JP7126425B2 - 基板処理装置、基板の搬入方法及び基板処理方法 - Google Patents
基板処理装置、基板の搬入方法及び基板処理方法 Download PDFInfo
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Description
該反応管の前記開口を開閉可能な蓋体と、
該蓋体に載置可能であり、複数枚の基板を縦方向に間隔を空けて多段に保持可能な基板保持具と、
前記蓋体に載置可能であり、前記基板保持具を覆うインナーチューブと、を有し、
前記インナーチューブの側面は、基板を前記基板保持具に移載可能とするための第1の開口と、前記反応管内で排気口となる第2の開口を有する。
本開示の第1の実施形態に係る基板処理装置について説明する。図1は、第1の実施形態に係る基板処理装置の概略図である。
図9は、本開示の第2の実施形態に係る基板処理装置の一例を示した横断面図である。図9に示されるように、第2の実施形態に係る基板処理装置では、インナーチューブ43の構成は第1の実施形態に係る基板処理装置と同様であるが、センターチューブ44が設けられていない点で、第1の実施形態と異なっている。
図10は、本開示の第3の実施形態に係る基板処理装置の一例を示した図である。第3の実施形態に係る基板処理装置においては、ガス抜け防止部材47がインナーチューブ43の下部に設けられた構成を有する。ガス抜け防止部材47は、処理ガスが下方に抜けるのを防止するための部材であり、下方への流路のコンダクタンスを低下させるべく、複数の突起47aが表面に設けられ、処理ガスの流路を狭め、ガスの通過を妨げる。すなわち、複数の突起47aは、各インジェクタ40の間の空間をカバーするように設けられる。ガス抜け防止部材47は、例えば、インナーチューブ43の供給開口43Aの下方に設けてもよい。これにより、供給開口43Aの下方における処理ガスの流出を抑制することができる。
38 ウエハボート
40 インジェクタ
43 インナーチューブ
43A 供給開口
43B 排気開口
43C 突出面
44 センターチューブ
45 アウターチューブ
46 反応管
47 ガス抜け防止部材
47a 突起
52 排気開口部
64 磁性流体シール部
65 回転テーブル
66 回転軸
Claims (16)
- 下端に開口を有する円筒形状の反応管と、
該反応管の前記開口を開閉可能な蓋体と、
該蓋体に載置可能であり、複数枚の基板を縦方向に間隔を空けて多段に保持可能な基板保持具と、
前記蓋体に載置可能であり、前記基板保持具を覆うインナーチューブと、を有し、
前記インナーチューブの側面は、基板を前記基板保持具に移載可能とするための第1の開口と、前記反応管内で排気口となる第2の開口を有する基板処理装置。 - 前記第1及び第2の開口は、縦長の長方形の形状を有する請求項1に記載の基板処理装置。
- 前記第2の開口は、前記第1の開口よりも小さい請求項1又は2に記載の基板処理装置。
- 前記インナーチューブの内面は、前記基板保持具の外形に沿った形状を有する請求項1乃至3のいずれか一項に記載の基板処理装置。
- 前記蓋体は、前記基板保持具を回転させる第1の回転軸と、前記インナーチューブを回転させる第2の回転軸とを有し、
前記第1の回転軸及び前記第2の回転軸は、回転中心が一致するように設けられている請求項1乃至4のいずれか一項に記載の基板処理装置。 - 前記基板保持具を回転させる前記第1の回転軸を囲むように前記第2の回転軸が設けられ、前記第2の回転軸は、前記インナーチューブを載置可能な回転テーブルを有する請求項5に記載の基板処理装置。
- 前記第1及び第2の回転軸は、磁性流体シールを介して独立して回転可能に構成されている請求項6に記載の基板処理装置。
- 前記反応管内の所定領域には、前記反応管の側面の内周面に沿って鉛直に延びる処理ガスを供給するためのインジェクタが設けられ、
前記インナーチューブは、前記第1の開口が前記インジェクタと対向するように前記反応管内に配置される請求項7に記載の基板処理装置。 - 前記蓋体と、前記第1及び第2の回転軸の動作を制御する制御部と、
基板を前記基板保持具に移載する移載装置と、を更に有し、
前記制御部は、前記基板保持具を前記蓋体上の前記回転テーブル上に載置された前記インナーチューブ内に移載する際には、前記第1の開口が前記移載装置の方に向くように前記回転テーブルを回転させ、
前記基板が前記インナーチューブ内の前記基板保持具に移載されたら、前記インナーチューブの前記第1の開口が前記インジェクタが配置された方向を向くように前記回転テーブルを回転させ、前記第1の開口が前記インジェクタが配置された方向を向いた状態で前記蓋体を上昇させて前記開口を塞ぐ制御を行う請求項8に記載の基板処理装置。 - 前記第2の回転軸を停止させて前記インナーチューブを固定した状態とし、前記第1の回転軸を回転させて前記基板保持具を回転させながら前記インジェクタから処理ガスを供給し、前記基板を処理する請求項9に記載の基板処理装置。
- 前記インナーチューブの前記第1の開口の縦に延びる左右の端部には、前記インジェクタを左右から囲むように突出して縦に延びた突出面が設けられた請求項9又は10に記載の基板処理装置。
- 前記反応管の内周には、前記突出面の外側に延び、前記突出面とでラビリンス構造を形成する突出壁が設けられている請求項11に記載の基板処理装置。
- 前記反応管内の前記インナーチューブと前記反応管との間には、前記第1の開口を外側から覆うとともに、前記第2の開口を包含する位置に開口が設けられているセンターチューブが設けられている請求項8乃至12のいずれか一項に記載の基板処理装置。
- 前記第1の開口の下方には、前記処理ガスの下方への流出を妨げるガス抜け防止部材が設けられた請求項8乃至13のいずれか一項に記載の基板処理装置。
- 下端に第1の開口を有する円筒形状の反応管の下方に配置された蓋体上に設けられた回転テーブル上に載置されたインナーチューブ内に設けられ、複数枚の基板を縦方向に間隔を有して多段に保持可能な基板保持具内に、前記インナーチューブの側面に設けられた第2の開口を介して基板を移載する工程と、
前記第2の開口が、前記反応管内に設けられたインジェクタに対向する平面位置となるように前記回転テーブルを回転させる工程と、
前記蓋体を上昇させ、前記第2の開口が前記インジェクタに対向するように前記蓋体で前記第1の開口を塞ぐ工程と、を有する基板の搬入方法。 - 請求項15に記載の基板の搬入方法により前記反応管内に前記基板保持具及び前記インナーチューブを搬入する工程と、
前記回転テーブルを回転させる第1の回転軸と軸心が一致する第2の回転軸により前記基板保持具を回転させながら、前記インジェクタから処理ガスを供給して前記複数枚の基板を処理する基板処理方法。
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