JP7480793B2 - 音響共振器デバイス、音響共振器デバイスを製造する方法及びフィルタデバイス - Google Patents
音響共振器デバイス、音響共振器デバイスを製造する方法及びフィルタデバイス Download PDFInfo
- Publication number
- JP7480793B2 JP7480793B2 JP2022003739A JP2022003739A JP7480793B2 JP 7480793 B2 JP7480793 B2 JP 7480793B2 JP 2022003739 A JP2022003739 A JP 2022003739A JP 2022003739 A JP2022003739 A JP 2022003739A JP 7480793 B2 JP7480793 B2 JP 7480793B2
- Authority
- JP
- Japan
- Prior art keywords
- piezoelectric plate
- idt
- dielectric layer
- thickness
- acoustic resonator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 37
- 239000004020 conductor Substances 0.000 claims description 26
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 2
- 230000008569 process Effects 0.000 description 20
- 238000004891 communication Methods 0.000 description 12
- 230000008878 coupling Effects 0.000 description 10
- 238000010168 coupling process Methods 0.000 description 10
- 238000005859 coupling reaction Methods 0.000 description 10
- 238000002161 passivation Methods 0.000 description 10
- 239000003989 dielectric material Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000010897 surface acoustic wave method Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 230000006872 improvement Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 230000013011 mating Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000277 atomic layer chemical vapour deposition Methods 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02228—Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
- H03H9/02031—Characteristics of piezoelectric layers, e.g. cutting angles consisting of ceramic
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02047—Treatment of substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14544—Transducers of particular shape or position
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/176—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of ceramic material
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/562—Monolithic crystal filters comprising a ceramic piezoelectric layer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/564—Monolithic crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/566—Electric coupling means therefor
- H03H9/568—Electric coupling means therefor consisting of a ladder configuration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/023—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the membrane type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0407—Temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0442—Modification of the thickness of an element of a non-piezoelectric layer
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Description
本特許文書の開示の一部分は、著作権の保護を受ける材料を含む。本特許文書は、所有者のトレードドレスである若しくはトレードドレスとなり得る事項を図示及び/又は記載することができる。著作権及びトレードドレスの所有者は、その特許開示が米国特許商標庁の特許出願書類又は記録内にあるので、当該特許開示を任意の者が複製することに異議はないが、それ以外は何であれ、全ての著作権及びトレードドレス権を保有するものである。
本特許は、2021年1月15日に出願された、「XBAR WITH INSULATING LAYER BETWEEN ELECTRODE AND PIEZOELECTRIC MEMBRANE TO REDUCE ACOUSTIC COUPLING」と題する仮特許出願第63/137,736号の優先権を主張し、その内容は参照によりここに組み込まれるものとする。
図1は、XBAR100の簡略化された概略的上面図及び直交断面図を示す。XBAR100などのXBARタイプの共振器は、バンドリジェクトフィルタ、バンドパスフィルタ、デュプレクサ、及びマルチプレクサを含むさまざまなRFフィルタで使用し得る。
図8は、XBARを組み込んだフィルタを製造するためのプロセス800の簡略化されたフローチャートである。具体的には、プロセス800は、複数のDXBARを含むフィルタデバイスを製造するためのものであり、そのうちのいくつかは、周波数設定誘電体層を含んでもよい。プロセス800は、805でデバイス基板と、犠牲基板上に配置された圧電材料の薄いプレートとから開始される。プロセス800は、895で、完成したフィルタデバイスで終了する。図8のフローチャートには、主要なプロセスステップのみが含まれている。さまざまな従来のプロセスステップ(例えば、表面処理、洗浄、検査、ベーキング、アニーリング、監視、試験など)は、図8に示されるステップの前、間、後、及び最中に実行され得る。
この説明全体を通して、示される実施形態及び実施例は、開示又は特許請求される装置及び手順に対する制限ではなく、模範と見なされるべきである。本明細書に提示される例の多くは、方法動作又はシステム要素の特定の組み合わせを含むが、それらの行為及びそれらの要素は、同じ目的を達成するために他の方法で組み合わせることができることを理解されたい。フローチャートに関しては、ステップを追加することも、より少なくすることもでき、示されているステップを組み合わせて、あるいはさらに改良して、本明細書に記載の方法を達成することもできる。一実施形態に関連してのみ論じられる動作、要素、及び特徴は、他の実施形態における同様の役割から除外されることを意図するものではない。
Claims (17)
- 基板と、
前面と背面を有し、前記前面と前記背面との間の厚さが200nm以上1000nm以下であり、直接または少なくとも1つ以上の中間材料層を介して前記背面が前記基板に取り付けられている圧電プレートと、
前記圧電プレートの前記前面にある減結合誘電体層と、
前記減結合誘電体層上に形成されたインターデジタル変換器(IDT)であって、前記IDTのインターリーブされたフィンガが、キャビティを横切って懸架する前記圧電プレートの一部の上にあるようになっている、IDTと、
を備え、
前記圧電プレートが回転Yカットニオブ酸リチウムであり、
前記減結合誘電体層の厚さをtddとし、前記圧電プレートの厚さをtpとして、tdd/tpが0.05より大きい、
音響共振器デバイス。 - 前記IDTは、前記IDTに印加される無線周波数信号に応答して、前記圧電プレートに剪断音響波を励起するように構成される、請求項1に記載の音響共振器デバイス。
- 前記減結合誘電体層が二酸化ケイ素からなる、請求項1に記載の音響共振器デバイス。
- 前記IDTの前記フィンガのピッチが、前記圧電プレートの厚さの2倍以上25倍以下である、請求項1に記載の音響共振器デバイス。
- 前記IDTの前記フィンガは、幅を有し、
前記ピッチは、前記幅の2倍以上25倍以下である、
請求項4に記載の音響共振器デバイス。 - 前記IDTの前記フィンガの間の前記圧電プレートの前記前面に形成された前面誘電体層をさらに備え、
前記音響共振器デバイスの共振周波数は、前記前面誘電体層の厚さによって部分的に決定される、
請求項1に記載の音響共振器デバイス。 - 前記前面誘電体層は、二酸化ケイ素及び窒化ケイ素の少なくとも1つを含む、請求項6に記載の音響共振器デバイス。
- 前記IDTは、アルミニウム、アルミニウム合金、銅、銅合金、ベリリウム、及び金のうちの1つを含む、請求項1に記載の音響共振器デバイス。
- 基板と、
前面と背面を有し、前記前面と前記背面との間の厚さが200nm以上1000nm以下であり、直接または少なくとも1つ以上の中間材料層を介して前記背面が前記基板に取り付けられている圧電プレートと、
前記圧電プレートの前記前面にある減結合誘電体層と、
前記減結合誘電体層上に形成された導体パターンであって、それぞれの複数の共振器の複数のインターデジタル変換器(IDT)を含む、導体パターンと、
を備える、フィルタデバイスであって、
前記複数のIDTのそれぞれのインターリーブされたフィンガは、キャビティを横切って懸架する前記圧電プレートのそれぞれの部分の上にある、1つ又は複数のキャビティを横切って懸架する前記圧電プレートのそれぞれの部分上にあり、
前記圧電プレートが回転Yカットニオブ酸リチウムであり、
前記減結合誘電体層の厚さをtddとし、前記圧電プレートの厚さをtpとして、tdd/tpが0.05より大きい、
フィルタデバイス。 - 前記複数のIDTの全てが、各IDTに印加されるそれぞれの無線周波数信号に応答して、前記圧電プレートに剪断音響波を励起するように構成される、請求項9に記載のフィルタデバイス。
- 前記減結合誘電体層が二酸化ケイ素からなる、請求項9に記載のフィルタデバイス。
- 前記複数のIDTのそれぞれは、前記基板に形成されたそれぞれのキャビティ上に懸架された少なくとも1つの前記圧電プレートのそれぞれの部分上にある、請求項9に記載のフィルタデバイス。
- 前記複数の共振器は、シャント共振器と直列共振器とを含む、請求項9に記載のフィルタデバイス。
- 前記シャント共振器のIDTのフィンガの間に堆積された第一の誘電体層の厚さは、前記直列共振器のIDTのフィンガの間に堆積された第二の誘電体層の厚さより大きい、請求項13に記載のフィルタデバイス。
- 圧電プレートの背面を基板に取り付けるステップであって、前記圧電プレートは200nm以上1000nm以下の厚さを有する、ステップと、
前記基板にキャビティを形成し、前記圧電プレートの部分がキャビティを横切って懸架するようにするステップと、
前記圧電プレートの前面上に減結合誘電体層を形成するステップと、
インターデジタル変換器(IDT)を前記減結合誘電体層上に形成し、前記IDTのインターリーブされたフィンガが前記キャビティを横切って懸架する前記圧電プレートの前記部分の上にあるようにするステップと、
を含み、
前記圧電プレートが回転Yカットニオブ酸リチウムであり、
前記減結合誘電体層の厚さをtddとし、前記圧電プレートの厚さをtpとして、tdd/tpが0.05より大きい、
音響共振器デバイスを製造する方法。 - 前記IDTのインターリーブされた前記フィンガのピッチが、前記圧電プレートの厚さの2倍以上25倍以下である、請求項15に記載の音響共振器デバイスを製造する方法。
- 前記IDTのインターリーブされた前記フィンガは、幅を有し、
前記ピッチは、前記幅の2倍以上25倍以下である、
請求項16に記載の音響共振器デバイスを製造する方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202163137736P | 2021-01-15 | 2021-01-15 | |
US63/137,736 | 2021-01-15 | ||
US17/408,120 US11239816B1 (en) | 2021-01-15 | 2021-08-20 | Decoupled transversely-excited film bulk acoustic resonators |
US17/408,120 | 2021-08-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022109890A JP2022109890A (ja) | 2022-07-28 |
JP7480793B2 true JP7480793B2 (ja) | 2024-05-10 |
Family
ID=80034712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022003739A Active JP7480793B2 (ja) | 2021-01-15 | 2022-01-13 | 音響共振器デバイス、音響共振器デバイスを製造する方法及びフィルタデバイス |
Country Status (4)
Country | Link |
---|---|
US (3) | US11239816B1 (ja) |
JP (1) | JP7480793B2 (ja) |
CN (1) | CN114765454A (ja) |
DE (1) | DE102022100739A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11658639B2 (en) | 2020-10-05 | 2023-05-23 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband |
US11728784B2 (en) | 2020-10-05 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters |
US11476834B2 (en) | 2020-10-05 | 2022-10-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors |
US11496113B2 (en) | 2020-11-13 | 2022-11-08 | Resonant Inc. | XBAR devices with excess piezoelectric material removed |
US11239816B1 (en) * | 2021-01-15 | 2022-02-01 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008067289A (ja) | 2006-09-11 | 2008-03-21 | Fujitsu Media Device Kk | 弾性波デバイスおよびフィルタ |
WO2013021948A1 (ja) | 2011-08-08 | 2013-02-14 | 株式会社村田製作所 | 弾性波装置 |
WO2019241174A1 (en) | 2018-06-15 | 2019-12-19 | Resonant Inc. | Transversely-excited film bulk acoustic resonator |
WO2020092414A2 (en) | 2018-10-31 | 2020-05-07 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator |
US20210013859A1 (en) | 2018-06-15 | 2021-01-14 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with etched conductor patterns |
Family Cites Families (148)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3760299A (en) * | 1971-08-09 | 1973-09-18 | Hazeltine Corp | Acoustic surface wave-apparatus having dielectric material separating transducer from acoustic medium |
US5274345A (en) | 1992-05-13 | 1993-12-28 | Andersen Laboratories | Dual function reflector structures for interdigital saw transducer |
EP0616426B1 (en) | 1993-03-15 | 1998-09-16 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device having a lamination structure |
US5552655A (en) | 1994-05-04 | 1996-09-03 | Trw Inc. | Low frequency mechanical resonator |
US5632909A (en) | 1995-06-19 | 1997-05-27 | Motorola, Inc. | Filter |
US5853601A (en) | 1997-04-03 | 1998-12-29 | Northrop Grumman Corporation | Top-via etch technique for forming dielectric membranes |
US6540827B1 (en) | 1998-02-17 | 2003-04-01 | Trustees Of Columbia University In The City Of New York | Slicing of single-crystal films using ion implantation |
JP3317274B2 (ja) | 1999-05-26 | 2002-08-26 | 株式会社村田製作所 | 弾性表面波装置及び弾性表面波装置の製造方法 |
EP1198881B1 (de) | 1999-06-03 | 2004-07-28 | Tele Filter Zweigniederlassung der Dover Germany GmbH | Akustisches oberflächenwellenfilter |
JP2001024475A (ja) | 1999-07-09 | 2001-01-26 | Oki Electric Ind Co Ltd | 弾性表面波フィルタ |
US6570470B2 (en) | 2000-06-30 | 2003-05-27 | Kyocera Corporation | Surface acoustic wave ladder filter utilizing parallel resonators with different resonant frequencies |
JP3797155B2 (ja) | 2000-09-06 | 2006-07-12 | 株式会社村田製作所 | 端面反射型表面波装置の周波数調整方法 |
US6424237B1 (en) | 2000-12-21 | 2002-07-23 | Agilent Technologies, Inc. | Bulk acoustic resonator perimeter reflection system |
US6873226B2 (en) | 2001-03-19 | 2005-03-29 | Murata Manufacturing Co., Ltd. | Edge-reflection surface acoustic wave filter |
US6480074B1 (en) | 2001-04-27 | 2002-11-12 | Nokia Mobile Phones Ltd. | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters by reducing thickness non-uniformity |
TW506128B (en) | 2001-06-15 | 2002-10-11 | Asia Pacific Microsystems Inc | Manufacturing method of high-quality thin film type bulk acoustic wave device |
US6661313B2 (en) | 2001-10-25 | 2003-12-09 | Sawtek, Inc. | Surface acoustic wave devices using optimized cuts of lithium niobate (LiNbO3) |
US6767749B2 (en) | 2002-04-22 | 2004-07-27 | The United States Of America As Represented By The Secretary Of The Navy | Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer splitting |
US6833774B2 (en) | 2002-06-25 | 2004-12-21 | Sawtek, Inc. | Surface acoustic wave filter |
JP3892370B2 (ja) | 2002-09-04 | 2007-03-14 | 富士通メディアデバイス株式会社 | 弾性表面波素子、フィルタ装置及びその製造方法 |
JP4766831B2 (ja) | 2002-11-26 | 2011-09-07 | 株式会社村田製作所 | 電子部品の製造方法 |
JP2004254291A (ja) | 2003-01-27 | 2004-09-09 | Murata Mfg Co Ltd | 弾性表面波装置 |
JP4192794B2 (ja) | 2004-01-26 | 2008-12-10 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエーター、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、周波数フィルタ、発振器、電子回路、薄膜圧電共振器、及び電子機器 |
JP3875240B2 (ja) | 2004-03-31 | 2007-01-31 | 株式会社東芝 | 電子部品の製造方法 |
JP2005347892A (ja) | 2004-05-31 | 2005-12-15 | Fujitsu Media Device Kk | 弾性表面波素子 |
JP4306668B2 (ja) | 2005-01-07 | 2009-08-05 | セイコーエプソン株式会社 | ラム波型高周波共振子 |
JP2006217281A (ja) | 2005-02-03 | 2006-08-17 | Toshiba Corp | 薄膜バルク音響装置の製造方法 |
CN101292423B (zh) | 2005-10-19 | 2010-08-25 | 株式会社村田制作所 | 兰姆波器件 |
JP4585431B2 (ja) | 2005-11-15 | 2010-11-24 | 富士通メディアデバイス株式会社 | 分波器 |
KR101302132B1 (ko) | 2006-02-06 | 2013-09-03 | 삼성전자주식회사 | 멀티 밴드용 필터 모듈 및 그의 제작 방법 |
JP4315174B2 (ja) | 2006-02-16 | 2009-08-19 | セイコーエプソン株式会社 | ラム波型高周波デバイスの製造方法 |
JP2007221588A (ja) | 2006-02-17 | 2007-08-30 | Toshiba Corp | 薄膜圧電共振器及び薄膜圧電共振器の製造方法 |
JP2007312164A (ja) | 2006-05-19 | 2007-11-29 | Hitachi Ltd | 圧電薄膜共振器並びにそれを用いた高周波フィルタ及び高周波モジュール |
US7463118B2 (en) | 2006-06-09 | 2008-12-09 | Texas Instruments Incorporated | Piezoelectric resonator with an efficient all-dielectric Bragg reflector |
US7639105B2 (en) | 2007-01-19 | 2009-12-29 | Georgia Tech Research Corporation | Lithographically-defined multi-standard multi-frequency high-Q tunable micromechanical resonators |
US7684109B2 (en) | 2007-02-28 | 2010-03-23 | Maxim Integrated Products, Inc. | Bragg mirror optimized for shear waves |
US9369105B1 (en) | 2007-08-31 | 2016-06-14 | Rf Micro Devices, Inc. | Method for manufacturing a vibrating MEMS circuit |
DE112008002283B4 (de) | 2007-09-06 | 2018-01-04 | Murata Manufacturing Co., Ltd. | Piezoelektrischer Resonator |
JP5110092B2 (ja) | 2007-12-25 | 2012-12-26 | 株式会社村田製作所 | 複合圧電基板の製造方法 |
WO2009096563A1 (ja) | 2008-01-30 | 2009-08-06 | Kyocera Corporation | 弾性波装置およびその製造方法 |
US8278802B1 (en) | 2008-04-24 | 2012-10-02 | Rf Micro Devices, Inc. | Planarized sacrificial layer for MEMS fabrication |
JP5392258B2 (ja) | 2008-07-11 | 2014-01-22 | パナソニック株式会社 | 板波素子と、これを用いた電子機器 |
JP5220503B2 (ja) | 2008-07-23 | 2013-06-26 | 太陽誘電株式会社 | 弾性波デバイス |
WO2010013197A2 (en) | 2008-08-01 | 2010-02-04 | Ecole polytechnique fédérale de Lausanne (EPFL) | Piezoelectric resonator operating in thickness shear mode |
KR20110081865A (ko) | 2008-10-24 | 2011-07-14 | 엡슨 토요콤 가부시키 가이샤 | 탄성 표면파 공진자, 탄성 표면파 발진기 및 탄성 표면파 모듈 장치 |
JP4821834B2 (ja) | 2008-10-31 | 2011-11-24 | 株式会社村田製作所 | 圧電性複合基板の製造方法 |
JP5433367B2 (ja) | 2008-11-19 | 2014-03-05 | 日本碍子株式会社 | ラム波装置 |
US8689426B2 (en) | 2008-12-17 | 2014-04-08 | Sand 9, Inc. | Method of manufacturing a resonating structure |
US8294330B1 (en) | 2009-03-31 | 2012-10-23 | Triquint Semiconductor, Inc. | High coupling, low loss saw filter and associated method |
US8902020B2 (en) | 2009-07-27 | 2014-12-02 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Resonator filter with multiple cross-couplings |
EP2533422A3 (en) | 2010-01-28 | 2013-07-17 | Murata Manufacturing Co., Ltd. | Tunable filter |
WO2011111743A1 (ja) * | 2010-03-12 | 2011-09-15 | 株式会社村田製作所 | 弾性波共振子及びラダー型フィルタ |
FI123640B (fi) | 2010-04-23 | 2013-08-30 | Teknologian Tutkimuskeskus Vtt | Laajakaistainen akustisesti kytketty ohutkalvo-BAW-suodin |
JP5429200B2 (ja) | 2010-05-17 | 2014-02-26 | 株式会社村田製作所 | 複合圧電基板の製造方法および圧電デバイス |
GB2482528A (en) | 2010-08-05 | 2012-02-08 | Adaptalog Ltd | Crystal reference oscillator for navigation applications |
JP5447682B2 (ja) | 2010-09-28 | 2014-03-19 | 株式会社村田製作所 | 圧電デバイスの製造方法 |
FR2966305B1 (fr) | 2010-10-15 | 2013-07-12 | Commissariat Energie Atomique | Structure acoustique heterogene formee a partir d'un materiau homogene |
WO2012073871A1 (ja) | 2010-11-30 | 2012-06-07 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
WO2012086441A1 (ja) | 2010-12-24 | 2012-06-28 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
WO2012132238A1 (en) | 2011-03-25 | 2012-10-04 | Panasonic Corporation | Acoustic wave device with reduced higher order transverse modes |
KR101904991B1 (ko) | 2011-05-25 | 2018-10-08 | 페어차일드코리아반도체 주식회사 | 슈퍼정션 반도체 소자 및 그 제조방법 |
US8816567B2 (en) | 2011-07-19 | 2014-08-26 | Qualcomm Mems Technologies, Inc. | Piezoelectric laterally vibrating resonator structure geometries for spurious frequency suppression |
CN103891139B (zh) | 2011-10-24 | 2016-08-24 | 株式会社村田制作所 | 弹性表面波装置 |
FI124732B (en) | 2011-11-11 | 2014-12-31 | Teknologian Tutkimuskeskus Vtt | Laterally connected bulk wave filter with improved passband characteristics |
WO2013080461A1 (ja) | 2011-11-30 | 2013-06-06 | パナソニック株式会社 | ラダー型弾性波フィルタと、これを用いたアンテナ共用器 |
JP2013214954A (ja) | 2012-03-07 | 2013-10-17 | Taiyo Yuden Co Ltd | 共振子、周波数フィルタ、デュプレクサ、電子機器及び共振子の製造方法 |
DE102013204428B4 (de) | 2012-03-29 | 2014-08-07 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Akustisches Oberflächenwellenbauelement |
JP2013223025A (ja) | 2012-04-13 | 2013-10-28 | Taiyo Yuden Co Ltd | フィルタ装置、フィルタ装置の製造方法及びデュプレクサ |
US9178256B2 (en) | 2012-04-19 | 2015-11-03 | Qualcomm Mems Technologies, Inc. | Isotropically-etched cavities for evanescent-mode electromagnetic-wave cavity resonators |
US9093979B2 (en) | 2012-06-05 | 2015-07-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Laterally-coupled acoustic resonators |
WO2014035530A2 (en) | 2012-06-15 | 2014-03-06 | Gong Songbin | Microelectronic structures with suspended lithium-based thin films |
JP6013829B2 (ja) | 2012-08-17 | 2016-10-25 | 太陽誘電株式会社 | 弾性波フィルタ、デュプレクサ及びモジュール |
US9596546B2 (en) | 2012-12-12 | 2017-03-14 | Epcos Ag | Electroacoustic components and methods thereof |
WO2014148648A1 (ja) * | 2013-03-21 | 2014-09-25 | 日本碍子株式会社 | 弾性波素子用複合基板および弾性波素子 |
WO2015012914A2 (en) | 2013-04-22 | 2015-01-29 | Northeastern University | Nano- and micro-electromechanical resonators |
US9276557B1 (en) | 2013-07-01 | 2016-03-01 | Sandia Corporation | Programmable electroacoustic filter apparatus and method for its manufacture |
JP5817795B2 (ja) | 2013-08-06 | 2015-11-18 | 株式会社村田製作所 | 高周波モジュール |
KR101883209B1 (ko) | 2013-12-12 | 2018-08-30 | 퀄컴 인코포레이티드 | 마이크로기계식 초음파 트랜스듀서 및 디스플레이 |
US9525398B1 (en) | 2014-05-27 | 2016-12-20 | Sandia Corporation | Single crystal micromechanical resonator and fabrication methods thereof |
US9691963B2 (en) * | 2014-05-29 | 2017-06-27 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Capacitive coupled resonator and filter device with comb electrodes and support pillars separating piezoelectric layer |
US9912314B2 (en) | 2014-07-25 | 2018-03-06 | Akoustics, Inc. | Single crystal acoustic resonator and bulk acoustic wave filter |
WO2016017104A1 (en) | 2014-07-31 | 2016-02-04 | Skyworks Panasonic Filter Solutions Japan Co., Ltd. | Acoustic wave filters and duplexers using same |
WO2016060151A1 (ja) | 2014-10-16 | 2016-04-21 | 株式会社村田製作所 | 高周波モジュール |
US10374573B2 (en) | 2014-12-17 | 2019-08-06 | Qorvo Us, Inc. | Plate wave devices with wave confinement structures and fabrication methods |
US9837984B2 (en) | 2014-12-24 | 2017-12-05 | Qorvo Us, Inc. | RF ladder filter with simplified acoustic RF resonator parallel capacitance compensation |
US10079414B2 (en) | 2015-03-17 | 2018-09-18 | The United States Of America, As Represented By The Secretary Of The Navy | Switched multiplexer with flat group delay and channelized limiting |
CN107534433B (zh) | 2015-05-08 | 2021-01-15 | 株式会社村田制作所 | 高频模块 |
WO2016189952A1 (ja) | 2015-05-22 | 2016-12-01 | 株式会社村田製作所 | 電子部品 |
US10284176B1 (en) | 2015-06-03 | 2019-05-07 | Qorvo Us, Inc. | Temperature compensated surface acoustic wave device and methods of manufacturing the same |
US10541667B2 (en) | 2015-08-25 | 2020-01-21 | Avago Technologies International Sales Pte. Limited | Surface acoustic wave (SAW) resonator having trap-rich region |
US10305447B2 (en) | 2015-11-13 | 2019-05-28 | Resonant Inc. | Acoustic wave filter with enhanced rejection |
US10530329B2 (en) | 2016-01-22 | 2020-01-07 | Qorvo Us, Inc. | Guided wave devices with selectively thinned piezoelectric layers |
US10164605B2 (en) | 2016-01-26 | 2018-12-25 | Avago Technologies International Sales Pte. Limited | Bulk acoustic wave resonator with piezoelectric layer comprising lithium niobate or lithium tantalate |
US10084427B2 (en) | 2016-01-28 | 2018-09-25 | Qorvo Us, Inc. | Surface acoustic wave device having a piezoelectric layer on a quartz substrate and methods of manufacturing thereof |
US10200013B2 (en) | 2016-02-18 | 2019-02-05 | X-Celeprint Limited | Micro-transfer-printed acoustic wave filter device |
US10979025B2 (en) | 2016-03-11 | 2021-04-13 | Akoustis, Inc. | 5G band n79 acoustic wave resonator RF filter circuit |
US10187039B2 (en) | 2016-06-07 | 2019-01-22 | Skyworks Filter Solutions Japan Co., Ltd. | Filter devices having reduced spurious emissions from lamb waves |
JP6556103B2 (ja) | 2016-06-28 | 2019-08-07 | 太陽誘電株式会社 | 弾性波デバイスの製造方法及び弾性波デバイス |
CN109417379B (zh) | 2016-06-28 | 2022-08-12 | 株式会社村田制作所 | 多工器、高频前端电路及通信装置 |
JP6520845B2 (ja) | 2016-06-29 | 2019-05-29 | 株式会社村田製作所 | 電子部品装置、回路基板への電子部品装置の実装方法、および、回路基板への電子部品装置の実装構造 |
JP6556105B2 (ja) | 2016-07-28 | 2019-08-07 | 太陽誘電株式会社 | 電子デバイスの製造方法 |
KR20180016828A (ko) | 2016-08-08 | 2018-02-20 | 삼성전기주식회사 | 표면 탄성파 필터 장치 및 이의 제조방법 |
US10038422B2 (en) | 2016-08-25 | 2018-07-31 | Qualcomm Incorporated | Single-chip multi-frequency film bulk acoustic-wave resonators |
WO2018043606A1 (ja) | 2016-09-02 | 2018-03-08 | 株式会社村田製作所 | 弾性波フィルタ装置、高周波フロントエンド回路及び通信装置 |
CN112600532B (zh) | 2016-11-25 | 2024-05-31 | 株式会社村田制作所 | 弹性波滤波器装置 |
US10608608B2 (en) | 2017-01-03 | 2020-03-31 | Win Semiconductors Corp. | Method for fabricating bulk acoustic wave resonator with mass adjustment structure |
JP6760479B2 (ja) | 2017-03-13 | 2020-09-23 | 株式会社村田製作所 | ノッチフィルタ |
WO2018168836A1 (ja) | 2017-03-15 | 2018-09-20 | 株式会社村田製作所 | 弾性波素子、弾性波フィルタ装置およびマルチプレクサ |
US10439580B2 (en) | 2017-03-24 | 2019-10-08 | Zhuhai Crystal Resonance Technologies Co., Ltd. | Method for fabricating RF resonators and filters |
JP6662490B2 (ja) | 2017-04-26 | 2020-03-11 | 株式会社村田製作所 | 弾性波装置 |
US10491291B2 (en) | 2017-05-19 | 2019-11-26 | Honeywell International Inc. | System and method for multi-channel vehicle communications |
US11451209B2 (en) | 2017-10-31 | 2022-09-20 | The Board Of Trustees Of The University Of Illinois | Interdigital transducers on a piezoelectric thin-film for signal compression |
WO2019094388A1 (en) | 2017-11-07 | 2019-05-16 | Resonant Inc. | Ultra-wide-band saw sensor with hyperbolically frequency-modulated etched reflector |
US10911023B2 (en) | 2018-06-15 | 2021-02-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with etch-stop layer |
US11323090B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonator using Y-X-cut lithium niobate for high power applications |
US20210328574A1 (en) | 2020-04-20 | 2021-10-21 | Resonant Inc. | Small transversely-excited film bulk acoustic resonators with enhanced q-factor |
US10637438B2 (en) | 2018-06-15 | 2020-04-28 | Resonant Inc. | Transversely-excited film bulk acoustic resonators for high power applications |
US11146232B2 (en) | 2018-06-15 | 2021-10-12 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with reduced spurious modes |
US10790802B2 (en) | 2018-06-15 | 2020-09-29 | Resonant Inc. | Transversely excited film bulk acoustic resonator using rotated Y-X cut lithium niobate |
US10756697B2 (en) | 2018-06-15 | 2020-08-25 | Resonant Inc. | Transversely-excited film bulk acoustic resonator |
US10601392B2 (en) | 2018-06-15 | 2020-03-24 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator |
US11165406B2 (en) | 2018-03-02 | 2021-11-02 | Skyworks Solutions, Inc. | Lamb wave element and bulk acoustic wave resonator on common substrate |
DE102018109833A1 (de) | 2018-04-24 | 2019-10-24 | RF360 Europe GmbH | SAW-Resonator, HF-Filter, Multiplexer und Verfahren zur Herstellung eines SAW-Resonators |
US10530334B2 (en) | 2018-05-10 | 2020-01-07 | Globalfoundries Singapore Pte. Ltd. | Acoustic wave filter formed on a V-groove topography and method for producing the same |
US10868513B2 (en) | 2018-06-15 | 2020-12-15 | Resonant Inc. | Transversely-excited film bulk acoustic filters with symmetric layout |
US10998882B2 (en) | 2018-06-15 | 2021-05-04 | Resonant Inc. | XBAR resonators with non-rectangular diaphragms |
US10992284B2 (en) | 2018-06-15 | 2021-04-27 | Resonant Inc. | Filter using transversely-excited film bulk acoustic resonators with multiple frequency setting layers |
US10992283B2 (en) | 2018-06-15 | 2021-04-27 | Resonant Inc. | High power transversely-excited film bulk acoustic resonators on rotated Z-cut lithium niobate |
US10985728B2 (en) | 2018-06-15 | 2021-04-20 | Resonant Inc. | Transversely-excited film bulk acoustic resonator and filter with a uniform-thickness dielectric overlayer |
US10917072B2 (en) | 2019-06-24 | 2021-02-09 | Resonant Inc. | Split ladder acoustic wave filters |
US10998877B2 (en) | 2018-06-15 | 2021-05-04 | Resonant Inc. | Film bulk acoustic resonator fabrication method with frequency trimming based on electric measurements prior to cavity etch |
US10797675B2 (en) | 2018-06-15 | 2020-10-06 | Resonant Inc. | Transversely excited film bulk acoustic resonator using rotated z-cut lithium niobate |
US11146238B2 (en) | 2018-06-15 | 2021-10-12 | Resonant Inc. | Film bulk acoustic resonator fabrication method |
US10826462B2 (en) | 2018-06-15 | 2020-11-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with molybdenum conductors |
US10819309B1 (en) | 2019-04-05 | 2020-10-27 | Resonant Inc. | Transversely-excited film bulk acoustic resonator package and method |
US11171629B2 (en) | 2018-06-15 | 2021-11-09 | Resonant Inc. | Transversely-excited film bulk acoustic resonator using pre-formed cavities |
US11646714B2 (en) | 2018-07-10 | 2023-05-09 | Texas Instruments Incorporated | Laterally vibrating bulk acoustic wave resonator |
US11143561B2 (en) | 2018-12-05 | 2021-10-12 | Resonant Inc. | Passive microphone/pressure sensor using a piezoelectric diaphragm |
US11146241B2 (en) | 2019-02-08 | 2021-10-12 | Vtt Technical Research Centre Of Finland Ltd | Low loss acoustic device |
WO2020175234A1 (ja) | 2019-02-27 | 2020-09-03 | 株式会社村田製作所 | 弾性表面波装置 |
CN113615083A (zh) | 2019-03-14 | 2021-11-05 | 谐振公司 | 带有半λ介电层的横向激励的薄膜体声波谐振器 |
US11463069B2 (en) | 2019-03-25 | 2022-10-04 | Skyworks Solutions, Inc. | Acoustic wave filters with isolation |
US10911021B2 (en) | 2019-06-27 | 2021-02-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with lateral etch stop |
WO2021060523A1 (ja) | 2019-09-27 | 2021-04-01 | 株式会社村田製作所 | 弾性波装置及びフィルタ装置 |
US10992282B1 (en) | 2020-06-18 | 2021-04-27 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with electrodes having a second layer of variable width |
US11239816B1 (en) * | 2021-01-15 | 2022-02-01 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators |
US20220231661A1 (en) | 2021-01-15 | 2022-07-21 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators for high power filters |
CN117652097A (zh) | 2021-07-21 | 2024-03-05 | 株式会社村田制作所 | 弹性波装置及滤波器装置 |
-
2021
- 2021-08-20 US US17/408,120 patent/US11239816B1/en active Active
- 2021-12-09 US US17/547,113 patent/US11811386B2/en active Active
-
2022
- 2022-01-11 CN CN202210028712.9A patent/CN114765454A/zh active Pending
- 2022-01-13 DE DE102022100739.1A patent/DE102022100739A1/de active Pending
- 2022-01-13 JP JP2022003739A patent/JP7480793B2/ja active Active
-
2023
- 2023-09-28 US US18/477,307 patent/US20240022228A1/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008067289A (ja) | 2006-09-11 | 2008-03-21 | Fujitsu Media Device Kk | 弾性波デバイスおよびフィルタ |
WO2013021948A1 (ja) | 2011-08-08 | 2013-02-14 | 株式会社村田製作所 | 弾性波装置 |
WO2019241174A1 (en) | 2018-06-15 | 2019-12-19 | Resonant Inc. | Transversely-excited film bulk acoustic resonator |
US20210013859A1 (en) | 2018-06-15 | 2021-01-14 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with etched conductor patterns |
WO2020092414A2 (en) | 2018-10-31 | 2020-05-07 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator |
Also Published As
Publication number | Publication date |
---|---|
US11239816B1 (en) | 2022-02-01 |
DE102022100739A1 (de) | 2022-07-21 |
US20240022228A1 (en) | 2024-01-18 |
US11811386B2 (en) | 2023-11-07 |
JP2022109890A (ja) | 2022-07-28 |
US20220231659A1 (en) | 2022-07-21 |
CN114765454A (zh) | 2022-07-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11139794B2 (en) | Transversely-excited film bulk acoustic resonator | |
US10917070B2 (en) | Bandpass filter with frequency separation between shunt and series resonators set by dielectric layer thickness | |
US10868510B2 (en) | Transversely-excited film bulk acoustic resonator with half-lambda dielectric layer | |
US11368139B2 (en) | Small transversely-excited film bulk acoustic resonators with enhanced Q-factor | |
JP7480793B2 (ja) | 音響共振器デバイス、音響共振器デバイスを製造する方法及びフィルタデバイス | |
US11916532B2 (en) | Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate | |
US20220231661A1 (en) | Decoupled transversely-excited film bulk acoustic resonators for high power filters | |
US20220393666A1 (en) | Filter device | |
US20240213955A1 (en) | Resonators with different membrane thicknesses on the same die | |
US20210391844A1 (en) | Transversely-excited film bulk acoustic resonator | |
US20230025241A1 (en) | Low loss transversely-excited film bulk acoustic resonators and filters | |
JP2022186631A (ja) | 低損失横方向励起フィルムバルク音響共振器及びフィルタ | |
US20220060167A1 (en) | Acoustic resonators with high acoustic velocity layers | |
US20210376814A1 (en) | Transversely-excited film bulk acoustic resonators with two-layer electrodes | |
US11405020B2 (en) | Transversely-excited film bulk acoustic resonators with structures to reduce acoustic energy leakage | |
US20220231658A1 (en) | Filters using decoupled transversely-excited film bulk acoustic resonators | |
US12021496B2 (en) | Resonators with different membrane thicknesses on the same die | |
US20220231657A1 (en) | Transversely-excited film bulk acoustic resonators with improved coupling and reduced energy leakage | |
US11405019B2 (en) | Transversely-excited film bulk acoustic resonator matrix filters | |
US20220166401A1 (en) | Transversely-excited film bulk acoustic resonators with improved edge effects | |
US20210399714A1 (en) | Transversely-excited film bulk acoustic resonators with three-layer electrodes | |
US20220311421A1 (en) | Acoustic filters with shared acoustic tracks for series and shunt resonators | |
WO2023108006A1 (en) | Decoupled transversely-excited film bulk acoustic resonators for high power filters | |
CN118285055A (zh) | 使用解耦横向激发薄膜体声学谐振器的滤波器 | |
WO2023097182A1 (en) | Filters using decoupled transversely-excited film bulk acoustic resonators |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220407 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20230105 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20230602 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230620 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230818 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231031 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231228 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240326 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240408 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7480793 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |