JP7179587B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP7179587B2 JP7179587B2 JP2018211902A JP2018211902A JP7179587B2 JP 7179587 B2 JP7179587 B2 JP 7179587B2 JP 2018211902 A JP2018211902 A JP 2018211902A JP 2018211902 A JP2018211902 A JP 2018211902A JP 7179587 B2 JP7179587 B2 JP 7179587B2
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- Prior art keywords
- electrode
- metal material
- semiconductor device
- solder
- semiconductor substrate
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- 239000004065 semiconductor Substances 0.000 title claims description 125
- 229910000679 solder Inorganic materials 0.000 claims description 71
- 239000007769 metal material Substances 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 45
- 239000010936 titanium Substances 0.000 claims description 30
- 239000010949 copper Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 description 18
- 239000012535 impurity Substances 0.000 description 8
- 230000035515 penetration Effects 0.000 description 8
- 239000006071 cream Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 229920005591 polysilicon Polymers 0.000 description 7
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 230000006378 damage Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Description
本実施形態の半導体装置は、第1面と、第2面と、を有する半導体基板と、半導体基板内に設けられ、第1面に設けられているゲート絶縁膜を有する半導体素子と、第1面の上に設けられた第1電極と、第1電極の上に設けられ、第1金属材料を含み、膜厚は(65[g・μm・cm-3])/(第1金属材料の密度[g・cm-3])以上である第2電極と、第2電極の上に設けられた第1はんだ部と、第1はんだ部の上に設けられた第3電極と、第1面の上に設けられた第4電極と、第4電極の上に設けられ、第2金属材料を含み、膜厚は(65[g・μm・cm-3])/(第2金属材料の密度[g・cm-3])以上である第5電極と、第5電極の上に設けられた第2はんだ部と、第2はんだ部の上に設けられた第6電極と、を備える半導体装置である。
本実施形態の半導体装置は、半導体基板は、第2領域に設けられた終端構造(半導体素子に隣接して第1面に設けられた終端構造、又は半導体基板の端部側に設けられた終端構造)をさらに有し、第1はんだ部と半導体基板の間の距離をe、第1はんだ部が第1面に投影された第1部分と終端構造の間の距離をfとしたときに、(a/b)>(a+e)/fである点で第1の実施形態の半導体装置と異なっている。
本実施形態の半導体装置は、第2電極が第1面2aに投影された第2部分と、第4電極が第1面に投影された第3部分は、接している、又は重なりを有する点で、第1の実施形態及び第2の実施形態と異なっている。ここで、第1の実施形態及び第2の実施形態と重複する点については、記載を省略する。
2a 第1面
2b 第2面
10 半導体層
12 ドリフト層
14 ウェル領域
16 ゲート絶縁膜
18 ゲート電極
20 ソース領域
22 コンタクト領域
30 半導体素子(MOSFET)
40a 第1領域
40b 第2領域
52 絶縁膜
54 絶縁膜
60 第1電極
60a 第1Ti含有電極
60b 第1Al含有電極
61 重なり部分(重なり)
62 第1Ti含有層
63 第2部分
64 第2電極
64a 第1下地層
64b 第1めっき電極
65 電極部分(第1の電極部分)
66 第1はんだ部
67 第1部分
68 第3電極
69 第3部分
70 第4電極
70a ポリシリコン電極
70b 第2Ti含有電極
70c 第2Al含有電極
72 第2Ti含有層
74 第5電極
74a 第2下地層
74b 第2めっき電極
75 電極部分(第2の電極部分)
76 第2はんだ部
78 第6電極
80 バリアメタル
82 第8電極
82a 第3下地層
82b 第3めっき電極
84 第3はんだ部
86 第7電極
90 終端構造
91 第3の領域
92 絶縁膜
94 コンタクト
96 膜
98 膜
99 フォトレジスト
100 半導体装置
110 半導体装置
120 半導体装置
130 半導体装置
Claims (6)
- 第1面と、第2面と、を有する半導体基板と、
前記半導体基板内に設けられ、前記第1面に設けられているゲート絶縁膜を有する半導体素子と、
前記第1面の上に設けられ、第1金属材料を含む第1電極と、
前記第1電極の上に設けられ、第2金属材料を含む第2電極と、
前記第2電極の上に設けられた第1はんだ部と、
前記第1はんだ部の上に設けられた第3電極と、
前記第1面の上に設けられ、第3金属材料を含む第4電極と、
前記第4電極の上に設けられ、第4金属材料を含む第5電極と、
前記第5電極の上に設けられた第2はんだ部と、
前記第2はんだ部の上に設けられた第6電極と、
を備え、
前記第1電極の膜厚と前記第2電極の膜厚の和は((65[g・μm・cm -3 ])/(前記第1金属材料の密度[g・cm -3 ])+(65[g・μm・cm -3 ])/(前記第2金属材料の密度[g・cm -3 ]))以上であり、
前記第4電極の膜厚と前記第5電極の膜厚の和は((65[g・μm・cm -3 ])/(前記第3金属材料の密度[g・cm -3 ])+(65[g・μm・cm -3 ])/(前記第4金属材料の密度[g・cm -3 ]))以上である、
半導体装置。 - 前記半導体基板の前記第2面に設けられた第7電極と、
前記第7電極と前記半導体基板の間に設けられた第3はんだ部と、
前記第3はんだ部と前記半導体基板の間に設けられ、前記第3金属材料を含み、膜厚は(65[g・μm・cm-3])/(前記第3金属材料の密度[g・cm-3])以上である第8電極と、
をさらに備え、
前記半導体基板の板厚は25μm以下である請求項1記載の半導体装置。 - 前記第2電極又は前記第5電極は、複数の金属層の積層構造を有する請求項1又は請求項2記載の半導体装置。
- 前記第2電極が前記第1面に投影された第2部分と、前記第4電極が前記第1面に投影された第3部分は、接している、又は重なりを有する請求項1ないし請求項3いずれか一項記載の半導体装置。
- 前記ゲート絶縁膜は前記半導体基板の前記第1面から前記第2面の方向へ延伸している、請求項1ないし請求項4いずれか一項記載の半導体装置。
- 前記第1金属材料及び前記第2金属材料は、Cu(銅)、Ni(ニッケル)、Al(アルミニウム)、Ag(銀)、Ti(チタン)又はW(タングステン)である請求項1ないし請求項5いずれか一項記載の半導体装置。
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