and method |
| JPS5917502A (en) * | 1982-07-21 | 1984-01-28 | Tokyo Optical Co Ltd | Infrared anti-reflection film of germanium substrate |
| JPS6177001A (en) * | 1984-09-25 | 1986-04-19 | Canon Inc | Optical antireflecting film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11142606A (en) * | 1997-11-13 | 1999-05-28 | Canon Inc | Reflection preventive film and its manufacture |
| WO2000003957A3 (en) * | 1998-07-14 | 2000-04-20 | Leica Microsystems | Double-range reflection reduction for the visible spectral range |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2586527B2 (en) | 1997-03-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |